WO2013077145A1 - Pressurization disc, bonding device, and bonding method - Google Patents
Pressurization disc, bonding device, and bonding method Download PDFInfo
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- WO2013077145A1 WO2013077145A1 PCT/JP2012/077955 JP2012077955W WO2013077145A1 WO 2013077145 A1 WO2013077145 A1 WO 2013077145A1 JP 2012077955 W JP2012077955 W JP 2012077955W WO 2013077145 A1 WO2013077145 A1 WO 2013077145A1
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- disk
- disc
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- notch
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
Definitions
- the present invention relates to a laminating apparatus, a laminating method, and a pressure disc used for laminating two discs to produce a disc laminate. Specifically, when a circular workpiece such as a semiconductor substrate is thinned by surface grinding / polishing, a circular support having substantially the same diameter is previously centered and angled with respect to the circular workpiece.
- the present invention relates to a bonding apparatus, a bonding method, and a pressure disk used therefor.
- a technique for thinning a circular workpiece such as a semiconductor substrate by surface grinding and polishing is indispensable.
- thinning is required to reduce the thickness to 30 to 50 ⁇ m for a silicon wafer having a diameter of 300 mm.
- the circular workpiece having an extremely thin thickness with respect to the planar dimension cannot maintain the planar shape alone due to internal stress and own weight with its own rigidity. Therefore, as described in Patent Document 1, a step of bonding the circular support to the non-processed surface side of the circular workpiece in advance through an adhesive is required before the surface grinding / polishing process.
- an adhesive is uniformly applied to the entire surface by a spin coating method with the non-processed surface (hereinafter referred to as the upper surface) side of the circular workpiece before processing the flakes facing upward.
- a thermosetting resin or a UV curable resin is generally used, and it can be fixed by heat treatment after bonding and UV irradiation.
- the circular support is processed in advance precisely in flatness, and heat-resistant glass or silicon wafer having the same diameter as the circular workpiece and the same thickness as that of the circular workpiece before thinning is used.
- the bonding process is performed in a vacuum chamber (not shown) in which a circular workpiece W1 and a circular support W2 are sandwiched, and a stage 50 is disposed below and a pressure disk 60 is disposed above. Done in Each of the stage 50 and the pressure disk 60 uses a machined flatness with high accuracy, and the parallelism is also precisely adjusted in the vacuum chamber.
- the diameter of the stage 50 and the pressure disk 60 is reduced with respect to the circular workpiece W1 and the circular support W2 having the same diameter as the circular workpiece W1, thereby protruding the adhesive generated at the outer edge during bonding. It is devised not to be polluted by.
- the radial thickness profile of the adhesive layer R applied to the upper surface of the circular workpiece W1 by the spin coating method is an event peculiar to the spin coating method, but as shown in FIG. It becomes the shape which has a swell.
- the thickness of the adhesive layer R When the thickness of the adhesive layer R is increased, the swell of the adhesive at the outer edge portion is increased, and in this state, when the pressure is applied with the pressure disk 60 whose diameter is considerably smaller than that of the circular support W2, FIG. As shown in FIG. 10 (A), the outer edge of the thickness profile in the radial direction of the disk stack becomes thick after bonding. The reason for this is that if the diameter dimension of the pressure disk 60 is small, the rigidity of the circular support W2 is lost due to the force of the outer edge portion of the adhesive to rise and crush. As the diameter dimension of the pressure disk 60 is increased, the thickness profile approaches flat, and when the diameter is further increased, the outer edge portion becomes thinner as shown in FIG. 10B. The reason for this is that when the diameter dimension of the pressure disk 60 is large, the adhesive at the outer edge portion is crushed so that the adhesive remaining in the central portion does not flow to the outer periphery.
- the diameter of the pressure disc 60 has experienced an appropriate dimension value in order to suppress and equalize such fluctuations in the outer edge in the radial thickness profile of the laminated disc stack. Has been used.
- the circular support W2 disposed above the circular workpiece W1 is held while maintaining parallelism with respect to the circular workpiece W1.
- the center direction of the circular support W2 is provided by a plurality of pins 81 and 82 that abut on the side surface of the circular support W2 equally divided in the circumferential direction. The one that grips the circular support body W2 by applying a force toward is adopted.
- the circular workpiece W1 supported on the stage 50 and the circular support W2 held by the holding mechanism are angle-matched.
- a method for performing such an angle alignment first, the angle of the circular support W2 is accurately determined, and the angle of the circular workpiece W1 is adjusted by an alignment device on the basis of this, and the robot 50 or the like is mounted on the stage 50. The method of transporting to is used.
- a method for determining the angle of the circular support W2 as shown in FIG. 11, one of a plurality of pins constituting the holding mechanism is formed in a notch N formed in one place on the side surface of the circular support W2. A configuration in which a certain pin 81 is engaged is employed.
