WO2014166169A1 - 用于液晶显示面板的光罩及其使用方法 - Google Patents

用于液晶显示面板的光罩及其使用方法 Download PDF

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Publication number
WO2014166169A1
WO2014166169A1 PCT/CN2013/078233 CN2013078233W WO2014166169A1 WO 2014166169 A1 WO2014166169 A1 WO 2014166169A1 CN 2013078233 W CN2013078233 W CN 2013078233W WO 2014166169 A1 WO2014166169 A1 WO 2014166169A1
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Prior art keywords
light
liquid crystal
crystal display
display panel
shielding
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PCT/CN2013/078233
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English (en)
French (fr)
Inventor
罗时勋
韩丙
唐振赛
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/126,442 priority Critical patent/US20140317906A1/en
Publication of WO2014166169A1 publication Critical patent/WO2014166169A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/08—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 light absorbing layer
    • G02F2201/086—UV absorbing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating

Definitions

  • the present invention relates to a photomask for a thin film transistor liquid crystal display panel, and more particularly to a photomask for preventing ultraviolet light from being irradiated onto a liquid crystal display panel.
  • liquid crystal display panels With the advancement of the technology of liquid crystal display panels, different manufacturers have developed different types of liquid crystal display panels, among which there are twisted nematic (Twisted) Nematic, TN), Vertical Alignment (VA), Planar Conversion (In-Plane) Switching, IPS) and polymer stabilized vertical alignment (Polymer Stabilized Vertical) Alignment, PSVA) and other types.
  • twisted nematic Nematic
  • TN Vertical Alignment
  • VA Planar Conversion
  • IPS Planar Conversion
  • PSVA Polymer Stabilized Vertical Alignment
  • PSVA Polymer Stabilized Vertical Alignment
  • the characteristics of the polymer monomer which is polymerized in advance are no longer the same as those of the other polymer monomers.
  • different pre-forms will be formed in the liquid crystal layer.
  • the reticle 10 includes a transparent substrate 102, and a light-shielding material forms a light-shielding region 104 on the transparent substrate 102, and a region not covered by the light-shielding material forms a light-transmitting region 106.
  • the light-transmitting area 106 corresponds to the non-display area of the liquid crystal display panel
  • the light-shielding area 104 corresponds to the display area of the liquid crystal display panel, so that the ultraviolet light can only illuminate the area corresponding to the non-display area on the liquid crystal display panel, and the sealant is cured by ultraviolet radiation to The liquid crystal molecules in the liquid crystal layer of the liquid crystal display panel are encapsulated.
  • FIG. 2 is a schematic view showing irradiation using a photomask in the fabrication of a conventional PSVA liquid crystal display panel.
  • the ultraviolet ray is irradiated, the AA area 2022 is protected by the reticle 208 from being irradiated.
  • the AA area 2022 in Fig. 2 is located in the display area of the liquid crystal display panel.
  • the mask 208 for shielding ultraviolet rays is sputtered with a layer of metal on the glass and then etched.
  • the metal has good light-shielding properties, but the disadvantage is that the metal under the sealant 206 The ultraviolet light is reflected, and the mask 208 is at a certain distance from the TFT substrate 202. Therefore, a part of the light is reflected on the mask 208, and the mask 208 is also made of metal, and the light is also reflected, so that the liquid crystal of the AA area 2022 is It is exposed to light, causing some of the ultraviolet rays to illuminate the AA area 2022 of the liquid crystal display panel.
  • liquid crystal molecules 210 in the liquid crystal layer of the polymer-stabilized vertical alignment type liquid crystal display are doped with a polymer monomer, once the polymer monomer in the liquid crystal layer is irradiated with ultraviolet rays, the polymer monomer of the irradiated portion will be The polymerization reaction occurs in advance, resulting in some problems of mura in the later stage.
  • An object of the present invention is to provide a photomask for a thin film transistor liquid crystal display panel which can shield ultraviolet light and absorb ultraviolet light reflected from a TFT substrate of a liquid crystal display panel.
  • Another object of the present invention is to provide a method for using a reticle of a liquid crystal display panel.
