WO2013146680A1 - Dispositif de vaporisation - Google Patents

Dispositif de vaporisation Download PDF

Info

Publication number
WO2013146680A1
WO2013146680A1 PCT/JP2013/058576 JP2013058576W WO2013146680A1 WO 2013146680 A1 WO2013146680 A1 WO 2013146680A1 JP 2013058576 W JP2013058576 W JP 2013058576W WO 2013146680 A1 WO2013146680 A1 WO 2013146680A1
Authority
WO
WIPO (PCT)
Prior art keywords
heating
static mixer
unit
flow path
mixed fluid
Prior art date
Application number
PCT/JP2013/058576
Other languages
English (en)
Japanese (ja)
Inventor
永井 秀明
隆 久江
Original Assignee
株式会社ブイテックス
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ブイテックス filed Critical 株式会社ブイテックス
Publication of WO2013146680A1 publication Critical patent/WO2013146680A1/fr

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/22Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222In rotating vessels; vessels with movable parts
    • B01D1/223In rotating vessels; vessels with movable parts containing a rotor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles

Definitions

  • the present invention relates to a vaporizer.
  • TEOS tetraethoxysilane
  • CVD Chemical Vapor Deposition
  • US Patent Application Publication No. 2005/0147749 discloses an apparatus for heating a mixed fluid that passes through a plurality of axially extending heating flow paths with a heater to vaporize material droplets. Yes.
  • two blocks provided with a plurality of heating channels are arranged in the chamber so as to be separated in the axial direction. Thereby, a part of the mixed fluid is caused to flow backward in the chamber to increase the moving distance of the mixed fluid and to increase the heating time of the material droplet.
  • the mixed fluid in the apparatus is insufficiently stirred, and there is a possibility that the distribution of material droplets in the mixed fluid is biased. If the distribution of the material droplets is biased, a part of the material droplets may not be vaporized and a large number of material droplets may reach the filter unit. In this case, the amount of material gas obtained from the vaporizer decreases with respect to the liquid material supplied to the vaporizer. In addition, the material droplets adhering to the filter unit may solidify and the filter unit may be clogged.
  • the present invention is directed to a vaporizer and aims to improve the vaporization efficiency of the vaporizer.
  • the vaporization apparatus includes a supply port to which a mixed fluid of a carrier gas and a fine droplet of material is supplied, a heating channel portion provided with a plurality of heating channels extending in an axial direction parallel to the central axis, A static mixer portion that stirs the mixed fluid that has passed in the axial direction and passed through the heating channel portion, and is disposed outside the heating channel portion and the static mixer portion in a radial direction centered on the central axis.
  • a heating section that heats the heating flow path section and the static mixer section; a filter section that allows gas to pass through the mixed fluid that has passed through the static mixer section; and the gas that has passed through the filter section is discharged. And a discharge port. According to the vaporizer, vaporization efficiency can be improved.
  • the supply port is disposed on the central axis
  • the plurality of heating flow paths are disposed in a cylindrical region centered on the central axis
  • the static mixer A portion is provided circumferentially around the central axis at a position facing the outer peripheral portion of the heating channel portion
  • a diffusion space is provided that is continuous with the plurality of heating channels in the axial direction, and the heating
  • the mixed fluid that has passed through the flow path part diffuses outward in the radial direction in the diffusion space and is guided to the static mixer part.
  • the plurality of heating flow paths are a first flow path disposed on the central axis, and each cross-sectional area is smaller than the cross-sectional area of the first flow path, and the first flow path is the center. And a plurality of second flow paths arranged around the first flow path.
  • the static mixer section is provided outside the plurality of heating channels in the radial direction.
  • the heating channel portion overlaps with the static mixer unit in the radial direction, and the mixed fluid that has passed through the heating channel unit includes the heating channel unit and the static mixer unit. Is passed through the gap provided between the two, and is guided to the static mixer section.
  • FIG. 1 is a longitudinal sectional view showing a vaporizer 1 according to a first embodiment of the present invention.
  • the vaporizer 1 is an apparatus that vaporizes a material such as tetraethoxysilane (TEOS) by heating.
  • TEOS tetraethoxysilane
  • the material vaporized by the vaporizer 1 is supplied to, for example, a CVD (Chemical Vapor Deposition) apparatus.
  • CVD Chemical Vapor Deposition
  • the vaporizer 1 includes a substantially cylindrical main body 7, a main body heating part 5 that heats the main body part 7, and a housing 6 that accommodates the main body part 7 and the main body heating part 5 therein.
  • the main body heating unit 5 is a band heater that is wound around the outer peripheral surface 75 of the main body unit 7 and covers the outer peripheral surface 75 over substantially the entire circumference in the circumferential direction around the central axis J1.
  • a heat insulating material 61 is provided over substantially the entire inner peripheral surface parallel to the central axis J1.
  • the main body portion 7 includes a supply port 11, a heating channel portion 2, a static mixer portion 3, a filter portion 4, and a discharge port 12.
  • the supply port 11 is disposed on the front side in the axial direction parallel to the central axis J1
  • the discharge port 12 is disposed on the rear side in the axial direction.
  • the supply port 11 is a circular opening centered on the central axis J1, and is disposed on the central axis J1.
  • a gas supply pipe 13 and a material supply pipe 14 are connected to the supply port 11.
  • the gas supply pipe 13 is connected to a gas supply source (not shown), and the carrier gas supplied from the gas supply source is guided toward the supply port 11 through the gas supply pipe 13.
  • the material supply pipe 14 is connected to a material supply source (not shown), and the liquid material supplied from the material supply source is guided toward the supply port 11 through the material supply pipe 14.
  • the material and the carrier gas are mixed to generate micro droplets of the material.
  • a mixed fluid of the carrier gas and the material fine droplets is supplied to the supply port 11.
  • TEOS tetraethoxysilane
  • N 2 nitrogen
