WO2014134865A1 - Three-dimensional memory comprising independent intermediate circuit chip - Google Patents

Three-dimensional memory comprising independent intermediate circuit chip Download PDF

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Publication number
WO2014134865A1
WO2014134865A1 PCT/CN2013/075222 CN2013075222W WO2014134865A1 WO 2014134865 A1 WO2014134865 A1 WO 2014134865A1 CN 2013075222 W CN2013075222 W CN 2013075222W WO 2014134865 A1 WO2014134865 A1 WO 2014134865A1
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Prior art keywords
memory
dimensional
chip
address
intermediate circuit
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PCT/CN2013/075222
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French (fr)
Chinese (zh)
Inventor
张国飙
Original Assignee
Zhang Guobiao
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Priority claimed from US13/787,796 external-priority patent/US9117493B2/en
Priority claimed from US13/787,787 external-priority patent/US8890300B2/en
Priority claimed from US13/798,135 external-priority patent/US9024425B2/en
Application filed by Zhang Guobiao filed Critical Zhang Guobiao
Publication of WO2014134865A1 publication Critical patent/WO2014134865A1/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • G11C5/025Geometric lay-out considerations of storage- and peripheral-blocks in a semiconductor storage device
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C8/00Arrangements for selecting an address in a digital store
    • G11C8/06Address interface arrangements, e.g. address buffers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
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    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
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    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0688Integrated circuits having a three-dimensional layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48145Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06506Wire or wire-like electrical connections between devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/0651Wire or wire-like electrical connections from device to substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06562Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking at least one device in the stack being rotated or offset
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1064Electrical connections provided on a side surface of one or more of the containers

Definitions

  • This invention relates to the field of integrated circuit memory and, more particularly, to a three dimensional memory (3D-M).
  • the three-dimensional memory (3D-M) is a monolithic semiconductor memory whose memory elements are distributed in three-dimensional space.
  • the 3D-M includes a three-dimensional read only memory (3D-ROM) and a three-dimensional random read memory (3D-RAM).
  • 3D-ROM can be further divided into 3D mask programming read-only memory ( 3D-MPROM) and 3D electrical programming read only memory (3D-EPROM).
  • 3D-M can contain printed memory elements (see PCT application) PCT/CN2012/080895), memristor memory elements, resistive memory elements (RRAM or ReRAM), phase-change memory (PCM), programmable metallization memory (PMM), or conductive-bridging Random-access memory (CBRAM), etc.
  • U.S. Patent 5,835,396 discloses a 3D-M, 3D-ROM.
  • the chip 20 includes a substrate layer 0K and a plurality of memory layers 16A, 16B stacked on the substrate layer 0K and stacked on each other.
  • Substrate layer 0K contains transistor 0t and its interconnect 0i .
  • transistor 0t is formed in semiconductor substrate 0;
  • interconnect 0i contains substrate metal layers 0M1, 0M2 which are above substrate 0 but at the lowest memory level 16A Below.
  • a memory layer (e.g., 16A) is coupled to the substrate layer 0K through contact via holes (e.g., 1av).
  • Each storage layer (such as 16A) contains multiple top address lines (such as 2a), bottom address lines (such as 1a), and storage elements (such as 5aa).
  • the memory cells can be diodes, transistors or other devices. Among the various memory elements, a memory cell using a diode is especially important: its area is the smallest, only 4F 2 (F is the minimum feature size). Diode memory cells are typically formed at the intersection of the top address line and the bottom address line to form a cross-point array.
  • a diode generally refers to any two-terminal device having a characteristic that when its applied voltage is smaller than the read voltage or the applied voltage is opposite to the read voltage, its resistance is greater than its resistance at the read voltage. Examples of the diode include a semiconductor diode (such as a pin silicon diode) and a metal oxide diode (such as a titanium oxide diode, a nickel oxide diode, etc.).
  • the storage layers 16A, 16B constitute at least one three-dimensional memory array 16 and the substrate layer 0K contains a three-dimensional memory array 16 Peripheral circuit. Wherein, some of the peripheral circuits are located under the three-dimensional memory array, which are referred to as the lower peripheral circuits of the array; and another part of the peripheral circuits are located outside the three-dimensional memory array, which are referred to as array peripheral circuits 18 . Since the space 17 above the array peripheral circuit 18 does not contain a memory cell, the space is actually wasted.
  • U.S. Patent No. 7,388,476 discloses an integrated 3D-M chip 20 which can directly use the power supply voltage supplied by the host 23 and exchange address/data directly with the host 27 .
  • the host is a device that directly uses the chip 20, and the address/data 27 used by the host is a logical address/data.
  • the integrated 3D-M chip 20 includes a 3D-M core region 22 and an intermediate circuit region 28 .
  • the 3D-M core area 22 contains multiple 3D storage arrays (such as 22aa, 22ay) and its decoders (such as 24, 24G). These decoders 24 include a local decoder ( Local decoder ) 24 and global decoder (24G). Where local decoder 24 addresses the address of a single 3D storage array / The data is decoded and the overall decoder 24G decodes the overall address/data 25 into a single three dimensional memory array. Note that the address/data 25 of the 3D-M core area 22 is the physical address. / Data.
  • the intermediate circuit area 28 contains an intermediate circuit between the 3D-M core area 22 and the host.
  • the intermediate circuit 28 implements voltage, data, and address conversion between the 3D-M core area 22 and the host. For example, it converts the supply voltage 23 into a read voltage V R or / and a write (program) voltage V W , converting the logical address / data 27 and the physical address / data 25 to each other.
  • the intermediate circuit 28 includes a read/write voltage generator 21 and an address/data converter 29.
  • the read/write voltage generator 21 includes a bandgap reference circuit (precise reference voltage source) 21B, a read voltage generator 21R, and a charge pump 21W (refer to US Pat. No. 6,486,728).
  • the address/data converter 29 includes an error check and correction circuit (ECC) 29E, a page register 29P, and a smart write controller 29W.
  • ECC circuit 29E performs ECC decoding on the data read from the three-dimensional memory array while performing error checking and correction (refer to U.S. Patent No. 6,591,394); the page register 29P functions to temporarily store data between the host and the three-dimensional memory array, and it also functions.
  • the data can be ECC encoded (refer to US Pat. No. 8,223,525); the intelligent write controller 29W monitors the write error during the programming process, and once the write error occurs, the self-repair mechanism is initiated to write the data into the redundant row (refer to the US patent) 7,219,271).
  • the prior art integrated 3D-M chip 20 implements voltage, data, and address conversion inside the chip.
  • the intermediate circuit 28 is an array outer peripheral circuit 18.
  • the three-dimensional memory array is integrated with all intermediate circuit components on one chip. Since the intermediate circuit occupies a large amount of chip area in the 3D-M chip 20, the integrated 3D-M chip 20 has a lower array efficiency.
  • the array efficiency is defined as the ratio of the total storage area (ie, the chip area for storing user data) to the total chip area.
  • a c is the chip area occupied by a single storage element
  • C L is the amount of data stored in one storage layer
  • F is the half cycle of the address line
  • C 3D-M is the storage capacity of 3D-M
  • N is 3D- The number of all storage tiers in M. The following paragraphs take two 3D-M as examples to calculate their array efficiency.
  • 3D-M 3D-on-a-chip memory (see Crowley et al., 512Mb PROM with 8 layers of antifuse/diode cells, 2003 International Solid State Circuits Conference, Figure 16.4.5).
  • 3D-M is a three-dimensional resistive memory (3D-ReRAM) (see Liu et al., "A 130.7mm 2 2-Layer 32Gb ReRAM Memory Device in 24nm Technology", 2013 International Solid State Circuits Conference, Figure 12.1. 7).
  • the mainstream view of integrated circuits is that integration reduces costs. Unfortunately, this view is not universal, it is in 3D-M Not in the middle. Since the intermediate circuit is weighted by the front-end process, and the rear-end process of the three-dimensional memory array is heavy and its production cost is higher than that of the intermediate circuit, the consequence of blindly integrating the intermediate circuit and the three-dimensional memory array is that the expensive process for manufacturing the three-dimensional memory array has to be used. The process of manufacturing intermediate circuits not only does not reduce costs, but increases costs. In addition, since the intermediate circuit can only use the same number of metal layers as the three-dimensional memory array (for example, only two layers), the design of the intermediate circuit is cumbersome, and the required chip area is large.
  • 3D-M memory cells are generally subjected to high-temperature processes, and intermediate circuits require high-temperature interconnect materials such as tungsten (W). These materials generally have poor electrical conductivity, which makes 3D-M The overall performance is degraded.
  • W tungsten
  • the present invention follows the guiding principle of separating three-dimensional circuits and two-dimensional circuits into different chips in order to optimize them separately; in order to improve array efficiency, voltage, address and data should be avoided in a three-dimensional array chip.
  • the present invention proposes a separate three-dimensional memory containing an intermediate circuit chip (separation 3D-M ), it contains at least one three-dimensional array chip (three-dimensional circuit) and at least one intermediate circuit chip (two-dimensional circuit).
  • the three-dimensional array chip is constructed in a three-dimensional space and contains a plurality of functional layers (ie, storage layers), which generally do not contain transistors; the intermediate circuit chip is constructed in a two-dimensional space and contains only one functional (analog, digital) layer.
  • the intermediate circuit chip can be fabricated using a separate, inexpensive process flow, the cost of the wafer is much lower than that of the three-dimensional array chip. So for the same storage capacity, the total cost of separating 3D-M is lower than the integrated 3D-M .
  • the number of metal layers in the intermediate circuit chip is no longer limited by the three-dimensional array chip, it can contain more metal layers (such as from two layers of metal to four layers of metal), so the intermediate circuit components thereon (such as Read / The design of the write voltage generator, address/data converter is simpler and requires a smaller chip area.
  • the intermediate circuit chip does not need to undergo a high temperature process, its interconnects can use high speed interconnect materials such as copper ( Cu), etc., these materials can improve the overall performance of 3D-M.
  • Intermediate circuit components include read/write voltage generators and addresses / Data converter.
  • the intermediate circuit components are integrated in the same intermediate circuit chip, so that the three-dimensional array chip can ensure high array efficiency and reduce the packaging cost of the intermediate circuit chip.
  • these components can also be separated into different chips. This means three-dimensional storage circuit (three-dimensional storage array), two-dimensional analog circuit (read / Write voltage generator) and two-dimensional digital circuit (address / data converter) are separated into different chips, and their performance can be optimized by different process flows: storage performance optimization of three-dimensional array chip, read / Write voltage generator chip for analog performance optimization, and digital performance optimization for address / data converter.
  • the main advantageous effect of the present invention is to provide a more inexpensive three-dimensional memory (3D-M).
  • Another advantageous effect of the present invention is to provide a 3D-M which is excellent in performance.
  • Another benefit of the present invention is to increase the array efficiency of the three-dimensional array chip.
  • FIG. 1A is a cross-sectional view of a prior art three-dimensional memory (3D-M); FIG. 1B is an integrated 3D-M The system architecture of the chip (prior art).
  • FIGS. 1A - Figure 2H are block diagrams of eight separate 3D-Ms with intermediate circuit chips.
  • Figure 3A is a cross-sectional view of a three-dimensional array chip in a separate 3D-M;
  • Figure 3B is a cross-sectional view of a circuit chip in between.
  • Figure 4A - Figure 4C are cross-sectional views of three separate 3D-M.
  • Figures 5A-5C are circuit diagrams of three read/write voltage generators.
  • Figure 6A - Figure 6B are circuit block diagrams of two address/data converters.
  • ' / ' denotes a relationship between 'and' or 'or'.
  • read / The write voltage generator indicates that it can generate only the read voltage, or only the write voltage, or both the read voltage and the write voltage; address / A data converter means that it can convert only addresses, or just convert data, or both address and voltage.
  • the intermediate circuit refers to a circuit between the 3D-M core area and the host that implements voltage, address or/and data conversion between the host and the 3D-M core area. For example, it converts the external voltage (ie, supply voltage V DD ) from the host, the external address (ie, the logical address), and the external data (ie, the logical data) into the internal voltage of the 3D-M core region (ie, the read voltage V R and write Voltage V W ), internal address (ie physical address) and internal data (ie physical data).
  • the intermediate circuit components include a read/write voltage generator and an address/data converter.
  • Figure 2A - Figure 2H show eight separate three-dimensional memories (separated 3D-M) with intermediate circuit chips 50 .
  • Each of these embodiments includes at least one three-dimensional array chip (three-dimensional circuit) and at least one intermediate circuit chip (two-dimensional circuit).
