WO2014141507A1 - 静電容量型センサ、音響センサ及びマイクロフォン - Google Patents
静電容量型センサ、音響センサ及びマイクロフォン Download PDFInfo
- Publication number
- WO2014141507A1 WO2014141507A1 PCT/JP2013/074209 JP2013074209W WO2014141507A1 WO 2014141507 A1 WO2014141507 A1 WO 2014141507A1 JP 2013074209 W JP2013074209 W JP 2013074209W WO 2014141507 A1 WO2014141507 A1 WO 2014141507A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode plate
- diaphragm
- anchor
- slit
- sensor according
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/16—Mounting or tensioning of diaphragms or cones
- H04R7/18—Mounting or tensioning of diaphragms or cones at the periphery
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0006—Interconnects
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/04—Microphones
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0257—Microphones or microspeakers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0307—Anchors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/07—Interconnects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15151—Shape the die mounting substrate comprising an aperture, e.g. for underfilling, outgassing, window type wire connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2410/00—Microphones
- H04R2410/03—Reduction of intrinsic noise in microphones
Definitions
- the present invention relates to a capacitive sensor, an acoustic sensor, and a microphone. More specifically, the present invention relates to a capacitive sensor configured by a capacitor structure including a vibrating electrode plate (diaphragm) and a fixed electrode plate. The present invention also relates to an acoustic sensor (acoustic transducer) that converts an acoustic vibration into an electrical signal and outputs the electrical signal, and a microphone using the acoustic sensor.
- acoustic sensor acoustic transducer
- FIG. 1 is a plan view showing the shape of a diaphragm used in a conventional acoustic sensor.
- the acoustic sensor of FIG. 1 does not have a leg piece for supporting the diaphragm 12, and supports the lower surface of the corner portion of the diaphragm 12 by the anchor 14 on the upper surface of the substrate 11.
- the lower surface of the outer peripheral portion of the diaphragm is fixed to the upper surface of the substrate over the entire periphery, and a plurality of small holes are opened in the diaphragm along the inner side of the fixed portion.
- the displacement amount of the diaphragm when subjected to acoustic vibration is small, and it is difficult to produce a highly sensitive acoustic sensor.
- an acoustic sensor in which a leg piece (beam) is extended outward from the diaphragm and the end of the leg piece is supported by an anchor. ing.
- Examples of such an acoustic sensor include those described in Patent Document 2 and those described in Patent Document 3.
- FIG. 2 (A) is a schematic plan view of an acoustic sensor in which a leg piece provided on a diaphragm is supported by an anchor. However, in FIG. 2A, the diaphragm is exposed except for the back plate and the fixed electrode plate.
- a rectangular diaphragm 12 is disposed on the upper surface of the substrate 11 so as to cover a chamber (not shown) opened in the substrate 11.
- Leg pieces 13 extend diagonally outward from the corners of the diaphragm 12.
- Four anchors 14 are provided on the upper surface of the substrate 11 at the edge of the chamber, and the lower surfaces of the distal ends of the leg pieces 13 are supported by the anchors 14, respectively. Therefore, the diaphragm 12 is supported on the upper surface of the substrate 11 by a leg piece 13 having a small rigidity, and has a structure that is largely displaced up and down by acoustic vibration.
- the diaphragm 12 may be extended to a region between the leg pieces 13 as shown in FIG. It is done.
- the portion 12a extending between the leg piece 13 and the leg piece 13 is the portion supported by the leg piece 13 (originally the diaphragm 12 in FIG. 2A).
- the extended portion 12a is easily affected by the warp inherent to the diaphragm 12, and is likely to warp upward or downward.
- the warped portion 12a may collide with the substrate 11 or the back plate.
- the length of the leg piece 13 may be shortened. However, if the length of the leg piece 13 is shortened, the rigidity of the leg piece 13 is increased, so that the displacement amount of the diaphragm 12 is reduced and the sensitivity of the acoustic sensor is lowered.
- An object of the present invention is to provide a capacitive sensor such as an acoustic sensor that can improve sensitivity while reducing the sensor size.
- the capacitance sensor includes a substrate having a cavity opened at least on the upper surface, a vibrating electrode plate formed above the substrate so as to cover the upper surface of the cavity, and an outer periphery of the vibrating electrode plate A plurality of anchors that are arranged at intervals in the portion and that enable the vibration electrode plate to be fixed to a stationary member; and a fixed electrode plate that is disposed so as to face the vibration electrode plate.
- the outer edge of the vibrating electrode plate located between adjacent anchors is outside the tangent line circumscribing the edge of the adjacent anchor on the side far from the center of the vibrating electrode plate over the entire length.
- 1 or 2 is characterized in that one or more openings are provided in a region near the anchor of the vibrating electrode plate.
- the opening is surrounded by a dialam like a through hole or slit penetrating vertically, and does not include a notch.
- the entire length of the outer edge of the vibrating electrode plate located between adjacent anchors is tangent to the edge of the adjacent anchor on the side far from the center of the vibrating electrode plate.
- the outer edge of the vibrating electrode plate positioned between the adjacent anchors is positioned inside the tangent line circumscribing the edge of the adjacent anchor on the side far from the center of the vibrating electrode plate.
- the outer edge of the vibrating electrode plate does not intersect the tangent line.
- a closed opening such as a through hole or a slit provided inside the vibrating electrode plate may be in contact with or intersect with the tangent line.
- the position close to the anchor may be a position that is, for example, a position that is approximately the same as or twice the size of the anchor from the position of the anchor.
- the vibrating electrode plate can be expanded to the region between the anchors without loosening the edge of the vibrating electrode plate, the area of the vibrating electrode plate can be increased, The sensitivity of the sensor can be improved.
- the vibration electrode plate has an opening in the vicinity of the anchor, the rigidity of the support portion by the anchor of the vibration electrode plate can be reduced, the displacement amount of the vibration electrode plate can be increased, and the sensitivity of the sensor can be improved.
- the leg pieces for supporting the vibrating electrode plate do not protrude outward as in the conventional sensor, the size of the sensor can be reduced. Therefore, according to the capacitive sensor of the present invention, it is possible to produce a capacitive sensor with high sensitivity and small size.
- a portion of the outer peripheral edge of the opening that has the largest vertical distance from a line segment connecting the anchor near the opening and the center of the vibrating electrode plate is curved. It is characterized by that. Stress tends to concentrate at a portion where the vertical distance from the line connecting the anchor and the center of the vibrating electrode plate is the largest, but if this portion is curved, the stress concentration can be relaxed.
