WO2013063816A1 - 液晶显示器超窄边框结构 - Google Patents

液晶显示器超窄边框结构 Download PDF

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Publication number
WO2013063816A1
WO2013063816A1 PCT/CN2011/081886 CN2011081886W WO2013063816A1 WO 2013063816 A1 WO2013063816 A1 WO 2013063816A1 CN 2011081886 W CN2011081886 W CN 2011081886W WO 2013063816 A1 WO2013063816 A1 WO 2013063816A1
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Prior art keywords
line
color
color resist
tft
resist line
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PCT/CN2011/081886
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English (en)
French (fr)
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刘明
丁涛
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深圳市华星光电技术有限公司
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Priority to US13/381,929 priority Critical patent/US8976326B2/en
Priority to DE112011105806.3T priority patent/DE112011105806B4/de
Publication of WO2013063816A1 publication Critical patent/WO2013063816A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

Definitions

  • the present invention relates to the field of display technologies, and in particular, to an ultra-narrow bezel structure of a liquid crystal display. Background technique
  • the narrow bezel design of the display is a trend in the display field, and the distance from the PI (polyimide) film edge to the AA area (Active Area, display area) has been the most difficult to control of the PI coating equipment, and in the finished product.
  • the Mura (color difference) defect caused by the uneven film thickness of the edge of the PI film is particularly serious.
  • the narrow bezel design method of TFT-LCD (Thin Film Transistor LCD) display products is mostly realized by overlapping of PI film and sealing material (Seal), but the final narrow frame is difficult to achieve customer pursuit due to uncontrollable factors of PI film. Or the design requirements of an ideal product. Therefore, the design of the narrow frame of the display device still needs to be further improved. Summary of the invention
  • the present invention provides an ultra-narrow bezel structure of a liquid crystal display, comprising: a TFT surface with a PI film on the inner surface, a CF surface with a PI film on the inner surface, a sealant and a first color resistance line and a second
  • the color resistance line, the inner surface of the TFT surface and the CF surface are vertically joined together, and the two seals are adhered to the edge of the inner surface of the TFT surface and the CF surface by the sealant, and the first color resistance line is colored by
  • the inner surface of the TFT surface is adjacent to the linear color resistance line formed by the continuous arrangement of the sealant along the edge of the TFT surface, and the second color resistance line is adhered to the sealant along the inner surface of the CF surface by the color resistance.
  • the edge of the CF surface is continuously arranged to extend a linear color resist line, and the first color resist line and the second color resist line are opposite to each other and block the diffusion of the PI film on the TFT surface and the
  • the third color resisting line is formed by intermittently extending the color resist on the inner surface of the TFT surface adjacent to the inner side of the first color resist line in the extending direction of the first color resist line. Dotted color resistance line.
  • the fourth color resist line is formed by intermittently extending the color resistance on the inner surface of the CF surface adjacent to the inner side of the second color resist line along the extending direction of the second color resist line. Dotted color resistance line.
  • the third color resistive line and the fourth color resist line are formed by the color resistance on the inner surface of the TFT surface adjacent to the inner side of the first color resist line along the first color resist line.
  • a dotted-shaped color resist line formed by intermittently extending, the fourth color resist line being intermittently arranged by the color resistance on the inner surface of the CF surface adjacent to the inner side of the second color resist line along the extending direction of the second color resist line
  • the color resistance of the dash line constituting the third color resist line of the dotted line and the color line of the dash line constituting the fourth color resist line of the dotted line are formed. Interlaced up and down.
  • the third color resist line and the fourth color resist line are different from the gap between the first color resist line and the second color resist line.
  • the first color resist line and the second color resist line are formed by using a blue pixel or a photoresist gap material.
  • the third color resist line is formed by using a blue pixel or a photoresist gap material.
  • the fourth color resist line is formed by using a blue pixel or a photoresist gap material.
  • the present invention can effectively control the diffusion region of the PI film by setting the color resistance line, fundamentally controlling the distance from the edge of the PI film to the display area, and realizing an ultra-narrow bezel design;
  • the surface is provided with a color resistance line with a short horizontal line between the gaps, so that the PI film can be well diffused at the edge, and the peripheral chromatic aberration can be effectively solved.
  • FIG. 1 is a schematic structural view of an ultra-narrow bezel structure of a liquid crystal display according to the present invention
  • FIG. 2 is a plan view showing the overall effect of a preferred embodiment of the ultra-narrow bezel structure of the liquid crystal display of the present invention. detailed description
  • FIG. 1 it is a schematic structural view of an ultra-narrow bezel structure of a liquid crystal display according to the present invention.