  • the reticle can be used to cure the sealant between the TFT substrate and the CF substrate, and the ultraviolet light can be prevented from being irradiated into the liquid crystal layer.
  • Polymer monomer Polymer monomer.
  • the invention constructs a reticle for a liquid crystal display panel, the reticle comprises a substrate; a light shielding layer is disposed on the substrate, the light shielding layer is used for shielding ultraviolet light and absorbing from the liquid crystal display The ultraviolet light reflected by a TFT substrate of the panel; and a light transmissive region disposed on the substrate and adjacent to the region of the first light shielding layer to allow the ultraviolet light to penetrate.
  • the light shielding layer is made of black resin or ink
  • the substrate is a transparent substrate.
  • the light shielding layer is divided into a first light shielding area for shielding ultraviolet light, and a second light shielding area for shielding the ultraviolet light and The ultraviolet light reflected from a TFT substrate of the liquid crystal display panel is absorbed.
  • Another object of the present invention is to provide a photomask for a thin film transistor liquid crystal display panel, which can prevent ultraviolet rays from being irradiated onto the display region of the liquid crystal display panel, thereby preventing polymerization of the polymer monomer in advance.
  • the present invention constructs a photomask for a liquid crystal display panel, the photomask includes a substrate; a light shielding layer is disposed on the substrate, and is divided into a first light shielding area and a second a light shielding area, the first light shielding area is for shielding ultraviolet light, and the second light shielding area is for shielding the ultraviolet light and absorbing the ultraviolet light reflected from a TFT substrate of the liquid crystal display panel; The light zone is disposed adjacent to the first light-shielding zone to allow the ultraviolet light to penetrate.
  • the first shielding area is made of a metal material
  • the second shielding area is made of black resin or ink.
  • the second shielding layer overlaps the first shielding layer.
  • the liquid crystal display panel is a polymer stabilized vertical alignment type (Polymer Stabilized) Vertical Alignment, PSVA) thin film transistor liquid crystal display panel.
  • PSVA Polymer Stabilized Vertical Alignment
  • Another object of the present invention is to provide a method for using a reticle of a liquid crystal display panel.
  • the reticle can be used to cure the sealant between the TFT substrate and the CF substrate, and the ultraviolet light can be prevented from being irradiated into the liquid crystal layer.
  • Polymer monomer Polymer monomer.
  • the present invention constructs a reticle using method of a liquid crystal display panel, and the reticle is used for curing the sealant of the liquid crystal display panel, wherein the reticle using method comprises the following steps. Preparing a mask for shielding a display area of the liquid crystal display panel; coating a black material around the first masking area of the mask as a second light shielding area; and displaying the light mask and the liquid crystal display UV light is applied above the panel to cure in a thin film transistor (Thin Film Transistor, TFT) substrate with a color filter (color Filter, CF) a sealant between the substrates; and preventing, by the light absorbing property of the second light-shielding region, the ultraviolet light reflected from the non-display area of the liquid crystal display panel from the second The light shielding area is reflected to a display area of the liquid crystal display panel.
  • TFT Thin Film Transistor
  • CF color filter
  • the material of the second light shielding region is black resin or black ink.
  • the method is for frame glue curing of a PSVA thin film transistor liquid crystal display panel.
  • the method prevents the polymer monomer in the liquid crystal layer of the liquid crystal display panel from being exposed to ultraviolet rays.
  • the reticle of the liquid crystal display panel can shield ultraviolet light and absorb reflection from the TFT substrate of the liquid crystal display panel. Ultraviolet light.
  • FIG. 1 is a schematic view of a prior art PSVA type liquid crystal display panel in which illumination is performed using a photomask;
  • FIG. 2 is a schematic view of a photomask of a conventional liquid crystal display panel
  • FIG. 3 is a schematic structural view of a mask-cured photomask according to a preferred embodiment of the present invention.
  • FIG. 4A is a schematic view showing curing of a sealant of a TFT liquid crystal display panel by using a photomask according to an embodiment of the invention
  • 4B is a schematic diagram of curing of a sealant of a TFT liquid crystal display panel by using a photomask according to another embodiment of the present invention
  • FIG. 5 is a flow chart showing steps of curing a sealant of a TFT liquid crystal display panel by using a photomask according to an embodiment of the invention.