- the pressure disk 60 is lowered from above with respect to the circular support W2 held in this way, and further pressurization is performed after the lower surface of the pressure disk 60 contacts the upper surface of the circular support W2.
- a downward force is applied to the circular support W2 by lowering the disk 60.
- the circular support W2 descends, and the lower surface of the circular support W2 comes into contact with the adhesive layer R applied to the upper surface of the circular workpiece W1 supported on the stage 50.
- the pressure workpiece 60 further applies pressure to the upper surface of the circular support W2, thereby bonding the circular workpiece W1 and the circular support W2.
- FIG. 11 is a plan view for explaining the spread of the adhesive during the pressure treatment.
- the portion where the notch N of the circular support W2 is formed has a short distance from the center, so that the amount of the adhesive that can protrude is small, and not only from the center direction (see arrow C1). Since it protrudes from the lateral direction (see arrow C2), the spread of the adhesive in the radial direction is suppressed as compared with a portion without the notch N (see arrow D).
- the thickness in the radial direction of the disk stack after bonding tends to be thicker as a whole at the notch portion than at the portion where the notch N is not present.
- the notch N formed on the side surface of the circular support to make a reference for angle alignment causes the adhesive to spread unevenly in the pressure treatment process, and the circumferential thickness of the disk stack This will cause an imbalance in the profile.
- the circular support W2 is held in such a manner that a plurality of pins 81 and 82 are brought into contact with each other on the side surface.
- the friction is applied to the portions where the pins 81 and 82 on the side surface of the circular support W2 are in contact. (Dynamic friction) acts.
- the pin 81 contacts at two points on the side surface of the circular support W2, and therefore the friction is greater than the location where the notch N is not formed.
- Such friction becomes a resistance force against the pressure applied from the pressure disk 60, and as shown in FIG.
- the outer edge portion of the circular support W2 is likely to be turned up at the place where the pins 81 and 82 are in contact.
- the flat surface of the lower surface of the circular support W2 is brought into contact with the adhesive layer R without securing the flatness, and there is a possibility that the finish after bonding is adversely affected as a problem unique to the holding mechanism.
- the present invention has been made in view of the above problems, and a disk laminate after two disks are bonded even if there is a notch for angle adjustment at one place on the side of one disk.
- the pressure disk shape which can suppress that the imbalance arises in the thickness profile of the circumferential direction of this is provided.
- the present invention provides a pressure disk shape that can be lowered without deforming a disk gripped by pins at a plurality of positions on the side surface.
- the pressure disk is supported on a stage, and a second disk having a notch for angle adjustment at one side of the side is arranged oppositely above the first disk on which the adhesive is uniformly applied on the upper surface. Is set to a diameter smaller than that of the second disc, and is centered with respect to the first disc and the second disc, and is in close contact with the upper surface of the second disc.
- the second disk is pressurized against the first disk on the stage.
- the pressurization disc of the present invention has a projection set on the side surface of the pressurization disc on the side surface of the pressurization disc corresponding to the notch of the second disc. It is formed.
- the pressure disk has a protrusion set to be flush with the lower surface of the pressure disk corresponding to the location where the notch of the second disk is formed.
- the dimension from the center of the lower surface of the pressure disk that pressurizes the plate to the outer edge is longer in the notch portion than the portion where the notch is not formed (that is, the same dimension as the radius) by the amount of the protrusion. .
- the pressure of a pressurization disc comes to act firmly on a notch part with which the amount of adhesive which can protrude is absolutely small at the time of pressurization processing.
- the spread of the adhesive in the radial direction at the notch portion is promoted, and the protrusion from the lateral direction is suppressed so as to be hindered by the flow of the adhesive in this direction, which is the mainstream.
- the second disk disposed above the first disk is maintained while maintaining parallelism with respect to the first disk.
- a holding mechanism that enables this, by applying a force toward the center of the second disk by a plurality of pins that abut on the side of the second disk equally divided in the circumferential direction, What grips a disk is employ
- the pressure disk has a protrusion that is set flush with the lower surface of the pressure disk, corresponding to the location where the pin on the side surface of the second disk contacts.
- the dimension from the center of the lower surface of the pressurizing disk that pressurizes the second disk to the outer edge is the part where the pin is not in contact by the amount of the protrusion (ie, the radius and Longer than the same dimensions.)
- the pressure force of the pressurizing disk is firmly applied to the portion where the resistance force is relatively increased and the pin comes into contact. become. Therefore, the outer edge of the second disk is prevented from turning up.
- the adhesive layer is contacted with the flatness of the lower surface of the circular support secured, and it is possible to suppress adverse effects on the finish after bonding as a problem specific to the holding mechanism.
- the first disk and the second disk are pre-centered, and an adhesive is uniformly applied to the upper surface of the first disk or the lower surface of the second disk.
- an adhesive is uniformly applied to the upper surface of the first disk or the lower surface of the second disk.
