WO2014013962A1 - Continuous pattern plating transfer system and method for manufacturing continuous pattern plating transfer material - Google Patents

Continuous pattern plating transfer system and method for manufacturing continuous pattern plating transfer material Download PDF

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Publication number
WO2014013962A1
WO2014013962A1 PCT/JP2013/069238 JP2013069238W WO2014013962A1 WO 2014013962 A1 WO2014013962 A1 WO 2014013962A1 JP 2013069238 W JP2013069238 W JP 2013069238W WO 2014013962 A1 WO2014013962 A1 WO 2014013962A1
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Prior art keywords
pattern
pattern plating
plating
transfer
cylinder body
Prior art date
Application number
PCT/JP2013/069238
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French (fr)
Japanese (ja)
Inventor
重田 龍男
Original Assignee
株式会社シンク・ラボラトリー
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Application filed by 株式会社シンク・ラボラトリー filed Critical 株式会社シンク・ラボラトリー
Priority to CN201380019122.9A priority Critical patent/CN104206031B/en
Priority to KR1020147026916A priority patent/KR101603967B1/en
Publication of WO2014013962A1 publication Critical patent/WO2014013962A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/10Moulds; Masks; Masterforms
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/20Separation of the formed objects from the electrodes with no destruction of said electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/205Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0104Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0143Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating

Definitions

  • the present invention relates to a plating transfer product using continuous pattern plating, in particular, a continuous pattern plating transfer system suitable for manufacturing a printed circuit board, and a method of manufacturing a continuous pattern plating transfer product using the same.
  • printed circuit boards are largely divided into single-sided printed circuit boards in which circuits are formed only on one side of an insulating substrate, double-sided printed circuit boards in which circuits are formed on both sides, and multilayer printed circuit boards in which circuits are formed in multiple layers. Separated.
  • the component elements were simple and the circuit pattern was simple, and single-sided printed circuit boards were used.
  • the complexity of circuits has increased, and the demand for higher density and smaller circuits has also increased. It is common to use a circuit board or a multilayer printed circuit board.
  • the most frequently used material for a double-sided printed circuit board is a copper clad laminate in which a thin copper plating layer is formed on both sides of an insulator (Patent Document 1).
  • the printed circuit board is classified into a rigid type, a flexible type, and a rigid-flexible type in which these two are mixed depending on the material of the base material.
  • a rigid printed circuit board refers to a known fixed printed circuit board.
  • the flexible printed circuit board is flexible and is used when it is necessary to attach the printed circuit board in a bent or bent state in an electronic device or the like. Further, when electrical connection is required at a portion driven like a printer head, it is also used as a kind of connector.
  • a rigid-flexible printed circuit board is a printed circuit board in which a rigid printed circuit board is connected by a flexible printed circuit board, and more elaborate circuits can be manufactured and electrical connection can be reduced. High reliability. Therefore, it is often used for aerospace and military equipment. Furthermore, recently, it is also used for electrical connection of a folded portion of a foldable mobile phone. Rigid-flexible printed circuit boards are manufactured by combining original plates made of different materials, so there is a difficulty in that production efficiency is low and special technologies are required. The frequency of use is increasing along with the shift to commercialization.
  • any circuit pattern forming method is based on etching and plating. . That is, both of them are appropriately used to adapt to the required properties and economic conditions of various substrates (Patent Documents 2 to 4).
  • Patent Documents 2 to 4 the quality of the circuit pattern is determined by the quality of the etching, so it is necessary to perform very precise etching, and it takes time and cost to perform the etching. It was a thing.
  • the present invention has been made in view of the above-described problems of the prior art, and an object of the present invention is to provide a continuous pattern plating transfer system and a continuous pattern plating transfer material manufacturing method that perform patterning only by plating and do not require etching. To do.
  • the applicant of the present application has been conducting research and development on a method for patterning gravure plate rolls using DLC (diamond-like carbon), and by using DLC, it is possible to achieve very precise and fine patterning.
  • DLC diamond-like carbon
  • the present invention has been completed through extensive research.
  • a continuous pattern plating transfer system includes a plating unit including at least one plating tank containing a plating solution, and a pattern plating layer on the surface of the plating unit immersed in the plating solution.
  • a plating unit including at least one plating tank containing a plating solution, and a pattern plating layer on the surface of the plating unit immersed in the plating solution.
  • At least one DLC pattern cylinder body that is formed and rotatably provided, a printing substrate continuously conveyed to the surface of the DLC pattern cylinder body, and the DLC on at least one surface of the printing substrate
  • At least one printing substrate rotating means including a pressure-transfer roller that pressure-transfers the pattern-plating layer from the surface of the pattern cylinder body, and the pattern-plating layer is formed on the substrate for printing by the pressure-transfer roller.
  • the pattern plating layer is continuously transferred by applying pressure transfer to at least a part. It is characterized by comprising.
  • a synthetic resin film such as a polyimide film
  • a metal used for the pattern plating layer any metal that can be plated can be applied.
  • nickel, tungsten, chromium, titanium, gold, silver, platinum, iron, copper, aluminum, and the like can be applied. .
  • the DLC pattern cylinder body has a diameter of about 200 mm to 1000 mm, it is preferable to rotate the DLC pattern cylinder body at a low speed of about 0.01 to 10 rpm.
  • a release treatment zone for releasing the pattern plating layer by immersing the pattern plating layer in a release treatment agent is provided on the DLC pattern cylinder body. This is because the pattern plating layer is easily transferred to the substrate for printing by immersing the pattern plating layer on the DLC pattern cylinder body in a release treatment agent.
  • a release treatment agent unit containing a release treatment agent may be provided on the DLC pattern cylinder body.
  • the pressure transfer position is a position where the pattern plating layer is pressure transferred to at least a part of the substrate for printing by the pressure transfer roller. It is preferable that the release processing zone is located downstream in the rotation direction of the DLC pattern cylinder body.
  • a washing / drying zone for washing and drying the pattern plating layer is provided on the DLC pattern cylinder body. This is because dirt or the like can be removed by washing and drying the pattern plating layer on the DLC pattern cylinder body.
  • a washing / drying unit containing a washing device and a drying device may be provided on the DLC pattern cylinder body.
  • a conventionally well-known apparatus can be used as a washing apparatus and a drying apparatus.
  • the washing / drying zone is located downstream in the rotation direction of the pattern cylinder body.
  • the continuous pattern plating transfer multi-system of the present invention is a continuous pattern plating transfer multi-system in which a plurality of the continuous pattern plating transfer systems are provided, and is used for printing a pattern plating layer by at least the first continuous pattern plating transfer system. It is characterized in that it is transferred to one surface of the substrate and the pattern plating layer is transferred to the other surface of the printing substrate by at least a second continuous pattern plating transfer system.
  • at least one type of pattern plating layer can be transferred to one side of the printing substrate, and at least another type of pattern plating layer can be transferred to the other side of the printing substrate.
  • a pattern plating layer can be transcribe
  • the continuous pattern plating transfer product manufacturing method of the present invention is a continuous pattern plating transfer product manufacturing method using the above-described system of the present invention, and a step of forming a pattern plating layer on the surface of the DLC pattern cylinder body, Forming a plated transfer product by pressure-transferring the pattern plating layer onto at least a part of the substrate for printing by the pressure-transfer roller.
