WO2014010552A1 - Système optique d'éclairage, dispositif d'exposition, et procédé de fabrication de dispositif - Google Patents

Système optique d'éclairage, dispositif d'exposition, et procédé de fabrication de dispositif Download PDF

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Publication number
WO2014010552A1
WO2014010552A1 PCT/JP2013/068635 JP2013068635W WO2014010552A1 WO 2014010552 A1 WO2014010552 A1 WO 2014010552A1 JP 2013068635 W JP2013068635 W JP 2013068635W WO 2014010552 A1 WO2014010552 A1 WO 2014010552A1
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Prior art keywords
light
illumination
optical system
incident
optical
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PCT/JP2013/068635
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English (en)
Japanese (ja)
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尚憲 北
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株式会社ニコン
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Definitions

  • the present invention relates to an illumination optical system, an exposure apparatus, and a device manufacturing method.
  • a light source emitted from a light source is a secondary light source (generally a surface light source consisting of a number of light sources via a fly-eye lens as an optical integrator).
  • a secondary light source generally a surface light source consisting of a number of light sources via a fly-eye lens as an optical integrator.
  • Form a predetermined light intensity distribution in the illumination pupil is referred to as “pupil intensity distribution”.
  • the illumination pupil is a position where the illumination surface becomes the Fourier transform plane of the illumination pupil by the action of the optical system between the illumination pupil and the illumination surface (a mask or a wafer in the case of an exposure apparatus). Defined.
  • the mask on which a predetermined pattern is formed is illuminated in a superimposed manner.
  • the light transmitted through the mask forms an image on the wafer via the projection optical system, and the mask pattern is projected and exposed (transferred) onto the wafer.
  • the pattern formed on the mask is miniaturized, and it is indispensable to obtain a uniform illuminance distribution on the wafer in order to accurately transfer the fine pattern onto the wafer.
  • an illumination optical system capable of continuously changing the pupil intensity distribution (and consequently the illumination condition) without using a zoom optical system (see, for example, Patent Document 1).
  • a conventional illumination optical system an incident light flux is made minute for each reflecting surface by using a movable multi-mirror configured by a large number of minute mirror elements that are arranged in an array and whose tilt angle and tilt direction are individually driven and controlled.
  • the cross section of the light beam is converted into a desired shape or a desired size, and thus a desired pupil intensity distribution is realized.
  • the pupil intensity distribution is adjusted to the desired shape, but also the pupil intensity distribution for each point on the wafer as the final irradiated surface is almost uniform. It is necessary to adjust to. If there is a variation in the uniformity of the pupil intensity distribution at each point on the wafer, the line width of the pattern varies from position to position on the wafer, and the fine pattern of the mask has the desired line width over the entire exposure area. It cannot be accurately transferred onto the wafer.
  • the present invention has been made in view of the above-described problems, and an object thereof is to provide an illumination optical system that can adjust the pupil intensity distribution at each point on the irradiated surface to a required distribution. . Further, the present invention uses an illumination optical system that adjusts the pupil intensity distribution at each point on the surface to be irradiated to a required distribution, and can perform exposure with good exposure under appropriate illumination conditions. An object is to provide an apparatus.
  • a spatial light modulation element that is disposed in an optical path between the light source and the irradiated surface and has a modulation action surface that sets an emission angle of emission light according to an incident position of incident light;
  • the spatial light modulation element is disposed between the spatial light modulation element and the irradiated surface, and the spatial light modulation element is positioned at a position on the irradiated surface according to an emission position from which the emitted light from the spatial light modulation element is emitted.
  • an illumination optical system comprising a condensing optical system for guiding light.
  • a spatial light modulation element that is arranged in an optical path between the light source and the surface to be illuminated and spatially modulates incident light to form a pupil intensity distribution in an illumination pupil of the illumination optical system;
  • An optical integrator disposed in an optical path between the spatial light modulation element and the irradiated surface and having a plurality of unit wavefront division regions having a predetermined exit-side numerical aperture;
  • a first relay optical system that optically arranges the spatial light modulator and the incident-side surface of the optical integrator in a Fourier transform relationship;
  • a second relay optical system formed in a second space including, Light that has passed through the first modulation region of the modulation acting surface of the spatial light modulation element is incident on the optical integrator at an incident angle equal to or smaller than the angle corresponding to the predetermined exit-side numerical aperture, and is formed on the conjugate surface.
  • the light that forms the first illumination region within the illumination region and has passed through the second modulation region adjacent to the first modulation region on the modulation acting surface has an incident angle larger than the angle corresponding to the predetermined exit side numerical aperture.
  • the illumination optical system is characterized in that a second illumination area that is incident on the optical integrator and is adjacent to the first illumination area in the illumination area is formed.
  • a spatial light modulation element that is arranged in an optical path between the light source and the surface to be illuminated and spatially modulates incident light to form a pupil intensity distribution in an illumination pupil of the illumination optical system;
  • a conjugate plane that is disposed in an optical path between the spatial light modulation element and the irradiated surface and is optically conjugate with the modulation action surface of the spatial light modulation element is the position of the irradiated surface or the irradiated surface.
  • a relay optical system formed at a position optically conjugate with the surface;
  • a diffusion element disposed in the pupil space of the relay optical system and having a plurality of unit regions having a predetermined exit-side numerical aperture;
  • the modulation action surface of the spatial light modulation element sets the emission angle of the emitted light according to the position on the modulation action surface,
  • an illumination optical system in which the unit region of the diffusing element emits an obliquely incident light beam that is incident on the optical axis of the unit region obliquely with respect to the optical axis of the unit region.
  • a spatial light modulation element that is arranged in an optical path between the light source and the surface to be illuminated and spatially modulates incident light to form a pupil intensity distribution in an illumination pupil of the illumination optical system; , A plurality of incident refracting surfaces disposed in a light path between the spatial light modulation element and the irradiated surface and arranged at a predetermined pitch along a first direction; and the plurality of incident refracting surfaces An optical integrator having a plurality of exit refracting surfaces arranged displaced in the first direction; A first relay optical system that optically arranges the spatial light modulator and the incident-side surface of the optical integrator in a Fourier transform relationship; A second relay that forms a conjugate surface optically conjugate with the incident-side surface of the optical integrator at a position of the irradiated surface or a position optically conjugate with the irradiated surface by combination with the optical integrator.
  • An illumination optical system characterized by forming an illumination area is provided.
  • the illumination optical system according to the first, second, third, or fourth embodiment for illuminating a predetermined pattern is provided, and the predetermined pattern is exposed on the substrate. Providing equipment.
  • exposing the predetermined pattern to a photosensitive substrate exposing the predetermined pattern to a photosensitive substrate; Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate; And processing the surface of the photosensitive substrate through the mask layer.
  • a device manufacturing method is provided.
  • an apparatus for measuring the angular distribution of light incident on a plurality of discrete measurement points on the first surface Arranged at the plurality of measurement points on the first surface and passing through the light incident on the plurality of measurement points, respectively, and at a region other than the light passage unit on the first surface.
  • a light selection member comprising a dimming unit for dimming light through the region, Measurement that includes a light receiving surface disposed on a second surface different from the first surface in the traveling direction of light through the light selection member, and measures an intensity distribution of light that is two-dimensionally distributed on the second surface
  • the pupil intensity distribution at each point on the irradiated surface can be adjusted to a required distribution.
  • the exposure optical system that adjusts the pupil intensity distribution at each point on the surface to be irradiated to the required distribution is used to perform good exposure under appropriate illumination conditions. As a result, a good device can be manufactured.
  • FIG. 1 shows schematically the structure of the exposure apparatus concerning 1st Example of embodiment. It is a figure explaining the structure and effect
  • each microlens which comprises a microlens array. It is a figure which shows the emission angle characteristic of each micro lens which comprises a micro fly's eye lens. It is a figure which shows the emission angle characteristic of many micro lenses which comprise the intermediate optical member of a micro lens array and a micro fly eye lens.
  • the group of mirror elements appear to shine when viewed upstream from one point in the illumination field on the mask blind. It is a figure explaining formation of the illumination field on the mask blind in the modification of 1st Example. It is a figure explaining formation of the illumination field on the mask blind in the structure of FIG.
  • FIG. 1 It is a figure which shows a mode that the illumination field which has trapezoid illuminance distribution in the modification of 1st Example is formed on a mask blind. It is a figure explaining formation of the illumination field on a mask blind in the structure provided with the intermediate
  • (A) is a perspective view which shows the optical path from the spatial light modulator in 2nd Example to a mask blind
  • (b) is the one-dimensional direction of the illumination field formed on the mask blind in 2nd Example. It is a figure which shows illuminance distribution. It is a figure which shows schematically the structure of the exposure apparatus concerning 3rd Example of embodiment.
  • FIG. 1 is a drawing schematically showing a configuration of an exposure apparatus according to a first example of the embodiment.
  • the Z-axis is along the normal direction of the transfer surface (exposure surface) of the wafer W, which is a photosensitive substrate, and the Y-axis is in the direction parallel to the paper surface of FIG.
  • the X axis is set in a direction perpendicular to the paper surface of FIG.
  • exposure light (illumination light) is supplied from a light source LS.
  • the light source LS for example, an ArF excimer laser light source that supplies light with a wavelength of 193 nm, a KrF excimer laser light source that supplies light with a wavelength of 248 nm, or the like can be used.
  • Light emitted from the light source LS in the + Z direction is incident on the spatial light modulator 2 via the beam transmitter 1.
  • the beam transmitter 1 guides the incident light beam from the light source LS to the spatial light modulator 2 while converting it into a light beam having an appropriate size and shape, and changes the position of the light incident on the spatial light modulator 2. And a function of actively correcting the angular variation.
  • the spatial light modulator 2 individually controls the postures of a plurality of mirror elements arranged in a predetermined plane and individually controlled based on a control signal from the control system CR. And a driving unit for driving.
  • Light emitted from the spatial light modulator 2 in the + Y direction is a relay optical system 3 including a front lens group 3a and a rear lens group 3b, and a microlens disposed at or near the pupil position of the relay optical system 3.
  • a mask blind 5 as an illumination field stop is illuminated through the array (or lens array) 4.
  • the rear focal position of the front lens group 3a and the front focal position of the rear lens group 3b substantially coincide with each other, and the microlens array 4 has the rear focal position of the front lens group 3a or its focal position. It is arranged in the vicinity.
  • a rectangular (slit-shaped) illumination field having a long side along the Z direction and a short side along the X direction is formed at the position of the mask blind 5.
  • the array surface of the plurality of mirror elements of the spatial light modulator 2 (hereinafter referred to as “spatial light modulator array surface” or “spatial light modulator modulation surface”) is the front focal position of the front lens group 3a or its focal position. It is arranged in the vicinity.
  • the mask blind 5 is disposed at or near the rear focal position of the rear lens group 3b.
  • the relay optical system 3 forms a conjugate surface optically conjugate with the modulation action surface of the spatial light modulator 2 at or near the position of the mask blind 5.
  • the configuration and operation of the microlens array 4 will be described later.
  • the light beam that has passed through the rectangular opening (light transmitting portion) of the mask blind 5 is subjected to the light condensing action of the imaging optical system 6 and is an optical path bending mirror MR1 disposed in the optical path of the imaging optical system 6.
  • the mask M on which a predetermined pattern is formed is illuminated in a superimposed manner. That is, the imaging optical system 6 forms an image of the rectangular opening of the mask blind 5 on the mask M.
  • a mask M to be transferred is formed on the mask M held on the mask stage MS, and has a long side along the Y direction (corresponding to the Z direction at the position of the mask blind 5) in the entire pattern region.
  • a rectangular pattern region having a short side along the X direction is illuminated.
  • the light transmitted through the pattern area of the mask M forms an image of the mask pattern on the wafer (photosensitive substrate) W held on the wafer stage WS via the projection optical system PL. That is, a rectangular stationary image having a long side along the Y direction and a short side along the X direction on the wafer W so as to optically correspond to the rectangular illumination area on the mask M.
  • a pattern image is formed in the exposure area (effective exposure area).
  • the mask stage MS and the wafer stage WS along the X direction (scanning direction) in the plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL,
  • the wafer W has a width equal to the dimension in the Y direction of the static exposure region and corresponds to the scanning amount (movement amount) of the wafer W.
  • a mask pattern is scanned and exposed to a shot area (exposure area) having a length.
  • the exposure apparatus of the present embodiment includes a first pupil intensity distribution measurement unit DTr that measures the pupil intensity distribution on the exit pupil plane of the illumination optical system based on light that passes through the illumination optical system (1 to 6), and a projection optical system.
  • a second pupil intensity distribution measurement unit DTw that measures a pupil intensity distribution on the pupil plane of the projection optical system PL (an exit pupil plane of the projection optical system PL) based on light via the PL, and first and second pupil intensity distributions
  • a control system CR that controls the spatial light modulator 2 based on the measurement result of at least one of the measurement units DTr and DTw and controls the overall operation of the exposure apparatus.
