WO2014104350A1 - 病原菌および害虫の駆除方法ならびに病原菌および害虫の駆除装置 - Google Patents

病原菌および害虫の駆除方法ならびに病原菌および害虫の駆除装置 Download PDF

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Publication number
WO2014104350A1
WO2014104350A1 PCT/JP2013/085232 JP2013085232W WO2014104350A1 WO 2014104350 A1 WO2014104350 A1 WO 2014104350A1 JP 2013085232 W JP2013085232 W JP 2013085232W WO 2014104350 A1 WO2014104350 A1 WO 2014104350A1
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Prior art keywords
pathogen
water
pest control
plasma
reaction vessel
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PCT/JP2013/085232
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English (en)
French (fr)
Japanese (ja)
Inventor
俊郎 金子
俊顕 加藤
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Tohoku University NUC
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Tohoku University NUC
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Priority to JP2014554615A priority Critical patent/JP5909831B2/ja
Priority to CN201380068973.2A priority patent/CN104883881A/zh
Priority to EP13868543.3A priority patent/EP2941955B1/en
Publication of WO2014104350A1 publication Critical patent/WO2014104350A1/ja
Anticipated expiration legal-status Critical
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    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01M—CATCHING, TRAPPING OR SCARING OF ANIMALS; APPARATUS FOR THE DESTRUCTION OF NOXIOUS ANIMALS OR NOXIOUS PLANTS
    • A01M1/00—Stationary means for catching or killing insects
    • A01M1/20—Poisoning, narcotising, or burning insects
    • A01M1/2022—Poisoning or narcotising insects by vaporising an insecticide
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/471—Pointed electrodes

Definitions

  • the present invention relates to a pathogen and pest control method and a pathogen and pest control apparatus for sterilizing and controlling the pathogen or pest.
  • Patent Document 1 discloses an apparatus for spraying an analyte together with a liquid and introducing it into plasma in a plasma analysis apparatus that performs elemental analysis.
  • Patent Document 3 a method of sterilization using air plasma has been developed (see, for example, Patent Document 3).
  • OH radicals hydroxyl radicals
  • Patent Document 3 The sterilization method using air plasma as described in Patent Document 3 cannot efficiently generate OH radicals having an excellent sterilization effect, and cannot effectively eliminate pathogenic bacteria and pests. It was. For this reason, for example, even if it used in the field
  • the present invention provides a pathogen and pest control method, and a pathogen and pest control apparatus, which can efficiently generate OH radicals and have an excellent control effect of the pathogen and pest.
  • the purpose is.
  • the second object is to provide a pathogen and pest control method and a pathogen and pest control apparatus that can sterilize or kill crops and soil without using pesticides. Yes.
  • the present inventors have come up with the present invention by obtaining knowledge that OH radicals are generated by introducing water such as water mist into plasma such as air, and that OH radicals can be sterilized or killed.
  • the pathogen and pest control method introduces water into a reaction vessel, supplies a gas serving as plasma from a gas supply unit to the reaction vessel, and disposes in the reaction vessel.
  • a voltage is applied between the formed anode electrode and cathode electrode to discharge the gas, generate OH radicals, and irradiate the OH radicals to control pathogens or pests.
  • the pathogen and pest control method according to the present invention can efficiently generate OH radicals by introducing not only gas but also water into the reaction vessel. Since the OH radical has an excellent bactericidal effect, it can be effectively removed by sterilizing pathogenic bacteria or killing pests.
  • water may be introduced into the reaction vessel in any form, preferably water mist or water droplets.
  • OH radicals can be easily generated.
  • the gas may be any gas as long as it becomes plasma, and is preferably air, helium, argon, or a mixture of the gases. Further, the amount of OH radicals generated may be controlled by controlling the amount of water mist and / or gas supplied.
  • the method for controlling pathogens and pests according to the present invention is used for sterilized materials that are damaged or damaged by pathogens or pests that damage plants, such as plants or soils that are damaged or damaged.
  • the pathogen include pathogenic bacteria such as filamentous fungi (mainly mold) and bacteria (bacteria), and viruses.
  • Pathogens are rice blast, wheat powdery mildew, soybean purpura, strawberry gray mold, cucumber gray mold, tomato gray mold, lily leaf blight, cucumber powdery mildew, strawberry powdery mildew, tomato leaf mold , Leek rust, chrysanthemum rust, leek black spot disease, leek black spot disease, apple spotted leaf disease, cucumber brown leaf disease, garlic anthracnose, celery leaf blight, apple brown spot disease, idiot seedling disease There may be.
  • the pest can be any pest that harms the plant, and may be a tick or aphid.
  • OH radicals generated by introducing a water mist of 0.001 mL to 10 mL per hour at a voltage of 10 kV to 20 kV may be used.
  • the gas supply rate may be 7 liters / minute to 20 liters / minute, and in addition, the object to be sterilized or insecticide may be irradiated for at least 5 minutes to 15 minutes.
  • the agricultural control method according to the present invention comprises the pathogen and pest control method according to the present invention. According to the agricultural extermination method according to the present invention, OH radicals having an excellent sterilizing effect can be efficiently generated, so that agricultural products and soil can be sterilized or killed without using agricultural chemicals.
  • the pathogen and pest control device includes a reaction vessel, a pair of electrodes, a water supply unit, a gas supply unit, and a power supply unit, It has an insertion part inserted into the reaction container, the other electrode is arranged at a position facing the insertion part, and the water supply part can supply water to the reaction container via the insertion part.
  • the gas supply unit is provided so as to be able to supply a plasma gas to the reaction vessel, and the power supply unit generates OH radicals in the reaction vessel supplied with the water and the gas.
  • a voltage can be applied between the insertion portion and the other electrode.
  • the pathogen and pest control apparatus according to the present invention is suitably used in the pathogen and pest control method according to the present invention described above. Since the pathogen and pest control apparatus according to the present invention introduces not only gas but also water into the reaction vessel through the insertion portion, it can efficiently generate OH radicals. Since the OH radical has an excellent bactericidal effect, it can be effectively removed by sterilizing pathogenic bacteria or killing pests. For this reason, when used in the agricultural field, it becomes possible to sterilize or kill agricultural products and soil without using agricultural chemicals. As used in this agricultural field, the plasma apparatus according to the present invention comprises the pathogen and pest control apparatus according to the present invention, and is characterized by being used in the agricultural control method according to the present invention.
