WO2013154203A1 - Circuit connection material, connection structure, and fabrication method for same - Google Patents

Circuit connection material, connection structure, and fabrication method for same Download PDF

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Publication number
WO2013154203A1
WO2013154203A1 PCT/JP2013/061216 JP2013061216W WO2013154203A1 WO 2013154203 A1 WO2013154203 A1 WO 2013154203A1 JP 2013061216 W JP2013061216 W JP 2013061216W WO 2013154203 A1 WO2013154203 A1 WO 2013154203A1
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WO
WIPO (PCT)
Prior art keywords
circuit
connection
substrate
electrode
circuit member
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PCT/JP2013/061216
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French (fr)
Japanese (ja)
Inventor
孝 中澤
竹村 賢三
Original Assignee
日立化成株式会社
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Publication date
Application filed by 日立化成株式会社 filed Critical 日立化成株式会社
Priority to KR1020147024584A priority Critical patent/KR102044574B1/en
Priority to CN201380008376.0A priority patent/CN104093799B/en
Priority to JP2014510223A priority patent/JP6107816B2/en
Publication of WO2013154203A1 publication Critical patent/WO2013154203A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37Thiols
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0221Insulating particles having an electrically conductive coating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/361Assembling flexible printed circuits with other printed circuits

Definitions

  • the present invention relates to a circuit connection material that is interposed between circuit electrodes facing each other, pressurizes the circuit electrodes facing each other, and electrically connects the electrodes in the pressing direction, and a connection structure using the circuit connection material And a manufacturing method thereof.
  • thermosetting resin using an epoxy resin having high adhesiveness and high reliability As a circuit connection material for a semiconductor element or a liquid crystal display element, a thermosetting resin using an epoxy resin having high adhesiveness and high reliability is known (for example, see Patent Document 1).
  • a curing agent such as an epoxy resin, a phenol resin having reactivity with the epoxy resin, and a latent curing agent that accelerates the reaction between the epoxy resin and the curing agent are generally used.
  • the latent curing agent is an important factor for determining the curing temperature and the curing rate, and various compounds are used from the viewpoint of storage stability at room temperature and curing rate during heating.
  • (meth) acrylate derivative a radical curable adhesive using an acrylate derivative and / or a methacrylate derivative (hereinafter collectively referred to as “(meth) acrylate derivative”) and a peroxide as a radical polymerization initiator has attracted attention.
  • Radical curing can be cured in a short time because radicals that are reactive species are rich in reactivity (see, for example, Patent Documents 2 and 3).
  • circuit connection materials have been studied as alternative members of connectors from the viewpoint that the modules can be thinned. Since the connection pitch of circuit members in such a small module is coarser than the connection pitch (for example, 0.4 mm or less) of circuit members to which circuit connection materials have been conventionally applied, circuit connection materials have characteristics different from conventional ones. Required.
  • a circuit connection material used as an alternative member for a connector is required to have a higher adhesive force because the length of the connection portion is shorter than that of conventional fields (for semiconductor element use, liquid crystal display element use, etc.).
  • an adhesive force of 6 N / cm or more is usually required, but an adhesive force of 12 N / cm or more is required as an alternative member for a connector. There is a case.
  • connection with rough pitch for example, connection pitch of 0.5 mm or more
  • connection pitch for example, connection pitch of 0.5 mm or more
  • the adhesive force tends to decrease even when the same circuit connection material is used as compared with the connection with fine pitch. This is presumably because the adhesive force in the shearing direction generated at the interface between the electrode wall and the circuit connecting material decreases as the number of electrodes per unit length decreases.
  • the present invention provides a circuit connection material that can obtain a sufficiently high adhesive force even in rough pitch connection and has excellent connection reliability, a connection structure using the circuit connection material, and a method of manufacturing the same. Objective.
  • the present inventors have expressed a specific chain transfer agent in a specific amount, thereby exhibiting high adhesive force even in rough pitch connection, and good connection reliability.
  • the present inventors have found that the circuit connection material shown can be obtained and have completed the present invention.
  • the present invention provides a first circuit member in which a first circuit electrode is formed on a main surface of a first substrate, and a second circuit member in which a second circuit electrode is formed on a main surface of a second substrate.
  • a circuit connection material for connecting the first circuit electrode and the second circuit electrode in a state of facing each other comprising a radical polymerization initiator, a radical polymerizable substance, and a thiol And a thiol compound in which the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0, and the content of the thiol compound is 100 parts by mass of the radical polymerizable substance
  • a circuit connecting material having 7 to 17 parts by mass is provided.
  • Such a circuit connecting material can provide a sufficiently high adhesive force even in rough pitch connection. Further, a circuit connection material used as an alternative member of a connector is required to have a good connection reliability for a connection structure connected using the circuit connection material. According to the circuit connection material according to the present invention, a sufficiently high adhesive force in a rough pitch connection and good connection reliability can be achieved at the same time. Furthermore, according to the circuit connecting material according to the present invention, since the thiol compound functions as a chain transfer agent, the curing speed is high, the low temperature and short time connection can be realized, and the adhesion to an inorganic material such as a metal is improved. It is possible to effectively obtain an effect such as.
  • the thiol compound preferably has a molecular weight of 400 or more.
  • Such a circuit connection material has a higher adhesive force in connection with rough pitch, and more excellent connection reliability.
  • the first circuit member (or the second circuit member) is 0.5 mm or more on the main surface of the first substrate (or the second substrate). It is preferable to have a region where the first circuit electrode (or the second substrate) is formed at a connection pitch. Since the circuit connection material of the present invention can obtain a sufficiently high adhesive force even in rough pitch connection, it can be suitably used for the connection of circuit members as described above.
  • the present invention also includes a first circuit member having a first circuit electrode formed on the main surface of the first substrate, and a second circuit electrode formed on the main surface of the second substrate.
  • a second circuit member disposed so that the second circuit electrode and the first circuit electrode face each other; and provided between the first circuit member and the second circuit member,
  • An adhesive layer that electrically connects the one circuit member and the second circuit member, and the adhesive layer connects the circuit connection material between the first circuit member and the second circuit member.
  • a connection structure formed by being interposed and heated and pressed.
  • connection structure uses the circuit connection material according to the present invention, the first circuit member and the second circuit member are bonded with high adhesive force. Further, the first circuit member and the second circuit member are connected with good connection reliability. Therefore, the connection structure according to the present invention is excellent in durability, heat resistance, and moisture resistance.
  • the present invention further includes a first circuit member having a first circuit electrode formed on a main surface of a first substrate, and a second circuit member having a second circuit electrode formed on a main surface of a second substrate.
  • the circuit member and the circuit connection material are heated and pressurized in a state where the first circuit electrode and the second circuit electrode are arranged to face each other with the circuit connection material interposed therebetween.
  • a method for manufacturing a connection structure is provided, which includes a step of electrically connecting the first circuit electrode and the second circuit electrode. According to such a manufacturing method, the connection structure according to the present invention can be easily obtained.
  • a sufficiently high adhesive force can be obtained even in rough pitch connection, and a circuit connection material excellent in connection reliability, a connection structure using the circuit connection material, and a method of manufacturing the same are provided. .
  • FIG. 1 is a schematic cross-sectional view showing an embodiment of a connection structure according to the present invention.
  • the circuit connection material includes a radical polymerization initiator, a radical polymerizable substance, a thiol having a thiol group, and the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0. And a compound.
  • the content of the thiol compound is 7 to 17 parts by mass with respect to 100 parts by mass of the radical polymerizable substance.
  • the circuit connection material according to the present embodiment includes a first circuit member in which a first circuit electrode is formed on the main surface of the first substrate, and a second circuit electrode on the main surface of the second substrate. It can be suitably used as a circuit connection material for connecting the formed second circuit member in a state where the first circuit electrode and the second circuit electrode are arranged to face each other.
  • the circuit connection material according to the present embodiment can obtain a sufficiently high adhesive force in rough pitch connection. Moreover, according to the circuit connection material which concerns on this embodiment, even when it uses for the connection of rough pitch, the connection structure which has favorable connection reliability is obtained. Therefore, the circuit connection material according to the present embodiment can be particularly suitably used for connection of circuit members having a rough pitch (connection pitch of 0.5 mm or more).
  • the radical polymerization initiator is a compound that generates free radicals, and can also be called a free radical generator.
  • a compound that decomposes by heating such as a peroxide compound or an azo compound, to generate a free radical is suitable.
  • the radical polymerization initiator is appropriately selected depending on the intended connection temperature, connection time, and the like.
  • the content of the radical polymerization initiator in the circuit connecting material is preferably 0.05 to 10% by mass, and more preferably 0.1 to 5% by mass.
  • radical polymerization initiator examples include diacyl peroxides, peroxydicarbonates, peroxyesters, peroxyketals, dialkyl peroxides, hydroperoxides and the like.
  • Diacyl peroxides include 2,4-dichlorobenzoyl peroxide, 3,5,5-trimethylhexanoyl peroxide, octanoyl peroxide, lauroyl peroxide, stearoyl peroxide, succinic peroxide, benzoyl peroxide And benzoyl peroxide.
  • Peroxydicarbonates include di-n-propyl peroxydicarbonate, diisopropyl peroxydicarbonate, bis (4-tert-butylcyclohexyl) peroxydicarbonate, di-2-ethoxymethoxyperoxydicarbonate, di- (2-Ethylhexylperoxy) dicarbonate, dimethoxybutylperoxydicarbonate, di (3-methyl-3-methoxybutylperoxy) dicarbonate and the like.
  • Peroxyesters include 1,1,3,3-tetramethylbutylperoxyneodecanoate, 1-cyclohexyl-1-methylethylperoxynoedecanoate, t-hexylperoxyneodecanoate, t-butyl peroxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanate, 2,5-dimethyl-2,5-di (2-ethylhexanoylperoxy) hexane 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanate, t-hexylperoxy-2-ethylhexanoate, t-butylperoxy-2-ethylhexanoate, t-butylperoxy Isobutyrate, 1,1-bis (t-butylperoxy) cyclohexane, t-hexylperoxyisopropy
  • Peroxyketals include 1,1-bis (t-hexylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (t-hexylperoxy) cyclohexane, 1,1-bis (t -Butylperoxy) -3,3,5-trimethylcyclohexane, 1,1- (t-butylperoxy) cyclododecane, 2,2-bis (t-butylperoxy) decane and the like.
  • Dialkyl peroxides include ⁇ , ⁇ '-bis (t-butylperoxy) diisopropylbenzene, dicumyl peroxide, 2,5-dimethyl-2,5-di (t-butylperoxy) hexane, t- Examples thereof include butyl cumyl peroxide.
  • hydroperoxides examples include diisopropylbenzene hydroperoxide and cumene hydroperoxide.
  • radical polymerization initiators can be used alone or in combination, and may be used in combination with a decomposition accelerator, an inhibitor and the like.
  • those obtained by coating these radical polymerization initiators with a polyurethane-based or polyester-based polymer substance and making them into microcapsules are preferable because the storage stability is extended.
  • the radical polymerizable substance is a compound having a radical polymerizable functional group.
  • a vinyl group, an acryloyl group, a methacryloyl group, or the like is preferable. Of these, compounds having an acryloyl group and / or a methacryloyl group are more preferred.
  • a compound described later can be used in either a monomer or oligomer state, and the monomer and oligomer can be used in combination.
  • radical polymerizable substance examples include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, 2-hydroxy-1,3-di ( (Meth) acryloxypropane, 2,2-bis [4-((meth) acryloxymethoxy) phenyl] propane, 2,2-bis [4-((meth) acryloxypolyethoxy) phenyl] propane, dicyclopentenyl (Meth) acrylate, tricyclodecanyl (meth) acrylate, tris ((meth) acryloyloxyethyl) isocyanurate, urethane (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, isocyanuric acid EO (ethylene oxy) De) modified diacrylate, 2-methacryloyl
  • the radical polymerizable substance preferably has at least one partial structure selected from the group consisting of a dicyclopentane skeleton, a tricyclodecane skeleton, and a triazine ring.
  • the radical polymerizable substance includes polystyrene, polyethylene, polyvinyl butyral, polyvinyl formal, polyimide, polyamide, polyester, polyvinyl chloride, polyphenylene oxide, urea resin, melamine resin, phenol resin, xylene resin, epoxy resin, polyisocyanate resin.
  • a polymer such as phenoxy resin can also be used.
  • the polymer used as the radical polymerizable substance has at least one radical polymerizable functional group in the molecule.
  • a polymer as a radical polymerizable substance because it is easy to handle and excellent in stress relaxation during curing, and is more preferable when the polymer has a functional group such as a hydroxyl group because adhesion is improved. What modified each polymer with the radically polymerizable functional group is more preferable.
  • the weight average molecular weight of these polymers is preferably 1.0 ⁇ 10 4 or more, and more preferably 1.0 ⁇ 10 4 or more and 1.0 ⁇ 10 6 or less from the viewpoint of mixing properties.
  • the weight average molecular weight defined in the present application refers to a value measured using a standard polystyrene calibration curve by gel permeation chromatography (GPC) according to the following conditions.
  • the thiol compound is a compound having a thiol group and having 0 or 1 hydrogen atoms bonded to the carbon atom to which the thiol group is bonded.
  • thiol compounds include aromatic thiols and secondary thiol compounds.
  • An aromatic thiol is a compound having a thiol group bonded to an aromatic ring, and examples of the aromatic thiol include allylbenzene thiol sulfonate, benzene thiol, o-ethoxybenzene thiol, p-ethoxybenzene thiol, 2-benzimidazole thiol, o-Mercaptobenzoic acid, o-mercaptobenzoic acid methyl ester, 2-benzothiazolethiol, mercaptobenzoxazole, naphthalenethiol, toluenethiol, thiobisbenzenethiol, p-methoxy-toluenethiol and the like.
  • the secondary thiol compound is a compound having a secondary thiol group.
  • Examples of the secondary thiol compound include secondary butanethiol, 2,3-butanedithiol, hexa-5-ene-3-thiol, and secondary dodecane.
  • Secondary thiol compounds have higher reactivity as chain transfer agents than alcohols, and are practically superior.