  • FIG. 3 is a schematic structural view of a photomask 30 for curing a sealant according to a preferred embodiment of the present invention.
  • the photomask 30 is made of a substrate 302.
  • the substrate 302 is preferably a transparent substrate 302, and a light shielding layer 303 and a light transmissive region 306 are formed on the transparent substrate 302. It can be divided into a first light blocking area 304 and a second light blocking area 308.
  • the first light-shielding region 304 is formed by sputtering a layer of metal on the transparent substrate 302 and then etching, and the region without the sputtered metal is the light-transmitting region 306.
  • the first opaque area 304 can shield the ultraviolet ray that is irradiated during the reticle processing step, and the light permeable area 306 allows the ultraviolet ray to penetrate the transparent substrate 302 to cure the visor area of the corresponding liquid crystal display panel.
  • the second light shielding region 308 is disposed between the first light shielding region 304 and the light transmission region 306 and surrounds the first light shielding region 304.
  • the second light-shielding region 308 and the first light-shielding region 304 are overlapped, and in different embodiments, the second light-shielding region 308 may partially overlap the first light-shielding region 304, or the second The light shielding area 308 can be closely disposed around the first light shielding area 304, which is not limited herein.
  • the second light-shielding region 308 is made of a black material, and the composition of the black material may be resin or ink. However, any material suitable for coating the periphery of the first light-shielding region 304 may be used as an embodiment of the present invention. Black material.
  • the color of the second light-shielding region 308 is preferably black because the black light-absorbing effect is better, and the second light-shielding region 308 can prevent the ultraviolet light reflected to the second light-shielding region 308 from being reflected again, in addition to shielding the ultraviolet light.
  • the constituent material of the second light-shielding region 308 may also be other colors, as long as the light-absorbing effect is achieved, and the ultraviolet light is prevented from being reflected back to the liquid crystal display panel as the color of the second light-shielding region 308 of the present invention. It is not limited here.
  • the TFT liquid crystal display panel 40 is preferably a polymer stabilized vertical alignment type (Polymer). Stabilized Vertical A thin film transistor liquid crystal display panel of Alignment, PSVA, and the TFT liquid crystal display panel 40 mainly includes a TFT substrate 402, a color filter (CF) 404, and a sealant 406.
  • CF color filter
  • the mask 42 includes a transparent substrate 421, a light shielding layer 422 and a light transmitting region 424, and the light shielding layer 422 can be divided into a first light shielding region 422A and a second light shielding region 426A.
  • the second shielding area 426A of the photomask 42 is located between the first shielding area 422A and the light transmitting area 424, and the second shielding area 426A is disposed around the first shielding area 422A.
  • the first masking region 422A is formed by sputtering a layer of metal on the transparent substrate 421 and then etching, and the second masking region 426A is coated on the first masking region 422A.
  • a black material (such as resin or ink) is formed, and the first shielding area 422A overlaps with the second shielding area 426A.
  • the photomask 42 is correspondingly disposed above the liquid crystal display panel 40, and the ultraviolet light is irradiated from the light transmitting region 424 of the photomask 42 to the sealant 406 region below the TFT substrate 402.
  • the glue 406 is cured by ultraviolet irradiation, and the liquid crystal molecules 408 in the liquid crystal layer of the liquid crystal display panel 40 can be enclosed. As is apparent from FIG.
  • the light-transmitting region 424 of the reticle 42 allows ultraviolet light to penetrate the liquid crystal display panel 40, thereby curing the sealant 406. .
  • the ultraviolet light reaches the liquid crystal display panel 40 through the light transmitting region 424 of the mask 420, a reflection is generated in the liquid crystal display panel 40, and the reflected partial ultraviolet light is projected to the edge of the first shielding region 422A.
  • the edge of the first shielding area 422A is the area provided by the second shielding area 426, and the ultraviolet light projected to the second shielding area 426 is projected to the second shielding area because the light absorption effect of the second shielding area 426 is better.