  • FIG. 2 is a cross-sectional view of the vaporizer 1 cut at a position of I I -I I in FIG.
  • the rear side is seen from the front side of the vaporization apparatus 1, and the structure in the back of a cross section (namely, back side) is also shown collectively.
  • the heating channel portion 2 has a substantially columnar shape centered on the central axis J ⁇ b> 1 and is disposed behind the supply port 11. Between the supply port 11 and the heating flow path portion 2, a substantially cylindrical first diffusion space 16 centering on the central axis J1 is provided.
  • the diameter of the cross section perpendicular to the central axis J1 of the first diffusion space 16 is approximately equal to the diameter of the cross section perpendicular to the central axis J1 of the heating flow path section 2.
  • cross-section and “cross-sectional area” simply mean a cross-section perpendicular to the central axis J1 and the area of the cross-section (the same applies to other configurations).
  • the diameter, inner diameter and outer diameter of the cross section perpendicular to the central axis J1 are simply referred to as “diameter”, “inner diameter” and “outer diameter”, respectively.
  • the diameters of the heating channel portion 2 and the first diffusion space 16 are about 2/3 of the diameter of the main body portion 7.
  • the heating channel 2 is provided with a plurality of heating channels 24 extending in the axial direction.
  • the plurality of heating channels 24 include one first channel 21 and a plurality of second channels 22.
  • the first flow path 21 has a substantially cylindrical shape centered on the central axis J1, and is disposed on the central axis J1.
  • the plurality of second flow paths 22 are arranged around the first flow path 21 with the first flow path 21 as the center.
  • the plurality of heating channels 24, that is, the first channel 21 and the plurality of second channels 22 extend in the axial direction in parallel with each other, and are disposed in a substantially cylindrical region centered on the central axis J1.
  • Each second flow path 22 is also substantially cylindrical, and the cross-sectional area of each second flow path 22 is smaller than the cross-sectional area of the first flow path 21.
  • the diameter of the first flow path 21 is approximately equal to the diameter of the supply port 11.
  • the first flow path 21 and the plurality of second flow paths 22 are located on the rear side of the first diffusion space 16 in the axial direction and are continuous with the first diffusion space 16.
  • FIG. 3 is a cross-sectional view of the vaporizer 1 cut at a position I I I -I I I in FIG.
  • FIG. 3 as in FIG. 2, the rear side from the front side of the vaporizer 1 is seen, and the structure at the back of the cross section (that is, the rear side) is also shown.
  • the static mixer unit 3 is disposed behind the heating channel unit 2.
  • the second diffusion space 17 includes a main diffusion space 171 located between the heating flow path portion 2 and the static mixer portion 3 and an auxiliary diffusion space 172 located on the rear side of the main diffusion space 171.
  • the main diffusion space 171 has a substantially cylindrical shape centered on the central axis J1.
  • the diameter of the main diffusion space 171 is approximately equal to the diameter of the heating channel portion 2.
  • the main diffusion space 171 is located on the rear side of the first flow path 21 and the plurality of second flow paths 22 in the axial direction, and is continuous with the first flow path 21 and the plurality of second flow paths 22.
  • the auxiliary diffusion space 172 is convex in a dome shape from the front side to the rear side in the axial direction (that is, in the direction in which the mixed fluid flows from the heating flow path portion 2 flows), and is continuous with the main diffusion space 171.
  • the cross section of the auxiliary diffusion space 172 is substantially circular, and the area of the cross section gradually decreases as the distance from the main diffusion space 171 increases in the axial direction.
  • the diameter of the front edge of the auxiliary diffusion space 172 is approximately 2/3 of the diameter of the heating channel portion 2 (that is, the diameter of the main diffusion space 171), and is approximately four times the diameter of the first channel 21. .
  • the static mixer portion 3 is a substantially cylindrical portion extending in the axial direction around the central axis J1.
  • the static mixer unit 3 has a radial inner side centered on the central axis J1 and a front edge of the auxiliary diffusion space 172 with respect to the rear side edge of the main diffusion space 171 of the second diffusion space 17.
  • the auxiliary diffusion space 172 of the second diffusion space 17 is disposed on the radially inner side of the static mixer unit 3.
  • the static mixer portion 3 is provided in a circumferential shape around the central axis J1 at a position facing the outer peripheral portion of the heating flow path portion 2 in the axial direction.
  • the static mixer unit 3 includes a plurality (12 in this embodiment) of static mixers 31.
  • the plurality of static mixers 31 are arranged at equal intervals in the circumferential direction around the central axis J1.
  • Each of the plurality of static mixers 31 has a substantially cylindrical shape extending in the axial direction in parallel with each other, and has the same structure as each other.
  • the distances from the central axis J1 to the central axes of the plurality of static mixers 31 are equal to each other.
  • the plurality of static mixers 31 are located on the rear side of the main diffusion space 171 of the second diffusion space 17 in the axial direction and are continuous with the second diffusion space 17.
  • a plurality of (five in the present embodiment) mixing elements 312 are arranged in the axial direction in a substantially cylindrical channel extending in the axial direction.
  • Each mixing element 312 is obtained by twisting one end portion in the axial direction of a rectangular plate-shaped member by 180 ° around a central axis parallel to the axial direction.
  • the mixing elements 312 formed by twisting clockwise and the mixing elements 312 formed by twisting counterclockwise are alternately arranged in the axial direction.
  • each of the two mixing elements 312 adjacent in the axial direction is arranged so that the axial edges are orthogonal.
  • the filter unit 4 has a substantially cylindrical shape extending in the axial direction with the central axis J1 as the center, and is disposed on the rear side of the static mixer unit 3.
  • the diameter of the filter unit 4 is smaller than the inner diameter of the static mixer unit 3, and the front end of the filter unit 4 is positioned on the inner side in the axial direction of the rear end of the static mixer unit 3.