  • the content of the thiol compound in the circuit connecting material is preferably 7 to 17 parts by mass and more preferably 9 to 12 parts by mass with respect to 100 parts by mass of the radical polymerizable substance. If the content of the radical polymerizable substance is small, it is difficult to obtain the effect of high adhesive strength in rough pitch connection, and if the content of the radical polymerizable substance is large, the crosslinking density is lowered, and the resistance of the circuit connecting material is reliable. It tends to get worse.
  • the molecular weight of the thiol compound is preferably 90 or more, more preferably 150 or more, and further preferably 400 or more.
  • the molecular weight of the thiol compound is preferably 5000 or less, more preferably 2000 or less, and further preferably 1000 or less.
  • the molecular weight is less than 90, the boiling point of the compound reaches the boiling point due to heating at the time of connection, and the compound tends to evaporate, so that a sufficient amount of thiol compound cannot contribute to the reaction.
  • the molecular weight is larger than 5000, the resin exclusion property tends to deteriorate and the connection resistance tends to increase.
  • the molecular weight of the thiol compound is 400 or more.
  • the molecular weight is less than 400, when blending materials or handling products, the odor is strong and the workability and handling tend to decrease.
  • the molecular weight is 400 or more, the odor is suppressed and there is no problem in workability and handling.
  • the thiol equivalent of the thiol compound is preferably 50 or more and 500 or less, and more preferably 120 or more and 400 or less.
  • the thiol equivalent is less than 50, the crosslinking density is lowered, and the resistance reliability in the circuit connecting material tends to be lowered.
  • the thiol equivalent is 500 or less, the adhesive force tends to be further improved.
  • the circuit connection material according to the present embodiment may be composed only of a radical polymerization initiator, a radical polymerizable substance, and a thiol compound, but may further contain the following components as necessary. .
  • the circuit connection material according to the present embodiment can further contain a compound having one or more aminoxyl structures in the molecule.
  • the circuit connecting material contains a compound having an aminoxyl structure, the storage stability of the circuit connecting material can be further improved.
  • the circuit connection material according to the present embodiment can further contain a thermoplastic resin.
  • a thermoplastic resin polyvinyl butyral resin, polyvinyl formal resin, polyamide resin, polyester resin, phenol resin, epoxy resin, phenoxy resin, polystyrene resin, xylene resin, polyurethane resin, polyester urethane resin and the like can be used.
  • the weight average molecular weight of these thermoplastic resins is preferably from the viewpoint of film formability is 1.0 ⁇ 10 4 or more, mixing the viewpoint from 1.0 ⁇ 10 4 or more 1.0 ⁇ 10 than 6 More preferably.
  • the weight average molecular weight of the thermoplastic resin is measured in the same manner as the polymerization average molecular weight of the polymer that can be contained in the radical polymerizable substance.
  • thermoplastic resin a hydroxyl group-containing resin (for example, phenoxy resin) having a Tg (glass transition temperature) of 40 ° C. or higher and a weight average molecular weight of 1.0 ⁇ 10 4 or higher can be preferably used.
  • the hydroxyl group-containing resin may be modified with an epoxy group-containing elastomer or a radical polymerizable functional group. Those modified with a radically polymerizable functional group are preferred because the heat resistance is improved.
  • the phenoxy resin can be obtained by reacting a bifunctional phenol and epihalohydrin to a high molecular weight or by polyaddition reaction of a bifunctional epoxy resin and a bifunctional phenol.
  • thermoplastic resin It is also preferable to use a polyester urethane resin as the thermoplastic resin.
  • a polyester urethane resin By containing a polyester urethane resin, the adhesive force in rough pitch connection tends to be further improved.
  • circuit connection material includes fillers, softeners, accelerators, anti-aging agents, colorants, flame retardants, thixotropic agents, coupling agents, phenol resins, melamine resins, isocyanates, and the like. Can also be contained.
  • a compound having at least one of a vinyl group, an acrylic group, an amino group, an epoxy group, or an isocyanate group is preferable from the viewpoint of improving adhesiveness.
  • a filler since an improvement in connection reliability and the like can be obtained.
  • the filler those having a maximum diameter smaller than the particle diameter of the conductive particles described later can be used.
  • the filler content is preferably in the range of 5 to 60% by volume based on the total volume of the circuit connecting material. If it is 60% by volume or more, the effect of improving the reliability is saturated.
  • the circuit connection material according to the present embodiment can obtain a connection by direct contact of circuit electrodes facing each other at the time of connection without containing conductive particles, but is more stable when further containing conductive particles. Connection can be obtained.
  • the conductive particles include metal particles such as Au, Ag, Ni, Cu, and solder, and carbon.
  • the surface of a transition metal such as Ni may be coated with a noble metal such as Au.
  • the surface layer is preferably made of Au, Ag, or a platinum group noble metal, and more preferably Au, rather than transition metals such as Ni and Cu.
  • a conductive layer was formed on the surface of the non-conductive particles by a method such as coating the surface of the non-conductive particles such as glass, ceramic, plastic, etc. with the above-mentioned conductive material, and the outermost layer was composed of noble metals. In the case of particles or hot-melt metal particles, since they are deformable by heating and pressing, the contact area with the electrode is increased at the time of connection, and the reliability is improved.
  • the blending amount of the conductive particles is appropriately set depending on the application, but is usually in the range of 0.1 to 30 parts by volume with respect to 100 parts by volume of the resin component in the circuit connecting material. In order to prevent an adjacent circuit from being short-circuited by excessive conductive particles, the amount is more preferably 0.1 to 10 parts by volume.
  • circuit connection material is divided into two or more layers and separated into a layer containing a curing agent and a layer containing conductive particles, an improvement in pot life can be obtained.
  • circuit connecting material according to the present embodiment may appropriately contain a polymerization inhibitor such as hydroquinone or methyl ether hydroquinone as necessary.
  • connection structure and the manufacturing method thereof according to this embodiment will be described.
  • FIG. 1 is a schematic cross-sectional view showing an embodiment of a connection structure.
  • a connection structure 1 shown in FIG. 1 includes a first circuit member 20 having a first circuit board 21 and a first circuit electrode (first connection terminal) 22 formed on a main surface 21a thereof, A second circuit member 30 having a second circuit board 31 and a second circuit electrode (second connection terminal) 32 formed on the main surface 31a thereof; the first circuit member 20; An adhesive layer 10 is provided between the circuit member 30 and the circuit member 30 to bond them together.
  • the second circuit member 30 is disposed to face the first circuit member 20 so that the second circuit electrode 32 faces the first circuit electrode 22.
  • the adhesive layer 10 is formed by interposing the circuit connecting material between the first circuit member 20 and the second circuit member 30 and pressing in that state.
  • the adhesive layer 10 is formed using a circuit connecting material containing conductive particles is shown.
  • the adhesive layer 10 is dispersed in the insulating layer 11 and the insulating layer 11. It is comprised from the electroconductive particle 7 which is carrying out.
  • the insulating layer 11 is a cured body that is derived from components other than the conductive particles in the adhesive and is formed by radical polymerization of a radical polymerizable substance.
  • the first circuit electrode 22 and the second circuit electrode 32 facing each other are electrically connected through the conductive particles 7.
  • the first circuit electrodes 22 and the second circuit electrodes 32 formed on the same circuit board are insulated from each other.
  • connection pitch of the first circuit electrode 22 and / or the second circuit electrode 32 may be 0.4 mm or more, and may be 0.45 mm or more.
  • the upper limit of the connection pitch of the first circuit electrode 22 and / or the second circuit electrode 32 is not particularly limited, but may be, for example, 1.0 mm or less, or 0.9 mm or less.
  • At least a part of the first circuit electrode 22 and / or the second circuit electrode 32 is a connection pitch (rough pitch) of 0.5 mm or more. (That is, the first circuit member 20 and / or the second circuit member 30 is formed with the first circuit electrode 22 and / or the second circuit electrode 32 at a connection pitch of 0.5 mm or more. It is preferred that the
  • the first circuit electrode 22 and the second circuit electrode 32 are, for example, partly or entirely formed so that L / S (Line / Space) is 4/6 to 9/1.
  • L / S may be 5/5 to 9/1. That is, the first circuit member 20 and / or the second circuit member 30 has the first circuit electrode 22 and / or the second circuit electrode 32 so that L / S is 4/6 to 9/1. It may have a formed region. Further, from the viewpoint of facilitating better conduction, the connection structure 1 has a sum of L / S of the first circuit electrode 22 and L / S of the second circuit electrode 32 of 5/5. It is preferable to have a region of 1/9.
  • Examples of the first circuit board 31 and the second circuit board 21 include chip parts such as semiconductor chips, resistor chips, and capacitor chips, and boards such as printed boards.
  • the circuit member is provided with a large number of connection terminals, but the number of connection terminals may be one in some cases.
  • a substrate made of an inorganic material such as a semiconductor, glass or ceramic, a plastic substrate, or a glass / epoxy substrate is used.
  • the plastic substrate include a polyimide film, a polycarbonate film, and a polyester film.
  • the first circuit electrode and the second circuit electrode are formed from a metal such as copper.
  • at least one surface of the first circuit electrode and the second circuit electrode is made of a metal selected from the group consisting of gold, silver, tin, and platinum.
  • the surface layer is selected from gold, silver, platinum group, or tin, and these may be used in combination.
  • one of the first circuit member 20 and the second circuit member 30 may be a liquid crystal display panel having a glass substrate or a plastic substrate as a circuit substrate and having connection terminals formed from ITO or the like.
  • one of the first circuit member 20 and the second circuit member 30 is a flexible printed wiring board (FPC), a tape carrier package (TCP) or a chip-on-film (COF) having a polyimide film as a circuit board, or It may be a semiconductor silicon chip having a semiconductor substrate as a circuit board.
  • FPC flexible printed wiring board
  • TCP tape carrier package
  • COF chip-on-film
  • the connection structure 1 includes, for example, the first circuit member 20, the film-like circuit connection material, and the second circuit member 30, in which the first connection terminal 22 and the second connection terminal 32 are relative to each other. In this state, they are formed by pressurizing or further heating.
  • the pressure is not particularly limited as long as it does not damage the adherend, but it is generally preferably 0.1 to 10 MPa.
  • the heating temperature is not particularly limited but is preferably 100 to 200 ° C. These pressurization and heating are preferably performed in the range of 0.5 to 100 seconds, and can be bonded by heating at 130 to 180 ° C., 3 MPa, and 10 seconds.
  • Example 1 Polyester urethane resin (UR-8200, manufactured by Toyobo Co., Ltd., 30% solution) as a thermoplastic resin is dissolved in methyl ethyl ketone by dissolving 40 parts by mass in terms of non-volatile content and polyurethane resin (T-6075N, manufactured by DIC Bayer Polymer Co., Ltd.). 10 parts by mass of the 15% by mass solution obtained in terms of non-volatile content, and 20% by mass solution obtained by dissolving ethylene-vinyl acetate copolymer (EV40W, Mitsui DuPont Polychemical Co., Ltd.) in toluene.
  • UR-8200 manufactured by Toyobo Co., Ltd., 30% solution
  • T-6075N manufactured by DIC Bayer Polymer Co., Ltd.
  • the compounding amount of the compound having a secondary thiol group is 10.5 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
  • Example 2 A circuit connection material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 3 parts by mass.
  • the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance here, UA5500, DCP-A, M-215 and P-2M
  • UA5500, DCP-A, M-215 and P-2M is 7.89 parts by mass. It is.
  • Example 3 A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 6 parts by mass.
  • the compounding amount of the compound having a secondary thiol group is 15.8 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M). It is.
  • Example 4 The blending amount of polyester urethane resin (UR8240) is 34 parts by mass in terms of nonvolatile content, the blending amount of dicyclopentadiene diacrylate (DCP-A) is 8 parts by mass, isocyanuric acid EO modified diacrylate (manufactured by Toagosei Co., Ltd., A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of M-215) was 8 parts by mass.
  • the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance herein, UA5500, DCP-A, M-215 and P-2M is 9.09 parts by mass. It is.
  • Example 5 A circuit connecting material was obtained in the same manner as in Example 1 except that 3 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A.
  • the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance herein, UA5500, DCP-A, M-215 and P-2M is 7.89 parts by mass. It is.
  • Example 6 A circuit connecting material was obtained in the same manner as in Example 1 except that 6 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A.
  • the compounding amount of the compound having a secondary thiol group is 15.8 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
  • Comparative Example 1 A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 2 parts by mass.
  • the compounding amount of the compound having a secondary thiol group is 5.26 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
  • Comparative Example 2 A circuit connection material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 8 parts by mass.
  • the compounding amount of the compound having a secondary thiol group is 21.1 parts by mass with respect to 100 parts by mass of the radically polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M). It is.
  • Comparative Example 3 A circuit connecting material was obtained in the same manner as in Example 4 except that the amount of thiol A (molecular weight 567.7) was 2 parts by mass.
  • the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance herein, UA5500, DCP-A, M-215 and P-2M is 4.55 parts by mass. It is.
  • Comparative Example 5 A circuit connecting material was obtained in the same manner as in Example 4 except that 8 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A.
  • the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (referred to here as UA5500, DCP-A, M-215 and P-2M) is 18.2 parts by mass. It is.
  • Comparative Example 6 A circuit connection material was obtained in the same manner as in Example 1 except that 2 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A.
  • the compounding amount of the compound having a secondary thiol group is 5.26 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
  • Tables 1 and 2 show the compositions of the circuit connection materials of Examples and Comparative Examples.
  • connection structure connection between COF and PWB
  • a multilayer printed wiring board (PWB-TEG) was connected at 130 ° C.-2 MPa-10 seconds with a width of 2.0 mm.
  • connection resistance After connecting the circuits, the initial resistance value between adjacent circuits of the FPC-PWB including the connection part was measured with a multimeter, and then the connection structure was left in an environment of a temperature of 40 ° C. and a humidity of 60% for 5 days. The resistance value between adjacent circuits was measured with a multimeter. As the resistance value, an average value and a maximum value of 37 resistance values between adjacent circuits were measured. When the maximum rate of change was 3 times or less, A was taken as B, and when it was larger than 3 times, the connection reliability after the high temperature and high humidity test at 85 ° C. and 85% RH for 500 hours was evaluated. The smaller the rate of change of the maximum value, the better the connection reliability. The obtained results are shown in Tables 3 and 4.