- Another embodiment of the capacitive sensor according to the present invention is characterized in that the opening is an open annular slit. According to this embodiment, since the region surrounded by the slit is blocked by a part of the diaphragm, it is possible to prevent the sensitivity of the low frequency sound from being lowered.
- Still another embodiment of the capacitive sensor according to the present invention is characterized in that the slit is interrupted at a central portion side of the vibrating electrode plate. According to such an embodiment, since the region surrounded by the slit is displaced together with the central portion of the vibrating electrode plate, it contributes to a change in capacitance and can improve the sensitivity of the sensor.
- the interval between the ends of the slit in the slit portion is larger than the maximum vertical distance from the line segment connecting the anchor near the slit and the center of the vibrating electrode plate to the outer periphery of the slit. Small is preferable.
- Still another embodiment of the capacitive sensor according to the present invention is characterized in that an end portion of the slit is curved toward an inner side of a region surrounded by the slit. According to this embodiment, the stress concentration at the tip portion of the slit 42 can be relaxed, and the strength of the vibrating electrode plate can be increased.
- Still another embodiment of the capacitive sensor according to the present invention is such that the opening is symmetrical with respect to a line segment connecting the anchor and the center of the vibrating electrode plate when viewed from a direction perpendicular to the upper surface of the substrate. It is characterized by having. According to such an embodiment, it is possible to prevent the occurrence of uneven stress on both sides of the opening.
- a plurality of the openings provided in a region close to a certain anchor may be arranged around the anchor.
- the opening of the vibrating electrode plate is provided at a position that does not overlap the cavity when viewed from a direction perpendicular to the upper surface of the substrate. It is a feature. According to this embodiment, it is possible to prevent the acoustic resistance between the vibrating electrode plate and the upper surface of the substrate from becoming too small, and the sensitivity from being lowered due to the low sound.
- the stationary member may be the substrate, and the vibration electrode plate may be fixed above the substrate via an anchor.
- the vibrating electrode plate may be fixed on the substrate via an anchor, or may be fixed on an insulating film or a protective film provided on the upper surface of the substrate.
- the stationary member is the back plate, and the vibration electrode plate is connected to the back plate via an anchor. It may be possible to fix to the lower surface of the.
- the stationary member may be the fixed electrode plate, and the vibration electrode plate may be fixed to the fixed electrode plate via an anchor.
- the vibrating electrode plate and the substrate may be electrically connected by a conductive portion penetrating the inside of the anchor. According to this embodiment, since it is not necessary to extend the extraction wiring from the vibrating electrode plate and route the wiring, the sensor size can be reduced.
- the acoustic sensor according to the present invention uses the capacitive sensor according to the present invention, and the back plate and the fixed electrode plate are formed with a plurality of acoustic holes for allowing acoustic vibrations to pass therethrough. According to the acoustic sensor of the present invention, it is possible to produce an acoustic sensor having high sensitivity to sound and a small sensor size.
- An embodiment of the acoustic sensor according to the present invention is characterized in that the acoustic hole located above the opening has a smaller opening area than the acoustic hole located in a central portion of the back plate. According to this embodiment, it is difficult for air to escape from the opening through the acoustic hole, and it is possible to prevent a decrease in sensitivity in the low sound range.
- the microphone according to the present invention includes the acoustic sensor according to the present invention and a circuit unit that amplifies a signal from the acoustic sensor and outputs the amplified signal to the outside. According to such a microphone, the sensitivity can be increased and the size can be reduced.
- the means for solving the above-described problems in the present invention has a feature in which the above-described constituent elements are appropriately combined, and the present invention enables many variations by combining such constituent elements. .
- FIG. 1 is a plan view of an acoustic sensor having no conventional leg piece in a state in which a back plate and a fixed electrode plate are removed.
- FIG. 2A is a plan view of a conventional acoustic sensor having leg pieces, excluding the back plate and the fixed electrode plate.
- FIG. 2B is a diagram illustrating a useless area in the acoustic sensor of FIG.
- FIG. 3 is a plan view showing a comparative example in which the area is expanded based on the diaphragm of FIG.
- FIG. 4A is a plan view showing the acoustic sensor according to the first embodiment of the present invention.
- FIG. 4A is a plan view showing the acoustic sensor according to the first embodiment of the present invention.
- FIG. 4B is a plan view showing a state in which the diaphragm is exposed by removing the back plate and the fixed electrode plate from the acoustic sensor shown in FIG.
- FIG. 5A is an enlarged cross-sectional view of the acoustic sensor shown in FIG.
- FIG. 5B is an enlarged view showing a cross section of the X portion in FIG.
- FIG. 6A is an enlarged view of the diaphragm of the first embodiment.
- FIG. 6B is an enlarged view showing a corner portion of the diaphragm.
- FIG. 7 is an enlarged view showing a corner portion of the diaphragm according to the first embodiment of the present invention.
- FIG. 8A is a plan view showing an acoustic sensor according to Embodiment 2 of the present invention.
- FIG. 8B is a plan view showing a state in which the diaphragm is exposed by removing the back plate and the fixed electrode plate from the acoustic sensor shown in FIG.
- FIG. 9 is a cross-sectional view of the acoustic sensor according to the second embodiment.
- FIG. 10 is an enlarged view of the diaphragm according to the second embodiment.
- FIG. 11A is an enlarged plan view illustrating a corner portion of the diaphragm according to the second embodiment.
- FIG. 11B is an enlarged view showing a corner portion of the diaphragm of the comparative example.
- FIG. 12 is a plan view showing a modification of the second embodiment of the present invention.
- FIG. 13A is a plan view of a diaphragm according to the third embodiment of the present invention.
- FIG. 13B is an enlarged view showing a corner portion of the diaphragm shown in FIG.
- FIG. 14 is a schematic cross-sectional view showing the structure of an acoustic hole in the acoustic sensor of the third embodiment.
- FIG. 15 is a plan view of a diaphragm in a modification of the third embodiment.
- FIG. 16A is a plan view of a diaphragm in still another modified example of the third embodiment.
- FIG. 16B is a plan view of a diaphragm in still another modified example of the third embodiment.
- FIG. 16A is a plan view of a diaphragm in still another modified example of the third embodiment.
- FIG. 17 is a cross-sectional view of an acoustic sensor according to Embodiment 4 of the present invention.
- FIG. 18 is a plan view of a diaphragm according to the fifth embodiment of the present invention.
- FIG. 19 is a cross-sectional view showing an acoustic sensor according to Embodiment 6 of the present invention.
- FIG. 20 is a cross-sectional view showing an acoustic sensor according to Embodiment 7 of the present invention.