  • the ultra-narrow bezel structure of the liquid crystal display comprises: a TFT surface 1 provided with a PI film on the inner surface, a CF (color filter) surface 2 provided with a PI film on the inner surface, a sealant (not shown) and a first color a blocking line 31 and a second color resisting line 32.
  • the inner surfaces of the TFT surface 1 and the CF surface 2 are vertically joined together, and the two are bonded to each other at the edges of the inner surfaces of the TFT surface 1 and the CF surface 2 by the sealant.
  • the first color resist line 31 is a linear color resist line formed by the color resist on the inner surface of the TFT surface 1 adjacent to the sealant along the edge of the TFT surface 1.
  • the second color resist 32 is colored. Blocking the inner surface of the CF surface 2 close to the linear color resist line formed by the sealant continuously extending along the edge of the CF surface 2, the first color resist line 31 and the second color resist line 32 are vertically opposite each other and respectively The diffusion of the PI film on the TFT surface 1 and the CF surface 2 is blocked.
  • the TFT surface 1 refers to the side on which the TFT transistor is provided in the TFT-LCD liquid crystal panel structure
  • the CF surface 2 refers to the side on which the color filter is provided.
  • a third color resist line 33 is further disposed on the TFT surface 1 , and the third color resist line 33 is formed by the color resist on the inner surface of the TFT surface 1 adjacent to the first color resist line 31 along the first color resist line 31 .
  • the extending direction is intermittently arranged to extend the dotted-shaped color resistance line.
  • a fourth color resist line 34 is further disposed on the CF surface 2, and the fourth color resist line 34 is colored by the color resist
  • the inner surface of the CF surface 2 is adjacent to the inner side of the second color resisting line 32 and is arranged in a zigzag-shaped color resist line extending along the extending direction of the second resistive line 32.
  • the short-line color resist of the third color resist line 33 constituting the dotted line and the short-line color resist of the fourth color resist line 34 constituting the dotted line are formed. Interlaced up and down. After the inner surfaces of the TFT surface 1 and the CF surface 2 are vertically joined, the third color resist line 33 and the fourth color resist line 34 are different from the gap between the first color resist line 31 and the second color resist line 32. The positional relationship between the color resistance lines can be obtained by the dotted line reference in Fig. 1.
  • the first color resist line 31, the second color resist line 32, the third color resist line 33, and the fourth color resist line 34 may be formed of blue pixels (B in RGB) or PS (Photo Spacer) materials. That is, the illumination Mask (mask) forming the blue pixel or the PS is modified, and each color resistance line is formed according to the film formation process flow.
  • the color resist line Mask of the CF design size can be added to the new illumination Mask of the B-pixel image of the CF surface, and then processed according to the normal B pixel imaging process (Coating, illumination, development, baking);
  • a new color illumination line using a TFT design pattern size can be used for illumination, and a color resistance line of the TFT surface is formed according to a film formation process.
  • FIG. 2 is a top view of an overall effect of a preferred embodiment of the ultra-narrow bezel structure of the liquid crystal display of the present invention, and is a partial perspective view of the ultra-narrow bezel structure of the liquid crystal display according to the present invention.
  • Figure 2 shows: display area edge 10, PI film area 20, sealant 30, color resistance The line of defense 40, the color resist line 50 on the TFT surface, and the color resist line 60 on the CF surface.
  • the PI film region 20 simultaneously indicates the PI film on the TFT surface and the CF surface, and the color resist line 40 actually has a color resist line which coincides with the position.
  • the color resistance line 50 on the TFT surface and the color resistance line 60 on the CF surface are dotted lines formed by the color resistance of the short horizontal line form, which are designed in a staggered manner, and are spaced apart from each other, and no overlap occurs, and after the combination, the two pairs are There is a certain gap between them.
  • the invention uses the color resistance to form an anti-line to control the PI edge, that is, controls the PI edge to the display area distance, and this line of defense is also the theoretical edge of the PI film expansion, thereby realizing the feasibility of the ultra-narrow bezel design; Increasing the color resistance line and increasing the chromatic aberration is poor.
  • a short horizontal line color resistance line is formed between the CF surface and the TFT surface, and a plurality of color resistance lines are alternately used to improve the chromatic aberration.
  • the present invention can be applied to the field of TFT-LCD display, etc., in various fields such as reducing PI Halo (halo) regions, improving the diffusion precision of PI film edges, designing ultra-narrow bezels, and improving peripheral chromatic aberration.
