WO2014080742A1 - Élément optique doté d'une couche conductrice transparente - Google Patents

Élément optique doté d'une couche conductrice transparente Download PDF

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Publication number
WO2014080742A1
WO2014080742A1 PCT/JP2013/079709 JP2013079709W WO2014080742A1 WO 2014080742 A1 WO2014080742 A1 WO 2014080742A1 JP 2013079709 W JP2013079709 W JP 2013079709W WO 2014080742 A1 WO2014080742 A1 WO 2014080742A1
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WO
WIPO (PCT)
Prior art keywords
refractive index
dielectric layer
transparent conductive
index dielectric
conductive layer
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PCT/JP2013/079709
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English (en)
Japanese (ja)
Inventor
伊村　正明
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日本電気硝子株式会社
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Priority to JP2013550703A priority Critical patent/JPWO2014080742A1/ja
Publication of WO2014080742A1 publication Critical patent/WO2014080742A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202—Conductive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/204—Di-electric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/412—Transparent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/418—Refractive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208—Touch screens

Definitions

  • the present invention relates to an optical member with a transparent conductive layer.
  • an optical film having a patterned transparent conductive layer is used for a touch panel or the like.
  • Such an optical film has a problem that the patterned transparent conductive layer is visually recognized and the appearance of the touch panel is deteriorated.
  • a transparent conductive layer is provided by arranging first and second transparent dielectric layers having a predetermined refractive index and thickness between a film substrate and a transparent conductive layer. It has been proposed to reduce the difference in reflectance between the formed portion and the portion where the transparent conductive layer is not provided.
  • the transparent conductive film described in Patent Document 1 the first transparent dielectric layer, the second transparent dielectric layer, and the transparent conductive layer are arranged in this order from the transparent film substrate side. Is formed.
  • the refractive index n1 of the first transparent dielectric layer is larger than the refractive index n3 of the transparent conductive layer.
  • the refractive index n3 of the transparent conductive layer is larger than the refractive index n2 of the second transparent dielectric layer.
  • n1 is 2.0 to 2.3.
  • n2 is 1.4 to 1.5.
  • n3 is 1.9 to 2.1.
  • the thickness of the first transparent dielectric layer is 2 nm to 10 nm.
  • the thickness of the second transparent dielectric layer is 20 nm to 55 nm.
  • the thickness of the transparent conductive layer is 15 nm to 30 nm.
  • the main object of the present invention is to provide an optical member with a transparent conductive layer in which the transparent conductive layer is hardly visible.
  • the optical member with a transparent conductive layer includes a high refractive index dielectric layer, a patterned transparent conductive layer, and a low refractive index dielectric layer.
  • the refractive index of the high refractive index dielectric layer is 1.65 to 1.95.
  • the transparent conductive layer is disposed on the high refractive index dielectric layer.
  • the low refractive index dielectric layer is disposed between the transparent conductive layer and the high refractive index dielectric layer.
  • the low refractive index dielectric layer has a lower refractive index than each of the transparent conductive layer and the high refractive index dielectric layer.
  • the optical member with a transparent conductive layer may further include a second high refractive index dielectric layer and a second low refractive index dielectric layer.
  • the second high refractive index dielectric layer is disposed between the transparent conductive layer and the low refractive index dielectric layer, and has a refractive index of 1.65 or more.
  • the second low-refractive index dielectric layer is disposed between the transparent conductive layer and the second high-refractive index dielectric layer, and the transparent conductive layer, the high-refractive index dielectric layer, and the second high-refractive index.
  • the refractive index is lower than each of the dielectric layers.
  • the refractive index of the high refractive index dielectric layer is preferably less than or equal to the refractive index of the second high refractive index dielectric layer.
  • the thickness of the high refractive index dielectric layer and / or the second high refractive index dielectric layer is preferably 10 nm or more.
  • the refractive index of the high refractive index dielectric layer and / or the second high refractive index dielectric layer is preferably 1.7 or more.