  • the continuous pattern plating transfer product of the present invention is a continuous pattern plating transfer product manufactured using the above-described system of the present invention, wherein a pattern plating layer is formed on the surface of the DLC pattern cylinder body, and the pattern plating layer Is produced by pressure-transferring at least a part of the substrate for printing by the pressure-transfer transfer roller.
  • the continuous pattern plating transfer product is a printed circuit board.
  • the continuous pattern plating transfer product means a product obtained by continuously plating a pattern and transferring the plating.
  • FIG. 1 is a schematic side view showing one embodiment of a continuous pattern plating transfer system of the present invention.
  • FIG. It is typical explanatory drawing which shows the formation procedure of a continuous pattern plating transcription
  • 1 is a schematic side view illustrating one embodiment of a continuous pattern plating transfer multi-system of the present invention.
  • reference numeral 10A denotes a continuous pattern plating transfer system according to the present invention.
  • the continuous pattern plating transfer system 10A includes a plating unit 14 including at least one plating tank 12 containing a plating solution M, and a pattern plating layer MA formed on the surface of the plating unit 14 by being immersed in the plating solution M of the plating tank 12. And at least one DLC pattern cylinder body 16 that is rotatably provided, a printing substrate 18 that is continuously conveyed to the surface of the DLC pattern cylinder body 16, and at least one surface of the printing substrate 18 At least one substrate rotation means 22 for printing including a pressure transfer roller 20 for pressure transfer of the pattern plating layer MA from the surface of the DLC pattern cylinder body 16 is included.
  • the printing substrate 18 is sent out by a delivery roller 21 and continuously conveyed, and the manufactured continuous pattern plating transfer product 25 is taken up by a take-up roller 23.
  • a synthetic resin film such as a polyimide film can be applied. Also in the illustrated example, an example using a polyimide film is shown.
  • the DLC pattern cylinder body 16 has a diameter of about 200 mm to 1000 mm, it is preferable to rotate the DLC pattern cylinder body 16 at a low speed of about 0.01 to 10 rpm.
  • the pattern plating layer MA is transferred to at least a part of the substrate 18 for printing by the pressure-transfer roller 20 so as to be continuously applied to the substrate 18 for printing as shown in FIG.
  • the pattern plating layer is transferred.
  • the continuous pattern plating transfer system 10 ⁇ / b> A is easy to release the pattern plating layer MA from the pattern plating layer MA from the DLC pattern cylinder body 16 by immersing the pattern plating layer MA in a release treatment agent.
  • a release treatment zone 24 for performing a peeling treatment for the purpose is provided on the DLC pattern cylinder body 16.
  • the release treatment zone 24 is configured such that a release treatment unit 26 containing a release treatment agent is provided on the DLC pattern cylinder body 16.
  • the DLC pattern cylinder body 16 with respect to the pressure transfer position P that is the position where the pattern plating layer MA is pressure transferred to at least a part of the printing substrate 18 by the pressure transfer roller 20.
  • An example in which the mold release treatment zone 24 is positioned downstream in the rotation direction is shown.
  • a washing / drying zone 28 for washing and drying the pattern plating layer MA is provided on the DLC pattern cylinder body 16.
  • the washing / drying zone 28 is configured such that a washing / drying unit 30 including a washing device and a drying device is provided on the DLC pattern cylinder body 16.
  • the DLC pattern cylinder body 16 with respect to the pressure transfer position P that is the position where the pattern plating layer MA is pressure transferred to at least a part of the printing substrate 18 by the pressure transfer roller 20.
  • the washing / drying zone 28 is positioned upstream in the rotation direction.
  • Reference numeral 52 denotes a sponge roller for preventing the mold release treatment agent from entering the plating solution M
  • reference numeral 54 denotes a sponge roller for discharging the plating solution M.
  • Reference numerals 56 and 58 denote rollers.
  • a convex DLC pattern 32 formed by a method described later is provided on the surface of the DLC pattern cylinder body 16, and a surface portion other than the DLC pattern 32 is a concave portion 34 in which the plating solution M can be accommodated.
  • the DLC pattern cylinder body 16 is rotatably provided.
  • the plating solution M is accommodated in the concave portion 34, which is well illustrated in FIGS.
  • the pattern plating layer MA is formed on the surface.
  • any metal that can be plated can be applied. For example, nickel, tungsten, chromium, titanium, gold, silver, platinum, iron, copper, aluminum or the like can be applied. it can.
  • FIG. 1 shows an example in which copper plating is performed using an insoluble anode.
  • Reference numeral 36 denotes an insoluble anode for plating installed in the plating tank 12 and is connected to a plus terminal.
  • the center of the DLC pattern cylinder body 16 is connected to the negative terminal.
  • the DLC pattern cylinder body 16 is hollow, and the hollow center is rotatably supported by the chuck means 38.
  • a plating unit similar to that used in the fully automatic gravure plate processing system disclosed in Patent Document 5 can be used.
  • a continuous pattern plating transfer multisystem 50 of the present invention is a continuous pattern plating transfer multisystem provided with a plurality of the above-described continuous pattern plating transfer systems. That is, in the continuous pattern plating transfer multisystem 50, the pattern plating layer MA is transferred to one surface of the printing substrate 18 by at least the first continuous pattern plating transfer system 10A, and the pattern is transferred by at least the second continuous pattern plating transfer system 10B. The plating layer MA is configured to be transferred to the other surface of the printing substrate 18.
  • FIG. 3 an example is shown in which two continuous pattern plating transfer systems, a continuous pattern plating transfer system 10A and a continuous pattern plating transfer system 10B, are arranged.
  • the continuous pattern plating transfer system 10A Since the configuration of the continuous pattern plating transfer system 10A is as described above, detailed description thereof is omitted.
  • the continuous pattern plating transfer system 10B can have the same configuration as the continuous pattern plating transfer system 10A.
  • the printing substrate 18 is fed by the feeding roller 21 and continuously conveyed, and is transferred to one surface (the surface side in the illustrated example) of the printing substrate 18 by the continuous pattern plating transfer system 10A. Then, the pattern plating layer MB that is continuously conveyed to the surface of the DLC pattern cylinder body 16 of the continuous pattern plating transfer system 10B and formed on the surface of the DLC pattern cylinder body 16 is printed on the substrate for printing by the pressure-transfer roller 20.
  • the continuous pattern plating transfer product 40 transferred to the other surface 18 (the back surface side in the illustrated example) and manufactured in this manner is wound up by a winding roller 42.
  • Reference numeral 60 denotes a roller.
  • the manufacturing method of the continuous pattern plating transfer product of the present invention is a manufacturing method using the above-described system of the present invention, comprising the step of forming a pattern plating layer MA on the surface of the DLC pattern cylinder body 16, and the pattern plating. Forming a plating transfer product 25, 40 by pressure-transferring the layer MA onto at least a part of the substrate 18 for printing by the press-transfer roller 20, and a continuous pattern plating transfer product manufacturing method. By doing so, patterning is performed only by plating and etching becomes unnecessary.
  • the photosensitive material 214 is applied to the surface of the cylinder base material 212 which is the base material (step 300 in FIG. 4A and FIG. 5).
  • the cylinder body base 212 a hollow roll made of aluminum alloy, iron, or CFRP (fiber reinforced plastic) can be used.
  • the photosensitive composition used as the photosensitive material can be either a negative type or a positive type, but it is preferable to use a negative photosensitive composition.
  • a DLC coating film 218 is formed on the surfaces of the cylinder body base material 212 and the resist pattern 216 (FIG. 4C and step 304 in FIG. 5).
