WO2013119775A1 - Procédé et appareil de détermination d'un profil d'épaisseur d'une lentille ophtalmique par utilisation de mesures à un seul point d'épaisseur et d'indice de réfraction - Google Patents

Procédé et appareil de détermination d'un profil d'épaisseur d'une lentille ophtalmique par utilisation de mesures à un seul point d'épaisseur et d'indice de réfraction Download PDF

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Publication number
WO2013119775A1
WO2013119775A1 PCT/US2013/025094 US2013025094W WO2013119775A1 WO 2013119775 A1 WO2013119775 A1 WO 2013119775A1 US 2013025094 W US2013025094 W US 2013025094W WO 2013119775 A1 WO2013119775 A1 WO 2013119775A1
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WIPO (PCT)
Prior art keywords
lens
thickness
ophthalmic lens
measurement
thickness profile
Prior art date
Application number
PCT/US2013/025094
Other languages
English (en)
Inventor
Michael F. Widman
Naveen Agarwal
Christopher Wildsmith
Peter W. Sites
Original Assignee
Johnson & Johnson Vision Care, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Johnson & Johnson Vision Care, Inc. filed Critical Johnson & Johnson Vision Care, Inc.
Priority to US13/764,499 priority Critical patent/US8810784B2/en
Publication of WO2013119775A1 publication Critical patent/WO2013119775A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G01M11/0235—Testing optical properties by measuring refractive power by measuring multiple properties of lenses, automatic lens meters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested

Definitions

  • This invention describes a method and apparatus for a non-contact method of obtaining a thickness profile of at least a portion of one or more ophthalmic lenses. More specifically, the invention provides for ways to measure the transmitted wavefront, center thickness and an approximate refractive index value of a dry free- formed ophthalmic lens to get said thickness profile.
  • optical metrology involves directing an incident beam at an optical object, measuring the resulting diffracted beam, and analyzing the diffracted beam to determine various characteristics, such as the profile of the structure.
  • traditional ophthalmic lenses are often made by cast molding, in which a monomer material is deposited in a cavity defined between optical surfaces of opposing mold parts.
  • an uncured hydrogel lens formulation is placed between a plastic disposable front curve mold part and a plastic disposable back curve mold part.
  • the front curve mold part and the back curve mold part are typically formed via injection molding techniques wherein melted plastic is forced into highly machined steel tooling with at least one surface of optical quality.
  • the front curve and back curve mold parts are brought together to shape the lens according to desired lens parameters.
  • the lens formulation is subsequently cured, for example by exposure to heat and light, thereby forming a lens.
  • the mold parts are separated and the lens is removed from the mold parts for said conventional optical metrology.
  • the nature of the injection molding processes and equipment make it difficult to form custom lenses specific to a particular patient's eye or a particular application. Consequently, in prior
  • a free formed surface and base may include a free flowing fluent media included in the free formed surface. This combination results in a device sometimes referred to as a lens precursor. Fixing radiation and hydration treatments may typically be utilized to convert a lens precursor into an ophthalmic lens.
  • a freeform ophthalmic lens created in this manner may need to be measured at different states in order to ascertain the physical parameters of the lens and ensure it meets specified convergence design criteria. Therefore, new apparatus and methods are needed for measuring a thickness profile of said free-formed ophthalmic lenses.
  • the present invention is directed to apparatus and methods of using a non-contact optical metrology technique to determine a single-point center thickness value of an ophthalmic lens to obtain a thickness profile of at least a portion of an ophthalmic lens at its dry state on a forming mandrel.
  • a center thickness value of a lens Utilizing a center thickness value of a lens, a wavefront of a lens measured in transmission, and an approximate refractive index (hereon may be referred to as "RI") value for a lens; a lens thickness profile may be calculated.
  • RI approximate refractive index
  • a wavefront metrology technique may be used to obtain simultaneous measurements of intensity and phase in one or more continuous measurements.
  • additional methods of measuring said wavefront, a single point thickness, and RI will be provided. Said methods are exemplary and do not limit the method of using these to obtain a lens thickness profile, the subject matter of this disclosure.
  • Obtaining a lens thickness profile of the generated free-formed ophthalmic device may allow comparison with a design lens thickness profile to determine whether said formed ophthalmic lens meets specified convergence design criteria.
