WO2013059670A3 - Pointes octaédriques et de pyramide sur montant pour microscopie et lithographie - Google Patents

Pointes octaédriques et de pyramide sur montant pour microscopie et lithographie Download PDF

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Publication number
WO2013059670A3
WO2013059670A3 PCT/US2012/061132 US2012061132W WO2013059670A3 WO 2013059670 A3 WO2013059670 A3 WO 2013059670A3 US 2012061132 W US2012061132 W US 2012061132W WO 2013059670 A3 WO2013059670 A3 WO 2013059670A3
Authority
WO
WIPO (PCT)
Prior art keywords
octahedral
cantilever
tip
pyramid
lithography
Prior art date
Application number
PCT/US2012/061132
Other languages
English (en)
Other versions
WO2013059670A2 (fr
Inventor
Raymond Roger Shile
Original Assignee
Nanoink, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanoink, Inc. filed Critical Nanoink, Inc.
Publication of WO2013059670A2 publication Critical patent/WO2013059670A2/fr
Publication of WO2013059670A3 publication Critical patent/WO2013059670A3/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/08—Probe characteristics
    • G01Q70/10—Shape or taper
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/16—Probe manufacture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Micromachines (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

Selon la présente invention, un dispositif comprend un porte-à-faux et une pointe octaédrique s'étendant depuis une surface inférieure du porte-à-faux. La pointe octaédrique comprend une partie supérieure à laquelle la pointe octaédrique est fixée au porte-à-faux, une partie inférieure comprenant un premier sommet et une partie intermédiaire disposée entre la partie supérieure et la partie inférieure, la partie intermédiaire comprenant quatre sommets additionnels et étant plus large que la partie supérieure et la partie inférieure. Un autre dispositif comprend un porte-à-faux et une pointe s'étendant depuis une surface inférieure du porte-à-faux. La pointe comprend une partie de montant allongée et une partie pyramidale située à une extrémité de la partie de montant allongée. Le porte-à-faux et la pointe sont formés d'une couche continue de matière ayant une épaisseur entre 400 nm et 1 000 nm.
PCT/US2012/061132 2011-10-21 2012-10-19 Pointes octaédriques et de pyramide sur montant pour microscopie et lithographie WO2013059670A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161550305P 2011-10-21 2011-10-21
US61/550,305 2011-10-21

Publications (2)

Publication Number Publication Date
WO2013059670A2 WO2013059670A2 (fr) 2013-04-25
WO2013059670A3 true WO2013059670A3 (fr) 2013-06-27

Family

ID=47291214

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2012/061132 WO2013059670A2 (fr) 2011-10-21 2012-10-19 Pointes octaédriques et de pyramide sur montant pour microscopie et lithographie

Country Status (1)

Country Link
WO (1) WO2013059670A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112062084A (zh) * 2020-08-25 2020-12-11 华南理工大学 一种高分辨率的硅基中空悬臂探针及其制备方法

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US20090325816A1 (en) * 2006-04-19 2009-12-31 Northwestern University Massively parallel lithography with two-dimensional pen arrays
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DE19914838A1 (de) 1999-04-01 2000-10-05 Thomson Brandt Gmbh Verfahren zum Zusammenstellen von Buspaketen für die Isochrondatenübertragung über einen Datenbus sowie Vorrichtung zur Durchführung des Verfahrens
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
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US6737646B2 (en) 2001-06-04 2004-05-18 Northwestern University Enhanced scanning probe microscope and nanolithographic methods using the same
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US7247895B2 (en) 2001-07-26 2007-07-24 The Board Of Trustees Of The University Of Illinois Electrostatic nanolithography probe actuation device and method
AU2002337793A1 (en) 2001-10-02 2003-05-12 Northwestern University Protein and peptide nanoarrays
US7361310B1 (en) 2001-11-30 2008-04-22 Northwestern University Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
JP2005513768A (ja) 2001-12-17 2005-05-12 ノースウエスタン ユニバーシティ 直接書込みナノリソグラフィック印刷による固体フィーチャのパターニング
US7279046B2 (en) 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
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US8071168B2 (en) 2002-08-26 2011-12-06 Nanoink, Inc. Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair
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US7034854B2 (en) 2002-11-12 2006-04-25 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
EP1855861A4 (fr) 2003-07-18 2010-12-01 Univ Northwestern Polymerisation en surface et specifique a un site par lithographie a gravure directe
US7541062B2 (en) 2004-08-18 2009-06-02 The United States Of America As Represented By The Secretary Of The Navy Thermal control of deposition in dip pen nanolithography
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040226464A1 (en) * 2003-05-16 2004-11-18 Chad Mirkin Scanning probe microscopy probe and method for scanning probe contact printing
US20090325816A1 (en) * 2006-04-19 2009-12-31 Northwestern University Massively parallel lithography with two-dimensional pen arrays
US20110055987A1 (en) * 2009-08-26 2011-03-03 Advanced Diamond Technologies, Inc. Method to reduce wedge effects in molded trigonal tips

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Title
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