WO2014112297A1 - Substrat transparent - Google Patents

Substrat transparent Download PDF

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Publication number
WO2014112297A1
WO2014112297A1 PCT/JP2013/084508 JP2013084508W WO2014112297A1 WO 2014112297 A1 WO2014112297 A1 WO 2014112297A1 JP 2013084508 W JP2013084508 W JP 2013084508W WO 2014112297 A1 WO2014112297 A1 WO 2014112297A1
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WO
WIPO (PCT)
Prior art keywords
transparent substrate
gloss
experimental example
glass
substrate
Prior art date
Application number
PCT/JP2013/084508
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English (en)
Japanese (ja)
Inventor
稔 玉田
Original Assignee
旭硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to CN201380071015.0A priority Critical patent/CN104936920A/zh
Priority to JP2014557373A priority patent/JPWO2014112297A1/ja
Priority to DE112013006464.2T priority patent/DE112013006464T5/de
Priority to KR1020157018861A priority patent/KR20150109358A/ko
Publication of WO2014112297A1 publication Critical patent/WO2014112297A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00—Nature of the non-vitreous component
    • C03C2214/08—Metals

Definitions

  • the present invention relates to a transparent substrate.
  • display devices such as liquid crystal displays have been widely used in portable devices and in-vehicle devices.
  • sunlight, light from interior lights, etc. are reflected and visibility is improved. Therefore, it has been required to suppress the reflection of light.
  • touch panels have been used, and since there are many opportunities for human hands to touch, it has also been desired to suppress the adhesion of fingerprints.
  • Patent Document 1 discloses that a glass product is immersed in a corrosive liquid composed of hydrogen fluoride, ammonium fluoride, or a glass-based fine powder, washed with water, and further corroded with hydrogen fluoride, sulfuric acid, or nitric acid. There is disclosed a surface processing method for glass products which is immersed in a discharge liquid and then washed with water.
  • Patent Document 1 since it is not assumed to be used as a transparent base material for a display device or the like, when a glass substrate that has been subjected to surface processing on the surface of a liquid crystal display or the like is disposed, the uneven size of the glass and the liquid crystal Depending on the relationship with the pixel size of the display, there has been a problem that light scattering unevenness (hereinafter also referred to as glare) occurs.
  • glare light scattering unevenness
  • the present invention has been made in view of the above-mentioned problems of the prior art, and an object of the present invention is to provide a transparent base material capable of suppressing reflection of light, reducing fingerprint adhesion, and suppressing glare.
  • the present invention provides a transparent substrate having ⁇ Gloss / ⁇ RMS of ⁇ 800 or less, which indicates a change in Gloss (%) with respect to a change in surface roughness RMS ( ⁇ m) for at least one surface.
  • the transparent substrate of the present invention can suppress reflection of light, reduce fingerprint adhesion, and suppress light scattering unevenness (glare).
  • the transparent substrate of the present embodiment is characterized in that ⁇ Gloss / ⁇ RMS indicating a change amount of Gloss (%) with respect to a change amount of surface roughness RMS ( ⁇ m) is ⁇ 800 or less for at least one surface. .
  • the inventors of the present invention as a result of repeated studies on a transparent substrate that can suppress the reflection of light, reduce fingerprint adhesion, and suppress glare, the surface of the transparent substrate has an appropriate unevenness
  • the present invention has been completed by finding that the problem can be solved by forming a fine structure.
  • an appropriate fine structure of unevenness means that the uneven shape, uneven shape distribution, uneven size, and uneven size distribution are in an appropriate range.
  • these were individually evaluated and the correlation with glare was investigated, but a clear relationship was not obtained.
  • the present inventors have found that it is possible to evaluate that these are in an appropriate range by the amount of change in Gloss (%) with respect to the amount of change in surface roughness RMS ( ⁇ m).