- FIG. 21 is a schematic cross-sectional view of a microphone with a built-in acoustic sensor according to the present invention.
- FIG. 4A is a plan view of the acoustic sensor 21 according to the first embodiment of the present invention.
- FIG. 4B is a plan view showing a state in which the diaphragm 24 is exposed by removing the back plate 28 and the fixed electrode plate 29 from the acoustic sensor 21 of FIG.
- FIG. 5A is a cross-sectional view of the acoustic sensor 21.
- FIG. 5B is an enlarged cross-sectional view of a portion X in FIG. 6A is an enlarged view of the diaphragm according to the first embodiment, and
- FIG. 6B is an enlarged view of a corner portion of the diaphragm.
- the acoustic sensor 21 is a capacitive element manufactured using MEMS technology. As shown in FIG. 5A, the acoustic sensor 21 is provided with a diaphragm 24 on an upper surface of a silicon substrate 22 (substrate) via an anchor 27, and a fixed electrode plate 29 above the diaphragm 24 so as to face the diaphragm 24. Is provided.
- a chamber 23 (cavity) penetrating from the upper surface to the lower surface is opened in the silicon substrate 22.
- the diaphragm 24 is disposed on the upper surface of the silicon substrate 22 so as to cover the upper surface opening of the chamber 23.
- the diaphragm 24 is formed in a substantially rectangular shape by a conductive polysilicon thin film, and the diaphragm 24 itself is a vibrating electrode plate.
- each anchor 27 is located in a substantially diagonal direction of the diaphragm 24.
- the diaphragm 24 is supported by an anchor 27 made of an insulating material on the lower surface of each corner portion at a location close to the outer periphery.
- the diaphragm 24 is disposed so as to cover the upper surface opening of the chamber 23 and floats from the upper surface opening of the chamber 23 and the upper surface of the silicon substrate 22.
- the diaphragm 24 is formed with a plurality of relatively small through holes 25 in the vicinity of the portion supported by the anchor 27 and on the center side of the portion supported by the anchor 27. If the through hole 25 overlaps with the chamber 23, the acoustic resistance (bent hole resistance) between the diaphragm 24 and the upper surface of the substrate becomes too small, and the sensitivity is lowered with low sound (roll-off). Provide in a position that will not be The through hole 25 penetrates the diaphragm 24 vertically.
- the plurality of through holes 25 are arranged in a direction orthogonal to a line segment K connecting the center of the anchor 27 and the center of the diaphragm 24 as shown in FIG. They may be arranged on a straight line orthogonal to the line segment K, or may be arranged on a curved curve.
- the plurality of through holes 25 are desirably arranged symmetrically with respect to the line segment K.
- At least one of the anchors 27 has a through hole 27a as shown in FIG. 5B, and a part of the diaphragm 24 becomes a through hole part 32 (conductive part) and is embedded in the through hole 27a.
- the diaphragm 24 is electrically connected to the silicon substrate 22 through the through-hole structure.
- an electrode pad 34 is provided on the upper surface of the silicon substrate 22, and the diaphragm 24 is electrically connected to the electrode pad 34 through the silicon substrate 22. According to such a structure, it is not necessary to route the lead wiring from the diaphragm 24, which contributes to downsizing of the acoustic sensor 21.
- a fixed electrode plate 29 made of polysilicon is provided on the lower surface of the back plate 28 made of SiN.
- the back plate 28 is formed in a dome shape and has a hollow portion below it, and covers the diaphragm 24 with the hollow portion.
- a minute air gap 30 (air gap) is formed between the lower surface of the fixed electrode plate 29 and the upper surface of the diaphragm 24.
- a bulging portion 28 a extends from a part of the back plate 28 toward the outer periphery of the upper surface of the silicon substrate 22. From the fixed electrode plate 29, a lead-out wiring 33 is led out along the lower surface of the bulging portion 28a. An electrode pad 35 provided on the upper surface of the bulging portion 28 a is connected to the leading end of the lead wiring 33. Therefore, the fixed electrode plate 29 is electrically connected to the electrode pad 35.
- the back plate 28 and the fixed electrode plate 29 are provided with a number of acoustic holes 31 (acoustic holes) through which acoustic vibrations pass so as to penetrate from the upper surface to the lower surface.
- acoustic holes 31 are regularly arranged.
- the acoustic holes 31 are arranged in a triangular shape along three directions forming an angle of 60 ° with each other.
- the acoustic holes 31 may be arranged in a rectangular shape or a concentric shape.
- the fixed electrode plate 29 and the diaphragm 24 constitute a capacitor structure with the air gap 30 interposed therebetween.
- the capacitance between the fixed electrode plate 29 and the diaphragm 24 changes, and the acoustic vibration is converted into an electric signal through the change in capacitance.
- the outer edge of the diaphragm 24 located between the adjacent anchors 27 extends over the entire length of the diaphragm 24. It is located outside the tangent line G circumscribing the edge of the adjacent anchor 27 on the side far from the center. In other words, the outer edge of the diaphragm 24 is not inside the tangent line G and does not intersect the tangent line G. However, closed openings such as the through hole 25 and the slit 42 may be in contact with the tangent line G or may intersect the tangent line G.
- the diaphragm 24 has a structure having no leg pieces. Therefore, when a diaphragm is provided on the upper surface of the substrate having the same width, the area of the diaphragm 24 can be made wider than the diaphragm 12 having the leg pieces 13 as shown in FIG. 2A, and the sensitivity of the acoustic sensor 21 is improved. Can be made. Or when the area of a diaphragm is the same, since the leg piece 13 has come out outward in the diaphragm 12 as shown to FIG. 2 (A), although a board
- the leg equivalent portion 26 in the vicinity of the portion fixed by the anchor 27 is greatly deformed.
- the rigidity of the leg piece-corresponding portion 26 in the vicinity of the anchor 27 can be reduced. That is, since a plurality of through holes 25 are provided in this portion 26, the substantial width of the leg piece-corresponding portion 26 is the sum of the widths d1, d2, and d3 shown in FIG. This is the same as providing a thin leg piece at the corner. As a result, the rigidity of the leg piece equivalent portion 26 is lowered. As a result, the diaphragm 24 is likely to vibrate and the displacement amount of the diaphragm 24 is increased, so that the sensitivity of the acoustic sensor 21 is further improved.
- the outer edge of the diaphragm 24 between the anchors 27 is outside the tangent line G that circumscribes the edge of the anchor 27 over the entire length, and therefore, between the anchor 27 and the anchor 27 in the diaphragm 24.