  • the insertion portion has a cylindrical shape, and the water can be supplied to the reaction vessel through the inside.
  • water can be supplied to the position between the electrodes in the reaction vessel, and OH radicals can be generated effectively.
  • the insertion portion When the insertion portion has a cylindrical shape, the insertion portion may have a linear body made of a thin line provided so as to protrude from the tip so that water passing through the inside is transmitted. In this case, OH radicals can be efficiently generated from the water that travels along the linear body.
  • the water that travels along the linear body is preferably in the form of water droplets.
  • a gap is formed between the distal end and the outer surface of the insertion portion to cover the distal end and the outer surface of the insertion portion, and water passing through the insertion portion is supplied to the reaction vessel after passing through the clearance. You may have the cooling means provided.
  • the insertion portion can be cooled by the cooling means, and it is possible to suppress the plasma containing the generated OH radicals from becoming high temperature. For this reason, the influence by the heat
  • the water supply unit may be capable of supplying water mist and water droplets to the reaction vessel, and is particularly preferably capable of supplying water mist.
  • OH radicals can be particularly easily generated.
  • the other electrode may have a coil disposed inside or outside the reaction vessel, and has a radial electrode portion composed of a plurality of thin wires. It may be. In this case, plasma is easily generated, and OH radicals can be generated efficiently.
  • the power source is preferably a pulse power source, and an AC power source can also be used.
  • a pathogen and pest control method and a pathogen and pest control apparatus it is possible to efficiently generate OH radicals generated by water and plasma gas such as water mist, sterilize or kill insects in a short time, and are excellent in the effect of controlling pathogens and pests. Furthermore, it is possible to provide a pathogen and pest control method and a pathogen and pest control apparatus.
  • a pathogen and pest control method and a pathogen and pest control apparatus that can sterilize or kill crops and soil without using agricultural chemicals are provided. can do.
  • OH radicals having a strong oxidizing power can be efficiently generated by supplying water mist into plasma using air, helium, and argon at 0.5 to atmospheric pressure. Can do.
  • FIG. 6 It is an enlarged view of the electrode vicinity which shows the structural example of the pathogenic microbe and pest control apparatus which concerns on the 4th Embodiment of this invention.
  • FIG. 6 (a) temperature change when plasma is generated when water is not introduced into the cooling means, and (b) temperature change when plasma is generated when water is introduced into the cooling means.
  • It is a graph to show.
  • FIG. 6 shows the structural example of the pathogenic microbe and pest control apparatus which concerns on the 5th Embodiment of this invention.
  • FIG. 3 shows the emission spectrum of plasma with and without air and water mist by the pathogen and pest control device shown in FIG.
  • FIG. 13 is an enlarged view of a wavelength region of 300 nm to 350 nm of the emission spectrum of FIG.
  • control devices of pathogens and pests 3 shows the emission intensity ratio dependence on N 2 of OH radicals to water introduction amount. It is a figure which shows the light emission intensity ratio dependence with respect to helium of the OH radical with respect to the water introduction amount by the pathogen and pest control apparatus shown in FIG.
  • control devices of pathogens and pests 3 is a diagram showing applied voltage dependence of the emission intensity of OH radicals and N 2.
  • FIG. 1 It is a figure which shows the helium gas flow rate dependence of the fluorescence intensity by the pathogen and pest control apparatus shown in FIG. It is a figure which shows the (a) water introduction amount dependence of the hydrogen peroxide density
  • FIG. 5 is a view showing a microscopic image of a lily leaf blight fungus two days after irradiation with OH radicals generated by air plasma, of the pathogen and pest control apparatus shown in FIG.
  • (E) It is a microscope picture which shows the observation result for every elapsed days when only air is blown for 4 minutes every day, without performing plasma irradiation.
  • the pathogen and pest control apparatus 1 of FIG. 1 is used to irradiate idiot fungus (a) with plasma every day, (b) every 2 days, and (c) every 5 days, (d) perform plasma irradiation First, when only air is blown every day, (e) a photomicrograph showing observation results for each elapsed day when plasma irradiation is not performed (thick frame is the date of plasma irradiation).
  • FIG. 1 is a diagram showing a configuration example of a pathogen and pest control apparatus 1 according to the first embodiment of the present invention.
  • a pathogen and pest control apparatus 1 according to a first embodiment of the present invention includes a reaction vessel 2, a gas supply unit 3 that supplies gas to the reaction vessel 2, and water in the reaction vessel 2.
  • the water supply part 4 which supplies mist, the cathode electrode 5 and the anode electrode 6 which are arrange
  • the reaction vessel 2 is a vessel made of an insulating material such as glass or resin such as quartz glass.
  • a gas transport pipe 3 a is connected to the reaction vessel 2. Further, the reaction vessel 2 is provided with a cathode electrode 5 and an anode electrode 6.
  • the cathode electrode 5 is disposed in the vicinity of the gas transport tube 3a.
  • the anode electrode 6 has an outer coil 8 wound around the reaction vessel 2.
  • the outer coil 8 is formed using a copper wire or a coated copper wire. When the outer coil 8 is inserted, air plasma is easily generated.
  • the gas supply unit 3 includes a pressure regulator connected to a cylinder, a stop valve, a mass flow controller, and the like, and is connected to an inlet of the gas transport pipe 3a by a pipe made of resin or metal.
  • a pressure regulator connected to a cylinder, a stop valve, a mass flow controller, and the like, and is connected to an inlet of the gas transport pipe 3a by a pipe made of resin or metal.
  • One of air, helium, and argon, or a mixture of the gases is supplied from the gas supply unit 3 to the gas transport pipe 3a.
  • the air may be normal air or compressed air from a compressor.
  • the gas transport pipe 3a is composed of a pipe made of resin or glass.