  • the high refractive index dielectric layer and / or the second high refractive index dielectric layer is made of a complex oxide containing at least one selected from the group consisting of Ta, Nb, Zr and Ti and Si. May be.
  • the refractive index of the low refractive index dielectric layer and / or the second low refractive index dielectric layer is 1.6 or less.
  • the low refractive index dielectric layer and / or the second low refractive index dielectric layer may be made of silicon oxide.
  • the thickness of the low refractive index dielectric layer and / or the second low refractive index dielectric layer is preferably 10 nm or more.
  • the refractive index of the transparent conductive layer is preferably 1.7 to 2.2.
  • the thickness of the transparent conductive layer is preferably 15 nm to 200 nm.
  • the thickness and refractive index of the high refractive index dielectric layer, the second high refractive index dielectric layer, the low refractive index dielectric layer, and the second low refractive index dielectric layer are the same as the high refractive index dielectric layer, Compared with the case where the high-refractive-index dielectric layer, the low-refractive-index dielectric layer, and the second low-refractive-index dielectric layer are not provided, the light reflectance in the region where the transparent conductive layer is provided and the transparent It is preferable that the difference between the light reflectance in the region where the conductive layer is not provided is set to be small.
  • a reflection suppressing layer is disposed on the high refractive index dielectric layer or the second high refractive index dielectric layer so as to cover the transparent conductive layer. Is preferred.
  • an optical member with a transparent conductive layer in which the transparent conductive layer is hardly visible.
  • FIG. 1 is a schematic cross-sectional view of an optical member with a transparent conductive layer according to an embodiment of the present invention.
  • FIG. 2 is a schematic cross-sectional view showing an example of a usage mode of the optical member with a transparent conductive layer according to an embodiment of the present invention.
  • FIG. 3 shows the refraction of the high refractive index dielectric layer when the difference in reflectance at a wavelength of 400 nm to 800 nm between the region where the transparent conductive layer is provided and the region where the transparent conductive layer is not provided is minimized. It is a graph showing the relationship between a refractive index and the thickness of a high refractive index dielectric material layer.
  • FIG. 1 is a schematic cross-sectional view of an optical member with a transparent conductive layer according to an embodiment of the present invention.
  • FIG. 2 is a schematic cross-sectional view showing an example of a usage mode of the optical member with a transparent conductive layer according to an embodiment of the present invention.
  • FIG. 3 shows
  • FIG. 4 is a schematic cross-sectional view of an optical member with a transparent conductive layer according to another embodiment of the present invention.
  • FIG. 5 is a schematic cross-sectional view showing an example of a usage mode of an optical member with a transparent conductive layer according to another embodiment of the present invention.
  • FIG. 1 is a schematic cross-sectional view of an optical member 1 with a transparent conductive layer according to an embodiment of the present invention.
  • the optical member 1 includes a base material 10.
  • the substrate 10 is not particularly limited as long as it has translucency.
  • the substrate 10 includes a glass plate 11 and a silicon oxide layer 12 provided on the glass plate 11.
  • the silicon oxide layer 12 functions as an alkali barrier layer, or as an adhesion layer that improves adhesion between the high refractive index dielectric layer 21 and the substrate 10 described later. It may have the function of.
  • the base material 10 may be comprised only by the glass plate, for example.
  • the base material 10 may be comprised with the resin board etc. by which the hard-coat layer etc. were formed in the resin board or the surface.
  • the shape of the base material 10 is not particularly limited, in the present embodiment, the base material 10 has a plate shape.
  • a high refractive index dielectric layer 21 is provided on the substrate 10.
  • the refractive index of the high refractive index dielectric layer 21 is 1.65 to 1.95.
  • the refractive index of the high refractive index dielectric layer 21 is preferably 1.7 or more, and more preferably 1.75 or more.
  • the refractive index of the high refractive index dielectric layer 21 is preferably 1.9 or less, and more preferably 1.85 or less.