- This region is not cantilevered like the extending portion 12a of the diaphragm 12 in FIG. 3, and is supported by the anchor 27 to the outer edge. Therefore, the region between the anchor 27 and the anchor 27 in the diaphragm 24 is tensioned by the tension from the anchor 27 (the tension in the direction indicated by the arrow in FIG. 6A), and warpage and distortion are unlikely to occur.
- the width d1 + d2 + d3 of the leg piece equivalent portion 26 is set while suppressing the decrease in the diaphragm area due to the through holes 25. Can be made small efficiently.
- the diaphragm installation space on the upper surface of the substrate can be effectively used to widen the diaphragm area, and the sensitivity can be improved while reducing the sensor size.
- the number of through holes 25 may be one as shown in FIG.
- the through-hole 25 is long in a direction orthogonal to a line segment K connecting the center of the anchor 27 and the center of the diaphragm 24. If the through-hole 5 is long in the direction perpendicular to the line segment K, the width of the leg piece-corresponding portion 26 can be made narrower than that of a circular through-hole having the same opening area, and the diaphragm 24 vibrates. The amount of displacement can be increased.
- the through hole 25 has a symmetric shape with respect to the line segment K in order to prevent stress from being unevenly generated in the leg piece equivalent portions 26 on both sides of the through hole 25.
- the edge of the through hole 25 has a bent corner at this portion. It is desirable to alleviate the stress concentration by curving the rounded portion of the edge of the through hole 25 that has the largest vertical distance from the line segment K.
- FIG. 8A is a plan view showing an acoustic sensor 41 according to Embodiment 2 of the present invention.
- FIG. 8B is a plan view showing a state in which the diaphragm 24 is exposed by removing the back plate 28 and the fixed electrode plate 29 from the acoustic sensor 41 of FIG.
- FIG. 9 is a cross-sectional view of the acoustic sensor 41 of the second embodiment.
- FIG. 10 is an enlarged view showing the diaphragm 24 of the acoustic sensor 41.
- FIG. 11A is an enlarged view showing a corner portion of the diaphragm.
- FIG. 11B shows a through hole 25 having the same size as the slit of FIG.
- a slit 42 is provided instead of the through hole 25 of the first embodiment.
- the same components as those in the first embodiment are denoted by the same reference numerals in the drawings, and the description thereof is omitted (the same applies to the third and subsequent embodiments).
- the slit 24 is provided in the diaphragm 24.
- the slit 42 has an open ring shape, that is, a substantially C shape, and penetrates the diaphragm 24 vertically.
- the slit 42 is interrupted at the edge on the center side of the diaphragm 24, and a portion 36 surrounded by the slit 42 is continuous with a region outside the slit 42 at the center side end of the diaphragm 24.
- the outer edge of the diaphragm 24 located between the adjacent anchors 27 extends from the center of the diaphragm 24 over the entire length when viewed from the direction perpendicular to the upper surface of the silicon substrate 22. It is located outside the tangent line G that circumscribes the edge of the adjacent anchor 27 on the far side.
- the diaphragm 24 has a structure having no leg pieces. Therefore, when the diaphragm is provided on the upper surface of the substrate having the same width, the area of the diaphragm 24 can be increased compared with the diaphragm 12 having the leg pieces 13 as shown in FIG.
- the substantial width of the leg piece-corresponding portion 26 that supports the diaphragm 24 is the sum of the widths d1 and d2 on both sides of the slit 42 shown in FIG. 11A, and a thin leg piece is provided at the corner of the diaphragm 24. It will be the same as As a result, the rigidity of the leg piece equivalent portion 26 is lowered. As a result, the diaphragm 24 is likely to vibrate and the displacement amount of the diaphragm 24 is increased, so that the sensitivity of the acoustic sensor 21 is further improved.
- the outer edge of the diaphragm 24 between the anchors 27 is outside the tangent line G that circumscribes the edge of the anchor 27 over the entire length, and therefore, between the anchor 27 and the anchor 27 in the diaphragm 24.
- This region is not cantilevered like the extending portion 12a of the diaphragm 12 in FIG. 3, and is supported by the anchor 27 to the outer edge. Therefore, the region between the anchor 27 and the anchor 27 in the diaphragm 24 is tensioned by the tension from the anchor 27 (the tension in the direction indicated by the arrow in FIG. 6A), and warpage and distortion are unlikely to occur.
- the slit 42 not only a portion extending in a direction orthogonal to the line segment K but also a portion extending substantially parallel to the line segment K is important.
- the slit of the present embodiment has both a curved portion extending in a direction orthogonal to the line segment K and a curved portion extending substantially parallel to the line segment K, so that the rigidity of the leg piece equivalent portion 26 is reduced.
- the deformation of the leg equivalent portion 26 can be increased and the sensitivity of the acoustic sensor 41 can be improved. Therefore, as a modified example of the second embodiment, as shown in FIG. 12, a substantially U-shaped slit in which the tips are separated may be used.
- the portion where the vertical distance from the line segment K connecting the center of the anchor 27 and the center of the diaphragm 24 is the largest is that stress tends to concentrate when the diaphragm 24 is deformed. It is preferable to make it roundish. Therefore, in the acoustic sensor 41 of the second embodiment, as shown in FIG. 11A, the slit 42 is formed in a substantially C shape by approaching the tip of the slit 42, and the vertical distance from the line segment K is the longest. Is curved.
- the open portion of the slit 42 is located on the center side of the diaphragm 24 as shown in FIG.
- the open portion of the slit 42 is directed to the outer peripheral side of the diaphragm 24, even if the diaphragm 24 is vibrated and displaced, the portion 36 surrounded by the slit 42 is not displaced and does not contribute to the sensitivity of the acoustic sensor 41.
- the open portion of the slit 42 is directed toward the center side of the diaphragm 24, when the diaphragm 24 is vibrated and displaced, the portion 36 surrounded by the slit 42 is also displaced and the capacitance changes. Contribute to.
- the sensitivity of the acoustic sensor 41 can be improved by directing the open portion of the slit 42 toward the center side of the diaphragm 24.
- the slit 42 can be positioned far from the chamber 23 to prevent the sensitivity from being lowered at low frequencies, the slit 42 is directed toward the center of the diaphragm 24 rather than toward the outside of the diaphragm 24. In addition, it is possible to prevent a decrease in sensitivity at low frequencies.
- the diaphragm installation space on the upper surface of the substrate can be effectively utilized to increase the diaphragm area, and the sensitivity can be improved while reducing the sensor size.