  • Gloss (%) is an index that one-dimensionally represents the degree of gloss of the object surface by paying attention to the ratio of regular reflection light, the direction distribution of diffuse reflection light, and the like. Gloss (%) can be measured as specular gloss by a method based on the method defined in JIS Z 8741. Since regular reflection decreases when there is irregular reflection or absorption on the incident surface, Gloss is considered to be an amount that indirectly reflects the uneven shape and its distribution, the uneven size and its distribution.
  • the surface roughness RMS ( ⁇ m) is the average depth of irregularities from the reference plane (here, the substrate surface before the surface treatment).
  • the surface roughness RMS ( ⁇ m) can be measured by a method based on the method defined in JIS B 0601 (2001).
  • the surface roughness RMS may be represented by the root mean square roughness Sq.
  • various methods generally used for measuring surface roughness can be used, but in particular, a wider measurement field can reflect a wider range of conditions on the surface of a transparent substrate. Preferably it is done.
  • the amount of change in Gloss (%) with respect to the amount of change in surface roughness RMS ( ⁇ m) means that after forming fine irregularities on at least one surface (surface) of the transparent substrate, the surface roughness RMS is obtained by performing an etching process. It means a change amount of Gloss (%) by slightly changing ( ⁇ m).
  • the method of etching treatment at this time is not particularly limited.
  • the etching treatment can be performed with hydrofluoric acid (aqueous hydrogen fluoride solution).
  • dry etching such as reactive ion etching can be used.
  • FIG. 1 schematically shows a cross-sectional view of an uneven microstructure (hereinafter also simply referred to as “irregular shape”) on the surface of a transparent substrate.
  • the solid line indicates the concavo-convex shape on the surface of the transparent substrate before the etching process
  • the dotted line indicates the concavo-convex shape after the etching process.
  • FIG. 1A shows an example of a preferable concavo-convex shape in the present embodiment having a fine recess
  • FIG. 1B shows an example in which the size of the recess is larger than that in FIG.
  • the depth of the recesses is different in the initial state before the etching process. Specifically, the depth of the concave portion, that is, the radius of curvature, is smaller in (a) having a fine concave portion than in (b). Subsequently, when an etching process is performed so as to obtain an equivalent minute etching amount in both cases of FIGS. 1A and 1B, the change in the depth of the recesses is as shown in FIGS. 1A and 1B. Therefore, the amount of change in the surface roughness RMS ( ⁇ m) is the same.
  • ⁇ Gloss / ⁇ RMS may be ⁇ 800 or less as described above, more preferably ⁇ 1000 or less, and particularly preferably ⁇ 1200 or less.
  • ⁇ Gloss / ⁇ RMS satisfies the above-described requirements for at least one surface of the transparent substrate. Moreover, you may have an appropriate uneven
  • the surface of the base material has a fine structure on the surface of the transparent substrate, compared to a transparent base material that does not have a fine structure on the surface. It is considered that regular reflection can be moderately suppressed. Further, regarding the decrease in fingerprint adhesion, it is considered that fine irregularities are formed on the surface of the transparent base material, so that it becomes difficult for dirt, sweat, or the like to enter the recessed portion.
  • the Gloss (%) of at least one surface is preferably 95% or less, more preferably 90% or less. preferable.
  • Gloss (%) reflects the effect of suppressing the regular reflection of light due to the formation of an uneven microstructure on the surface of the transparent substrate, but the gloss (%) is in the above range. This indicates that regular reflection of light on the surface can be suppressed, and when used for various displays, touch panels, etc., the visibility of display can be improved, which is preferable.
  • the Gloss (%) here preferably satisfies the above-mentioned requirements for at least one of the surfaces when the concavo-convex shape is formed on both surfaces of the transparent substrate. Moreover, you may satisfy
  • the surface roughness RMS is measured by etching the surface of the transparent substrate to be measured at least once. ( ⁇ m) and Gloss (%) may be measured. From the viewpoint of increasing the measurement accuracy, the etching process was performed twice or more under the same conditions as the first time, and the Gloss (%) and the surface roughness RMS ( ⁇ m) were measured each time the etching process was performed. It is preferable to perform linear approximation on a plurality of measurement results and calculate ⁇ Gloss / ⁇ RMS from the slopes.