- Such a bonding apparatus has, as a specific configuration, a processing chamber having airtightness, a stage disposed in the processing chamber and supporting the first disc, and facing above the stage in the processing chamber.
- a pressure disk that is disposed and centered with respect to the first disk and the second disk, a lifting mechanism that supports the pressure disk so as to be movable up and down, and the second disk.
- a holding mechanism that is detachably held above the stage and below the pressure disk.
- the bonding apparatus of this invention is such a structure WHEREIN:
- the said pressurization disc corresponds to the said notch of the said 2nd disc, and the said pressurization disc on the side surface of the said pressurization disc
- a protrusion that is set flush with the lower surface of the substrate is formed.
- the holding mechanism includes one movable pin that comes into contact with one place on the side surface of the second disc, and a plurality of stationary pins that comes into contact with a plurality of places on the side surface of the second disc.
- the movable pin is pressed against the side surface of the second disc by moving the movable pin in the forward direction and moving the movable pin in the direction approaching the center in the radial direction of the second disc, The side surface of the second disk is gripped by the movable pin and the stationary pin. Conversely, by moving the moving mechanism in the backward direction to move the movable pin away from the center of the second disk, the movable pin is separated from the side surface of the second disk, and the side surface of the second disk is gripped. Is released and the second disk is removed.
- the angular position of the second disk is determined simultaneously with the gripping of the second disk.
- the holding mechanism may include a suction mechanism that adsorbs the upper surface of the second disk to the pressure surface of the pressure disk. According to this, by operating the suction mechanism, the suction adsorption force acts on the second disk, and the upper surface of the second disk is adsorbed on the pressure surface of the pressure disk. Conversely, if the suction mechanism is stopped, the second disk is detached from the pressure disk. In this configuration of the holding mechanism, since the second disk is held by the pressure disk itself, another holding member is unnecessary, and the holding mechanism can be simplified.
- the pressure disk when equipped with an attachment / detachment mechanism that positions the center of the pressure disk and detachably supports it on the lifting mechanism, the pressure disk can be easily replaced, and it is easy to change lots of disk stacks. It becomes possible to do.
- the bonding method of the present invention is a method in which a notch for angle alignment is formed at one place on the side surface above the first disk supported on the stage and having the adhesive uniformly applied to the upper surface.
- Two discs are held opposite to each other, and the upper surface of the second disc is pressed with a uniform force by a press disc that is centered with the first disc and the second disc.
- the said 2nd disk is bonded together and a disk laminated body is produced.
- a protrusion that is set flush with the lower surface of the pressure disk is formed on the side surface corresponding to the notch of the second disk. Use a pressurized disk.
- the pressurizing treatment with the pressurizing disc is performed under a high vacuum.
- the adhesive layer applied to the upper surface of the first disk is applied to the first disk during the pressure treatment. Even if it protrudes to the outside, it flows to the outer edge of the lower surface of the second disk that is slightly larger than the first disk and stays there, so that the adhesive adheres to the side surface of the first disk. There is nothing. Therefore, it is possible to prevent the diameter of the first disc after bonding from becoming uneven in the circumferential direction.
- a silicon wafer is used as an example
- a glass support is used as an example.
- a photocurable resin or a thermosetting resin is used as an example of the adhesive.
- the two discs when two discs are bonded via the adhesive layer by the pressure of the pressure disc, the two discs are bonded even if there is a notch for angle alignment at one location on the side of one disc. It is possible to suppress the occurrence of an imbalance in the thickness profile in the circumferential direction of the disk stack after the lapse of time.
- the disk when the disk is lowered by applying the pressure of the pressure disk from above the disk gripped by the pins at a plurality of positions on the side surface, the disk is lowered without being deformed. Is possible.
- FIG. 4A is a side view for explaining the moving mechanism of the movable pin, and shows a state in which the movable pin is pressed against the side surface of the second disk to hold the second disk.
- FIG. 4B is a side view for explaining the moving mechanism of the movable pin, and shows a state where the movable pin is separated from the side surface of the second disk and the holding of the second disk is released. It is a top view which shows an example of a pressurization disc. It is a top view which shows the other example of a pressure disc. It is a top view which shows the further another example of a pressurization disc. It is a side view explaining a mode when lowering the 2nd disc currently hold
- FIG. 10A is a view for explaining how the outer edge portion of the adhesive layer is crushed in the pressurizing step in relation to the diameter dimension of the pressurizing disk, and the diameter dimension of the pressurizing disk is the second. The case where it is considerably smaller than a disk is shown.
- FIG. 10 (B) is a diagram for explaining how the outer edge of the adhesive layer is crushed in the pressurizing step in relation to the diameter dimension of the pressurizing disk, and the diameter dimension of the pressurizing disk is the second. The case where it is comparable as a disk is shown. It is a top view explaining the flow mode of the adhesive under pressure processing execution. It is a side view explaining a mode when lowering the 2nd disc currently hold
- FIG. 1 is a front view showing a schematic configuration of a bonding apparatus according to the first embodiment of the present invention.