  • the gas supply unit 3 may be configured by a blower fan and a damper that is provided at the air suction port of the blower fan and that can adjust the air volume by opening and closing. Furthermore, if a blower fan whose rotational speed is controlled by an inverter is employed, the damper can be omitted.
  • a gas supply unit 3 in addition to not using expensive helium or argon, a cylinder is not required, and the running cost of the pathogen and pest control apparatus 1 can be reduced, reduced in weight, and reduced in size. You can plan.
  • the pathogen and pest control device 1 of the present invention is used for sterilization of crops such as cocoons, it is easy to sterilize the pathogen and pest control device 1 while moving above the crop. Become.
  • the water supply unit 4 controls the flow rate of water transported by the pump 4a, the water mist generator 4b, the water mist transport gas supply 4c connected to the water mist generator 4b, and the pump 4a. It includes a water amount control device 4d and the like.
  • the water mist generator 4b is a water spray device and is also called a nebulizer. Water mist generated in the water supply unit 4 is supplied into the reaction container 2 from the lower left side of the cathode electrode 5 disposed in the reaction container 2.
  • the water supply unit 4 generates water mist in a very small amount of water supplied from the pump 4a and gas supplied from the water mist transport gas supply unit 4c. At this time, the amount of water supplied from the pump 4a is controlled by the water amount control device 4d.
  • the cathode electrode 5 As a material for the cathode electrode 5, copper (Cu) or stainless steel can be used. Alternatively, an electrode using a W line may be used. As a material of the anode electrode 6, a plate or wire made of tungsten (W) can be used. The anode electrode 6 may be grounded as an earth or ground potential. This potential is 0V. Hereinafter, the voltage applied to the cathode electrode 5 is represented by V.
  • the power supply unit 7 is a power supply connected to the cathode electrode 5 and the anode electrode 6.
  • the power supply unit 7 includes an AC high-voltage power supply that can control a voltage, a half-wave rectification power supply including a capacitor, a diode, a resistor, and the like.
  • an AC power source such as a low frequency high voltage power source or a pulse power source may be used.
  • the inner wall of the reaction vessel 2 may be formed with a groove that generates a swirl flow of a gas flow containing OH radicals, and the diameter of the vessel is reduced toward the tip from which the gas flow is discharged. You may have.
  • the pathogen and pest control apparatus 1 of the present invention supplies gas and water mist to the reaction vessel 2 to generate OH radicals in the reaction vessel 2.
  • the amount of OH radicals generated can be controlled by the water amount control device 4d.
  • FIG. 2 is a diagram showing an example of the relationship between the amount of hydroxyl radicals generated from the pathogen and pest control apparatus 1 and the amount of water introduced.
  • the vertical axis is the generated OH radical (arbitrary scale), and the horizontal axis is the amount of water introduced ( ⁇ l / min). 1 ⁇ l is 10 ⁇ 6 liters.
  • FIG. 2 it can be seen that the amount of hydroxyl radicals generated from the pathogen and pest control device 1 increases with respect to the amount of water introduced and decreases after reaching a peak.
  • FIG. 3 is a diagram showing a configuration example of the pathogen and pest control apparatus 20 according to the second embodiment of the present invention.
  • the pathogen and pest control apparatus 20 shown in FIG. 3 is different from the pathogen and pest control apparatus 1 of FIG. 1 in that the configuration of the cathode electrode 25 and the anode electrode 26 and the water mist from the cathode electrode 25 side are the reaction vessel 2. It is a point introduced in.
  • the cathode electrode 25 includes a main body portion 25 a connected to the reaction vessel 2 and an insertion portion 25 b connected to the main body portion 25 a and inserted into the reaction vessel 2.
  • the insertion part 25b consists of a thin tube with a sharp tip.
  • the water supply part 4 introduces water mist into the reaction vessel 2 through the insertion part 25b.
  • the anode electrode 26 is made of bundled thin wires made of W (tungsten) or the like, and has a radial electrode portion 26a made of a plurality of fine wires from which the bundled thin tubes are unwound on the side facing the insertion portion 25b of the cathode electrode 25. ing.
  • a portion having a higher electric field strength is generated between the insertion portion 25b of the cathode electrode 25 and the radial electrode portion 26a of the anode electrode 26 than in the case of a so-called flat electrode plate. And many electric lines of force can be generated.
  • air is used as a gas, discharge at a pressure on the order of atmospheric pressure can be easily performed.
  • the pressure of air is, for example, about 0.1 atmosphere to atmospheric pressure.
  • FIG. 4 is a diagram illustrating a configuration example of a pathogen and pest control apparatus 20A according to a modification of the second embodiment of the present invention.
  • the pathogen and pest control device 20A shown in FIG. 4 is different from the pathogen and pest control device 20 shown in FIG. 3 in that an inner coil 9 connected to the anode electrode 26 is provided.
  • Other configurations are the same as those of the pathogen and pest control apparatus 20 in FIG.
  • the inner coil 9 connected to the anode electrode 26 is formed using a coated copper wire. When the inner coil 9 is inserted, air plasma is easily generated.
  • FIG. 5 is a diagram showing a configuration example of a pathogen and pest control apparatus 30 according to the third embodiment of the present invention.
  • the pathogen and pest control apparatus 30 shown in FIG. 5 differs from the pathogen and pest control apparatus 1 in FIG. 1 in that the structure of the cathode electrode 25 and water are introduced into the reaction vessel 2 from the cathode electrode 25 side. It is.
  • the cathode electrode 25 has a cylindrical insertion portion 25b to be inserted into the reaction vessel 2, and a linear body 25c made of a thin wire provided at the tip of the insertion portion 25b.
  • the distal end portion of the insertion portion 25 b and the linear body 25 c are disposed inside the outer coil 8 of the anode electrode 26 wound around the reaction vessel 2.
  • the pathogen and pest control device 30 introduces water from the water supply unit 4 into the reaction vessel 2 through the inside of the insertion unit 25b. Moreover, the water which passed through the inside of the insertion part 25b becomes a water droplet shape, and is transmitted through the linear body 25c.