  • the method for producing the transparent substrate of the present embodiment is not particularly limited, and can be produced by forming fine irregularities on the surface of at least one surface of the transparent substrate by any method.
  • a method of forming a fine concavo-convex structure by excavating the surface of the transparent substrate by frosting, sandblasting, lapping or the like on the surface of the transparent substrate can be preferably used.
  • the transparent substrate it is preferable to subject the transparent substrate to a surface treatment by frosting, that is, to form an uneven microstructure on the surface of the transparent substrate.
  • a surface treatment by frosting that is, to form an uneven microstructure on the surface of the transparent substrate.
  • frost processing the range that can be processed by one operation is wide, the work time is short, and fine irregularities are easily formed on the surface.
  • the width that can be selected for Gloss (%) and haze (%) is adjusted by adjusting the degree of processing, that is, the shape and size of the irregularities. , Wider than other processing methods. For this reason, it becomes possible to supply the transparent base material which has desired Gloss (%) and haze (%) by selecting the conditions of frost processing.
  • the material for the transparent substrate of the present embodiment is not particularly limited as long as it is a transparent solid material.
  • Examples of the material for the transparent substrate of the present embodiment include various materials such as plastic and glass.
  • the transparent substrate is preferably glass from the viewpoints of transparency and strength.
  • the type of glass is not particularly limited, and various glasses such as non-alkali glass, soda lime glass, and aluminosilicate glass can be used.
  • the shape of the transparent substrate is not particularly limited, and need not be flat and plate-like, and may include a curved surface or an irregular shape.
  • the transparent substrate of this embodiment is soda lime glass or aluminosilicate glass
  • the transparent substrate of this embodiment can be further subjected to chemical strengthening treatment by a known method.
  • the chemical strengthening treatment refers to a treatment of replacing alkali ions (for example, sodium ions) having a small ionic radius on the glass surface with alkali ions (for example, potassium ions) having a large ionic radius.
  • alkali ions for example, potassium ions
  • it can be performed by treating a glass containing sodium ions with a molten salt containing potassium ions.
  • the composition of the compressive stress layer formed on the glass surface by such an ion exchange treatment is slightly different from the composition before the ion exchange treatment, but is deep enough to be deep from the glass substrate surface (tensile stress layer in a broad sense).
  • the composition of is substantially the same as the composition before the ion exchange treatment.
  • the conditions for chemical strengthening are not particularly limited, and can be selected according to the type of glass used for chemical strengthening and the required degree of chemical strengthening.
  • the molten salt for performing the chemical strengthening treatment may be selected according to the glass substrate used for the chemical strengthening.
  • Examples thereof include alkali sulfates and alkali chlorides such as potassium nitrate, sodium sulfate, potassium sulfate, potassium carbonate, sodium chloride and potassium chloride. These molten salts may be used alone or in combination of two or more.
  • the heating temperature of the molten salt is preferably 350 ° C. or higher, and more preferably 380 ° C. or higher. Moreover, 500 degrees C or less is preferable and 480 degrees C or less is more preferable.
  • the heating temperature of the molten salt By setting the heating temperature of the molten salt to 350 ° C. or higher, it is possible to prevent chemical strengthening from becoming difficult due to a decrease in the ion exchange rate. Moreover, decomposition
  • the time for bringing the glass into contact with the mixed molten salt is preferably 1 hour or longer and more preferably 2 hours or longer in order to give sufficient compressive stress.
  • productivity falls and a compressive stress value falls by relaxation, 24 hours or less are preferable and 20 hours or less are more preferable.
  • the transparent substrate of the present embodiment has been described.