- a disc stack is produced by laminating two kinds of first disc W1 and second disc W2 that are oppositely arranged with an adhesive uniformly applied to either one in advance.
- the first disk is, for example, a semiconductor circular workpiece such as a silicon wafer
- the second disk is, for example, a glass circular support.
- the bonding apparatus 10 includes a chamber (processing chamber) 20, a decompression mechanism 30, an opening / closing mechanism 40, a stage 50, a pressurizing disk 60, an elevating mechanism 70, and a holding mechanism 80 as main components. Is provided.
- the laminating apparatus 10 includes a base plate 11 and a gate-type support frame 12 fixed to the base plate 11.
- the base plate 11 and the support frame 12 are formed of a material having sufficiently high rigidity.
- a chamber 20 as a processing chamber is provided inside the support frame 12.
- the chamber 20 is divided into upper and lower parts, and is composed of an upper container 20A and a lower container 20B.
- An O-ring 21 is provided at the opening of the chamber 20, that is, at a place where the upper container 20 ⁇ / b> A and the lower container 20 ⁇ / b> B come into contact with each other to keep the inside of the chamber 20 airtight.
- the lower container 20B is supported by the base plate 11.
- the upper container 20 ⁇ / b> A is suspended and supported by the support frame 12, and can be moved up and down (moved up and down) by the opening / closing mechanism 40.
- the opening / closing mechanism 40 includes an actuator 41, a lifting plate 42, and a support 43.
- the actuator 41 has a piston 411 and a cylinder 412.
- the piston 411 is a non-moving portion of the actuator 41 and is erected vertically at the center of the upper surface of the ceiling wall of the support frame 12.
- the cylinder 412 is a movable part of the actuator 41 and is configured to be movable up and down along the piston 411.
- the actuator 41 is driven by solenoid, hydraulic pressure, pneumatic pressure, or the like as power, and is configured to be controllable by an electrical signal using a control mechanism (not shown).
- the elevating plate 42 is fixed to the cylinder 412 of the actuator 41 and can move up and down together with the cylinder 412 while keeping the level.
- the piston 411 is inserted through the center of the lifting plate 42.
- the upper ends of a plurality of vertically extending columns 43 are fixed to the outer edge of the lower surface of the elevating plate 42.
- the support 43 is penetrated through the ceiling wall of the support frame 12, and the lower end thereof is fixed to the upper surface of the upper container 20A.
- the upper container 20 ⁇ / b> A is suspended and supported by the elevating plate 42 via the column 43.
- FIG. 1 shows a state in which the chamber 20 is opened
- FIG. 2 shows a state in which the chamber 20 is closed.
- the decompression mechanism 30 includes a vacuum line 31, a vent line 32, a vacuum pump 33, a vacuum valve 34, and a vent valve 35.
- the vacuum line 31 is formed by piping made of a vacuum material, and the intake side is attached through the lower container 20B. As a result, the vacuum line 31 communicates with the chamber 20.
- the vacuum line 31 is provided with a vacuum pump 33 and a vacuum valve 34.
- the vent line 32 is branched from the vacuum line 31 on the upstream side of the vacuum valve 34, and is connected to a pressure-resistant container containing an inert gas (for example, nitrogen).
- the vent line 32 is formed by piping.
- a vent valve 35 is provided in the vent line 32.
- the vacuum valve 34 when the vacuum valve 34 is opened with the chamber 20 closed as shown in FIG. 2 and the vacuum pump 33 is driven, the air in the chamber 20 is exhausted through the vacuum line 31. The Thereby, the inside of the chamber 20 is depressurized and a high vacuum is obtained.
- the vent valve 35 is opened when an inert gas such as nitrogen is leaked into the chamber 20 through the vent line 32 to return the pressure in the chamber 20 to normal pressure.
- the pressure in the chamber 20 is monitored by a vacuum gauge 17 attached to the outside of the upper container 20A.
- a stage 50 as a support plate for supporting the first disc W1 and a pressurizing disc 60 for pressurizing the second disc W2 are arranged to face each other.
- the stage 50 has a mechanism for attracting and holding the first disk W1 by applying at least one of a suction attracting force or an electrostatic attracting force.
- the pressurizing disc 60 is supported by an elevating mechanism 70 provided in the upper container 20A so as to be elevable.
- the lifting mechanism 70 includes an actuator 71, a mounting base 72, a support shaft 73, and a disk magnet 74.
- the pressure disk 60 is mounted and adjusted with respect to the stage 50 with a parallelism of 4 ⁇ m or less.
- Actuator 71 has a piston 711 and a cylinder 712.
- the cylinder 712 is a non-moving portion of the actuator 71, and its axial direction is oriented vertically, and is attached to a mounting base 72 fixed to the ceiling wall of the upper container 20A.