  • tin-plated flexible circuit board COF-TEG
  • line width 100 ⁇ m, pitch 200 ⁇ m, thickness 35 ⁇ m copper circuit formed on the copper surface 0.1 ⁇ m thick gold plated glass epoxy
  • PWB-TEG multilayer printed wiring board
  • each of Examples 1 to 6 showed good adhesive strength, but increased resistance in connection reliability. Further, in the fine pitch, all of the comparative examples show good adhesive strength, and in Comparative Examples 1, 3, 4, and 6 in which the ratio of the secondary thiol to 100 parts by mass of the radical polymerizable substance is less than 7, stable connection reliability Sex was obtained.
  • SYMBOLS 1 Connection structure, 7 ... Electroconductive particle, 10 ... Adhesive layer, 11 ... Insulating layer, 20 ... 1st circuit member, 21 ... 1st circuit board, 22 ... 1st circuit electrode (1st connection Terminal), 30 ... second circuit member, 31 ... second circuit board, 32 ... second circuit electrode (second connection terminal).

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  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
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  • Adhesives Or Adhesive Processes (AREA)
  • Combinations Of Printed Boards (AREA)

Abstract

Provided is a circuit connection material for connecting a first circuit member that has a first circuit electrode formed on top of the main surface of a first substrate, and a second circuit member that has a second circuit electrode formed on top of the main surface of a second substrate, in a state where the first circuit electrode and the second circuit electrode are disposed facing each other. The circuit connection material comprises a radical polymerization initiator, a radical polymerization material and a thiol compound containing a thiol group in which the number of hydrogen atoms that will bond with the carbon atoms to which the thiol group has bonded is 1 or 0, and the thiol compound content is 7-17 parts by weight per 100 parts by weight of radical polymer material.

Description

回路接続材料、接続構造体及びその製造方法Circuit connection material, connection structure and manufacturing method thereof
 本発明は、相対向する回路電極間に介在し、相対向する回路電極を加圧して加圧方向の電極間を電気的に接続する回路接続材料、並びに該回路接続材料を用いた接続構造体及びその製造方法に関する。 The present invention relates to a circuit connection material that is interposed between circuit electrodes facing each other, pressurizes the circuit electrodes facing each other, and electrically connects the electrodes in the pressing direction, and a connection structure using the circuit connection material And a manufacturing method thereof.
 半導体素子や液晶表示素子用の回路接続材料としては、高接着性でかつ高信頼性を示すエポキシ樹脂を用いた熱硬化性樹脂が知られている(例えば、特許文献1参照)。樹脂の構成成分としては、エポキシ樹脂、エポキシ樹脂と反応性を有するフェノール樹脂等の硬化剤、エポキシ樹脂と硬化剤の反応を促進する潜在性硬化剤が一般に用いられている。潜在性硬化剤は硬化温度及び硬化速度を決定する重要な因子となっており、室温での貯蔵安定性と加熱時の硬化速度の観点から種々の化合物が用いられている。 As a circuit connection material for a semiconductor element or a liquid crystal display element, a thermosetting resin using an epoxy resin having high adhesiveness and high reliability is known (for example, see Patent Document 1). As a constituent component of the resin, a curing agent such as an epoxy resin, a phenol resin having reactivity with the epoxy resin, and a latent curing agent that accelerates the reaction between the epoxy resin and the curing agent are generally used. The latent curing agent is an important factor for determining the curing temperature and the curing rate, and various compounds are used from the viewpoint of storage stability at room temperature and curing rate during heating.
 また、近時、アクリレート誘導体及び/又はメタアクリレート誘導体(以下、「(メタ)アクリレート誘導体」と総称する。)とラジカル重合開始剤である過酸化物とを併用した、ラジカル硬化型接着剤が注目されている。ラジカル硬化は、反応活性種であるラジカルが反応性に富むため、短時間硬化が可能である(例えば、特許文献2、3参照)。 Recently, a radical curable adhesive using an acrylate derivative and / or a methacrylate derivative (hereinafter collectively referred to as “(meth) acrylate derivative”) and a peroxide as a radical polymerization initiator has attracted attention. Has been. Radical curing can be cured in a short time because radicals that are reactive species are rich in reactivity (see, for example, Patent Documents 2 and 3).
 そのため、現在では生産時間短縮に有利な短時間硬化型接着剤が普及しつつある。また、ラジカル硬化型接着剤の反応性を更に向上させる目的で、連鎖移動剤の適用が検討されている(例えば、特許文献4、5参照)。 Therefore, a short-curing adhesive that is advantageous for shortening the production time is now spreading. In addition, application of a chain transfer agent has been studied for the purpose of further improving the reactivity of the radical curable adhesive (see, for example, Patent Documents 4 and 5).
特開平1-113480号公報Japanese Patent Laid-Open No. 1-113480 特開2002-203427号公報JP 2002-203427 A 国際公開WO98/044067号パンフレットInternational Publication WO98 / 044067 Pamphlet 特開2003-221557号公報JP 2003-221557 A 国際公開WO2009/057376号パンフレットInternational Publication WO2009 / 057376 Pamphlet
 ところで、近年、携帯電話などの小型モジュールの用途では、モジュールを薄型化できるという観点から、コネクタの代替部材として回路接続材料が検討されている。このような小型モジュールにおける回路部材の接続ピッチは、従来回路接続材料が適用されてきた回路部材の接続ピッチ(例えば0.4mm以下)よりも粗いため、回路接続材料としては、従来と異なる特性が要求される。 By the way, in recent years, in applications of small modules such as mobile phones, circuit connection materials have been studied as alternative members of connectors from the viewpoint that the modules can be thinned. Since the connection pitch of circuit members in such a small module is coarser than the connection pitch (for example, 0.4 mm or less) of circuit members to which circuit connection materials have been conventionally applied, circuit connection materials have characteristics different from conventional ones. Required.
 例えば、コネクタの代替部材として用いる回路接続材料には、従来の分野(半導体素子用途、液晶表示素子用途、等)と比較して接続部の長さが短いために、より高い接着力が要求される。例として、従来の用途である液晶パネルの周辺部材での接続では、通常6N/cm以上の接着力があればよいが、コネクタの代替部材としては、12N/cm以上の接着力を要求される場合がある。 For example, a circuit connection material used as an alternative member for a connector is required to have a higher adhesive force because the length of the connection portion is shorter than that of conventional fields (for semiconductor element use, liquid crystal display element use, etc.). The For example, in connection with a peripheral member of a liquid crystal panel, which is a conventional application, an adhesive force of 6 N / cm or more is usually required, but an adhesive force of 12 N / cm or more is required as an alternative member for a connector. There is a case.
 その一方で、ラフピッチ(例えば、接続ピッチ0.5mm以上)の接続では、ファインピッチの接続と比べて、同じ回路接続材料を用いた場合であっても接着力が減少する傾向にある。これは、単位長さ当りの電極本数が減少することにより、電極の壁と回路接続材料との界面で発生する、せん断方向の接着力が減少するためと考えられる。 On the other hand, in the connection with rough pitch (for example, connection pitch of 0.5 mm or more), the adhesive force tends to decrease even when the same circuit connection material is used as compared with the connection with fine pitch. This is presumably because the adhesive force in the shearing direction generated at the interface between the electrode wall and the circuit connecting material decreases as the number of electrodes per unit length decreases.
 そこで本発明は、ラフピッチの接続においても十分に高い接着力を得ることができ、接続信頼性に優れる回路接続材料、並びに該回路接続材料を用いた接続構造体及びその製造方法を提供することを目的とする。 Therefore, the present invention provides a circuit connection material that can obtain a sufficiently high adhesive force even in rough pitch connection and has excellent connection reliability, a connection structure using the circuit connection material, and a method of manufacturing the same. Objective.
 本発明者らは、上記目的を達成すべく鋭意検討した結果、特定の連鎖移動剤を、特定の量含有させることにより、ラフピッチ接続においても高い接着力を発現し、かつ良好な接続信頼性を示す回路接続材料が得られることを見出し、本発明を完成させるに至った。 As a result of intensive studies to achieve the above-mentioned object, the present inventors have expressed a specific chain transfer agent in a specific amount, thereby exhibiting high adhesive force even in rough pitch connection, and good connection reliability. The present inventors have found that the circuit connection material shown can be obtained and have completed the present invention.
 すなわち本発明は、第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成された第二の回路部材とを、上記第一の回路電極及び上記第二の回路電極を対向配置させた状態で接続するための回路接続材料であって、ラジカル重合開始剤と、ラジカル重合性物質と、チオール基を有し、該チオール基が結合した炭素原子に結合する水素原子の数が1又は0であるチオール化合物と、を含有し、上記チオール化合物の含有量が、上記ラジカル重合性物質100質量部に対して、7~17質量部である、回路接続材料を提供する。 That is, the present invention provides a first circuit member in which a first circuit electrode is formed on a main surface of a first substrate, and a second circuit member in which a second circuit electrode is formed on a main surface of a second substrate. A circuit connection material for connecting the first circuit electrode and the second circuit electrode in a state of facing each other, comprising a radical polymerization initiator, a radical polymerizable substance, and a thiol And a thiol compound in which the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0, and the content of the thiol compound is 100 parts by mass of the radical polymerizable substance In contrast, a circuit connecting material having 7 to 17 parts by mass is provided.
 このような回路接続材料によれば、ラフピッチの接続においても十分に高い接着力を得ることができる。また、コネクタの代替部材として用いる回路接続材料には、該回路接続材料を用いて接続した接続構造体が良好な接続信頼性を有することが要求される。本発明に係る回路接続材料によれば、ラフピッチの接続における十分に高い接着力と、良好な接続信頼性とを、同時に達成することができる。さらに、本発明に係る回路接続材料によれば、チオール化合物が連鎖移動剤として機能するため、硬化速度が速く、低温短時間接続を実現することができ、金属等の無機質への密着力が向上する等の効果を有効に得ることができる。 Such a circuit connecting material can provide a sufficiently high adhesive force even in rough pitch connection. Further, a circuit connection material used as an alternative member of a connector is required to have a good connection reliability for a connection structure connected using the circuit connection material. According to the circuit connection material according to the present invention, a sufficiently high adhesive force in a rough pitch connection and good connection reliability can be achieved at the same time. Furthermore, according to the circuit connecting material according to the present invention, since the thiol compound functions as a chain transfer agent, the curing speed is high, the low temperature and short time connection can be realized, and the adhesion to an inorganic material such as a metal is improved. It is possible to effectively obtain an effect such as.
 本発明に係る回路接続材料において、上記チオール化合物の分子量は400以上であることが好ましい。このような回路接続材料は、ラフピッチの接続における接着力が一層高くなるとともに、接続信頼性に一層優れるようになる。 In the circuit connection material according to the present invention, the thiol compound preferably has a molecular weight of 400 or more. Such a circuit connection material has a higher adhesive force in connection with rough pitch, and more excellent connection reliability.
 また、本発明の回路接続材料において、上記第一の回路部材(又は上記第二の回路部材)は、上記第一の基板(又は上記第二の基板)の主面上に0.5mm以上の接続ピッチで上記第一の回路電極(又は上記第二の基板)が形成された領域を有するものであることが好ましい。本発明の回路接続材料は、ラフピッチの接続においても十分に高い接着力を得ることができるものであるため、上記のような回路部材の接続に好適に使用することができる。 In the circuit connection material of the present invention, the first circuit member (or the second circuit member) is 0.5 mm or more on the main surface of the first substrate (or the second substrate). It is preferable to have a region where the first circuit electrode (or the second substrate) is formed at a connection pitch. Since the circuit connection material of the present invention can obtain a sufficiently high adhesive force even in rough pitch connection, it can be suitably used for the connection of circuit members as described above.
 本発明はまた、第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成され、上記第二の回路電極と上記第一の回路電極とが相対向するように配置された第二の回路部材と、上記第一の回路部材と上記第二の回路部材との間に設けられ、上記第一の回路部材と上記第二の回路部材とを電気的に接続する接着層と、を備え、上記接着層が、上記回路接続材料を上記第一の回路部材と上記第二の回路部材との間に介在させ、加熱及び加圧することにより形成されたものである、接続構造体を提供する。 The present invention also includes a first circuit member having a first circuit electrode formed on the main surface of the first substrate, and a second circuit electrode formed on the main surface of the second substrate. A second circuit member disposed so that the second circuit electrode and the first circuit electrode face each other; and provided between the first circuit member and the second circuit member, An adhesive layer that electrically connects the one circuit member and the second circuit member, and the adhesive layer connects the circuit connection material between the first circuit member and the second circuit member. Provided is a connection structure formed by being interposed and heated and pressed.
 このような接続構造体は、本発明に係る回路接続材料を用いているため、第一の回路部材と第二の回路部材とが高い接着力で接着される。また、第一の回路部材と第二の回路部材とは、良好な接続信頼性をもって接続される。そのため、本発明に係る接続構造体は、耐久性、耐熱性及び耐湿性に優れる。 Since such a connection structure uses the circuit connection material according to the present invention, the first circuit member and the second circuit member are bonded with high adhesive force. Further, the first circuit member and the second circuit member are connected with good connection reliability. Therefore, the connection structure according to the present invention is excellent in durability, heat resistance, and moisture resistance.
 本発明はさらに、第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成された第二の回路部材と、上記回路接続材料と、を、上記第一の回路電極と上記第二の回路電極とが上記回路接続材料を介して相対向するように配置された状態で加熱及び加圧して、上記第一の回路電極と上記第二の回路電極とを電気的に接続する工程を備える、接続構造体の製造方法を提供する。このような製造方法によれば、本発明に係る接続構造体を容易に得ることができる。 The present invention further includes a first circuit member having a first circuit electrode formed on a main surface of a first substrate, and a second circuit member having a second circuit electrode formed on a main surface of a second substrate. The circuit member and the circuit connection material are heated and pressurized in a state where the first circuit electrode and the second circuit electrode are arranged to face each other with the circuit connection material interposed therebetween. A method for manufacturing a connection structure is provided, which includes a step of electrically connecting the first circuit electrode and the second circuit electrode. According to such a manufacturing method, the connection structure according to the present invention can be easily obtained.