  • the three-dimensional array chip is constructed in a three-dimensional space and contains a plurality of functional (storage) layers
  • the intermediate circuit chip is constructed in a two-dimensional space and contains only one functional (analog, digital) layer. Separating the three-dimensional memory circuit and the two-dimensional intermediate circuit into different chips can be optimized separately.
  • the split 3D-M 50 includes an interface 52 that can physically interface with various hosts and communicate in accordance with a communication standard.
  • the interface 52 includes a plurality of contact ends 52x, 52y, 52a-52b that are coupled to corresponding contact ends of the host jack.
  • the host provides a supply voltage V DD and a ground voltage V SS for the split 3D-M 50 through the power supply terminal 52x and the ground terminal 52y, respectively; the host exchanges address/data with the separate 3D-M 50 via the signal terminals 52a - 52d. Since these addresses/data are used directly by the host, they are logical addresses/data.
  • the split 3D-M 50 in Figure 2A is a 3D-M memory card. It contains a separate three-dimensional array chip (three-dimensional circuit) 30 and a separate intermediate circuit chip (two-dimensional circuit) 40 .
  • the three-dimensional array chip 30 contains a 3D-M core region 22 as in Figure 1B, which contains a plurality of three-dimensional memory arrays (e.g., 22aa, 22ay) and decoders thereof (e.g., 24, 24G).
  • the three-dimensional array chip 30 also includes an address/data converter 47 that converts the logical address/data of the host and the physical address/data of the 3D-M core area 22 to each other.
  • the intermediate circuit chip 40 includes a read/write voltage generator 41 that takes the power supply voltage V DD from the host, converts it into a read/write voltage, and transmits it to the three-dimensional array chip 30 through the power bus 56.
  • This read/write voltage is supplied.
  • the read/write voltage may be only the read voltage V R , or only the write voltage V W , or both the read voltage V R and the write voltage V W , which have different values from the power supply voltage V DD .
  • the read/write voltage includes a read voltage V R and two write voltages V W1 , V W2 .
  • the read/write voltage can include more than one read voltage or two write voltages. Since the three-dimensional array chip 30 does not include the read/write voltage generator 41, its array efficiency can be greater than 40%.
  • the split 3D-M 50 in Figure 2B is also a 3D-M memory card. Similar to Figure 2A, the intermediate circuit chip 40* An address/data converter 47 is included, and the address/data converter 47 includes an address translator 43 and a data converter 45. Where address translator 43 will be the external bus 54 The logical address on the internal bus 58 (including the signals from the contacts 52a - 52d) is converted to the physical address on the internal bus 58; the data converter 45 takes the logical data on the external bus 54 to the internal bus The physical data on 58 is converted to each other.
  • the address/data converter 47 can implement only address translation, or only data conversion, or both address and data conversion. Since the 3D array chip 30 does not contain an address / Data Converter 47, whose array efficiency can be greater than 40%.
  • the separation 3D-M 50 in Figure 2C is also a 3D-M memory card.
  • the intermediate circuit chip 40 includes a read/write voltage generator 41 and an address/data converter 47.
  • the read/write voltage generator 41 and the address/data converter 47 is integrated in the same intermediate circuit chip 40. Since the 3D array chip 30 does not include an address/data converter and a read/write voltage generator, its array efficiency can easily exceed 40% or even reach ⁇ 60%. Integrating the read/write voltage generator 41 and the address/data converter 47 into the same intermediate circuit chip 40 ensures the three-dimensional array chip 30 It has higher array efficiency and lowers the packaging cost of the intermediate circuit chip 40.
  • the split 3D-M 50 in Figure 2D is also a 3D-M memory card.
  • the difference with Figure 2C is that read / The write voltage generator 41 and the address/data converter 47 are separated into different intermediate circuit chips 40, 40*.
  • a three-dimensional memory circuit three-dimensional array chip 30
  • a two-dimensional analog circuit read/write voltage generator 41
  • a two-dimensional digital circuit address/data converter 47
  • storage performance optimization of the three-dimensional array chip 30 simulation performance optimization of the read/write voltage generator chip 40
  • address/ Data Converter 40* for digital performance optimization. Since the three-dimensional array chip 30 does not include the read/write voltage generator 41 and the address/data converter 47, its array efficiency can easily exceed 40. %, even up to ⁇ 60%.
  • the intermediate circuit chip (including the read/write voltage generator chip 40 and the address/data converter chip 40*) It can be manufactured in a separate, inexpensive process flow, and its wafer cost is much lower than that of the three-dimensional array chip 30.
  • the intermediate circuit chip 40, 40* wafer cost is a three-dimensional array chip Half of 30, and the array efficiency is increased from 30% of the integrated 3D-M chip 20 to 40% of the 3D array chip 30 ( Figure 2A - Figure 2B) ), then for the same storage capacity, the total cost of separating the 3D-M 50 is ⁇ 88% of the integrated 3D-M 20; if the array efficiency is increased to 60% ( Figure 2C - Figure 2D) ), then the total cost of separating the 3D-M 50 is only ⁇ 75% of the integrated 3D-M 20.
  • the split 3D-M 50 in Figure 2E is also a 3D-M memory card.
  • the three-dimensional array chip 30 also includes a serializer-deserializer (Ser-Des) 49 that will parallel digital signals within the three-dimensional array chip 30 (eg, address/data/instructions/ State, etc.) is converted to its external serial digital signal 58';
  • the address/data converter chip 40* also contains a second serializer-deserializer (Ser-Des) 49* which will address /
  • the parallel digital signal (such as address/data/instruction/status, etc.) inside the data converter chip 40* is converted into its external serial digital signal 58'.
  • Figure 2E By serializing the digital signal, Figure 2E The number of connecting wires 58' (such as leads, solder balls) between the middle three-dimensional array chip 30 and the address/data converter chip 40* is less than the connecting line in Fig. 2C. The number of this can help reduce packaging costs.
  • connecting wires 58' such as leads, solder balls
  • the split 3D-M 50 in Figure 2F is also a 3D-M memory card. Similar to Figure 2E, it is in Figure 2D A first serializer-deserializer (Ser-Des) 49 is added to the three-dimensional array chip 30, and a second serializer-deserializer 49* is added to the intermediate circuit chip 40.
  • Ser-Des serializer-deserializer
  • Figure 2F The number of connection lines 58' between the middle three-dimensional array chip 30 and the intermediate circuit chip 40 is less than the number of connection lines 58 in Fig. 2D, which can help reduce packaging costs.
  • the separation in Figure 2G 3D-M 50 is a large capacity 3D-M memory card or a 3D-M SSD. It contains an intermediate circuit chip 40 and a plurality of three-dimensional array chips 30a, 30b... 30w.
  • the intermediate circuit chip 40 includes a plurality of read/write voltage generators 41a, 41b... 41w and multiple address / data converters 47a, 47b... 47w.
  • Each read/write voltage generator (such as 41a) is a three-dimensional array chip (such as 30a) Providing read voltage or / and write voltage; each address / data converter (such as 47a) performs address or / and data conversion for a three-dimensional array chip (such as 30a).
  • 30w makes up two channels: A and B.
  • channel A the internal bus 58A from the intermediate circuit chip 40 is a three-dimensional array chip 30a, 30b... 30i
  • the physical address/data is provided; in channel B, the internal bus 58B from the intermediate circuit chip 40 provides physical addresses for the three-dimensional array chips 30r, 30s... 30w / Data.
  • the power bus 56 from the intermediate circuit chip 40 provides read for the dimensional array chips 30a, 30b...30w / Write voltage.
  • this embodiment has only two channels, a large-capacity 3D-M memory card and a 3D-M solid state hard disk can contain more channels for those skilled in the art.
  • the 3D-M 50 is also a large capacity 3D-M memory card or a 3D-M solid state drive.
  • Figure 2G The difference is that the read/write voltage generators 41a, 41b... 41w and the address/data converters 47a, 47b... 47w are separated into different intermediate circuit chips 40, 40* Medium.
  • this embodiment will have three-dimensional memory circuits (three-dimensional array chips 30a, 30b...30w) and two-dimensional analog circuits (read/write voltage generator chip 40). ), the two-dimensional digital circuit (address/data converter chip 40*) is separated into different chips, so that their performance can be optimized separately by different processes.
  • 3A-3B are separated 3D array chip 30 and intermediate circuit chip 40 in 3D-M 50 (including 40*) section view.
  • the three-dimensional array chip 30 in Fig. 3A is formed in a three-dimensional space and contains a plurality of functional layers including a substrate layer 0K and memory layers 16A, 16B.
  • Substrate layer 0K Contains transistor 0t and its interconnect 0iA.
  • the transistor 0t is formed on the three-dimensional array substrate 0A, and the interconnection 0iA includes two substrate metal layers 0M1, 0M2 .
  • the substrate metal layers 0M1, 0M2 are preferably made of a high temperature interconnect material such as tungsten (W).
  • Storage layers 16A and 16B contain multiple address lines (such as 2a, etc.) and multiple storage elements (such as 5aa). Wait).
  • Each memory element can contain at least one of the following components, such as a printed storage element (see PCT application PCT/CN2012/080895), memristor Storage element, resistive storage element (RRAM or ReRAM), phase-change memory (PCM), programmable Metallization memory ( PMM ), or conductive-bridging random-access memory ( CBRAM )Wait.
  • These components are typically combined with diode or diode-like components (ie, diode-like components) to implement a memory array.
  • storage layers 16A, 16B There are no transistor or transistor-like components (ie, transistors-like components). Of course, since the memory layer does not contain transistor-like components, the memory layers 16A, 16B The required analog functions (such as signal amplification) and digital functions (such as address decoding) are implemented in the substrate layer 0K.
  • the intermediate circuit chip 40 in Fig. 3B is formed in a two-dimensional space and contains only one functional layer, that is, the substrate layer 0K'.
  • Substrate layer 0K ' includes transistor 0t and its interconnect 0iB.
  • the transistor 0t is formed on the intermediate circuit substrate 0B, and the interconnection 0iB includes four metal layers 0M1' - 0M4'. Since the three-dimensional array chip 30 and the intermediate circuit chip 40 are two separate chips, the intermediate circuit chip 40 can be fabricated in an independent, inexpensive process flow instead of using an expensive, three-dimensional array chip. The craft to manufacture. Therefore, the wafer cost of the intermediate circuit chip 40 is much lower than that of the three-dimensional array chip 30.
  • the intermediate circuit chip 40 can be integrated with the 3D-M chip 20 There are more metal layers (such as from two layers of metal to four layers of metal), so the intermediate circuit components on it (such as read / write voltage generator, address / The data converter is designed to be simpler and requires a smaller chip area.
  • the metal layer 0M1' - 0M4' of the intermediate circuit chip 40 does not need to undergo a high temperature process, its interconnection 0iB High performance interconnect materials such as copper (Cu) can be used. These materials can improve the functionality of the intermediate circuit chip 40 and can also improve the overall performance of the 3D-M.
  • FIG. 4A-4C are cross-sectional views of three separate 3D-M 50s.
  • Figure 3A - Figure 4B Separation 3D-M 50 is a multi-chip package (MCP).
  • MCP multi-chip package
  • the 3D-M multi-chip package 50 of FIG. 4A contains two separate chips: a three-dimensional array chip 30 and an intermediate circuit chip 40. .
  • the chips 30, 40 are stacked on an interposer 53 and located in the same package 51.
  • the lead wire 55 is the chip 30 , 40 provides electrical connection.
  • the chips 30, 40 are preferably packaged in a molding compound (molding) Compound ) 57 inside.
  • the three-dimensional array chip 30 is stacked on the intermediate circuit chip 40.
  • the intermediate circuit chip 40 can be stacked on a three-dimensional array chip. 30, or the three-dimensional array chip 30 is stacked face-to-face with the intermediate circuit chip 40, or the three-dimensional array chip 30 and the intermediate circuit chip 40 are juxtaposed.
  • the 3D-M multi-chip package 50 The circuit block diagram in Figure 2A - Figure 2F can be used.
  • the 3D-M multi-chip package 50 in Figure 4B contains at least two three-dimensional array chips 30a, 30b And an intermediate circuit chip 40. These chips 30a, 30b and 40 are three separate chips. They are located in the same package 51. Wherein, the three-dimensional array chip 30a Stacked on the three-dimensional array chip 30b, the three-dimensional array chip 30b is stacked on the intermediate circuit chip 40. Lead 55 provides electrical connections for chips 30a, 30b, and 40.
  • the 3D-M Multi-Chip Package 50 The circuit block diagram in Figure 2G - Figure 2H can be used.
  • the split 3D-M in Figure 4C is a 3D-M Multi-Chip Component (MCM) 50* with a frame 66 .