- the piston 711 is a movable part of the actuator 71, and is configured to be movable in the axial direction of the cylinder 712, that is, vertically movable, through the mounting base 72.
- the actuator 71 is driven using solenoid, hydraulic pressure, pneumatic pressure, or the like as power, and is configured to be controllable by an electrical signal using a control mechanism (not shown).
- the upper end of the support shaft 73 is coaxially fixed to the lower end of the piston 711 of the actuator 71.
- the support shaft 73 is formed in a columnar shape, and is inserted through a through hole provided at the center of the ceiling wall of the upper container 20A.
- a shaft seal 14 is provided in the through hole of the upper container 20A, and the shaft seal 14 seals between the upper container 20A and the support shaft 73.
- a disc magnet 74 is horizontally attached to the lower end of the support shaft 73. The disc magnet 74 is attached in a state of being precisely aligned with the axes of the piston 711 and the support shaft 73, the center of which is set coaxially.
- the pressure disk 60 is made of a magnetic material (for example, an alloy containing a magnetic material), and can be attracted and held by applying the magnetic attraction force of the disk magnet 74.
- the diameter dimension of the pressure disk 60 and the smoothness of the pressure surface (lower surface) are processed with extremely high accuracy.
- a plurality of positioning protrusions (not shown) are formed on the upper surface of the pressure disk 60 in the center and in the circumferential direction around the center.
- a plurality of positioning holes are formed at locations corresponding to the positioning protrusions on the lower surface of the disc magnet 74.
- the plate 60 is mounted in a state in which the displacement is prevented and the center thereof is aligned with the axes of the piston 711 and the support shaft 73.
- the disk magnet 74 and its positioning hole, and the positioning protrusion of the pressure disk 60 are an example of an attachment / detachment mechanism that allows the pressure disk 60 to be attached and detached.
- this attachment / detachment mechanism using magnetic attraction fixing parts such as screws are unnecessary, and attachment / detachment work can be performed very easily with one touch.
- the pressurization method according to the present invention in which the pressurization disk 60 needs to be replaced for each lot of the disk stacks, can be easily replaced, and thus is a very useful attachment / detachment mechanism.
- the stage 50 is supported by the lower container 20B.
- a plurality of lift pins 13 are passed through the stage 50 from below.
- the plurality of lift pins 13 are erected vertically on the support member 16.
- the support member 16 can be moved up and down by an elevating mechanism 90, and thereby, the tip end portion of the lift pin 13 can be projected and retracted from the support surface (upper surface) of the stage 50.
- the structure of the raising / lowering mechanism 90 is the same as that of the raising / lowering mechanism 70 of the pressurization disc 60 mentioned above.
- the first disk W1 is transported above the stage 50 by a transport device (not shown) provided with a robot arm in a state in which the center and angle are adjusted in advance using an alignment device (not shown). Is supported by lift pins 13 projecting from the top. When the lift pin 13 is lowered in this state, the first disc W1 is supported at a fixed position on the support surface of the stage 50.
- the second disk W2 is detachably held above the stage 50 and below the pressure disk 60 by the holding mechanism 80.
- the holding mechanism 80 is configured to be able to grip the side surface of the second disc W2.
- the holding mechanism 80 includes a movable pin 81, a stationary pin 82, and a moving mechanism (device) 83.
- FIG. 3 is a plan view for explaining the holding mechanism 80.
- 4A and 4B are side views illustrating the moving mechanism 83 of the movable pin 81.
- FIG. Details of the holding mechanism 80 will be described with reference to FIGS. 3, 4 (A), and 4 (B).
- the movable pin 81 is engaged with an angle adjusting notch N formed at one place on the side surface of the second disk W2, and the two stationary pins 82 are on the side surface of the second disk W2. Are abutted at two locations.
- One movable pin 81 and two stationary pins 82 are provided in a planar arrangement in which the circumference of the second disk W2 is equally divided into three at a central angle of 120 °.
- the movable pin 81 and the stationary pin 82 are formed in a cylindrical shape as an example. As shown in FIG. 1, the fixed pin 82 is fixed to the inner surface of the ceiling wall of the upper container 20 ⁇ / b> A with the axial direction vertical.
- the moving mechanism 83 is configured to be able to reciprocate the movable pin 81 in the radial direction of the second disk W2.
- the moving mechanism 83 includes a stepping motor 831, a ball screw nut 832, a ball screw 833, a stem 834, a support shaft 835, a stopper 836, a flange 837, a compression coil spring 838, and a bearing 839.
- the stepping motor 831 is fixed to the outer surface of the ceiling wall of the upper container 20A with its drive shaft oriented in the direction away from the center in the radial direction of the second disc W2.
- the stepping motor 831 is configured to be able to rotate the drive shaft in both forward and reverse directions by pulse driving, and the driving force is transmitted to the ball screw nut 832 to rotate the ball screw nut 832 by a predetermined amount in the forward direction or the reverse direction.
- the rotational motion of the ball screw nut 832 is converted into the linear motion of the ball screw 833.