  • the DLC coating film may be formed by a CVD (Chemical Vapor Deposition) method or a sputtering method.
  • the DLC coating film formed on the resist pattern is peeled off together with the resist pattern to form the convex DLC pattern 220 and the concave portion 222 on the surface of the substrate (steps of FIG. 4D and FIG. 5). 306).
  • the DLC pattern cylinder body 224 can be manufactured. This manufactured DLC pattern cylinder body can be used as the DLC pattern cylinder body 16 in the present invention.
  • 10A, 10B Continuous pattern plating transfer system
  • 12 plating tank
  • 14 plating unit
  • 16,224 DLC pattern cylinder body
  • 18 substrate for printing
  • 20 pressure transfer roller
  • 21 delivery roller
  • 22 printing Substrate rotating means
  • 23, 42 winding roller
  • 24 release processing zone
  • 25 continuous pattern plating transfer product
  • 26 release processing unit
  • 28 water washing drying zone
  • 30 water washing drying unit 32
  • 220 DLC pattern
  • 36 insoluble anode for plating
  • 38 chuck means
  • 50 continuous pattern plating transfer multisystem
  • 52, 54 sponge roller
  • 56, 58, 60 roller
  • 212 cylinder body base material
  • 214 photosensitive material
  • 216 resist pattern
  • 218 coating film
  • MA Plating solution
  • P crimping transfer position.

Abstract

Provided are a continuous pattern plating transfer system and a method for manufacturing continuous pattern plating transfer material that carry out patterning only with plating and do not require etching. The present invention includes: a plating unit that includes at least one plating tank that accommodates a plating solution; at least one DLC pattern cylinder body that is immersed in the plating solution in the plating tank, has a pattern plating layer formed on the surface thereof, and is provided rotatably; and at least one printing base material rotating means that includes printing base material transported continuously to the surface of the DLC pattern cylinder body and a pressure transfer roller that carries out pressure transfer of the pattern plating layer from the surface of the DLC pattern cylinder body onto at least one surface of the printing base material. The pattern plating layer is continuously transferred by carrying out pressure transfer of the pattern plating layer to at least part of the printing base material by the pressure transfer roller.

Description

連続パターンメッキ転写システム及び連続パターンメッキ転写物製造方法Continuous pattern plating transfer system and method of manufacturing continuous pattern plating transfer
 本発明は、連続パターンメッキを用いたメッキ転写物、特にプリント回路基板の製造に適した連続パターンメッキの転写システム及びそれを用いた連続パターンメッキの転写物の製造方法に関する。 The present invention relates to a plating transfer product using continuous pattern plating, in particular, a continuous pattern plating transfer system suitable for manufacturing a printed circuit board, and a method of manufacturing a continuous pattern plating transfer product using the same.
 従来、プリント回路基板は、その層数によって、絶縁基板の片面にのみ回路を形成した片面プリント回路基板、両面に回路を形成した両面プリント回路基板、及び多層に回路形成した多層プリント回路基板に大別される。従来は部品素子が単純で回路パターンも簡単であって片面プリント回路基板を使用していたが、最近は回路の複雑度が増してきて高密度化及び小型化回路に対する要求も増加して両面プリント回路基板や多層プリント回路基板を使用することが一般的である。両面プリント回路基板の材料として最も多く用いられるものは、絶縁物の両側に薄く銅メッキ層を形成した銅張積層板である(特許文献1)。 Conventionally, depending on the number of layers, printed circuit boards are largely divided into single-sided printed circuit boards in which circuits are formed only on one side of an insulating substrate, double-sided printed circuit boards in which circuits are formed on both sides, and multilayer printed circuit boards in which circuits are formed in multiple layers. Separated. Conventionally, the component elements were simple and the circuit pattern was simple, and single-sided printed circuit boards were used. Recently, however, the complexity of circuits has increased, and the demand for higher density and smaller circuits has also increased. It is common to use a circuit board or a multilayer printed circuit board. The most frequently used material for a double-sided printed circuit board is a copper clad laminate in which a thin copper plating layer is formed on both sides of an insulator (Patent Document 1).
 プリント回路基板は、基材の材質によって、リジッド型、フレキシブル型及びこれら2つを混合したリジッド-フレキシブル型に分類される。リジッド型プリント回路基板とは、公知の固定されたプリント回路基板をさす。一方で、フレキシブル型プリント回路基板は、柔軟性があり、電子機器等の中で屈曲又は折曲状態でプリント回路基板を取り付ける必要がある場合に使用される。さらに、プリンタのヘッドのように駆動される部分で、電気的連結が必要な場合、一種のコネクタとしても使用される。 The printed circuit board is classified into a rigid type, a flexible type, and a rigid-flexible type in which these two are mixed depending on the material of the base material. A rigid printed circuit board refers to a known fixed printed circuit board. On the other hand, the flexible printed circuit board is flexible and is used when it is necessary to attach the printed circuit board in a bent or bent state in an electronic device or the like. Further, when electrical connection is required at a portion driven like a printer head, it is also used as a kind of connector.
 リジッド-フレキシブル型プリント回路基板は、リジッド型プリント回路基板がフレキシブル型プリント回路基板によって連結されている形のプリント回路基板であって、より精巧な回路の製作が可能で電気的接続が減少でき、信頼性が高い。そのため、航空宇宙、軍事用装備に多く使用される。さらに、最近では折り畳み型携帯電話の折られる部分の電気接続のためにも使用されている。リジッドーフレキシブル型プリント回路基板は、互いに異なる材質の原板を結合させて製作するため、生産効率が低く、特殊な技術が求められるという難しさがあったが、電子製品の機能の多様化及び小型化に伴って使用の頻度が増加しつつある。 A rigid-flexible printed circuit board is a printed circuit board in which a rigid printed circuit board is connected by a flexible printed circuit board, and more elaborate circuits can be manufactured and electrical connection can be reduced. High reliability. Therefore, it is often used for aerospace and military equipment. Furthermore, recently, it is also used for electrical connection of a folded portion of a foldable mobile phone. Rigid-flexible printed circuit boards are manufactured by combining original plates made of different materials, so there is a difficulty in that production efficiency is low and special technologies are required. The frequency of use is increasing along with the shift to commercialization.
 プリント回路基板の製造の際、回路パターンの設計を済ませた後、この設計済の回路パターンを基板上に形成する方法にはいろいろあるが、いずれの回路パターン形成方法もエッチングとメッキを基本とする。すなわち、この両者を適切に使用して、求められる種々の基板の性質及び経済条件に適合させるものであった(特許文献2~4)。しかしながら、メッキを行った後にエッチングを行う場合にはエッチングの良否によって回路パターンの良否が決定されてしまうもので、非常に精密なエッチングを行う必要があり、エッチングを行う分だけ時間やコストがかかるものであった。そこでメッキのみで回路パターンを形成しエッチングを不要とする回路パターン形成方法が待望されているが、いまだメッキのみでパターニングを行ってエッチングを不要とするプリント回路基板の製造装置や方法は開発されていないのが現状である。 There are various methods for forming the designed circuit pattern on the substrate after designing the circuit pattern in the production of the printed circuit board, and any circuit pattern forming method is based on etching and plating. . That is, both of them are appropriately used to adapt to the required properties and economic conditions of various substrates (Patent Documents 2 to 4). However, when etching is performed after plating, the quality of the circuit pattern is determined by the quality of the etching, so it is necessary to perform very precise etching, and it takes time and cost to perform the etching. It was a thing. Therefore, there is a need for a circuit pattern forming method that forms a circuit pattern only by plating and does not require etching, but a printed circuit board manufacturing apparatus and method that does not require etching by patterning only by plating have been developed. There is no current situation.