  • the first pupil intensity distribution measurement unit DTr includes, for example, an imaging unit having a photoelectric conversion surface disposed at a position optically conjugate with the exit pupil position of the illumination optical system, and each point on the surface to be irradiated by the illumination optical system. Is monitored (pupil intensity distribution formed at the exit pupil position of the illumination optical system by light incident on each point).
  • the second pupil intensity distribution measurement unit DTw includes an imaging unit having a photoelectric conversion surface disposed at a position optically conjugate with, for example, the exit pupil position of the projection optical system PL, and includes an image plane of the projection optical system PL. A pupil intensity distribution for each point (a pupil intensity distribution formed at the exit pupil position of the projection optical system PL by light incident on each point) is measured.
  • the spatial light modulator 2 includes a plurality of mirror elements 2a arranged in a predetermined plane, a base 2b holding the plurality of mirror elements 2a, and a cable (not shown) connected to the base 2b. ) Through which the plurality of mirror elements 2a are individually controlled and driven.
  • FIG. 2 shows an optical path from the spatial light modulator 2 to the pupil plane 3 c of the relay optical system 3.
  • the attitude of the plurality of mirror elements 2a is changed by the action of the drive unit 2c that operates based on a command from the control system CR, and each mirror element 2a is set in a predetermined direction.
  • the spatial light modulator 2 includes a plurality of minute mirror elements 2a arranged two-dimensionally, and the spatial modulation according to the incident position of the incident light can be varied. Is applied and injected.
  • the spatial light modulator 2 may include about 4000 to 100,000 mirror elements 2a.
  • the light beam L1 is incident on the mirror element SEa of the plurality of mirror elements 2a, and the light beam L2 is incident on the mirror element SEb different from the mirror element SEa.
  • the light beam L3 is incident on a mirror element SEc different from the mirror elements SEa and SEb
  • the light beam L4 is incident on a mirror element SEd different from the mirror elements SEa to SEc.
  • the mirror elements SEa to SEd give spatial modulations set according to their positions to the lights L1 to L4. In other words, the mirror elements SEa to SEd give the light angles L1 to L4 with the emission angles set according to their positions.
  • a light beam incident in a direction parallel to the optical axis AX along the Z direction is spatial light modulated.
  • the light travels in a direction parallel to the optical axis AX of the relay optical system 3.
  • the array surface of the plurality of mirror elements 2a of the spatial light modulator 2 and the pupil plane 3c of the relay optical system 3 are optically positioned in a Fourier transform relationship via the front lens group 3a.
  • the front lens group 3a determines the angle that the plurality of mirror elements SEa to SEd of the spatial light modulator 2 gives to the emitted light on the pupil plane 3c that is the far field (Fraunhofer diffraction region) of the spatial light modulator 2. Convert to position.
  • the spatial light modulator 2 is a large number of minute reflecting elements regularly and two-dimensionally arranged along one plane with a planar reflecting surface as an upper surface.
  • a movable multi-mirror including a mirror element 2a.
  • Each mirror element 2a is movable, and the inclination of the reflection surface, that is, the inclination angle and the inclination direction of the reflection surface are independently controlled by the action of the drive unit 2c that operates based on the control signal from the control system CR.
  • Each mirror element 2a can be rotated continuously or discretely by a desired rotation angle with two directions parallel to the reflecting surface and orthogonal to each other as rotation axes. That is, it is possible to two-dimensionally control the inclination of the reflecting surface of each mirror element 2a.
  • each mirror element 2a When the reflecting surface of each mirror element 2a is discretely rotated, the rotation angle is set in a plurality of states (for example,..., -2.5 degrees, -2.0 degrees, ... 0 degrees, +0.5 degrees). ... +2.5 degrees,.
  • FIG. 3 shows the mirror element 2a having a square outer shape
  • the outer shape of the mirror element 2a is not limited to a square.
  • the shape can be arranged so that the gap between the mirror elements 2a is reduced (a shape that can be packed most closely). Further, from the viewpoint of light utilization efficiency, the interval between two adjacent mirror elements 2a can be minimized.
  • the spatial light modulator 2 for example, a spatial light modulator that continuously changes the directions of a plurality of mirror elements 2a arranged two-dimensionally is used.
  • a spatial light modulator for example, European Patent Publication No. 779530, US Pat. No. 5,867,302, US Pat. No. 6,480,320, US Pat. No. 6,600,591 U.S. Patent No. 6,733,144, U.S. Patent No. 6,900,915, U.S. Patent No. 7,095,546, U.S. Patent No. 7,295,726, U.S. Patent No. 7, No. 424,330, U.S. Pat. No. 7,567,375, U.S. Patent Publication No.
  • a spatial light modulator can be used. Note that the orientations of the plurality of mirror elements 2a arranged two-dimensionally may be controlled so as to have a plurality of discrete stages.
  • the attitude of the plurality of mirror elements 2a is changed by the action of the drive unit 2c that operates according to the control signal from the control system CR, and each mirror element 2a is set in a predetermined direction.
  • the light reflected at a predetermined angle by each of the plurality of mirror elements 2 a of the spatial light modulator 2 variably forms a desired light intensity distribution on the pupil plane 3 c of the relay optical system 3. That is, the spatial light modulator 2 is a spatial light modulation element that spatially modulates and emits incident light in order to form a pupil intensity distribution, and changes the emission angle of the emitted light for each position of the modulation action surface. Set independently.
  • FIG. 4 is a diagram showing an optical path from the spatial light modulator to the mask blind in the conventional configuration.
  • a reflective spatial light modulator 42 (corresponding to the spatial light modulator 2 in the first embodiment) having a plurality of mirror elements 42 a is replaced with a transmissive spatial light. Illustrated as a modulator.
  • the reflective spatial light modulator is illustrated as a transmissive spatial light modulator in FIGS. 5, 6, 7, 11, 17, and 19 below.
  • the light emitted from the spatial light modulator 42 enters the micro fly's eye lens (or fly eye lens) 44 via the relay optical system 43a.
  • the relay optical system 43a has a front focal position located near the arrangement surface of the spatial light modulator 42, and a rear focal position located near the incident side surface of the micro fly's eye lens 44.
  • the arrangement surface of the light modulator 42 and the surface on the incident side of the micro fly's eye lens 44 are optically set in a Fourier transform relationship. Therefore, the light passing through the spatial light modulator 42 variably forms a light intensity distribution according to the postures of the plurality of mirror elements 42 a on the incident side surface of the micro fly's eye lens 44.
  • the micro fly's eye lens 44 is, for example, an optical element composed of a large number of micro lenses 44a having a positive refractive power that are arranged vertically and horizontally and densely. By performing etching on a plane-parallel plate, a micro lens group is formed. It is configured.
  • a micro fly's eye lens unlike a fly eye lens composed of lens elements isolated from each other, a large number of micro lenses (micro refractive surfaces) are integrally formed without being isolated from each other.
  • the micro fly's eye lens is the same wavefront division type optical integrator as the fly's eye lens in that the lens elements are arranged vertically and horizontally.
  • a rectangular minute refracting surface as a unit wavefront dividing surface in the micro fly's eye lens 44 is a rectangular shape similar to the shape of the illumination field to be formed on the mask M (and thus the shape of the exposure region to be formed on the wafer W). It is.
  • the light beam incident on the micro fly's eye lens 44 is two-dimensionally divided by a large number of micro lenses 44a, and the light intensity distribution formed on the incident side surface is substantially the same on the rear focal plane or in the vicinity of the illumination pupil.
  • a secondary light source having a light intensity distribution substantially surface light source consisting of a large number of small light sources: pupil intensity distribution
  • the light from the secondary light source formed on the illumination pupil immediately after the micro fly's eye lens 44 illuminates the mask blind 45 in a superimposed manner via the condenser optical system 43b.
  • the condenser optical system 43 b by combining with the micro fly's eye lens 44, the incident side surface of the micro fly's eye lens 44 and the mask blind 45 are optically substantially conjugate.
  • the mask blind 45 is formed with a rectangular illumination field 46 corresponding to the shape and focal length of the rectangular micro-refractive surface of the micro fly's eye lens 44.
  • the pupil intensity distribution for each point in the exposure region on the wafer W needs to be substantially uniform.
  • the pupil intensity distribution for each point on the wafer W tends to be non-uniform so that it cannot be ignored.
  • a spatial light modulator 42 composed of a large number of mirror elements 42a has a high degree of freedom regarding the change of the pupil intensity distribution, and a free-form light intensity distribution having a relatively low pupil filling rate can also be adopted.
  • the pupil intensity distribution at each point on the wafer W is adjusted substantially uniformly using the spatial light modulator 42, and in general, the pupil intensity distribution is adjusted to a required distribution. I can't.
  • the light reflected by one mirror element 42a of the spatial light modulator 42 is spot-irradiated on a region extending across a plurality of microlenses 44a on the incident side surface of the micro fly's eye lens 44.
  • a field 47 is formed.
  • the incident side surface of the micro fly's eye lens 44 is optically substantially conjugate with the mask blind 45 via the condenser optical system 43b. Therefore, the light flux that forms the spot illumination field 47 is wavefront-divided by a plurality of corresponding microlenses 44 a, and the plurality of wavefront-divided small light fluxes are superimposed on the mask blind 45 to form the illumination field 46.
  • the light reflected by one mirror element 42 a is incident on the plurality of micro lenses 44 a of the micro fly's eye lens 44, and the light passing through the plurality of micro lenses 44 a overlaps the illumination field 46 on the mask blind 45.
  • the upstream side incident side
  • the micro fly The pupil intensity distribution is observed as a distribution in which a plurality of microlenses 44a shine locally instead of the entire eye lens 44.
  • the spatial light modulator 42 is used to identify the illumination field 46.
  • the degree of freedom to change only the pupil intensity distribution relating to this point, and the degree of freedom to independently adjust the pupil intensity distribution relating to each point on the wafer W, is not originally possessed.
  • a pupil intensity distribution 53 is formed while forming a pupil intensity distribution 53 (a quadrupole distribution is illustrated in FIG. 5) 53 of the required shape on the illumination pupil plane 52 using only the light reflected by the group of mirror elements 2a included. Is required to contribute only to illumination of a specific area 54 in the illumination field on the mask blind 5.
  • the relay optical system 3 (3a, 3b) has a mask M in which a conjugate surface optically conjugate with the modulation action surface of the spatial light modulator 2 is an irradiated surface. Are formed at or near the position of the mask blind 5 that is optically conjugate with the mask blind 5. Therefore, as shown in FIG. 6, the light reflected by one mirror element 2 a of the spatial light modulator 2 is partially distributed in the pupil intensity distribution 55 having a required shape on the pupil plane 3 c of the relay optical system 3. After the formation, the one-to-one correspondence relationship that only reaches a specific small area (area optically corresponding to the reflecting surface of one mirror element 2a) in the illumination field on the mask blind 5 is obtained.
  • the spatial light modulation element 2 has a modulation action surface that sets the emission angle of the emitted light in accordance with the incident position of the incident light.
  • the rear group 3b of the relay optical system 3 disposed between the surface and the surface of the relay optical system 3 is emitted from the spatial light modulator 2 at a position on the irradiated surface corresponding to the emission position from which the light emitted from the spatial light modulator 2 is emitted.
  • the light emitted from the spatial light modulation element 2 is guided to a position on the irradiated surface at an angle corresponding to a set emission angle in the light emitted from the emission position.
  • the spatial light modulation is always performed when looking upstream from each point in the illumination field on the mask blind 5.
  • the point light source illumination is such that only one mirror element 2a of the vessel 2 is shining.
  • the position of one mirror element 2a shining when viewed from each point in the illumination field on the mask blind 5 is different for each point, and the pupil intensity distribution for each point in the illumination field is accordingly different. It differs for each point position.
  • the spatial intensity modulator 2 can be used to independently adjust the pupil intensity distribution for each point.
  • the first embodiment shown in FIG. 6 is the conventional example shown in FIG. It can be said that it has a reverse relationship with the composition.
  • the pupil intensity distributions at each point in the illumination field 46 are the same. As a result, there is no difference in image height between pupil intensity distributions.
  • the condenser optical system 43b is actually not an ideal optical system, and due to the transmittance distribution, aberration, and the like of the optical system, the pupil intensity distribution at each point is not uniform enough to be ignored. Tend to be.
  • the pupil intensity distribution for each point can be changed independently and actively. A possible configuration is realized.
  • FIG. 7 is a diagram showing an optical path from the spatial light modulator to the mask blind in a modification of the first embodiment.
  • the pupil intensity distribution relating to each point of the illumination field is different for each position, and there is a possibility that a problem may occur in the formation of the pupil intensity distribution itself.
  • the pupil for each point in the illumination field 46 is utilized using the spatial light modulator 42.
  • the intensity distribution cannot be adjusted independently.