  • the invention can effectively control the diffusion area of the PI film, fundamentally solve the distance from the edge of the PI film to the display area, and realize the ultra-narrow bezel design; in addition, the gap between the TFT surface and the CF surface is provided.
  • the color resistance line of the short horizontal line allows the PI film to diffuse well at the edge, which can effectively solve the peripheral chromatic aberration.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种液晶显示器超窄边框结构，包括：内表面设有PI膜的TFT面（1）、内表面设有PI膜的CF面（2）、密封胶及第一色阻防线（31）及第二色阻防线（32），该TFT面和CF面的内表面上下对合后通过该密封胶在该TFT面和CF面的内表面的边缘将两者粘合，该第一色阻防线为由色阻在该TFT面的内表面贴近该密封胶沿该TFT面边缘连续排列延伸形成的直线形的色阻防线，该第二色阻防线为由色阻在该CF面的内表面贴近该密封胶沿该CF面边缘连续排列延伸形成的直线形的色阻防线，该第一色阻防线及第二色阻防线上下正相对并且分别阻挡该TFT面及CF面上的PI膜扩散。该液晶显示器超窄边框结构能够有效地控制PI膜的扩散区域，实现超窄边框设计，能够有效地解决周边色差不良。

Description

液晶显示器超窄边框结构 技术领域
本发明涉及显示技术领域， 尤其涉及一种液晶显示器超窄边框结构。 背景技术
显示器的窄边框设计是显示领域发展的一个趋势， 而 PI (聚酰亚胺)膜 边缘到 AA区 （Active Area, 显示区） 的距离一直是 PI 涂布设备最难控制 的， 并且在成品中由于 PI膜边缘膜厚不均匀而造成的 Mura (色差)不良特 别严重。 TFT-LCD (薄膜晶体管 LCD )显示产品的窄边框设计方法大多采 用 PI膜与密封材料（Seal ) 重叠 （Overlap ) 来实现， 但是由于 PI膜不可 控因素导致最后的窄边框也很难达到客户追求或者理想产品的设计要求。 因此， 显示装置窄边框的设计仍需进一步完善。 发明内容
本发明的目的在于， 提供一种液晶显示器超窄边框结构， 利用色阻防 线来控制 PI边缘， 即控制 PI边缘到显示区距离， 同时采用多条色阻防线 交替设置来改善 Mura不良的现象。
为实现上述目的， 本发明提供一种液晶显示器超窄边框结构， 包括： 内表面设有 PI膜的 TFT面、 内表面设有 PI膜的 CF面、 密封胶及第一色 阻防线及第二色阻防线， 该 TFT面和 CF面的内表面上下对合后通过该密 封胶在该 TFT面和 CF面的内表面的边缘将两者粘合， 该第一色阻防线为 由色阻在该 TFT 面的内表面贴近该密封胶沿该 TFT面边缘连续排列延伸 形成的直线形的色阻防线， 该第二色阻防线为由色阻在该 CF 面的内表面 贴近该密封胶沿该 CF 面边缘连续排列延伸形成的直线形的色阻防线， 该 第一色阻防线及第二色阻防线上下正相对并且分别阻挡该 TFT面及 CF面 上的 PI膜扩散。
其中， 还包括第三色阻防线， 该第三色阻防线为由色阻在该 TFT面的 内表面邻近该第一色阻防线内侧沿该第一色阻防线延伸方向断续排列延伸 形成的虚线形的色阻防线。
其中， 还包括第四色阻防线， 该第四色阻防线为由色阻在该 CF 面的 内表面邻近该第二色阻防线内侧沿该第二色阻防线延伸方向断续排列延伸 形成的虚线形的色阻防线。 其中， 还包括第三色阻防线及第四色阻防线， 该第三色阻防线为由色 阻在该 TFT面的内表面邻近该第一色阻防线内侧沿该第一色阻防线延伸方 向断续排列延伸形成的虚线形的色阻防线， 该第四色阻防线为由色阻在该 CF 面的内表面邻近该第二色阻防线内侧沿该第二色阻防线延伸方向断续 排列延伸形成的虚线形的色阻防线。