特開2002-171032号公報JP 2002-171032 A 特開2004-214590号公報JP 2004-214590 A 特開2004-273915号公報JP 2004-273915 A 特開2009-158707号公報JP 2009-158707 A 国際公開WO2011/125926International Publication WO2011 / 125926
 本発明は、上記した従来技術の問題点に鑑みなされたもので、メッキのみでパターニングを行ってエッチングを不要とする連続パターンメッキ転写システム及び連続パターンメッキ転写物製造方法を提供することを目的とする。
 本願出願人は、DLC(ダイヤモンドライクカーボン)によってグラビア製版ロール等にパターニングを行う方法についての研究開発を行っており、DLCを用いることによって非常に精度がよく微細なパターニングを実現することが可能となり、例えば特願2011-11141及び特願2012-120058として提案しているが、そのDLCを用いてパターニングを行う技術をプリント回路基板などの連続パターンメッキ転写物の製造に適用することに着眼し、鋭意研究を重ねて、本発明を完成したものである。
The present invention has been made in view of the above-described problems of the prior art, and an object of the present invention is to provide a continuous pattern plating transfer system and a continuous pattern plating transfer material manufacturing method that perform patterning only by plating and do not require etching. To do.
The applicant of the present application has been conducting research and development on a method for patterning gravure plate rolls using DLC (diamond-like carbon), and by using DLC, it is possible to achieve very precise and fine patterning. Have been proposed as, for example, Japanese Patent Application No. 2011-11141 and Japanese Patent Application No. 2012-120058, but focusing on applying the patterning technology using the DLC to the production of a continuous pattern plating transfer product such as a printed circuit board, The present invention has been completed through extensive research.
 上記課題を解決するため、本発明の連続パターンメッキ転写システムは、メッキ液を収容した少なくとも一つのメッキ槽を含むメッキユニットと、該メッキ槽のメッキ液に浸漬されてその表面にパターンメッキ層が形成されるとともに回動可能に設けられた少なくとも一つのDLCパターンシリンダ体と、該DLCパターンシリンダ体の表面に連続的に搬送されるプリント用基材及び該プリント用基材の少なくとも一面に該DLCパターンシリンダ体の表面から該パターンメッキ層を圧着転写する圧着転写ローラーを含む少なくとも一つのプリント用基材回動手段と、を含み、前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによって連続的に前記パターンメッキ層が転写されてなることを特徴とする。 In order to solve the above problems, a continuous pattern plating transfer system according to the present invention includes a plating unit including at least one plating tank containing a plating solution, and a pattern plating layer on the surface of the plating unit immersed in the plating solution. At least one DLC pattern cylinder body that is formed and rotatably provided, a printing substrate continuously conveyed to the surface of the DLC pattern cylinder body, and the DLC on at least one surface of the printing substrate At least one printing substrate rotating means including a pressure-transfer roller that pressure-transfers the pattern-plating layer from the surface of the pattern cylinder body, and the pattern-plating layer is formed on the substrate for printing by the pressure-transfer roller. The pattern plating layer is continuously transferred by applying pressure transfer to at least a part. It is characterized by comprising.
 プリント用基材としては、例えばポリイミドフィルムなどの合成樹脂製フィルムが適用できる。パターンメッキ層に用いられる金属としては、メッキ可能な金属であればいずれも適用でき、例えば、ニッケル、タングステン、クロム、チタン、金、銀、白金、鉄、銅、アルミニウムなどを適用することができる。 As the substrate for printing, for example, a synthetic resin film such as a polyimide film can be applied. As the metal used for the pattern plating layer, any metal that can be plated can be applied. For example, nickel, tungsten, chromium, titanium, gold, silver, platinum, iron, copper, aluminum, and the like can be applied. .
 また、前記DLCパターンシリンダ体が直径200mm~1000mm程度の場合には、前記DLCパターンシリンダ体を0.01~10rpm程度の低速回転させるのが好適である。 In addition, when the DLC pattern cylinder body has a diameter of about 200 mm to 1000 mm, it is preferable to rotate the DLC pattern cylinder body at a low speed of about 0.01 to 10 rpm.
 また、前記パターンメッキ層を離型処理剤に浸漬して離型処理するための離型処理ゾーンが、前記DLCパターンシリンダ体上に設けられているのが好ましい。前記DLCパターンシリンダ体上の前記パターンメッキ層を離型処理剤に浸漬することで、前記パターンメッキ層がプリント用基材に転写され易くなるからである。この離型処理ゾーンとしては、離型処理剤が入った離型処理剤ユニットを、前記DLCパターンシリンダ体上に設けるようにすればよい。前記離型処理ゾーンの位置に特別の限定はないが、前記パターンメッキ層が前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめられる位置である圧着転写位置に対して、前記DLCパターンシリンダ体の回転方向の下流に前記離型処理ゾーンが位置するのが好適である。 Further, it is preferable that a release treatment zone for releasing the pattern plating layer by immersing the pattern plating layer in a release treatment agent is provided on the DLC pattern cylinder body. This is because the pattern plating layer is easily transferred to the substrate for printing by immersing the pattern plating layer on the DLC pattern cylinder body in a release treatment agent. As the release treatment zone, a release treatment agent unit containing a release treatment agent may be provided on the DLC pattern cylinder body. Although there is no particular limitation on the position of the mold release treatment zone, the pressure transfer position is a position where the pattern plating layer is pressure transferred to at least a part of the substrate for printing by the pressure transfer roller. It is preferable that the release processing zone is located downstream in the rotation direction of the DLC pattern cylinder body.
 前記パターンメッキ層を水洗及び乾燥するための水洗乾燥ゾーンが、前記DLCパターンシリンダ体上に設けられているのが好ましい。前記DLCパターンシリンダ体上の前記パターンメッキ層を水洗及び乾燥することで、汚れなどを除去することができるからである。この水洗乾燥ゾーンとしては、水洗装置と乾燥装置が入った水洗乾燥ユニットを、前記DLCパターンシリンダ体上に設けるようにすればよい。水洗装置及び乾燥装置としては、従来公知の装置が使用できる。前記水洗乾燥ゾーンの位置に特別の限定はないが、前記パターンメッキ層が前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめられる位置である圧着転写位置に対して、前記DLCパターンシリンダ体の回転方向の下流に前記水洗乾燥ゾーンが位置するのが好適である。 It is preferable that a washing / drying zone for washing and drying the pattern plating layer is provided on the DLC pattern cylinder body. This is because dirt or the like can be removed by washing and drying the pattern plating layer on the DLC pattern cylinder body. As this washing / drying zone, a washing / drying unit containing a washing device and a drying device may be provided on the DLC pattern cylinder body. A conventionally well-known apparatus can be used as a washing apparatus and a drying apparatus. Although there is no particular limitation on the position of the washing / drying zone, the DLC with respect to the pressure transfer position where the pattern plating layer is pressure transferred to at least a part of the substrate for printing by the pressure transfer roller. It is preferable that the washing / drying zone is located downstream in the rotation direction of the pattern cylinder body.
