WO2013034060A1 - 彩膜基板及电容式触摸屏 - Google Patents

彩膜基板及电容式触摸屏 Download PDF

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Publication number
WO2013034060A1
WO2013034060A1 PCT/CN2012/080671 CN2012080671W WO2013034060A1 WO 2013034060 A1 WO2013034060 A1 WO 2013034060A1 CN 2012080671 W CN2012080671 W CN 2012080671W WO 2013034060 A1 WO2013034060 A1 WO 2013034060A1
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WO
WIPO (PCT)
Prior art keywords
layer
metal
metal layer
color filter
filter substrate
Prior art date
Application number
PCT/CN2012/080671
Other languages
English (en)
French (fr)
Inventor
王世君
陈小川
Original Assignee
北京京东方光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 北京京东方光电科技有限公司 filed Critical 北京京东方光电科技有限公司
Priority to KR1020127032318A priority Critical patent/KR101470607B1/ko
Priority to US13/700,889 priority patent/US8964132B2/en
Priority to EP12788100.1A priority patent/EP2755077B1/en
Priority to JP2014528839A priority patent/JP6084615B2/ja
Publication of WO2013034060A1 publication Critical patent/WO2013034060A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/94—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the way in which the control signals are generated
    • H03K17/96—Touch switches
    • H03K17/962—Capacitive touch switches
    • H03K17/9622—Capacitive touch switches using a plurality of detectors, e.g. keyboard