  • the pathogen and pest control apparatus 30 generates plasma by applying a voltage at the power supply unit 7 between the insertion portion 25b and the linear body 25c of the cathode electrode 25 and the outer coil 8 of the anode electrode 26. OH radicals can be efficiently generated from the water traveling through the linear body 25c.
  • FIG. 6 is a diagram showing a configuration example of a pathogen and pest control apparatus 40 according to the fourth embodiment of the present invention.
  • the pathogen and pest control apparatus 40 shown in FIG. 6 differs from the pathogen and pest control apparatus 1 in FIG. 1 in that the configuration of the cathode electrode 25 and water are introduced into the reaction vessel 2 from the cathode electrode 25 side. It is.
  • the cathode electrode 25 has a cylindrical insertion portion 25b inserted into the reaction vessel 2, and a cylindrical cooling means 25d covering the insertion portion 25b.
  • the cooling means 25d is made of quartz glass, and the opening on the distal end side of the insertion portion 25b is closed.
  • the cooling means 25d is disposed so as to cover the distal end and the outer surface of the insertion portion 25b with a gap between the distal end and the outer surface of the insertion portion 25b.
  • the distal end portion of the insertion portion 25 b is arranged inside the outer coil 8 of the anode electrode 26 wound around the reaction vessel 2.
  • the pathogen and pest control device 40 introduces water from the water supply unit 4 into the reaction vessel 2 through the inside of the insertion unit 25b. Further, the water that has passed through the inside of the insertion portion 25b passes from the tip of the insertion portion 25b through the gap between the insertion portion 25b and the cooling means 25d, and from the opening on the rear end side of the cooling means 25d to the outside of the cooling means 25d, that is, It is supplied between the inner wall of the reaction vessel 2 and the cooling means 25d.
  • the pathogen and pest control apparatus 40 generates a plasma by applying a voltage between the insertion portion 25b of the cathode electrode 25 and the outer coil 8 of the anode electrode 26 by the power supply unit 7, and is external to the cooling means 25d.
  • OH radicals can be efficiently generated from the water supplied to.
  • the insertion part 25b can be cooled by the cooling means 25d, and it can suppress that the plasma containing the generated OH radical becomes high temperature. For this reason, the influence by the heat
  • FIG. 7 is a graph showing temperature changes of the insertion portion 25b and plasma when plasma is generated when water is not introduced into the cooling means 25d of the pathogen and pest control device 40 and when water is introduced.
  • FIG. 8 is a diagram showing a configuration example of a pathogen and pest control apparatus 50 according to the fifth embodiment of the present invention.
  • the pathogen and pest control apparatus 50 shown in FIG. 8 includes the pathogen and pest control apparatus 1 in FIG. 1, the pathogen and pest control apparatus 20 in FIG. 3, the pathogen and pest control apparatus 20A in FIG. 4, and the pathogen in FIG. And the pest control apparatus 30 or a plurality of the pathogen and pest control apparatus 40 shown in FIG. According to the pathogen and pest control apparatus 50 shown in FIG. 8, a large amount of OH radicals can be generated. If the pathogen and pest control device 50 of FIG.
  • the pathogen and pest control device 1 is placed on a vehicle such as a tractor and moved along the dredging direction of the farmland where the crop is cultivated, the operability is improved. To do.
  • the pathogen and pest control device 50 shown in FIG. 8 the pathogen and pest control device 1, 20, 20 ⁇ / b> A, 30 or 40 is arranged in a line, but not in the same line but in a plane. In the case of planar arrangement, it is possible to irradiate a larger area with OH radicals.
  • the pathogen and pest control apparatus 1, 20, 20A, 30, 40, 50 were used, no ozone odor was generated.
  • OH radicals for example, rice blast, wheat powdery mildew, soybean purpura, strawberry gray mold, cucumber gray mold, tomato gray mold, lily leaf blight, cucumber powdery mildew, strawberry powdery mildew Disease, tomato leaf mold, leek rust, chrysanthemum rust, leek black spot, leek black spot, apple spotted decoction, cucumber brown spot, garlic anthracnose, sorghum leaf blight, apple brown spot, Examples include idiot seedlings.
  • OH radicals generated by water and plasma gas such as water mist can be used to control mites and aphids by insecticide.
  • any insect pest that can damage plants can be used as the insecticide.
  • the applied voltage is 10 kV to 20 kV (see FIGS. 11 and 16), and 0.001 mL to 10 mL of water mist (see FIGS. 14 and 15) is introduced per hour. Is preferred. More preferably, 0.01 mL to 5 mL of water mist is introduced.
  • the gas supply rate is preferably 7 liters / minute to 20 liters / minute (see FIG. 21).
  • the sterilized product or insecticidal product may be irradiated with OH radicals generated using helium plasma or air plasma for at least about 5 to 15 minutes.
  • the pathogen and pest control method and the pathogen and pest control apparatus 1, 20, 20A, 30, 40, and 50 of the present invention can be applied to cultivation using so-called greenhouses, plant factories, and the like in addition to ordinary farms. .
  • the method for controlling pathogenic bacteria and pests according to the present invention since the OH radicals generated by water and gas such as water mist are irradiated on the agricultural product, it is safe and does not remain on the agricultural product like agricultural chemicals.
  • the OH radical may be irradiated to the crops being grown or to the crops after harvesting.
  • the irradiation of the OH radicals can be applied not only to agricultural products but also to methods for disinfection or insecticidal treatment of fertilizers, liquid fertilizers, water, soil, articles used in farms and plant factories, etc.
  • the method of irradiating the cultivated crop with OH radicals may be any method.
  • the pathogen and pest control device 50 is mounted on a moving vehicle such as a tractor or an automatic transport vehicle, and OH radicals are irradiated to the crop while moving the moving vehicle along the dredging direction of the farmland where the crop is grown. May be.
  • rails are attached along the ceiling above the crops cultivated in a house or the like, and pathogens and pest control devices 1, 20, 20A, 30 are attached to an automatic transport vehicle that can move along the rails.
  • 40, 50 may be suspended, and OH radicals may be irradiated from above the crops while moving an automated guided vehicle or the like.