 また、本発明の連続パターンメッキ転写マルチシステムは、前記連続パターンメッキ転写システムが複数設けられてなる連続パターンメッキ転写マルチシステムであり、少なくとも第一の連続パターンメッキ転写システムでパターンメッキ層をプリント用基材の一面に転写せしめ、少なくとも第二の連続パターンメッキ転写システムでパターンメッキ層をプリント用基材の他面に転写せしめてなることを特徴とする。このように構成すれば、プリント用基材の一面に少なくとも一種類のパターンメッキ層を転写でき、プリント用基材の他面に少なくとももう一種類のパターンメッキ層を転写できるからである。これにより、前記プリント用基材の両側の面にパターンメッキ層を転写することができる。 The continuous pattern plating transfer multi-system of the present invention is a continuous pattern plating transfer multi-system in which a plurality of the continuous pattern plating transfer systems are provided, and is used for printing a pattern plating layer by at least the first continuous pattern plating transfer system. It is characterized in that it is transferred to one surface of the substrate and the pattern plating layer is transferred to the other surface of the printing substrate by at least a second continuous pattern plating transfer system. With this configuration, at least one type of pattern plating layer can be transferred to one side of the printing substrate, and at least another type of pattern plating layer can be transferred to the other side of the printing substrate. Thereby, a pattern plating layer can be transcribe | transferred to the surface of the both sides of the said base material for printing.
 本発明の連続パターンメッキ転写物の製造方法は、上記した本発明のシステムを用いる連続パターンメッキ転写物の製造方法であって、前記DLCパターンシリンダ体の表面にパターンメッキ層を形成する工程と、前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによってメッキ転写物を形成する工程と、を有することを特徴とする。 The continuous pattern plating transfer product manufacturing method of the present invention is a continuous pattern plating transfer product manufacturing method using the above-described system of the present invention, and a step of forming a pattern plating layer on the surface of the DLC pattern cylinder body, Forming a plated transfer product by pressure-transferring the pattern plating layer onto at least a part of the substrate for printing by the pressure-transfer roller.
 本発明の連続パターンメッキ転写物は、上記した本発明のシステムを用いて製造された連続パターンメッキ転写物であって、前記DLCパターンシリンダ体の表面にパターンメッキ層を形成し、前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによって製造されたことを特徴とする。 The continuous pattern plating transfer product of the present invention is a continuous pattern plating transfer product manufactured using the above-described system of the present invention, wherein a pattern plating layer is formed on the surface of the DLC pattern cylinder body, and the pattern plating layer Is produced by pressure-transferring at least a part of the substrate for printing by the pressure-transfer transfer roller.
 また、前記連続パターンメッキ転写物が、プリント回路基板であるのが好適である。なお、本明細書において連続パターンメッキ転写物とは、連続的にパターンをメッキして、そのメッキを転写してなる物という意味である。 Further, it is preferable that the continuous pattern plating transfer product is a printed circuit board. In the present specification, the continuous pattern plating transfer product means a product obtained by continuously plating a pattern and transferring the plating.
 本発明によれば、メッキのみでパターニングを行ってエッチングを不要とする連続パターンメッキ転写システム及び連続パターンメッキ転写物製造方法を提供することが可能となり、従来の製造方法に比して時間の節約及びコストの低減を大幅に図ることができ、かつパターンの精度にも優れた連続パターンメッキ転写物を得ることができるという大きな効果を奏する。 ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the continuous pattern plating transcription | transfer system and continuous pattern plating transcription | transfer manufacturing method which perform patterning only by plating and do not require etching, and save time compared with the conventional manufacturing method. In addition, it is possible to greatly reduce the cost, and it is possible to obtain a continuous pattern plating transfer product having excellent pattern accuracy.
本発明の連続パターンメッキ転写システムの一つの実施の形態を示す概略側面的説明図である。1 is a schematic side view showing one embodiment of a continuous pattern plating transfer system of the present invention. FIG. 連続パターンメッキ転写物の形成手順を示す模式的説明図で、(a)はDLCパターンシリンダ体の凹部にメッキ液を収容した状態、(b)はDLCパターンシリンダ体の凹部に形成されたメッキ層をプリント用基材上に転写する状態、及び(c)はプリント用基材上にパターンメッキ層を転写して連続パターンメッキ転写物を製造した状態をそれぞれ示す。It is typical explanatory drawing which shows the formation procedure of a continuous pattern plating transcription | transfer material, (a) is the state which accommodated the plating liquid in the recessed part of the DLC pattern cylinder body, (b) is the plating layer formed in the recessed part of the DLC pattern cylinder body And (c) shows a state in which a pattern plating layer is transferred onto the printing substrate to produce a continuous pattern plating transfer product. 本発明の連続パターンメッキ転写マルチシステムの一つの実施の形態を示す概略側面的説明図である。1 is a schematic side view illustrating one embodiment of a continuous pattern plating transfer multi-system of the present invention. FIG. 本発明に用いられるDLCパターンシリンダ体の製造工程を模式的に示す説明図で、(a)はシリンダ体基材の表面に感光剤を塗布した状態の要部断面図、(b)は露光・現像せしめてレジストパターンを形成した状態の要部断面図、(c)はシリンダ体基材及びレジストパターンの表面にDLC被覆膜を形成した状態の要部断面図、(d)はレジストパターン及びレジストパターン表面のDLC被覆膜を除去しシリンダ体基材上にDLCパターンを残存形成せしめた状態を示す要部断面図である。It is explanatory drawing which shows typically the manufacturing process of the DLC pattern cylinder body used for this invention, (a) is principal part sectional drawing of the state which apply | coated the photosensitive agent on the surface of a cylinder body base material, (b) is exposure * (C) is a cross-sectional view of the main part in a state where a DLC coating film is formed on the surfaces of the cylinder body substrate and the resist pattern, and (d) is a cross-sectional view of the main part It is principal part sectional drawing which shows the state which removed the DLC coating film on the surface of a resist pattern, and made the DLC pattern remain on a cylinder body base material. DLCパターンシリンダ体の製造工程を示すフローチャートである。It is a flowchart which shows the manufacturing process of a DLC pattern cylinder body.
 以下に本発明の実施の形態を説明するが、これら実施の形態は例示的に示されるもので、本発明の技術思想から逸脱しない限り種々の変形が可能なことはいうまでもない。 Embodiments of the present invention will be described below, but these embodiments are exemplarily shown, and it goes without saying that various modifications are possible without departing from the technical idea of the present invention.
 図1において、符号10Aは本発明に係る連続パターンメッキ転写システムを示す。 In FIG. 1, reference numeral 10A denotes a continuous pattern plating transfer system according to the present invention.
 連続パターンメッキ転写システム10Aは、メッキ液Mを収容した少なくとも一つのメッキ槽12を含むメッキユニット14と、該メッキ槽12のメッキ液Mに浸漬されてその表面にパターンメッキ層MAが形成されるとともに回動可能に設けられた少なくとも一つのDLCパターンシリンダ体16と、該DLCパターンシリンダ体16の表面に連続的に搬送されるプリント用基材18及び該プリント用基材18の少なくとも一面に該DLCパターンシリンダ体16の表面から該パターンメッキ層MAを圧着転写する圧着転写ローラー20を含む少なくとも一つのプリント用基材回動手段22と、を含む構成とされている。プリント用基材18は、送り出しローラー21によって送り出されて連続的に搬送され、製造された連続パターンメッキ転写物25は、巻取りローラー23によって巻き取られる。 The continuous pattern plating transfer system 10A includes a plating unit 14 including at least one plating tank 12 containing a plating solution M, and a pattern plating layer MA formed on the surface of the plating unit 14 by being immersed in the plating solution M of the plating tank 12. And at least one DLC pattern cylinder body 16 that is rotatably provided, a printing substrate 18 that is continuously conveyed to the surface of the DLC pattern cylinder body 16, and at least one surface of the printing substrate 18 At least one substrate rotation means 22 for printing including a pressure transfer roller 20 for pressure transfer of the pattern plating layer MA from the surface of the DLC pattern cylinder body 16 is included. The printing substrate 18 is sent out by a delivery roller 21 and continuously conveyed, and the manufactured continuous pattern plating transfer product 25 is taken up by a take-up roller 23.