  • a relay optical system 3 (a conjugate optical surface optically conjugate with the modulation action surface of the spatial light modulator 2 is formed at or near the position of the mask blind 5.
  • the microlens array 4 is arranged at or near the pupil position 3a, 3b). In other words, if the microlens array 4 is not provided, the modulation action surface of the spatial light modulator 2 and the mask blind 5 are optically almost conjugate via the relay optical system 3 as in the configuration of FIG. is there.
  • the microlens array 4 is a diffusing element composed of a large number of microlenses 4a arranged vertically and horizontally and densely, for example.
  • a large number of microlenses 4a constituting the microlens array 4 include an incident side surface 4aa having a convex surface facing the light incident side and an emission surface having a plane directed to the light emitting side.
  • Surface 4ab the microlens array 4 is configured by two-dimensionally arranging a plurality of refractive surfaces having power in two directions orthogonal to each other.
  • the microlens array 4 constitutes a diffusing element having a plurality of unit regions having a predetermined exit-side numerical aperture.
  • the principal ray 61 of light incident obliquely at an incident angle smaller than the angle corresponding to the exit-side numerical aperture of the microlens 4 a remains at the same angle as the incident angle without changing its traveling direction. It is injected. That is, the microlens array 4 emits an obliquely incident light beam that is incident on the optical axis of the minute lens 4a obliquely with respect to the optical axis of the minute lens 4a.
  • the light emitted from the minute lens 4a is given a divergence angle (emission NA) based on the emission angle.
  • the light from the spatial light modulator 42 enters the micro fly's eye lens 44 at an incident angle smaller than the angle corresponding to the exit numerical aperture of the micro lens 44a.
  • a large number of microlenses 44a constituting the micro fly's eye lens 44 include an incident-side surface 44aa having a convex surface facing the light incident side and an exit surface having the convex surface facing the light exit side. 44ab.
  • the principal ray 62 of light obliquely incident at an incident angle smaller than the angle corresponding to the exit-side numerical aperture of the micro lens 44a is emitted in parallel with the optical axis of the micro lens 44a.
  • the light emitted from the minute lens 44a is given a divergence angle (emission NA) with reference to the emission angle along the optical axis.
  • an optical member 64 having an intermediate emission angle characteristic between the microlens array 4 and the micro fly's eye lens 44 can be assumed.
  • the principal ray 63 of light incident obliquely at an incident angle smaller than the angle corresponding to the exit-side numerical aperture of the micro lens 64a is emitted at an angle slightly smaller than the incident angle.
  • the light emitted from the microlens 64a is given a divergence angle (emission NA) based on the emission angle.
  • the light beam reflected by one mirror element 2a of the spatial light modulator 2 and incident on the microlens array 4 maintains the incident angle and the divergence angle.
  • (Ejection NA) is given and reaches a finite area 56 in the illumination field on the mask blind 5.
  • the orientation of the mirror element 2a changes, the position of incidence on the microlens array 4 changes, but the finite region 56 in the illumination field on the mask blind 5 that is optically conjugate with the modulation surface of the spatial light modulator 2 is used.
  • the relationship of illuminating almost the same area as before is maintained.
  • the size of the finite region 56 depends on the power of the microlenses 4a constituting the microlens array 4.
  • the light from the group of mirror elements 2a in the specific area of the spatial light modulator 2 forms a pupil intensity distribution of a required shape, and forms an illuminance distribution in the specific area in the illumination field on the mask blind 5.
  • the relationship is to contribute. That is, in the configuration of FIG. 7, as shown in FIG. 11, when looking upstream from one point in the illumination field on the mask blind 5, the group of mirror elements 2a in the specific region 57 of the spatial light modulator 2 shines. appear. Accordingly, it is necessary to determine the exit-side numerical aperture of the microlenses 4a constituting the microlens array 4 so that the specific region 57 includes a sufficient number of mirror elements 2a to form a pupil intensity distribution having a required shape. is there.
  • the pupil intensity distribution observed upstream from any one point in the illumination field on the mask blind 5 is It has the required shape regardless of the position of the point. Actually, it may be sufficient if the pupil intensity distribution can be independently adjusted between the center and the end in the illumination field on the mask blind 5, and in this case, the size of the specific region 57 is spatial light. A fraction of the effective reflection area of the modulator 2 is sufficient.
  • the size (cross-sectional size) of the microlenses 4 a constituting the microlens array 4 the light reflected by one mirror element 2 a of the spatial light modulator 2 is incident on the incident side surface of the microlens array 4.
  • the spot illumination field to be formed is determined so as to include the incident side surface of at least one microlens 4a. Accordingly, in the configuration of FIG. 7, when looking upstream from an arbitrary point in the finite area 56 in the illumination field on the mask blind 5, a relationship in which a point image is always observed on the illumination pupil plane is obtained.
  • the illumination field on the mask blind 5 (and thus the illumination area formed on the pattern surface of the mask M and the surface of the wafer W).
  • the light incident on the first point P1 in the exposure area forms the pupil intensity distribution related to the first point P1 through the first region R1 on the modulation acting surface of the spatial light modulator 2, and then the first point P1.
  • the light that reaches The light incident on the second point P2 in the illumination field on the mask blind 5 forms a pupil intensity distribution related to the second point P2 via the second region R2 of the modulation action surface of the spatial light modulator 2.
  • the light incident on the first point P1 in the illumination field on the mask blind 5 passes through the mirror element 2a of the first group G1 of the spatial light modulator 2 and forms a pupil intensity distribution related to the first point P1.
  • the light reaching the first point P1 and incident on the second point P2 passes through the mirror element 2a of the second group G2 of the spatial light modulator 2 and forms a pupil intensity distribution related to the second point P2.
  • the pupil intensity distribution related to the first point P1 is adjusted by controlling the orientation of the mirror element 2a of the first group G1
  • the orientation of the mirror element 2a of the second group G2 is controlled by controlling the orientation of the mirror element 2a of the first group G1, respectively.
  • the pupil intensity distribution for the second point P2 can be adjusted. That is, in the modified example of the first embodiment, the spatial light modulator 2 is used to independently adjust the pupil intensity distribution for each point in the illumination field on the mask blind 5 (and thus each point on the wafer W). can do.
  • the spatial light modulation element 2 has a modulation action surface that sets the emission angle of the emitted light according to the incident position of the incident light.
  • the rear group 3b of the relay optical system 3 arranged between the surface 2 and the surface to be irradiated has a spatial light modulation element at a position on the surface to be irradiated corresponding to the emission position from which the light emitted from the spatial light modulation element 2 is emitted.
  • the light emitted from the spatial light modulator 2 is guided to a position on the irradiated surface at an angle corresponding to the set emission angle in the light emitted from the emission position.
  • the mirror element 2a of the first group G1 and the mirror element 2a of the second group G2 partially overlap. Therefore, in order to stably obtain the pupil intensity distribution relating to each point to a required distribution (for example, a substantially uniform distribution), mirrors belonging to each group of a plurality of first partial groups obtained by virtually dividing the first group G1.
  • the illumination field 71 on the mask blind 5 includes an intensity distribution 72 of a light beam incident on the spatial light modulator 2 and a single far field distribution ( And an illuminance distribution obtained by convolution with the emission angle distribution 73.
  • the intensity distribution 72 of the incident light beam on the spatial light modulator 2 is, for example, a smoothing optical system composed of a fly-eye lens and a relay optical system disposed in the optical path between the beam transmitter 1 and the spatial light modulator 2. By using, a distribution close to a top hat shape is obtained.
  • a fly-eye lens having a plurality of lens surfaces arranged two-dimensionally in a plane crossing the traveling direction of incident light or the optical axis of the illumination optical system, and a plurality of the fly-eye lenses And a relay optical system in which the front focal point is disposed at the formation position of the light source image and the rear focal point is disposed on the arrangement surface of the spatial light modulator 2.
  • a diffractive optical element having a plurality of diffractive surfaces arranged two-dimensionally in the transverse plane and a plurality of reflective surfaces arranged two-dimensionally in the transverse plane are used.
  • a provided mirror array or the like may be used.
  • a wavefront dividing element having a plurality of wavefront dividing surfaces arranged two-dimensionally in the transverse plane may be used.
  • the single far field distribution 73 by the microlens array 4 is a top hat distribution. Therefore, the mirror element 2a corresponding to the positions 72a, 72b, and 72c in the intensity distribution 72 regardless of whether the incident angle of light on the microlens array 4 is smaller or larger than the angle corresponding to the exit side numerical aperture of the microlens 4a.
  • the light from the light forms top hat-like intensity distributions 71a, 71b, 71c that are displaced from each other in the illumination field 71, respectively.
  • the incident angle of light to the micro fly's eye lens 44 is set smaller than the angle corresponding to the exit side numerical aperture of the micro lens 44a.
  • the single far field distribution 74 by the micro fly's eye lens 44 has a top hat shape as in the case of the micro lens array 4. Accordingly, the light from the mirror element 2a corresponding to the positions 72a, 72b, and 72c in the intensity distribution 72 forms the top hat-shaped intensity distributions 75a, 75b, and 75c that are superimposed in the illumination field 75 without being displaced from each other. To do.
  • the light from the plurality of mirror elements 2a is superimposed on the illumination field 75 without being misaligned with each other.
  • the illumination field 75 having the following illuminance distribution is formed.
  • the illumination field 71 having a trapezoidal illuminance distribution as a whole is easily formed as shown in FIG. .
  • the illuminance distribution of the rectangular illumination field 71 is trapezoidal along the short side direction and the long side direction.
  • the illuminance distribution along the short side direction (corresponding to the scanning direction) has a small influence even if it has a trapezoidal shape, but in the long side direction (corresponding to the scanning orthogonal direction orthogonal to the scanning direction).
  • the illuminance distribution along is required to be rectangular. Therefore, in the first embodiment, at least both end portions (the hatched portions in FIG. 14) 71d along the long side direction of the illumination field 71 need to be blocked by the mask blind 5, and a light amount loss occurs in the mask blind 5. To do.
  • the optical member 64 shown in FIG. 10 that is, a single far field distribution 76 by the optical member 64 having an intermediate emission angle characteristic between the microlens array 4 and the micro fly's eye lens 44 is also obtained. Similar to the case of the microlens array 4, it has a top hat shape. Therefore, even if the incident angle of light to the optical member 64 is smaller or larger than the angle corresponding to the exit side numerical aperture of the micro lens 64a, the mirror element 2a corresponding to the positions 72a, 72b, 72c in the intensity distribution 72 is used. In the illumination field 77 form top hat-like intensity distributions 77a, 77b, and 77c that are displaced from each other. Note that the degree of positional deviation of the top hat-shaped intensity distributions 77a, 77b, and 77c is smaller than that of the microlens array 4.
  • the light reflected by the plurality of mirror elements 2a of the spatial light modulator 2 at each predetermined angle is desired to the illumination pupil in the optical path of the relay optical system 3.
  • the pupil intensity distribution is variably formed. Further, the desired pupil intensity distribution is also applied to the position of another illumination pupil optically conjugate with the illumination pupil in the optical path of the relay optical system 3, that is, the pupil position of the imaging optical system 6 and the pupil position of the projection optical system PL. Is formed.
  • Each distribution can be adjusted independently.
  • the pupil intensity distribution at each point in the still exposure region ER on the wafer W can be adjusted substantially uniformly. Therefore, in the exposure apparatus of the first embodiment, the illumination optical system that adjusts the pupil intensity distribution at each point in the static exposure region ER on the wafer W almost uniformly adjusts according to the fine pattern of the mask M. Good exposure can be performed under appropriate illumination conditions. As a result, the fine pattern of the mask M can be accurately transferred onto the wafer W with a desired line width over the entire exposure region.
  • the microlens array 4 is disposed at or near the pupil position of the relay optical system 3.
  • the present invention is not limited to this, and the microlens array 4 as a diffusing element can be disposed in the pupil space between the front lens group 3a and the rear lens group 3b of the relay optical system 3.
  • the pupil space means a space formed in the optical path by the optical element arranged immediately before the pupil position and the optical element arranged immediately after the pupil position.
  • a parallel plane plate or plane mirror having no power may exist in the pupil space.
  • FIG. 16 is a drawing schematically showing a configuration of an exposure apparatus according to the second example of the embodiment.
  • FIG. 17A is a perspective view showing an optical path from the spatial light modulator to the mask blind in the second embodiment
  • FIG. 17B shows one of the illumination fields formed on the mask blind in the second embodiment. It is a figure which shows the illumination intensity distribution in a dimension direction.
  • the second embodiment has a configuration similar to that of the first embodiment of FIG. However, the second embodiment is different from the first embodiment in that an optical unit 14 having both the function of a microlens array and the function of a micro fly's eye lens is used instead of the microlens array 4. . Therefore, in FIG. 16, the same reference numerals as those in FIG. 1 are given to elements having the same functions as the components shown in FIG. Hereinafter, the configuration and operation of the second embodiment will be described focusing on the differences from the first embodiment.