  • the constituent material of the high refractive index dielectric layer 21 is not particularly limited as long as the refractive index is 1.65 to 1.95.
  • the high refractive index dielectric layer 21 can be composed of, for example, a complex oxide containing Si and at least one selected from the group consisting of Ta, Nb, Zr and Ti.
  • Specific examples of composite oxides containing at least one selected from the group consisting of Ta, Nb, Zr and Ti and Si include composite oxides of Nb and Si, composite oxides of Ti and Si, Zr And a composite oxide of Ta and Si, and the like.
  • the high refractive index dielectric layer 21 is at least one selected from the group consisting of Ta, Nb, Zr and Ti and an atomic ratio with Si (at least one selected from the group consisting of Ta, Nb, Zr and Ti: Si) is preferably composed of a complex oxide having a ratio of 15:85 to 80:20, and more preferably composed of a complex oxide having a ratio of 25:75 to 70:30.
  • the thickness of the high refractive index dielectric layer 21 is preferably 10 nm or more, and more preferably 12 nm or more.
  • the thickness of the high refractive index dielectric layer 21 is preferably 40 nm or less, and more preferably 35 nm or less.
  • a transparent conductive layer 23 is disposed on the high refractive index dielectric layer 21.
  • the transparent conductive layer 23 is patterned. For this reason, the transparent conductive layer 23 is disposed on a part of the high refractive index dielectric layer 21, and the remaining part of the high refractive index dielectric layer 21 is not covered with the transparent conductive layer 23.
  • the transparent conductive layer 23 can be made of, for example, a transparent conductive oxide.
  • the transparent conductive layer 23 is made of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), or the like. May be.
  • the refractive index of the transparent conductive layer 23 is usually about 1.7 to 2.2. Further, from the viewpoint of reducing the sheet resistance, the thickness of the transparent conductive layer 23 is usually about 15 to 200 nm. If the transparent conductive layer 23 is too thick, light absorption is increased. Therefore, the thickness of the transparent conductive layer 23 is more preferably 50 nm or less, and further preferably 30 nm or less.
  • a low refractive index dielectric layer 22 is disposed between the transparent conductive layer 23 and the high refractive index dielectric layer 21.
  • the low refractive index dielectric layer 22 is provided across a region where the transparent conductive layer 23 is provided and a region where the transparent conductive layer 23 is not provided.
  • the low refractive index dielectric layer 22 is provided on substantially the entire high refractive index dielectric layer 21 including the region where the transparent conductive layer 23 is provided. Therefore, the high refractive index dielectric layer 21 is not exposed from the low refractive index dielectric layer 22.
  • the low refractive index dielectric layer 22 and the transparent conductive layer 23 constitute the surface of the optical member 1.
  • the low refractive index dielectric layer 22 can be composed of, for example, silicon oxide, magnesium fluoride, barium fluoride, or the like.
  • the thickness of the low refractive index dielectric layer 22 is preferably 10 nm or more, and more preferably 20 nm or more.
  • the thickness of the low refractive index dielectric layer 22 is preferably 55 nm or less, and preferably 50 nm or less.
  • FIG. 2 is a schematic cross-sectional view showing an example of how the optical member 1 is used.
  • the optical member 1 can be used in such a manner that the surface on the transparent conductive layer 23 side is adhered to the glass plate 32 by the adhesive layer 31.
  • the refractive index of the adhesive layer 31 is approximately the same as that of the glass plate 32.
  • the antireflection layer 33 is provided on the high refractive index dielectric layer 21 so as to cover the transparent conductive layer 23.
  • the antireflection layer 33 is constituted by, for example, a dielectric multilayer film in which a low refractive index layer having a relatively low refractive index and a high refractive index layer having a relatively high refractive index are alternately stacked. Can do.
  • the thickness and refractive index of the high-refractive index dielectric layer 21 and the low-refractive index dielectric layer 22 are compared with the case where the high-refractive index dielectric layer 21 and the low-refractive index dielectric layer 22 are not provided.