 本発明によれば、ラフピッチの接続においても十分に高い接着力を得ることができ、接続信頼性に優れる回路接続材料、並びに該回路接続材料を用いた接続構造体及びその製造方法が提供される。 According to the present invention, a sufficiently high adhesive force can be obtained even in rough pitch connection, and a circuit connection material excellent in connection reliability, a connection structure using the circuit connection material, and a method of manufacturing the same are provided. .
本発明に係る接続構造体の一実施形態を示す模式断面図である。1 is a schematic cross-sectional view showing an embodiment of a connection structure according to the present invention.
 以下、本発明に係る回路接続材料及び接続構造体の好適な一実施形態について説明する。 Hereinafter, a preferred embodiment of a circuit connection material and a connection structure according to the present invention will be described.
 本実施形態に係る回路接続材料は、ラジカル重合開始剤と、ラジカル重合性物質と、チオール基を有し、該チオール基が結合した炭素原子に結合する水素原子の数が1又は0であるチオール化合物と、を含有する。チオール化合物の含有量は、ラジカル重合性物質100質量部に対して、7~17質量部である。 The circuit connection material according to this embodiment includes a radical polymerization initiator, a radical polymerizable substance, a thiol having a thiol group, and the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0. And a compound. The content of the thiol compound is 7 to 17 parts by mass with respect to 100 parts by mass of the radical polymerizable substance.
 本実施形態に係る回路接続材料は、第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成された第二の回路部材とを、第一の回路電極及び第二の回路電極を対向配置させた状態で接続するための回路接続材料として、好適に用いることができる。 The circuit connection material according to the present embodiment includes a first circuit member in which a first circuit electrode is formed on the main surface of the first substrate, and a second circuit electrode on the main surface of the second substrate. It can be suitably used as a circuit connection material for connecting the formed second circuit member in a state where the first circuit electrode and the second circuit electrode are arranged to face each other.
 本実施形態に係る回路接続材料によれば、ラフピッチの接続において十分に高い接着力を得ることができる。また、本実施形態に係る回路接続材料によれば、ラフピッチの接続に用いた場合でも、良好な接続信頼性を有する接続構造体が得られる。そのため、本実施形態に係る回路接続材料は、ラフピッチ(接続ピッチ0.5mm以上)を有する回路部材の接続に特に好適に用いることができる。 The circuit connection material according to the present embodiment can obtain a sufficiently high adhesive force in rough pitch connection. Moreover, according to the circuit connection material which concerns on this embodiment, even when it uses for the connection of rough pitch, the connection structure which has favorable connection reliability is obtained. Therefore, the circuit connection material according to the present embodiment can be particularly suitably used for connection of circuit members having a rough pitch (connection pitch of 0.5 mm or more).
 ラジカル重合開始剤は、遊離ラジカルを発生する化合物であり、遊離ラジカル発生剤ということもできる。ラジカル重合開始剤としては、過酸化化合物、アゾ系化合物などの加熱により分解して遊離ラジカルを発生する化合物が好適である。ラジカル重合開始剤は、目的とする接続温度、接続時間等により適宜選定される。 The radical polymerization initiator is a compound that generates free radicals, and can also be called a free radical generator. As the radical polymerization initiator, a compound that decomposes by heating, such as a peroxide compound or an azo compound, to generate a free radical is suitable. The radical polymerization initiator is appropriately selected depending on the intended connection temperature, connection time, and the like.
 回路接続材料におけるラジカル重合開始剤の含有量は、0.05~10質量%とすることが好ましく、0.1~5質量%とすることがより好ましい。 The content of the radical polymerization initiator in the circuit connecting material is preferably 0.05 to 10% by mass, and more preferably 0.1 to 5% by mass.
 ラジカル重合開始剤は、ジアシルパーオキサイド類、パーオキシジカーボネート類、パーオキシエステル類、パーオキシケタール類、ジアルキルパーオキサイド類、ハイドロパーオキサイド類等が挙げられる。 Examples of the radical polymerization initiator include diacyl peroxides, peroxydicarbonates, peroxyesters, peroxyketals, dialkyl peroxides, hydroperoxides and the like.
 ジアシルパーオキサイド類としては、2,4-ジクロロベンゾイルパーオキサイド、3,5,5-トリメチルヘキサノイルパーオキサイド、オクタノイルパーオキサイド、ラウロイルパーオキサイド、ステアロイルパーオキサイド、スクシニックパーオキサイド、ベンゾイルパーオキシトルエン、ベンゾイルパーオキサイド等が挙げられる。 Diacyl peroxides include 2,4-dichlorobenzoyl peroxide, 3,5,5-trimethylhexanoyl peroxide, octanoyl peroxide, lauroyl peroxide, stearoyl peroxide, succinic peroxide, benzoyl peroxide And benzoyl peroxide.
 パーオキシジカーボネート類としては、ジ-n-プロピルパーオキシジカーボネート、ジイソプロピルパーオキシジカーボネート、ビス(4-t-ブチルシクロヘキシル)パーオキシジカーボネート、ジ-2-エトキシメトキシパーオキシジカーボネート、ジ(2-エチルヘキシルパーオキシ)ジカーボネート、ジメトキシブチルパーオキシジカーボネート、ジ(3-メチル-3-メトキシブチルパーオキシ)ジカーボネート等が挙げられる。 Peroxydicarbonates include di-n-propyl peroxydicarbonate, diisopropyl peroxydicarbonate, bis (4-tert-butylcyclohexyl) peroxydicarbonate, di-2-ethoxymethoxyperoxydicarbonate, di- (2-Ethylhexylperoxy) dicarbonate, dimethoxybutylperoxydicarbonate, di (3-methyl-3-methoxybutylperoxy) dicarbonate and the like.
 パーオキシエステル類としては、1,1,3,3-テトラメチルブチルパーオキシネオデカノエート、1-シクロヘキシル-1-メチルエチルパーオキシノエデカノエート、t-ヘキシルパーオキシネオデカノエート、t-ブチルパーオキシピバレート、1,1,3,3-テトラメチルブチルパーオキシ-2-エチルヘキサノネート、2,5-ジメチル-2,5-ジ(2ーエチルヘキサノイルパーオキシ)ヘキサン、1-シクロヘキシル-1-メチルエチルパーオキシ-2-エチルヘキサノネート、t-ヘキシルパーオキシ-2-エチルヘキサノネート、t-ブチルパーオキシ-2-エチルヘキサノネート、t-ブチルパーオキシイソブチレート、1,1-ビス(t-ブチルパーオキシ)シクロヘキサン、t-ヘキシルパーオキシイソプロピルモノカーボネート、t-ブチルパーオキシ-3,5,5-トリメチルヘキサノネート、t-ブチルパーオキシラウレート、2,5-ジメチル-2,5-ジ(m-トルオイルパーオキシ)ヘキサン、t-ブチルパーオキシイソプロピルモノカーボネート、t-ブチルパーオキシ-2-エチルヘキシルモノカーボネート、t-ヘキシルパーオキシベンゾエート、t-ブチルパーオキシアセテート等が挙げられる。 Peroxyesters include 1,1,3,3-tetramethylbutylperoxyneodecanoate, 1-cyclohexyl-1-methylethylperoxynoedecanoate, t-hexylperoxyneodecanoate, t-butyl peroxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanate, 2,5-dimethyl-2,5-di (2-ethylhexanoylperoxy) hexane 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanate, t-hexylperoxy-2-ethylhexanoate, t-butylperoxy-2-ethylhexanoate, t-butylperoxy Isobutyrate, 1,1-bis (t-butylperoxy) cyclohexane, t-hexylperoxyisopropyl Rumonocarbonate, t-butylperoxy-3,5,5-trimethylhexanonate, t-butylperoxylaurate, 2,5-dimethyl-2,5-di (m-toluoylperoxy) hexane, t -Butyl peroxyisopropyl monocarbonate, t-butyl peroxy-2-ethylhexyl monocarbonate, t-hexyl peroxybenzoate, t-butyl peroxyacetate and the like.
 パーオキシケタール類としては、1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン、1,1-ビス(t-ヘキシルパーオキシ)シクロヘキサン、1,1-ビス(t-ブチルパーオキシ)-3,3,5-トリメチルシクロヘキサン、1、1-(t-ブチルパーオキシ)シクロドデカン、2,2-ビス(t-ブチルパーオキシ)デカン等が挙げられる。 Peroxyketals include 1,1-bis (t-hexylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (t-hexylperoxy) cyclohexane, 1,1-bis (t -Butylperoxy) -3,3,5-trimethylcyclohexane, 1,1- (t-butylperoxy) cyclododecane, 2,2-bis (t-butylperoxy) decane and the like.
 ジアルキルパーオキサイド類としては、α,α’-ビス(t-ブチルパーオキシ)ジイソプロピルベンゼン、ジクミルパーオキサイド、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン、t-ブチルクミルパーオキサイド等が挙げられる。 Dialkyl peroxides include α, α'-bis (t-butylperoxy) diisopropylbenzene, dicumyl peroxide, 2,5-dimethyl-2,5-di (t-butylperoxy) hexane, t- Examples thereof include butyl cumyl peroxide.
 ハイドロパーオキサイド類としては、ジイソプロピルベンゼンハイドロパーオキサイド、クメンハイドロパーオキサイド等が挙げられる。 Examples of hydroperoxides include diisopropylbenzene hydroperoxide and cumene hydroperoxide.
 これらのラジカル重合開始剤は、単独又は混合して使用することができ、分解促進剤、抑制剤等を混合して用いてもよい。また、これらのラジカル重合開始剤をポリウレタン系、ポリエステル系の高分子物質等で被覆してマイクロカプセル化したものは、保存性が延長されるために好ましい。 These radical polymerization initiators can be used alone or in combination, and may be used in combination with a decomposition accelerator, an inhibitor and the like. In addition, those obtained by coating these radical polymerization initiators with a polyurethane-based or polyester-based polymer substance and making them into microcapsules are preferable because the storage stability is extended.
 ラジカル重合性物質は、ラジカル重合性の官能基を有する化合物であり、ラジカル重合性の官能基としては、ビニル基、アクリロイル基、メタアクリロイル基等が好適である。これらのうち、アクリロイル基及び/又はメタアクリロイル基を有する化合物がより好ましい。 The radical polymerizable substance is a compound having a radical polymerizable functional group. As the radical polymerizable functional group, a vinyl group, an acryloyl group, a methacryloyl group, or the like is preferable. Of these, compounds having an acryloyl group and / or a methacryloyl group are more preferred.
 ラジカル重合性物質としては、後述する化合物をモノマー、オリゴマーいずれの状態でも用いることができ、モノマーとオリゴマーとを併用することも可能である。 As the radically polymerizable substance, a compound described later can be used in either a monomer or oligomer state, and the monomer and oligomer can be used in combination.
 ラジカル重合性物質としては、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、テトラメチロールメタンテトラ(メタ)アクリレート、2-ヒドロキシ-1,3-ジ(メタ)アクリロキシプロパン、2,2-ビス[4-((メタ)アクリロキシメトキシ)フェニル]プロパン、2,2-ビス[4-((メタ)アクリロキシポリエトキシ)フェニル]プロパン、ジシクロペンテニル(メタ)アクリレート、トリシクロデカニル(メタ)アクリレート、トリス((メタ)アクリロイロキシエチル)イソシアヌレート、ウレタン(メタ)アクリレート、ジメチロールトリシクロデカンジ(メタ)アクリレート、イソシアヌル酸EO(エチレンオキシド)変性ジアクリレート、2-メタクリロイルオキシエチルアシッドホスフェート等が挙げられる。これらは単独又は併用して用いることができる。 Examples of the radical polymerizable substance include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, 2-hydroxy-1,3-di ( (Meth) acryloxypropane, 2,2-bis [4-((meth) acryloxymethoxy) phenyl] propane, 2,2-bis [4-((meth) acryloxypolyethoxy) phenyl] propane, dicyclopentenyl (Meth) acrylate, tricyclodecanyl (meth) acrylate, tris ((meth) acryloyloxyethyl) isocyanurate, urethane (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, isocyanuric acid EO (ethylene oxy) De) modified diacrylate, 2-methacryloyloxyethyl acid phosphate, and the like. These can be used alone or in combination.
 また、ラジカル重合性物質としては、ジシクロペンタン骨格、トリシクロデカン骨格及びトリアジン環からなる群より選ばれる少なくと一つの部分構造を有するものが好ましい。このような部分構造を有するラジカル重合性物質を用いることで、回路接続材料の硬化物が耐熱性に優れるようになる。 The radical polymerizable substance preferably has at least one partial structure selected from the group consisting of a dicyclopentane skeleton, a tricyclodecane skeleton, and a triazine ring. By using a radically polymerizable substance having such a partial structure, the cured product of the circuit connection material becomes excellent in heat resistance.
 さらに、ラジカル重合性物質としては、ポリスチレン、ポリエチレン、ポリビニルブチラール、ポリビニルホルマール、ポリイミド、ポリアミド、ポリエステル、ポリ塩化ビニル、ポリフェニレンオキサイド、尿素樹脂、メラミン樹脂、フェノール樹脂、キシレン樹脂、エポキシ樹脂、ポリイソシアネート樹脂、フェノキシ樹脂などのポリマーを用いることもできる。なお、ラジカル重合性物質として用いられるポリマーは、分子内に少なくとも一つのラジカル重合性の官能基を有する。 Furthermore, the radical polymerizable substance includes polystyrene, polyethylene, polyvinyl butyral, polyvinyl formal, polyimide, polyamide, polyester, polyvinyl chloride, polyphenylene oxide, urea resin, melamine resin, phenol resin, xylene resin, epoxy resin, polyisocyanate resin. A polymer such as phenoxy resin can also be used. The polymer used as the radical polymerizable substance has at least one radical polymerizable functional group in the molecule.