  • a rectangular illumination field 81 having a long side along the Z direction and a short side along the X direction is located at the position of the mask blind 5. It is formed.
  • the image height difference in the pupil intensity distribution in the X direction (corresponding to the scanning direction) in the short side direction in the illumination field 81 is relatively small, and the non-uniformity is caused by the averaging effect of scanning exposure. Does not significantly affect the occurrence of line width errors.
  • the difference in image height of the pupil intensity distribution with respect to the Z direction (corresponding to the scanning orthogonal direction) which is the long side direction is relatively large, and the non-uniformity easily affects the occurrence of a line width error.
  • an optical unit 14 having the function of a microlens array in the Z direction and the function of a micro fly's eye lens in the X direction is introduced.
  • the optical unit 14 is disposed at or near the pupil position of the relay optical system 3. That is, in the relay optical system 3, the rear focal position of the front lens group 3a and the front focal position of the rear lens group 3b substantially coincide with each other, and the optical unit 14 is located at or near the rear focal position of the front lens group 3a. Is arranged.
  • the optical unit 14 includes a parallel plane plate-like first optical member 14a and a parallel plane plate-like second optical member 14b arranged along the optical axis of the illumination optical system.
  • a plurality of cylindrical refractive surfaces having power in the Z direction are arranged in the Z direction.
  • a plurality of cylindrical refractive surfaces having power in the X direction are arranged in the X direction. Therefore, the optical unit 14 has a function of a cylindrical lens array in the Z direction, and has a function of a cylindrical fly's eye lens in the X direction.
  • the optical unit 14 constitutes a diffusing element having a plurality of unit regions having a predetermined exit-side numerical aperture.
  • the unit area of the optical unit 14 emits an oblique incident light beam that is obliquely incident on the optical axis of the unit area at a constant angle regardless of the incident angle of the oblique incident light beam.
  • the obliquely incident light beam that is incident obliquely with respect to the optical axis of the unit area corresponds to the incident angle of the obliquely incident light beam. Inject at an angle.
  • the light incident on the point 81a in the illumination field 81 forms a pupil intensity distribution related to the point P81a through the plurality of mirror elements 2a belonging to the region 2da of the modulation action surface 2d of the spatial light modulator 2.
  • the illumination field 81 light incident on the point 81b at the same position as the point 81a in the Z direction passes through a plurality of mirror elements 2a belonging to the same region 2da as in the case of the point 81a to form a pupil intensity distribution regarding the point P81b.
  • Point 81b is reached.
  • the modulation acting surface 2d is arranged in the Z direction.
  • the spatial light modulator is controlled by the controller CR so that the light passing through the mirror element 2a belonging to each of the plurality of partial regions obtained by virtual division is incident on each point after forming the same light intensity distribution on the illumination pupil. It is only necessary to individually control a large number of two mirror elements 2a.
  • the optical unit 14 having the function of a microlens array in the Z direction since the optical unit 14 having the function of a microlens array in the Z direction is used, the Z in the illumination field 81 on the mask blind 5 using the spatial light modulator 2 is used.
  • the pupil intensity distribution for each point along the direction (and thus each point along the Y direction in the exposure region on the wafer W) can be independently adjusted.
  • the optical unit 14 having the function of a micro fly's eye lens in the X direction is used, the cross section of the illuminance distribution along the X direction (short side direction) in the rectangular illumination field 81 is rectangular rather than trapezoidal.
  • the light amount loss in the mask blind 5 can be reduced as compared with the first embodiment.
  • a plurality of cylindrical refractive surfaces having power in the Z direction are arranged in the Z direction on the exit surface 14ab of the first optical member 14a, and the incident side surface 14aa and the second surface of the first optical member 14a are arranged in the second direction.
  • a plurality of cylindrical refracting surfaces having power in the X direction are arranged in the X direction.
  • various forms of the specific configuration of the optical unit 14 are possible.
  • a plurality of cylindrical refractive surfaces constituting the cylindrical fly-eye lens are formed on one surface of the first optical member 14a and one surface of the second optical member 14b, and the plurality of cylindrical refractive surfaces constituting the cylindrical lens array are formed. It can be formed on the other surface of the first optical member 14a or the other surface of the second optical member 14b.
  • a plurality of cylindrical refracting surfaces constituting the cylindrical fly-eye lens are formed on one surface of the first optical member 14a and the other surface of the first optical member 14a, and a plurality of cylindrical refracting surfaces constituting the cylindrical lens array are formed. You may form in the one surface of the 2nd optical member 14b, or the other surface of the 2nd optical member 14b.
  • the optical unit 14 is disposed at or near the pupil position of the relay optical system 3.
  • the present invention is not limited to this, and the optical unit 14 as a diffusing element can be arranged in the pupil space between the front lens group 3a and the rear lens group 3b of the relay optical system 3.
  • the illumination distribution of the illumination field 81 in the Z direction of the illumination field 81 formed at the position of the mask blind 5 has a trapezoidal shape as shown in FIG.
  • both end portions (the hatched portions in FIG. 17B) 81 d along the long side direction of the illumination field 81 need to be blocked by the mask blind 5. In this case, a light quantity loss occurs.
  • the focal length of the front lens group 3a of the relay optical system 3 that can be regarded as a conversion optical system is defined as f1
  • f2 is a length in a direction corresponding to a direction (long side direction) orthogonal to the scanning direction of the irradiation region of light incident on the spatial light modulator 2 (typically, the modulation action surface 2d of the spatial light modulator 2).
  • the above expression (1) or (2) may be satisfied.
  • the above expression (1) or (2) may be satisfied.
  • the direction corresponding to the direction (long side direction) orthogonal to the scanning direction on the modulation acting surface of the spatial light modulator 2 is the optical system interposed between the spatial light modulator and the irradiated surface.
  • a direction along a virtual axis and an optically conjugate axis along the direction (long side direction) orthogonal to the scanning direction on the irradiated surface in other words, an axis in the direction orthogonal to the scanning direction on the irradiated surface.
  • the direction of the axis when projected back onto the modulation action surface of the spatial light modulator 2 through the intervening optical system can be obtained.
  • N ⁇ 10 may be satisfied.
  • FIG. 18 is a drawing schematically showing a configuration of an exposure apparatus according to the third example of the embodiment.
  • FIG. 19 is a diagram showing an optical path from the spatial light modulator to the mask blind in the third embodiment.
  • the third embodiment has a configuration similar to that of the first embodiment shown in FIG. However, the third embodiment is different from the first embodiment in that a micro fly's eye lens (fly eye lens) 24 is used instead of the micro lens array 4. Therefore, in FIG. 18, the same reference numerals as those in FIG. 1 are given to elements having the same functions as the components shown in FIG.
  • the configuration and operation of the third embodiment will be described with a focus on differences from the first embodiment.
  • the third embodiment a configuration similar to the conventional configuration shown in FIG. 4 is adopted as the configuration between the spatial light modulator 2 and the mask blind 5. That is, the light emitted from the spatial light modulator 2 enters the micro fly's eye lens 24 through the relay optical system 23a.
  • the micro fly's eye lens 24 is an optical element composed of a large number of microlenses 24a having positive refractive power, which are arranged vertically and horizontally and densely, and an optical element having a plurality of unit wavefront division regions having a predetermined exit side numerical aperture.
  • An integrator is configured.
  • the relay optical system 23a has a front focal position located in the vicinity of the array surface of the spatial light modulator 22, and a rear focal position located in the vicinity of the incident side surface of the micro fly's eye lens 24.
  • the arrangement surface of the optical modulator 2 and the incident side surface of the micro fly's eye lens 24 are optically set in a Fourier transform relationship. Therefore, the light passing through the spatial light modulator 2 variably forms a light intensity distribution according to the postures of the plurality of mirror elements 2 a on the incident side surface of the micro fly's eye lens 24.
  • the light that has passed through the micro fly's eye lens 24 illuminates the mask blind 5 via the relay optical system 23b.
  • the surface on the incident side of the micro fly's eye lens 24 and the mask blind 5 are optically substantially conjugate with the combination with the micro fly's eye lens 24.
  • the micro fly's eye lens 24 includes a plurality of rectangular unit wavefront division regions having long sides along the Z direction and short sides along the X direction. Accordingly, also in the third embodiment, as in the first embodiment, a rectangular illumination having a long side along the Z direction and a short side along the X direction at the position of the mask blind 5.
  • a field 82 is formed.
  • the third embodiment pays attention to three modulation regions 83a, 83b, 83c obtained by virtually dividing the modulation acting surface 83 of the spatial light modulator 2 into three in the Z direction.
  • the light that has passed through the plurality of mirror elements 2a belonging to the central modulation region 83a on the modulation action surface 83 is microfly with an incident angle equal to or smaller than the angle corresponding to the exit side numerical aperture of the microlens 24a with respect to the Z direction.
  • the light that has entered the eye lens 24 and has passed through the plurality of mirror elements 2a belonging to the modulation region 83b on the + Z direction side and the modulation region 83c on the ⁇ Z direction side on the modulation acting surface 83 is the exit side opening of the micro lens 24a with respect to the Z direction It is configured to enter the micro fly's eye lens 24 at an incident angle larger than the angle corresponding to the number.
  • the light that has passed through all the mirror elements 2a belonging to the modulation acting surface 83 is incident on the micro fly's eye lens 24 at an incident angle equal to or smaller than the angle corresponding to the exit side numerical aperture of the micro lens 24a with respect to the X direction.
  • the illumination field 82 on the mask blind 5 includes an intensity distribution 84 of a light beam incident on the spatial light modulator 2 and a single far field distribution (emergence angle distribution) by the micro fly's eye lens 24. ) 85 and an illuminance distribution obtained by convolution.
  • light from the mirror element 2 a corresponding to the position 84 a of the intensity distribution 84 in the modulation region 83 a is emitted from the incident microlens 24 a, and forms a top hat-shaped intensity distribution 82 a in the illumination field 82.
  • light from a plurality of other mirror elements 2a belonging to the modulation region 83a is also emitted from the incident microlens 24a, and a top hat-shaped intensity distribution is superimposed on the position of the intensity distribution 82a.
  • the light from the mirror element 2a corresponding to the position 84b of the intensity distribution 84 in the modulation region 83b adjacent to the modulation region 83a on the + Z direction side is emitted from the incident minute lens 24a and the minute lens 24a adjacent to the ⁇ Z direction side.
  • the intensity distribution 82a and the top hat-shaped intensity distribution 82b adjacent to the ⁇ Z direction side are formed.
  • light from the other mirror elements 2a belonging to the modulation region 83b is also emitted from the incident microlens 24a and the microlens 24a adjacent to the ⁇ Z direction side, and has a top hat shape at the position of the intensity distribution 82b.
  • An intensity distribution is formed in a superimposed manner.
  • the intensity distribution 82a and the top hat-shaped intensity distribution 82c adjacent to the + Z direction side are formed.
  • light from other mirror elements 2a belonging to the modulation region 83c is also emitted from the incident microlens 24a and the microlens 24a adjacent to the + Z direction side, and has a top hat-like intensity at the position of the intensity distribution 82c.
  • the distribution is formed in a superimposed manner.
  • the intermediate optical member 64 shown in FIG. 10 when used instead of the micro fly's eye lens 24, the top hat-like intensity distributions 82a, 82b, and 82c partially overlap each other. A bright illumination area is formed on the mask blind 5.
  • light from the plurality of mirror elements 2a belonging to the modulation area 83a in the modulation acting surface 83 of the spatial light modulator 2 is illuminated in the central illumination area 82A (intensity distribution in FIG. 20) in the illumination field 82 on the mask blind 5.
  • Light from the plurality of mirror elements 2a belonging to the modulation area 83b forms an illumination area 82B (corresponding to the intensity distribution 82b in FIG. 20) adjacent to the illumination area 82A on the ⁇ Z direction side in the illumination field 82.
  • Light from the plurality of mirror elements 2a belonging to the modulation region 83c forms an illumination region 82C (corresponding to the intensity distribution 82c in FIG. 20) adjacent to the illumination region 82A and the + Z direction side in the illumination field 82.
  • light reaching an arbitrary point Pa (not shown) in the illumination area 82A passes through a plurality of mirror elements 2a belonging to the modulation area 83a of the spatial light modulator 2, and the pupil intensity relating to the arbitrary point Pa.
  • Light that is incident on an arbitrary point Pa after the distribution is formed.
  • light reaching arbitrary points Pb and Pc (not shown) in the illumination regions 82B and 82C passes through a plurality of mirror elements 2a belonging to the modulation regions 83b and 83c, and pupil intensity distribution regarding the arbitrary points Pb and Pc. Is incident on arbitrary points Pb and Pc.
  • the pupil intensity distribution for each point in the illumination area 82A is adjusted by controlling the orientation of the plurality of mirror elements 2a belonging to the modulation area 83a, and the orientation of the plurality of mirror elements 2a belonging to the modulation area 83b is controlled.