  • the front end of the filter unit 4 overlaps the rear end of the static mixer unit 3 in the radial direction
  • the outer surface of the front end of the filter unit 4 is the inner surface of the rear end of the static mixer unit 3.
  • the side wall portion (that is, the side surface substantially parallel to the central axis J1) of the filter portion 4 is a sintered filter through which only gas can pass.
  • the discharge port 12 is a circular opening centered on the central axis J1, and is disposed on the central axis J1 behind the filter unit 4.
  • the gas that has passed through the filter unit 4 is discharged from the discharge port 12 to the outside of the main body unit 7.
  • a pipe 121 is connected to the discharge port 12, and the gas discharged from the discharge port 12 is supplied to the CVD apparatus or the like through the pipe 121.
  • the main body portion 7 is formed by arranging the first lid member 71, the central portion 72 and the second lid member 73 from the front side in the axial direction to the rear side and fixing them with bolts or the like.
  • Each of the first lid member 71, the central portion 72, and the second lid member 73 is a substantially columnar member centered on the central axis J1.
  • the central part 72 has a static mixer part 3.
  • the central portion 72 has a first recess 723 that is recessed from the end surface 721 on the axial front side toward the end surface 722 on the rear side in the axial direction, and a first recess that is recessed from the end surface 722 on the rear side in the axial direction toward the end surface 721 on the front side in the axial direction.
  • the static mixer unit 3 is located on the outer side in the radial direction from the first recess 723 and the second recess 724.
  • the front portion of the first recess 723 has a substantially cylindrical shape centered on the central axis J1
  • the rear portion of the first recess 723 has a dome shape centered on the central axis J1.
  • the second recess 724 has a substantially cylindrical shape with the central axis J1 as the center.
  • the first lid member 71 is attached to the front end surface 721 of the central portion 72. By attaching the first lid member 71 to the central portion 72, the first concave portion 723 of the central portion 72 becomes the second diffusion space 17, and the front and rear portions of the first concave portion 723 of the central portion 72 are the first and second portions, respectively.
  • the main diffusion space 171 and the auxiliary diffusion space 172 of the two diffusion spaces 17 are formed.
  • the first lid member 71 includes a first lid main body 711 attached to the front end surface 721 of the central portion 72 and a first lid end 712 attached to the front side of the first lid main body 711.
  • the first lid main body 711 has a substantially cylindrical shape centered on the central axis J1, and the first lid end 712 has a substantially disk shape centered on the central axis J1.
  • the first lid main body 711 has the heating channel portion 2 in the central portion in the radial direction, and a substantially cylindrical recess centering on the central axis J1 is provided on the front side of the heating channel portion 2.
  • the concave portion becomes the first diffusion space 16 by attaching the first lid end portion 712 to the front end face of the first lid main body 711.
  • the first lid end 712 has a supply port 11 at the center in the radial direction.
  • the second lid member 73 is attached to the end surface 722 on the rear side of the central portion 72.
  • the second lid member 73 includes a second lid main body 731 attached to the rear end surface 722 of the central portion 72, a second lid end 732 attached to the rear side of the second lid main body 731, and the above-mentioned.
  • a filter unit 4 The second lid body 731 has a substantially cylindrical shape having a through hole 733 centered on the central axis J1.
  • the through hole 733 includes a large diameter portion 734 positioned at the front end of the second lid main body 731, a small diameter portion 736 extending from the rear end of the second lid main body 731 to the vicinity of the front end, a large diameter portion 734, and a small diameter portion. 736 and an inclined portion 735 that connects 736 to each other.
  • the diameter of the large diameter portion 734 is approximately constant, and is approximately equal to the outer diameter of the static mixer portion 3, the diameter of the main diffusion space 171 of the second diffusion space 17, and the diameter of the heating flow path portion 2.
  • the large diameter portion 734 is continuous with the plurality of static mixers 31 of the static mixer portion 3 and the second concave portion 724 of the central portion 72.
  • the diameter of the small diameter portion 736 is approximately constant and smaller than the diameter of the large diameter portion 734.
  • the diameter of the small diameter portion 736 is approximately equal to the diameter of the second recess 724 in the central portion 72.
  • the diameter of the small diameter portion 736 and the diameter of the second concave portion 724 of the central portion 72 are larger than the diameter of the filter portion 4.
  • the diameter of the cross section of the inclined portion 735 gradually decreases from the front side to the rear side in the axial direction.
  • the second lid end portion 732 has a substantially disk shape centered on the central axis J1, and has a discharge port 12 in the central portion in the radial direction.
  • the filter unit 4 is attached to the front end surface of the second lid end portion 732.
  • the filter portion 4 is supported by the second lid portion end portion 732, and the through hole 733 of the second lid portion main body 731, and , Located in the second recess 724 of the central portion 72.
  • the second lid part end 732 is a filter support part that supports the filter part 4.
  • the filter part 4 does not directly contact the second lid part main body 731 and the central part 72.
  • the outer peripheral surface of the filter unit 4 is opposed to the inner peripheral surface of the through hole 733 and the inner peripheral surface of the second recess 724 in the radial direction.
  • the front end face of the filter unit 4 faces the bottom of the second recess 724 in the axial direction.
  • the main body heating unit 5 includes a first heating unit 51, a second heating unit 52, and a temperature control unit 53.
  • the first heating unit 51 covers the outer peripheral surface 75 of the main body 7 over the entire circumference in the circumferential direction from the center in the axial direction of the main body 7 to the front side.
  • the first heating unit 51 is disposed outside the supply port 11, the first diffusion space 16, the heating flow path unit 2, the second diffusion space 17, and the static mixer unit 3 in the radial direction.