  • the present invention provides apparatus for providing a lens thickness profile, the apparatus comprising:
  • a computer processor in digital communication with a digital media storage device, wherein the digital media storage device stores executable software code; and a transmitter in logical communication with the processor and also in logical communication with a communication network; wherein, the software is executable upon demand and operative with the processor to transmit and receive digital data via the transmitter and to:
  • the thickness profile may be subtracted from a design thickness profile to determine whether the difference value is within a predetermined threshold.
  • the transmitted wavefront measurement may be received from a source for the wavefront measurement and the source for the wavefront measurement may comprise an emitter functional to emit a wavelength of radiation in a direction towards the ophthalmic device, a sensor functional to detect a reflecting wavelength based upon the emitted wavelength, wherein the reflecting wavelength's intensity and phase will be different based upon physical characteristics of said ophthalmic device, and
  • the processor is in logical communication with one or more of the emitter, the sensor, and the apparatus for the processor, to transmit a logical signal based upon the properties of the free-formed ophthalmic lens.
  • the sensor may comprise a laser confocal sensor.
  • the emitted radiation may be a high quality light beam with a monochromatic wavelength.
  • the emitted radiation may comprise a monochromatic wavelength of from about 630nm to about 635mm.
  • the apparatus may further comprise a lens cancellation system comprising one or more lenses to collectively cancel a forming optic mandrel's optical effect.
  • the lens cancellation system may be positioned in the optical path between the emitter and the sensor.
  • the present invention also provides a method of obtaining a lens thickness profile, the method comprising the steps:
  • the method may additionally comprise subtracting a design thickness profile from the calculated thickness profile and determining whether the difference is a value within a predetermined threshold.
  • the single point thickness may be a single point center of the free-formed ophthalmic lens.
  • the predetermined threshold may be a programmed design convergence criteria.
  • measurement may be measured on a dry free formed ophthalmic lens.
  • transmitted wavefront measurements may be obtained by optical digital wavefront metrology techniques. These techniques may be used to obtain simultaneous measurements of intensity and phase of the transmitted wavefront in one or more continuous measurements.
  • Apparatus for measuring a transmitted wavefront includes apparatus comprising: an optic mandrel for forming an ophthalmic device using free-form
  • said optic mandrel comprising an optical effect
  • a lens cancellation system comprising one or more lenses to collectively cancel said optical mandrel's optical effect
  • an emitter functional to emit a wavelength of radiation in a direction towards the ophthalmic device
  • a sensor functional to detect a transmitted wavefront based upon the emitted wavelength, wherein the transmitted wavefront's intensity and phase will be different based upon a physical characteristic of said ophthalmic device
  • a processor in logical communication with one or both of the emitter and the sensor; wherein the processor is programmed to transmit a logical signal based upon the reflecting wavefront's intensity and phase.
  • emitter may mean “light source”.
  • the optic mandrel, the lens cancellation system, the emitter and the sensor may be aligned.
  • the lens cancellation system, the emitter and the sensor are mounted on a rail.
  • the rail may be a vertical rail, preferably a vertical optical rail.
  • the sensor may comprise a digital wavefront camera.
  • the digital wavefront camera may be capable of moving to change or vary continuously a distance along an optical axis of transmission of two or more intensity profiles.
  • the digital wavefront camera may be vibration insensitive.
  • the digital wavefront camera may further comprise a beam splitter to cause a production of a second image at a different position along the optical axis of transmission.
  • the digital wavefront camera may further comprise one or more magnification lenses dependant on the diaphragm in a light source and the working distance between the light source and the digital wavefront camera.
  • the apparatus for measuring a transmitted wavefront may further comprise a kinematic mount for placement of said optical mandrel for proper alignment with the lens cancellation system and the emitter.
  • the apparatus for measuring a transmitted wavefront may further comprise a vacuum for holding the mandrel fixture and the kinematic mount.
  • the apparatus for measuring a transmitted wavefront may further comprise a top aperture and a bottom aperture, wherein said top aperture is slightly smaller than the bottom aperture and placed on top of the mandrel fixture without contacting said mandrel to create a physical barrier by limiting the light beam passing through defining a boundary condition for a solution of an intensity transport equation.