  • the pupil intensity distribution for each point in the illumination area 82B is adjusted by controlling the directions of the plurality of mirror elements 2a belonging to the modulation area 83c. be able to.
  • the intensity distribution and the pupil intensity distribution regarding each point in the illumination area 82C can be adjusted independently.
  • the pupil intensity distribution can be independently adjusted for each of the illumination areas 82A, 82B, and 82C, but the pupil intensity distribution for each point is independently adjusted in each of the illumination areas 82A, 82B, and 82C. I can't do it.
  • each of the plurality of partial areas obtained by virtually dividing the modulation area 83a belongs.
  • the light passing through the mirror element 2a is incident on an arbitrary point in the illumination area 82A after forming the same light intensity distribution on the illumination pupil, and belongs to each of a plurality of partial areas obtained by virtually dividing the modulation area 83b.
  • the light passing through the mirror element 2a is incident on an arbitrary point in the illumination area 82B after forming the same light intensity distribution on the illumination pupil, and belongs to each of a plurality of partial areas obtained by virtually dividing the modulation area 83c.
  • a number of mirror elements 2a of the spatial light modulator 2 are controlled by the controller CR so that the light passing through the mirror element 2a is incident on an arbitrary point in the illumination region 82C after forming the same light intensity distribution on the illumination pupil. It can be individually controlled.
  • the relay optical system 23b optically substantially conjugates the incident surface of the micro fly's eye lens 24 and the mask blind 5 in combination with the micro fly's eye lens 24.
  • the present invention is not limited to this, and generally, it is combined with an optical integrator (for example, a micro fly's eye lens) having a plurality of unit wavefront division regions having a predetermined exit-side numerical aperture so as to enter the optical integrator on the incident side. It is possible to use a relay optical system that forms a conjugate surface optically conjugate with the first surface in the first space including the position of the irradiated surface or the second space including the position optically conjugate with the irradiated surface.
  • the first space is a space including an irradiated surface, such as a pattern surface of the mask M, and includes an optical element arranged immediately before the irradiated surface and an optical element arranged immediately after the irradiated surface. It means the space formed in the optical path.
  • the second space is a space including a position conjugate with the irradiated surface (for example, the position of the mask blind), and is formed in the optical path by an optical element arranged immediately before the conjugate position and an optical element arranged immediately after the conjugate position. It means the space to be done.
  • the micro fly's eye lens 24 is disposed at or near the pupil position of the combining optical system composed of the relay optical systems 23a and 23b.
  • the present invention is not limited to this, and the micro fly's eye lens 24 as a diffusing element can be disposed in the pupil space between the relay optical systems 23a and 23b.
  • FIG. 21 is a drawing schematically showing a configuration of an exposure apparatus according to the fourth example of the embodiment.
  • FIG. 22 is a diagram illustrating the optical path from the spatial light modulator to the mask blind in the fourth embodiment and the operation of the fourth embodiment.
  • the fourth embodiment has a configuration similar to that of the third embodiment of FIG. However, the fourth embodiment is different from the third embodiment in that a wavefront division type optical integrator 34 having a novel configuration is used instead of the micro fly's eye lens (fly eye lens) 24. . Therefore, in FIG. 21, the same reference numerals as those in FIG. 18 are given to elements having the same functions as the components shown in FIG. Hereinafter, the configuration and operation of the fourth embodiment will be described, focusing on the differences from the third embodiment.
  • the light emitted from the spatial light modulator 2 enters the optical integrator 34 via the relay optical system 23a.
  • the optical integrator 34 includes a plurality of rectangular incident refracting surfaces 34a arranged at a predetermined pitch along the Z direction, and a half pitch in the Z direction with respect to the plurality of incident refracting surfaces 34a. And a plurality of rectangular exit refracting surfaces 34b arranged in a shifted position.
  • the Z-direction period of the plurality of rectangular exit refracting surfaces 34b of the optical integrator 34 is shifted by a half period with respect to the Z-direction period of the plurality of rectangular incident refracting surfaces 34a.
  • the plurality of incident refracting surfaces 34a are arranged at a predetermined pitch along the X direction, and the plurality of exit refracting surfaces 34b are not displaced in the X direction with respect to the plurality of incident refracting surfaces 34a. It is arranged.
  • the relay optical system 23a has a front focal position positioned in the vicinity of the array surface of the spatial light modulator 22, and a rear focal position positioned in the vicinity of the incident-side surface of the optical integrator 34.
  • the arrangement surface of the device 2 and the incident-side surface of the optical integrator 34 are optically set in a Fourier transform relationship. Therefore, the light passing through the spatial light modulator 2 variably forms a light intensity distribution corresponding to the postures of the plurality of mirror elements 2 a on the incident side surface of the optical integrator 34.
  • the light that has passed through the optical integrator 34 illuminates the mask blind 5 via the relay optical system 23b.
  • the relay optical system 23b optically substantially conjugates the incident side surface of the optical integrator 34 and the mask blind 5 in combination with the optical integrator 34.
  • the optical integrator 34 has a plurality of rectangular incident refracting surfaces 34a having long sides along the Z direction and short sides along the X direction, and thus having long sides along the Z direction and the X direction. Are provided with a plurality of rectangular unit wavefront division regions having short sides.
  • the mask blind 5 has a long side along the Z direction and a short side along the X direction at the position of the mask blind 5.
  • a rectangular illumination field 87 is formed.
  • the filling ratio of the small light source described here refers to the formation area of the small light source image that occupies each area of the multiple exit surfaces of the optical integrator (or the multiple wavefront split surfaces of the optical integrator as viewed from the exit side). It is a ratio.
  • the light that has passed through the plurality of mirror elements 42a of the spatial light modulator 42 passes through the relay optical system 43a in the vicinity of the exit surface of each micro lens 44a of the micro fly's eye lens 44.
  • a plurality of small light sources 42s are formed. Light from each small light source 42s illuminates the mask blind 45 in a superimposed manner via a condenser optical system 43b to form a rectangular illumination field 46.
  • the maximum value of the incident angle in the Z direction of light incident on the micro fly's eye lens 44 from the spatial light modulator 42 via the relay optical system 43a is the exit side opening in the Z direction of the micro lens 44a.
  • the plurality of small light sources 42s are distributed in the entire Z direction in the vicinity of the exit surface of each microlens 44a. That is, the filling rate in the Z direction of the small light source 42s formed through the micro fly's eye lens 44 as an optical integrator is 100%.
  • the maximum value of the incident angle in the Z direction of light incident on the micro fly's eye lens 44 is smaller than the incident angle corresponding to the exit side numerical aperture in the Z direction of the micro lens 44a
  • the filling ratio in the Z direction of the formed small light source 42s is smaller than 100%.
  • the maximum value of the incident angle of light incident on the micro fly's eye lens 44 corresponds to the exit side numerical aperture of the micro lens 44a. The incident angle is not set larger than the incident angle.
  • the light that has passed through the plurality of mirror elements 2a belonging to the central modulation region 83a on the modulation action surface 83 of the spatial light modulator 2 passes through the relay optical system 23a in the Z direction. Is incident on the micro fly's eye lens 24 at an incident angle equal to or smaller than the angle corresponding to the exit-side numerical aperture of the micro lens 24a.
  • the light that has passed through the plurality of mirror elements 2a belonging to the modulation region 83b on the + Z direction side and the modulation region 83c on the -Z direction side of the modulation acting surface 83 passes through the relay optical system 23a and exits from the minute lens 24a with respect to the Z direction. The light enters the micro fly's eye lens 24 at an incident angle larger than the angle corresponding to the numerical aperture.
  • the light from the plurality of mirror elements 2a belonging to the modulation area 83a is emitted from the incident micro lens 24a, and forms a central illumination area 82A in the illumination field 82 on the mask blind 5 via the relay optical system 23b.
  • Light from a plurality of mirror elements 2a belonging to the modulation region 83a and the modulation region 83b adjacent to the + Z direction side is emitted from the incident micro lens 24a and the micro lens 24a adjacent to the ⁇ Z direction side, and passes through the relay optical system 23b. Accordingly, in the illumination field 82, an illumination area 82B adjacent to the illumination area 82A on the ⁇ Z direction side is formed.
  • Light from the plurality of mirror elements 2a belonging to the modulation region 83a and the modulation region 83c adjacent to the ⁇ Z direction side is emitted from the incident micro lens 24a and the micro lens 24a adjacent to the + Z direction side, and passes through the relay optical system 23b. Accordingly, in the illumination field 82, an illumination area 82C adjacent to the illumination area 82A on the + Z direction side is formed. In this way, a plurality of small light sources 83s are distributed and formed as a whole along the Z direction in the vicinity of the exit surface of the micro lens 24a on which light is incident in FIG. That is, the filling rate in the Z direction of the small light source 83s in the vicinity of the exit surface of the microlens 24a on which light is incident is necessarily 100%.
  • the microlens 24a adjacent to the + Z direction side is also adjacent to the exit surface of the microlens 24a adjacent to the -Z direction side of the microlens 24a on which light is incident. Even in the vicinity of the exit surface, it is required that the plurality of small light sources 83 s be formed in an overall distribution along the Z direction. In other words, the filling rate in the Z direction of the small light source 83s formed through the microlens array 24 as an optical integrator is required to be 300%.
  • one modulation region obtained by virtually dividing the modulation acting surface 86 of the spatial light modulator 2 into two equal parts in the Z direction that is, the modulation region on the ⁇ Z direction side
  • the light that has passed through the plurality of mirror elements 2a belonging to 86a enters the optical integrator 34 via the relay optical system 23a.
  • the other modulation region 86b adjacent to the modulation region 86a in the modulation direction 86a in the Z direction that is, the modulation region on the + Z direction side
  • 86b also enters the optical integrator 34 via the relay optical system 23a.
  • the illumination area 87A on the + Z direction side in the illumination field 87 on the mask blind 5 is formed via the relay optical system 23b.
  • Light passing through the plurality of mirror elements 2a belonging to the modulation region 86b on the + Z direction side is emitted from an incident refracting surface 34b shifted by a half pitch in the ⁇ Z direction from the incident incident refracting surface 34a, as shown in FIG.
  • an illumination area 87B on the ⁇ Z direction side in the illumination field 87 is formed via the relay optical system 23b.
  • the illumination area 87 has a rectangular shape having long sides along the Z direction.
  • the ⁇ Z direction side modulation region 86 a and the + Z direction side modulation region 86 b are symmetric with respect to an axis extending in the X direction (a predetermined axis perpendicular to the Z direction) on the modulation acting surface 86.
  • the illumination area 87A on the + Z direction side and the illumination area 87B on the ⁇ Z direction side are related to an axis extending in the X direction on the surface of the mask blind 5 that is optically conjugate with the pattern surface of the mask M, which is the irradiated surface. Symmetric.
  • the incident refracting surface 34a on which light is incident is set by setting the incident angle in the Z direction of the light incident on the optical integrator 34 from the spatial light modulator 2 via the relay optical system 23a to an appropriate value.
  • a plurality of small light sources 86s are entirely distributed along the Z direction. That is, the filling rate in the Z direction of the small light source 86s formed through the optical integrator 34 is 200%.
  • a plurality of small refracting surfaces 34a are provided in the vicinity of the pair of exit refracting surfaces 34b that are displaced by a half pitch in the ⁇ Z direction from the incident refracting surface 34a on which light is incident. It is not required that the light sources 86s are distributed and formed along the Z direction. In other words, it is not essential that the filling rate in the Z direction of the small light source 86s formed via the optical integrator 34 is 200%.
  • light reaching an arbitrary point Pa (not shown) in the illumination area 87A passes through a plurality of mirror elements 2a belonging to the modulation area 86a of the spatial light modulator 2, and the pupil intensity relating to the arbitrary point Pa.
  • Light that is incident on an arbitrary point Pa after the distribution is formed.
  • light reaching an arbitrary point Pb (not shown) in the illumination area 87B passes through a plurality of mirror elements 2a belonging to the modulation area 86b, forms a pupil intensity distribution related to the arbitrary point Pb, and then reaches an arbitrary point Pb. Is incident on the light.
  • the pupil intensity distribution for each point in the illumination area 87A is adjusted by controlling the orientation of the plurality of mirror elements 2a belonging to the modulation area 86a, and the orientation of the plurality of mirror elements 2a belonging to the modulation area 86b is controlled. By doing this, the pupil intensity distribution for each point in the illumination area 87B can be adjusted.
  • the spatial light modulator 2 is used to relate the pupil intensity distribution related to each point in the illumination area 87A and each point in the illumination area 87B out of the illumination field 87 on the mask blind 5.
  • the pupil intensity distribution can be adjusted independently.
  • the pupil intensity distribution can be adjusted independently for each of the illumination areas 87A and 87B, but the pupil intensity distribution for each point in each of the illumination areas 87A and 87B cannot be adjusted independently. .