  • the rear edge of the first heating unit 51 is located at a position about 2/3 of the length of the static mixer unit 3 from the front end of the static mixer unit 3 in the axial direction.
  • the first heating unit 51 heats the supply port 11, the first diffusion space 16, the heating channel unit 2, the second diffusion space 17, and about 2/3 of the portion from the front side of the static mixer unit 3.
  • the second heating unit 52 covers the outer peripheral surface 75 of the main body 7 over the entire circumference in the circumferential direction from the axial center to the rear side of the main body 7.
  • the second heating unit 52 is disposed outside the static mixer unit 3, the second recess 724, the through hole 733, the filter unit 4, and the discharge port 12 in the radial direction.
  • the front edge of the second heating unit 52 is located at about 1/3 of the length of the static mixer unit 3 from the rear end of the static mixer unit 3 in the axial direction.
  • the front edge of the second heating unit 52 is slightly separated from the rear edge of the first heating unit 51 in the axial direction.
  • the second heating unit 52 heats about one third of the portion from the rear side of the static mixer unit 3, the second recess 724, the through hole 733, the filter unit 4, and the discharge port 12.
  • the temperature control unit 53 individually controls the temperature of the first heating unit 51 and the temperature of the second heating unit 52, and each is maintained at a predetermined temperature. In the present embodiment, control by the temperature control unit 53 is performed so that the temperature of the first heating unit 51 is lower than the temperature of the second heating unit 52.
  • a part of the above-described mixed fluid (that is, microdroplets of material and carrier gas) supplied from the supply port 11 passes from the first diffusion space 16 to the first flow path of the heating flow path section 2.
  • 21 and a plurality of second flow paths 22 in the vicinity of the first flow path 21 flows into the second diffusion space 17, and flows from the main diffusion space 171 into the auxiliary diffusion space 172.
  • the mixed fluid that has flowed into the auxiliary diffusion space 172 returns to the main diffusion space 171 while being diffused radially outward and axially forward along the inner surface of the auxiliary diffusion space 172.
  • a part of the mixed fluid in the second diffusion space 17 diffuses radially outward in the main diffusion space 171 and is guided to the outer peripheral portion of the main diffusion space 171.
  • the other part of the mixed fluid in the second diffusion space 17 passes through the plurality of second flow paths 22 from the rear side to the front side in the axial direction and returns to the first diffusion space 16. Diffuses radially outward.
  • another part of the mixed fluid supplied from the supply port 11 (that is, the mixed fluid that has not flowed into the heating flow path portion 2 from the first diffusion space 16) is also radially outward in the first diffusion space 16.
  • the mixed fluid passes through the plurality of second flow paths 22 from the front side to the rear side in the axial direction and is guided to the outer periphery of the main diffusion space 171 of the second diffusion space 17. It is burned.
  • the fluid mixture on the outer periphery of the main diffusion space 171 flows into the plurality of static mixers 31 of the static mixer unit 3.
  • the mixed fluid that has flowed into the static mixer section 3 through the heating flow path section 2 is agitated by passing through a plurality of static mixers 31.
  • a mixed fluid that flows through the first diffusion space 16, a space constituted by the heating channel portion 2 and the second diffusion space 17 (hereinafter referred to as “front space 20”), and the static mixer portion 3. Is heated by the first heating unit 51 and the second heating unit 52.
  • material droplets fine droplets of material in the mixed fluid
  • the mixed fluid that has passed through the static mixer portion 3 spreads to the entire through-hole 733 and the second recess 724 via the large-diameter portion 734 of the through-hole 733.
  • only the gas can pass through the side wall of the filter unit 4, and only the carrier gas and the material gas out of the mixed fluid that has passed through the static mixer unit 3 pass through the side wall of the filter unit 4 to be filtered. It flows into the inside of the part 4 and is discharged from the discharge port 12.
  • the material droplet does not flow into the filter unit 4, and the through hole 733 and the second recess In 724, the material gas is heated by the second heating unit 52 and then flows into the filter unit 4.
  • the mixed fluid flows in various directions in the front space 20 as described above, so that the mixed fluid is efficiently stirred.
  • the uniformity of the distribution of the material droplets in the mixed fluid can be improved, and as a result, the vaporization efficiency of the material droplets can be improved.
  • the material gas and the carrier gas are stirred, and the uniformity of the concentration of the material gas in the mixed fluid is also improved.
  • the mixed fluid is further efficiently stirred in the static mixer unit 3.
  • the uniformity of the distribution of the material droplets in the mixed fluid can be further improved, and as a result, the vaporization efficiency of the material droplets can be further improved.
  • the uniformity of the concentration of the material gas in the mixed fluid can be further improved.
  • the second diffusion space 17 that is continuous with the heating channel portion 2 is provided on the axially rear side of the heating channel portion 2, and the mixed fluid that has passed through the heating channel portion 2. Is diffused radially outward in the second diffusion space 17 and guided to the static mixer unit 3.
  • the mixed fluid since the mixed fluid is efficiently stirred, the vaporization efficiency of the material droplets is further improved, and the uniformity of the concentration of the material gas in the mixed fluid is further improved.
  • auxiliary diffusion space 172 continuous to the main diffusion space 171 of the second diffusion space 17, a mixed fluid that returns from the auxiliary diffusion space 172 to the main diffusion space 171, and the main diffusion space 171 from the heating channel portion 2.
  • the mixed fluid that flows into the cylinder collides in the main diffusion space 171.
  • stirring of the mixed fluid in the second diffusion space 17 is promoted, the vaporization efficiency of the material droplets can be further improved, and the uniformity of the concentration of the material gas in the mixed fluid is further improved.