  • ⁇ Gloss / ⁇ RMS indicating the amount of change is ⁇ 800 or less. If this condition is met, the uneven microstructure formed on the surface of the transparent substrate has an appropriate shape and size, suppressing reflection of light, reducing fingerprint adhesion, and light It becomes possible to suppress the scattering unevenness (glaring) of the light.
  • the transparent substrate of the present embodiment can be used in various applications, and for example, it can be preferably used in applications such as liquid crystal displays and organic EL displays and touch panels. In particular, it can be more preferably used for a display or touch panel of a portable device or a vehicle-mounted device.
  • experimental examples 1 to 6 are examples, and experimental examples 7 to 10 are comparative examples.
  • Evaluation Method A method for evaluating the characteristics of the transparent substrate obtained in the following experimental examples will be described below. ⁇ Gloss (%)> Measurement was performed in accordance with the method defined in JIS Z 8741: 1997.
  • the specular reflection light beam measured about the sample is represented by setting the reflected light quantity of the light when measuring similarly about the transparent base material (unprocessed transparent base material) before forming a fine unevenness
  • ⁇ RMS ( ⁇ m)> Measurement was performed in accordance with the method defined in JIS B 0601: 2001.
  • the regression line of Gloss (%) and surface roughness RMS ( ⁇ m) was obtained from the measurement results of the sample four times by the least square method, and ⁇ Gloss / ⁇ RMS was calculated from the slope.
  • haze was measured in accordance with the method defined in JIS K 7136.
  • the measurement was performed using a haze meter (trade name: HZ-2 manufactured by Suga Test Instruments Co., Ltd.).
  • ⁇ Fine uneven diameter> Regarding the measurement surface of the sample, the height distribution of the measurement surface was measured using a laser microscope in a visual field range P of 300 ⁇ m ⁇ 200 ⁇ m. Subsequently, in order to remove noise due to variation in shape, the obtained surface was binarized using a value obtained by subtracting 1 ⁇ m from the highest point as a threshold value. A perfect circle approximation was performed on each unevenness of the image obtained by binarization, and the diameter of the circle was calculated. The median diameter of the obtained diameter was defined as the fine uneven diameter.
  • ⁇ Glitter evaluation> The obtained transparent substrate is placed on a liquid crystal panel of iPhon 4S (manufactured by Apple) and a measurement range of 50 mm ⁇ 50 mm square is set, and then (A) the substrate is fixed to the liquid crystal panel and then a visual inspection is performed. (B) The light scattering unevenness was evaluated both by visual inspection while moving the substrate at 1 mm / sec with respect to the liquid crystal panel. Due to the characteristics of the human eye, more precise measurement is possible by performing visual observation while moving the substrate. In the evaluation, the number of glare points generated was counted and performed as follows.
  • This evaluation was performed with 1 to 5 points according to the following criteria.
  • a lower score means that light scattering unevenness (glaring) is suppressed, and a score of 3 or less was accepted.
  • Example 5 A transparent base material was prepared in the same manner as in Experimental Example 1, except that the frost treatment liquid was changed to 470 ml of pure water, 470 ml of glacial acetic acid mixed with 30 g of potassium fluoride and 60 ml of 50 wt% hydrogen fluoride aqueous solution. A fine concavo-convex shape was formed on the surface.
  • the aluminosilicate glass substrate is taken out of the frost solution, washed with running water for 10 minutes, and then immersed in a 20 wt% hydrogen fluoride aqueous solution for 16 minutes to carry out an etching treatment, and the aluminosilicate glass substrate which is a transparent substrate Fine irregularities were formed on the surface.
  • Table 1 shows the results of Experimental Example 1 to Experimental Example 10.
  • the transparent base materials obtained in Experimental Examples 1 to 6 have a fine structure with appropriate irregularities, the reflected light is reflected in comparison with the transparent substrate before the fine irregularities are formed. It was possible to suppress the fingerprint adhesion.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Surface Treatment Of Glass (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)