 ラジカル重合性物質としてポリマーを含有させると、取扱い性もよく硬化時の応力緩和に優れるため好ましく、ポリマーが水酸基等の官能基を有する場合接着性が向上するためより好ましい。各ポリマーをラジカル重合性の官能基で変性したものがより好ましい。 It is preferable to include a polymer as a radical polymerizable substance because it is easy to handle and excellent in stress relaxation during curing, and is more preferable when the polymer has a functional group such as a hydroxyl group because adhesion is improved. What modified each polymer with the radically polymerizable functional group is more preferable.
 これらポリマーの重量平均分子量は1.0×10以上が好ましく、混合性の点から1.0×10以上1.0×10以下がより好ましい。本願で規定する重量平均分子量とは、以下の条件に従ってゲルパーミエイションクロマトグラフィー法(GPC)により標準ポリスチレンによる検量線を用いて測定したもののことをいう。
[GPC条件]
使用機器:日立L-6000 型〔株式会社日立製作所〕、カラム:ゲルパックGL-R420+ゲルパックGL-R430+ゲルパックGL-R440(計3本)〔日立化成株式会社製〕、溶離液:テトラヒドロフラン、測定温度:40℃、流量:1.75ml/min、検出器:L-3300RI〔株式会社日立製作所〕
The weight average molecular weight of these polymers is preferably 1.0 × 10 4 or more, and more preferably 1.0 × 10 4 or more and 1.0 × 10 6 or less from the viewpoint of mixing properties. The weight average molecular weight defined in the present application refers to a value measured using a standard polystyrene calibration curve by gel permeation chromatography (GPC) according to the following conditions.
[GPC conditions]
Equipment used: Hitachi L-6000 type [Hitachi, Ltd.], column: Gel pack GL-R420 + gel pack GL-R430 + gel pack GL-R440 (3 in total) [manufactured by Hitachi Chemical Co., Ltd.], eluent: tetrahydrofuran, measurement temperature: 40 ° C., flow rate: 1.75 ml / min, detector: L-3300RI [Hitachi, Ltd.]
 チオール化合物は、チオール基を有し、該チオール基が結合した炭素原子に結合する水素原子の数が0又は1である化合物である。チオール化合物としては、例えば、芳香族チオール及び2級チオール化合物が挙げられる。 The thiol compound is a compound having a thiol group and having 0 or 1 hydrogen atoms bonded to the carbon atom to which the thiol group is bonded. Examples of thiol compounds include aromatic thiols and secondary thiol compounds.
 芳香族チオールは、芳香環に結合したチオール基を有する化合物であり、芳香族チオールとしては、アリルベンゼンチオールスルホネート、ベンゼンチオール、o-エトキシベンゼンチオール、p-エトキシベンゼンチオール、2-ベンズイミダゾールチオール、o-メルカプト安息香酸、o-メルカプト安息香酸メチルエステル、2-ベンゾチアゾールチオール、メルカプトベンゾオキサゾール、ナフタレンチオール、トルエンチオール、チオビスベンゼンチオール、p-メトキシ-トルエンチオール等が挙げられる。 An aromatic thiol is a compound having a thiol group bonded to an aromatic ring, and examples of the aromatic thiol include allylbenzene thiol sulfonate, benzene thiol, o-ethoxybenzene thiol, p-ethoxybenzene thiol, 2-benzimidazole thiol, o-Mercaptobenzoic acid, o-mercaptobenzoic acid methyl ester, 2-benzothiazolethiol, mercaptobenzoxazole, naphthalenethiol, toluenethiol, thiobisbenzenethiol, p-methoxy-toluenethiol and the like.
 2級チオール化合物は、2級チオール基を有する化合物であり、2級チオール化合物としては、2級のブタンチオール、2,3-ブタンジチオール、ヘキサ-5-エン-3-チオール、2級のドデカンチオール、2級のヘプタンチオール、2級のヘキサンチオール、2級のオクタデカンチオール、2級のオクタンチオール、2-メチル-2-プロパンチオール等が挙げられる。2級チオール化合物は、アルコール類と比べて、連鎖移動剤としての反応性が高く、実用上優れている。 The secondary thiol compound is a compound having a secondary thiol group. Examples of the secondary thiol compound include secondary butanethiol, 2,3-butanedithiol, hexa-5-ene-3-thiol, and secondary dodecane. Thiol, secondary heptane thiol, secondary hexane thiol, secondary octadecane thiol, secondary octane thiol, 2-methyl-2-propanethiol and the like. Secondary thiol compounds have higher reactivity as chain transfer agents than alcohols, and are practically superior.
 また、2級チオール化合物としては、下記式(1)~(5)で表される化合物が好適である。 Moreover, as the secondary thiol compound, compounds represented by the following formulas (1) to (5) are suitable.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 回路接続材料におけるチオール化合物の含有量は、ラジカル重合性物質100質量部に対して、7~17質量部であることが好ましく、9~12質量部であることがより好ましい。ラジカル重合性物質の含有量が少ないと、ラフピッチ接続における高接着力の効果が得られにくく、ラジカル重合性物質の含有量が多いと、架橋密度が低くなり、回路接続材料における抵抗の信頼性が悪化する傾向にある。 The content of the thiol compound in the circuit connecting material is preferably 7 to 17 parts by mass and more preferably 9 to 12 parts by mass with respect to 100 parts by mass of the radical polymerizable substance. If the content of the radical polymerizable substance is small, it is difficult to obtain the effect of high adhesive strength in rough pitch connection, and if the content of the radical polymerizable substance is large, the crosslinking density is lowered, and the resistance of the circuit connecting material is reliable. It tends to get worse.
 チオール化合物の分子量は、90以上であることが好ましく、150以上であることがより好ましく、400以上であることがさらに好ましい。また、チオール化合物の分子量は、5000以下であることが好ましく、2000以下であることがより好ましく、1000以下であることがさらに好ましい。分子量が90未満の場合、接続時の加温により化合物の沸点に到達して蒸発してしまい、十分な量のチオール化合物を反応に寄与させることができなくなる傾向にある。一方、分子量が5000より大きい場合は、樹脂の排除性が悪化し、接続抵抗が上昇する傾向にある。 The molecular weight of the thiol compound is preferably 90 or more, more preferably 150 or more, and further preferably 400 or more. The molecular weight of the thiol compound is preferably 5000 or less, more preferably 2000 or less, and further preferably 1000 or less. When the molecular weight is less than 90, the boiling point of the compound reaches the boiling point due to heating at the time of connection, and the compound tends to evaporate, so that a sufficient amount of thiol compound cannot contribute to the reaction. On the other hand, when the molecular weight is larger than 5000, the resin exclusion property tends to deteriorate and the connection resistance tends to increase.
 また、製造時の作業性や製品の取り扱い性の面からは、チオール化合物の分子量が400以上であることがより好ましい。分子量が400未満では、材料を配合する際や、製品の取り扱いの際に、臭気が強く、作業性や取り扱い性が低下する傾向にある。一方、分子量が400以上の場合、臭気が抑えられ作業性・取り扱い性に支障はない。 In addition, from the viewpoint of workability during production and product handling, it is more preferable that the molecular weight of the thiol compound is 400 or more. When the molecular weight is less than 400, when blending materials or handling products, the odor is strong and the workability and handling tend to decrease. On the other hand, when the molecular weight is 400 or more, the odor is suppressed and there is no problem in workability and handling.
 また、チオール化合物のチオール当量としては、50以上500以下が好ましく、120以上400以下がより好ましい。チオール当量が50未満の場合、架橋密度が低くなり、回路接続材料における抵抗の信頼性が低下する傾向にある。一方、チオール当量が500以下であると、接着力が一層向上する傾向にある。 The thiol equivalent of the thiol compound is preferably 50 or more and 500 or less, and more preferably 120 or more and 400 or less. When the thiol equivalent is less than 50, the crosslinking density is lowered, and the resistance reliability in the circuit connecting material tends to be lowered. On the other hand, when the thiol equivalent is 500 or less, the adhesive force tends to be further improved.
 本実施形態に係る回路接続材料は、ラジカル重合開始剤と、ラジカル重合性物質と、チオール化合物とのみからなるものであってもよいが、必要に応じて以下の成分を更に含有することができる。 The circuit connection material according to the present embodiment may be composed only of a radical polymerization initiator, a radical polymerizable substance, and a thiol compound, but may further contain the following components as necessary. .
 本実施形態に係る回路接続材料は、分子内に1つ以上のアミノキシル構造を有する化合物をさらに含有することができる。回路接続材料がアミノキシル構造を有する化合物を含有すると、回路接続材料の保存安定性をより向上させることができる。 The circuit connection material according to the present embodiment can further contain a compound having one or more aminoxyl structures in the molecule. When the circuit connecting material contains a compound having an aminoxyl structure, the storage stability of the circuit connecting material can be further improved.
 また本実施形態に係る回路接続材料は、熱可塑性樹脂をさらに含有することができる。熱可塑性樹脂としては、ポリビニルブチラール樹脂、ポリビニルホルマール樹脂、ポリアミド樹脂、ポリエステル樹脂、フェノール樹脂、エポキシ樹脂、フェノキシ樹脂、ポリスチレン樹脂、キシレン樹脂、ポリウレタン樹脂、ポリエステルウレタン樹脂等が使用できる。これら熱可塑性樹脂の重量平均分子量は、製膜性などの観点から1.0×10以上であることが好ましく、混合性の観点から1.0×10以上1.0×10未満であることがより好ましい。熱可塑性樹脂の重量平均分子量は、ラジカル重合性物質に含まれ得るポリマーの重合平均分子量と同様にして測定される。 The circuit connection material according to the present embodiment can further contain a thermoplastic resin. As the thermoplastic resin, polyvinyl butyral resin, polyvinyl formal resin, polyamide resin, polyester resin, phenol resin, epoxy resin, phenoxy resin, polystyrene resin, xylene resin, polyurethane resin, polyester urethane resin and the like can be used. The weight average molecular weight of these thermoplastic resins is preferably from the viewpoint of film formability is 1.0 × 10 4 or more, mixing the viewpoint from 1.0 × 10 4 or more 1.0 × 10 than 6 More preferably. The weight average molecular weight of the thermoplastic resin is measured in the same manner as the polymerization average molecular weight of the polymer that can be contained in the radical polymerizable substance.
 また、熱可塑性樹脂としては、Tg(ガラス転移温度)が40℃以上であり、重量平均分子量が1.0×10以上である水酸基含有樹脂(例えばフェノキシ樹脂)を好ましく使用することができる。水酸基含有樹脂は、エポキシ基含有エラストマー、ラジカル重合性の官能基によって変性されていてもよい。ラジカル重合性の官能基で変性したものは耐熱性が向上するため好ましい。 As the thermoplastic resin, a hydroxyl group-containing resin (for example, phenoxy resin) having a Tg (glass transition temperature) of 40 ° C. or higher and a weight average molecular weight of 1.0 × 10 4 or higher can be preferably used. The hydroxyl group-containing resin may be modified with an epoxy group-containing elastomer or a radical polymerizable functional group. Those modified with a radically polymerizable functional group are preferred because the heat resistance is improved.
 フェノキシ樹脂は、二官能フェノール類とエピハロヒドリンを高分子量まで反応させるか、又は二官能エポキシ樹脂と二官能フェノール類を重付加反応させることにより得ることができる。 The phenoxy resin can be obtained by reacting a bifunctional phenol and epihalohydrin to a high molecular weight or by polyaddition reaction of a bifunctional epoxy resin and a bifunctional phenol.
 また、熱可塑性樹脂として、ポリエステルウレタン樹脂を用いることも好ましい。ポリエステルウレタン樹脂を含有することで、ラフピッチの接続における接着力が一層向上する傾向がある。 It is also preferable to use a polyester urethane resin as the thermoplastic resin. By containing a polyester urethane resin, the adhesive force in rough pitch connection tends to be further improved.
 さらに、本実施形態に係る回路接続材料は、充填材、軟化剤、促進剤、老化防止剤、着色剤、難燃化剤、チキソトロピック剤、カップリング剤及びフェノール樹脂やメラミン樹脂、イソシアネート類等を含有することもできる。 Furthermore, the circuit connection material according to the present embodiment includes fillers, softeners, accelerators, anti-aging agents, colorants, flame retardants, thixotropic agents, coupling agents, phenol resins, melamine resins, isocyanates, and the like. Can also be contained.
 カップリング剤としては、ビニル基、アクリル基、アミノ基、エポキシ基又はイソシアネート基の少なくとも1種を有する化合物が、接着性の向上の点から好ましい。 As the coupling agent, a compound having at least one of a vinyl group, an acrylic group, an amino group, an epoxy group, or an isocyanate group is preferable from the viewpoint of improving adhesiveness.
 また、充填材を含有した場合、接続信頼性等の向上が得られるので好ましい。充填材としては、最大径が後述する導電性粒子の粒径未満であるものを使用することができる。また、充填材の含有量は、回路接続材料の全体積基準で、5~60体積%の範囲が好ましい。60体積%以上では信頼性向上の効果が飽和する。 In addition, it is preferable to contain a filler since an improvement in connection reliability and the like can be obtained. As the filler, those having a maximum diameter smaller than the particle diameter of the conductive particles described later can be used. The filler content is preferably in the range of 5 to 60% by volume based on the total volume of the circuit connecting material. If it is 60% by volume or more, the effect of improving the reliability is saturated.
 本実施形態に係る回路接続材料は、導電性粒子を含有せずとも接続時に相対向する回路電極の直接接触により接続を得ることができるものであるが、導電性粒子をさらに含有すると、より安定した接続を得ることができる。 The circuit connection material according to the present embodiment can obtain a connection by direct contact of circuit electrodes facing each other at the time of connection without containing conductive particles, but is more stable when further containing conductive particles. Connection can be obtained.