- the end of the slit 42 may be cracked by the vibration of the diaphragm 24. Therefore, it is preferable that the end of the slit 42 is rounded in an arc shape or is terminated with a circular hole.
- the through-hole 25 has a symmetric shape with respect to the line segment K in order to prevent stress from being unevenly generated at the leg piece equivalent portions 26 on both sides of the through-hole 25.
- the slit 42 is interrupted at one place. If the slits 42 are interrupted at two locations, the outer peripheral side portion of the slit 42 and the inner portion of the slit 42 are connected via the portion 36 surrounded by the slit 42, and the leg piece equivalent portion 26 has high rigidity. Because it becomes.
- FIG. 13A is a plan view for explaining the acoustic sensor according to the third embodiment of the present invention, and shows a state in which the diaphragm 24 is exposed except for the back plate and the fixed electrode plate.
- FIG. 13B is an enlarged view showing a corner portion of the diaphragm 24.
- slits 42 are provided near the anchors 27 in each corner portion of the diaphragm 24.
- the tip portion of the slit 42 is bent inward and curled. Since the stress concentration tends to occur at the tip portion of the slit 42 when the diaphragm 24 is displaced, the strength of the diaphragm 24 can be increased by curling this portion and winding it inward.
- FIG. 14 is a schematic cross-sectional view showing the structure of the acoustic hole 31 in all acoustic sensors of Embodiment 1-3.
- the diameter (opening area) of the acoustic hole 31a located above the slit 42 (the same applies to the case of the through hole 25) is made small so that air does not pass through as much as possible.
- the acoustic hole 31b not positioned above the slit 42 has a relatively large diameter (opening area) so that air can easily escape to avoid damping of the diaphragm 24.
- the acoustic hole 31 a located above the slit 42 (through hole 25) is smaller than the other acoustic holes 31 b, particularly the acoustic hole 31 b located at the center of the back plate 28.
- the acoustic hole 31 a positioned above the slit 42 is reduced, Sensitivity drop in the low frequency range is prevented.
- FIG. 15 is a plan view showing a back plate in a modification of the third embodiment of the present invention.
- two slits 42 having the shape described in the third embodiment are formed in the vicinity of the anchor 27.
- the chamber 23 may be expanded so that the chamber 23 protrudes into a region between the slits 42 and the anchors 27 in the adjacent corner portions. If the chamber 23 is expanded in this way, the vent hole resistance is reduced.
- three or more slits 42 may be provided in the vicinity of the anchor 27.
- the chamber 23 is not limited to a rectangular shape, and may be a disc shape as shown in FIG. 16A or a polygonal shape as shown in FIG.
- FIG. 17 is a cross-sectional view of an acoustic sensor 51 according to Embodiment 4 of the present invention.
- the anchor 27 is provided on the lower surface of the back plate 28, the upper surface of the diaphragm 24 is fixed to the lower surface of the anchor 27, and the diaphragm 24 is suspended below the back plate 28.
- the anchor 27 is provided on the upper surface of the silicon substrate 22, the chamber 23 cannot be formed at the position of the anchor 27, and the size and shape of the chamber 23 are restricted by the anchor 27.
- the position, size, and shape of the chamber 23 can be determined without being restricted by the position of the anchor 27. In particular, since the chamber 23 can be formed directly under the anchor 27, the degree of freedom in designing near the vent hole is increased.
- FIG. 18 is a plan view showing Embodiment 5 of the present invention.
- two diaphragms 24 a and 24 b are formed on the chamber 23 formed on the silicon substrate 22.
- the diaphragms 24 a and 24 b are supported by anchors 27 on the lower surfaces of the corners, and slits 42 (or through holes 25) are opened in the diaphragms 24 a and 24 b in the vicinity of the anchors 27.
- one fixed electrode plate 29 faces the diaphragms 24a and 24b (or separate fixed electrode plates 29 may face the diaphragms 24a and 24b, respectively).
- the diaphragm 24a and the fixed electrode plate 29 constitute a first sensing portion 56a, and the diaphragm 24b and the fixed electrode plate 29 constitute a second sensing portion 56b. Therefore, if the diaphragms 24a and 24b as shown in FIG. 18 are used, an acoustic sensor having a high S / N ratio is produced using two sensing units, or the dynamic range is changed by changing the areas of the two sensing units. It is possible to produce a wide acoustic sensor.
- the leg pieces are not extended from the diaphragms 24a and 24b, and therefore the diaphragm 24a and the diaphragm 24b can be arranged close to each other. . Therefore, a small and wide dynamic range acoustic sensor can be manufactured.
- FIG. 19 is a cross-sectional view showing an acoustic sensor 61 according to Embodiment 6 of the present invention.
- the fixed electrode plate 29 is formed in a dome shape, and has a thickness enough to obtain a required rigidity.
- the fixed electrode plate 29 is provided on the upper surface of the silicon substrate 22 with the insulating layer 62 interposed therebetween, and covers the diaphragm 24 disposed above the silicon substrate 22.
- the pressure sensor may not use a back plate.
- FIG. 20 is a cross-sectional view showing an acoustic sensor 71 according to Embodiment 4 of the present invention.
- a flat fixed electrode plate 29 is provided on the upper surface of the silicon substrate 22 via an insulating layer 72.
- a diaphragm 24 is disposed above the fixed electrode plate 29 so as to face the fixed electrode plate 29.
- the leg piece 26 connected to the diaphragm 24 is supported by an anchor 27 provided on the upper surface of the fixed electrode plate 29.
- a plurality of acoustic holes 31 are opened in the fixed electrode plate 29 above the chamber 23.
- the fixed electrode plate may face the diaphragm below the diaphragm.
- FIG. 21 is a schematic cross-sectional view of an acoustic sensor according to the present invention, for example, a bottom port type microphone 81 incorporating the acoustic sensor 21 of the first embodiment.
- the microphone 81 includes a package made up of a circuit board 82 and a cover 83 with a built-in acoustic sensor 21 and a signal processing circuit 85 (ASIC) as a circuit unit.
- the acoustic sensor 21 and the signal processing circuit 85 are mounted on the upper surface of the circuit board 82.
- the circuit board 82 has a sound introduction hole 84 for introducing acoustic vibration into the acoustic sensor 21.
- the acoustic sensor 21 is mounted on the upper surface of the circuit board 82 so that the lower surface opening of the chamber 23 is aligned with the sound introduction hole 84 and covers the sound introduction hole 84. Therefore, the chamber 23 of the acoustic sensor 21 is a front chamber, and the space in the package is a back chamber.