  • the top aperture may be changed to cover a different field of view.
  • the bottom aperture may also be changed to further improve a dynamic range of measurement.
  • the lens cancellation system used in the apparatus for measuring a transmitted wavefront may comprise an assembly comprising three lenses inside of a tube, wherein a light beam can pass through each of said lenses.
  • the assembly may be placed perpendicularly to the rail.
  • the light beam may be placed perpendicularly to the rail.
  • the three lens cancellation system may include one or more of: an asphere lens, a plano-convex lens and a plano-concave lens to cancel out one or both of:
  • the processor may function in real time to generate one or more continuous wavefront measurements of said ophthalmic device.
  • the emitted radiation may be a high quality light beam with a monochromatic wavelength.
  • the emitted radiation may comprise a monochromatic wavelength of from about 630nm to about 635mm.
  • a method that may be used to obtain wavefront measurements of an ophthalmic device comprises:
  • the method to obtain wavefront measurements of an ophthalmic device may further comprise a step of the processor implementing an intensity transport equation and an algorithm.
  • intensity data may subsequently be converted into an optical wavefront.
  • the optical wavefront may describe a path of light in terms of a light's intensity and phase.
  • the method to obtain wavefront measurements of an ophthalmic device may comprise any of the apparatus described above for measuring a transmitted wavefront.
  • Fig. 1 illustrates method steps that may be used to implement the present invention.
  • Fig. 2 illustrates additional method steps that may be used to implement the present invention.
  • Fig. 3 illustrates exemplary refractive index values for a range of ophthalmic lenses and apertures.
  • Fig. 4 illustrates apparatus components that may be useful in implementing the present invention comprising laser confocal measurement technology.
  • Fig. 5 depicts a schematic of a processor that can be used by the system.
  • the present invention provides for methods and apparatus for obtaining a lens thickness profile of a free-formed ophthalmic lens.
  • detailed descriptions of the invention will be given. The description of both preferred and alternative embodiments though thorough are exemplary only, and it is understood to those skilled in the art that variations, modifications, and alterations may be apparent. It is therefore to be understood that the exemplary embodiments do not limit the broadness of the aspects of the underlying invention as defined by the claims.
  • the term “comprising” encompasses “including” as well as “consisting” and “consisting essentially of e.g. an apparatus “comprising” X may consist exclusively of X or may include something additional e.g. X + Y.
  • Frequency lens reactive media as used herein means a reactive mixture that is flowable in either its native form, reacted form, or partially reacted form and, a portion or all reactive media may be formed upon further processing into a part of an ophthalmic lens.
  • Free-form refers to a surface that is formed by crosslinking of a reactive mixture via exposure to actinic radiation on a voxel by voxel basis, with or without a fluent media layer, and is not shaped according to a cast mold, lathe, or laser ablation.
  • Lens forming mixture and sometimes referred as “reactive mixture” or “RMM” (reactive monomer mixture) herein refers to a monomer or prepolymer material which may be crosslinked to form an ophthalmic lens.
  • Lens-forming mixtures may comprise one or more additives such as: UV blockers, tints,
  • photoinitiators or catalysts, and other additives one might desire in an ophthalmic lenses such as, contact or intraocular lenses.
  • Lens precursor refers to a composite object consisting of a Lens precursor form and a fluent lens reactive mixture in contact with the lens precursor form.
  • the fluent lens reactive media may be formed in the course of producing a lens precursor form within a volume of reactive mixture.
  • Separating the lens precursor form and adhered fluent lens reactive media from a volume of reactive mixture used to produce the lens precursor form may generate a lens precursor. Additionally, a lens precursor may be converted to a different entity by either the removal of significant amounts of fluent lens reactive mixture or the conversion of a significant amount of fluent lens reactive media into non-fluent, incorporated material.
  • “Lens precursor form” as used herein, means a non-fluent object with at least one optical quality surface which is consistent with being incorporated, upon further processing, into an ophthalmic lens.
  • “Lens thickness profile” as used herein refers to a measured set of values that characterize the physical characteristics of a free-formed lens. For example, the thickness profile may comprise mapping the complex spatially varying thicknesses throughout the lens.