  • the auxiliary diffusion space 172 has the above-mentioned dome shape, the mixed fluid can be efficiently diffused radially outward.
  • the mixed fluid that has returned from the auxiliary diffusion space 172 to the main diffusion space 171 passes through the heating flow path portion 2 from the rear side to the front side in the axial direction, flows into the first diffusion space 16, and is supplied from the supply port 11. It collides with the mixed fluid spreading radially outward. Thereby, since the stirring of the mixed fluid in the first diffusion space 16 is promoted, the vaporization efficiency of the material droplets can be further improved, and the uniformity of the concentration of the material gas in the mixed fluid can be further improved. Can do.
  • the mixed fluid that has once passed through the heating flow path portion 2 from the front side in the axial direction to the rear side passes through the heating flow path portion 2 from the rear side in the axial direction to the front side, thereby mixing in the front space 20. The moving distance of the fluid can be increased. Thereby, the heating time of the mixed fluid can be increased while suppressing an increase in the size of the vaporizer 1, and the vaporization efficiency of the material droplets can be further improved.
  • a first flow path 21 having a larger cross-sectional area than the plurality of surrounding second flow paths 22 is provided in the central portion in the radial direction.
  • the mixed fluid supplied from the supply port 11 can be quickly guided to the second diffusion space 17.
  • the mixed fluid can be rapidly diffused radially outward, and the flow rate of the vaporizer 1 can be increased.
  • the diameter of the front edge of the auxiliary diffusion space 172 is larger than the diameter of the first flow path 21, the mixed fluid that has passed through the first flow path 21 can be easily diffused radially outward.
  • the outer peripheral surface 75 of the main body 7 is covered with the first heating unit 51 and the second heating unit 52, and the plurality of heating channels 24 (the first channel 21 and the first channel 21 and the heating channel unit 2).
  • a plurality of second flow paths 22) are provided intensively in the vicinity of the central axis J1 away from the outer peripheral surface 75 inward in the radial direction.
  • the static mixer unit 3 is provided in a circumferential shape at a position facing the outer peripheral part of the heating flow path unit 2, so that the static mixer unit 3 is located near the first heating unit 51 and the second heating unit 52. It can arrange
  • FIG. since there is no great difference in the distance from the outer peripheral surface 75 of the main body portion 7 at each position in the cross section of each static mixer 31, the mixed fluid flowing in the static mixer 31 can be heated almost uniformly. Furthermore, in the static mixer unit 3, a large flow path area through which the mixed fluid flows can be secured.
  • the temperature of the first heating unit 51 that heats the front space 20 and the front part of the static mixer unit 3, and the temperature of the second heating unit 52 that heats the rear part of the static mixer unit 3 and the filter unit 4. are individually controlled by the temperature control unit 53. Thereby, the mixed fluid can be appropriately heated at the front part and the rear part of the vaporizer 1. As a result, generation of by-products such as silicon dioxide can be suppressed, and clogging of the filter unit 4 can be suppressed.
  • the main body portion 7 is formed by attaching the first lid member 71 and the second lid member 73 to the front side and the rear side of the central portion 72. Further, the heating flow path unit 2 is provided in the first lid member 71, the static mixer unit 3 is provided in the central portion 72, and the filter unit 4 is provided in the second lid member 73. For this reason, by separating the first lid member 71, the central portion 72, and the second lid member 73, the heating channel portion 2, the static mixer portion 3 and the filter portion 4 can be easily maintained and replaced. Moreover, the kind and magnitude
  • the static mixer unit 3 is formed by arranging a plurality of static mixers 31 in the circumferential direction, the static mixer unit 3 can be easily formed using a commercially available static mixer or the like. .
  • FIG. 4 is a longitudinal sectional view showing the main body portion 7a and the main body heating portion 5 of the vaporizer 1a according to the second embodiment of the present invention.
  • FIG. 4 shows a longitudinal section including the central axis J1 of the vaporizer 1a.
  • the main body 7a has substantially the same structure as the main body 7 of the vaporizer 1 shown in FIG. 1 except that the heating flow path 2a is disposed on the radially inner side of the static mixer 3.
  • the main body heating unit 5 has the same structure as the main body heating unit 5 shown in FIG.
  • components corresponding to the components of the vaporizer 1 are denoted by the same reference numerals.
  • the heating channel portion 2a has a substantially cylindrical shape with the central axis J1 as the center, and the diameter of the heating channel portion 2a is smaller than the inner diameter of the static mixer portion 3.
  • a plurality of heating channels 23 having the same cross-sectional area extend in the axial direction.
  • the plurality of heating passages 23 are arranged so as to be distributed substantially evenly in the heating passage portion 2a with the central axis J1 as the center.
  • a substantially cylindrical first diffusion space 16a centering on the central axis J1 is provided between the heating flow path 23 and the supply port 11, a substantially cylindrical first diffusion space 16a centering on the central axis J1 is provided.
  • the diameter of the first diffusion space 16 a is slightly smaller than the diameter of the heating flow path 23.
  • the first diffusion space 16a is also arranged inside the static mixer unit 3 in the radial direction. In other words, the heating channel portion 2a and the first diffusion space 16a overlap the static mixer portion 3 in the radial direction.
  • a substantially cylindrical second diffusion space 17a centering on the central axis J1 is provided on the rear side in the axial direction of the heating flow path portion 2a.
  • the diameter of the second diffusion space 17a is slightly larger than the diameter of the heating flow path portion 2a.
  • the outer peripheral surface of the heating channel portion 2a and the outer peripheral surface of the cylindrical portion 161 forming the first diffusion space 16a are opposed to the inner peripheral surface of the static mixer portion 3 in the radial direction.
  • a gap 19 is provided between the inner peripheral surface of the static mixer unit 3 and the outer peripheral surfaces of the heating flow path unit 2 a and the cylindrical unit 161.