 導電性粒子としては、Au、Ag、Ni、Cu、はんだ等の金属粒子やカーボン等が挙げられる。また、Ni等の遷移金属類の表面をAu等の貴金属類で被覆したものでもよい。十分なポットライフを得るためには、表層はNi、Cu等の遷移金属類ではなく、Au、Ag、白金族の貴金属類とすることが好ましく、Auがより好ましい。また、ガラス、セラミック、プラスチック等の非導電性粒子の表面を上述した導電性物質で被覆する等の方法により、非導電性粒子表面に導通層を形成し、さらに最外層を貴金属類で構成したものや、熱溶融金属粒子の場合、加熱加圧により変形性を有するので接続時に電極との接触面積が増加し信頼性が向上するので好ましい。 Examples of the conductive particles include metal particles such as Au, Ag, Ni, Cu, and solder, and carbon. Further, the surface of a transition metal such as Ni may be coated with a noble metal such as Au. In order to obtain a sufficient pot life, the surface layer is preferably made of Au, Ag, or a platinum group noble metal, and more preferably Au, rather than transition metals such as Ni and Cu. In addition, a conductive layer was formed on the surface of the non-conductive particles by a method such as coating the surface of the non-conductive particles such as glass, ceramic, plastic, etc. with the above-mentioned conductive material, and the outermost layer was composed of noble metals. In the case of particles or hot-melt metal particles, since they are deformable by heating and pressing, the contact area with the electrode is increased at the time of connection, and the reliability is improved.
 導電性粒子の配合量は用途により適宜設定されるが、通常は、回路接続材料中の樹脂成分100体積部に対して0.1~30体積部の範囲である。過剰な導電性粒子による隣接回路の短絡等を防止するためには0.1~10体積部とするのがより好ましい。 The blending amount of the conductive particles is appropriately set depending on the application, but is usually in the range of 0.1 to 30 parts by volume with respect to 100 parts by volume of the resin component in the circuit connecting material. In order to prevent an adjacent circuit from being short-circuited by excessive conductive particles, the amount is more preferably 0.1 to 10 parts by volume.
 また、回路接続材料を2層以上に分割し、硬化剤を含有する層と導電性粒子を含有する層に分離した場合、ポットライフの向上が得られる。 Also, when the circuit connection material is divided into two or more layers and separated into a layer containing a curing agent and a layer containing conductive particles, an improvement in pot life can be obtained.
 さらに、本実施形態に係る回路接続材料は、必要に応じて、ハイドロキノン、メチルエーテルハイドロキノン類などの重合禁止剤を適宜含有していてもよい。 Furthermore, the circuit connecting material according to the present embodiment may appropriately contain a polymerization inhibitor such as hydroquinone or methyl ether hydroquinone as necessary.
 次に、本実施形態に係る接続構造体及びその製造方法について説明する。 Next, the connection structure and the manufacturing method thereof according to this embodiment will be described.
 図1は、接続構造体の一実施形態を示す概略断面図である。図1に示す接続構造体1は、第一の回路基板21及びこれの主面21a上に形成された第一の回路電極(第一の接続端子)22を有する第一の回路部材20と、第二の回路基板31及びこれの主面31a上に形成された第二の回路電極(第二の接続端子)32を有する第二の回路部材30と、第一の回路部材20と第二の回路部材30との間に介在してこれらを接着している接着層10とを備える。第二の回路部材30は、第二の回路電極32が第一の回路電極22と対向するように第一の回路部材20と対向配置されている。 FIG. 1 is a schematic cross-sectional view showing an embodiment of a connection structure. A connection structure 1 shown in FIG. 1 includes a first circuit member 20 having a first circuit board 21 and a first circuit electrode (first connection terminal) 22 formed on a main surface 21a thereof, A second circuit member 30 having a second circuit board 31 and a second circuit electrode (second connection terminal) 32 formed on the main surface 31a thereof; the first circuit member 20; An adhesive layer 10 is provided between the circuit member 30 and the circuit member 30 to bond them together. The second circuit member 30 is disposed to face the first circuit member 20 so that the second circuit electrode 32 faces the first circuit electrode 22.
 接着層10は、上記回路接続材料を第一の回路部材20と第二の回路部材30との間に介在させ、その状態で加圧することにより形成されたものである。なお、本実施形態では、導電性粒子を含有する回路接続材料を用いて接着剤層10を形成した場合の一例を示しており、接着層10は、絶縁層11と、絶縁層11内に分散している導電性粒子7とから構成される。絶縁層11は、接着剤のうち導電性粒子以外の成分に由来し、ラジカル重合性物質のラジカル重合により形成された硬化体である。 The adhesive layer 10 is formed by interposing the circuit connecting material between the first circuit member 20 and the second circuit member 30 and pressing in that state. In the present embodiment, an example in which the adhesive layer 10 is formed using a circuit connecting material containing conductive particles is shown. The adhesive layer 10 is dispersed in the insulating layer 11 and the insulating layer 11. It is comprised from the electroconductive particle 7 which is carrying out. The insulating layer 11 is a cured body that is derived from components other than the conductive particles in the adhesive and is formed by radical polymerization of a radical polymerizable substance.
 対向する第一の回路電極22及び第二の回路電極32は、導電性粒子7を介して電気的に接続されている。一方、同一の回路基板上に形成された第一の回路電極22同士、及び第二の回路電極32同士は絶縁されている。 The first circuit electrode 22 and the second circuit electrode 32 facing each other are electrically connected through the conductive particles 7. On the other hand, the first circuit electrodes 22 and the second circuit electrodes 32 formed on the same circuit board are insulated from each other.
 第一の回路電極22及び/又は第二の回路電極32の接続ピッチは、0.4mm以上であってよく、0.45mm以上であってもよい。また、第一の回路電極22及び/又は第二の回路電極32の接続ピッチの上限は特に限定されないが、例えば1.0mm以下であってよく、0.9mm以下であってもよい。 The connection pitch of the first circuit electrode 22 and / or the second circuit electrode 32 may be 0.4 mm or more, and may be 0.45 mm or more. In addition, the upper limit of the connection pitch of the first circuit electrode 22 and / or the second circuit electrode 32 is not particularly limited, but may be, for example, 1.0 mm or less, or 0.9 mm or less.
 また、上記回路接続材料による効果が一層顕著に得られる観点からは、第一の回路電極22及び/又は第二の回路電極32は、少なくともその一部が0.5mm以上の接続ピッチ(ラフピッチ)で形成されている(すなわち、第一の回路部材20及び/又は第二の回路部材30が、0.5mm以上の接続ピッチで第一の回路電極22及び/又は第二の回路電極32が形成された領域を有する)ことが好ましい。 In addition, from the viewpoint that the effect of the circuit connection material can be obtained more remarkably, at least a part of the first circuit electrode 22 and / or the second circuit electrode 32 is a connection pitch (rough pitch) of 0.5 mm or more. (That is, the first circuit member 20 and / or the second circuit member 30 is formed with the first circuit electrode 22 and / or the second circuit electrode 32 at a connection pitch of 0.5 mm or more. It is preferred that the
 また、第1の回路電極22及び第二の回路電極32は、例えば、その一部又は全部が、L/S(Line/Space)が4/6~9/1となるように形成されたものであってよく、L/Sは5/5~9/1であってもよい。すなわち、第一の回路部材20及び/又は第二の回路部材30は、L/Sが4/6~9/1となるように第一の回路電極22及び/又は第二の回路電極32が形成された領域を有するものであってよい。また、より良好な導通が得られ易くなる観点からは、接続構造体1は、第1の回路電極22のL/Sと第2の回路電極32のL/Sとの合計が、5/5~1/9となる領域を有していることが好ましい。 The first circuit electrode 22 and the second circuit electrode 32 are, for example, partly or entirely formed so that L / S (Line / Space) is 4/6 to 9/1. L / S may be 5/5 to 9/1. That is, the first circuit member 20 and / or the second circuit member 30 has the first circuit electrode 22 and / or the second circuit electrode 32 so that L / S is 4/6 to 9/1. It may have a formed region. Further, from the viewpoint of facilitating better conduction, the connection structure 1 has a sum of L / S of the first circuit electrode 22 and L / S of the second circuit electrode 32 of 5/5. It is preferable to have a region of 1/9.
 第一の回路基板31及び第二の回路基板21としては、半導体チップ、抵抗体チップ、コンデンサチップ等のチップ部品、プリント基板等の基板等が挙げられる。通常、回路部材には多数の接続端子が設けられているが、接続端子は場合によっては単数でもよい。 Examples of the first circuit board 31 and the second circuit board 21 include chip parts such as semiconductor chips, resistor chips, and capacitor chips, and boards such as printed boards. Usually, the circuit member is provided with a large number of connection terminals, but the number of connection terminals may be one in some cases.
 より具体的には、半導体、ガラス及びセラミック等の無機材料の基板、プラスチック基板、又はガラス/エポキシ基板が用いられる。プラスチック基板としては、ポリイミドフィルム、ポリカーボネートフィルム及びポリエステルフィルムが挙げられる。第一の回路電極及び第二の回路電極は、銅などの金属から形成される。より良好な電気的接続を得るためには、第一の回路電極及び第二の回路電極の少なくとも一方の表面を、金、銀、錫及び白金族から選ばれる金属にすることが好ましい。表面層は金、銀、白金族、又は錫のいずれかから選択され、これらを組み合わせて用いてもよい。また、銅/ニッケル/金のように複数の金属を組み合わせて多層構成としてもよい。 More specifically, a substrate made of an inorganic material such as a semiconductor, glass or ceramic, a plastic substrate, or a glass / epoxy substrate is used. Examples of the plastic substrate include a polyimide film, a polycarbonate film, and a polyester film. The first circuit electrode and the second circuit electrode are formed from a metal such as copper. In order to obtain better electrical connection, it is preferable that at least one surface of the first circuit electrode and the second circuit electrode is made of a metal selected from the group consisting of gold, silver, tin, and platinum. The surface layer is selected from gold, silver, platinum group, or tin, and these may be used in combination. Moreover, it is good also as a multilayer structure combining several metals like copper / nickel / gold.
 また、第一の回路部材20及び第二の回路部材30のうち一方は、ガラス基板又はプラスチック基板を回路基板として有し、ITO等から形成された接続端子を有する液晶ディスプレイパネルであってもよい。また、第一の回路部材20及び第二の回路部材30のうち一方は、ポリイミドフィルムを回路基板として有するフレキシブルプリント配線板(FPC)、テープキュリアパッケージ(TCP)若しくはチップオンフィルム(COF)、又は半導体基板を回路基板として有する半導体シリコンチップであってもよい。これらの各種の回路部材を、必要により適宜組み合わせて接続構造体が構成される。 Further, one of the first circuit member 20 and the second circuit member 30 may be a liquid crystal display panel having a glass substrate or a plastic substrate as a circuit substrate and having connection terminals formed from ITO or the like. . Further, one of the first circuit member 20 and the second circuit member 30 is a flexible printed wiring board (FPC), a tape carrier package (TCP) or a chip-on-film (COF) having a polyimide film as a circuit board, or It may be a semiconductor silicon chip having a semiconductor substrate as a circuit board. These various circuit members are appropriately combined as necessary to form a connection structure.
 なお、回路電極を設けた基板は接続時の加熱による揮発成分による接続への影響を排除するために、回路接続材料による接続工程の前に予め加熱処理することが好ましい。 In addition, in order to eliminate the influence on the connection by the volatile component by the heating at the time of a connection, it is preferable to heat-process in advance before the connection process by a circuit connection material.
 接続構造体1は、例えば、第一の回路部材20、フィルム状の回路接続材料及び第二の回路部材30を、この順で、第一の接続端子22及び第二の接続端子32が相対峙するように重ね合わせ、その状態で加圧あるいは更に加熱することにより形成される。圧力は、被着体に損傷を与えない範囲であれば、特に制限は受けないが、一般的には0.1~10MPaが好ましい。加熱温度は、特に制限は受けないが、100~200℃が好ましい。これらの加圧及び加熱は、0.5秒~100秒間の範囲で行うことが好ましく、130~180℃、3MPa、10秒の加熱でも接着させることが可能である。 The connection structure 1 includes, for example, the first circuit member 20, the film-like circuit connection material, and the second circuit member 30, in which the first connection terminal 22 and the second connection terminal 32 are relative to each other. In this state, they are formed by pressurizing or further heating. The pressure is not particularly limited as long as it does not damage the adherend, but it is generally preferably 0.1 to 10 MPa. The heating temperature is not particularly limited but is preferably 100 to 200 ° C. These pressurization and heating are preferably performed in the range of 0.5 to 100 seconds, and can be bonded by heating at 130 to 180 ° C., 3 MPa, and 10 seconds.
 以上、本発明の好適な実施形態について説明したが、本発明は上記実施形態に限定されるものではない。 The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment.
 以下、実施例及び比較例に基づき本発明をさらに具体的に説明するが、本発明は以下の実施例に何ら限定されるものではない。 Hereinafter, the present invention will be described more specifically based on examples and comparative examples, but the present invention is not limited to the following examples.
[1,3,5-トリス(3-メルカプトブチルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオンの合成]
 1,3,5-トリス(2-ヒドロキシエチル)-1,3,5-トリアジン-2,4,6-(1H,3H,5H)-トリオン120mmol(31.35g)、3-メルカプト酪酸(淀化学株式会社製)378mmol(45.42g)、p-トルエンスルホン酸・1水和物(純正化学株式会社製)8.1mmol(1.51g)、及び、トルエン63gを100mlナスフラスコに仕込み、Dean-Stark装置及び冷却管を装着した。内容物を撹拌しながらオイルバス温度140℃で加熱して4時間反応させた。その後放冷し、10%炭酸水素ナトリウム水溶液100mlで、反応液を中和した。さらに反応液をイオン交換水にて3回洗浄した後、無水硫酸マグネシウム(純正化学株式会社製)にて脱水・乾燥を行った。次にトルエンを留去し、1,3,5-トリス(3-メルカプトブチルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン(上記式(1)で表される、チオール基を有する化合物)を得た。得られた化合物は高粘度の無色透明の液体であった。これを以下、チオールAと呼ぶ。
[Synthesis of 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione]
1,3,5-tris (2-hydroxyethyl) -1,3,5-triazine-2,4,6- (1H, 3H, 5H) -trione 120 mmol (31.35 g), 3-mercaptobutyric acid (淀Chemical Co., Ltd.) 378 mmol (45.42 g), p-toluenesulfonic acid monohydrate (Pure Chemical Co., Ltd.) 8.1 mmol (1.51 g), and toluene 63 g were charged into a 100 ml eggplant flask, and Dean. -A Stark device and a cooling tube were installed. The contents were heated at an oil bath temperature of 140 ° C. with stirring and reacted for 4 hours. Thereafter, the mixture was allowed to cool, and the reaction solution was neutralized with 100 ml of 10% aqueous sodium hydrogen carbonate solution. Further, the reaction solution was washed three times with ion-exchanged water, and then dehydrated and dried with anhydrous magnesium sulfate (manufactured by Junsei Chemical Co., Ltd.). Next, toluene was distilled off, and 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione (the above formula ( A compound having a thiol group represented by 1) was obtained. The obtained compound was a highly transparent and colorless liquid. This is hereinafter referred to as thiol A.