 プリント用基材18としては、例えばポリイミドフィルムなどの合成樹脂製フィルムが適用できる。図示例でも、ポリイミドフィルムを使用した例を示した。 As the substrate 18 for printing, for example, a synthetic resin film such as a polyimide film can be applied. Also in the illustrated example, an example using a polyimide film is shown.
 また、前記DLCパターンシリンダ体16が直径200mm~1000mm程度の場合には、前記DLCパターンシリンダ体16を0.01~10rpm程度の低速回転させるのが好適である。 Further, when the DLC pattern cylinder body 16 has a diameter of about 200 mm to 1000 mm, it is preferable to rotate the DLC pattern cylinder body 16 at a low speed of about 0.01 to 10 rpm.
 そして、前記パターンメッキ層MAを前記圧着転写ローラー20によって前記プリント用基材18の少なくとも一部に圧着転写せしめることによって、図1に示されるように、連続的に前記プリント用基材18に前記パターンメッキ層が転写されてなる。 Then, the pattern plating layer MA is transferred to at least a part of the substrate 18 for printing by the pressure-transfer roller 20 so as to be continuously applied to the substrate 18 for printing as shown in FIG. The pattern plating layer is transferred.
 図1の例では、連続パターンメッキ転写システム10Aには、前記パターンメッキ層MAを離型処理剤に浸漬して離型処理、すなわち前記DLCパターンシリンダ体16から前記パターンメッキ層MAから剥離し易くするための剥離処理を行う離型処理ゾーン24が、前記DLCパターンシリンダ体16上に設けられている。離型処理ゾーン24としては、離型処理剤の入った離型処理ユニット26を前記DLCパターンシリンダ体16上に設けた構成とされている。 In the example of FIG. 1, the continuous pattern plating transfer system 10 </ b> A is easy to release the pattern plating layer MA from the pattern plating layer MA from the DLC pattern cylinder body 16 by immersing the pattern plating layer MA in a release treatment agent. A release treatment zone 24 for performing a peeling treatment for the purpose is provided on the DLC pattern cylinder body 16. The release treatment zone 24 is configured such that a release treatment unit 26 containing a release treatment agent is provided on the DLC pattern cylinder body 16.
 図1の例では、前記パターンメッキ層MAが前記圧着転写ローラー20によって前記プリント用基材18の少なくとも一部に圧着転写せしめられる位置である圧着転写位置Pに対して、前記DLCパターンシリンダ体16の回転方向の下流に前記離型処理ゾーン24が位置した例を示した。 In the example of FIG. 1, the DLC pattern cylinder body 16 with respect to the pressure transfer position P that is the position where the pattern plating layer MA is pressure transferred to at least a part of the printing substrate 18 by the pressure transfer roller 20. An example in which the mold release treatment zone 24 is positioned downstream in the rotation direction is shown.
 また、図1の例では、前記パターンメッキ層MAを水洗及び乾燥するための水洗乾燥ゾーン28が、前記DLCパターンシリンダ体16上に設けられている。水洗乾燥ゾーン28としては、水洗装置と乾燥装置が入った水洗乾燥ユニット30を、前記DLCパターンシリンダ体16上に設けた構成とされている。 Further, in the example of FIG. 1, a washing / drying zone 28 for washing and drying the pattern plating layer MA is provided on the DLC pattern cylinder body 16. The washing / drying zone 28 is configured such that a washing / drying unit 30 including a washing device and a drying device is provided on the DLC pattern cylinder body 16.
 図1の例では、前記パターンメッキ層MAが前記圧着転写ローラー20によって前記プリント用基材18の少なくとも一部に圧着転写せしめられる位置である圧着転写位置Pに対して、前記DLCパターンシリンダ体16の回転方向の上流に前記水洗乾燥ゾーン28が位置した例を示した。符号52は離型処理剤がメッキ液Mに入らないようにするためのスポンジローラー、符号54は、メッキ液Mをきるためのスポンジローラーである。なお、符号56,58はそれぞれローラーである。 In the example of FIG. 1, the DLC pattern cylinder body 16 with respect to the pressure transfer position P that is the position where the pattern plating layer MA is pressure transferred to at least a part of the printing substrate 18 by the pressure transfer roller 20. In this example, the washing / drying zone 28 is positioned upstream in the rotation direction. Reference numeral 52 denotes a sponge roller for preventing the mold release treatment agent from entering the plating solution M, and reference numeral 54 denotes a sponge roller for discharging the plating solution M. Reference numerals 56 and 58 denote rollers.
 DLCパターンシリンダ体16の表面には後述する方法によって形成された凸状のDLCパターン32が設けられ、該DLCパターン32以外の表面部分はメッキ液Mを収容できる凹部34となっている。該DLCパターンシリンダ体16は回動可能に設けられるとともに、該メッキ槽12のメッキ液Mに浸漬されると上記凹部34にメッキ液Mが収容され、図1及び図2によく示されかつ後述するように、その表面にパターンメッキ層MAが形成される。パターンメッキ層MAに用いられる金属としては、メッキ可能な金属であればいずれも適用でき、例えば、ニッケル、タングステン、クロム、チタン、金、銀、白金、鉄、銅、アルミニウムなどを適用することができる。 A convex DLC pattern 32 formed by a method described later is provided on the surface of the DLC pattern cylinder body 16, and a surface portion other than the DLC pattern 32 is a concave portion 34 in which the plating solution M can be accommodated. The DLC pattern cylinder body 16 is rotatably provided. When the DLC pattern cylinder body 16 is immersed in the plating solution M of the plating tank 12, the plating solution M is accommodated in the concave portion 34, which is well illustrated in FIGS. Thus, the pattern plating layer MA is formed on the surface. As the metal used for the pattern plating layer MA, any metal that can be plated can be applied. For example, nickel, tungsten, chromium, titanium, gold, silver, platinum, iron, copper, aluminum or the like can be applied. it can.
 前記メッキユニット14としては、図1の例では、不溶性陽極を使用して銅メッキを行う例を示した。符号36はメッキ槽12内に設置されたメッキ用不溶性陽極であり、プラス端子に接続されている。また、DLCパターンシリンダ体16は、その中心がマイナス端子に接続されている。なお、DLCパターンシリンダ体16は中空とされており、その中空とされた中心がチャック手段38によって回転可能に支持されている。前記メッキユニット14としては、例えば、特許文献5に開示された全自動グラビア製版用処理システムに用いられるのと同様のメッキユニットを使用することができる。 As the plating unit 14, the example of FIG. 1 shows an example in which copper plating is performed using an insoluble anode. Reference numeral 36 denotes an insoluble anode for plating installed in the plating tank 12 and is connected to a plus terminal. The center of the DLC pattern cylinder body 16 is connected to the negative terminal. The DLC pattern cylinder body 16 is hollow, and the hollow center is rotatably supported by the chuck means 38. As the plating unit 14, for example, a plating unit similar to that used in the fully automatic gravure plate processing system disclosed in Patent Document 5 can be used.