  • the rear end portion of the gap 19 continues to the outer peripheral portion of the second diffusion space 17a.
  • the front end portion of the gap 19 continues to the plurality of static mixers 31 of the static mixer unit 3 through a cylindrical space 191 having a short axial direction centered on the central axis J1.
  • the main body portion 7a is formed by arranging the first lid member 71, the central portion 72, and the second lid member 73 from the front side in the axial direction to the rear side and fixing them with bolts or the like.
  • Each of the first lid member 71, the central portion 72, and the second lid member 73 is a substantially columnar member centered on the central axis J1.
  • the central portion 72 has a first recess 723 that is recessed from the end surface 721 on the axial front side toward the end surface 722 on the rear side in the axial direction, and a first recess that is recessed from the end surface 722 on the rear side in the axial direction toward the end surface 721 on the front side in the axial direction. 2 recesses 724.
  • Each of the first recess 723 and the second recess 724 has a substantially cylindrical shape centered on the central axis J1. The diameter of the first recess 723 and the diameter of the second recess 724 are approximately equal.
  • the central portion 72 has a static mixer portion 3.
  • the static mixer portion 3 has a substantially annular surface on the outer side in the radial direction from the rear edge of the second recess 724 and on the inner side in the radial direction from the front edge of the large-diameter portion 734 of the through hole 733 described later. This is a substantially cylindrical portion extending forward in the axial direction.
  • the static mixer unit 3 is located on the outer side in the radial direction than the first recess 723 and the second recess 724.
  • the first lid member 71 includes a substantially disc-shaped first lid main body 711 centering on the central axis J1, and the above-described cylindrical portion 161 and the heating channel portion 2a protruding rearward from the first lid main body 711. And have.
  • the first lid member 71 has a supply port 11 in the central portion in the radial direction.
  • the first lid member 71 is attached to the front end surface 721 of the central portion 72 while inserting the heating channel portion 2 a and the cylindrical portion 161 into the first concave portion 723 of the central portion 72.
  • the first lid body 711 is a heating channel support unit that supports the cylindrical unit 161 and the heating channel unit 2a.
  • the structure of the second lid member 73 is substantially the same as that of the first embodiment, and the second lid member 73 is attached to the end surface 722 on the rear side of the central portion 72.
  • the second lid member 73 includes a second lid main body 731 attached to the rear end surface 722 of the central portion 72, a second lid end 732 attached to the rear side of the second lid main body 731, and a filter portion. 4.
  • the second lid body 731 has a substantially cylindrical shape having a through hole 733 centered on the central axis J1.
  • the through-hole 733 includes a large-diameter portion 734, an inclined portion 735, and a small-diameter portion 736, as in the first embodiment.
  • the large diameter portion 734 is continuous with the plurality of static mixers 31 of the static mixer portion 3 and the second concave portion 724 of the central portion 72.
  • the diameter of the small diameter portion 736 is approximately constant and is smaller than the diameter of the large diameter portion 734.
  • the diameter of the small diameter portion 736 is approximately equal to the diameter of the second recess 724 in the central portion 72.
  • the diameter of the small diameter portion 736 and the diameter of the second concave portion 724 of the central portion 72 are larger than the diameter of the filter portion 4.
  • the diameter of the cross section of the inclined portion 735 gradually decreases from the front side to the rear side in the axial direction.
  • the second lid end portion 732 has a substantially disk shape centered on the central axis J1, and has a discharge port 12 in the central portion in the radial direction.
  • the filter unit 4 is attached to the front end surface of the second lid end portion 732. In a state where the second lid end 732 is attached to the second lid main body 731, the filter unit 4 is supported by the second lid end 732, as in the first embodiment.
  • the second lid part end 732 is a filter support part that supports the filter part 4.
  • the first heating unit 51 and the second heating unit 52 of the main body heating unit 5 are respectively arranged on the outer peripheral surface 75 of the main body unit 7 from the axial center to the front side and the rear side. Is covered over the entire circumference in the circumferential direction.
  • the first heating unit 51 is disposed outside the supply port 11, the first diffusion space 16 a, the heating flow path unit 2 a, the second diffusion space 17 a, the gap 19, and the static mixer unit 3 in the radial direction.
  • the rear edge of the first heating unit 51 is located approximately at the center of the static mixer unit 3 in the axial direction.
  • the first heating part 51 heats the supply port 11, the first diffusion space 16 a, the heating flow path part 2 a, the second diffusion space 17 a, the gap 19, and the front part of the static mixer part 3.
  • the second heating unit 52 is disposed outside the static mixer unit 3, the second recess 724, the through hole 733, and the filter unit 4 in the radial direction.
  • the front edge of the second heating unit 52 is located approximately at the center of the static mixer unit 3 in the axial direction.
  • the front edge of the second heating unit 52 is slightly separated from the rear edge of the first heating unit 51 in the axial direction.
  • the second heating unit 52 heats the rear part of the static mixer unit 3, the second recess 724, the through hole 733, and the filter unit 4.
  • the temperature control unit 53 individually controls the temperature of the first heating unit 51 and the temperature of the second heating unit 52, and each is maintained at a predetermined temperature. In the present embodiment, control by the temperature control unit 53 is performed so that the temperature of the first heating unit 51 is lower than the temperature of the second heating unit 52.
  • the mixed fluid supplied from the supply port 11 (that is, the fine droplets of the material and the carrier gas) flows from the first diffusion space 16a into the plurality of heating channels 23 of the heating channel unit 2a.