  • a number of mirror elements 2a of the spatial light modulator 2 are individually controlled by the controller CR so that the light having passed through 2a is incident on an arbitrary point in the illumination area 87B after forming the same light intensity distribution on the illumination pupil. Just do it.
  • light that has passed through the plurality of mirror elements 2a belonging to the modulation region 86a on the ⁇ Z direction side forms an illumination region 87A on the + Z direction side, and is symmetric with respect to the modulation region 86a with respect to the axis extending in the X direction.
  • Light that has passed through the plurality of mirror elements 2a belonging to the direction-side modulation region 86b forms an illumination region 87B on the ⁇ Z direction side that is symmetrical to the illumination region 87A with respect to the axis extending in the X direction.
  • the light intensity distribution of the light beam incident on the modulation action surface 86 of the spatial light modulator 2 does not necessarily have to be substantially uniform, and the light intensity distribution of the light beam incident on the modulation region 86a on the ⁇ Z direction side and the + Z direction side If the light intensity distribution of the light beam incident on the modulation region 86b is substantially symmetrical with respect to the axis extending in the X direction, the light amount in the illumination region 87A on the + Z direction side and the light amount in the illumination region 87B on the -Z direction side are substantially equal. As a result, a substantially uniform illuminance distribution is obtained over the entire illumination area 87.
  • the relay optical system 23b optically arranges the incident side surface of the optical integrator 34 and the mask blind 5 in an optically conjugate manner in combination with the optical integrator 34.
  • the present invention is not limited to this, and generally, in combination with an optical integrator, a conjugate plane optically conjugate with the incident-side surface of the optical integrator is changed into the first space including the position of the irradiated surface or A relay optical system formed in the second space including a position optically conjugate with the irradiated surface can be used.
  • the optical integrator 34 is disposed at or near the pupil position of the combining optical system composed of the relay optical systems 23a and 23b.
  • the present invention is not limited to this, and the optical integrator 34 can be arranged in the pupil space between the relay optical systems 23a and 23b.
  • the spatial light modulator having a plurality of mirror elements that are two-dimensionally arranged and individually controlled the directions (angle: inclination) of the plurality of two-dimensionally arranged reflecting surfaces are individually set.
  • the controllable spatial light modulator 2 is used.
  • a spatial light modulator that can individually control the height (position) of a plurality of two-dimensionally arranged reflecting surfaces can be used.
  • the spatial light modulator disclosed in FIG. 1d of US Pat. No. 5,312,513 and US Pat. No. 6,885,493 can be used.
  • spatial light modulators by forming a two-dimensional height distribution, an action similar to that of the diffractive surface can be given to incident light.
  • the spatial light modulator having a plurality of reflection surfaces arranged two-dimensionally as described above is modified in accordance with the disclosure of, for example, US Pat. No. 6,891,655 and US Patent Publication No. 2005/0095749. May be.
  • a diffusing element that has a plurality of unit regions having a predetermined exit numerical aperture and that emits obliquely incident light beams that are incident on the optical axis of the unit region obliquely with respect to the optical axis.
  • a microlens array (or lens array) 4 an optical unit 14 including a pair of optical members 14a and 14b, or a micro fly's eye lens (fly eye lens) 24 is used.
  • the present invention is not limited to this, and a diffractive optical element, a diffusing plate, or the like can be used as a diffusing element having a plurality of unit regions having a predetermined exit-side numerical aperture.
  • the exit side numerical aperture is obtained by multiplying the sine of the half angle of the opening angle of the emitted light beam emitted when the parallel light beam is incident and the refractive index of the medium on the exit side of the diffusing element.
  • the reflection type spatial light modulator 2 provided with is used.
  • the present invention is not limited to this, and a plurality of spatial light modulation elements that are arranged in a predetermined plane and are individually controlled as a spatial light modulation element having a modulation action surface that sets an emission angle of emission light according to an incident position of incident light.
  • a transmissive spatial light modulator that includes a transmissive optical element and variably forms a pupil intensity distribution, a diffractive optical element that forms a pupil intensity distribution in a fixed manner, and the like.
  • the light incident on the point P1 in the illumination field on the mask blind 5 is the first region of the diffractive optical surface of the diffractive optical element.
  • the light reaching the point P1 after forming the pupil intensity distribution related to the point P1 through R1 and the light incident on the point P2 passes through the second region R2 of the diffractive optical surface and forms the pupil intensity distribution related to the point P2 after forming the pupil intensity distribution.
  • the light that reaches Then, light that has passed through each of the plurality of first partial regions obtained by virtually dividing the first region R1 of the diffractive optical surface is incident on the point P1 after forming the same light intensity distribution on the illumination pupil.
  • the diffractive optical surface of the diffractive optical element is made so that light that has passed through each of the plurality of second partial regions obtained by virtually dividing the region R2 enters the point P2 after forming the same light intensity distribution on the illumination pupil. What is necessary is just to form.
  • a diffractive optical element when used in place of the spatial light modulator 2, light reaching an arbitrary point Pa in the illumination area 82A passes through the first area Ra of the diffractive optical surface and passes through the first area Ra. Light that is incident on an arbitrary point Pa after the pupil intensity distribution relating to the point Pa is formed. Similarly, light reaching arbitrary points Pb and Pc in the illumination regions 82B and 82C passes through the second region Rb and the third region Rc adjacent to the first region Ra on the diffractive optical surface, and passes through the arbitrary points Pb and Pc. Is incident on arbitrary points Pb and Pc after the pupil intensity distribution is formed.
  • An arbitrary point in the illumination area 82A after the light passing through each of the plurality of first partial areas obtained by virtually dividing the first area Ra of the diffractive optical surface forms the same light intensity distribution in the illumination pupil.
  • An arbitrary point Pb in the illumination area 82B after the light incident on Pa and passing through each of the plurality of second partial areas obtained by virtually dividing the second area Rb forms the same light intensity distribution in the illumination pupil.
  • the light passing through each of the plurality of third partial regions obtained by virtually dividing the third region Rc forms the same light intensity distribution on the illumination pupil and then reaches an arbitrary point Pc in the illumination region 82C. What is necessary is just to form the diffractive optical surface of a diffractive optical element so that it may inject.
  • An arbitrary point in the illumination area 87A after the light having passed through each of the plurality of first partial areas obtained by virtually dividing the first area Ra of the diffractive optical surface forms the same light intensity distribution in the illumination pupil.
  • An arbitrary point Pb in the illumination area 87B after the light incident on Pa and passing through each of the plurality of second partial areas obtained by virtually dividing the second area Rb forms the same light intensity distribution in the illumination pupil. What is necessary is just to form the diffractive optical surface of a diffractive optical element so that it may inject into.
  • the relay optical is provided between the spatial light modulation element such as the reflective spatial light modulator 2 and the diffusion element such as the microlens array 4, the optical unit 14, or the micro fly's eye lens 24.
  • a conversion optical system such as the front lens group 3a of the system 3 or the relay optical system 23a is interposed.
  • the conversion optical system is disposed between the spatial light modulation element and the diffusion element, and converts the position of the light emitted from the spatial light modulation element on the modulation action surface into an angle on the diffusion element arrangement surface.
  • This is an optical system that converts the emission angle of the light emitted from the spatial light modulation element into a position on the arrangement surface of the diffusion element.
  • the present invention is not limited to this.
  • the illumination optical system that illuminates the illuminated surface with light from the light source is not limited to the configuration of each embodiment, and is disposed in the optical path between the light source and the illuminated surface.
  • a spatial light modulation element having a modulation action surface for setting an emission angle of the emitted light according to an incident position of the incident light, and being disposed between the spatial light modulation element and the irradiated surface,
  • a diffusion element having a plurality of unit regions having a side numerical aperture, and disposed between the diffusion element and the irradiated surface, on the irradiated surface according to an emission angle of an emitted light beam from the diffusion element
  • a condensing optical system that guides the emitted light beam from the diffusing element at a position, and the unit region of the diffusing element transmits an obliquely incident light beam that is incident obliquely with respect to the optical axis of the unit region. It is important to emit at an angle to the optical axis. .
  • the condensing optical system disposed between the diffusing element and the irradiated surface emits light from the spatial light modulation element.
  • the light emitted from the spatial light modulation element is guided to a position on the irradiated surface according to the emission position where the light is emitted, and on the irradiated surface at an angle corresponding to the set emission angle in the emitted light from the emission position. It can be considered that the emitted light from the spatial light modulation element is guided to the position.
  • the pupil intensity distribution measurement unit DTr is used to measure the pupil intensity distribution on the exit pupil plane of the illumination optical system
  • the pupil intensity distribution measurement unit DTw is used to measure the pupil plane (projection optical system).
  • the pupil intensity distribution on the PL exit pupil plane) is measured.
  • the conventional pupil intensity distribution measuring units DTr and DTw described in the above publication are optically connected to a pinhole member having a single pinhole and an exit pupil plane of an illumination optical system or a projection optical system. And an objective lens that forms a conjugate position. As a result, it is impossible to simultaneously measure pupil intensity distributions regarding a plurality of points and to make the apparatus compact.
  • FIG. 26 is a diagram schematically showing a configuration of a pupil distribution measurement unit that simultaneously measures pupil intensity distributions at a plurality of points without using an objective lens.
  • the pupil distribution measurement unit 90 shown in FIG. 26 has a pupil plane of the projection optical system mounted on an immersion type exposure apparatus that performs exposure in a state where the space between the projection optical system and the wafer (photosensitive substrate) is filled with liquid. It is an apparatus for measuring the pupil intensity distribution formed in the.
  • the pupil distribution measurement unit 90 shields or dimmes, for example, a plurality of pinholes 91a two-dimensionally and discretely arranged on a predetermined surface and a region on the predetermined surface other than the formation positions of the plurality of pinholes 91a.
  • a pinhole array member 91 having a light-reducing portion (light-shielding portion) and a parallel flat plate-like glass substrate 92 on which light having passed through the pinhole 91a is incident.
  • Various forms of the arrangement of the plurality of pinholes 91a are possible.
  • the pupil distribution measurement unit 90 includes a fluorescent film 93, an absorption film 94, a fiber optics (FOP) 95, and a photoelectric converter 96 in the order of incidence of light passing through the pinhole 91a and the glass substrate 92.
  • the fluorescent film 93 and the absorption film 94 are sandwiched between the lower surface of the glass substrate 92 and the upper surface of the fiber optics 95.
  • a CCD type or CMOS type two-dimensional imaging device can be used as the photoelectric converter 96, and the light receiving surface thereof is disposed in contact with the lower surface of the fiber optics 95.
  • the fiber optics 95 has a function of forming a distribution having the same property as the light intensity distribution formed on the upper surface on the lower surface.
  • the pinhole array member 91 when measuring the pupil intensity distribution formed on the pupil plane of the projection optical system, the pinhole array member 91 is set to an image plane of the projection optical system or a plane optically conjugate with the image plane. .
  • the plurality of pinholes 91a of the pinhole array member 91 correspond to a plurality of measurement points on the pupil plane of the projection optical system.
  • the light that has passed through the plurality of pinholes 91 a enters the fluorescent film 93 through the glass substrate 92.
  • the fluorescence generated from the fluorescent film 93 excited by the incident light enters the photoelectric converter 96 through the absorption film 94 and the fiber optics 95.
  • the fluorescent film 93 can be regarded as a wavelength conversion unit that converts incident ultraviolet light into visible light.
  • a light intensity distribution corresponding to the pupil intensity distribution formed on the pupil plane of the projection optical system is formed on the upper surface of the fiber optics 95. Then, a distribution having the same property as the light intensity distribution formed on the upper surface of the fiber optics 95 is transmitted to the lower surface of the fiber optics 95 and further transmitted to the light receiving surface of the photoelectric converter 96.
  • the detection result of the photoelectric converter 96 is supplied to the processing unit 97.
  • the processing unit 97 performs image processing on the light intensity distribution detected by the photoelectric converter 96 in consideration of the projection characteristic of ftan ⁇ , thereby simultaneously measuring pupil intensity distributions regarding a plurality of measurement points on the image plane of the projection optical system. .
  • the pupil distribution measurement unit 90 can be regarded as a device that measures the angular distribution of light incident on each of a plurality of discrete measurement points on a predetermined plane.
  • the pupil distribution measurement unit 90 is arranged at a plurality of measurement points on a predetermined plane, and passes through the light incident on the plurality of measurement points, and an area other than the light passage unit on the predetermined plane.
  • a light receiving member disposed on a surface different from the first surface in the traveling direction of the light through the light selecting member.
  • a measurement unit that measures the intensity distribution of light that is two-dimensionally distributed on this surface.
  • the pupil intensity distribution formed on the pupil plane of the projection optical system mounted on a normal dry exposure apparatus that performs exposure with a gas interposed between the projection optical system and the photosensitive substrate is measured.
  • the glass substrate 92 may be replaced with a gas layer (such as an air layer).
  • the pinhole array member 91 is used as an irradiated surface (a mask pattern surface in the case of an exposure apparatus) or an irradiated surface. And an optically conjugate surface.