  • the ultraviolet light of 426 does not continue to be reflected, and the ultraviolet light is prevented from being reflected again to the AA area 4022 of the liquid crystal display panel 40. Since the liquid crystal molecules 408 in the liquid crystal layer of the AA region 4022 are doped with a polymer monomer, once the polymer monomer in the liquid crystal layer is irradiated with ultraviolet rays, the polymer monomer in the irradiated portion will be polymerized in advance. . Because the second shielding area 426A is disposed in the embodiment of the present invention, the polymerization reaction of the polymer monomer in the liquid crystal layer of the AA area 4022 is prevented from occurring in advance, and the problem of uneven light source generation of the liquid crystal display panel is reduced. The AA area 4022 in Fig. 4A is located in the display area of the liquid crystal display panel.
  • the liquid crystal display panel 40 also includes a TFT substrate 402, a CF substrate 404, and a sealant 406.
  • the sealant is cured by ultraviolet irradiation to encapsulate the liquid crystal molecules 408 in the liquid crystal layer of the liquid crystal display panel 40.
  • the photomask 42 includes a substrate 421, a light shielding layer 422, and a light transmitting region 424.
  • the light shielding layer 422 is formed by coating a black resin on the glass substrate, and the region other than the light shielding layer 422 is the light transmitting region 424.
  • the light shielding layer 422 is disposed on the substrate 421 for shielding ultraviolet light and absorbing ultraviolet light reflected from the TFT substrate 402 of the liquid crystal display panel 40. Further, the light shielding layer 422 can be divided into a first light shielding area 422B and a second light shielding area 426B.
  • ultraviolet light when ultraviolet light is irradiated onto the TFT substrate 402, ultraviolet light will be reflected, and ultraviolet light adjacent to the second light-shielding region 426B will be reflected to the second light-shielding region 426B of the mask 42, due to the second The light-shielding region 426B is composed of a black material, and the ultraviolet light reflected to the second light-shielding region 426B is absorbed by the ultraviolet light due to the better light-absorbing effect of the second light-shielding region 426B, so that the ultraviolet light does not continue to be reflected to the AA of the TFT substrate 402. Area 4022.
  • FIG. 5 is a flow chart showing steps of curing a sealant of a TFT liquid crystal display panel by using a photomask according to an embodiment of the invention.
  • the implementation steps of Figure 5 are illustrated in conjunction with the components of Figure 4A.
  • a mask 42 is prepared for shielding the display area of the liquid crystal display panel 40.
  • a black material is applied around the first masking region 422A of the light shielding layer 422 of the mask 42 as the second masking region 426A.
  • the composition of the second masking region 426A is preferably resin or ink, and is black. The color of the material of the second masking region 426A is because the black light absorbing effect is better.
  • step S506 ultraviolet light is irradiated over the photomask 42 and the liquid crystal display panel 40 to cure the sealant 406 between the TFT substrate 402 and the CF substrate 404.
  • step S508 the ultraviolet light is absorbed by the light absorption property of the material of the second masking region 426A, and the ultraviolet light reflected from the liquid crystal display panel 40 is prevented from being reflected from the second masking region 426A to the AA region 4022 of the liquid crystal display panel 40 again.
  • ultraviolet light is prevented from being irradiated to the AA region 4022 of the liquid crystal display panel 40, and the polymerization of the irradiated portion of the polymer monomer in the liquid crystal layer of the liquid crystal display panel of the PSVA-type thin film transistor is prevented.
  • the monomer will undergo polymerization in advance.