  • pots and the like where crops are cultivated are provided so as to be movable along a movement path such as a rail, and pathogens and pest control devices 1, 20, 20A, 30, 40, 50 are arranged beside the movement path.
  • the OH radicals may be sequentially irradiated to the crops that have moved along the movement path.
  • pathogens and pest control devices 1, 20, 20A, 30, 40, and 50 may be mounted on a flying body such as a helicopter, a radio controlled helicopter, or a radio controlled airplane, and OH radicals may be irradiated onto crops from above.
  • the pathogen and pest control method and the pathogen and pest control apparatus 1, 20, 20A, 30, 40, and 50 of the present invention are not limited to the agricultural field, and can be used to remove viruses in hospitals, nursing homes, general homes, and the like. It may be used for air purification, deodorization and the like.
  • the pathogen and pest control method of the present invention introduces water such as water mist into the reaction vessel 2, supplies gas that becomes plasma from the gas supply unit 3 to the reaction vessel 2, and distributes it to the reaction vessel 2.
  • a voltage is applied between the provided anode electrode 6 and the cathode electrode 5 to discharge gas and generate OH radicals, which are called “pathogens” in humans, animals and plants by viruses, eubacteria It is characterized by being exterminated by irradiating pathogenic bacteria or pests of microorganisms such as fungi and protozoa.
  • the pathogen and pest control apparatus 1 shown in FIG. 1 was produced.
  • the reaction vessel 2 a vessel made of quartz having an inner diameter of 3 mm, an outer diameter of 6 mm, and a length of 110 mm was used.
  • Stainless steel was used for the electrode on the cathode side.
  • Tungsten was used for the electrode on the anode side.
  • water supply unit 4 water was supplied from a pump and gas was supplied, and water mist was supplied into the reaction vessel 2.
  • gases argon and helium having a pressure of 0 to 0.2 MPa at room temperature were supplied to the gas transport tube 3a.
  • the gas was allowed to flow through the gas transport pipe 3a by controlling the flow rate with a mass flow controller, and discharge was performed under atmospheric pressure at a pressure of atmospheric pressure and room temperature. Discharge was performed with an applied voltage V of 2 to 25 kV, and OH radicals generated by the discharge were detected using a spectroscope. Ozone odor was not generated.
  • FIG. 9 is a diagram showing an emission spectrum of plasma by helium gas and water mist. As is clear from FIG. 9, light emission by OH radicals having an emission wavelength of 309 nm and light emission by He having an emission wavelength of 700 nm were observed.
  • FIG. 10 is a graph showing the dependence of the OH radical on the amount of water introduced with respect to the emission intensity ratio of helium and argon, where (a) is a helium plasma and (b) is an argon plasma.
  • the horizontal axis represents the amount of water introduced (mL / hour), and the vertical axis represents the emission intensity ratio (OH radical / He).
  • the emission intensity ratio (OH radical / He) increases rapidly when the water introduction amount is 0.001 mL / hour or more, and 2 to 6 mL / hour. In the range of, it was found that unevenness was changed.
  • FIG. 10 is a graph showing the dependence of the OH radical on the amount of water introduced with respect to the emission intensity ratio of helium and argon plasma.
  • the horizontal axis represents the amount of water introduced (mL / hour)
  • the vertical axis represents the emission intensity ratio (OH radical / He).
  • the emission intensity ratio (OH radical / He) increases rapidly when the water introduction amount
  • the emission intensity ratio (OH radical / He) increases rapidly when the water introduction amount is 0.1 mL / hour or more, and 2 to 6 mL / hour. In the range of, it was found to be almost constant.
  • FIGS. 11A and 11B are diagrams showing the emission intensity ratio dependence of OH radicals against helium and argon with respect to the applied voltage.
  • FIG. 11A shows helium plasma
  • FIG. 11B shows argon plasma.
  • the horizontal axis in FIG. 11 is the applied voltage (kV)
  • the vertical axis is the emission intensity ratio (OH radical / He).
  • the emission intensity ratio in the case of helium plasma, the emission intensity ratio (OH radical / He) becomes 1 when the applied voltage is 10 kV, and the emission intensity ratio increases as the applied voltage increases.
  • the voltage was about 14 kV, and the emission intensity ratio peaked at about 9.
  • the emission intensity ratio monotonously decreased from 9 to 6 even when the applied voltage was increased to 17 kV.
  • the emission intensity ratio (OH radical / He) becomes 0.5 when the applied voltage is 9 kV, and the emission intensity ratio increases as the applied voltage increases.
  • the applied voltage was about 14 kV to 24 kV, the emission intensity ratio became constant at about 0.9.
  • the pathogen and pest control apparatus 20 shown in FIG. 3 was produced.
  • the reaction vessel 2 a vessel made of quartz having an inner diameter of 4 mm, an outer diameter of 6 mm, and a length of 85 mm was used.
  • An injection needle was used for the insertion portion 25 b of the cathode electrode 25.
  • Water was supplied to the injection needle from a pump, and water mist was supplied from the water supply unit 4 into the reaction vessel 2.
  • Gas was supplied from the gas supply unit 3 into the reaction vessel 2.
  • the anode electrode 26 inserted into the reaction vessel 2 was a tungsten wire bundle, and five wires having a diameter of 0.5 mm were used.
  • As the gas argon, oxygen, or air was supplied to the gas transport tube 3a under atmospheric pressure and room temperature.
  • the gas was allowed to flow through the gas transport pipe 3a by controlling the flow rate with a mass flow controller, and discharge was performed under atmospheric pressure, which was ejected from the gas transport pipe 3a under atmospheric pressure and room temperature. Discharge was performed by changing the applied voltage V from 0 to 25 kV, and OH radicals generated by the discharge were detected using a spectroscope. Ozone odor was not generated.
  • FIGS. 12A and 12B are diagrams showing an emission spectrum of plasma according to the presence or absence of air and water mist.
  • FIG. 12A shows a case where water mist is not added
  • FIG. 12B shows a case where water mist is added.
  • FIG. 13 is an enlarged view of the wavelength region of 300 nm to 350 nm of the emission spectrum of FIG.