  • the difference between the light reflectance in the region where the transparent conductive layer 23 is provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is set to be small.
  • the thickness and refractive index of the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are the light reflectance in the region where the transparent conductive layer 23 is provided in the visible wavelength region (400 nm to 800 nm), and It is preferable that the difference from the light reflectance in the region where the transparent conductive layer 23 is not provided is set to be minimum. This is because the transparent conductive layer 23 is less visible.
  • the thickness and refractive index of the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are the light reflectance in the region where the transparent conductive layer 23 is provided in the visible wavelength region (400 nm to 800 nm), and It is preferable that the difference from the light reflectance in a region where the transparent conductive layer 23 is not provided is 0.5% or less, and that the difference is 0.3% or less. More preferred.
  • Tables 1 to 4 below show design examples of the optical member 1.
  • “reflectance difference at a wavelength of 550 nm” refers to a difference in reflectance between a region where a transparent conductive layer is provided and a region where a transparent conductive layer is not provided at a wavelength of 550 nm.
  • “Reflectance difference at a wavelength of 550 nm” shown in Tables 1 to 4 is reflectance difference data when the refractive index of the medium located on the transparent conductive layer is 1.5.
  • the ratio shown in the column of the material of the high refractive index dielectric layer is an atomic ratio.
  • the high refractive index dielectric layer 21 is a composite oxide of Ti and Si, in order to set the refractive index of the high refractive index dielectric layer 21 to 1.65 to 1.95, Ti: Si Is about 15:85 to 45:55.
  • Nb: Si in order to set the refractive index of the high refractive index dielectric layer 21 to 1.65 to 1.95, Nb: Si is set to 30. : 70 to 70:30.
  • Zr: Si is 25 : About 75 to 70:30.
  • the high refractive index dielectric layer 21 is a complex oxide of Ta and Si, in order to set the refractive index of the high refractive index dielectric layer 21 to 1.65 to 1.95, Ta: Si is 40 : About 60 to 80:20.
  • FIG. 3 shows a high-refractive-index dielectric layer when the difference in reflectance at a wavelength of 400 nm to 800 nm between the region where the transparent conductive layer 23 is provided and the region where the transparent conductive layer 23 is not provided is minimized.
  • 2 is a graph showing the relationship between the refractive index of 21 and the thickness of the high refractive index dielectric layer 21.
  • the graph shown in FIG. 3 is a graph under the following conditions.
  • Refractive index of the transparent conductive layer 23 1.83 Transparent conductive layer 23 thickness: 18 nm Refractive index of the glass plate 11: 1.5 Refractive index of the silicon oxide layer 12: 1.47 Silicon oxide layer 12 thickness: 10 nm
  • the thickness of the high refractive index dielectric layer should be less than 10 nm in order to make the transparent conductive layer difficult to be seen. There is a need to. However, when the thickness is less than 10 nm, it is difficult to form a uniform high refractive index dielectric layer. In addition, it is difficult to form a high refractive index dielectric layer with a desired thickness. Further, when the thickness of the formed high refractive index dielectric layer deviates from the design value, the optical characteristics of the high refractive index dielectric layer change greatly. Therefore, it is difficult to stably manufacture an optical member in which the transparent conductive layer is hardly visible.
  • the refractive index of the high refractive index dielectric layer is less than 1.65, the light reflectance in the region where the transparent conductive layer is provided and the region where the transparent conductive layer is provided even if the thickness of the high refractive index dielectric layer is increased. It becomes difficult to reduce the difference.