 次に、本発明の連続パターンメッキ転写マルチシステムの一つの実施の形態を図3に基づいて説明する。 Next, an embodiment of the continuous pattern plating transfer multisystem of the present invention will be described with reference to FIG.
 図3において、本発明の連続パターンメッキ転写マルチシステム50は、上述した連続パターンメッキ転写システムが複数設けられてなる連続パターンメッキ転写マルチシステムである。すなわち、連続パターンメッキ転写マルチシステム50は、少なくとも第一の連続パターンメッキ転写システム10Aでパターンメッキ層MAをプリント用基材18の一面に転写せしめ、少なくとも第二の連続パターンメッキ転写システム10Bでパターンメッキ層MAをプリント用基材18の他面に転写せしめてなるように構成されている。 In FIG. 3, a continuous pattern plating transfer multisystem 50 of the present invention is a continuous pattern plating transfer multisystem provided with a plurality of the above-described continuous pattern plating transfer systems. That is, in the continuous pattern plating transfer multisystem 50, the pattern plating layer MA is transferred to one surface of the printing substrate 18 by at least the first continuous pattern plating transfer system 10A, and the pattern is transferred by at least the second continuous pattern plating transfer system 10B. The plating layer MA is configured to be transferred to the other surface of the printing substrate 18.
 図3の例では、連続パターンメッキ転写システム10Aと連続パターンメッキ転写システム10Bという2つの連続パターンメッキ転写システムを並べた例を示した。 In the example of FIG. 3, an example is shown in which two continuous pattern plating transfer systems, a continuous pattern plating transfer system 10A and a continuous pattern plating transfer system 10B, are arranged.
 連続パターンメッキ転写システム10Aの構成は上述の通りであるから再度の詳細な説明は省略する。また、連続パターンメッキ転写システム10Bとしては、連続パターンメッキ転写システム10Aと同様の構成とすることができる。 Since the configuration of the continuous pattern plating transfer system 10A is as described above, detailed description thereof is omitted. The continuous pattern plating transfer system 10B can have the same configuration as the continuous pattern plating transfer system 10A.
 プリント用基材18は、送り出しローラー21によって送り出されて連続的に搬送され、連続パターンメッキ転写システム10Aでプリント用基材18の一面(図示例では表面側)に転写される。そして、連続パターンメッキ転写システム10BのDLCパターンシリンダ体16の表面に連続的に搬送され、DLCパターンシリンダ体16の表面に形成されたパターンメッキ層MBが、圧着転写ローラー20によって、プリント用基材18の他面(図示例では裏面側)に転写され、このようにして製造された連続パターンメッキ転写物40は、巻取りローラー42によって巻き取られる。なお、符号60はローラーである。 The printing substrate 18 is fed by the feeding roller 21 and continuously conveyed, and is transferred to one surface (the surface side in the illustrated example) of the printing substrate 18 by the continuous pattern plating transfer system 10A. Then, the pattern plating layer MB that is continuously conveyed to the surface of the DLC pattern cylinder body 16 of the continuous pattern plating transfer system 10B and formed on the surface of the DLC pattern cylinder body 16 is printed on the substrate for printing by the pressure-transfer roller 20. The continuous pattern plating transfer product 40 transferred to the other surface 18 (the back surface side in the illustrated example) and manufactured in this manner is wound up by a winding roller 42. Reference numeral 60 denotes a roller.
 本発明の連続パターンメッキ転写物の製造方法は、上述した本発明のシステムを用いた製造方法であって、前記DLCパターンシリンダ体16の表面にパターンメッキ層MAを形成する工程と、前記パターンメッキ層MAを前記圧着転写ローラー20によって前記プリント用基材18の少なくとも一部に圧着転写せしめることによってメッキ転写物25,40を形成する工程と、を有する連続パターンメッキ転写物製造方法である。このようにすることで、メッキのみでパターニングを行ってエッチングが不要となるのである。 The manufacturing method of the continuous pattern plating transfer product of the present invention is a manufacturing method using the above-described system of the present invention, comprising the step of forming a pattern plating layer MA on the surface of the DLC pattern cylinder body 16, and the pattern plating. Forming a plating transfer product 25, 40 by pressure-transferring the layer MA onto at least a part of the substrate 18 for printing by the press-transfer roller 20, and a continuous pattern plating transfer product manufacturing method. By doing so, patterning is performed only by plating and etching becomes unnecessary.
 次に、本発明において使用されるDLCパターンシリンダ体の製造方法について図4及び図5によって以下に説明する。 Next, a manufacturing method of the DLC pattern cylinder body used in the present invention will be described below with reference to FIGS.
 まず、母材であるシリンダ体基材212の表面に感光材214を塗布する(図4(a)及び図5のステップ300)。シリンダ体基材212としては、アルミニウム合金、鉄、又はCFRP(繊維強化プラスチック)製などの中空ロールが使用できる。 First, the photosensitive material 214 is applied to the surface of the cylinder base material 212 which is the base material (step 300 in FIG. 4A and FIG. 5). As the cylinder body base 212, a hollow roll made of aluminum alloy, iron, or CFRP (fiber reinforced plastic) can be used.
 次に、感光材214を塗布されたシリンダ体基材212を露光・現像せしめてレジストパターン216を形成する(図4(b)及び図5のステップ302)。感光材として用いる感光性組成物はネガ型及びポジ型のいずれでも使用可能であるが、ネガ型感光性組成物を用いるのが好ましい。 Next, the cylinder base material 212 coated with the photosensitive material 214 is exposed and developed to form a resist pattern 216 (FIG. 4B and step 302 in FIG. 5). The photosensitive composition used as the photosensitive material can be either a negative type or a positive type, but it is preferable to use a negative photosensitive composition.
 次に、該シリンダ体基材212及びレジストパターン216の表面にDLC被覆膜218を形成する(図4(c)及び図5のステップ304)。DLC被覆膜はCVD(Chemical Vapor Deposition)法やスパッタ法によって形成すればよい。 Next, a DLC coating film 218 is formed on the surfaces of the cylinder body base material 212 and the resist pattern 216 (FIG. 4C and step 304 in FIG. 5). The DLC coating film may be formed by a CVD (Chemical Vapor Deposition) method or a sputtering method.
 次いで、該レジストパターン上に形成されたDLC被覆膜を該レジストパターンごと剥離せしめ、基材の表面に凸条のDLCパターン220及び凹部222を形成する(図4(d)及び図5のステップ306)。このようにしてDLCパターンシリンダ体224を製造することができる。この製造されたDLCパターンシリンダ体を本発明におけるDLCパターンシリンダ体16として用いることができる。 Next, the DLC coating film formed on the resist pattern is peeled off together with the resist pattern to form the convex DLC pattern 220 and the concave portion 222 on the surface of the substrate (steps of FIG. 4D and FIG. 5). 306). In this way, the DLC pattern cylinder body 224 can be manufactured. This manufactured DLC pattern cylinder body can be used as the DLC pattern cylinder body 16 in the present invention.