  • H ⁇ of 656 nm due to hydrogen (H) is compared with the case where water mist is not added (see FIG. 12A). It can be seen that the emission increases and the emission intensity near 309 nm, which is the emission wavelength of the OH radical, increases.
  • the emission of oxygen (O) is 777 nm.
  • FIG. 14 is a graph showing the dependence of the OH radical on the amount of water introduced relative to the emission intensity ratio of N 2 .
  • the horizontal axis in FIG. 14 is the amount of water introduced (mL / hour), and the vertical axis is the emission intensity ratio (OH radical / N 2 ).
  • the emission intensity ratio (OH radical / N 2 ) is about 0.4 to 0.7 when the water introduction amount is about 1 to 10 ml / hour.
  • the water introduction rate is in the range of 10 to 12 mL / hour, it increases to about 0.4 to 1, and then decreases to about 0.9 in the range of 12 to 14.5 mL / hour. Turned out to be.
  • FIG. 15 is a graph showing the dependence of OH radicals on the emission intensity ratio of helium to the amount of water introduced.
  • the horizontal axis of FIG. 15 is the amount of water introduced (mL / hour), and the vertical axis is the emission intensity ratio (OH radical / He).
  • the emission intensity ratio (OH radical / He) increases to about 2.3 to 3.2 when the water introduction amount is in the range of 0 to 4 mL / hour. Thereafter, it was found that even when the amount of water introduced was increased in the range of 12 to 14.5 mL / hour, the emission intensity ratio (OH radical / He) was saturated at 3.3 to 3.6. Ozone odor was not generated.
  • FIG. 16 is a diagram illustrating the applied voltage dependence on the OH radical and N 2 emission intensity.
  • the horizontal axis in FIG. 16 is the applied voltage (kV), and the vertical axis is the emission intensity (arbitrary scale).
  • OH radical light emission occurred when the applied voltage was 14 kV or higher, and the light emission intensity was substantially constant even when the applied voltage was increased to about 24 kV.
  • Luminous intensity of N 2 the applied voltage is generated at about 14kV or higher, the maximum value then applied voltage 18 kV, when then further increasing the applied voltage, light emission intensity of N 2 was found to decrease. In other words, it was found that a large angle change was exhibited when the applied voltage ranged from about 14 to about 24 kV.
  • FIG. 17 is a diagram showing the applied voltage dependence on the emission intensity of OH radicals and helium.
  • the horizontal axis in FIG. 17 is the applied voltage (kV), and the vertical axis is the emission intensity (arbitrary scale).
  • the emission intensity of the OH radical was generated when the applied voltage was 4 kV or more, and the emission intensity of the OH radical increased with the increase of the applied voltage. It was found that helium luminescence occurs at an applied voltage of about 4 kV or higher, and then the helium luminescence increases in proportion to the applied voltage when the applied voltage is increased to about 23.5 kV.
  • FIG. 18 is a diagram schematically showing a measurement method for examining the density of OH radicals using hydroxylation of terephthalic acid by OH radicals.
  • OH radicals react (hydroxylate) with terephthalic acid to produce hydroxyterephthalic acid.
  • Hydroxyterephthalic acid generates fluorescence having a wavelength of 425 nm when irradiated with violet light of 310 nm. The intensity of this fluorescence increases in proportion to the amount of hydroxyterephthalic acid produced by the reaction of OH radicals with terephthalic acid.
  • FIG. 19 is a diagram showing an emission spectrum of fluorescence generated by hydroxylation of terephthalic acid when the flow rate of helium gas is changed.
  • A is 1 slm
  • (b) is 3 slm
  • (c) is 5 slm
  • d) is 8 slm.
  • slm is standard liter / minute and represents a unit of L / minute.
  • the horizontal axis in FIG. 19 is the wavelength (nm), and the vertical axis is the emission intensity (arbitrary scale). As is clear from FIG.
  • the fluorescence intensity (position of the arrow in the drawing) having a wavelength of 425 nm, that is, the density of OH radicals, increases as the flow rate of helium gas increases to 1 slm, 3 slm, 5 slm, and 8 slm. I understood.
  • FIG. 20 shows the dependence of fluorescence intensity on the flow rate of helium gas.
  • the horizontal axis in FIG. 20 is the helium gas flow rate (slm), and the vertical axis is the emission intensity (arbitrary scale).
  • the fluorescence intensity that is, the OH radical density
  • the pathogen and pest control apparatus 1 of the present invention can efficiently generate OH radicals by changing the flow rate of helium gas.
  • the plasma irradiation distance was 50 mm
  • the plasma irradiation time when the water introduction amount was changed was 10 minutes
  • the plasma irradiation time when the air introduction amount was changed was 1 minute.
  • the voltage during plasma irradiation was 11.5 kV and the frequency was 8.3 kHz.
  • Fig. 21 (a) shows the result when the water introduction amount is changed
  • Fig. 21 (b) shows the result when the air introduction amount is changed.
  • the concentration of hydrogen peroxide increases rapidly to about 2 to 10 times that in the case where water is not introduced. all right.
  • FIG. 21 (b) it was found that when the air introduction amount was increased 4 times from 4 L / min to 16 L / min, the concentration of hydrogen peroxide increased 10 to 100 times or more. In particular, it was found that the concentration of hydrogen peroxide was increased at a rate of 7 L / min or higher. Since OH radicals are generated using hydrogen peroxide, the OH radicals are considered to increase to the same extent as the increase in hydrogen peroxide concentration with an increase in the amount of water introduced and an amount of air introduced.
  • OH radical density and hydrogen peroxide concentration in plasma generated when the plasma irradiation time and the plasma irradiation distance were changed were measured.
  • the OH radical density was measured using the fluorescence intensity at a wavelength of 425 nm based on FIG. 18, and the hydrogen peroxide concentration was measured using a pack test.
  • the voltage during plasma irradiation was 11.7 kV
  • the frequency was 8.3 kHz
  • the air introduction flow rate was 16 L / min
  • the water introduction amount was 91 ⁇ L / min.
  • the plasma irradiation distance when the plasma irradiation time was changed was 30 mm
  • the plasma irradiation time when the plasma irradiation distance was changed was 15 minutes.