  • Opt lens refers to any ophthalmic device that resides in or on the eye. These devices can provide optical correction or may be cosmetic.
  • the term lens can refer to a contact lens, intraocular lens, overlay lens, ocular insert, optical insert or other similar device through which vision is corrected or modified, or through which eye physiology is cosmetically enhanced (e.g., iris color) without impeding vision.
  • the ophthalmic lenses may be soft contact lenses made from silicone elastomers or hydrogels, which include but are not limited to silicone hydrogels, and fluorohydrogels.
  • Measurements of one or more ophthalmic devices may be taken in its unhydrated lens state, and on a mandrel on which, a lens may be formed using free- form technology.
  • the present invention provides for methods and apparatus for obtaining a single -point center thickness measurement of an object.
  • the single-point center thickness measurement may be obtained using a refractive index ("RI”) or a fitted value of ni and a transmitted wavefront (“WF”), thereby determining a thickness profile of an ophthalmic lens.
  • RI refractive index
  • WF transmitted wavefront
  • a center thickness measurement may be taken of an ophthalmic lens in a dry mandrel state, which may be defined as a residence on a mandrel on which an ophthalmic lens may have been formed, using free form technology.
  • the apparatus and method of the present invention may include a laser confocal displacement sensor, used to measure a thickness profile of a dry contact lens affixed on a lens forming mandrel.
  • a mandrel fixture may be mounted on top of a kinematic mount. In order to obtain a flat wavefront from an optical glass mandrel, alignment of a metrology apparatus may need to occur. Prior to utilizing the present invention, a calculation to determine RI may have to occur to obtain a RI value.
  • An estimated dry ophthalmic lens RI may be used as a calibration procedure with respect to a confocal measurement.
  • RI may be referred to as a measure of the speed of light in that substance relative to the speed of light in a vacuum, and may determine by what amount light will be bent when it goes from one medium to another.
  • a refractive index may be utilized to calculate a thickness profile of a dry contact lens from a transmitted wavefront. Either, a transmitted optical wavefront measurement done on an optical metrology system, or a confocal thickness measurement of an ophthalmic lens may be done first.
  • an estimated start value of a RI value may be inputted into a computer program.
  • a RI value and a transmitted WF may be used to obtain a thickness profile from a wavefront of an ophthalmic lens ("WF t ").
  • an optimization procedure may be used to fit a RI, tilt, and shift, and to minimize error between a difference of a WF t and a t.
  • An optimization procedure may include adjustment of one or more of: an x- tilt, a y-tilt, an x-shift, and a y-shift. If an error is a value below a pre-determined threshold between a WF t and a t, a RI may be accepted as a fitted value of a RI for a data set. This process may repeated for multiple lenses and apertures, in which an average may be calculated for all ni values combined, to arrive at a fitted value for a dry lens RI ('W). A fitted value of ni may remain a constant value and subsequently be inputted into a computer program, where a fitted value of ni may remain unchanged.
  • a fitted ni value may be used to enable a single-point thickness measurement of a lens ("CT"), such as, for example the single-point center thickness of a lens.
  • CT single-point thickness measurement of a lens
  • Single point thickness may be measured by a laser confocal sensor first taking a single-point optical measurement at a center of a forming optic glass mandrel without a lens on it. That data may be stored as a reference point.
  • An ophthalmic lens may be made on a same exact forming optic glass mandrel, which may be mounted onto a kinematic mount.
  • a single-point optical measurement of a center of a forming optic glass mandrel may be taken with a lens on it, and that data point may be stored. The two points may be subtracted from each other, thereby determining a center thickness of an ophthalmic lens at a single point.
  • a fitted ni value may be used in an equation with a center thickness value to calculate a lens thickness profile from a measured transmitted WF.
  • a lens thickness profile may be compared to a design ophthalmic lens thickness profile by subtracting two profiles from each other, to determine whether an ophthalmic lens meets specified convergence criteria. If not, a new iteration of an ophthalmic lens may be made and a process started over.
  • Fig. 1 illustrates a flow chart that illustrates method steps that may be used to implement the present invention to obtain a thickness profile of an ophthalmic lens.