- the acoustic sensor 21 and the signal processing circuit 85 are connected by a bonding wire 86. Further, the signal processing circuit 85 is connected to the circuit board 82 by bonding wires 87.
- the signal processing circuit 85 has a function of supplying power to the acoustic sensor 21 and a function of outputting a capacitance change signal of the acoustic sensor 21 to the outside.
- a cover 83 is attached to the upper surface of the circuit board 82 so as to cover the acoustic sensor 21 and the signal processing circuit 85.
- the package has an electromagnetic shielding function, and protects the acoustic sensor 21 and the signal processing circuit 85 from external electrical disturbances and mechanical shocks.
- the acoustic vibration that has entered the chamber 23 through the sound introduction hole 84 is detected by the acoustic sensor 21, amplified and processed by the signal processing circuit 85, and then output.
- the microphone 81 since the space in the package is used as the back chamber, the volume of the back chamber can be increased and the sensitivity of the microphone 81 can be increased.
- a sound introduction hole 84 for introducing acoustic vibration into the package may be opened on the upper surface of the cover 83.
- the chamber 23 of the acoustic sensor 21 is a back chamber, and the space in the package is a front chamber.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
Abstract
Description
22 シリコン基板
23 チャンバ
24 ダイアフラム
25 通孔
27 アンカー
27a 貫通孔
28 バックプレート
29 固定電極板
42 スリット
以下、図4-図6を参照して本発明の実施形態1による静電容量型センサ、すなわち音響センサ21を説明する。図4(A)は、本発明の実施形態1による音響センサ21の平面図である。図4(B)は、図4(A)の音響センサ21からバックプレート28と固定電極板29を除いてダイアフラム24を露出させた状態の平面図である。図5(A)は音響センサ21の断面図である。図5(B)は、図5(A)のX部拡大断面図である。図6(A)は実施形態1のダイアフラムの拡大図、図6(B)はダイアフラムのコーナー部の拡大図である。
上記実施形態1では複数個の通孔25を設けていたが、通孔25は図7に示すように、1個であってもよい。1個の通孔25の場合には、アンカー27の中心とダイアフラム24の中心を結ぶ線分Kと直交する方向に通孔25が長くなっていることが好ましい。線分Kと直交する方向に通孔5が長くなっていると、同じ開口面積を有する円形の通孔と比較して脚片相当部位26の幅を狭くすることができ、ダイアフラム24が振動するときの変位量を大きくできる。
図8(A)は、本発明の実施形態2による音響センサ41を示す平面図である。図8(B)は、図8(A)の音響センサ41からバックプレート28と固定電極板29を除いてダイアフラム24を露出させた状態の平面図である。図9は、実施形態2の音響センサ41の断面図である。図10は、音響センサ41のダイアフラム24を拡大して示す図である。図11(A)は、ダイアフラムのコーナー部を拡大して示す図である。図11(B)は、図11(A)のスリットと同じ大きさの通孔25を示す。
なお、図示しないが、図11(A)に示したような形状のスリット42をアンカー27の近傍に複数個配置してもよい。
図13(A)は、本発明の実施形態3による音響センサを説明するための平面図であって、バックプレートと固定電極板を除いてダイアフラム24を露出させた状態を示す。また、図13(B)は、ダイアフラム24のコーナー部を示す拡大図である。
図15は、本発明の実施形態3の変形例におけるバックプレートを示す平面図である。この変形例では、実施形態3において説明した形状のスリット42をアンカー27の近傍に2個ずつ形成している。また、図15に示すように隣り合うコーナー部のスリット42及びアンカー27間の領域へチャンバ23が張り出すようにしてチャンバ23を広げてもよい。このようにしてチャンバ23を広げれば、ベントホール抵抗が小さくなる。
図17は、本発明の実施形態4による音響センサ51の断面図である。この実施形態においては、バックプレート28の下面にアンカー27を設け、アンカー27の下面にダイアフラム24の上面を固定してバックプレート28の下方にダイアフラム24を吊り下げている。シリコン基板22の上面にアンカー27を設ける場合には、アンカー27の位置にチャンバ23を形成することができず、アンカー27によってチャンバ23の大きさや形状が制約される。これに対し、実施形態4の場合には、アンカー27の位置にとらわれることなくチャンバ23の位置や大きさ、形状を決めることが可能になる。特に、アンカー27の真下にチャンバ23を形成することも可能になるので、ベントホール付近の設計自由度が増す。
図18は、本発明の実施形態5を示す平面図である。実施形態5では、シリコン基板22に形成されたチャンバ23の上に、2つのダイアフラム24a、24bが形成されている。それぞれのダイアフラム24a、24bは、各コーナー部の下面をアンカー27によって支持されており、各アンカー27の近傍においてダイアフラム24a、24bにはスリット42(又は通孔25)が開口されている。図示しないが、ダイアフラム24a、24bの上方には1枚の固定電極板29が対向している(あるいは、ダイアフラム24a、24bにそれぞれ別個の固定電極板29が対向していてもよい。)。そして、ダイアフラム24aと固定電極板29によって第1センシング部56aが構成されており、ダイアフラム24bと固定電極板29によって第2センシング部56bが構成されている。よって、図18のようなダイアフラム24a、24bを用いれば、2個のセンシング部を利用してS/N比の高い音響センサを作製したり、2個のセンシング部の面積を変えることでダイナミックレンジの広い音響センサを作製したりすることが可能になる。
図19は、本発明の実施形態6による音響センサ61を示す断面図である。この音響センサ61にあっては、固定電極板29がドーム状に形成されており、必要な剛性を得られる程度の厚みを有している。固定電極板29は、絶縁層62を挟んでシリコン基板22の上面に設けられており、シリコン基板22の上方に配設されたダイアフラム24を覆っている。この実施形態のように、圧力センサは、バックプレートを用いないものであってもよい。
図20は、本発明の実施形態4による音響センサ71を示す断面図である。この音響センサ71では、シリコン基板22の上面に絶縁層72を介して平板状の固定電極板29を設けている。さらに、固定電極板29の上方には、固定電極板29と対向させるようにしてダイアフラム24が配設されている。ダイアフラム24につながった脚片26は、固定電極板29の上面に設けられたアンカー27によって支持されている。また、チャンバ23の上方において、固定電極板29には複数のアコースティックホール31が開口されている。この実施形態のように、圧力センサは、ダイアフラムの下方で固定電極板がダイアフラムに対向していてもよい。
図21は、本発明に係る音響センサ、たとえば実施形態1の音響センサ21を内蔵したボトムポート型のマイクロフォン81の概略断面図である。このマイクロフォン81は、回路基板82とカバー83からなるパッケージ内に音響センサ21と回路部である信号処理回路85(ASIC)とを内蔵したものである。音響センサ21と信号処理回路85は、回路基板82の上面に実装されている。回路基板82には、音響センサ21内に音響振動を導き入れるための音導入孔84が開口されている。音響センサ21は、チャンバ23の下面開口を音導入孔84に合わせ、音導入孔84を覆うようにして回路基板82の上面に実装されている。したがって、音響センサ21のチャンバ23がフロントチャンバとなり、パッケージ内の空間がバックチャンバとなる。