  • FIG. 22 The result when the plasma irradiation time t is changed is shown in FIG. 22, and the result when the plasma irradiation distance d is changed is shown in FIG. Also, changes in OH radical density are shown in FIGS. 22 (a) and 23 (b), and changes in the concentration of hydrogen peroxide are shown in FIGS. 22 (b) and 23 (b). As shown in FIG. 22, the OH radical density and the hydrogen peroxide concentration tended to increase as the plasma irradiation time t increased. Further, as shown in FIG. 23 (a), it was found that the OH radical density was large when the plasma irradiation distance d was in the range of 60 mm to 100 mm, and was maximum around 70 mm. Further, as shown in FIG. 23 (b), the hydrogen peroxide concentration tended to decrease as the plasma irradiation distance d increased. In addition, when the above-mentioned pathogen and pest control device was used, no ozone odor was generated.
  • FIG. 24 is a diagram showing a microscopic image of a lily leaf blight fungus 2 days after irradiation with OH radicals generated by helium plasma.
  • A is a fungus when no OH radicals are irradiated
  • a power supply unit 7 The bacteria when turned off and irradiated with He and water mist for 10 minutes, (c) the bacteria when irradiated with OH radicals for 5 minutes, and (d) the bacteria when irradiated with OH radicals for 10 minutes.
  • FIG. 24 it was found that the lily leaf blight fungus was killed by irradiation with OH radicals for 10 minutes.
  • OH radicals generated by adding water mist to air plasma are irradiated to the PDA medium in the same manner as in the case of He plasma, and then divided into nine parts. Incubated at 20 ° C. for 2 days. The distance between the reaction vessel and the PDA medium was about 1 cm. The applied voltage V during discharge was 10 to 20 kV, and the amount of water introduced was 0.1 to 5 mL / hour.
  • FIG. 25 is a diagram showing a microscopic image of a lily leaf blight fungus two days after irradiation with OH radicals generated by air plasma.
  • A is a fungus without irradiation with OH radicals
  • b a power supply unit 7 Bacteria when irradiated with air and water mist for 10 minutes,
  • bacteria when irradiated with OH radicals for 5 minutes and
  • bacteria when irradiated with OH radicals for 10 minutes As shown in FIG. 25, it was found that the lily leaf blight fungus was killed by irradiation with OH radicals for 10 minutes.
  • the temperature state at the time of plasma irradiation is reproduced with a dryer when water mist is introduced and when it is not introduced and without plasma irradiation.
  • Experiments were conducted when water mist was introduced and when water mist was not introduced.
  • the lily leaf blight fungus was cultured for 10 days at 20 ° C. using PDA medium after plasma irradiation or after the wind of a dryer, and the change was observed.
  • Reproduction of the temperature state with a dryer was performed by applying the wind of the dryer while measuring the temperature with a radiation thermometer using the result of measuring the temperature state during plasma irradiation with a radiation thermometer.
  • the plasma irradiation time and the time of applying the wind of the dryer were 10 minutes, and the plasma irradiation distance and the wind injection distance of the dryer were 30 mm.
  • the voltage during plasma irradiation was 11.5 kV, the frequency was 8.3 kHz, the air introduction flow rate was 16 L / min, and the water introduction amount was 98 ⁇ L / min.
  • FIG. 26A shows a case where plasma is irradiated without introducing water mist
  • FIG. 26B shows a case where the wind of a dryer is applied without introducing water mist
  • FIG. (D) shows the result when water mist was introduced and the wind of the dryer was applied
  • (e) shows the result when neither plasma irradiation nor dryer or water was introduced for comparison. is there.
  • the plasma irradiated samples FIGS. 26 (a) and (c)
  • FIG. 26 (a) and (c) have no bacteria breeding even if cultured for 10 days regardless of whether water mist is introduced or not.
  • the wind of the dryer FIG.
  • chrysanthemum rust leaf fungus Similar to lily leaf blight fungus, chrysanthemum rust fungus was cultured in PDA medium, then cut into 5 mm square, OH radical irradiated, divided into 9 parts, and cultured for 4 days at 20 ° C. using PDA medium. . OH radicals were generated using helium plasma. The applied voltage V during discharge was 10 to 20 kV, and the amount of water introduced was 0.1 to 5 mL / hour.
  • FIG. 27 is a view showing a microscopic image 4 days after OH radical irradiation of chrysanthemum rust fungi. As shown in FIG. 27, it was found that chrysanthemum rust fungi were killed by irradiation with OH radicals.
  • the pathogen and pest control apparatus 1 of FIG. 1 uses the pathogen and pest control apparatus 1 of FIG. 1, the change was observed when the plasma was irradiated every day to the idiot fungus and the irradiation time was changed.
  • the idiotic fungus was cultured at 20 ° C. for 24 days using a PDA medium, and changes due to plasma irradiation were observed during that time.
  • the plasma irradiation time was 15 minutes, 10 minutes, and 4 minutes, respectively, and the plasma irradiation distance was 100 mm.
  • the voltage during plasma irradiation was 11.5 kV, the frequency was 8.3 kHz, the air introduction flow rate was 16 L / min, and the water introduction amount was 98 ⁇ L / min.
  • FIG. (A) of FIG. 28 is when the plasma irradiation time is 15 minutes every day
  • (b) is when the plasma irradiation time is 10 minutes every day
  • (c) is when the plasma irradiation time is 4 minutes every day
  • (d ) Shows the result when plasma irradiation is not performed for comparison and only air is blown for 4 minutes every day
  • (e) shows the result when plasma irradiation is not performed for comparison.
  • the bacteria were gradually decreased in the sample irradiated with plasma for 15 minutes every day (FIG. 28 (a)) and the sample irradiated with plasma for 10 minutes every day (FIG. 28 (b)).
  • the idiotic fungus was cultured for 26 days at 20 ° C. using PDA medium, and changes due to plasma irradiation were observed during that time.
  • the plasma irradiation time was 15 minutes, and the plasma irradiation distance was 100 mm.
  • the voltage during plasma irradiation was 11.5 kV, the frequency was 8.3 kHz, the air introduction flow rate was 16 L / min, and the water introduction amount was 98 ⁇ L / min.