- the tip of the ball screw 833 is attached to the top of a vertically extending stem 834.
- a base end of a support shaft 835 extending in parallel with the ball screw 833 is attached to the lower portion of the stem 834.
- the support shaft 835 is inserted through the through hole in the side wall of the upper container 20A.
- a shaft seal 14 is provided in the through hole of the upper container 20A, and the shaft seal 14 seals between the upper container 20A and the support shaft 835.
- a flange 837 is formed at a portion located inside the upper container 20 ⁇ / b> A in the axial direction of the support shaft 835.
- the distal end portion of the support shaft 835 is inserted into the through hole of the movable pin 81.
- a bearing 839 is provided in the through hole of the movable pin 81, and the bearing 839 enables sliding along the support shaft 835 of the movable pin 81.
- a compression coil spring 838 is provided in a portion between the flange 837 and the movable pin 81 in the axial direction of the support shaft 835, and the movable pin 81 is urged toward the distal end side of the support shaft 835 by the compression coil spring 838.
- a stopper 836 is attached to the tip of the support shaft 835, and the movable pin 81 is prevented from coming off the support shaft 835 by the stopper 836.
- the moving mechanism 83 when the stepping motor 831 is driven to rotate in the forward direction, the support shaft 835 approaches the center in the radial direction of the second disk W2 as indicated by the arrow in FIG. Moving. As a result, the movable pin 81 urged by the compression coil spring 838 is pressed against the side surface of the second disk W2, and the second disk W2 is held at three positions on the side surface by the movable pin 81 and the two stationary pins 82. Is done. As shown in FIG. 3, it is assumed that the mounting position of the stationary pin 82 is set so that the center of the second disk W ⁇ b> 2 is aligned with the center of the pressure disk 60. At this time, if the movable pin 81 is engaged with a notch N provided on one side of the second disk W2, the angle of the second disk W2 can be adjusted.
- the support shaft 835 moves away from the center in the radial direction of the second disk W2, as indicated by the arrow in FIG. Thereby, the movable pin 81 is separated from the side surface of the second disk W2, and the second disk W2 is detached.
- pressurization may be performed in a state where the second disk W2 is held by the pins as shown in FIG. In the latter case, it is effective to prevent the displacement of the second disk W2 during pressurization.
- the gripping force of the second disk W2 can be adjusted by the spring constant of the compression coil spring 838.
- FIGS. 5 to 7 illustrate a pressure disk 60 used in the bonding apparatus of the present invention.
- Three protrusions 61, 62, 62 are formed on the side surface of the pressure disk 60.
- the protrusion 61 is provided corresponding to the notch N (see FIG. 3) of the second disk W2. Since the notch N is also a place where the movable pin 81 (see FIG. 3) is engaged (contacted), the protrusion 61 has a movable pin 81 (see FIG. 3) on the side surface of the second disk W2. It corresponds also to the part touched.
- the protrusion 62 is provided corresponding to a location where the stationary pin 82 on the side surface of the second disk W2 comes into contact.
- the lower surfaces of the protrusions 61 and 62 are set flush with the lower surface of the second disc 60. If the lower surfaces of the protrusions 61 and 62 are set flush with the lower surface of the second disk 60, the protrusions 61 and 62 are formed over the entire thickness direction of the second disk 60. There is no need.
- the protrusions 61 and 62 are formed integrally with the pressure disk 60 for ease of manufacture. Note that the protrusions 61 and 62 may be prepared as separate members from the pressure disk 60 and attached to the pressure disk 60 by adhesion or the like later.
- FIG. 5 illustrates a case where the planar shapes of the protrusions 61 and 62 are rectangular
- FIG. 6 is a semicircular shape
- FIG. 7 is a triangular shape, but these are examples and are not limited.
- the planar shape of the projections 61 and 62 may be selected as appropriate in accordance with the shape and size of the notch.
- the holding mechanism 80 holds the second disk W2 with the chamber 20 opened, and the first disk W1 is placed on the stage 50 using the second disk W2 as a reference for alignment. To support. As a result, the first disk W1 and the second disk W2 are disposed in the chamber 20 so as to face each other in the vertical direction. Note that an adhesive is uniformly applied to the upper surface of the first disk W1 with a predetermined film thickness. After the upper container 20A is lowered by the opening / closing mechanism 40 and the chamber 20 is closed, the decompression mechanism 30 is operated to keep the inside of the chamber 20 at a high vacuum.
- the lifting mechanism 70 is operated with respect to the circular support W2 held in this way to lower the pressure disk 60, and the lower surface of the pressure disk 60 contacts the upper surface of the second disk W2. After that, a downward force is applied to the second disk W2 by further lowering the pressure disk 60. As a result, the second disk W2 descends, and the lower surface of the second disk W2 comes into contact with the adhesive layer R applied to the upper surface of the first disk W1 supported on the stage 50.