  • the mixed fluid that has passed through the heating channel portion 2a from the axial front side to the axial rear side is diffused in the radial direction in the second diffusion space 17a, and is provided between the heating channel unit 2a and the static mixer unit 3.
  • the gap 19 is guided from the rear side in the axial direction to the front side in the axial direction to the static mixer unit 3.
  • the mixed fluid that has flowed into the static mixer unit 3 is stirred by passing through the plurality of static mixers 31.
  • the first diffusion space 16a, the heating channel portion 2a, the second diffusion space 17a and the gap 19 (hereinafter referred to as “inside space 20a”) and the static mixer portion 3 flow.
  • the mixed fluid is heated by the first heating unit 51 and the second heating unit 52.
  • the material droplets in the mixed fluid are vaporized into a material gas.
  • the mixed fluid that has passed through the static mixer unit 3 spreads to the through-hole 733 and the second recess 724, and only the carrier gas and the material gas in the mixed fluid are side walls of the filter unit 4. It passes through the part and flows into the filter part 4 and is discharged from the discharge port 12.
  • the mixed fluid that has passed through the inner space 20a is efficiently stirred in the static mixer unit 3.
  • the uniformity of the distribution of the material droplets in the mixed fluid can be improved, and as a result, the vaporization efficiency of the material droplets can be improved.
  • the uniformity of the concentration of the material gas in the mixed fluid can be improved.
  • the heating channel portion 2a overlaps with the static mixer unit 3 in the radial direction, and the mixed fluid that has passed through the heating channel unit 2a is provided between the heating channel unit 2a and the static mixer unit 3. It passes through the gap 19 and is guided to the static mixer unit 3.
  • the moving distance of the mixed fluid flowing from the heating flow path portion 2a to the static mixer portion 3 can be lengthened, and the heating time of the mixed fluid can be increased.
  • the vaporization efficiency of the droplet can be further improved.
  • the gap 19 provided between the part and the static mixer part 3 is mixed.
  • the static mixer unit 3 is provided outside the plurality of heating channels 23 in the radial direction. Thereby, the static mixer part 3 is arrange
  • the plurality of heating channels 23 of the heating channel unit 2a are separated from the first heating unit 51 and the second heating unit 52 inward in the radial direction by the central axis J1. It is provided intensively in the vicinity. Thereby, in the some heating flow path 23, the dispersion
  • the temperature of the first heating unit 51 that heats the inner space 20 a and the front part of the static mixer unit 3, and the temperature of the second heating unit 52 that heats the rear part of the static mixer unit 3 and the filter unit 4 are individually controlled by the temperature control unit 53.
  • the mixed fluid can be appropriately heated at the front part and the rear part of the vaporizer 1a.
  • generation of by-products such as silicon dioxide can be suppressed, and clogging of the filter unit 4 can be suppressed.
  • the heating channel portion 2a, the static mixer portion 3 and the filter portion 4 are separated by separating the first lid member 71, the central portion 72, and the second lid member 73. Can be easily maintained and replaced. Moreover, the kind and magnitude
  • the static mixer unit 3 is formed by arranging a plurality of static mixers 31 in the circumferential direction, the static mixer unit 3 can be easily formed using a commercially available static mixer or the like. .
  • the static mixer unit 3 is not necessarily provided at a position facing the outer peripheral portion of the heating flow channel unit 2 in the axial direction.
  • the static mixer unit 3 is centered on the central axis J1.
  • the static mixer portion 3 provided in a circumferential shape may be disposed outside the plurality of heating channels in the radial direction. Even in this case, the mixed fluid that has passed through the heating channel portion 2 is agitated in the static mixer portion 3, so that the uniformity of the distribution of the material droplets in the mixed fluid is improved, and Vaporization efficiency is improved. It is also possible to improve the uniformity of the concentration of the material gas in the mixed fluid.
  • the plurality of static mixers 31 are not necessarily arranged in the circumferential direction, and one substantially cylindrical static mixer 31 centering on the central axis J1 may be provided.
  • the structure of the static mixer 31 is not necessarily limited to that in which the mixing element is provided in the flow path.
  • a static mixer in which steel wool is accommodated in the flow path through which the mixed fluid passes may be used. Good.
  • vaporizers 1 and 1a various types of materials may be vaporized, and various types of carrier gases may be used.
  • temperature control may be performed so that the temperature of the first heating unit 51 is higher than the temperature of the second heating unit 52 in accordance with the characteristics of the material to be vaporized, etc.
  • the temperature control may be performed so that the temperature of the part 51 and the temperature of the second heating part 52 become equal.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Accessories For Mixers (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif de vaporisation (1) prévu avec : un orifice d'alimentation (11) à partir duquel un fluide mélangé d'un gaz porteur et des gouttelettes de matériau est fourni; et une section de trajet d'écoulement de chauffage (2) à laquelle une pluralité de trajets d'écoulement de chauffage (24) s'étendant dans une direction axiale parallèle à un axe central (J1) sont fournis; une section de mélangeur statique (3) pour mélanger le fluide ayant traversé la section de trajet d'écoulement de chauffage (2); une section de chauffage principale (5) pour chauffer la section de trajet d'écoulement de chauffage (2) et la section de mélangeur statique (3) à partir de l'extérieur dans la direction radiale; une section de filtre (4) à travers laquelle passe une vapeur du fluide mélangé ayant traversé la section de mélangeur statique (3); et un orifice de décharge (12) à partir duquel la vapeur qui a traversé la section de filtre (4) est déchargée. Dans la section de mélangeur statique (3), le fluide mélangé est efficacement agité et l'uniformité de distribution des gouttelettes de matériau dans le fluide mélangé est améliorée. Il est ainsi possible d'améliorer l'efficacité de vaporisation des gouttelettes de matériau.
PCT/JP2013/058576 2012-03-30 2013-03-25 Dispositif de vaporisation WO2013146680A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012079395A JP5885564B2 (ja) 2012-03-30 2012-03-30 気化装置
JP2012-079395 2012-03-30