  • FIG. 29 (a) is when plasma is irradiated every day
  • (b) is when plasma is irradiated every 2 days
  • (c) is when plasma is irradiated every 5 days
  • (d) is for comparison
  • (e) shows the result when plasma irradiation is not performed for comparison.
  • FIG. 29 (a) it can be seen that in the case of daily plasma irradiation (FIG. 29 (a)), the bacteria are gradually decreased and a bactericidal effect is obtained.
  • FIG. 29 (b) shows what irradiated plasma every 2 days
  • FIG. 29 (c) have acquired the effect which suppresses reproduction of a microbe.
  • the bacteria are gradually growing and the bactericidal effect is not obtained.
  • gray mold fungus (scientific name: Botryotinia fuckeliana))
  • pathogen and pest control apparatus 1 of FIG. 1 plasma irradiation was performed on the gray mold fungus when the water mist was introduced and when it was not introduced, and the changes when the irradiation time was changed Examined.
  • Gray mold fungus was cultured for 10 days at 20 ° C. using PDA medium after plasma irradiation, and the change was observed.
  • the plasma irradiation time was 15 minutes, 10 minutes, 7 minutes, 2 minutes, and 1 minute, respectively, and the plasma irradiation distance was 100 mm.
  • the voltage during plasma irradiation was 11.5 kV, the frequency was 8.3 kHz, and the air introduction flow rate was 16 L / min.
  • the amount of water introduced when water mist was introduced was 117 ⁇ L / min when the irradiation time was 1 to 4 minutes and 91 ⁇ L / min when the irradiation time was 7 to 15 minutes.
  • FIG. 30 shows the experimental results when water mist was not introduced
  • FIG. 31 shows the experimental results when water mist was introduced.
  • the plasma irradiation time is 15 minutes
  • (b) is 10 minutes
  • (c) is 7 minutes
  • (d) is 2 minutes
  • (e) is 1 minute.
  • plasma irradiation for 15 minutes is a fungus that can be cultured for 10 days regardless of whether water mist is introduced or not. From this, it can be seen that the bactericidal effect is obtained.
  • the plasma irradiation of 10 minutes or less increases the irradiation time regardless of whether water mist is introduced or not.
  • the effect of suppressing the growth of the fungus is increasing, it can be seen that the fungus gradually propagates and no bactericidal effect is obtained.
  • the spores of gray mold fungus were irradiated with plasma, and the changes when the irradiation time and irradiation distance were changed were examined.
  • the spores of gray mold were cultured for 10 days at 20 ° C. using PDA medium after plasma irradiation, and the change was observed.
  • the plasma irradiation time was 15 minutes and 4 minutes, respectively, and the plasma irradiation distance was 200 mm and 100 mm, respectively.
  • the voltage during plasma irradiation was 11.7 kV, the frequency was 8.3 kHz, the air introduction flow rate was 16 L / min, and the water introduction amount was 91 ⁇ L / min.
  • the density of the spores was 100/10 ⁇ L.
  • FIG. 32A shows a plasma irradiation time of 15 minutes and an irradiation distance of 200 mm
  • FIG. 32B shows a plasma irradiation time of 15 minutes and an irradiation distance of 100 mm
  • FIG. 32C shows a plasma irradiation.
  • the time is 4 minutes and the irradiation distance is 100 mm
  • (d) shows the result when plasma irradiation is not performed for comparison.
  • the plasma irradiation for 15 minutes (FIGS. 32 (a) and (b)) was sterilized because the bacteria did not propagate after 10 days of cultivation regardless of the irradiation distance. It turns out that the effect is acquired.
  • the plasma irradiation for 4 minutes (FIG. 32 (c)) has the effect of suppressing the growth of bacteria, but the bacteria are gradually growing and the bactericidal effect is not obtained. I understand.
  • FIG. (A) of FIG. 33 is when the hydrogen peroxide concentration is 1000 mg / L, (b) is 625 mg / L, (c) is 250 mg / L, (d) is 100 mg / L, ( e) shows the results when pure water was dropped instead of hydrogen peroxide for comparison, and (f) shows the results when nothing was dropped for comparison.
  • the higher the concentration of hydrogen peroxide the greater the effect of suppressing the growth of the bacteria, but in any case, the bacteria are gradually growing, and it can be seen that the bactericidal effect is not obtained. From this result, it can be said that the bactericidal effect at the time of plasma irradiation is not due to hydrogen peroxide, but is due to OH radicals.
  • FIG. 34 is a view showing a microscope image of aphids when OH radicals are irradiated to the aphids. As shown in FIG. 34, when aphids were irradiated with OH radicals, the aphids were killed or weakened. The individual was confirmed by visual observation or microscopic observation.
  • the mite was irradiated with OH radicals generated using helium plasma using the pathogen and pest control apparatus 1 of FIG.
  • the applied voltage V during discharge was 10 to 20 kV, and the amount of water introduced was 0.1 to 5 ml / hour. It was confirmed by microscopic observation that individuals irradiated with OH radicals died after several days. On the other hand, ticks that were not irradiated with OH radicals survived.
  • the applied voltage is 10 kV to 20 kV (see FIGS. 11 and 16), and 0.001 mL to 10 mL of water mist per hour (FIGS. 14 and 15). (See FIG. 21), and the supply amount of gas such as helium or air is set to 7 liter / minute to 20 liter / minute (see FIG. 21). It has been confirmed that OH radicals generated using helium plasma or air plasma may be irradiated to pathogenic bacteria or pests for at least 5 minutes to 15 minutes.
  • the amount of OH radicals is introduced by the size of the inner diameter of the reaction vessel 2 of the pathogen and pest control apparatus 1 used, the length of the cathode electrode 5 and the anode electrode 6, the surface area of the electrode, the range of the voltage, and the introduction. It is controlled depending on the amount of water mist and the like, and is not limited to the introduction range of 0.001 mL to 10 mL of water mist per hour as described above. Further, the irradiation time is not limited to the above-mentioned irradiation time of 5 minutes to 15 minutes.

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