  • the optical member 1 in which the refractive index of the high refractive index dielectric layer 21 is 1.65 to 1.95, by providing the high refractive index dielectric layer 21 having a thickness of 10 nm or more, transparent conductive The difference in light reflectance between the region where the layer 23 is provided and the region where the layer 23 is provided can be reduced. Moreover, since the thickness of the high refractive index dielectric layer 21 can be 10 nm or more, it is easy to form the high refractive index dielectric layer 21 having a uniform thickness. Even when the thickness of the formed high refractive index dielectric layer deviates from the design value, the optical characteristics of the high refractive index dielectric layer are unlikely to change. Therefore, the optical member 1 in which the transparent conductive layer 23 is hardly visible can be easily and stably manufactured.
  • the refractive index of the high refractive index dielectric layer 21 is preferably 1.7 or more, and more preferably 1.75 or more.
  • the refractive index of the high refractive index dielectric layer 21 is 1.65 to 1. More preferred is .95.
  • a low refractive index dielectric layer, a high refractive index dielectric layer, and a transparent conductive layer may be laminated in this order.
  • the difference in light reflectance between the region where the transparent conductive layer is provided and the region where the transparent conductive layer is not provided cannot be made sufficiently small.
  • FIG. 4 is a schematic cross-sectional view of an optical member 2 with a transparent conductive layer according to another embodiment of the present invention.
  • the base material 10 similarly to the embodiment shown in FIG. 1, the base material 10, the high refractive index dielectric layer 21 provided on the base material 10, and the low refractive index dielectric layer 21 provided on the high refractive index dielectric layer 21.
  • a refractive index dielectric layer 22 and a transparent electrode layer 23 provided on the low refractive index dielectric layer 22 are provided.
  • the second high refractive index dielectric layer 24 and the second low refractive index dielectric are further provided between the low refractive index dielectric layer 22 and the transparent electrode layer 23.
  • a layer 25 is provided.
  • the second high refractive index dielectric layer 24 is provided on the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 is the second high refractive index dielectric layer 24. It is provided above.
  • the transparent conductive layer 23 can be further prevented from being visually recognized.
  • the refractive index of the second high refractive index dielectric layer 24 is preferably 1.65 or more, more preferably 1.7 or more, and even more preferably 1.75 or more.
  • the refractive index of the second high refractive index dielectric layer 24 is preferably 2.2 or less, more preferably 1.9 or less, and even more preferably 1.85 or less.
  • the refractive index of the high refractive index dielectric layer 21 is preferably equal to or lower than the refractive index of the second high refractive index dielectric layer 24. Accordingly, the refractive index of the second high refractive index dielectric layer 24 is preferably equal to or higher than the refractive index of the high refractive index dielectric layer 21.
  • the second high-refractive-index dielectric layer 24 can be composed of, for example, a complex oxide containing Si and at least one selected from the group consisting of Ta, Nb, Zr, and Ti.
  • composite oxides containing at least one selected from the group consisting of Ta, Nb, Zr and Ti and Si include composite oxides of Nb and Si, composite oxides of Ti and Si, Zr And a composite oxide of Ta and Si, and the like.
  • the second high refractive index dielectric layer 24 was selected from the group consisting of at least one selected from the group consisting of Ta, Nb, Zr and Ti and the atomic ratio of Si (Ta, Nb, Zr and Ti).
  • at least one type: Si) is composed of a complex oxide of 15:85 to 80:20, and more preferably composed of a complex oxide of 25:75 to 70:30.
  • the thickness of the second high refractive index dielectric layer 24 is preferably 10 nm or more, and more preferably 12 nm or more.
  • the thickness of the second high refractive index dielectric layer 24 is preferably 40 nm or less, and more preferably 35 nm or less.
  • the refractive index of the second low refractive index dielectric layer 25 is lower than the refractive index of the transparent conductive layer 23 and lower than the refractive index of the high refractive index dielectric layer 21, and the second high refractive index. Lower than the refractive index of the dielectric layer 24.
  • the refractive index of the second low refractive index dielectric layer 25 is preferably 1.6 or less, and more preferably 1.55 or less.
  • the refractive index of the second low refractive index dielectric layer 25 is normally 1.38 or more.