- the pressure disk 60 is flush with the lower surface of the pressure disk 60 corresponding to the location where the pins 81 and 82 on the side surface of the second disk W2 are in contact. Since the protrusions 61 and 62 are set to, the dimension from the center of the lower surface of the pressurizing disk 60 that pressurizes the second disk to the outer edge is at the position where the pins 81 and 82 are in contact with each other. The length of the pins 61 and 62 is longer than the portion where the pins 81 and 82 are not in contact (that is, the same size as the radius).
- the pressure of the pressure disk 60 is firmly applied to the portion where the pins 81 and 82 are in contact with each other, where the resistance force becomes relatively large. Therefore, the outer edge portion of the second disc W2 is prevented from turning up. As a result, the adhesive layer is contacted with the flatness of the lower surface of the second disc W2 secured, and an adverse effect on the finish after bonding is suppressed as a problem unique to the holding mechanism.
- the second disc W2 is detached from the holding mechanism 80 while the pressurizing disc 60 is continuously lowered by the elevating mechanism 70.
- the upper surface of the second disc W2 is pressed with a uniform force on the stage 50 by the pressurizing disc 60, and the upper surface of the first disc W1 and the lower surface of the second disc W2 form the adhesive layer.
- a disk laminate bonded together is produced.
- the first disc W1, the second disc W2, and the pressure disc 60 are centered in advance.
- the pressure disk 60 is a protrusion that is set flush with the lower surface of the pressure disk 60 corresponding to the location where the notch N of the second disk W ⁇ b> 2 is formed. Since the portion 61 is included, the dimension from the center of the lower surface of the pressurizing disc 60 that pressurizes the second disc W2 to the outer edge is not uniform in the circumferential direction, and the notch has a notch corresponding to the projection 61. The length is longer than that of the portion not formed (that is, the same dimension as the radius). For this reason, the pressure of a pressurization disc comes to act firmly on the notch part with which the amount of adhesive which can protrude is absolutely small at the time of pressurization processing.
- thermosetting resin or a UV curable resin is used as an example of the adhesive.
- the disk laminate after the bonding is taken out from the bonding apparatus 10, and the adhesive layer is solidified by heating or UV irradiation in the next step to obtain a product.
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- Engineering & Computer Science (AREA)
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- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract
Description
20…チャンバ
30…減圧機構
40…開閉機構
50…ステージ
60…加圧円板
61,62…突起部
70…昇降機構
80…保持機構
81…可動ピン
82…不動ピン
83…移動機構
W1…第1円板
W2…第2円板 DESCRIPTION OF
Claims (7)
- ステージ上に支持され、上面に接着剤が均一に塗布された第1円板の上方に、側面の一箇所に角度合せ用のノッチを有する第2円板が対向配置されており、前記第2円板よりも小さな直径寸法に設定されるとともに、前記第1円板および前記第2円板に対して中心合わせがなされ、前記第2円板の上面に密着して前記ステージ上で前記第1円板に対して前記第2円板を加圧する加圧円板であって、
前記第2円板の前記ノッチに対応して、前記加圧円板の側面に、前記加圧円板の下面と面一に設定される突起部が形成されたことを特徴とする加圧円板。 A second disk having a notch for angle adjustment at one place on the side is disposed above the first disk supported on the stage and uniformly coated with an adhesive on the upper surface. The diameter is set smaller than that of the disc, and the first disc and the second disc are centered, and the first disc on the stage is in close contact with the upper surface of the second disc. A pressurizing disc that pressurizes the second disc against a disc,
Corresponding to the notch of the second disk, a pressing circle is formed on the side surface of the pressing disk that is set to be flush with the lower surface of the pressing disk. Board. - 前記第2円板は、その側面の複数箇所に当接される複数のピンによって中心方向に向かう力を受けて前記ステージの上方、かつ、前記加圧円板の下方に離脱可能に保持されており、前記複数のピンが当接される箇所に対応して、前記加圧円板の側面に、前記加圧円板の下面と面一に設定される突起部が形成された、請求項1に記載の加圧円板。 The second disk is detachably held above the stage and below the pressure disk by receiving a force in the central direction by a plurality of pins that are in contact with a plurality of positions on a side surface of the second disk. And a protrusion that is set to be flush with a lower surface of the pressurization disk is formed on a side surface of the pressurization disk corresponding to a place where the plurality of pins are in contact with each other. Pressurized disk as described in 1.