 10A,10B:連続パターンメッキ転写システム、12:メッキ槽、14:メッキユニット、16,224:DLCパターンシリンダ体、18:プリント用基材、20:圧着転写ローラー、21:送り出しローラー、22:プリント用基材回動手段、23,42:巻取りローラー、24:離型処理ゾーン、25,40:連続パターンメッキ転写物、26:離型処理ユニット、28:水洗乾燥ゾーン、30:水洗乾燥ユニット、32,220:DLCパターン、34,222:凹部、36:メッキ用不溶性陽極、38:チャック手段、50:連続パターンメッキ転写マルチシステム、52,54:スポンジローラー、56,58,60:ローラー、212:シリンダ体基材、214:感光材、216:レジストパターン、218:被覆膜、M:メッキ液、MA,MB:パターンメッキ層、P:圧着転写位置。 10A, 10B: Continuous pattern plating transfer system, 12: plating tank, 14: plating unit, 16,224: DLC pattern cylinder body, 18: substrate for printing, 20: pressure transfer roller, 21: delivery roller, 22: printing Substrate rotating means, 23, 42: winding roller, 24: release processing zone, 25, 40: continuous pattern plating transfer product, 26: release processing unit, 28: water washing drying zone, 30: water washing drying unit 32, 220: DLC pattern, 34, 222: recess, 36: insoluble anode for plating, 38: chuck means, 50: continuous pattern plating transfer multisystem, 52, 54: sponge roller, 56, 58, 60: roller, 212: cylinder body base material, 214: photosensitive material, 216: resist pattern, 218: coating film, : Plating solution, MA, MB: pattern plating layer, P: crimping transfer position.

Claims (7)

  1.  メッキ液を収容した少なくとも一つのメッキ槽を含むメッキユニットと、
    該メッキ槽のメッキ液に浸漬されてその表面にパターンメッキ層が形成されるとともに回動可能に設けられた少なくとも一つのDLCパターンシリンダ体と、
    該DLCパターンシリンダ体の表面に連続的に搬送されるプリント用基材及び該プリント用基材の少なくとも一面に該DLCパターンシリンダ体の表面から該パターンメッキ層を圧着転写する圧着転写ローラーを含む少なくとも一つのプリント用基材回動手段と、
    を含み、
    前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによって連続的に前記パターンメッキ層が転写されてなることを特徴とする連続パターンメッキ転写システム。
    A plating unit including at least one plating tank containing a plating solution;
    At least one DLC pattern cylinder body that is dipped in the plating solution of the plating tank to form a pattern plating layer on the surface and is rotatably provided;
    A printing substrate continuously conveyed to the surface of the DLC pattern cylinder body, and at least a pressure-transfer roller for pressure-transferring the pattern plating layer from the surface of the DLC pattern cylinder body to at least one surface of the printing substrate. One substrate rotation means for printing;
    Including
    A continuous pattern plating transfer system, wherein the pattern plating layer is continuously transferred by pressure-transferring the pattern plating layer onto at least a part of the printing substrate by the pressure-transfer roller.
  2.  前記パターンメッキ層を離型処理剤に浸漬して離型処理するための離型処理ゾーンが、前記DLCパターンシリンダ体上に設けられていることを特徴とする請求項1記載の連続パターンメッキ転写システム。 2. The continuous pattern plating transfer according to claim 1, wherein a release treatment zone for releasing the pattern plating layer by immersing the pattern plating layer in a release treatment agent is provided on the DLC pattern cylinder body. system.
  3.  前記パターンメッキ層を水洗及び乾燥するための水洗乾燥ゾーンが、前記DLCパターンシリンダ体上に設けられていることを特徴とする請求項1又は2記載の連続パターンメッキ転写システム。 The continuous pattern plating transfer system according to claim 1 or 2, wherein a water washing and drying zone for washing and drying the pattern plating layer is provided on the DLC pattern cylinder body.
  4.  請求項1~3いずれか1項記載の連続パターンメッキ転写システムが複数設けられてなる連続パターンメッキ転写マルチシステムであり、少なくとも第一の連続パターンメッキ転写システムでパターンメッキ層をプリント用基材の一面に転写せしめ、少なくとも第二の連続パターンメッキ転写システムでパターンメッキ層をプリント用基材の他面に転写せしめてなることを特徴とする連続パターンメッキ転写マルチシステム。 A continuous pattern plating transfer multi-system comprising a plurality of continuous pattern plating transfer systems according to any one of claims 1 to 3, wherein at least the first continuous pattern plating transfer system applies a pattern plating layer to a printing substrate. A continuous pattern plating transfer multi-system characterized in that the pattern plating layer is transferred to the other side of the substrate for printing by at least a second continuous pattern plating transfer system.
  5.  請求項1~4いずれか1項記載のシステムを用いる連続パターンメッキ転写物の製造方法であって、
    前記DLCパターンシリンダ体の表面にパターンメッキ層を形成する工程と、
    前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによってメッキ転写物を形成する工程と、
    を有することを特徴とする連続パターンメッキ転写物製造方法。
    A method for producing a continuous pattern plating transfer using the system according to any one of claims 1 to 4,
    Forming a pattern plating layer on the surface of the DLC pattern cylinder body;
    Forming a plated transfer product by causing the pattern plating layer to be pressure-transferred to at least a part of the substrate for printing by the pressure-transfer roller, and
    A method for producing a continuous pattern plating transfer product, comprising:
  6.  請求項1~4いずれか1項記載のシステムを用いて製造された連続パターンメッキ転写物であって、前記DLCパターンシリンダ体の表面にパターンメッキ層を形成し、前記パターンメッキ層を前記圧着転写ローラーによって前記プリント用基材の少なくとも一部に圧着転写せしめることによって製造されたことを特徴とする連続パターンメッキ転写物。 A continuous pattern plating transfer product manufactured using the system according to any one of claims 1 to 4, wherein a pattern plating layer is formed on a surface of the DLC pattern cylinder body, and the pattern plating layer is transferred to the pressure transfer A continuous pattern plating transfer product produced by pressure-transferring at least a part of the substrate for printing with a roller.
  7.  前記連続パターンメッキ転写物が、プリント回路基板であることを特徴とする請求項6記載の連続パターンメッキ転写物。 The continuous pattern plating transfer product according to claim 6, wherein the continuous pattern plating transfer product is a printed circuit board.
PCT/JP2013/069238 2012-07-20 2013-07-16 Continuous pattern plating transfer system and method for manufacturing continuous pattern plating transfer material WO2014013962A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196795A (en) * 1984-10-17 1986-05-15 日本写真印刷株式会社 Manufacture of printed circuit board
JPH09260809A (en) * 1996-03-26 1997-10-03 Tokai Rubber Ind Ltd Printed circuit and its manufacture
JP2005206933A (en) * 2003-06-27 2005-08-04 Kyocera Corp Process for producing electronic part

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939542A (en) * 1982-08-30 1984-03-03 株式会社井上ジャパックス研究所 Manufacture of passage preventive body of electromagnetic wave
JPS63136689A (en) * 1986-11-28 1988-06-08 三菱電機株式会社 Method and apparatus for forming double-sided circuit
US20060163073A1 (en) * 2003-06-27 2006-07-27 Nobuhiro Higashihara Process for producing metal plating film, process for producing electronic part and plating film forming apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196795A (en) * 1984-10-17 1986-05-15 日本写真印刷株式会社 Manufacture of printed circuit board
JPH09260809A (en) * 1996-03-26 1997-10-03 Tokai Rubber Ind Ltd Printed circuit and its manufacture
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