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Abstract

一种用于液晶显示面板（40）的光罩（42），所述光罩（42）包含一基板（421）；一遮光层（422），设置于所述基板（421）上，所述遮光层（422）用于遮蔽紫外线光与吸收从所述液晶显示面板（40）的一TFT基板（402）反射的所述紫外线光；以及一透光区（424），设置于所述基板（421）上，且邻近所述遮光层（422）的区域，允许所述紫外线光穿透。

Description

用于液晶显示面板的光罩及其使用方法 技术领域
本发明涉及一种薄膜晶体管液晶显示面板的光罩，特别是涉及一种防止紫外线光照射至液晶显示面板的光罩。
 背景技术
随着液晶显示面板的技术日益进步，不同厂商之间各自发展出不同类型的液晶显示面板，其中有扭曲向列型(Twisted Nematic，TN)、垂直配向技术(Vertical Alignment，VA)、平面转换（In-Plane Switching，IPS）以及聚合物稳定垂直配向型(Polymer Stabilized Vertical Alignment，PSVA)等种类。在PSVA型液晶显示面板的制作过程中，由于液晶层内的液晶分子掺杂有聚合物单体(monomer)，一旦液晶层内的聚合物单体受到紫外线照射，被照射部分的聚合物单体将会提前发生聚合反应。在后续对液晶层配向过程中，提前发生聚合反应的聚合物单体的特性与其它聚合物单体的特性不再相同，在施加相同电压和光照进行配向时，液晶层内将形成不同的预倾角，尤其是液晶层边缘处的被提前照射的聚合物单体，其形成的预倾角较其它聚合物单体形成的预倾角错乱，影响PSVA型液晶显示器显示效果。
图1为传统液晶显示面板的光罩的示意图。在图1中，所述光罩10包括透明基板102，遮光材料在透明基板102上形成遮光区104，而未被遮光材料覆盖的区域则形成透光区106。透光区106对应液晶显示面板的非显示区，而遮光区104则对应液晶显示面板的显示区，因而紫外线仅能够照射液晶显示面板上非显示区对应的区域，框胶受到紫外线照射固化以将液晶显示面板的液晶层内的液晶分子封装在内。
图2为现有技术的PSVA型液晶显示面板制作中利用光罩进行照射的示意图。如图2所示，在将薄膜晶体管(Thin Film Transistor，TFT)基板202和彩色滤光片(color filter，CF)基板204贴合后，需要通过紫外线照射框胶206，以使得所述框胶206固化，进而将TFT基板202和CF基板204粘合在一起。在照射紫外线时，利用光罩208保护AA区2022不受到照射。图2中的AA区2022是位于液晶显示面板的显示区域内。
但是在具体操作过程中，用于遮蔽紫外线的光罩208是在玻璃上溅射一层金属，然后再经过蚀刻做成的，金属的遮旋光性能很好，但缺点是框胶206下面的金属会反射紫外线光，光罩208离TFT基板202有一定距离，因此就会有一部分光反射到光罩208上，而光罩208也是金属做的，也会反射光，这样AA区2022的液晶就会受到光照，导致部份紫外线照射至液晶显示面板的AA区2022。由于聚合物稳定垂直配向型液晶显示器的液晶层内的液晶分子210掺杂有聚合物单体(monomer)，一旦液晶层内的聚合物单体受到紫外线照射，被照射部分的聚合物单体将会提前发生聚合反应，导致后期产生一些光源不均(mura)的问题。
因此，存在一种需求设计新型的紫外线光罩结构以防止紫外线照射导致液晶层内的聚合物单体将会提前发生聚合反应。
 技术问题
本发明的一个目的在于提供一种用于薄膜晶体管液晶显示面板的光罩，此光罩可以遮蔽紫外线光与吸收从液晶显示面板的TFT基板反射的紫外线光。
本发明的又一个目的在于提供一种液晶显示面板的光罩使用方法，透过此光罩使用方法可以固化TFT基板与CF基板之间的框胶，也可以防止紫外线光照射到液晶层内的聚合物单体。
 技术解决方案
本发明构造了一种用于液晶显示面板的光罩，所述光罩包含一基板；一遮光层，设置于所述基板上，所述遮光层用于遮蔽紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光；以及一透光区，设置于所述基板上，且邻近所述第一遮光层的区域，允许所述紫外线光穿透。