- 請求項1に記載の加圧円板と、
気密性を有する処理室と、
前記処理室内に配置され、前記第1円板を支持するステージと、
前記加圧円板を昇降可能に支持する昇降機構と、
前記第2円板を、前記ステージの上方、かつ、前記加圧円板の下方に離脱可能に保持する保持機構と、
を有する、貼り合せ装置。 A pressure disk according to claim 1;
An airtight process chamber;
A stage disposed in the processing chamber and supporting the first disc;
An elevating mechanism for supporting the pressurizing disk so as to be elevable;
A holding mechanism for releasably holding the second disk above the stage and below the pressure disk;
A laminating apparatus. - 請求項2に記載の加圧円板と、
気密性を有する処理室と、
前記処理室内に配置され、前記第1円板を支持するステージと、
前記加圧円板を昇降可能に支持する昇降機構と、
前記第2円板を、前記ステージの上方、かつ、前記加圧円板の下方に離脱可能に保持する保持機構と、
を有する、貼り合せ装置。 A pressure disk according to claim 2;
An airtight process chamber;
A stage disposed in the processing chamber and supporting the first disc;
An elevating mechanism for supporting the pressurizing disk so as to be elevable;
A holding mechanism for releasably holding the second disk above the stage and below the pressure disk;
A laminating apparatus. - 前記保持機構は、前記第2円板の側面の一箇所に当接する1本の可動ピンと、前記第2円板の側面の複数箇所に当接する複数本の不動ピンと、前記可動ピンを前記第2円板の半径方向に往復移動させる移動機構と、を備える、請求項4に記載の貼り合せ装置。 The holding mechanism includes one movable pin that contacts one place on the side surface of the second disk, a plurality of fixed pins that contact a plurality of places on the side surface of the second disk, and the second pin that moves the movable pin to the second position. The bonding apparatus according to claim 4, further comprising: a moving mechanism that reciprocates in a radial direction of the disk.
- 前記可動ピンは前記第2円板の側面の一箇所に設けられた角度合わせ用ノッチに係合される、請求項5に記載の貼り合せ装置。 The bonding apparatus according to claim 5, wherein the movable pin is engaged with an angle adjusting notch provided at one place on a side surface of the second disk.
- ステージ上に支持された、接着剤が上面に均一に塗布された第1円板の上方に、側面の一箇所に角度合わせ用のノッチが形成された第2円板が対向保持され、前記第1円板および前記第2円板と中心合わせがなされた加圧円板により前記第2円板の上面を均等な力で加圧して前記第1円板および前記第2円板を貼り合せて円板積層体を作製する貼り合せ方法において、
前記加圧円板に、前記第2円板の前記ノッチに対応する箇所に突起部が形成された加圧円板を用いる、貼り合せ方法。 A second disk having a notch for angle adjustment formed at one side of the side is held oppositely above the first disk supported on the stage and coated with the adhesive uniformly on the upper surface. The upper surface of the second disk is pressed with an equal force by a pressure disk centered with the first disk and the second disk, and the first disk and the second disk are bonded together. In the laminating method for producing the disk laminate,
A laminating method, wherein a pressure disk having a protrusion formed at a position corresponding to the notch of the second disk is used as the pressure disk.
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WO2021041417A1 (en) * | 2019-08-27 | 2021-03-04 | Applied Materials, Inc. | Asymmetry correction via oriented wafer loading |
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JP2000188245A (en) * | 1998-12-21 | 2000-07-04 | Shin Etsu Handotai Co Ltd | Method for connecting wafer |
JP2004296907A (en) * | 2003-03-27 | 2004-10-21 | Shibaura Mechatronics Corp | Substrate laminating apparatus |
JP2008182127A (en) * | 2007-01-25 | 2008-08-07 | Tokyo Ohka Kogyo Co Ltd | Overlay unit and lamination device |
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JP3991300B2 (en) * | 2000-04-28 | 2007-10-17 | 株式会社Sumco | Manufacturing method of bonded dielectric isolation wafer |
US7378332B2 (en) * | 2002-05-20 | 2008-05-27 | Sumitomo Mitsubishi Silicon Corporation | Laminated substrate, method of manufacturing the substrate, and wafer outer periphery pressing jigs used for the method |
JP4405246B2 (en) * | 2003-11-27 | 2010-01-27 | スリーエム イノベイティブ プロパティズ カンパニー | Manufacturing method of semiconductor chip |
JP4698519B2 (en) * | 2006-07-31 | 2011-06-08 | 日東電工株式会社 | Semiconductor wafer mount equipment |
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JP2000188245A (en) * | 1998-12-21 | 2000-07-04 | Shin Etsu Handotai Co Ltd | Method for connecting wafer |
JP2004296907A (en) * | 2003-03-27 | 2004-10-21 | Shibaura Mechatronics Corp | Substrate laminating apparatus |
JP2008182127A (en) * | 2007-01-25 | 2008-08-07 | Tokyo Ohka Kogyo Co Ltd | Overlay unit and lamination device |
Cited By (3)
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WO2021041417A1 (en) * | 2019-08-27 | 2021-03-04 | Applied Materials, Inc. | Asymmetry correction via oriented wafer loading |
US11282755B2 (en) | 2019-08-27 | 2022-03-22 | Applied Materials, Inc. | Asymmetry correction via oriented wafer loading |
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KR101544734B1 (en) | 2015-08-17 |
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