Definitions

  • the present disclosure relates to the field of liquid crystal display, and in particular, to a color film substrate and a capacitive touch screen. Background technique
  • the manufacturing process of the liquid crystal display mainly comprises: manufacturing a color filter substrate (CF), comprising sequentially forming a black matrix (BM), a color film layer, a flat layer and a common electrode on the substrate; manufacturing the array substrate; The array substrate and the color filter substrate are subjected to alignment processing, and the array substrate and the color film substrate are aligned and then poured into the liquid crystal to form a liquid crystal cell; the polarizing plate, the backlight and the driving circuit are assembled to form a module having an independent standard external interface. As shown in Fig. 1, in the manufacture of a color filter substrate, a black matrix 12 is first formed on the substrate 11 for preventing sub-pixel color mixing of each pixel.
  • BM black matrix
  • the black matrix 12 causes a difference in surface flatness when the color layer (color layer) is subsequently formed, that is, when red (Red, R), green (Green, G), and blue (Blue, B) color layers are formed. Therefore, planarization by the flat layer 13 is required to perform the preparation of the next common electrode 14.
  • Touch screens are typically made by adding a layer of sensing layer for determining touch points on the liquid crystal panel.
  • a capacitive sensor is usually fabricated on the back surface of the substrate of the color filter substrate.
  • the capacitance sensor includes an insulating layer 16 sandwiched between two upper and lower transparent conductive films 15 (ITO) and sandwiched between two transparent conductive films 15.
  • ITO transparent conductive films
  • Two upper and lower transparent conductive films 15 are used as the upper plate 17 and the lower plate 18 of the capacitor, respectively.
  • the capacitance of the touch point changes, causing a change in the current or pulse signal of different rows and columns in the horizontal and vertical directions, so that the horizontal and vertical sensors respectively sense the coordinates of the horizontal and vertical directions of the touch point. Addressing is achieved.
  • the present disclosure provides a color film substrate and a capacitive touch screen, which is thinner than the color film substrate and the capacitive touch screen in the prior art, and at the same time, reduces the number of manufacturing layers in the production process, optimizes the production process, and reduces the cost.
  • the present disclosure is directed to a color filter substrate including: a substrate; a color film layer formed on the substrate, the color film layer including a plurality of sub-pixels; and a sensing layer formed on the substrate,
  • the sensing layer includes a first metal layer, a second metal layer, and an insulating layer between the first metal layer and the second metal layer, the first metal layer, the second metal layer, and the insulating layer
  • At least one of the light-shielding materials is formed by a light-shielding material, and the projection of the light-shielding material on the color film layer forms a mesh shape and correspondingly blocks the position between the sub-pixel cells.
  • the first metal layer and the second metal layer in the sensing layer are both made of the light shielding material.
  • the insulating layer in the sensing layer is made of a transparent insulating material. In one embodiment, a portion of the insulating layer in the sensing layer is made of the light shielding material. In one embodiment, the first metal layer and the second metal layer in the sensing layer are formed of a transparent conductive material.
  • the first metal layer and a portion of the insulating layer in the sensing layer are made of the light shielding material.
  • the second metal layer and a portion of the insulating layer in the sensing layer are made of the light shielding material.
  • the first metal layer is composed of a plurality of first metal stripes arranged at equal intervals in a first direction, and the first metal stripes are formed by a plurality of wide portions and a plurality of narrow portions, The wide portion and the narrow portion are alternately arranged and sequentially connected;
  • the second metal layer is composed of a plurality of second metal stripes arranged at equal intervals in the second direction, the second metal stripe being composed of a plurality of wide portions and narrow The portion is formed such that a plurality of wide portions and narrow portions are alternately arranged and sequentially connected, and the second direction is perpendicular to the first direction.
  • the first metal stripe and the second metal stripe respectively block a position between the sub-pixel grids, and the wide portion of the first metal stripe and the wide portion of the second metal stripe are opposite each other, respectively forming a
  • the upper and lower plates of the capacitance of the sensor, the narrow portion of the first metal strip and the narrow portion of the second metal strip form a lead connecting the capacitors.
  • the insulating layer is in the form of a sheet.
  • the sensing layer is between the substrate and the color film layer.
  • the sensing layer and the color film layer are respectively located on opposite sides of the substrate.
  • the present disclosure is directed to a capacitive touch screen including the color film substrate described above.
  • the metal layer or a part of the insulating layer in the sensing layer of the color film substrate and the capacitive touch screen is made of a light shielding material, and has the same shielding effect; therefore, the color film substrate and the capacitive touch screen in the present disclosure
  • the black matrix can be omitted in the production process, and the thickness of the color filter substrate can be effectively reduced.
  • the color adhesive layer can be directly formed on the substrate, so the surface of the color adhesive layer has good flatness, and it is not necessary to manufacture a flat layer for flattening the color rubber, thereby reducing the number of manufacturing layers and optimizing the production process. , reducing costs while being lighter than the prior art.
  • FIG. 1 is a schematic side cross-sectional view of a color filter substrate of a conventional capacitive touch screen
  • FIG. 2 is a schematic side cross-sectional view showing a capacitor structure of a conventional capacitive touch screen
  • FIG. 3 is a schematic side view of a sensing layer of a color filter substrate according to a first embodiment of the present disclosure
  • FIG. 4 is a schematic side cross-sectional view of the color filter substrate of the first embodiment of the present disclosure
  • FIG. 5 is a schematic plan view of two upper and lower metal layers of a sensing layer of a color filter substrate according to a first embodiment of the present disclosure
  • Figure 6 is a schematic side sectional view showing a color filter substrate of a second embodiment of the present disclosure.
  • Figure 7 is a schematic side sectional view of a color filter substrate of a third embodiment of the present disclosure.
  • Fig. 8 is a schematic plan view of an insulating layer of a third embodiment of the present disclosure. detailed description
  • FIG. 3 shows a sensing layer of a color filter substrate according to a first embodiment of the present disclosure.
  • 4 is a schematic side sectional view of a color filter substrate of a first embodiment of the present disclosure.
  • FIG. 5 is a schematic plan view of two upper and lower metal layers of a sensing layer of a color filter substrate according to a first embodiment of the present disclosure.
  • the color filter substrate includes a substrate 11, a color film layer 20, and a sensing layer 19.
  • the color film layer 20 includes a plurality of sub-pixel grids, such as the RGB sub-pixel grids shown in FIG.
  • the sensing layer 19 includes a first metal layer 21, a second metal layer 22, and an insulating layer 16.
  • the first metal layer 21 and the second metal layer 22 are each made of a light shielding material, and the first metal layer 21 and the second metal layer 22 overlap each other and form a mesh structure as shown in the top view of FIG.