  • the second low refractive index dielectric layer 25 can be made of, for example, silicon oxide, magnesium fluoride, barium fluoride, or the like.
  • the thickness of the second low refractive index dielectric layer 25 is preferably 10 nm or more, and more preferably 20 nm or more.
  • the thickness of the second low refractive index dielectric layer 25 is preferably 60 nm or less, and more preferably 55 nm or less.
  • FIG. 5 is a schematic cross-sectional view showing an example of how the optical member 2 is used.
  • a second high refractive index dielectric layer 24 and a second low refractive index dielectric layer 25 are provided between the low refractive index dielectric layer 22 and the transparent electrode layer 23. Except for this, it is the same as the usage mode of the optical member 1 shown in FIG.
  • a reflection suppressing layer 33 is provided on the second high refractive index dielectric layer 24 so as to cover the transparent conductive layer 23.
  • the thickness and refractive index of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are the same as the high refractive index dielectric.
  • the transparent conductive layer 23 is provided. It is set so that the difference between the light reflectance in the region where the transparent conductive layer 23 is not provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is small.
  • the thickness and refractive index of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are in the visible wavelength range ( 400 nm to 800 nm), the difference between the light reflectance in the region where the transparent conductive layer 23 is provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is set to be minimal. preferable. This is because the transparent conductive layer 23 is less visible.
  • the thickness and refractive index of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are in the visible wavelength range ( 400 nm to 800 nm), the difference between the light reflectance in the region where the transparent conductive layer 23 is provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is 0.5% or less. It is preferable that it is provided so that it may become 0.3% or less.
  • Tables 5 to 7 below show design examples of the optical member 2.
  • “maximum reflectance difference (400 ⁇ 800 nm)” is the reflectance between the region where the transparent conductive layer is provided and the region where the transparent conductive layer is not provided in the wavelength region of 400 to 800 nm. This is the difference in reflectance at the wavelength where the difference is maximized.
  • “Average reflectance difference (400-800 nm)” is an average of absolute values of reflectance differences between a region where a transparent conductive layer is provided and a region where a transparent conductive layer is not provided in a wavelength region of 400 to 800 nm. is there.
  • the “maximum reflectance difference (400-800 nm)” and “average reflectance difference (400-800 nm)” shown in Tables 5 to 7 indicate that the refractive index of the medium located on the transparent conductive layer is 1.5. It is data of the reflectance difference in the case.
  • the ratio shown in the column of the material of the high refractive index dielectric layer and the second high refractive index dielectric layer is an atomic ratio.

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Abstract

La présente invention concerne un élément optique doté d'une couche conductrice transparente et dans lequel la couche conductrice transparente est difficilement distinguée visuellement. L'élément optique (1) doté d'une couche conductrice transparente est pourvu : d'une couche diélectrique à indice de réfraction élevé (21) ; d'une couche conductrice transparente à motifs (23) ; et d'une couche diélectrique à indice de réfraction faible (22). L'indice de réfraction de la couche diélectrique à indice de réfraction élevé (21) est compris dans la plage allant de 1,65 à 1,95. La couche conductrice transparente (23) est agencée au-dessus de la couche diélectrique à indice de réfraction élevé (21). La couche diélectrique à indice de réfraction faible (22) est agencée entre la couche conductrice transparente (23) et la couche diélectrique à indice de réfraction élevé (21). La couche diélectrique à indice de réfraction faible (22) présente un indice de réfraction plus faible que ceux de la couche transparente conductrice (23) et de la couche diélectrique à indice de réfraction élevé (21).
PCT/JP2013/079709 2012-11-26 2013-11-01 Élément optique doté d'une couche conductrice transparente WO2014080742A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104766647A (zh) * 2015-04-02 2015-07-08 江苏双星彩塑新材料股份有限公司 Ito透明导电薄膜
WO2015166724A1 (fr) * 2014-04-30 2015-11-05 日東電工株式会社 Film électroconducteur transparent

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