其中， 所述 TFT面和 CF面的内表面上下对合后， 组成该虚线形的第 三色阻防线的短横线色阻与组成该虚线形的第四色阻防线的短横线色阻之 间上下交错。
其中， 所述 TFT面和 CF面的内表面上下对合后， 该第三色阻防线与 第四色阻防线距离该第一色阻防线及第二色阻防线的间隙不同。
其中， 所述第一色阻防线及第二色阻防线采用蓝像素或光阻间隙材料 形成。
其中， 所述第三色阻防线采用蓝像素或光阻间隙材料形成。
其中， 所述第四色阻防线采用蓝像素或光阻间隙材料形成。
本发明的有益效果： 本发明通过设置色阻防线， 能够有效地控制 PI膜 的扩散区域， 从根本上控制 PI膜边缘到显示区的距离， 实现超窄边框设 计； 此外， 在 TFT面与 CF面设有空隙相间的短横线的色阻防线， 让 PI膜 在边缘进行较好的扩散， 能够有效地解决周边色差不良。
为了能更进一步了解本发明的特征以及技术内容， 请参阅以下有关本 发明的详细说明与附图， 然而附图仅提供参考与说明用， 并非用来对本发 明加以限制。 附图说明
下面结合附图， 通过对本发明的具体实施方式详细描述， 将使本发明 的技术方案及其它有益效果显而易见。
附图中，
图 1为本发明液晶显示器超窄边框结构的结构示意图；
图 2为本发明液晶显示器超窄边框结构一较佳实施例的整体效果俯视 图。 具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果， 以下结合本发明 的优选实施例及其附图进行详细描述。
参见图 1 , 其为本发明液晶显示器超窄边框结构的结构示意图。 本发 明的液晶显示器超窄边框结构， 包括： 内表面设有 PI膜的 TFT面 1、 内 表面设有 PI膜的 CF (彩色滤光片） 面 2、 密封胶（图未示）及第一色阻 防线 31及第二色阻防线 32, 该 TFT面 1和 CF面 2的内表面上下对合后 通过该密封胶在 TFT面 1和 CF面 2的内表面的边缘将两者粘合， 该第一 色阻防线 31为由色阻在该 TFT面 1的内表面贴近该密封胶沿该 TFT面 1 边缘连续排列延伸形成的直线形的色阻防线， 该第二色阻防线 32 为由色 阻在该 CF面 2的内表面贴近该密封胶沿该 CF面 2边缘连续排列延伸形 成的直线形的色阻防线， 该第一色阻防线 31及第二色阻防线 32上下正相 对并且分别阻挡该 TFT面 1及 CF面上 2的 PI膜扩散。 本领域技术人员可 以理解， TFT 面 1 是指 TFT-LCD 液晶面板结构中设有 TFT 晶体管的一 面， CF面 2是指设有彩色滤光板的一面。
TFT面 1上还设有第三色阻防线 33, 该第三色阻防线 33为由色阻在 该 TFT面 1的内表面邻近该第一色阻防线 31内侧沿该第一色阻防线 31延 伸方向断续排列延伸形成的虚线形的色阻防线。
CF面 2上还设有第四色阻防线 34, 该第四色阻防线 34为由色阻在该
CF面 2的内表面邻近该第二色阻防线 32 内侧沿该第二色阻防线 32延伸 方向断续排列延伸形成的虚线形的色阻防线。
TFT面 1和 CF面 2的内表面上下对合后， 组成该虚线形的第三色阻 防线 33的短横线色阻与组成该虚线形的第四色阻防线 34的短横线色阻之 间上下交错。 TFT面 1和 CF面 2的内表面上下对合后， 第三色阻防线 33 与第四色阻防线 34距离该第一色阻防线 31及第二色阻防线 32的间隙不 同。 各色阻防线之间的位置关系可通过图 1中的虚线参考得出。
第一色阻防线 31、 第二色阻防线 32、 第三色阻防线 33及第四色阻防 线 34可以采用蓝像素 （ RGB中的 B )或 PS ( Photo Spacer, 光阻间隙）材 料形成， 即对形成蓝像素或 PS的光照 Mask (光罩）进行修改， 按照成膜 工艺流程形成各条色阻防线。
可在 CF面的 B像素成像的新光照 Mask中添加 CF设计图尺寸的色阻 防线 Mask, 然后再按照正常 B 像素成像的流程（Coating (涂布） 、 光 照、 显影、 烘烤）进行制程； 在 TFT面可以采用多增加一道采用 TFT设 计图尺寸的色阻防线新光照 Mask来进行光照， 按成膜流程形成 TFT面的 色阻防线。