Abstract

La présente invention concerne un substrat transparent qui permet de supprimer un reflet de lumière, de réduire l'adhésivité des empreintes digitales et de supprimer les reflets. La présente invention concerne un substrat transparent pour lequel ∆brillance/∆RMS, qui est une variable de la brillance (%) sur une variable de la rugosité de surface (RMS) (µm), pour au moins une surface est de -800 ou moins.
PCT/JP2013/084508 2013-01-21 2013-12-24 Substrat transparent WO2014112297A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201380071015.0A CN104936920A (zh) 2013-01-21 2013-12-24 透明基材
JP2014557373A JPWO2014112297A1 (ja) 2013-01-21 2013-12-24 透明基材
DE112013006464.2T DE112013006464T5 (de) 2013-01-21 2013-12-24 Transparentes Substrat
KR1020157018861A KR20150109358A (ko) 2013-01-21 2013-12-24 투명 기재

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-008275 2013-01-21
JP2013008275 2013-01-21

Publications (1)

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WO2014112297A1 true WO2014112297A1 (fr) 2014-07-24

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PCT/JP2013/084508 WO2014112297A1 (fr) 2013-01-21 2013-12-24 Substrat transparent

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JP (1) JPWO2014112297A1 (fr)
KR (1) KR20150109358A (fr)
CN (1) CN104936920A (fr)
DE (1) DE112013006464T5 (fr)
TW (1) TW201431811A (fr)
WO (1) WO2014112297A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018052802A (ja) * 2016-09-27 2018-04-05 旭硝子株式会社 ガラス物品の製造方法およびガラス物品
JP2018197183A (ja) * 2017-05-23 2018-12-13 Ａｇｃ株式会社 ガラス物品、および表示装置
WO2020013012A1 (fr) 2018-07-09 2020-01-16 日本板硝子株式会社 Plaque de verre appropriée pour un dispositif d'affichage d'image
WO2021039552A1 (fr) 2019-08-26 2021-03-04 Ａｇｃ株式会社 Élément de recouvrement

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107817616A (zh) * 2017-09-14 2018-03-20 合肥惠科金扬科技有限公司 一种tft‑lcd显示屏玻璃的制作方法
CN107995329A (zh) * 2017-11-17 2018-05-04 珠海市魅族科技有限公司 玻璃盖板及其制作方法和手机
CN109903691A (zh) * 2019-03-22 2019-06-18 深圳立泰触控显示科技有限公司 一种防眩光的电子显示广告牌

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4017273B2 (ja) * 1998-12-25 2007-12-05 株式会社巴川製紙所 防眩材料及びそれを用いた偏光フィルム
WO2010041623A1 (fr) * 2008-10-07 2010-04-15 Hoya株式会社 Procédé de production d’un substrat de verre pour un disque magnétique
WO2011034898A1 (fr) * 2009-09-15 2011-03-24 Corning Incorporated Verre et écran présentant des propriétés antireflets
JP2013139381A (ja) * 2011-12-07 2013-07-18 Nippon Sheet Glass Co Ltd 太陽電池用又はディスプレイ用ガラスとその製造方法
JP2013216542A (ja) * 2012-04-09 2013-10-24 Mitsubishi Gas Chemical Co Inc ガラス用エッチング液およびテクスチャー付きガラス基板の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4017273B2 (ja) * 1998-12-25 2007-12-05 株式会社巴川製紙所 防眩材料及びそれを用いた偏光フィルム
WO2010041623A1 (fr) * 2008-10-07 2010-04-15 Hoya株式会社 Procédé de production d’un substrat de verre pour un disque magnétique
WO2011034898A1 (fr) * 2009-09-15 2011-03-24 Corning Incorporated Verre et écran présentant des propriétés antireflets
JP2013139381A (ja) * 2011-12-07 2013-07-18 Nippon Sheet Glass Co Ltd 太陽電池用又はディスプレイ用ガラスとその製造方法
JP2013216542A (ja) * 2012-04-09 2013-10-24 Mitsubishi Gas Chemical Co Inc ガラス用エッチング液およびテクスチャー付きガラス基板の製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018052802A (ja) * 2016-09-27 2018-04-05 旭硝子株式会社 ガラス物品の製造方法およびガラス物品
JP2018197183A (ja) * 2017-05-23 2018-12-13 Ａｇｃ株式会社 ガラス物品、および表示装置
WO2020013012A1 (fr) 2018-07-09 2020-01-16 日本板硝子株式会社 Plaque de verre appropriée pour un dispositif d'affichage d'image
KR20210030422A (ko) 2018-07-09 2021-03-17 니혼 이타가라스 가부시키가이샤 화상 표시 장치에 적합한 유리판
JPWO2020013012A1 (ja) * 2018-07-09 2021-08-02 日本板硝子株式会社 画像表示装置に適したガラス板
JP2022017240A (ja) * 2018-07-09 2022-01-25 日本板硝子株式会社 画像表示装置に適したガラス板
JP7085051B2 (ja) 2018-07-09 2022-06-15 日本板硝子株式会社 画像表示装置に適したガラス板
WO2021039552A1 (fr) 2019-08-26 2021-03-04 Ａｇｃ株式会社 Élément de recouvrement

Also Published As

Publication number Publication date
KR20150109358A (ko) 2015-10-01
JPWO2014112297A1 (ja) 2017-01-19
DE112013006464T5 (de) 2015-10-08
TW201431811A (zh) 2014-08-16
CN104936920A (zh) 2015-09-23

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