  • the frame 66 contains two separate packages: a three-dimensional array package 62 and an intermediate circuit package 64.
  • the three-dimensional array package 62 includes two three-dimensional array chips 30a, 30b
  • the intermediate circuit package 64 contains an intermediate circuit chip 40.
  • Frame 66 also provides an electrical connection (not shown here) for three-dimensional array package 62 and intermediate circuit package 64.
  • the 3D-M multi-chip component 50* The circuit block diagram in Figure 2G - Figure 2H can be used.
  • FIGS. 5A to 5C are circuit diagrams of three kinds of read/write voltage generators 41.
  • Read/Write Voltage Generator 41 It is best to use a DC-DC converter (DC-DC converter) ).
  • the DC-DC converter includes a booster and a buck.
  • the output voltage of the booster is higher than the input voltage, and the input voltage of the buck is lower than the input voltage.
  • boosters include charge pumps (charge pumps) 5A) and Boost converter (Boost converter, Fig. 5B) and so on.
  • Examples of bucks include low dropout regulators (low dropout, Figure 5C) and Buck converter, etc.
  • FIG 5A is read / write voltage generator 41 comprises a charge pump 72, whose output voltage V out is greater than the input voltage V in. In general, charge pump 72 also contains one or more capacitors.
  • the read / write voltage generator 41 comprises a high frequency Boost converter 74, the output voltage V out is greater than the input voltage V in.
  • the Boost converter 74 also contains an inductor. The inductor is preferably a thin inductor to meet the thickness requirements of the memory card or solid state drive.
  • FIG. 5C read / write voltage generator 41 comprises a low dropout voltage regulator 76, output voltage V out which is less than the input voltage V in. In general, the low dropout regulator 76 also contains one or more capacitors.
  • Figures 6A-6B show two components of the address/data converter 47: address translator 43 and data converter, respectively. 45.
  • Fig. 6A shows an address converter 43. It converts the logical address 54A from the host into the physical address 58A of the three-dimensional array chip 30.
  • Address converter 43 contains a processor 92 and a memory 94.
  • the memory 94 stores an address mapping table 82, a fault block table 84, and a wear management table 86.
  • These status tables 82, 84, 86 Usually stored in read-only memory (ROM). It is loaded into random access memory (RAM) at the time of use.
  • the read only memory can be a nonvolatile memory (NVM) ), such as flash memory.
  • NVM nonvolatile memory
  • memory 94 For an address/data converter 47 that supports multiple 3D array chips (30a, 30b... 30w in Figure 2G - Figure 2H), memory 94
  • the state tables 82, 84, 86 are stored for all three-dimensional array chips 30a, 30b... 30w, which are shared by all three-dimensional array chips 30a, 30b... 30w.
  • the address mapping table 82 Stores the mapping between logical addresses and physical addresses; the fault block table 84 stores the addresses of faulty memory blocks in the 3D storage array; the wear management table 86 records each memory block read / The number of times written.
  • 'memory block' refers to a memory allocation unit that can be sized from one memory element to all memory elements in a three-dimensional memory array.
  • the processor 92 During the read process, once the processor 92 receives the logical address 54A of the memory block that needs to be read, it slave address map 82 Get the corresponding physical address 58A. During the write process, once the processor 92 receives the logical address 54A of the memory block to be written, it slave address mapping table 82, fault block table 84, and wear management table. Select an unoccupied, fault-free, and less-used block of memory to write data. The address of the selected memory block is the physical address.
  • Figure 6B shows a data converter 45. It converts the logical data 54D from the host into the physical data of the 3D storage array 58D, or convert the physical data 58D of the 3D storage array into logical data 54D output to the host.
  • the data converter 45 contains an error check correction (ECC) encoder 96 and a ECC Decoder 98.
  • ECC encoder 96 converts the input logical data 54D into physical data 58D to be stored to the three-dimensional storage array.
  • ECC Decoder 98 The physical data 58D read out from the three-dimensional memory array is converted into logical data 54D to be output. During this process, the error bits in physical data 58D are checked and corrected.
  • ECC for 3D-M The code includes Reed-Solomon code, Golay code, BCH code, multi-dimensional parity code and Hamming code.

Abstract

Proposed is a separate three-dimensional memory (separate 3D-M) comprising an intermediate circuit chip. The separate three-dimensional memory comprises at least one three-dimensional array chip and at least one intermediate circuit chip. The three-dimensional array chip comprises a plurality of three-dimensional storage arrays, wherein each three-dimensional storage array comprises a plurality of storage layers mutually stacked, and the storage layers do not comprise elements similar to transistors. The intermediate circuit chip comprises at least one of a read-write voltage generator and an address/data converter, and achieves conversions of the voltage, address or/and data between a core area of the 3D-M and a host. A separate 3D-M supports a plurality of three-dimensional array chips.

Description

含有独立中间电路芯片的三维存储器 Three-dimensional memory with independent intermediate circuit chip 技术领域Technical field
本发明涉及集成电路存储器领域,更确切地说,涉及三维存储器( 3D-M )。  This invention relates to the field of integrated circuit memory and, more particularly, to a three dimensional memory (3D-M).
背景技术Background technique
三维存储器( 3D-M )是一种单片( monolithic )半导体存储器,其存储元分布在三维空间中。 3D-M 包括三维只读存储器( 3D-ROM )和三维随机读取存储器( 3D-RAM )。 3D-ROM 可以进一步划分为三维掩膜编程只读存储器( 3D-MPROM )和三维电编程只读存储器( 3D-EPROM )。基于其编程机制, 3D-M 可以含有印录存储元(参见 PCT 申请 PCT/CN2012/080895 )、 memristor 存储元、电阻式存储元( RRAM 或 ReRAM )、 phase-change memory ( PCM )、 programmable metallization memory ( PMM )、或 conductive-bridging random-access memory ( CBRAM )等。 The three-dimensional memory (3D-M) is a monolithic semiconductor memory whose memory elements are distributed in three-dimensional space. The 3D-M includes a three-dimensional read only memory (3D-ROM) and a three-dimensional random read memory (3D-RAM). 3D-ROM can be further divided into 3D mask programming read-only memory ( 3D-MPROM) and 3D electrical programming read only memory (3D-EPROM). Based on its programming mechanism, 3D-M can contain printed memory elements (see PCT application) PCT/CN2012/080895), memristor memory elements, resistive memory elements (RRAM or ReRAM), phase-change memory (PCM), programmable metallization memory (PMM), or conductive-bridging Random-access memory (CBRAM), etc.
美国专利 5,835,396 披露了一种 3D-M ,即 3D-ROM 。如图 1A 所示, 3D-M 芯片 20 含有一衬底层 0K 及多个堆叠于衬底层 0K 上并相互堆叠的存储层 16A 、 16B 。衬底层 0K 含有晶体管 0t 及其互连线 0i 。其中,晶体管 0t 形成在半导体衬底 0 中;互连线 0i 含有衬底金属层 0M1 、 0M2 ,它位于衬底 0 上方,但位于最低存储层 16A 下方。存储层(如 16A )通过接触通道孔(如 1av )与衬底层 0K 耦合。 U.S. Patent 5,835,396 discloses a 3D-M, 3D-ROM. As shown in Figure 1A, 3D-M The chip 20 includes a substrate layer 0K and a plurality of memory layers 16A, 16B stacked on the substrate layer 0K and stacked on each other. Substrate layer 0K contains transistor 0t and its interconnect 0i . Wherein transistor 0t is formed in semiconductor substrate 0; interconnect 0i contains substrate metal layers 0M1, 0M2 which are above substrate 0 but at the lowest memory level 16A Below. A memory layer (e.g., 16A) is coupled to the substrate layer 0K through contact via holes (e.g., 1av).
每个存储层(如 16A )含有多条顶地址线(如 2a )、底地址线(如 1a )和存储元(如 5aa )。存储元可以采用二极管、晶体管或别的器件。在各种存储元中,采用二极管的存储元尤其重要:其面积最小,仅为 4F2 ( F 为最小特征尺寸)。二极管存储元一般形成在顶地址线和底地址线的交叉点处,从而构成一交叉点( cross-point )阵列。这里,二极管泛指任何具有如下特征的二端器件:当其外加电压的数值小于读电压或外加电压的方向与读电压相反时,其电阻大于其在读电压下的电阻。二极管的例子包括半导体二极管(如 p-i-n 硅二极管等)和金属氧化物二极管(如氧化钛二极管、氧化镍二极管等)等。Each storage layer (such as 16A) contains multiple top address lines (such as 2a), bottom address lines (such as 1a), and storage elements (such as 5aa). The memory cells can be diodes, transistors or other devices. Among the various memory elements, a memory cell using a diode is especially important: its area is the smallest, only 4F 2 (F is the minimum feature size). Diode memory cells are typically formed at the intersection of the top address line and the bottom address line to form a cross-point array. Here, a diode generally refers to any two-terminal device having a characteristic that when its applied voltage is smaller than the read voltage or the applied voltage is opposite to the read voltage, its resistance is greater than its resistance at the read voltage. Examples of the diode include a semiconductor diode (such as a pin silicon diode) and a metal oxide diode (such as a titanium oxide diode, a nickel oxide diode, etc.).
存储层 16A 、 16B 构成至少一三维存储阵列 16 ,而衬底层 0K 则含有三维存储阵列 16 的周边电路。其中,一部分周边电路位于三维存储阵列下方,它们被称为阵列下周边电路;另一部分周边电路位于三维存储阵列外边,它们被称为阵列外周边电路 18 。由于阵列外周边电路 18 上方的空间 17 不含有存储元,该空间实际上被浪费了。 The storage layers 16A, 16B constitute at least one three-dimensional memory array 16 and the substrate layer 0K contains a three-dimensional memory array 16 Peripheral circuit. Wherein, some of the peripheral circuits are located under the three-dimensional memory array, which are referred to as the lower peripheral circuits of the array; and another part of the peripheral circuits are located outside the three-dimensional memory array, which are referred to as array peripheral circuits 18 . Since the space 17 above the array peripheral circuit 18 does not contain a memory cell, the space is actually wasted.
美国专利 7,388,476 披露了一种集成 3D-M 芯片 20 ,它能直接使用由主机提供的电源电压 23 ,并直接与主机交换地址 / 数据 27 。这里,主机是直接使用该芯片 20 的设备,主机使用的地址 / 数据 27 是逻辑地址 / 数据。 U.S. Patent No. 7,388,476 discloses an integrated 3D-M chip 20 which can directly use the power supply voltage supplied by the host 23 and exchange address/data directly with the host 27 . Here, the host is a device that directly uses the chip 20, and the address/data 27 used by the host is a logical address/data.
如图 1B 所示,集成 3D-M 芯片 20 含有一 3D-M 核心区域 22 和一中间电路区域 28 。 3D-M 核心区域 22 含有多个三维存储阵列(如 22aa 、 22ay )及其解码器(如 24 、 24G )。这些解码器 24 包括本地解码器( local decoder ) 24 和整体解码器( global decoder ) 24G 。其中,本地解码器 24 对单个三维存储阵列的地址 / 数据进行解码,整体解码器 24G 将整体地址 / 数据 25 解码至单个三维存储阵列中。注意到, 3D-M 核心区域 22 的地址 / 数据 25 是物理地址 / 数据。 As shown in FIG. 1B, the integrated 3D-M chip 20 includes a 3D-M core region 22 and an intermediate circuit region 28 . The 3D-M core area 22 contains multiple 3D storage arrays (such as 22aa, 22ay) and its decoders (such as 24, 24G). These decoders 24 include a local decoder ( Local decoder ) 24 and global decoder (24G). Where local decoder 24 addresses the address of a single 3D storage array / The data is decoded and the overall decoder 24G decodes the overall address/data 25 into a single three dimensional memory array. Note that the address/data 25 of the 3D-M core area 22 is the physical address. / Data.