  • the projection of the light-shielding material composed of the first metal layer 21 and the second metal layer 22 on the color film layer 20 forms a network structure and correspondingly blocks the position between the sub-pixel cells.
  • the insulating layer 16 of the sensing layer 19 is made of a transparent insulating material, and the insulating layer 16 has a sheet shape and is embedded between the first metal layer 21 and the second metal layer 22. As shown in FIG.
  • the first metal layer 21 and the second metal layer 22 Corresponding to the position between the sub-pixels of the occlusion color film substrate, for example, the boundary between the sub-pixel R and the sub-pixel G and the boundary between the sub-pixel G and the sub-pixel B.
  • the first metal layer 21 includes a plurality of first metal stripes arranged at equal intervals in a horizontal direction, and each of the first metal stripes includes a plurality of wide portions and a plurality of narrow portions.
  • the above-mentioned wide portion and narrow portion are alternately arranged and sequentially connected.
  • the second metal layer 22 includes a plurality of second metal stripes arranged at equal intervals in a vertical direction, and each of the second metal stripes includes a plurality of wide portions and a plurality of narrow portions, the wide portion and the narrow portion Alternately arranged and connected in sequence.
  • the first metal stripe and the second metal stripe overlap, forming a mesh structure in a top view of FIG. 5, and correspondingly blocking a position between each sub-pixel grid, the first metal stripe and the second metal
  • Each of the overlapping positions of the stripes forms a capacitor 24 for determining the touch point.
  • the wide portion of the first metal stripe is opposite the wide portion of the second metal stripe and forms the upper plate 17 and the lower plate 18 of the capacitance of the sensing layer, respectively.
  • the narrow portion of the first metal stripe and the narrow portion of the second metal strip form a lead connecting the capacitors.
  • the capacitance 24 of the touch point changes, causing changes in the current or pulse signals of different rows and columns in the horizontal and vertical directions and passing through the leads between the capacitors, thereby detecting respectively by the detectors in the horizontal and vertical directions, and determining The coordinates at which the touch point occurs are addressed.
  • the first metal stripe and the second metal stripe enclose a light transmissive area 23, and each of the light transmissive areas 23 corresponds to a sub-pixel area.
  • the first metal layer 21 and the second metal layer 22 are located between adjacent light-transmitting regions 23, and the upper second metal layer is made of a light-shielding material, so that the regions of each sub-pixel are transparent, and each sub-pixel The area between the cells is blocked by the metal layer, thereby preventing light transmitted from a certain light-transmissive area 23 (corresponding to a sub-pixel area) and other surrounding light-transmissive areas (corresponding to other adjacent sub-pixels) Area) The color of light transmitted through. Therefore, the upper and second metal layers forming the capacitor plates can also function as a black matrix.
  • the sensing layer of the color film substrate according to the first embodiment of the present disclosure also has an occlusion function, which can replace the black matrix of the color film substrate in the prior art, so the step of fabricating the black matrix can be omitted in the color film substrate production process. Therefore, the color glue layer is directly formed on the substrate, and the surface of the color glue layer thus produced is flat, and the flat layer is not required to be manufactured, thereby reducing the number of manufacturing layers, optimizing the production process, and reducing the cost, compared with the prior art.
  • the color film substrate is lighter and thinner.
  • the sensing layer 19 formed on the substrate 11 and the color film layer 20 formed on the substrate 11 are located on opposite sides of the substrate 11. As shown in FIG. 6, according to the second embodiment of the present disclosure, the sensing layer 19 formed on the substrate 11 as shown in FIG. 3 is located between the substrate 11 and the color filter layer 20.
  • the present disclosure provides a third embodiment, as shown in FIG. Different from the embodiment shown in FIG. 4 and FIG. 6, a part of the insulating layer 16 in the sensing layer of the third embodiment is made of a light-shielding material and forms a mesh structure corresponding to the position between the sub-pixels.
  • the materials of the first metal layer 17 and the second metal layer 18 in the sensing layer are all transparent conductive materials such as ITO.
  • the insulating layer 16 in this embodiment includes a light shielding portion 25 having a light shielding function and a light transmitting portion surrounded by the light shielding portion 25, and the light transmitting portion forms a light transmitting region 23.
  • the light transmitting portion is formed of a transparent insulating material.
  • Each of the light transmissive regions 23 corresponds to a sub-pixel of the color filter substrate.
  • the light-shielding portion 25 surrounded by the light-transmitting region 23 is formed of an opaque insulating material to block the position between the corresponding sub-pixels, thereby preventing light transmitted from the light-transmitting region 23 (corresponding to light from a sub-pixel)
  • the light transmitted through the adjacent other light-transmitting regions (corresponding to the light from the adjacent sub-pixels) is mixed, and thus the light-shielding portion 25 forming the capacitance in the present embodiment functions as a black matrix at the same time.
  • the sensing layer 19 and the color film layer 20 are located on opposite sides of the substrate 11. It is also conceivable that the sensing layer is disposed between the substrate 11 and the color filter layer 20, similar to the embodiment shown in FIG.
  • a part of the insulating layer in the sensing layer of the color filter substrate is made of a light shielding material and formed into a mesh shape, corresponding to blocking the position between each sub-pixel grid, and shielding the black matrix. . Therefore, in the production process of the color filter substrate of the embodiment, the black matrix can be omitted, thereby directly forming a color adhesive layer on the substrate, which also makes the surface of the color adhesive layer flat, and no need to manufacture a flat layer, thereby reducing the number of layers. The number of layers is created, the production process is optimized, and the cost is reduced.
  • the first metal layer and a portion of the insulating layer in the sensing layer may also be made of the light shielding material, so that the projection of the first metal layer and a portion of the insulating layer on the color film layer Forming a mesh structure, or a second metal layer and a portion of the insulating layer in the sensing layer may also be made of the light shielding material, so that the projection of the second metal layer and a portion of the insulating layer on the color film layer forms a mesh structure.
  • the color filter substrate according to the disclosed embodiment is not limited to the precise form described above, as long as at least one of the first metal layer, the second metal layer, and the insulating layer is made of a light shielding material, and the light shielding material is
  • the projection on the color film layer forms a mesh shape and correspondingly blocks the position between the sub-pixel grids.
  • Embodiments of the present disclosure also provide a capacitive touch screen including the color film substrate described above.
  • any of the color film substrates described in the above embodiments is used.
  • the sensing layer of the color film substrate can play the same occlusion function as the black matrix, so
  • the capacitive touch screen in the embodiment can save the black matrix in the production process, effectively reduce the thickness of the color film substrate, and save the black matrix, and can directly make the color glue on the substrate, and the surface of the color adhesive layer is flat. There is no need to manufacture a flat layer to planarize the color paste, which reduces the number of layers produced, optimizes the production process, reduces the cost, and is lighter than the prior art.