在本发明一实施例中，所述遮光层为黑色树脂或墨水所构成，且所述基板为一透明基板。
在本发明一实施例中，所述遮光层区分为第一遮光区与第二遮光区，所述第一遮光区用于遮蔽紫外线光，所述第二遮光区用于遮蔽所述紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光。
本发明的另一个目的在于提供一种用于薄膜晶体管液晶显示面板的光罩，此光罩可以防止紫外线照射到液晶显示面板的显示区，避免聚合物单体将会提前发生聚合反应。
为解决上述技术问题，本发明构造了一种用于液晶显示面板的光罩，所述光罩包含一基板；一遮光层，设置于所述基板上，且区分为第一遮光区与第二遮光区，所述第一遮光区用于遮蔽紫外线光，所述第二遮光区用于遮蔽所述紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光；以及一透光区，设置于邻近所述第一遮光区的区域，允许所述紫外线光穿透。
在本发明一实施例中，所述第一遮蔽区为金属材料所构成，所述第二遮蔽区为黑色树脂或墨水所构成。
在本发明一实施例中，所述第二遮蔽层与所述第一遮蔽层重迭。
在本发明一实施例中，液晶显示面板为聚合物稳定垂直配向型(Polymer Stabilized Vertical Alignment，PSVA)的薄膜晶体管液晶显示面板。
本发明的又一个目的在于提供一种液晶显示面板的光罩使用方法，透过此光罩使用方法可以固化TFT基板与CF基板之间的框胶，也可以防止紫外线光照射到液晶层内的聚合物单体。
为解决上述技术问题，本发明构造了一种液晶显示面板的光罩使用方法，所述光罩用于固化所述液晶显示面板的框胶，其特征在于，所述光罩使用方法包含下列步骤：准备一光罩用于遮蔽所述液晶显示面板的显示区域；在所述光罩的一第一遮蔽区四周涂布黑色材料作为一第二遮光区；在所述光罩与所述液晶显示面板上方照射紫外线光，以固化在一薄膜晶体管(Thin Film Transistor，TFT)基板与一彩色滤光片(color filter，CF)基板之间的一框胶；以及藉由所述第二遮光区的吸光特性，防止从所述液晶显示面板的所述非显示区反射的所述紫外线光再次从所述第二遮光区反射至所述液晶显示面板的一显示区。
在本发明一实施例中，第二遮光区的材料为黑色树脂或黑色墨水。
在本发明一实施例中，所述方法是用于PSVA薄膜晶体管液晶显示面板的框胶固化。
在本发明一实施例中，所述方法可防止所述液晶显示面板的液晶层内的聚合物单体受到紫外线照射。
 有益效果
防止紫外线照射导致液晶层内的聚合物单体将会提前发生聚合反应；改善光源不均(mura)的问题；液晶显示面板的光罩可以遮蔽紫外线光与吸收从液晶显示面板的TFT基板反射的紫外线光。
 附图说明
图1为现有技术的PSVA型液晶显示面板制作中利用光罩进行照射的示意图；
图2为传统液晶显示面板的光罩的示意图；
图3为根据本发明较佳实施例的框胶固化之光罩的结构示意图；以及
图4A为本发明实施例中利用光罩进行TFT液晶显示面板的框胶固化的示意图；
图4B为本发明另一实施例中利用光罩进行TFT液晶显示面板的框胶固化的示意图；以及
图5为本发明实施例中利用光罩进行TFT液晶显示面板的框胶固化的步骤流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
图3为根据本发明较佳实施例的用于框胶固化之光罩30的结构示意图。如图3所示，光罩30为一基板302所制成，基板302在此实施例中较佳为透明基板302，并在透明基板302上面形成遮光层303与透光区306，遮光层303可区分为第一遮光区304与第二遮光区308。第一遮光区304是透过在透明基板302上溅射一层金属，然后再经过蚀刻做成的，而没有溅射金属的区域则为透光区306。第一遮光区304可遮蔽在光罩制程步骤时所照射的紫外线，而透光区306则允许紫外线穿透透明基板302以固化所对应的液晶显示面板的框胶区域。另外，在本发明的实施例中，第二遮光区308设置于第一遮光区304与透光区306之间，且环绕第一遮光区304。