Claims (20)
- 少なくとも上面で開口した空洞を有する基板と、
前記空洞の上面を覆うようにして前記基板の上方に形成された振動電極板と、
前記振動電極板の外周部に間隔をあけて配置されていて、前記振動電極板を静止部材に固定可能にする複数個のアンカーと、
前記振動電極板と対向するように配置された固定電極板と、
を備え、
前記基板の上面に垂直な方向から見たとき、隣り合うアンカー間に位置する振動電極板の外縁が、全長にわたって、前記振動電極板の中心から遠い側で隣り合うアンカーの縁に外接する接線よりも外側に位置し、
前記振動電極板の前記アンカーに近い領域に1又は2以上の開口が設けられていることを特徴とする静電容量型センサ。 - 前記開口は、前記アンカーの位置から、前記アンカーのサイズと同程度もしくは2倍程度離れた位置に設けられていることを特徴とする、請求項1に記載の静電容量型センサ。
- 前記開口は、前記振動電極板を上下に貫通した通孔又はスリットであることを特徴とする、請求項1に記載の静電容量型センサ。
- 前記開口の外周縁のうち、当該開口の近傍のアンカーと前記振動電極板の中心とを結ぶ線分からの垂直距離が最も大きな箇所が湾曲していることを特徴とする、請求項1に記載の静電容量型センサ。
- 前記開口は、開環状のスリットであることを特徴とする、請求項3に記載の静電容量型センサ。
- 前記スリットは、前記振動電極板の中心側で途切れていることを特徴とする、請求項5に記載の静電容量型センサ。
- 前記スリットの途切れている部分における前記スリットの端どうしの間隔は、当該スリットの近傍のアンカーと前記振動電極板の中心とを結ぶ線分から前記スリットの外周縁までの最大の垂直距離よりも小さいことを特徴とする、請求項5に記載の静電容量型センサ。
- 前記スリットの端部は、前記スリットに囲まれた領域の内側へ向けて湾曲していることを特徴とする、請求項5に記載の静電容量型センサ。
- 前記スリットで囲まれた領域は、前記振動電極板の一部によって塞がれていることを特徴とする、請求項5に記載の静電容量型センサ。
- 前記開口は、前記基板の上面に垂直な方向から見て、前記アンカーと前記振動電極板の中心を結ぶ直線に関して対称な形状を有していることを特徴とする、請求項1に記載の静電容量型センサ。
- あるアンカーに近い領域に設けられた複数の前記開口が、当該アンカーの周囲に配置されていることを特徴とする、請求項1に記載の静電容量型センサ。
- 前記振動電極板の開口は、前記基板の上面に垂直な方向から見て前記空洞と重なり合わない位置に設けられていることを特徴とする、請求項1に記載の静電容量型センサ。
- 前記静止部材が前記基板であり、
前記振動電極板は、アンカーを介して前記基板の上方に固定されていることを特徴とする、請求項1に記載の静電容量型センサ。 - 前記アンカーの内部を貫通する導電部によって前記振動電極板と前記基板とが導通していることを特徴とする、請求項13に記載の静電容量型センサ。
- 前記振動電極板を覆うようにして前記基板の上方にバックプレートが形成され、
前記静止部材が前記バックプレートであり、
前記振動電極板は、アンカーを介して前記バックプレートの下面に固定可能になっていることを特徴とする、請求項1に記載の静電容量型センサ。 - 前記静止部材が前記固定電極板であり、
前記振動電極板は、アンカーを介して前記固定電極板に固定可能になっていることを特徴とする、請求項1に記載の静電容量型センサ。 - 前記振動電極板は、矩形状をしていることを特徴とする、請求項1に記載の静電容量型センサ。
- 請求項1に記載の静電容量型センサを利用した音響センサであって、
前記バックプレート及び前記固定電極板には、音響振動を通過させるための複数個の音響孔が形成された音響センサ。 - 前記開口の上方に位置する前記音響孔は、前記バックプレートの中央部に位置する前記音響孔よりも開口面積が小さいことを特徴とする、請求項18に記載の音響センサ。
- 請求項18に記載の音響センサと、前記音響センサからの信号を増幅して外部に出力する回路部とを備えたマイクロフォン。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201380074451.3A CN105191352B (zh) | 2013-03-14 | 2013-09-09 | 静电容量式传感器、声音传感器以及麦克风 |
US14/773,451 US9521491B2 (en) | 2013-03-14 | 2013-09-09 | Capacitive sensor, acoustic sensor and microphone |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013052538A JP6127611B2 (ja) | 2013-03-14 | 2013-03-14 | 静電容量型センサ、音響センサ及びマイクロフォン |
JP2013-052538 | 2013-03-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014141507A1 true WO2014141507A1 (ja) | 2014-09-18 |
Family
ID=51536196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2013/074209 WO2014141507A1 (ja) | 2013-03-14 | 2013-09-09 | 静電容量型センサ、音響センサ及びマイクロフォン |
Country Status (4)
Country | Link |
---|---|
US (1) | US9521491B2 (ja) |
JP (1) | JP6127611B2 (ja) |
CN (1) | CN105191352B (ja) |
WO (1) | WO2014141507A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016120214A1 (en) * | 2015-01-26 | 2016-08-04 | Cirrus Logic International Semiconductor Limited | Mems devices and processes |
CN106211015A (zh) * | 2014-10-17 | 2016-12-07 | 现代自动车株式会社 | 麦克风及其制造方法 |
GB2551854A (en) * | 2016-07-28 | 2018-01-03 | Cirrus Logic Int Semiconductor Ltd | MEMS device and process |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI694965B (zh) | 2016-06-30 | 2020-06-01 | 英國商席瑞斯邏輯國際半導體有限公司 | Mems裝置與製程 |
GB2551783B (en) * | 2016-06-30 | 2018-07-11 | Cirrus Logic Int Semiconductor Ltd | MEMS device and process |
IT201600121533A1 (it) | 2016-11-30 | 2018-05-30 | St Microelectronics Srl | Trasduttore elettroacustico integrato mems con sensibilita' migliorata e relativo processo di fabbricazione |
CN107105377B (zh) * | 2017-05-15 | 2021-01-22 | 潍坊歌尔微电子有限公司 | 一种mems麦克风 |
CN207910959U (zh) * | 2018-01-31 | 2018-09-25 | 瑞声声学科技(深圳)有限公司 | 麦克风 |
JP6877376B2 (ja) * | 2018-03-02 | 2021-05-26 | 株式会社東芝 | Mems素子 |
US10715924B2 (en) * | 2018-06-25 | 2020-07-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS microphone having diaphragm |
EP3793213A1 (en) | 2019-09-13 | 2021-03-17 | ams International AG | Microstructure and method of producing a microstructure |
JPWO2023120354A1 (ja) * | 2021-12-24 | 2023-06-29 | ||
CN115119121B (zh) * | 2022-08-22 | 2022-11-22 | 瑶芯微电子科技(上海)有限公司 | 振膜及mems麦克风 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62284233A (ja) * | 1986-05-31 | 1987-12-10 | Horiba Ltd | コンデンサマイクロフオン型検出器用ダイアフラム |