中间电路区域 28 含有介于 3D-M 核心区域 22 和主机之间的中间电路。中间电路 28 为 3D-M 核心区域 22 与主机之间实现电压、数据、地址转换。例如,它将电源电压 23 转换成读电压 VR 或 / 和写(编程)电压 VW ,将逻辑地址 / 数据 27 与物理地址 / 数据 25 相互转换。中间电路 28 含有读 / 写电压产生器 21 和地址 / 数据转换器 29 。其中,读 / 写电压产生器 21 包括带隙基准电路(精确基准电压源) 21B 、读电压产生器 21R 和电荷泵 21W (参考美国专利 6,486,728 )。地址 / 数据转换器 29 包括错误检验和校正电路( ECC ) 29E 、页寄存器 29P 和智能写控制器 29W 等。 ECC 电路 29E 对从三维存储阵列中读出的数据进行 ECC 解码,同时进行错误检验和校正(参考美国专利 6,591,394 );页寄存器 29P 在主机和三维存储阵列之间起临时存储数据的功能,它还能对数据进行 ECC 编码(参考美国专利 8,223,525 );智能写控制器 29W 在编程过程中监控写错误,一旦写错误发生,则启动自修复机制以将数据写入到冗余行中(参考美国专利 7,219,271 )。现有技术的集成 3D-M 芯片 20 在芯片内部实现电压、数据、地址转换。一般说来,中间电路 28 是阵列外周边电路 18 。The intermediate circuit area 28 contains an intermediate circuit between the 3D-M core area 22 and the host. The intermediate circuit 28 implements voltage, data, and address conversion between the 3D-M core area 22 and the host. For example, it converts the supply voltage 23 into a read voltage V R or / and a write (program) voltage V W , converting the logical address / data 27 and the physical address / data 25 to each other. The intermediate circuit 28 includes a read/write voltage generator 21 and an address/data converter 29. Among them, the read/write voltage generator 21 includes a bandgap reference circuit (precise reference voltage source) 21B, a read voltage generator 21R, and a charge pump 21W (refer to US Pat. No. 6,486,728). The address/data converter 29 includes an error check and correction circuit (ECC) 29E, a page register 29P, and a smart write controller 29W. The ECC circuit 29E performs ECC decoding on the data read from the three-dimensional memory array while performing error checking and correction (refer to U.S. Patent No. 6,591,394); the page register 29P functions to temporarily store data between the host and the three-dimensional memory array, and it also functions. The data can be ECC encoded (refer to US Pat. No. 8,223,525); the intelligent write controller 29W monitors the write error during the programming process, and once the write error occurs, the self-repair mechanism is initiated to write the data into the redundant row (refer to the US patent) 7,219,271). The prior art integrated 3D-M chip 20 implements voltage, data, and address conversion inside the chip. In general, the intermediate circuit 28 is an array outer peripheral circuit 18.
技术问题technical problem
在现有技术的集成 3D-M 芯片 20 中,三维存储阵列与所有中间电路组件集成在一个芯片上。由于中间电路在 3D-M 芯片 20 中占用了大量芯片面积,集成 3D-M 芯片 20 具有较低的阵列效率。这里,阵列效率定义为总存储面积(即用于存储用户数据的芯片面积)和总芯片面积之比。在 3D-M 中,总存储面积 AM 是用于存储用户数据的存储元投影到芯片表面上的总面积,它可以表达为: AM = Ac*CL = (4F2)*C3D-M/N 。其中, Ac 为单个存储元所占的芯片面积, CL 是一个存储层所存储的数据量, F 是地址线的半周期, C3D-M 是 3D-M 的存储容量, N 是 3D-M 中所有存储层的数目。以下段落以两个 3D-M 为例,来计算其阵列效率。In the prior art integrated 3D-M chip 20, the three-dimensional memory array is integrated with all intermediate circuit components on one chip. Since the intermediate circuit occupies a large amount of chip area in the 3D-M chip 20, the integrated 3D-M chip 20 has a lower array efficiency. Here, the array efficiency is defined as the ratio of the total storage area (ie, the chip area for storing user data) to the total chip area. In 3D-M, the total storage area A M is the total area of the storage element for storing user data projected onto the surface of the chip, which can be expressed as: A M = A c * C L = (4F 2 ) * C 3D -M /N. Where A c is the chip area occupied by a single storage element, C L is the amount of data stored in one storage layer, F is the half cycle of the address line, C 3D-M is the storage capacity of 3D-M, and N is 3D- The number of all storage tiers in M. The following paragraphs take two 3D-M as examples to calculate their array efficiency.
第一个 3D-M 的例子是三维一次编程存储器( 3D-OTP )(参见 Crowley 等著《 512Mb PROM with 8 layers of antifuse/diode cells 》, 2003 年国际固态电路会议,图 16.4.5 )。该 3D-OTP 芯片的存储容量为 512Mb ,它含有 8 个存储层,并采用 0.25um 的生产工艺。其总存储面积为 (4*0.25um2)*512Mb/8 = 16mm2 。由于总芯片面积为 48.3mm2 ,该 3D-OTP 芯片的阵列效率为 ~33% 。The first example of 3D-M is 3D-on-a-chip memory (3D-OTP) (see Crowley et al., 512Mb PROM with 8 layers of antifuse/diode cells, 2003 International Solid State Circuits Conference, Figure 16.4.5). The 3D-OTP chip has a storage capacity of 512Mb and contains 8 memory layers and a 0.25um production process. Its total storage area is (4*0.25um 2 )*512Mb/8 = 16mm 2 . Since the total chip area is 48.3 mm 2 , the array efficiency of the 3D-OTP chip is ~33%.
第二个 3D-M 的例子是三维电阻式存储器( 3D-ReRAM )(参见 Liu 等著《 A 130.7mm2 2-Layer 32Gb ReRAM Memory Device in 24nm Technology 》, 2013 年国际固态电路会议,图 12.1.7 )。该 3D-ReRAM 芯片的存储容量为 32Gb ,它含有 2 个存储层,并采用 24nm 的生产工艺。其总存储面积为 (4*24nm2)*32Gb/2 = 36.8mm2 。由于总芯片面积为 130.7mm2 ,该 3D-ReRAM 芯片的阵列效率为 ~28% 。The second example of 3D-M is a three-dimensional resistive memory (3D-ReRAM) (see Liu et al., "A 130.7mm 2 2-Layer 32Gb ReRAM Memory Device in 24nm Technology", 2013 International Solid State Circuits Conference, Figure 12.1. 7). The 3D-ReRAM chip has a storage capacity of 32Gb and contains 2 memory layers and uses a 24nm production process. Its total storage area is (4*24nm 2 )*32Gb/2 = 36.8mm 2 . Since the total chip area is 130.7 mm 2 , the array efficiency of the 3D-ReRAM chip is ~28%.
集成电路的主流观点认为:集成降低成本。不幸的是,该观点并非放之四海皆准,它在 3D-M 中并不成立。由于中间电路以前端工艺为重,而三维存储阵列以后端工艺为重且其生产成本比中间电路高昂,因此盲目地将中间电路和三维存储阵列集成的后果就是不得不用制造三维存储阵列的昂贵工艺流程来制造中间电路,这不仅不能降低成本,反而会增加成本。此外,由于中间电路只能采用与三维存储阵列同样数目的金属层(如仅为两层),故中间电路的设计比较麻烦,其所需的芯片面积较大。另外,由于 3D-M 存储元一般会经过高温工艺,中间电路需要采用耐高温的互连线材料,如钨( W )等,这些材料导电性能一般较差,故而会使 3D-M 的整体性能下降。 The mainstream view of integrated circuits is that integration reduces costs. Unfortunately, this view is not universal, it is in 3D-M Not in the middle. Since the intermediate circuit is weighted by the front-end process, and the rear-end process of the three-dimensional memory array is heavy and its production cost is higher than that of the intermediate circuit, the consequence of blindly integrating the intermediate circuit and the three-dimensional memory array is that the expensive process for manufacturing the three-dimensional memory array has to be used. The process of manufacturing intermediate circuits not only does not reduce costs, but increases costs. In addition, since the intermediate circuit can only use the same number of metal layers as the three-dimensional memory array (for example, only two layers), the design of the intermediate circuit is cumbersome, and the required chip area is large. In addition, due to 3D-M memory cells are generally subjected to high-temperature processes, and intermediate circuits require high-temperature interconnect materials such as tungsten (W). These materials generally have poor electrical conductivity, which makes 3D-M The overall performance is degraded.
技术解决方案Technical solution
本发明遵从如下指导原则:将三维电路和二维电路分离到不同芯片,以便将它们分别优化;为了提高阵列效率,应尽量避免在三维阵列芯片中转换电压、地址和数据。相应地,本发明提出一种含有中间电路芯片的分离三维存储器(分离 3D-M ),它含有至少一三维阵列芯片(三维电路)和至少一中间电路芯片(二维电路)。三维阵列芯片构建在三维空间中并含有多个功能层(即存储层),这些存储层一般不含晶体管;中间电路芯片构建在二维空间中并只含有一个功能(模拟、数字)层,它主要通过晶体管完成其功能。将三维存储电路和二维中间电路分离到不同芯片中可以对它们分别优化。由于三维阵列芯片含有较少中间电路组件,故其阵列效率可以大于 40 %。如果三维阵列芯片不含读 / 写电压产生器和地址 / 数据转换器,则其阵列效率可以很容易地超过 40 %,甚至达到 ~60 %。分离 3D-M 支持多个三维阵列芯片,它可以用于大容量 3D-M 存储卡和 3D-M 固态硬盘。 The present invention follows the guiding principle of separating three-dimensional circuits and two-dimensional circuits into different chips in order to optimize them separately; in order to improve array efficiency, voltage, address and data should be avoided in a three-dimensional array chip. Accordingly, the present invention proposes a separate three-dimensional memory containing an intermediate circuit chip (separation 3D-M ), it contains at least one three-dimensional array chip (three-dimensional circuit) and at least one intermediate circuit chip (two-dimensional circuit). The three-dimensional array chip is constructed in a three-dimensional space and contains a plurality of functional layers (ie, storage layers), which generally do not contain transistors; the intermediate circuit chip is constructed in a two-dimensional space and contains only one functional (analog, digital) layer. Mainly through the transistor to complete its function. Separating the three-dimensional memory circuit and the two-dimensional intermediate circuit into different chips can be optimized separately. Since the three-dimensional array chip contains fewer intermediate circuit components, its array efficiency can be greater than 40%. If the 3D array chip does not include a read/write voltage generator and an address/data converter, its array efficiency can easily exceed 40% or even reach ~60%. Separation 3D-M Support for multiple 3D array chips, which can be used for high-capacity 3D-M memory cards and 3D-M solid state drives.
由于中间电路芯片可以采用独立的、廉价工艺流程来制造,其晶片成本比三维阵列芯片低很多。因此对于相同的存储容量,分离 3D-M 的总成本低于集成 3D-M 。此外,由于中间电路芯片中金属层的数目不再受三维阵列芯片的限制,它可以含有更多的金属层(如从两层金属增加到四层金属),因此其上的中间电路组件(如读 / 写电压产生器、地址 / 数据转换器)的设计更为简单,而且所需的芯片面积更小。另外,由于中间电路芯片不需要经过高温工艺,其互连线可以使用高速互连线材料,如铜( Cu )等,这些材料可以提高 3D-M 的整体性能。 Since the intermediate circuit chip can be fabricated using a separate, inexpensive process flow, the cost of the wafer is much lower than that of the three-dimensional array chip. So for the same storage capacity, the total cost of separating 3D-M is lower than the integrated 3D-M . In addition, since the number of metal layers in the intermediate circuit chip is no longer limited by the three-dimensional array chip, it can contain more metal layers (such as from two layers of metal to four layers of metal), so the intermediate circuit components thereon (such as Read / The design of the write voltage generator, address/data converter is simpler and requires a smaller chip area. In addition, since the intermediate circuit chip does not need to undergo a high temperature process, its interconnects can use high speed interconnect materials such as copper ( Cu), etc., these materials can improve the overall performance of 3D-M.
中间电路组件包括读 / 写电压产生器和地址 / 数据转换器。在一实施例中,这些中间电路组件集成在同一中间电路芯片中,这样可以保证三维阵列芯片具有较高的阵列效率,且降低中间电路芯片的封装成本。在另一实施例中,这些组件也可以分离到不同芯片中。这意味着三维存储电路(三维存储阵列)、二维模拟电路(读 / 写电压产生器)和二维数字电路(地址 / 数据转换器)分离到不同芯片中,且可以采用不同的工艺流程将它们的性能分别优化:对三维阵列芯片进行存储性能优化,对读 / 写电压产生器芯片进行模拟性能优化,而对地址 / 数据转换器进行数字性能优化。 Intermediate circuit components include read/write voltage generators and addresses / Data converter. In an embodiment, the intermediate circuit components are integrated in the same intermediate circuit chip, so that the three-dimensional array chip can ensure high array efficiency and reduce the packaging cost of the intermediate circuit chip. In another embodiment, these components can also be separated into different chips. This means three-dimensional storage circuit (three-dimensional storage array), two-dimensional analog circuit (read / Write voltage generator) and two-dimensional digital circuit (address / data converter) are separated into different chips, and their performance can be optimized by different process flows: storage performance optimization of three-dimensional array chip, read / Write voltage generator chip for analog performance optimization, and digital performance optimization for address / data converter.