[ペンタエリストール テトラキス(3-メルカプトブチレート)の合成]
 2,2-ビス(ヒドロキシメチル)1,2-プロパンジオール(ペンタエリストール、広栄化学工業株式会社製)60mmol(8.17g)、3-メルカプト酪酸(淀化学株式会社製)252mmol(30.28g)、p-トルエンスルホン酸・1水和物(純正化学株式会社製)5.2mmol(0.98g)、及び、トルエン40gを100mlナスフラスコに仕込み、Dean-Stark装置及び冷却管を装着した。内容物を撹拌しながらオイルバス温度140℃で加熱して4時間反応させた。その後放冷し、10%炭酸水素ナトリウム水溶液100mlで、反応液を中和した。さらに反応液をイオン交換水にて3回洗浄した後、無水硫酸マグネシウム(純正化学株式会社製)にて脱水・乾燥を行った。次にトルエンを留去し、ペンタエリストール テトラキス(3-メルカプトブチレート)(上記式(2)で表される、チオール基を有する化合物)を得た。得られた化合物は高粘度の無色透明の液体であった。これを以下、チオールBと呼ぶ。
[Synthesis of pentaerythrole tetrakis (3-mercaptobutyrate)]
2,2-bis (hydroxymethyl) 1,2-propanediol (pentaerystol, manufactured by Guangei Chemical Industry Co., Ltd.) 60 mmol (8.17 g), 3-mercaptobutyric acid (manufactured by Sakai Chemical Co., Ltd.) 252 mmol (30.28 g) ), 5.2 mmol (0.98 g) of p-toluenesulfonic acid monohydrate (manufactured by Junsei Chemical Co., Ltd.) and 40 g of toluene were charged into a 100 ml eggplant flask and equipped with a Dean-Stark apparatus and a condenser. The contents were heated at an oil bath temperature of 140 ° C. with stirring and reacted for 4 hours. Thereafter, the mixture was allowed to cool, and the reaction solution was neutralized with 100 ml of 10% aqueous sodium hydrogen carbonate solution. Further, the reaction solution was washed three times with ion-exchanged water, and then dehydrated and dried with anhydrous magnesium sulfate (manufactured by Junsei Chemical Co., Ltd.). Next, toluene was distilled off to obtain pentaerythritol tetrakis (3-mercaptobutyrate) (a compound having a thiol group represented by the above formula (2)). The obtained compound was a highly transparent and colorless liquid. This is hereinafter referred to as thiol B.
[実施例1]
 熱可塑性樹脂としてポリエステルウレタン樹脂(UR-8200,東洋紡株式会社製,30%溶液)を不揮発分換算で40質量部、ポリウレタン樹脂(T-6075N、ディーアイシー バイエル ポリマー株式会社製)をメチルエチルケトンに溶解して得られた15質量%溶液を不揮発分換算で10質量部、エチレン-酢酸ビニル共重合体(EV40W、三井デュポンポリケミカル株式会社製)をトルエンに溶解して得られた20質量%溶液を不揮発分換算で10質量部、ラジカル重合性物質として、ウレタンアクリレートオリゴマー(UA5500T、新中村化学工業株式会社製)のトルエン溶解品70質量%溶液を不揮発分換算で25質量部、ジシクロペンタジエン型ジアクリレート(DCP-A、東亞合成株式会社製)を5質量部、イソシアヌル酸EO変成ジアクリレート(東亞合成株式会社製、M-215)を5質量部及び2-メタクリロイロキシエチルアシッドホスフェート(P-2M、共栄社化学株式会社製)を3質量部、2級チオール基を有する化合物としてチオールA(分子量567.7)を4質量部、ラジカル重合開始剤として2,5-ジメチル-2,5-ジ(2-エチルヘキサノイル)ヘキサン(パーヘキサ25O,日油株式会社製)を4質量部(パーヘキサ25Oは50%溶液であるため、製品の配合量は8質量部)、ジ-(3-メチルベンゾイル)パーオキシドとベンゾイル(3-メチルベンゾイル)パーオキシドとジベンゾイルパーオキシドとの混合物(ナイパーBMT-K40,日油株式会社製)3質量部(ナイパーBMTは40%溶液であるため、製品の配合量は7.5質量部)配合し、さらに、ポリスチレンを核とする粒子の表面に、厚み0.2μmのニッケル層を設け、このニッケル層の外側に、厚み0.04μmの金層を設けた平均粒径10μmの導電性粒子を6質量部配合し、混合した。この混合溶液をアプリケータでPETフィルム上に塗布し、70℃10分の熱風乾燥により、接着剤層の厚み35μmの回路接続材料を得た。この実施例1における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は10.5質量部である。
[Example 1]
Polyester urethane resin (UR-8200, manufactured by Toyobo Co., Ltd., 30% solution) as a thermoplastic resin is dissolved in methyl ethyl ketone by dissolving 40 parts by mass in terms of non-volatile content and polyurethane resin (T-6075N, manufactured by DIC Bayer Polymer Co., Ltd.). 10 parts by mass of the 15% by mass solution obtained in terms of non-volatile content, and 20% by mass solution obtained by dissolving ethylene-vinyl acetate copolymer (EV40W, Mitsui DuPont Polychemical Co., Ltd.) in toluene. 10 parts by weight in terms of a fraction, 25 parts by weight of a 70 mass% solution of a urethane acrylate oligomer (UA5500T, manufactured by Shin-Nakamura Chemical Co., Ltd.) as a radical polymerizable substance in terms of non-volatiles, a dicyclopentadiene diacrylate (DCP-A, manufactured by Toagosei Co., Ltd.) 5 parts by mass of cyanuric acid EO-modified diacrylate (manufactured by Toagosei Co., Ltd., M-215) and 2 parts by mass of 2-methacryloyloxyethyl acid phosphate (P-2M, manufactured by Kyoeisha Chemical Co., Ltd.), secondary thiol group 4 parts by mass of thiol A (molecular weight 567.7) as a compound having a hydrogen atom, and 2,5-dimethyl-2,5-di (2-ethylhexanoyl) hexane (Perhexa 25O, manufactured by NOF Corporation) as a radical polymerization initiator ) 4 parts by weight (perhexa25O is a 50% solution, so the amount of product is 8 parts by weight), di- (3-methylbenzoyl) peroxide, benzoyl (3-methylbenzoyl) peroxide and dibenzoyl peroxide 3 parts by weight of the mixture (Niper BMT-K40, manufactured by NOF Corporation) (Since Niper BMT is a 40% solution, The blending amount of the product is 7.5 parts by mass), and a nickel layer having a thickness of 0.2 μm is provided on the surface of particles having polystyrene as a core, and a gold layer having a thickness of 0.04 μm is provided outside the nickel layer. 6 parts by mass of conductive particles having an average particle diameter of 10 μm provided with a mixture were mixed. This mixed solution was applied onto a PET film with an applicator and dried with hot air at 70 ° C. for 10 minutes to obtain a circuit connecting material having an adhesive layer thickness of 35 μm. In this Example 1, the compounding amount of the compound having a secondary thiol group is 10.5 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
[実施例2]
 チオールA(分子量567.7)の配合量を3質量部としたこと以外は、実施例1と同様にして回路接続材料を得た。この実施例2における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は7.89質量部である。
[Example 2]
A circuit connection material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 3 parts by mass. In this Example 2, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M) is 7.89 parts by mass. It is.
[実施例3]
 チオールA(分子量567.7)の配合量を6質量部としたこと以外は、実施例1と同様にして回路接続材料を得た。この実施例3における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は15.8質量部である。
[Example 3]
A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 6 parts by mass. In this Example 3, the compounding amount of the compound having a secondary thiol group is 15.8 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M). It is.
[実施例4]
 ポリエステルウレタン樹脂(UR8240)の配合量を不揮発分換算で34質量部、ジシクロペンタジエン型ジアクリレート(DCP-A)の配合量を8質量部、イソシアヌル酸EO変成ジアクリレート(東亞合成株式会社製,M-215)の配合量を8質量部としたこと以外は、実施例1と同様にして回路接続材料を得た。この実施例4における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は9.09質量部である。
[Example 4]
The blending amount of polyester urethane resin (UR8240) is 34 parts by mass in terms of nonvolatile content, the blending amount of dicyclopentadiene diacrylate (DCP-A) is 8 parts by mass, isocyanuric acid EO modified diacrylate (manufactured by Toagosei Co., Ltd., A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of M-215) was 8 parts by mass. In Example 4, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M) is 9.09 parts by mass. It is.
[実施例5]
 チオールAに代えてチオールB(分子量:544.77)3質量部を用いたこと以外は、実施例1と同様にして回路接続材料を得た。この実施例5における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は7.89質量部である。
[Example 5]
A circuit connecting material was obtained in the same manner as in Example 1 except that 3 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A. In this Example 5, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M) is 7.89 parts by mass. It is.
[実施例6]
 チオールAに代えてチオールB(分子量:544.77)6質量部を用いたこと以外は、実施例1と同様にして回路接続材料を得た。この実施例6における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100配合部に対する、2級チオール基を有する化合物の配合量は15.8質量部である。
[Example 6]
A circuit connecting material was obtained in the same manner as in Example 1 except that 6 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A. In this Example 6, the compounding amount of the compound having a secondary thiol group is 15.8 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
[比較例1]
 チオールA(分子量567.7)の配合量を2質量部としたこと以外は、実施例1と同様にして回路接続材料を得た。この比較例1における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は5.26質量部である。
[Comparative Example 1]
A circuit connecting material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 2 parts by mass. In Comparative Example 1, the compounding amount of the compound having a secondary thiol group is 5.26 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
[比較例2]
 チオールA(分子量567.7)の配合量を8質量部としたこと以外は、実施例1と同様にして回路接続材料を得た。この比較例1における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は21.1質量部である。
[Comparative Example 2]
A circuit connection material was obtained in the same manner as in Example 1 except that the amount of thiol A (molecular weight 567.7) was 8 parts by mass. In Comparative Example 1, the compounding amount of the compound having a secondary thiol group is 21.1 parts by mass with respect to 100 parts by mass of the radically polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M). It is.
[比較例3]
 チオールA(分子量567.7)の配合量を2質量部としたこと以外は、実施例4と同様にして回路接続材料を得た。この比較例3における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は4.55質量部である。
[Comparative Example 3]
A circuit connecting material was obtained in the same manner as in Example 4 except that the amount of thiol A (molecular weight 567.7) was 2 parts by mass. In Comparative Example 3, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M) is 4.55 parts by mass. It is.
[比較例4]
 チオールA(分子量567.7)の配合量を8質量部としたこと以外は、実施例4と同様にして回路接続材料を得た。この比較例4における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は18.2質量部である。
[Comparative Example 4]
A circuit connection material was obtained in the same manner as in Example 4 except that the amount of thiol A (molecular weight 567.7) was 8 parts by mass. In this Comparative Example 4, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (here, UA5500, DCP-A, M-215 and P-2M) is 18.2 parts by mass. It is.
[比較例5]
 チオールAに代えてチオールB(分子量:544.77)8質量部を用いたこと以外は、実施例4と同様にして回路接続材料を得た。この比較例5における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は18.2質量部である。
[Comparative Example 5]
A circuit connecting material was obtained in the same manner as in Example 4 except that 8 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A. In Comparative Example 5, the compounding amount of the compound having a secondary thiol group with respect to 100 parts by mass of the radical polymerizable substance (referred to here as UA5500, DCP-A, M-215 and P-2M) is 18.2 parts by mass. It is.
[比較例6]
 チオールAに代えてチオールB(分子量:544.77)2質量部を用いたこと以外は、実施例1と同様にして回路接続材料を得た。この比較例6における、ラジカル重合性物質(ここではUA5500、DCP-A、M-215及びP-2Mを指す)100質量部に対する、2級チオール基を有する化合物の配合量は5.26質量部である。
[Comparative Example 6]
A circuit connection material was obtained in the same manner as in Example 1 except that 2 parts by mass of thiol B (molecular weight: 544.77) was used instead of thiol A. In Comparative Example 6, the compounding amount of the compound having a secondary thiol group is 5.26 parts by mass with respect to 100 parts by mass of the radical polymerizable substance (herein, UA5500, DCP-A, M-215 and P-2M). It is.
 表1及び表2に、実施例及び比較例の回路接続材料の組成を示す。 Tables 1 and 2 show the compositions of the circuit connection materials of Examples and Comparative Examples.
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
[接続構造体の作製(COFとPWBとの接続)]
 実施例1~6及び比較例1~6の各回路接続材料を用いて、厚み38μmのポリイミド上に直接形成された、ライン幅250μm、ピッチ500μm、厚み8μmの銅回路、銅表面には厚み0.2μmの錫めっきを施したフレキシブル回路板(COF-TEG)と、ライン幅250μm、ピッチ500μm、厚み35μmの銅回路を形成した、銅表面には厚み0.1μmの金めっきを施したガラスエポキシ多層プリント配線板(PWB-TEG)とを、130℃-2MPa-10秒、幅2.0mmで接続した。この際、ガラスエポキシ多層プリント配線版上に、回路接続材料の接着面を貼り付けた後、70℃、1MPa、2秒間加熱加圧して仮接続し、その後、PETフィルムを剥離してCOF-TEGと接続した。
[Production of connection structure (connection between COF and PWB)]
A copper circuit having a line width of 250 μm, a pitch of 500 μm, and a thickness of 8 μm formed directly on a polyimide having a thickness of 38 μm using the circuit connecting materials of Examples 1 to 6 and Comparative Examples 1 to 6, and a thickness of 0 on the copper surface. .2μm tin-plated flexible circuit board (COF-TEG) and line width 250μm, pitch 500μm, thickness 35μm copper circuit formed on the copper surface 0.1μm gold plated glass epoxy A multilayer printed wiring board (PWB-TEG) was connected at 130 ° C.-2 MPa-10 seconds with a width of 2.0 mm. At this time, after adhering the adhesive surface of the circuit connecting material on the glass epoxy multilayer printed wiring board, it is temporarily connected by heating and pressing at 70 ° C., 1 MPa for 2 seconds, and then the PET film is peeled off to remove COF-TEG. And connected.