Publications (1)

Publication Number Publication Date
WO2013146680A1 true WO2013146680A1 (fr) 2013-10-03

Family

ID=49259931

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2013/058576 WO2013146680A1 (fr) 2012-03-30 2013-03-25 Dispositif de vaporisation

Country Status (2)

Country Link
JP (1) JP5885564B2 (fr)
WO (1) WO2013146680A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019083987A1 (fr) * 2017-10-23 2019-05-02 Msp Corporation Appareil et procédé de génération de vapeur et de dépôt de film
US10287679B2 (en) 2015-05-11 2019-05-14 Msp Corporation Apparatus and method for vapor generation and film deposition
CN110965046A (zh) * 2019-12-31 2020-04-07 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
WO2022075111A1 (fr) * 2020-10-07 2022-04-14 東京エレクトロン株式会社 Dispositif de vaporisation, dispositif d'alimentation en gaz et procédé de commande pour dispositif d'alimentation en gaz
IL271279B1 (en) * 2017-06-21 2023-03-01 Cephalon Llc Wash buffer for cation exchange chromatography

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0480366A (ja) * 1990-07-20 1992-03-13 Nippon Sanso Kk 有機金属気相成長装置
JPH10337464A (ja) * 1997-06-04 1998-12-22 Ckd Corp 液体原料の気化装置
JP2000355765A (ja) * 1999-06-15 2000-12-26 Nippon Sanso Corp 気化器
JP2009188266A (ja) * 2008-02-07 2009-08-20 Tokyo Electron Ltd 液体原料気化器及びそれを用いた成膜装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0480366A (ja) * 1990-07-20 1992-03-13 Nippon Sanso Kk 有機金属気相成長装置
JPH10337464A (ja) * 1997-06-04 1998-12-22 Ckd Corp 液体原料の気化装置
JP2000355765A (ja) * 1999-06-15 2000-12-26 Nippon Sanso Corp 気化器
JP2009188266A (ja) * 2008-02-07 2009-08-20 Tokyo Electron Ltd 液体原料気化器及びそれを用いた成膜装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10287679B2 (en) 2015-05-11 2019-05-14 Msp Corporation Apparatus and method for vapor generation and film deposition
IL271279B1 (en) * 2017-06-21 2023-03-01 Cephalon Llc Wash buffer for cation exchange chromatography
IL271279B2 (en) * 2017-06-21 2023-07-01 Cephalon Llc Wash buffer for cation exchange chromatography
WO2019083987A1 (fr) * 2017-10-23 2019-05-02 Msp Corporation Appareil et procédé de génération de vapeur et de dépôt de film
CN111447982A (zh) * 2017-10-23 2020-07-24 Msp公司 用于蒸汽发生和薄膜沉积的设备和方法
CN111447982B (zh) * 2017-10-23 2022-09-13 Msp公司 用于蒸汽发生和薄膜沉积的设备和方法
CN110965046A (zh) * 2019-12-31 2020-04-07 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
CN110965046B (zh) * 2019-12-31 2024-05-28 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
WO2022075111A1 (fr) * 2020-10-07 2022-04-14 東京エレクトロン株式会社 Dispositif de vaporisation, dispositif d'alimentation en gaz et procédé de commande pour dispositif d'alimentation en gaz

Also Published As

Publication number Publication date
JP2013208524A (ja) 2013-10-10
JP5885564B2 (ja) 2016-03-15

Similar Documents

Publication Publication Date Title
WO2013146680A1 (fr) Dispositif de vaporisation
JP6796491B2 (ja) Cvd又はpvdコーティング装置にプロセスガス混合物を供給するための装置及び方法
JP4630226B2 (ja) シャワーヘッドを用いた化学気相蒸着方法及びその装置
JP6298493B2 (ja) 排気ガス流の混合方法
US6709264B2 (en) Catalytic combuster
JP2013239707A (ja) ガスシャワーヘッド、その製造方法及び薄膜成長反応装置
US20080230184A1 (en) Compact Total evaporator and Device For Carrying Out the Controlled Drying, Evaporation and/or Reaction of a Number of Fluids
KR20080074741A (ko) 배기 가스 정화 시스템
JP2015507132A (ja) 排気組立体
CN103912890B (zh) 催化燃烧器
RU2684151C1 (ru) Узел камеры сгорания и нагревательный прибор
KR20090110537A (ko) 화학 기상 증착 장치
US8763928B2 (en) Liquid material vaporizer
JP2005067990A (ja) 改質原料用蒸発器
US10605457B2 (en) Burner arrangement with resonator
TW201433355A (zh) 氣體混合裝置
JP6957857B2 (ja) 流体分散装置及び熱処理装置
JP2005056636A (ja) 燃料改質器用燃焼器
US11584990B2 (en) Bottom fed sublimation bed for high saturation efficiency in semiconductor applications
JP6061688B2 (ja) 触媒装置
WO2014002471A1 (fr) Dispositif de traitement de carburant
JP7188341B2 (ja) 燃焼器
JP2016044085A (ja) 水素生成装置
US20230087193A1 (en) Liquid material vaporizing device
KR20180093381A (ko) 촉매 연소기로 공급되는 연료 및 공기의 믹서 챔버

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13767659

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 13767659

Country of ref document: EP

Kind code of ref document: A1