有益效果Beneficial effect
本发明的主要有益效果是提供一种更为廉价的三维存储器( 3D-M )。 The main advantageous effect of the present invention is to provide a more inexpensive three-dimensional memory (3D-M).
本发明的另一有益效果是提供一种性能优异的 3D-M 。 Another advantageous effect of the present invention is to provide a 3D-M which is excellent in performance.
本发明的另一有益效果是提高三维阵列芯片的阵列效率。 Another benefit of the present invention is to increase the array efficiency of the three-dimensional array chip.
附图说明DRAWINGS
图 1A 是一种现有技术中三维存储器( 3D-M )的截面图;图 1B 是一种集成 3D-M 芯片(现有技术)的系统构架。 1A is a cross-sectional view of a prior art three-dimensional memory (3D-M); FIG. 1B is an integrated 3D-M The system architecture of the chip (prior art).
图 2A -图 2H 是八种含有中间电路芯片的分离 3D-M 之电路框图。 Figure 2A - Figure 2H are block diagrams of eight separate 3D-Ms with intermediate circuit chips.
图 3A 是一种分离 3D-M 中三维阵列芯片的截面图;图 3B 是其中间电路芯片的截面图。 Figure 3A is a cross-sectional view of a three-dimensional array chip in a separate 3D-M; Figure 3B is a cross-sectional view of a circuit chip in between.
图 4A -图 4C 是三种分离 3D-M 的截面图。 Figure 4A - Figure 4C are cross-sectional views of three separate 3D-M.
图 5A -图 5C 是三种读 / 写电压产生器的电路图。 Figures 5A-5C are circuit diagrams of three read/write voltage generators.
图 6A -图 6B 是两种地址 / 数据转换器的电路框图。 Figure 6A - Figure 6B are circuit block diagrams of two address/data converters.
注意到,这些附图仅是概要图,它们不按比例绘图。为了显眼和方便起见,图中的部分尺寸和结构可能做了放大或缩小。在不同实施例中,相同的符号一般表示对应或类似的结构。 It is noted that the drawings are only schematic and are not drawn to scale. In order to be conspicuous and convenient, some of the dimensions and structures in the figures may be enlarged or reduced. In the different embodiments, the same symbols generally indicate corresponding or similar structures.
本发明的实施方式Embodiments of the invention
在本发明中,' / '表示'和'或'或'的关系。例如,读 / 写电压产生器表示它可以只产生读电压、或只产生写电压、或同时产生读电压和写电压;地址 / 数据转换器表示它可以只转换地址、或只转换数据、或同时转换地址和电压。 In the present invention, ' / ' denotes a relationship between 'and' or 'or'. For example, read / The write voltage generator indicates that it can generate only the read voltage, or only the write voltage, or both the read voltage and the write voltage; address / A data converter means that it can convert only addresses, or just convert data, or both address and voltage.
在本发明中,中间电路是指介于 3D-M 核心区域和主机之间的电路,它在主机和 3D-M 核心区域之间实现电压、地址或 / 和数据转换。例如,它将来自主机的外部电压(即电源电压 VDD )、外部地址(即逻辑地址)和外部数据(即逻辑数据)转换成 3D-M 核心区域的内部电压(即读电压 VR 和写电压 VW )、内部地址(即物理地址)和内部数据(即物理数据)。中间电路组件包括读 / 写电压产生器和地址 / 数据转换器。In the present invention, the intermediate circuit refers to a circuit between the 3D-M core area and the host that implements voltage, address or/and data conversion between the host and the 3D-M core area. For example, it converts the external voltage (ie, supply voltage V DD ) from the host, the external address (ie, the logical address), and the external data (ie, the logical data) into the internal voltage of the 3D-M core region (ie, the read voltage V R and write Voltage V W ), internal address (ie physical address) and internal data (ie physical data). The intermediate circuit components include a read/write voltage generator and an address/data converter.
图 2A -图 2H 表示八种含有中间电路芯片的分离三维存储器(分离 3D-M ) 50 。这些实施例均含有至少一三维阵列芯片(三维电路)和至少一中间电路芯片(二维电路)。其中,三维阵列芯片构建在三维空间中并含有多个功能(存储)层,中间电路芯片构建在二维空间中并只含有一个功能(模拟、数字)层。将三维存储电路和二维中间电路分离到不同芯片中可以对它们分别优化。 Figure 2A - Figure 2H show eight separate three-dimensional memories (separated 3D-M) with intermediate circuit chips 50 . Each of these embodiments includes at least one three-dimensional array chip (three-dimensional circuit) and at least one intermediate circuit chip (two-dimensional circuit). Among them, the three-dimensional array chip is constructed in a three-dimensional space and contains a plurality of functional (storage) layers, and the intermediate circuit chip is constructed in a two-dimensional space and contains only one functional (analog, digital) layer. Separating the three-dimensional memory circuit and the two-dimensional intermediate circuit into different chips can be optimized separately.
分离 3D-M 50 包括一能与各种主机实现物理连接、并按照一种通讯标准通讯的接口 52 。接口 52 包括多个接触端 52x 、 52y 、 52a - 52b ,它们能与主机插口对应的接触端耦合。例如,主机分别通过电源端 52x 和接地端 52y 为分离 3D-M 50 提供电源电压 VDD 和接地电压 VSS ;主机并通过信号端 52a - 52d 与分离 3D-M 50 交换地址 / 数据。由于这些地址 / 数据直接被主机使用,它们是逻辑地址 / 数据。The split 3D-M 50 includes an interface 52 that can physically interface with various hosts and communicate in accordance with a communication standard. The interface 52 includes a plurality of contact ends 52x, 52y, 52a-52b that are coupled to corresponding contact ends of the host jack. For example, the host provides a supply voltage V DD and a ground voltage V SS for the split 3D-M 50 through the power supply terminal 52x and the ground terminal 52y, respectively; the host exchanges address/data with the separate 3D-M 50 via the signal terminals 52a - 52d. Since these addresses/data are used directly by the host, they are logical addresses/data.
图 2A 中的分离 3D-M 50 是一 3D-M 存储卡。它含有一单独的三维阵列芯片(三维电路) 30 和一单独的中间电路芯片(二维电路) 40 。三维阵列芯片 30 含有如图 1B 中的 3D-M 核心区域 22 ,它含有多个三维存储阵列(如 22aa 、 22ay )及其解码器(如 24 、 24G )。三维阵列芯片 30 还含有一地址 / 数据转换器 47 ,该地址 / 数据转换器 47 将主机的逻辑地址 / 数据与 3D-M 核心区域 22 的物理地址 / 数据相互转换。中间电路芯片 40 含有一读 / 写电压产生器 41 ,该读 / 写电压产生器 41 从主机处获取电源电压 VDD ,将其转换成读 / 写电压,并通过电源总线 56 向三维阵列芯片 30 提供该读 / 写电压。这里,读 / 写电压可以是仅为读电压 VR 、或仅为写电压 VW 、或同时为读电压 VR 和写电压 VW ,它与电源电压 VDD 具有不同的数值。在本实施例中,读 / 写电压包括一个读电压 VR 和两个写电压 VW1 、 VW2 。在别的实施例中,读 / 写电压可以包括不止一个读电压或两个写电压。由于三维阵列芯片 30 不含读 / 写电压产生器 41 ,其阵列效率可以大于 40 %。The split 3D-M 50 in Figure 2A is a 3D-M memory card. It contains a separate three-dimensional array chip (three-dimensional circuit) 30 and a separate intermediate circuit chip (two-dimensional circuit) 40 . The three-dimensional array chip 30 contains a 3D-M core region 22 as in Figure 1B, which contains a plurality of three-dimensional memory arrays (e.g., 22aa, 22ay) and decoders thereof (e.g., 24, 24G). The three-dimensional array chip 30 also includes an address/data converter 47 that converts the logical address/data of the host and the physical address/data of the 3D-M core area 22 to each other. The intermediate circuit chip 40 includes a read/write voltage generator 41 that takes the power supply voltage V DD from the host, converts it into a read/write voltage, and transmits it to the three-dimensional array chip 30 through the power bus 56. This read/write voltage is supplied. Here, the read/write voltage may be only the read voltage V R , or only the write voltage V W , or both the read voltage V R and the write voltage V W , which have different values from the power supply voltage V DD . In this embodiment, the read/write voltage includes a read voltage V R and two write voltages V W1 , V W2 . In other embodiments, the read/write voltage can include more than one read voltage or two write voltages. Since the three-dimensional array chip 30 does not include the read/write voltage generator 41, its array efficiency can be greater than 40%.
图 2B 中的分离 3D-M 50 也是一 3D-M 存储卡。与图 2A 类似,其中间电路芯片 40* 含有一地址 / 数据转换器 47 ,该地址 / 数据转换器 47 含有地址转换器 43 和数据转换器 45 。其中,地址转换器 43 将外部总线 54 (包括来自接触端 52a - 52d 上的信号)上的逻辑地址与内部总线 58 上的物理地址相互转换;数据转换器 45 将外部总线 54 上的逻辑数据与内部总线 58 上的物理数据相互转换。这里,地址 / 数据转换器 47 可以仅实现地址转换、或仅实现数据转换、或同时实现地址和数据转换。由于三维阵列芯片 30 不含地址 / 数据转换器 47 ,其阵列效率可以大于 40 %。 The split 3D-M 50 in Figure 2B is also a 3D-M memory card. Similar to Figure 2A, the intermediate circuit chip 40* An address/data converter 47 is included, and the address/data converter 47 includes an address translator 43 and a data converter 45. Where address translator 43 will be the external bus 54 The logical address on the internal bus 58 (including the signals from the contacts 52a - 52d) is converted to the physical address on the internal bus 58; the data converter 45 takes the logical data on the external bus 54 to the internal bus The physical data on 58 is converted to each other. Here, the address/data converter 47 can implement only address translation, or only data conversion, or both address and data conversion. Since the 3D array chip 30 does not contain an address / Data Converter 47, whose array efficiency can be greater than 40%.
图 2C 中的分离 3D-M 50 也是一 3D-M 存储卡。与图 2A 和图 2B 类似,其中间电路芯片 40 含有一读 / 写电压产生器 41 和一地址 / 数据转换器 47 。换句话说,读 / 写电压产生器 41 和地址 / 数据转换器 47 集成在同一中间电路芯片 40 中。由于三维阵列芯片 30 不含地址 / 数据转换器和读 / 写电压发生器,其阵列效率可以很容易地超过 40 %,甚至达到 ~60 %。将读 / 写电压产生器 41 和地址 / 数据转换器 47 集成到同一中间电路芯片 40 中可以保证三维阵列芯片 30 具有较高的阵列效率,且降低中间电路芯片 40 的封装成本。 The separation 3D-M 50 in Figure 2C is also a 3D-M memory card. With Figure 2A and Figure 2B Similarly, the intermediate circuit chip 40 includes a read/write voltage generator 41 and an address/data converter 47. In other words, the read/write voltage generator 41 and the address/data converter 47 is integrated in the same intermediate circuit chip 40. Since the 3D array chip 30 does not include an address/data converter and a read/write voltage generator, its array efficiency can easily exceed 40% or even reach ~60%. Integrating the read/write voltage generator 41 and the address/data converter 47 into the same intermediate circuit chip 40 ensures the three-dimensional array chip 30 It has higher array efficiency and lowers the packaging cost of the intermediate circuit chip 40.
图 2D 中的分离 3D-M 50 也是一 3D-M 存储卡。与图 2C 的差别是,读 / 写电压产生器 41 和地址 / 数据转换器 47 分离到不同中间电路芯片 40 、 40* 中。在该实施例中,三维存储电路(三维阵列芯片 30 )、二维模拟电路(读 / 写电压产生器 41 )和二维数字电路(地址 / 数据转换器 47 )进一步分离到不同芯片 30 、 40 、 40* 中,这样可以采用不同的工艺流程将它们的性能分别优化:对三维阵列芯片 30 进行存储性能优化,对读 / 写电压产生器芯片 40 进行模拟性能优化,而对地址 / 数据转换器 40* 进行数字性能优化。由于三维阵列芯片 30 不含读 / 写电压产生器 41 和地址 / 数据转换器 47 ,其阵列效率可以很容易地超过 40 %,甚至达到 ~60 %。 The split 3D-M 50 in Figure 2D is also a 3D-M memory card. The difference with Figure 2C is that read / The write voltage generator 41 and the address/data converter 47 are separated into different intermediate circuit chips 40, 40*. In this embodiment, a three-dimensional memory circuit (three-dimensional array chip 30) ), a two-dimensional analog circuit (read/write voltage generator 41) and a two-dimensional digital circuit (address/data converter 47) are further separated into different chips 30, 40, 40* In this way, different performances can be optimized by different processes: storage performance optimization of the three-dimensional array chip 30, simulation performance optimization of the read/write voltage generator chip 40, and address/ Data Converter 40* for digital performance optimization. Since the three-dimensional array chip 30 does not include the read/write voltage generator 41 and the address/data converter 47, its array efficiency can easily exceed 40. %, even up to ~60%.