  • the following steps may include one or more of: obtaining a transmitted wavefront ("WF") for an ophthalmic lens 110; followed by estimating a dry ophthalmic lens RI to get a value for ni 120; followed by measuring a center thickness of an ophthalmic lens ("CT") 130; followed by calculating a lens thickness profile (Ti) 140; followed by comparing a lens thickness profile with a design lens thickness profile (T 0 ) 150 by subtracting two profiles, (T 0 - Ti), from each other 160; followed by determining whether an ophthalmic lens meets a convergence criteria 170.
  • WF transmitted wavefront
  • CT center thickness of an ophthalmic lens
  • Ti lens thickness profile
  • a process may terminate 180, if an ophthalmic lens does not meet a convergence criteria 170, a new iteration of an ophthalmic lens may be made and a process started over 190 until an ophthalmic lens does meet a convergence criteria 170.
  • Fig. 2 represents a flow chart of method steps that may be used to calculate a RI to obtain a value for 3 ⁇ 4.
  • the following steps may include one or more of: obtaining a transmitted wavefront ("WF") of an ophthalmic lens 210; followed by obtaining a confocal thickness measurement of an ophthalmic lens ("t") 220; followed by assuming a start value of a RI 230; followed by calculating a RI with a transmitted WF of an ophthalmic lens to translate it into wavefront thickness ("WF t ") 240; followed by subtracting a t from a WF t 250; followed by comparing a difference of a t from a WF t to see if any error may be minimal 260; followed by either accepting a RI and obtaining a value for ni if error may be minimum 270, or either not accepting a RI if error may be more than minimum, changing a RI 280 and starting a process over.
  • WF transmitted
  • an average RI may be obtained, which may translate a WF of an ophthalmic lens into thickness. It may also be possible to calculate a RI for each pixel of an ophthalmic lens, as opposed to calculating only one number for a RI across a whole surface of an ophthalmic lens.
  • a transmitted lens wavefront may have to be obtained 210 and a confocal thickness measurement of a Lens 220 may have to be obtained.
  • a best guess assumption of a RI start value 230 may be made, which may be any value (e.g., 1, or 1.5).
  • a calculation of a estimated RI with a transmitted Lens WF may be performed to obtain a WF t of a Lens 240.
  • an objective may be to minimize error as much as possible between two data sets, a WF t and a t. Minimizing error may be done by an optimization procedure to obtain a best fit. Adjusting parameters to fit certain variables so that a difference between two data sets, a WF t and a t, may be as close to zero as possible, may thereby give a best fit.
  • Fig. 3 is an example of a table of data that illustrates calculation of RI values using a range of different lenses and apertures.
  • Some parameters may include one or more of: an x-tilt, a y-tilt, an x-shift, and a y-shift and may be represented on a data table.
  • a purpose of adjusting certain parameters may be to align two thickness maps, a WF and a t, with each other and subsequently take a difference between two thickness maps. This may be important, for example, because otherwise an error between a WF t and a t may also result from unalignment of a WF and a t.
  • a t data set may be subtracted from a WF t data set 250.
  • a quality of a parameter fit may be determined by error, which may be equivalent to root mean square (“RMS”), which may represent a value of a difference between two data sets, a WF t and a t, and a peak to valley (“PTV”) which may represent a PTV difference between aWF t and a t.
  • Error may be a value below a pre-determined threshold between a WF t and a t 260, and subsequently, a RI may be accepted and represent an ni value 270. However, error may not be below the threshold and subsequently, a RI start value may be changed 280 along with various parameters, and a RI loop started over.
  • Repetition of a RI process loop may occur multiple times for a range of ophthalmic lens designs and apertures to obtain several ni values.
  • An average of all RI values may be obtained for either one or both of, an entire data set in a table, or an average may just be taken of only a certain aperture range
  • An average of all multiple RI values taken may represent a fitted ni value, which may remain a constant value and inputted into a computer program, where a fitted value of ni may remain unchanged.
  • a single-point center thickness measurement may be made of an ophthalmic lens by an apparatus of the present invention.
  • FIG. 4 represents a front view of a laser confocal sensor measurement system, illustrating some components of an apparatus, including adjusters for a kinematic mount 440 and a sensor 400.