在本发明的实施例中，第二遮光区308与第一遮光区304为重迭设置，而在不同实施例中，第二遮光区308可以与第一遮光区304部分重迭，或者第二遮光区308可以紧贴设置于第一遮光区304的周围，在此并不局限。第二遮光区308是由一种黑色材质所制成，此黑色材质的组成成分可为树脂或墨水，然而，任何可适用于涂布第一遮光区304周围的材料都可以作为本发明实施例的黑色材质。而且，第二遮光区308的颜色较佳为黑色是因为黑色的吸光效果较佳，第二遮光区308除了可以遮蔽紫外线光照射外，还可以防止反射至第二遮光区308的紫外线光再次反射至液晶显示面板上。然而，在不同实施例中，第二遮光区308的组成材质也可以为其他颜色，只要达到吸光效果，防止紫外线再反射至液晶显示面板上都可以作为本发明的第二遮光区308物质的颜色，在此并不局限。
图4A为本发明实施例中利用光罩进行薄膜晶体管(TFT)液晶显示面板的框胶固化的示意图。如图4A所示，TFT液晶显示面板40较佳为聚合物稳定垂直配向型(Polymer Stabilized Vertical Alignment，PSVA)的薄膜晶体管液晶显示面板，且TFT液晶显示面板40主要包含TFT基板402、彩色滤光片(CF)404与框胶406。光罩42包含透明基板421、遮光层422与透光区424，且遮光层422可区分为第一遮光区422A与第二遮光区426A。光罩42的第二遮蔽区426A位于第一遮蔽区422A与透光区424之间，且第二遮蔽区426A围绕第一遮蔽区422A设置。在此实施例中，第一遮蔽区422A透过在透明基板421上溅射一层金属，然后再经过蚀刻做成的，第二遮蔽区426A则是透过在第一遮蔽区422A上涂布黑色材质(如树脂或墨水等)而形成，且第一遮蔽区422A与第二遮蔽区426A重迭。当液晶显示面板40进行紫外线照射之前，先将光罩42对应设置于液晶显示面板40的上方，让紫外线光从光罩42的透光区424照射至TFT基板402下方的框胶406区域，框胶406受到紫外线照射固化，可将液晶显示面板40的液晶层内的液晶分子408封装在内。由图4A可以明显看出，当紫外线光投射至光罩42与液晶显示面板40的上方，光罩42的透光区424可以让紫外线光穿透到达液晶显示面板40，进而将框胶406固化。而当紫外线光通过光罩420的透光区424到达液晶显示面板40的上方，会在液晶显示面板40产生反射，反射的部分紫外线光投射至第一遮蔽区422A的边缘。第一遮蔽区422A的边缘即为第二遮蔽区426所设置的区域，投射至第二遮蔽区426的紫外线光则因为第二遮蔽区426的吸光效果较佳，可以让投射至第二遮蔽区426的紫外线光不会继续反射，防止紫外线光再次反射到液晶显示面板40的AA区4022。因为AA区4022的液晶层内的液晶分子408掺杂有聚合物单体(monomer)，一旦液晶层内的聚合物单体受到紫外线照射，被照射部分的聚合物单体将会提前发生聚合反应。因为本发明的实施例中设置第二遮蔽区426A，防止AA区4022的液晶层内的聚合物单体提前发生聚合反应，降低液晶显示面板产生光源不均问题的可能。图4A中的AA区4022是位于液晶显示面板的显示区域内。
图4B为本发明另一实施例中利用光罩进行TFT液晶显示面板的框胶固化的示意图。如图4B所示，在此实施例中，液晶显示面板40同样包含TFT基板402、CF基板404与框胶406。框胶受到紫外线照射固化，将液晶显示面板40的液晶层内的液晶分子408封装在内。光罩42包含基板421、遮光层422与透光区424。在本实施例中，遮光层422是藉由在玻璃基板上涂布一层黑色树脂而成，而遮光层422以外的区域则为透光区424。遮光层422设置于基板421上，用于遮蔽紫外线光与吸收从液晶显示面板40的TFT基板402反射的紫外线光。进一步来说，遮光层422上可分为第一遮光区422B与第二遮光区426B。在本实施例中，当紫外线光照射到TFT基板402上，紫外线光会产生反射，而在邻近于第二遮光区426B的紫外线光会反射至光罩42的第二遮光区426B，由于第二遮光区426B为黑色材质所组成，反射至第二遮光区426B的紫外线光会因为第二遮光区426B的吸光效果较佳，将紫外线光吸收，让紫外线光不会继续反射到TFT基板402的AA区4022。