由于中间电路芯片(包括读 / 写电压产生器芯片 40 和地址 / 数据转换器芯片 40* )可以采用独立的、廉价工艺流程来制造,其晶片成本比三维阵列芯片 30 低很多。作为一个简单的估算,假如中间电路芯片 40 、 40* 的晶片成本是三维阵列芯片 30 的一半,且阵列效率由集成 3D-M 芯片 20 的 30 %提高到三维阵列芯片 30 的 40 %(如图 2A -图 2B ),那么对于相同的存储容量,分离 3D-M 50 的总成本是集成 3D-M 20 的 ~88% ;如果阵列效率提高到 60 %(如图 2C -图 2D ),那么分离 3D-M 50 的总成本仅为集成 3D-M 20 的 ~75% 。 Due to the intermediate circuit chip (including the read/write voltage generator chip 40 and the address/data converter chip 40*) It can be manufactured in a separate, inexpensive process flow, and its wafer cost is much lower than that of the three-dimensional array chip 30. As a simple estimate, if the intermediate circuit chip 40, 40* wafer cost is a three-dimensional array chip Half of 30, and the array efficiency is increased from 30% of the integrated 3D-M chip 20 to 40% of the 3D array chip 30 (Figure 2A - Figure 2B) ), then for the same storage capacity, the total cost of separating the 3D-M 50 is ~88% of the integrated 3D-M 20; if the array efficiency is increased to 60% (Figure 2C - Figure 2D) ), then the total cost of separating the 3D-M 50 is only ~75% of the integrated 3D-M 20.
图 2E 中的的分离 3D-M 50 也是一 3D-M 存储卡。与图 2C 不同之处是,三维阵列芯片 30 还含有一串行器-解串器( Ser-Des ) 49 ,它将三维阵列芯片 30 内部的并行数字信号(如地址 / 数据 / 指令 / 状态等)转换成其外部的串行数字信号 58' ;地址 / 数据转换器芯片 40* 还含有第二串行器-解串器( Ser-Des ) 49* ,它将地址 / 数据转换器芯片 40* 内部的并行数字信号(如地址 / 数据 / 指令 / 状态等)转换成其外部的串行数字信号 58' 。通过对数字信号串行化,图 2E 中三维阵列芯片 30 和地址 / 数据转换器芯片 40* 之间连接线 58' (如引线、焊球)的数目少于图 2C 中连接线 58 的数目,这可以帮助降低封装成本。 The split 3D-M 50 in Figure 2E is also a 3D-M memory card. The difference from Figure 2C is that the three-dimensional array chip 30 also includes a serializer-deserializer (Ser-Des) 49 that will parallel digital signals within the three-dimensional array chip 30 (eg, address/data/instructions/ State, etc.) is converted to its external serial digital signal 58'; the address/data converter chip 40* also contains a second serializer-deserializer (Ser-Des) 49* which will address / The parallel digital signal (such as address/data/instruction/status, etc.) inside the data converter chip 40* is converted into its external serial digital signal 58'. By serializing the digital signal, Figure 2E The number of connecting wires 58' (such as leads, solder balls) between the middle three-dimensional array chip 30 and the address/data converter chip 40* is less than the connecting line in Fig. 2C. The number of this can help reduce packaging costs.
图 2F 中的的分离 3D-M 50 也是一 3D-M 存储卡。与图 2E 类似,它在图 2D 中的三维阵列芯片 30 中增加了第一串行器-解串器( Ser-Des ) 49 ,在中间电路芯片 40 中增加了第二串行器-解串器 49* 。这样,图 2F 中三维阵列芯片 30 和中间电路芯片 40 之间连接线 58' 的数目少于图 2D 中连接线 58 的数目,这可以帮助降低封装成本。 The split 3D-M 50 in Figure 2F is also a 3D-M memory card. Similar to Figure 2E, it is in Figure 2D A first serializer-deserializer (Ser-Des) 49 is added to the three-dimensional array chip 30, and a second serializer-deserializer 49* is added to the intermediate circuit chip 40. Thus, Figure 2F The number of connection lines 58' between the middle three-dimensional array chip 30 and the intermediate circuit chip 40 is less than the number of connection lines 58 in Fig. 2D, which can help reduce packaging costs.
图 2G 中的分离 3D-M 50 是一大容量 3D-M 存储卡或一 3D-M 固态硬盘。它含有一中间电路芯片 40 和多个三维阵列芯片 30a 、 30b… 30w 。中间电路芯片 40 含有多个读 / 写电压产生器 41a 、 41b… 41w 和多个地址 / 数据转换器 47a 、 47b… 47w 。每个读 / 写电压产生器(如 41a )为一个三维阵列芯片(如 30a )提供读电压或 / 和写电压;每个地址 / 数据转换器(如 47a )为一个三维阵列芯片(如 30a )进行地址或 / 和数据转换。三维阵列芯片 30a 、 30b… 30w 组成两个通道: A 和 B 。通道 A 中,来自中间电路芯片 40 的内部总线 58A 为三维阵列芯片 30a 、 30b… 30i 提供物理地址 / 数据;通道 B 中,来自中间电路芯片 40 的的内部总线 58B 为三维阵列芯片 30r 、 30s… 30w 提供物理地址 / 数据。同时,来自中间电路芯片 40 的电源总线 56 为维阵列芯片 30a 、 30b… 30w 提供读 / 写电压。虽然本实施例仅有两个通道,对于熟悉本专业的人士来说,大容量 3D-M 存储卡和 3D-M 固态硬盘可以含有更多通道。 The separation in Figure 2G 3D-M 50 is a large capacity 3D-M memory card or a 3D-M SSD. It contains an intermediate circuit chip 40 and a plurality of three- dimensional array chips 30a, 30b... 30w. The intermediate circuit chip 40 includes a plurality of read/ write voltage generators 41a, 41b... 41w and multiple address / data converters 47a, 47b... 47w. Each read/write voltage generator (such as 41a) is a three-dimensional array chip (such as 30a) Providing read voltage or / and write voltage; each address / data converter (such as 47a) performs address or / and data conversion for a three-dimensional array chip (such as 30a). Three- dimensional array chip 30a, 30b... 30w makes up two channels: A and B. In channel A, the internal bus 58A from the intermediate circuit chip 40 is a three- dimensional array chip 30a, 30b... 30i The physical address/data is provided; in channel B, the internal bus 58B from the intermediate circuit chip 40 provides physical addresses for the three- dimensional array chips 30r, 30s... 30w / Data. At the same time, the power bus 56 from the intermediate circuit chip 40 provides read for the dimensional array chips 30a, 30b...30w / Write voltage. Although this embodiment has only two channels, a large-capacity 3D-M memory card and a 3D-M solid state hard disk can contain more channels for those skilled in the art.
图 2H 中的分离 3D-M 50 也是一大容量 3D-M 存储卡或一 3D-M 固态硬盘。与图 2G 的差别是,读 / 写电压产生器 41a 、 41b… 41w 和地址 / 数据转换器 47a 、 47b… 47w 分离到不同中间电路芯片 40 、 40* 中。与图 2D 类似,该实施例将三维存储电路(三维阵列芯片 30a 、 30b… 30w )和二维模拟电路(读 / 写电压产生器芯片 40 )、二维数字电路(地址 / 数据转换器芯片 40* )分离到不同芯片中,这样可以采用不同的工艺流程将它们的性能分别优化。 Separation in Figure 2H The 3D-M 50 is also a large capacity 3D-M memory card or a 3D-M solid state drive. With Figure 2G The difference is that the read/ write voltage generators 41a, 41b... 41w and the address/ data converters 47a, 47b... 47w are separated into different intermediate circuit chips 40, 40* Medium. Similar to FIG. 2D, this embodiment will have three-dimensional memory circuits (three- dimensional array chips 30a, 30b...30w) and two-dimensional analog circuits (read/write voltage generator chip 40). ), the two-dimensional digital circuit (address/data converter chip 40*) is separated into different chips, so that their performance can be optimized separately by different processes.
图 3A -图 3B 是分离 3D-M 50 中三维阵列芯片 30 和中间电路芯片 40 (包括 40* )的截面图。在图 3A 中的三维阵列芯片 30 形成在三维空间中,并含有多个功能层,包括衬底层 0K 和存储层 16A 、 16B 。衬底层 0K 含有晶体管 0t 及其互连线 0iA 。晶体管 0t 形成在三维阵列衬底 0A 上,互连线 0iA 包括两个衬底金属层 0M1 、 0M2 。为了适应制造存储元(如 5aa )所需的高温工艺,衬底金属层 0M1 、 0M2 最好采用高温互连线材料,如钨( W )等。 3A-3B are separated 3D array chip 30 and intermediate circuit chip 40 in 3D-M 50 (including 40*) section view. The three-dimensional array chip 30 in Fig. 3A is formed in a three-dimensional space and contains a plurality of functional layers including a substrate layer 0K and memory layers 16A, 16B. Substrate layer 0K Contains transistor 0t and its interconnect 0iA. The transistor 0t is formed on the three-dimensional array substrate 0A, and the interconnection 0iA includes two substrate metal layers 0M1, 0M2 . In order to accommodate the high temperature process required to fabricate memory cells (e.g., 5aa), the substrate metal layers 0M1, 0M2 are preferably made of a high temperature interconnect material such as tungsten (W).
存储层 16A 、 16B 含有多条地址线(如 2a 等)和多个存储元(如 5aa 等)。每个存储元可以含有以下元件中的至少一种,如印录存储元件(参见 PCT 申请 PCT/CN2012/080895 )、 memristor 存储元件、电阻式存储元件( RRAM 或 ReRAM )、 phase-change memory ( PCM )、 programmable metallization memory ( PMM )、或 conductive-bridging random-access memory ( CBRAM )等。这些元件一般与二极管或似二极管元件(即类似于二极管的元件)结合来实现存储阵列。为了降低成本,存储层 16A 、 16B 不含晶体管或似晶管元件(即类似于晶体管的元件)。当然,由于存储层中不含似晶体管元件,存储层 16A 、 16B 所需的模拟功能(如信号放大)和数字功能(如地址解码)都在衬底层 0K 中实现。  Storage layers 16A and 16B contain multiple address lines (such as 2a, etc.) and multiple storage elements (such as 5aa). Wait). Each memory element can contain at least one of the following components, such as a printed storage element (see PCT application PCT/CN2012/080895), memristor Storage element, resistive storage element (RRAM or ReRAM), phase-change memory (PCM), programmable Metallization memory ( PMM ), or conductive-bridging random-access memory ( CBRAM )Wait. These components are typically combined with diode or diode-like components (ie, diode-like components) to implement a memory array. In order to reduce costs, storage layers 16A, 16B There are no transistor or transistor-like components (ie, transistors-like components). Of course, since the memory layer does not contain transistor-like components, the memory layers 16A, 16B The required analog functions (such as signal amplification) and digital functions (such as address decoding) are implemented in the substrate layer 0K.
图 3B 中的中间电路芯片 40 形成在二维空间中,并只含有一个功能层,即衬底层 0K '。 衬底层 0K '包括晶体管 0t 及其互连线 0iB 。晶体管 0t 形成在中间电路衬底 0B 上,互连线 0iB 包括四个金属层 0M1' - 0M4' 。 由于三维阵列芯片 30 和中间电路芯片 40 为两个单独芯片,中间电路芯片 40 可以采用独立的、廉价工艺流程来制造,而非采用昂贵的、制造三维阵列芯片 30 的工艺来制造。因此,中间电路芯片 40 的晶片成本比三维阵列芯片 30 低很多。 The intermediate circuit chip 40 in Fig. 3B is formed in a two-dimensional space and contains only one functional layer, that is, the substrate layer 0K'. Substrate layer 0K 'includes transistor 0t and its interconnect 0iB. The transistor 0t is formed on the intermediate circuit substrate 0B, and the interconnection 0iB includes four metal layers 0M1' - 0M4'. Since the three-dimensional array chip 30 and the intermediate circuit chip 40 are two separate chips, the intermediate circuit chip 40 can be fabricated in an independent, inexpensive process flow instead of using an expensive, three-dimensional array chip. The craft to manufacture. Therefore, the wafer cost of the intermediate circuit chip 40 is much lower than that of the three-dimensional array chip 30.