JP2011234227A (ja) * | 2010-04-28 | 2011-11-17 | Omron Corp | 音響センサ及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8121315B2 (en) * | 2007-03-21 | 2012-02-21 | Goer Tek Inc. | Condenser microphone chip |
US20090190782A1 (en) | 2007-09-28 | 2009-07-30 | Yamaha Corporation | Vibration transducer |
IT1392742B1 (it) | 2008-12-23 | 2012-03-16 | St Microelectronics Rousset | Trasduttore acustico integrato in tecnologia mems e relativo processo di fabbricazione |
IT1395550B1 (it) * | 2008-12-23 | 2012-09-28 | St Microelectronics Rousset | Trasduttore acustico integrato in tecnologia mems e relativo processo di fabbricazione |
EP2242288A1 (en) | 2009-04-15 | 2010-10-20 | Nxp B.V. | Microphone with adjustable characteristics |
CN102264019A (zh) * | 2010-05-26 | 2011-11-30 | 国立清华大学 | 微机电电容式麦克风 |
JP5400708B2 (ja) * | 2010-05-27 | 2014-01-29 | オムロン株式会社 | 音響センサ、音響トランスデューサ、該音響トランスデューサを利用したマイクロフォン、および音響トランスデューサの製造方法 |
-
2013
- 2013-03-14 JP JP2013052538A patent/JP6127611B2/ja active Active
- 2013-09-09 US US14/773,451 patent/US9521491B2/en active Active
- 2013-09-09 CN CN201380074451.3A patent/CN105191352B/zh active Active
- 2013-09-09 WO PCT/JP2013/074209 patent/WO2014141507A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62284233A (ja) * | 1986-05-31 | 1987-12-10 | Horiba Ltd | コンデンサマイクロフオン型検出器用ダイアフラム |
JP2011234227A (ja) * | 2010-04-28 | 2011-11-17 | Omron Corp | 音響センサ及びその製造方法 |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106211015A (zh) * | 2014-10-17 | 2016-12-07 | 现代自动车株式会社 | 麦克风及其制造方法 |
CN106211015B (zh) * | 2014-10-17 | 2020-05-15 | 现代自动车株式会社 | 麦克风及其制造方法 |
US10494254B2 (en) | 2015-01-26 | 2019-12-03 | Cirrus Logic, Inc. | MEMS devices and processes |
CN107211222A (zh) * | 2015-01-26 | 2017-09-26 | 思睿逻辑国际半导体有限公司 | Mems设备和方法 |
CN107211223A (zh) * | 2015-01-26 | 2017-09-26 | 思睿逻辑国际半导体有限公司 | Mems设备和方法 |
US10343901B2 (en) | 2015-01-26 | 2019-07-09 | Cirrus Logic, Inc. | MEMS transducer having stress diffusing structures provided in a flexible membrane |
GB2538828B (en) * | 2015-01-26 | 2019-07-10 | Cirrus Logic Int Semiconductor Ltd | MEMS devices |
WO2016120214A1 (en) * | 2015-01-26 | 2016-08-04 | Cirrus Logic International Semiconductor Limited | Mems devices and processes |
TWI685465B (zh) * | 2015-01-26 | 2020-02-21 | 席瑞斯邏輯國際半導體有限公司 | Mems裝置與製程 |
CN107211222B (zh) * | 2015-01-26 | 2020-03-24 | 思睿逻辑国际半导体有限公司 | Mems换能器 |
CN107211223B (zh) * | 2015-01-26 | 2020-04-03 | 思睿逻辑国际半导体有限公司 | Mems换能器 |
WO2016120213A1 (en) * | 2015-01-26 | 2016-08-04 | Cirrus Logic International Semiconductor Limited | Mems devices and processes |
GB2551854A (en) * | 2016-07-28 | 2018-01-03 | Cirrus Logic Int Semiconductor Ltd | MEMS device and process |
GB2551854B (en) * | 2016-07-28 | 2019-03-27 | Cirrus Logic Int Semiconductor Ltd | MEMS device and process |
Also Published As
Publication number | Publication date |
---|---|
US9521491B2 (en) | 2016-12-13 |
JP6127611B2 (ja) | 2017-05-17 |
JP2014179812A (ja) | 2014-09-25 |
CN105191352B (zh) | 2018-03-02 |
CN105191352A (zh) | 2015-12-23 |
US20160021459A1 (en) | 2016-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6127611B2 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
JP6179297B2 (ja) | 音響トランスデューサ及びマイクロフォン | |
WO2014141505A1 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
JP6237978B2 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
JP6149628B2 (ja) | 音響トランスデューサ及びマイクロフォン | |
JP5252104B1 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
JP5991475B2 (ja) | 音響トランスデューサ | |
JP5987572B2 (ja) | 音響トランスデューサ | |
JP5928163B2 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
JP6028479B2 (ja) | 静電容量型センサ、音響センサ及びマイクロフォン | |
KR20120130310A (ko) | 음파센서 및 마이크로폰 | |
JP6127595B2 (ja) | 音響トランスデューサ | |
US9344807B2 (en) | Capacitance-type transducer, acoustic sensor, and microphone | |
JP6606439B2 (ja) | Mems素子 | |
JP6432372B2 (ja) | 音響センサ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201380074451.3 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13878363 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14773451 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 13878363 Country of ref document: EP Kind code of ref document: A1 |