  • the glass substrate 92 may be replaced with a gas layer (such as an air layer).
  • the pupil distribution measurement unit 90 or the pupil distribution measurement unit obtained by replacing the glass substrate 92 with a gas layer (such as an air layer) shown in FIG. 26 is set to a surface optically conjugate with the irradiated surface in the illumination optical system. In this case, for example, it may be provided so as to be detachable with respect to the optical path closer to the irradiated surface than the mask blind 5 as an illumination field stop.
  • an optical system for forming a conjugate position of the mask blind 5 is disposed in the optical path on the transmission side of the optical path bending mirror MR1 (the optical path on the + Y direction side of the optical path bending mirror MR1), and the pupil distribution measurement unit is disposed at the conjugate position.
  • a pupil distribution measurement unit in which 90 or the glass substrate 92 is replaced with a gas layer (such as an air layer) may be disposed. In this case, the pupil distribution is measured using light partially transmitted through the optical path bending mirror MR1.
  • the optical integrators 4, 14, 24, When the pupil distribution measurement unit 90 or the pupil distribution measurement unit in which the glass substrate 92 shown in FIG. 26 is replaced with a gas layer (air layer or the like) is arranged in the illumination optical system, the optical integrators 4, 14, 24, The pupil intensity distribution may be measured using light (light through the optical integrators 4, 14, 24, 34) that travels along the optical path closer to the irradiated surface than 34. In this case, an amplitude division surface for branching a part of the light via the optical integrators 4, 14, 24, 34 may be provided in the optical path closer to the irradiated surface than the optical integrators 4, 14, 24, 34. .
  • an amplitude division surface for branching a part of the light directed to the optical integrators 4, 14, 24, and 34 is provided in the optical path on the incident side of the optical integrators 4, 14, 24, and 34, and light passing through the amplitude division surfaces is provided.
  • the pupil intensity distribution may be measured with
  • a plurality of pinholes 91a of the pupil distribution measurement unit obtained by replacing the pupil distribution measurement unit 90 or the glass substrate 92 with a gas layer (such as an air layer) are adjacent to the incident side surfaces of the optical integrators 4, 14, 24, and 34.
  • the angular distribution of the light beam incident on the pupil plane with respect to a plurality of points on the pupil plane of the illumination optical system can be measured simultaneously.
  • pinhole array member 91 having a plurality of pinholes 91a as a plurality of light transmission regions arranged two-dimensionally and discretely on a predetermined surface
  • two-dimensionally and discretely on the predetermined surface A plurality of reflective regions arranged and a region on a predetermined surface other than the plurality of reflective regions have a non-reflective region or a low-reflective region (region having a reflectance lower than the reflectance of the plurality of reflective regions at the used wavelength).
  • a pinhole mirror array member may be used.
  • the normal of the predetermined surface is set to be non-parallel to the light traveling direction, and the light that is incident on the pinhole mirror array member and the light that has passed through the plurality of reflection regions of the pinhole mirror array member are optically separated. It may be configured to do so.
  • variable pattern forming apparatus that forms a predetermined pattern based on predetermined electronic data can be used instead of a mask.
  • a spatial light modulation element including a plurality of reflection elements driven based on predetermined electronic data can be used.
  • An exposure apparatus using a spatial light modulator is disclosed, for example, in US Patent Publication No. 2007/0296936.
  • a transmissive spatial light modulator may be used, or a self-luminous image display element may be used.
  • the exposure apparatus of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done.
  • various optical systems are adjusted to achieve optical accuracy
  • various mechanical systems are adjusted to achieve mechanical accuracy
  • various electrical systems are Adjustments are made to achieve electrical accuracy.
  • the assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus.
  • the exposure apparatus may be manufactured in a clean room where the temperature, cleanliness, etc. are controlled.
  • FIG. 27 is a flowchart showing manufacturing steps of a semiconductor device.
  • a metal film is vapor-deposited on a wafer W to be a substrate of the semiconductor device (step S40), and a photoresist, which is a photosensitive material, is applied on the vapor-deposited metal film.
  • Step S42 the pattern formed on the mask (reticle) M is transferred to each shot area on the wafer W (step S44: exposure process), and the wafer W after the transfer is completed.
  • Development that is, development of the photoresist to which the pattern has been transferred (step S46: development process).
  • step S48 processing step.
  • the resist pattern is a photoresist layer in which unevenness having a shape corresponding to the pattern transferred by the projection exposure apparatus of the above-described embodiment is generated, and the recess penetrates the photoresist layer. It is.
  • step S48 the surface of the wafer W is processed through this resist pattern.
  • the processing performed in step S48 includes, for example, at least one of etching of the surface of the wafer W or film formation of a metal film or the like.
  • the projection exposure apparatus of the above-described embodiment performs pattern transfer using the wafer W coated with the photoresist as a photosensitive substrate.
  • the projection exposure apparatus of the above embodiment is used to illuminate the pattern area corresponding to the logic circuit formation area on the mask M and the pattern area corresponding to the storage circuit formation area with different angular distributions ( What is necessary is just to illuminate with an optimal angle distribution.
  • FIG. 28 is a flowchart showing a manufacturing process of a liquid crystal device such as a liquid crystal display element.
  • a pattern formation process step S50
  • a color filter formation process step S52
  • a cell assembly process step S54
  • a module assembly process step S56
  • step S50 a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with a photoresist as the plate P using the projection exposure apparatus of the above-described embodiment.
  • the pattern forming step includes an exposure step of transferring the pattern to the photoresist layer using the projection exposure apparatus of the above-described embodiment, and development of the plate P on which the pattern is transferred, that is, development of the photoresist layer on the glass substrate. And a developing step for generating a photoresist layer having a shape corresponding to the pattern, and a processing step for processing the surface of the glass substrate through the developed photoresist layer.
  • a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix or three R, G, and B
  • a color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning direction.
  • a liquid crystal panel liquid crystal cell
  • a liquid crystal panel is assembled using the glass substrate on which the predetermined pattern is formed in step S50 and the color filter formed in step S52.
  • a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter.
  • various components such as an electric circuit and a backlight for performing the display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.
  • the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor device, for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display, It can also be widely applied to an exposure apparatus for manufacturing various devices such as an image sensor (CCD, etc.), micromachine, thin film magnetic head, and DNA chip. Furthermore, the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.
  • an exposure apparatus for manufacturing a semiconductor device for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display
  • various devices such as an image sensor (CCD, etc.), micromachine, thin film magnetic head, and DNA chip.
  • the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various
  • ArF excimer laser light (wavelength: 193 nm) or KrF excimer laser light (wavelength: 248 nm) is used as the exposure light.
  • the present invention is not limited to this, and other appropriate laser light sources are used.
  • the present invention can also be applied to an F 2 laser light source that supplies laser light having a wavelength of 157 nm.
  • a so-called immersion method is applied in which the optical path between the projection optical system and the photosensitive substrate is filled with a medium (typically liquid) having a refractive index larger than 1.1. You may do it.
  • a technique for filling the liquid in the optical path between the projection optical system and the photosensitive substrate a technique for locally filling the liquid as disclosed in International Publication No. WO99 / 49504, a special technique, A method of moving a stage holding a substrate to be exposed as disclosed in Kaihei 6-124873 in a liquid tank, or a predetermined stage on a stage as disclosed in Japanese Patent Laid-Open No. 10-303114. A method of forming a liquid tank having a depth and holding the substrate therein can be employed.
  • the teachings of WO99 / 49504, JP-A-6-124873 and JP-A-10-303114 are incorporated by reference.
  • the present invention is applied to a step-and-scan type exposure apparatus that scans and exposes the pattern of the mask M on the shot area of the wafer W.
  • the present invention is not limited to this, and the present invention can also be applied to a step-and-repeat type exposure apparatus that repeats the operation of collectively exposing the pattern of the mask M to each exposure region of the wafer W.
  • the present invention is applied to the illumination optical system that illuminates the mask (or wafer) in the exposure apparatus.
  • the present invention is not limited to this, and an object other than the mask (or wafer) is used.
  • the present invention can also be applied to a general illumination optical system that illuminates the irradiation surface.
  • a spatial light modulation element that is disposed in an optical path between the light source and the irradiated surface and has a modulation action surface that sets an emission angle of emission light according to an incident position of incident light;
  • a diffusing element having a plurality of unit regions disposed between the spatial light modulation element and the irradiated surface and having a predetermined exit-side numerical aperture;
  • a condensing optical system that is disposed between the diffusing element and the irradiated surface and guides the emitted light beam from the diffusing element to a position on the irradiated surface according to an emission angle of the emitted light beam from the diffusing element.
  • the illumination optical system includes a projection optical system and can be combined with an exposure apparatus that exposes the substrate while moving the substrate in the scanning direction with respect to the projection optical system, and the illumination optical system is disposed on the object surface of the projection optical system.
  • the unit area of the diffusing element causes the oblique incident light beam incident obliquely with respect to the optical axis of the unit area to have a constant angle regardless of the incident angle of the oblique incident light beam.
  • the oblique incident light beam that is obliquely incident on the optical axis of the unit region is an angle corresponding to the incident angle of the oblique incident light beam.
  • the diffusing element includes a cylindrical lens array configured by arranging a plurality of cylindrical refracting surfaces having power in a direction corresponding to the non-scanning direction in a direction corresponding to the non-scanning direction, and corresponds to the scanning direction.
  • the illumination optical system according to clause 2 further comprising a cylindrical fly's eye lens configured by arranging a plurality of cylindrical refractive surfaces having power in a direction in a direction corresponding to the scanning direction. 4).
  • the illumination optical system Disposed between the spatial light modulation element and the diffusion element to convert the position of the emitted light from the spatial light modulation element on the modulation action surface into an angle on the arrangement surface of the diffusion element;
  • the illumination optical system according to any one of clauses 1 to 3, further comprising a conversion optical system that converts an emission angle of the emission light from the spatial light modulation element into a position on the arrangement surface. system. 5.
  • the combined optical system of the conversion optical system and the condensing optical system is configured such that a conjugate plane optically conjugate with the modulation action surface of the spatial light modulator is a first space including the irradiated surface or the irradiated light 5.
  • the composite optical system of the conversion optical system and the condensing optical system forms a conjugate surface optically conjugate with the modulation action surface at the irradiated surface or a position optically conjugate with the irradiated surface.
  • the light incident on the first point in the illumination area formed on the irradiated surface forms the pupil intensity distribution related to the first point via the first area on the modulation acting surface, and then the first point.
  • the light that reaches the second point in the illumination region passes through the second region of the modulation action surface and forms a pupil intensity distribution related to the second point, and then reaches the second point.
  • the diffusing element has a lens array configured by two-dimensionally arranging a plurality of refractive surfaces having power in two directions orthogonal to each other.
  • the illumination area formed on the irradiated surface has a rectangular shape having a long side along the first direction and a short side along the second direction
  • the diffusing element includes a cylindrical lens array configured by arranging a plurality of cylindrical refracting surfaces having power in the first direction in the first direction, and a plurality of cylindrical refracting surfaces having power in the second direction.
  • the illumination optical system according to any one of clauses 1 to 8, further comprising a cylindrical fly-eye lens configured by being arranged in the second direction. 11.
  • the diffusing element has a parallel plane plate-like first optical member and a parallel plane plate-like second optical member arranged along the optical axis of the illumination optical system, A plurality of cylindrical refracting surfaces constituting the cylindrical fly-eye lens are formed on one surface of the first optical member and one surface of the second optical member, 11.
  • the diffusing element has a parallel plane plate-like first optical member and a parallel plane plate-like second optical member arranged along the optical axis of the illumination optical system, A plurality of cylindrical refracting surfaces constituting the cylindrical fly-eye lens are formed on one surface of the first optical member and the other surface of the first optical member, 11.
  • the illumination optical system according to clause 10 wherein the plurality of cylindrical refracting surfaces constituting the cylindrical lens array are formed on one surface of the second optical member or the other surface of the second optical member. system.
  • the spatial light modulation element sets the emission angle of the emitted light independently for each position of the modulation acting surface.
  • the spatial light modulation element has a plurality of optical elements arranged on the modulation action surface and individually controlled, and a control unit for individually controlling the plurality of optical elements, and the pupil intensity distribution is variable.
  • the spatial light modulator includes a plurality of mirror elements arranged two-dimensionally within the predetermined plane, and the control unit individually controls the postures of the plurality of mirror elements.
  • the illumination optical system described in 1. 16 The light incident on the first point in the illumination area formed on the illuminated surface forms a pupil intensity distribution related to the first point through the first group of optical elements of the plurality of optical elements.
  • the light that reaches the first point later and is incident on the second point in the illumination area passes through the second group of optical elements of the plurality of optical elements, and the pupil relating to the second point.
  • the control unit is configured such that the light passing through the optical elements belonging to each of the plurality of first partial groups obtained by virtually dividing the first group of optical elements forms the same light intensity distribution on the illumination pupil.