由于是一个单独芯片,中间电路芯片 40 可以比集成 3D-M 芯片 20 具有更多的金属层(如从两层金属增加到四层金属),因此其上的中间电路组件(如读 / 写电压产生器、地址 / 数据转换器)的设计更为简单,且所需的芯片面积要小。此外,由于中间电路芯片 40 的金属层 0M1' - 0M4' 不需要经历高温工艺,其互连线 0iB 可以采用高性能互连线材料,如铜( Cu )。这些材料可以提高中间电路芯片 40 的功能,也能相应地提高 3D-M 的整体性能。 Since it is a single chip, the intermediate circuit chip 40 can be integrated with the 3D-M chip 20 There are more metal layers (such as from two layers of metal to four layers of metal), so the intermediate circuit components on it (such as read / write voltage generator, address / The data converter is designed to be simpler and requires a smaller chip area. In addition, since the metal layer 0M1' - 0M4' of the intermediate circuit chip 40 does not need to undergo a high temperature process, its interconnection 0iB High performance interconnect materials such as copper (Cu) can be used. These materials can improve the functionality of the intermediate circuit chip 40 and can also improve the overall performance of the 3D-M.
图 4A -图 4C 是三种分离 3D-M 50 的截面图。图 4A -图 4B 中的分离 3D-M 50 是一种多芯片封装( MCP )。其中,图 4A 中的 3D-M 多芯片封装 50 含有两个单独的芯片:一三维阵列芯片 30 和一中间电路芯片 40 。芯片 30 、 40 堆叠在一封装衬底( interposer ) 53 上并位于同一封装壳 51 中。引线( bond wire ) 55 为芯片 30 、 40 提供电连接。除了引线,还可以采用焊球( solder bump )等。为了保证数据安全,芯片 30 、 40 最好封装在一模塑料( molding compound ) 57 内。在本实施例中,三维阵列芯片 30 堆叠在中间电路芯片 40 上。在其它实施例中,中间电路芯片 40 可以堆叠在三维阵列芯片 30 上,或三维阵列芯片 30 与中间电路芯片 40 面对面地堆叠在一起,或三维阵列芯片 30 和中间电路芯片 40 并列放置。该 3D-M 多芯片封装 50 可以使用图 2A -图 2F 中的电路框图。 4A-4C are cross-sectional views of three separate 3D-M 50s. Figure 3A - Figure 4B Separation 3D-M 50 is a multi-chip package (MCP). The 3D-M multi-chip package 50 of FIG. 4A contains two separate chips: a three-dimensional array chip 30 and an intermediate circuit chip 40. . The chips 30, 40 are stacked on an interposer 53 and located in the same package 51. The lead wire 55 is the chip 30 , 40 provides electrical connection. In addition to the leads, solder bumps and the like can also be used. In order to ensure data security, the chips 30, 40 are preferably packaged in a molding compound (molding) Compound ) 57 inside. In the present embodiment, the three-dimensional array chip 30 is stacked on the intermediate circuit chip 40. In other embodiments, the intermediate circuit chip 40 can be stacked on a three-dimensional array chip. 30, or the three-dimensional array chip 30 is stacked face-to-face with the intermediate circuit chip 40, or the three-dimensional array chip 30 and the intermediate circuit chip 40 are juxtaposed. The 3D-M multi-chip package 50 The circuit block diagram in Figure 2A - Figure 2F can be used.
图 4B 中的 3D-M 多芯片封装 50 含有至少两个三维阵列芯片 30a 、 30b 和一中间电路芯片 40 。这些芯片 30a 、 30b 和 40 是三个单独的芯片。它们位于同一封装壳 51 中。其中,三维阵列芯片 30a 堆叠在三维阵列芯片 30b 之上,三维阵列芯片 30b 堆叠在中间电路芯片 40 之上。引线 55 为芯片 30a 、 30b 和 40 提供电连接。该 3D-M 多芯片封装 50 可以使用图 2G -图 2H 中的电路框图。 The 3D-M multi-chip package 50 in Figure 4B contains at least two three- dimensional array chips 30a, 30b And an intermediate circuit chip 40. These chips 30a, 30b and 40 are three separate chips. They are located in the same package 51. Wherein, the three-dimensional array chip 30a Stacked on the three-dimensional array chip 30b, the three-dimensional array chip 30b is stacked on the intermediate circuit chip 40. Lead 55 provides electrical connections for chips 30a, 30b, and 40. The 3D-M Multi-Chip Package 50 The circuit block diagram in Figure 2G - Figure 2H can be used.
图 4C 中的分离 3D-M 是一 3D-M 多芯片组件( MCM ) 50* ,它含有一个框架 66 。该框架 66 含有两个单独的封装:三维阵列封装 62 和中间电路封装 64 。其中,三维阵列封装 62 含有两个三维阵列芯片 30a 、 30b ,而中间电路封装 64 含有中间电路芯片 40 。框架 66 还为三维阵列封装 62 和中间电路封装 64 提供电连接(此处未画出)。该 3D-M 多芯片组件 50* 可以使用图 2G -图 2H 中的电路框图。 The split 3D-M in Figure 4C is a 3D-M Multi-Chip Component (MCM) 50* with a frame 66 . The frame 66 contains two separate packages: a three-dimensional array package 62 and an intermediate circuit package 64. Wherein, the three-dimensional array package 62 includes two three- dimensional array chips 30a, 30b The intermediate circuit package 64 contains an intermediate circuit chip 40. Frame 66 also provides an electrical connection (not shown here) for three-dimensional array package 62 and intermediate circuit package 64. The 3D-M multi-chip component 50* The circuit block diagram in Figure 2G - Figure 2H can be used.
图 5A -图 5C 是三种读 / 写电压产生器 41 的电路图。读 / 写电压产生器 41 最好使用直流-直流变换器( DC-DC converter )。直流-直流变换器包括升压器和降压器。升压器的输出电压比输入电压高,降压器的输入电压比输入电压低。升压器的例子包括电荷泵( charge pump ,图 5A )和 Boost 变换器( Boost converter ,图 5B )等。降压器的例子包括低压降稳压器( low dropout ,图 5C )和 Buck 变换器( Buck converter )等。 5A to 5C are circuit diagrams of three kinds of read/write voltage generators 41. Read/Write Voltage Generator 41 It is best to use a DC-DC converter (DC-DC converter) ). The DC-DC converter includes a booster and a buck. The output voltage of the booster is higher than the input voltage, and the input voltage of the buck is lower than the input voltage. Examples of boosters include charge pumps (charge pumps) 5A) and Boost converter (Boost converter, Fig. 5B) and so on. Examples of bucks include low dropout regulators (low dropout, Figure 5C) and Buck converter, etc.
图 5A 中的读 / 写电压产生器 41 包括一电荷泵 72 ,其输出电压 Vout 大于输入电压 Vin 。一般说来,电荷泵 72 还含有一个或多个电容。图 5B 中的读 / 写电压产生器 41 包括一高频 Boost 变换器 74 ,其输出电压 Vout 大于输入电压 Vin 。 Boost 变换器 74 还含有电感。该电感最好是一薄电感,以满足存储卡或固态硬盘对厚度的要求。图 5C 中的读 / 写电压产生器 41 包括一低压降稳压器 76 ,其输出电压 Vout 小于输入电压 Vin 。一般说来,低压降稳压器 76 还含有一个或多个电容。FIG 5A is read / write voltage generator 41 comprises a charge pump 72, whose output voltage V out is greater than the input voltage V in. In general, charge pump 72 also contains one or more capacitors. 5B, the read / write voltage generator 41 comprises a high frequency Boost converter 74, the output voltage V out is greater than the input voltage V in. The Boost converter 74 also contains an inductor. The inductor is preferably a thin inductor to meet the thickness requirements of the memory card or solid state drive. FIG. 5C read / write voltage generator 41 comprises a low dropout voltage regulator 76, output voltage V out which is less than the input voltage V in. In general, the low dropout regulator 76 also contains one or more capacitors.
图 6A -图 6B 分别表示地址 / 数据转换器 47 的两个组件:地址转换器 43 和数据转换器 45 。图 6A 表示一种地址转换器 43 。它将来自主机的逻辑地址 54A 转换成三维阵列芯片 30 的物理地址 58A 。地址转换器 43 含有一个处理器 92 和一存储器 94 。存储器 94 存储一地址映射表 82 、一故障块表 84 和一磨损管理表 86 。这些状态表 82 、 84 、 86 平时存储在只读存储器( ROM )中。在使用时被加载到随机存取存储器( RAM )中。这里,只读存储器可以一种非易失性存储器( NVM ),如快闪存储器。对于一个支持多三维阵列芯片(如图 2G -图 2H 中的 30a 、 30b… 30w )的地址 / 数据转换器 47 来说,存储器 94 为所有三维阵列芯片 30a 、 30b… 30w 存储状态表 82 、 84 、 86 ,它被所有三维阵列芯片 30a 、 30b… 30w 共享。 Figures 6A-6B show two components of the address/data converter 47: address translator 43 and data converter, respectively. 45. Fig. 6A shows an address converter 43. It converts the logical address 54A from the host into the physical address 58A of the three-dimensional array chip 30. Address converter 43 contains a processor 92 and a memory 94. The memory 94 stores an address mapping table 82, a fault block table 84, and a wear management table 86. These status tables 82, 84, 86 Usually stored in read-only memory (ROM). It is loaded into random access memory (RAM) at the time of use. Here, the read only memory can be a nonvolatile memory (NVM) ), such as flash memory. For an address/data converter 47 that supports multiple 3D array chips (30a, 30b... 30w in Figure 2G - Figure 2H), memory 94 The state tables 82, 84, 86 are stored for all three- dimensional array chips 30a, 30b... 30w, which are shared by all three- dimensional array chips 30a, 30b... 30w.
在存储器 94 的各种状态表 82 、 84 、 86 中,地址映射表 82 存储逻辑地址和物理地址之间的映射;故障块表 84 存储三维存储阵列中有故障的存储块之地址;磨损管理表 86 纪录每个存储块读 / 写的次数。这里,'存储块'是指存储器的分配单元,其大小可以从一个存储元到一个三维存储阵列中的所有存储元。 In the various status tables 82, 84, 86 of the memory 94, the address mapping table 82 Stores the mapping between logical addresses and physical addresses; the fault block table 84 stores the addresses of faulty memory blocks in the 3D storage array; the wear management table 86 records each memory block read / The number of times written. Here, 'memory block' refers to a memory allocation unit that can be sized from one memory element to all memory elements in a three-dimensional memory array.
在读过程中,一旦处理器 92 接收到需要读出的存储块之逻辑地址 54A ,它从地址映射表 82 中获取相应的物理地址 58A 。在写过程中,一旦处理器 92 接收到需要写入的存储块之逻辑地址 54A ,它从地址映射表 82 、故障块表 84 和磨损管理表 86 中选择一未占用、无故障以及较少使用的存储块来写入数据。该被选存储块的地址即为物理地址。 During the read process, once the processor 92 receives the logical address 54A of the memory block that needs to be read, it slave address map 82 Get the corresponding physical address 58A. During the write process, once the processor 92 receives the logical address 54A of the memory block to be written, it slave address mapping table 82, fault block table 84, and wear management table. Select an unoccupied, fault-free, and less-used block of memory to write data. The address of the selected memory block is the physical address.
图 6B 表示一种数据转换器 45 。它将来自主机的逻辑数据 54D 转换成三维存储阵列的物理数据 58D ,或者将三维存储阵列的物理数据 58D 转换成输出至主机的逻辑数据 54D 。数据转换器 45 含有一错误检验校正( ECC )编码器 96 和一 ECC 解码器 98 。 ECC 编码器 96 将输入的逻辑数据 54D 转换成要存储到三维存储阵列的物理数据 58D 。 ECC 解码器 98 将从三维存储阵列中读出的物理数据 58D 转换成要被输出的逻辑数据 54D 。在该过程中,物理数据 58D 中的错误位被检验和校正。适合 3D-M 的 ECC 编码包括 Reed-Solomon 码、 Golay 码、 BCH 码、多维奇偶码和汉明码等。 Figure 6B shows a data converter 45. It converts the logical data 54D from the host into the physical data of the 3D storage array 58D, or convert the physical data 58D of the 3D storage array into logical data 54D output to the host. The data converter 45 contains an error check correction (ECC) encoder 96 and a ECC Decoder 98. The ECC encoder 96 converts the input logical data 54D into physical data 58D to be stored to the three-dimensional storage array. ECC Decoder 98 The physical data 58D read out from the three-dimensional memory array is converted into logical data 54D to be output. During this process, the error bits in physical data 58D are checked and corrected. ECC for 3D-M The code includes Reed-Solomon code, Golay code, BCH code, multi-dimensional parity code and Hamming code.