图5为本发明实施例中利用光罩进行TFT液晶显示面板的框胶固化的步骤流程图。图5的实施步骤是配合图4A的组件作说明。如图5所示，在步骤S502中，准备一光罩42用于遮蔽液晶显示面板40的显示区域。在步骤S504中，在光罩42的遮光层422的第一遮蔽区422A四周涂布黑色材料作为第二遮蔽区426A，第二遮蔽区426A的组成成分较佳为树脂或墨水，而以黑色作为第二遮蔽区426A材料的颜色是因为黑色的吸光效果较佳。接着，在步骤S506中，在光罩42与液晶显示面板40上方照射紫外线光，固化在TFT基板402与CF基板404之间的框胶406。在步骤S508中，藉由第二遮蔽区426A材质的吸光特性，吸收紫外线光，防止从液晶显示面板40反射的紫外线光再次从第二遮蔽区426A反射至液晶显示面板40的AA区4022。因此，藉由上述的步骤方法，防止紫外线光照射至液晶显示面板40的AA区4022，避免了PSVA型薄膜晶体管液晶显示面板的液晶层内的聚合物单体受到紫外线照射，被照射部分的聚合物单体将会提前发生聚合反应。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
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Claims (11)

  1. 一种用于液晶显示面板的光罩，其特征在于，所述光罩包含：
    一基板；
    一遮光层，设置于所述基板上，所述遮光层用于遮蔽紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光；以及
    一透光区，设置于所述基板上，且邻近所述遮光层的区域，允许所述紫外线光穿透。
  2. 根据权利要求1所述的光罩，其特征在于，所述遮光层为黑色树脂或墨水所构成，且所述基板为一透明基板。
  3. 根据权利要求1所述的光罩，其特征在于，所述遮光层区分为第一遮光区与第二遮光区，所述第一遮光区用于遮蔽紫外线光，所述第二遮光区用于遮蔽所述紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光。
  4. 一种用于液晶显示面板的光罩，其特征在于，所述光罩包含：
    一基板；
    一遮光层，设置于所述基板上，且区分为第一遮光区与第二遮光区，所述第一遮光区用于遮蔽紫外线光，所述第二遮光区用于遮蔽所述紫外线光与吸收从所述液晶显示面板的一TFT基板反射的所述紫外线光；以及
    一透光区，设置于邻近所述第一遮光区的区域，允许所述紫外线光穿透。
  5. 根据权利要求4所述的光罩，其特征在于，所述第一遮蔽区为金属材料所构成，所述第二遮蔽区为黑色树脂或墨水所构成。
  6. 根据权利要求5所述的光罩，其特征在于，所述第二遮蔽层与所述第一遮蔽层重迭。
  7. 根据权利要求4所述的光罩，其特征在于，所述液晶显示面板为聚合物稳定垂直配向型(Polymer Stabilized Vertical Alignment，PSVA)的薄膜晶体管液晶显示面板。
  8. 一种用于液晶显示面板的光罩使用方法，所述光罩用于固化所述液晶显示面板的框胶，其特征在于，所述光罩使用方法包含下列步骤：
    准备一光罩用于遮蔽所述液晶显示面板的显示区域；
    在所述光罩的遮光层的一第一遮光区四周涂布黑色材料作为一第二遮光区；
    在所述光罩与所述液晶显示面板上方照射紫外线光，以固化在一薄膜晶体管(Thin Film Transistor，TFT)基板与一彩色滤光片(color filter，CF)基板之间的一框胶；以及
    藉由所述第二遮光区的吸光特性，吸收紫外线光，防止从所述液晶显示面板的所述非显示区反射的所述紫外线光再次从所述第二遮光区反射至所述液晶显示面板的一显示区。
  9. 根据权利要求8所述的光罩使用方法，其特征在于，所述第二遮光区的材料为黑色树脂或黑色墨水。
  10. 根据权利要求8所述的光罩使用方法，其特征在于，所述方法是用于PSVA薄膜晶体管液晶显示面板的框胶固化。
  11. 根据权利要求10所述的光罩使用方法，其特征在于，所述方法用于防止所述液晶显示面板的液晶层内的聚合物单体受到紫外线照射。
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