  • Light incident on the first point and having passed through the optical elements belonging to each of the plurality of second partial groups obtained by virtually dividing the second group of optical elements forms the same light intensity distribution on the illumination pupil.
  • the spatial light modulation element includes a diffractive optical element that fixedly forms the pupil intensity distribution. 18.
  • the light incident on the first point in the illumination area formed on the irradiated surface passes through the first area of the diffractive optical surface of the diffractive optical element and then forms a pupil intensity distribution related to the first point.
  • the light that reaches the first point and is incident on the second point in the illumination area passes through the second area of the diffractive optical surface and forms a pupil intensity distribution related to the second point.
  • the light that reaches point 2 The diffractive optical surface is incident on the first point after the light passing through each of the plurality of first partial regions obtained by virtually dividing the first region forms the same light intensity distribution on the illumination pupil.
  • the light passing through each of the plurality of second partial regions obtained by virtually dividing the second region is formed so as to be incident on the second point after forming the same light intensity distribution on the illumination pupil.
  • the light from the modulation surface of the spatial light modulation element incident on the diffusion element is incident on the diffusion element at an incident angle smaller than an angle corresponding to the exit-side numerical aperture of the diffusion element.
  • the diffusion element includes an optical integrator having a plurality of unit wavefront division regions having the predetermined exit numerical aperture.
  • the condensing optical system has a conjugate surface optically conjugate with the incident surface of the optical integrator, in combination with the optical integrator, in the first space including the position of the irradiated surface or optically connected to the irradiated surface. Formed in a second space including a position conjugate to Light that has passed through the first modulation region of the modulation acting surface of the spatial light modulation element is incident on the optical integrator at an incident angle equal to or smaller than the angle corresponding to the predetermined exit-side numerical aperture, and is formed on the conjugate surface.
  • the light that forms the first illumination region within the illumination region and has passed through the second modulation region adjacent to the first modulation region on the modulation acting surface has an incident angle larger than the angle corresponding to the predetermined exit side numerical aperture.
  • the illumination optical system according to any one of clauses 1 to 18, wherein the illumination optical system is incident on the optical integrator to form a second illumination region adjacent to the first illumination region in the illumination region.
  • the illumination area has a rectangular shape having a long side along the first direction and a short side along the second direction;
  • the light that has passed through the first modulation region enters the optical integrator at an incident angle that is equal to or smaller than the angle corresponding to the predetermined exit-side numerical aperture with respect to the first direction to form the first illumination region, and
  • the light that has passed through the second modulation region adjacent to the modulation region in the first direction is incident on the optical integrator at an incident angle that is larger than the angle corresponding to the predetermined exit-side numerical aperture with respect to the first direction, 21.
  • a spatial light modulation element that is arranged in an optical path between the light source and the surface to be illuminated and spatially modulates incident light to form a pupil intensity distribution in an illumination pupil of the illumination optical system;
  • An optical integrator disposed in an optical path between the spatial light modulation element and the irradiated surface and having a plurality of unit wavefront division regions having a predetermined exit-side numerical aperture;
  • a first relay optical system that optically arranges the spatial light modulator and the incident surface of the optical integrator in a Fourier transform relationship;
  • a second relay optical system formed in two spaces, Light that has passed through the first modulation region of the modulation acting surface of the spatial light modulation element is incident on the optical integrator at an incident angle equal to or smaller than the angle corresponding to the predetermined exit-side numerical aperture, and is formed on the conjugate surface. The light that forms the first illumination region within the illumination region and has passed through the second modulation region adjacent to the first modulation region on the modulation acting surface has an incident angle larger than the angle corresponding to the predetermined exit side numerical aperture.
  • An illumination optical system wherein the illumination optical system forms a second illumination area that is incident on the optical integrator and is adjacent to the first illumination area in the illumination area.
  • the illumination area has a rectangular shape having a long side along the first direction and a short side along the second direction;
  • the light that has passed through the first modulation region enters the optical integrator at an incident angle that is equal to or smaller than the angle corresponding to the predetermined exit-side numerical aperture with respect to the first direction to form the first illumination region, and
  • the light that has passed through the second modulation region adjacent to the modulation region in the first direction is incident on the optical integrator at an incident angle that is larger than the angle corresponding to the predetermined exit-side numerical aperture with respect to the first direction, 23.
  • the illumination optical system according to clause 22, wherein the second illumination area adjacent to the first illumination area in the first direction is formed. 24.
  • the spatial light modulation element has a plurality of optical elements arranged on a predetermined surface and individually controlled, and a control unit that individually controls the plurality of optical elements, and variably forms the pupil intensity distribution 24.
  • the spatial light modulator includes a plurality of mirror elements arranged two-dimensionally within the predetermined plane, and the control unit individually controls the postures of the plurality of mirror elements.
  • Light that reaches an arbitrary point in the second illumination area forms a pupil intensity distribution related to the arbitrary point through the second group of optical elements adjacent to the first group in the plurality of optical elements.
  • Light incident on the arbitrary point after The control unit is configured such that the light passing through the optical elements belonging to each of the plurality of first partial groups obtained by virtually dividing the first group of optical elements forms the same light intensity distribution on the illumination pupil.
  • Light incident on an arbitrary point and having passed through optical elements belonging to each group of a plurality of second partial groups obtained by virtually dividing the second group of optical elements forms the same light intensity distribution in the illumination pupil.
  • the light reaching an arbitrary point in the first illumination region is light that enters the arbitrary point after forming a pupil intensity distribution related to the arbitrary point through the first region of the diffractive optical surface of the diffractive optical element.
  • the light reaching an arbitrary point in the second illumination area forms the pupil intensity distribution related to the arbitrary point through the second area adjacent to the first area on the diffractive optical surface, and then the arbitrary point. Is incident on the The diffractive optical surface is formed in the first illumination area after the light passing through each of the plurality of first partial areas obtained by virtually dividing the first area forms the same light intensity distribution in the illumination pupil.
  • the second illumination area after the light incident on the arbitrary point and passing through each of the plurality of second partial areas obtained by virtually dividing the second area forms the same light intensity distribution on the illumination pupil.
  • a spatial light modulation element that is arranged in an optical path between the light source and the surface to be illuminated and spatially modulates incident light to form a pupil intensity distribution in an illumination pupil of the illumination optical system;
  • a conjugate plane that is disposed in an optical path between the spatial light modulation element and the irradiated surface and is optically conjugate with the modulation action surface of the spatial light modulation element is the position of the irradiated surface or the irradiated surface.
  • a relay optical system formed at a position optically conjugate with the surface;
  • a diffusion element disposed in the pupil space of the relay optical system and having a plurality of unit regions having a predetermined exit-side numerical aperture;
  • the modulation action surface of the spatial light modulation element sets the emission angle of the emitted light according to the position on the modulation action surface,
  • Clause 1 is used in combination with a projection optical system that forms a surface optically conjugate with the irradiated surface, and the illumination pupil is at a position optically conjugate with the aperture stop of the projection optical system.
  • the illumination optical system according to any one of items 29 to 29. 31.
  • An exposure apparatus comprising the illumination optical system according to any one of clauses 1 to 30 for illuminating a predetermined pattern, and exposing the predetermined pattern onto a substrate.
  • the exposure according to clause 31 further comprising a projection optical system that forms an image of the predetermined pattern on the substrate, wherein the illumination pupil is at a position optically conjugate with an aperture stop of the projection optical system. apparatus. 33.
  • the illumination optical system includes an optical integrator having a plurality of unit wavefront division surfaces that are elongated in the first direction and have a rectangular shape,
  • the predetermined pattern and the substrate are moved relative to the projection optical system along a scanning direction corresponding to a second direction orthogonal to the first direction, and the predetermined pattern is projected and exposed to the substrate.
  • 33. The exposure apparatus according to clause 31 or 32, wherein 34. Exposing the predetermined pattern onto a photosensitive substrate using the exposure apparatus according to any one of clauses 31 to 33; Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate; Processing the surface of the photosensitive substrate through the mask layer.
  • a device manufacturing method comprising: 35.
  • the apparatus for measuring the angular distribution of light respectively incident on a plurality of discrete measurement points on the first surface Arranged at the plurality of measurement points on the first surface and passing through the light incident on the plurality of measurement points, respectively, and at a region other than the light passage unit on the first surface.
  • a light selection member comprising a dimming unit for dimming light through the region, Measurement that includes a light receiving surface disposed on a second surface different from the first surface in the traveling direction of light through the light selection member, and measures an intensity distribution of light that is two-dimensionally distributed on the second surface
  • the apparatus provided with a part.
  • the apparatus further includes a processing unit that obtains the angular distribution of the light from the intensity distribution of the light measured by the measuring unit. 37.
  • the processing unit obtains the angular distribution of the light in consideration of the projection characteristics of the light passage unit.
  • the projection characteristic is a projection characteristic of ftan ⁇ . 39.
  • a wavelength conversion unit is provided between the light passage unit and the light receiving surface and converts incident light into visible light. 40.
  • No gas is interposed between the light passage part and the light receiving surface.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

La présente invention porte sur un système optique d'éclairage dans lequel la distribution d'intensité de pupille à chaque point sur une surface irradiée peut être ajustée à la distribution requise. Le système optique d'éclairage, qui éclaire la surface irradiée en utilisant une lumière provenant d'une source de lumière, comporte : un élément de modulation de lumière spatiale ayant une surface d'action de modulation pour régler l'angle d'émission d'une lumière d'émission selon la position d'incidence d'une lumière incidente, l'élément de modulation de lumière spatiale étant disposé sur le chemin de lumière entre la source de lumière et la surface irradiée ; et un système optique de collecte de lumière pour guider la lumière d'émission depuis l'élément de modulation de lumière spatiale vers une position sur la surface irradiée correspondant à la position d'émission à laquelle la lumière d'émission de l'élément de modulation de lumière spatiale est émise, et guider la lumière d'émission depuis l'élément de modulation de lumière spatiale vers la position susmentionnée sur la surface irradiée à un angle correspondant à l'angle d'émission réglé de la lumière d'émission provenant de la position d'émission de l'élément de modulation de lumière spatiale, le système optique de collecte de lumière étant disposé entre l'élément de modulation de lumière spatiale et la surface irradiée. Une région d'unité d'un élément de diffusion émet, de manière diagonale par rapport à l'axe optique de la région d'unité, un faisceau de lumière diagonalement incident, qui est diagonalement incident par rapport à l'axe optique de la région d'unité.
PCT/JP2013/068635 2012-07-10 2013-07-08 Système optique d'éclairage, dispositif d'exposition, et procédé de fabrication de dispositif WO2014010552A1 (fr)

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US61/669948 2012-07-10
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JP2002217083A (ja) * 2001-01-12 2002-08-02 Canon Inc 照明装置及び露光装置
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JP2009205952A (ja) * 2008-02-28 2009-09-10 Komatsu Ltd 極端紫外光源装置
JP2010048802A (ja) * 2008-07-22 2010-03-04 Canon Inc 光リソグラフィシステムにより生成された像プロファイルを測定する装置、方法及びシステム
JP2010153413A (ja) * 2008-12-24 2010-07-08 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP2010153663A (ja) * 2008-12-25 2010-07-08 Nikon Corp 照明光学系、露光装置及びデバイスの製造方法
JP2011103465A (ja) * 2009-11-10 2011-05-26 Nikon Corp 照明光学装置、露光装置、及び制御方法
WO2011157601A2 (fr) * 2010-06-15 2011-12-22 Carl Zeiss Smt Gmbh Système d'éclairage optique pour la microlithographie et système d'exposition par projection ayant un système d'éclairage optique de ce type
JP2012004558A (ja) * 2010-06-17 2012-01-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217083A (ja) * 2001-01-12 2002-08-02 Canon Inc 照明装置及び露光装置
WO2009060744A1 (fr) * 2007-11-06 2009-05-14 Nikon Corporation Dispositif optique d'éclairage et dispositif d'exposition
JP2009205952A (ja) * 2008-02-28 2009-09-10 Komatsu Ltd 極端紫外光源装置
JP2010048802A (ja) * 2008-07-22 2010-03-04 Canon Inc 光リソグラフィシステムにより生成された像プロファイルを測定する装置、方法及びシステム
JP2010153413A (ja) * 2008-12-24 2010-07-08 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP2010153663A (ja) * 2008-12-25 2010-07-08 Nikon Corp 照明光学系、露光装置及びデバイスの製造方法
JP2011103465A (ja) * 2009-11-10 2011-05-26 Nikon Corp 照明光学装置、露光装置、及び制御方法
WO2011157601A2 (fr) * 2010-06-15 2011-12-22 Carl Zeiss Smt Gmbh Système d'éclairage optique pour la microlithographie et système d'exposition par projection ayant un système d'éclairage optique de ce type
JP2012004558A (ja) * 2010-06-17 2012-01-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

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