应该了解,在不远离本发明的精神和范围的前提下,可以对本发明的形式和细节进行改动,这并不妨碍它们应用本发明的精神。因此,除了根据附加的权利要求书的精神,本发明不应受到任何限制。 It is to be understood that the form and details of the invention may be modified without departing from the spirit and scope of the invention. Therefore, the invention should not be limited in any way by the spirit of the appended claims.

Claims (15)

  1. 一种三维存储器 (50) ,其特征在于包括:A three-dimensional memory (50), comprising:
    一三维阵列芯片 (30) ,该三维阵列芯片 (30) 含有至少一三维存储阵列 (22aa…) ,该三维存储阵列 (22aa…) 含有多个相互堆叠的存储层 (16A, 16B…) ,所述存储层不含似晶体管元件;a three-dimensional array chip (30), the three-dimensional array chip (30) comprising at least one three-dimensional memory array (22aa...), the three-dimensional memory array (22aa...) comprising a plurality of memory layers (16A, 16B...) stacked on each other, the memory layer containing no transistor-like components;
    一中间电路芯片 (40) ,该中间电路芯片含有至少一读 / 写电压产生器 (41) ,该读 / 写电压产生器 (41) 为该三维阵列芯片 (30) 提供至少一与电源电压 (VDD) 不同的读电压 (VR) 或 / 和写电压 (VW) ;An intermediate circuit chip (40), the intermediate circuit chip including at least one read/write voltage generator (41), the read/write voltage generator (41) providing at least one and a power supply voltage for the three-dimensional array chip (30) V DD ) different read voltage (V R ) or / and write voltage (V W );
    所述三维阵列芯片 (30) 和所述中间电路芯片 (40) 为两个不同的芯片。The three-dimensional array chip (30) and the intermediate circuit chip (40) are two different chips.
  2. 一种三维存储器 (50) ,其特征在于包括:A three-dimensional memory (50), comprising:
    一三维阵列芯片 (30) ,该三维阵列芯片 (30) 含有至少一三维存储阵列 (22aa…) ,该三维存储阵列 (22aa…) 含有多个相互堆叠的存储层 (16A, 16B…) ,所述存储层不含似晶体管元件;a three-dimensional array chip (30), the three-dimensional array chip (30) comprising at least one three-dimensional memory array (22aa...), the three-dimensional memory array (22aa...) comprising a plurality of memory layers (16A, 16B...) stacked on each other, the memory layer containing no transistor-like components;
    一中间电路芯片 (40*) ,该中间电路芯片 (40*) 含有至少一地址 / 数据转换器 (47) ,该地址 / 数据转换器 (47) 将主机的地址 / 数据 (54) 与该三维阵列芯片 (30) 的地址 / 数据 (58) 相互转换;An intermediate circuit chip (40*), the intermediate circuit chip (40*) containing at least one address/data converter (47), the address / The data converter (47) converts the address/data (54) of the host to the address/data (58) of the three-dimensional array chip (30);
    所述三维阵列芯片 (30) 和所述中间电路芯片 (40*) 为两个不同的芯片。The three-dimensional array chip (30) and the intermediate circuit chip (40*) are two different chips.
  3. 一种三维存储器 (50) ,其特征在于包括:A three-dimensional memory (50), comprising:
    一三维阵列芯片 (30) ,该三维阵列芯片 (30) 含有至少一三维存储阵列 (22aa…) ,该三维存储阵列 (22aa…) 含有多个相互堆叠的存储层 (16A, 16B…) ,所述存储层不含似晶体管元件;a three-dimensional array chip (30), the three-dimensional array chip (30) comprising at least one three-dimensional memory array (22aa...), the three-dimensional memory array (22aa...) comprising a plurality of memory layers (16A, 16B...) stacked on each other, the memory layer containing no transistor-like components;
    一中间电路芯片 (40) ,该中间电路芯片含有一读 / 写电压产生器 (41) 和一地址 / 数据转换器 (47) ,该读 / 写电压产生器 (41) 为该三维阵列芯片 (30) 提供至少一与电源电压 (VDD) 不同的读电压 (VR) 或 / 和写电压 (VW) ,该地址 / 数据转换器 (47) 将主机的地址 / 数据 (54) 与该三维阵列芯片 (30) 的地址 / 数据 (58) 相互转换;An intermediate circuit chip (40) comprising a read/write voltage generator (41) and an address/data converter (47), the read/write voltage generator (41) being the three-dimensional array chip ( 30) providing at least one read voltage (V R ) or / and write voltage (V W ) different from the power supply voltage (V DD ), the address/data converter (47) and the host address/data (54) The address/data (58) of the three-dimensional array chip (30) is converted to each other;
    所述三维阵列芯片 (30) 和所述中间电路芯片 (40) 为两个不同的芯片。The three-dimensional array chip (30) and the intermediate circuit chip (40) are two different chips.
  4. 一种三维存储器 (50) ,其特征在于包括:A three-dimensional memory (50), comprising:
    一三维阵列芯片 (30) ,该三维阵列芯片 (30) 含有至少一三维存储阵列 (22aa…) ,该三维存储阵列 (22aa…) 含有多个相互堆叠的存储层 (16A, 16B…) ,所述存储层不含似晶体管元件;a three-dimensional array chip (30), the three-dimensional array chip (30) comprising at least one three-dimensional memory array (22aa...), the three-dimensional memory array (22aa...) comprising a plurality of memory layers (16A, 16B...) stacked on each other, the memory layer containing no transistor-like components;
    一第一中间电路芯片 (40) ,该第一中间电路芯片含有至少一读 / 写电压产生器 (41) ,该读 / 写电压产生器 (41) 为该三维阵列芯片 (30) 提供至少一与电源电压 (VDD) 不同的读电压 (VR) 或 / 和写电压 (VW) ;a first intermediate circuit chip (40), the first intermediate circuit chip comprising at least one read/write voltage generator (41), the read/write voltage generator (41) providing at least one for the three-dimensional array chip (30) a different read voltage (V R ) or / and write voltage (V W ) than the supply voltage (V DD );
    一第二中间电路芯片 (40*) ,该第二中间电路芯片含有至少一地址 / 数据转换器 (47) ,该地址 / 数据转换器 (47) 将主机的地址 / 数据 (54) 与该三维阵列芯片 (30) 的地址 / 数据 (58) 相互转换;a second intermediate circuit chip (40*), the second intermediate circuit chip containing at least one address/data converter (47), the address/data converter (47) converting the address/data (54) of the host with the address/data (58) of the three-dimensional array chip (30);
    所述三维阵列芯片 (30) 、所述第一和第二中间电路芯片 (40 、 40*) 为三个不同的芯片。The three-dimensional array chip (30), the first and second intermediate circuit chips (40, 40*) For three different chips.
  5. 一种三维存储器 (50) ,其特征在于包括:A three-dimensional memory (50), comprising:
    第一和第二三维阵列芯片 (30a 、 30b) ,该第一和第二三维阵列芯片 (30a 、 30b) 分别含有至少一三维存储阵列 (22aa…) ,该三维存储阵列 (22aa…) 含有多个相互堆叠的存储层 (16A, 16B…) ,所述存储层不含似晶体管元件;First and second three-dimensional array chips (30a, 30b), the first and second three-dimensional array chips (30a, 30b) Each of the three-dimensional storage arrays (22aa...) contains a plurality of storage layers (16A, 16B...) stacked on each other. The storage layer does not contain a transistor-like component;
    至少一中间电路芯片 (40 或 40*) ,该中间电路芯片含有读 / 写电压产生器 (41) 和地址 / 数据转换器 (47) 中的至少一种,该中间电路芯片 (40 或 40*) 为该第一和第二三维阵列芯片 (30a 、 30b) 与主机之间实现电压、数据或 / 和地址转换;At least one intermediate circuit chip (40 or 40*) having a read/write voltage generator (41) and an address/data converter At least one of (47), the intermediate circuit chip (40 or 40*) implements voltage, data or / between the first and second three-dimensional array chips (30a, 30b) and the host And address translation;
    所述第一、第二三维阵列芯片 (30a 、 30b) 和所述中间电路芯片 (40 或 40*) 为至少三个不同的芯片。The first and second three-dimensional array chips (30a, 30b) and the intermediate circuit chip (40 or 40*) For at least three different chips.
  6. 根据权利要求 1 和 3 - 5 所述的存储器,其特征还在于:该读 / 写电压产生器 (41) 含有一直流-直流变换器( DC - DC converter )。A memory according to claims 1 and 3 - 5, characterized in that said read/write voltage generator (41) comprises a DC-DC converter ( DC - DC converter ).
  7. 根据权利要求 2 - 5 所述的存储器,其特征还在于:该地址 / 数据转换器 (47) 是一地址转换器 (43) ,该地址转换器 (43) 含有地址映射表 (82) 、故障块表 (84) 和磨损管理表 (86) 中的至少一种。 A memory according to claims 2 - 5, characterized in that the address/data converter (47) is an address translator (43) The address translator (43) contains at least one of an address mapping table (82), a fault block table (84), and a wear management table (86).
  8. 根据权利要求 2 - 5 所述的存储器,其特征还在于:该地址 / 数据转换器 (47) 是一数据转换器 (45) ,该数据转换器 (45) 含有 ECC 编码器 (96) 和 ECC 解码器 (98) 中的至少一种 。A memory according to claims 2 - 5, characterized in that the address/data converter (47) is a data converter (45). The data converter (45) contains at least one of an ECC encoder (96) and an ECC decoder (98).
  9. 根据权利要求 2 - 5 所述的存储器,其特征还在于:该三维阵列芯片 (30) 还含有一串行器-解串器 (49) 。 The memory according to claim 2 - 5, wherein the three-dimensional array chip (30) further comprises a serializer-deserializer (49) .
  10. 根据权利要求 1 - 5 所述的存储器,其特征还在于:所述三维存储器含有三维只读存储器( 3D-ROM ) 。 A memory according to claims 1 - 5, characterized in that said three-dimensional memory contains a three-dimensional read only memory (3D-ROM) .
  11. 根据权利要求 10 所述的存储器,其特征还在于:所述 3D-ROM 含有三维电编程只读存储器( 3D-EPROM )或三维掩膜编程只读存储器( 3D-MPROM ) 。 A memory according to claim 10, further characterized in that said 3D-ROM contains a three-dimensional electrically programmable read only memory (3D-EPROM) ) or 3D mask programming read-only memory (3D-MPROM).
  12. 根据权利要求 1 - 5 所述的存储器,其特征还在于:所述三维存储器含有三维随机读取存储器( 3D-RAM ) 。A memory according to claims 1 - 5, characterized in that said three-dimensional memory contains a three-dimensional random read memory (3D-RAM) .
  13. 根据权利要求 1 - 5 所述的存储器,其特征还在于:所述三维存储器含有 memristor 、 resistive random-access memory ( RRAM 或 ReRAM )、 phase-change memory ( PCM )、 programmable metallization cell ( PMC )和 conductive-bridging random-access memory ( CBRAM )中的至少一种 。A memory according to claims 1 - 5, characterized in that said three-dimensional memory contains memristor, resistive Random-access memory ( RRAM or ReRAM ), phase-change memory ( PCM ), Programmable metallization cell (PMC) and conductive-bridging random-access At least one of memory ( CBRAM ).
  14. 根据权利要求 1 - 5 所述的存储器,其特征还在于:所述存储器是存储卡、固态硬盘、多芯片封装和多芯片组件中的至少一种 。The memory according to any one of claims 1 to 5, wherein the memory is at least one of a memory card, a solid state hard disk, a multi-chip package, and a multi-chip module. .
  15. 根据权利要求 1 - 5 所述的存储器,其特征还在于:所述三维阵列芯片的阵列效率大于 40% 。The memory according to any of claims 1 - 5, wherein the array efficiency of said three-dimensional array chip is greater than 40%.
PCT/CN2013/075222 2013-03-06 2013-05-06 Three-dimensional memory comprising independent intermediate circuit chip WO2014134865A1 (en)

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US13/787,796 US9117493B2 (en) 2011-09-01 2013-03-06 Discrete three-dimensional memory comprising off-die address/data translator
US13/787,787 US8890300B2 (en) 2011-09-01 2013-03-06 Discrete three-dimensional memory comprising off-die read/write-voltage generator
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