[接着力の測定]
 作製した接続構造体について、90°で剥離するときの接着力を、剥離速度50mm/minで測定した。接着力の値が12N/cm以上である場合をA、12N/cm未満である場合をBとして評価した。得られた結果を表3及び表4に示す。
[Measurement of adhesive strength]
About the produced connection structure, the adhesive force when peeling at 90 ° was measured at a peeling speed of 50 mm / min. The case where the value of the adhesive force was 12 N / cm or more was evaluated as A, and the case where it was less than 12 N / cm was evaluated as B. The obtained results are shown in Tables 3 and 4.
[接続抵抗の測定]
 回路の接続後、接続部を含むFPC-PWBの隣接回路間の初期抵抗値をマルチメーターで測定し、次いで、接続構造体を温度40℃、湿度60%の環境下に5日間放置した後に、隣接回路間の抵抗値をマルチメーターで測定した。抵抗値は隣接回路間の抵抗値37点の平均値と最大値を測定した。最大値の変化率が3倍以内である場合をA、3倍より大きい場合をBとして、高温高湿試験85℃85%RH、500時間処理後の接続信頼性を評価した。なお最大値の変化率が少ないほど接続信頼性は良好である。得られた結果を表3及び表4に示す。
[Measurement of connection resistance]
After connecting the circuits, the initial resistance value between adjacent circuits of the FPC-PWB including the connection part was measured with a multimeter, and then the connection structure was left in an environment of a temperature of 40 ° C. and a humidity of 60% for 5 days. The resistance value between adjacent circuits was measured with a multimeter. As the resistance value, an average value and a maximum value of 37 resistance values between adjacent circuits were measured. When the maximum rate of change was 3 times or less, A was taken as B, and when it was larger than 3 times, the connection reliability after the high temperature and high humidity test at 85 ° C. and 85% RH for 500 hours was evaluated. The smaller the rate of change of the maximum value, the better the connection reliability. The obtained results are shown in Tables 3 and 4.
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
 表3及び表4に示すように、実施例1~6においては、ラフピッチの接続においても高い接着力と、優れた接続信頼性との両立を達成することができた。一方、比較例1,3,6では、ラフピッチの接続において十分な接着力が得られなかった。また、比較例4,5では、高い接着力は得られたものの、高温高湿処理後の接続抵抗が悪化し、十分な接続信頼性が得られなかった。 As shown in Tables 3 and 4, in Examples 1 to 6, it was possible to achieve both high adhesive force and excellent connection reliability even in rough pitch connection. On the other hand, in Comparative Examples 1, 3, and 6, sufficient adhesive force was not obtained in rough pitch connection. Moreover, in Comparative Examples 4 and 5, although high adhesive force was obtained, the connection resistance after the high-temperature and high-humidity treatment deteriorated, and sufficient connection reliability was not obtained.
 以下に、参考データとして、ファインピッチ接続における実施例および比較例の結果を示す。
[ファインピッチ接続構造体の作製(COFとPWBとの接続)]
 実施例1~6及び比較例1~6の各回路接続材料を用いて、厚み38μmのポリイミド上に直接形成された、ライン幅100μm、ピッチ200μm、厚み8μmの銅回路、銅表面には厚み0.2μmの錫めっきを施したフレキシブル回路板(COF-TEG)と、ライン幅100μm、ピッチ200μm、厚み35μmの銅回路を形成した、銅表面には厚み0.1μmの金めっきを施したガラスエポキシ多層プリント配線板(PWB-TEG)とを、130℃-2MPa-10秒、幅2.0mmで接続した。この際、ガラスエポキシ多層プリント配線版上に、回路接続材料の接着面を貼り付けた後、70℃、1MPa、2秒間加熱加圧して仮接続し、その後、PETフィルムを剥離してCOF-TEGと接続した。
Below, the result of the Example in a fine pitch connection and a comparative example is shown as reference data.
[Preparation of fine pitch connection structure (connection between COF and PWB)]
A copper circuit having a line width of 100 μm, a pitch of 200 μm, and a thickness of 8 μm formed directly on a polyimide having a thickness of 38 μm using the circuit connecting materials of Examples 1 to 6 and Comparative Examples 1 to 6, and a thickness of 0 on the copper surface. .2μm tin-plated flexible circuit board (COF-TEG) and line width 100μm, pitch 200μm, thickness 35μm copper circuit formed on the copper surface 0.1μm thick gold plated glass epoxy A multilayer printed wiring board (PWB-TEG) was connected at 130 ° C.-2 MPa-10 seconds with a width of 2.0 mm. At this time, after adhering the adhesive surface of the circuit connecting material on the glass epoxy multilayer printed wiring board, it is temporarily connected by heating and pressing at 70 ° C., 1 MPa for 2 seconds, and then the PET film is peeled off to remove COF-TEG. And connected.
 作製したファインピッチ接続構造体について、上記と同様にして接着力及び接続抵抗を測定した。得られた結果を表5及び表6に示す。 The adhesive strength and connection resistance of the produced fine pitch connection structure were measured in the same manner as described above. The obtained results are shown in Tables 5 and 6.
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
 ファインピッチでは、実施例1~6はいずれも良好な接着力を示したが、接続信頼性において、抵抗上昇が生じた。また、ファインピッチでは、比較例はいずれも良好な接着力を示し、ラジカル重合性物質100質量部に対する2級チオールの比率が7未満である比較例1、3、4、6では安定な接続信頼性が得られた。 In the fine pitch, each of Examples 1 to 6 showed good adhesive strength, but increased resistance in connection reliability. Further, in the fine pitch, all of the comparative examples show good adhesive strength, and in Comparative Examples 1, 3, 4, and 6 in which the ratio of the secondary thiol to 100 parts by mass of the radical polymerizable substance is less than 7, stable connection reliability Sex was obtained.
 以上に示すように、ファインピッチでは、接着力に関しては実施例と比較例において、大きな差はみられなかった。本発明はラフピッチの接続回路において有用性が増すと考える。 As described above, in the fine pitch, there was no significant difference in the adhesive strength between the example and the comparative example. The present invention is considered to be more useful in rough pitch connection circuits.
 1…接続構造体、7…導電性粒子、10…接着層、11…絶縁層、20…第一の回路部材、21…第一の回路基板、22…第一の回路電極(第一の接続端子)、30…第二の回路部材、31…第二の回路基板、32…第二の回路電極(第二の接続端子)。 DESCRIPTION OF SYMBOLS 1 ... Connection structure, 7 ... Electroconductive particle, 10 ... Adhesive layer, 11 ... Insulating layer, 20 ... 1st circuit member, 21 ... 1st circuit board, 22 ... 1st circuit electrode (1st connection Terminal), 30 ... second circuit member, 31 ... second circuit board, 32 ... second circuit electrode (second connection terminal).

Claims (10)

  1.  第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成された第二の回路部材とを、前記第一の回路電極及び前記第二の回路電極を対向配置させた状態で接続するための回路接続材料であって、
     ラジカル重合開始剤と、ラジカル重合性物質と、チオール基を有し、該チオール基が結合した炭素原子に結合する水素原子の数が1又は0であるチオール化合物と、を含有し、
     前記チオール化合物の含有量が、前記ラジカル重合性物質100質量部に対して、7~17質量部である、回路接続材料。
    A first circuit member having a first circuit electrode formed on the main surface of the first substrate; and a second circuit member having a second circuit electrode formed on the main surface of the second substrate. A circuit connection material for connecting the first circuit electrode and the second circuit electrode in a state of being opposed to each other,
    A radical polymerization initiator, a radical polymerizable substance, and a thiol compound having a thiol group, wherein the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0,
    The circuit connecting material, wherein the content of the thiol compound is 7 to 17 parts by mass with respect to 100 parts by mass of the radical polymerizable substance.
  2.  前記チオール化合物の分子量が400以上である、請求項1に記載の回路接続材料。 The circuit connection material according to claim 1, wherein the molecular weight of the thiol compound is 400 or more.
  3.  前記第一の回路部材又は前記第二の回路部材が、前記第一の基板又は前記第二の基板の主面上に0.5mm以上の接続ピッチで前記第一の回路電極又は前記第二の回路電極が形成された領域を有する、請求項1又は2に記載の回路接続材料。 Said 1st circuit member or said 2nd circuit member is said 1st circuit electrode or said 2nd with the connection pitch of 0.5 mm or more on the main surface of said 1st board | substrate or said 2nd board | substrate. The circuit connection material according to claim 1, which has a region in which circuit electrodes are formed.
  4.  第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、
     第二の基板の主面上に第二の回路電極が形成され、前記第二の回路電極と前記第一の回路電極とが相対向するように配置された第二の回路部材と、
     前記第一の回路部材と前記第二の回路部材との間に設けられ、前記第一の回路部材と前記第二の回路部材とを電気的に接続する接着層と、を備え、
     前記接着層が、請求項1~3のいずれか一項に記載の回路接続材料を前記第一の回路部材と前記第二の回路部材との間に介在させ、加熱及び加圧することにより形成されたものである、接続構造体。
    A first circuit member having a first circuit electrode formed on a main surface of the first substrate;
    A second circuit member is formed on the main surface of the second substrate, and the second circuit member is disposed so that the second circuit electrode and the first circuit electrode face each other;
    An adhesive layer provided between the first circuit member and the second circuit member and electrically connecting the first circuit member and the second circuit member;
    The adhesive layer is formed by interposing the circuit connecting material according to any one of claims 1 to 3 between the first circuit member and the second circuit member, and heating and pressing. A connection structure.
  5.  前記第一の回路部材又は前記第二の回路部材が、前記第一の基板又は前記第二の基板の主面上に0.5mm以上の接続ピッチで前記第一の回路電極又は前記第二の回路電極が形成された領域を有する、請求項4に記載の接続構造体。 Said 1st circuit member or said 2nd circuit member is said 1st circuit electrode or said 2nd with the connection pitch of 0.5 mm or more on the main surface of said 1st board | substrate or said 2nd board | substrate. The connection structure according to claim 4, comprising a region in which circuit electrodes are formed.
  6.  第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、
     第二の基板の主面上に第二の回路電極が形成された第二の回路部材と、
     請求項1~3のいずれか一項に記載の回路接続材料と、を、
     前記第一の回路電極と前記第二の回路電極とが前記回路接続材料を介して相対向するように配置された状態で加熱及び加圧して、前記第一の回路電極と前記第二の回路電極とを電気的に接続する工程を備える、接続構造体の製造方法。
    A first circuit member having a first circuit electrode formed on a main surface of the first substrate;
    A second circuit member having a second circuit electrode formed on the main surface of the second substrate;
    The circuit connection material according to any one of claims 1 to 3,
    The first circuit electrode and the second circuit are heated and pressurized in a state where the first circuit electrode and the second circuit electrode are arranged so as to face each other with the circuit connecting material therebetween. A method for manufacturing a connection structure, comprising a step of electrically connecting an electrode.
  7.  前記第一の回路部材又は前記第二の回路部材が、前記第一の基板又は前記第二の基板の主面上に0.5mm以上の接続ピッチで前記第一の回路電極又は前記第二の回路電極が形成された領域を有する、請求項6に記載の接続構造体の製造方法。 Said 1st circuit member or said 2nd circuit member is said 1st circuit electrode or said 2nd with the connection pitch of 0.5 mm or more on the main surface of said 1st board | substrate or said 2nd board | substrate. The manufacturing method of the connection structure of Claim 6 which has the area | region in which the circuit electrode was formed.
  8.  ラジカル重合開始剤と、ラジカル重合性物質と、チオール基を有し、該チオール基が結合した炭素原子に結合する水素原子の数が1又は0であるチオール化合物と、を含有し、
     前記チオール化合物の含有量が、前記ラジカル重合性物質100質量部に対して、7~17質量部である、回路接続材料の、
     第一の基板の主面上に第一の回路電極が形成された第一の回路部材と、第二の基板の主面上に第二の回路電極が形成された第二の回路部材とを、前記第一の回路電極及び前記第二の回路電極を対向配置させた状態で接続するための、使用。
    A radical polymerization initiator, a radical polymerizable substance, and a thiol compound having a thiol group, wherein the number of hydrogen atoms bonded to the carbon atom to which the thiol group is bonded is 1 or 0,
    The content of the thiol compound is 7 to 17 parts by mass with respect to 100 parts by mass of the radical polymerizable substance.
    A first circuit member having a first circuit electrode formed on the main surface of the first substrate; and a second circuit member having a second circuit electrode formed on the main surface of the second substrate. Use for connecting the first circuit electrode and the second circuit electrode in a state of facing each other.
  9.  前記チオール化合物の分子量が400以上である、請求項8に記載の使用。 The use according to claim 8, wherein the molecular weight of the thiol compound is 400 or more.
  10.  前記第一の回路部材又は前記第二の回路部材が、前記第一の基板又は前記第二の基板の主面上に0.5mm以上の接続ピッチで前記第一の回路電極又は前記第二の回路電極が形成された領域を有する、請求項8又は9に記載の使用。 Said 1st circuit member or said 2nd circuit member is said 1st circuit electrode or said 2nd with the connection pitch of 0.5 mm or more on the main surface of said 1st board | substrate or said 2nd board | substrate. 10. Use according to claim 8 or 9, having a region in which circuit electrodes are formed.
PCT/JP2013/061216 2012-04-13 2013-04-15 Circuit connection material, connection structure, and fabrication method for same WO2013154203A1 (en)

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