参见图 2, 其为本发明液晶显示器超窄边框结构一较佳实施例的整体 效果俯视图， 具体为本发明的液晶显示器超窄边框结构组装后的局部的透 视示意图。 图 2中所示为： 显示区边缘 10、 PI膜区 20、 密封胶 30、 色阻 防线 40、 TFT面上的色阻防线 50及 CF面上的色阻防线 60。 图 2 中因 TFT面与 CF面上下对合， 因此 PI膜区 20同时表示了 TFT面与 CF面上 的 PI膜， 而且色阻防线 40 下面实际上还有一条位置重合的色阻防线。 TFT面上的色阻防线 50及 CF面上的色阻防线 60为短横线形式色阻组成 的虚线形， 上下交错设计， 两两间隔， 不会发生重叠现象， 并且对合后两 两之间有一定间隙。
本发明利用色阻形成防线来控制 PI边缘， 即控制 PI边缘到显示区距 离， 这条防线也是 PI膜外扩的理论最边缘， 从而实现超窄边框设计的可 行性； 为了同时改善色差不良或者增加色阻防线而加重的色差不良， 在 CF 面和 TFT面设置了空隙相间的短横线色阻防线， 同时采用多条色阻防 线进行交替来改善色差不良。
本发明可应用于 TFT-LCD显示领域等， 在减少 PI Halo (晕轮） 区、 改善 PI膜边缘扩散精度、 设计超窄边框、 改善周边色差等各个领域。 本发 明通过设置色阻防线， 能够有效地控制 PI膜的扩散区域， 从根本上解决 PI膜边缘到显示区的距离， 实现超窄边框设计； 此外， 在 TFT面与 CF面 各设有空隙相间的短横线的色阻防线， 让 PI膜在边缘进行较好的扩散， 能 够有效地解决周边色差不良。
以上所述， 仅为本发明的较佳实施例， 对于本领域的普通技术人员来 说， 可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变 形， 而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims

权 利 要 求
1、 一种液晶显示器超窄边框结构， 包括： 内表面设有 PI膜的 TFT 面、 内表面设有 PI膜的 CF面、 密封胶及第一色阻防线及第二色阻防线， 该 TFT面和 CF面的内表面上下对合后通过该密封胶在该 TFT面和 CF面 的内表面的边缘将两者粘合， 该第一色阻防线为由色阻在该 TFT面的内表 面贴近该密封胶沿该 TFT面边缘连续排列延伸形成的直线形的色阻防线， 该第二色阻防线为由色阻在该 CF 面的内表面贴近该密封胶沿该 CF 面边 缘连续排列延伸形成的直线形的色阻防线， 该第一色阻防线及第二色阻防 线上下正相对并且分别阻挡该 TFT面及 CF面上的 PI膜扩散。
2、 如权利要求 1 所述的液晶显示器超窄边框结构， 其中， 还包括第 三色阻防线， 该第三色阻防线为由色阻在该 TFT面的内表面邻近该第一色 阻防线内侧沿该第一色阻防线延伸方向断续排列延伸形成的虚线形的色阻 防线。
3、 如权利要求 1 所述的液晶显示器超窄边框结构， 其中， 还包括第 四色阻防线， 该第四色阻防线为由色阻在该 CF 面的内表面邻近该第二色 阻防线内侧沿该第二色阻防线延伸方向断续排列延伸形成的虚线形的色阻 防线。
4、 如权利要求 1 所述的液晶显示器超窄边框结构， 其中， 还包括第 三色阻防线及第四色阻防线， 该第三色阻防线为由色阻在该 TFT面的内表 面邻近该第一色阻防线内侧沿该第一色阻防线延伸方向断续排列延伸形成 的虚线形的色阻防线， 该第四色阻防线为由色阻在该 CF 面的内表面邻近 该第二色阻防线内侧沿该第二色阻防线延伸方向断续排列延伸形成的虚线 形的色阻防线。
5、 如权利要求 4 所述的液晶显示器超窄边框结构， 其中， 所述 TFT 面和 CF 面的内表面上下对合后， 组成该虚线形的第三色阻防线的短横线 色阻与组成该虚线形的第四色阻防线的短横线色阻之间上下交错。
6、 如权利要求 4 所述的液晶显示器超窄边框结构， 其中， 所述 TFT 面和 CF 面的内表面上下对合后， 该第三色阻防线与第四色阻防线距离该 第一色阻防线及第二色阻防线的间隙不同。
7、 如权利要求 1 所述的液晶显示器超窄边框结构， 其中， 所述第一 色阻防线及第二色阻防线采用蓝像素或光阻间隙材料形成。
8、 如权利要求 2 所述的液晶显示器超窄边框结构， 其中， 所述第三 色阻防线采用蓝像素或光阻间隙材料形成。
9、 如权利要求 3 所述的液晶显示器超窄边框结构， 其中， 所述第四 色阻防线采用蓝像素或光阻间隙材料形成。
PCT/CN2011/081886 2011-11-04 2011-11-07 液晶显示器超窄边框结构 WO2013063816A1 (zh)

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