  • alignment of an apparatus may have to occur to allow centering of a forming optic glass mandrel 420 underneath a displacement sensor 400. Alignment of a confocal displacement sensor 400 may occur so that height of a sensor 400 may be in a correct measurement range.
  • An apparatus may have various alignment adjusters, which may include one or more of: an x adjuster 460, a y adjuster 470 for a stage 450, and a z adjuster 480 for a sensor 400.
  • An x adjuster 460 and a y adjuster 470 may adjust a center of a kinematic mount 440.
  • a sensor z adjuster 480 may bring a displacement sensor 400 down to a working distance of 30mm and a measurement range ofi 1 mm.
  • a measurement may be made, subsequent to alignment of an apparatus and sensor 400 brought down to a desired working height.
  • a measurement process may be controlled by a computer program and may include, taking a single-point center measurement of a forming optic glass mandrel 420 (e.g., data of which may serve as a reference point and stored), and taking a single-point center measurement of a lens 410 formed on a glass mandrel 420. Subsequently, reference point data may be subtracted from single-point center measurement of an ophthalmic lens point data thereby, obtaining a center thickness measurement of an ophthalmic lens 410.
  • a forming optic glass mandrel 420 e.g., data of which may serve as a reference point and stored
  • reference point data may be subtracted from single-point center measurement of an ophthalmic lens point data thereby, obtaining a center thickness measurement of an ophthalmic lens 410.
  • a transmitted WF may be obtained and CT and RI values may be used to calculate a lens thickness profile using algorithms in software used by wavefront sensors, for example, Phaseview's optic smart wavefront sensors, and systems.
  • a lens thickness profile may be subtracted from a design lens thickness profile to determine if a lens meets specified convergence criteria.
  • a lens may meet specified convergence criteria, and a process may terminate. However, a lens may not meet specified convergence criteria, and a new iteration of a lens may be made and process started over.
  • the server can contain different means of receiving information 501. For example, Bluetooth technology, network/internet capabilities, etc.
  • a receiver 502 can be used to allow the processor 504 to cause the data to be stored in specific databases 508 in uniform format and time. The data can then be used by a program 509 executable to perform the functions as described above.
  • the server also includes a User interphase 503, a processor for the software 505, a means of power 511, memory 510, and a means of keeping real time 507 in relation to the
  • the server may include a transmitter 506.

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  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
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Abstract

La présente invention concerne un procédé et un appareil de mesure de profil d'épaisseur de lentille ophtalmique. Plus particulièrement, l'invention concerne l'appareil permettant de mesurer la lentille ophtalmique dans un état précurseur, après sa formation libre sur un mandrin de formation d'optique sur lequel elle peut être formée. De plus, la présente invention peut également permettre une comparaison entre un profil de conception de la lentille ophtalmique formée et la lentille ophtalmique formée librement résultante pour s'assurer qu'elle satisfait à des critères de conception de convergence spécifiés.
PCT/US2013/025094 2012-02-10 2013-02-07 Procédé et appareil de détermination d'un profil d'épaisseur d'une lentille ophtalmique par utilisation de mesures à un seul point d'épaisseur et d'indice de réfraction WO2013119775A1 (fr)

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US13/764,499 US8810784B2 (en) 2012-02-10 2013-02-11 Method and apparatus for determining a thickness profile of an ophthalmic lens using a single point thickness and refractive index measurements

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US201261597338P 2012-02-10 2012-02-10
US201261597343P 2012-02-10 2012-02-10
US61/597,338 2012-02-10
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WO2016074034A2 (fr) * 2014-11-11 2016-05-19 Brien Holden Vision Institute Systèmes et procédés permettant de déterminer la qualité d'un dispositif optique (manufacturé) reproduit
US10607335B2 (en) 2016-06-28 2020-03-31 Johnson & Johnson Vision Care, Inc. Systems and methods of using absorptive imaging metrology to measure the thickness of ophthalmic lenses
TWI682158B (zh) * 2018-05-23 2020-01-11 財團法人國家實驗硏究院 檢測眼膜透鏡之含水量與透氧率的方法及用於檢驗眼膜透鏡的光學檢測系統
KR20200085966A (ko) * 2019-01-07 2020-07-16 에스케이하이닉스 주식회사 데이터 저장 장치 및 그 동작 방법

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