Abstract

一种彩膜基板及包括其的电容式触摸屏。所述彩膜基板包括：基板（11）；形成于基板（11）上的彩膜层（20），所述彩膜层（20）包括有多个亚像素格；以及形成于基板（11）上的传感层（19），所述传感层（19）包括第一金属层（21）、第二金属层（22）和位于所述第一金属层（21）、第二金属层（22）之间的绝缘层（16），所述第一金属层（21）、第二金属层（22）和所述绝缘层（16）的至少之一由遮光材料制成，该遮光材料在彩膜层（20）上的投影形成网状并对应遮挡各亚像素格之间的位置。从而，在生产过程中可减少制造层数、较现有技术轻薄，同时可优化生产工艺，降低成本。

Description

彩膜基板及电容式触摸屏 技术领域
本公开涉及液晶显示领域， 尤其涉及一种彩膜基板及电容式触摸屏。 背景技术
触摸屏液晶显示器发展迅速， 已经逐渐发展成为主流平板显示器。 液晶 显示器的生产制造过程主要包括： 制造出彩膜基板（Color Filter, CF ), 包括 在基板上依序形成黑矩阵 (Black Matrix, BM)、 彩膜层、 平坦层及公共电极； 制造阵列基板； 阵列基板与彩膜基板经历配向处理， 将阵列基板与彩膜基板 对位贴合后灌入液晶， 构成液晶盒； 组装偏光板、 背光源和驱动电路， 形成 具有独立的标准外部接口的模块。 如图 1所示， 在制造彩膜基板时， 首先在 基板 11上制作一层黑矩阵 12, 用于防止各像素的亚像素混色。 然而该黑矩 阵 12导致在后续制作彩膜层（色胶层） 时， 即制作红 (Red, R), 绿 (Green, G), 蓝 (Blue, B)色胶层时导致表面平整度差， 因此需要通过平坦层 13来进 行平坦化， 才能进行下一步公共电极 14的制备。
触摸屏通常由在液晶面板上增加一层用于确定触摸点的传感层来制成。 对于电容式触摸屏， 通常在彩膜基板的基板背面上制作电容传感器。 如图 2 所示， 电容传感器包括由上下两层透明导电膜 15 ( Indium Tin Oxides, ITO ) 和夹在两层透明导电膜 15之间的一层绝缘层 16。上下两层透明导电膜 15分 别作为电容的上极板 17和下极板 18。 当触摸屏被触摸时， 触摸点的电容发 生变化， 引起横纵方向的不同行列的电流或者脉冲信号发生变化， 从而由横 向和纵向的传感器分别感应， 确定出触摸点发生的横纵方向的坐标， 实现了 寻址。
在上述触摸屏的制造过程中， 有着需要制作多层、 工艺复杂等的问题， 不利于降低触摸屏成本并使触摸屏轻薄化。 发明内容
本公开提供了一种彩膜基板及电容式触摸屏， 较现有技术中的彩膜基板 及电容式触摸屏轻薄， 同时， 在生产过程中减少了制造层数， 优化了生产工 艺， 降低了成本。 根据一个方面， 本公开涉及一种彩膜基板， 其包括： 基板； 形成于基板 上的彩膜层，所述彩膜层包括有多个亚像素格； 以及形成于基板上的传感层， 所述传感层包括第一金属层、 第二金属层和位于所述第一金属层、 第二金属 层之间的绝缘层， 所述第一金属层、 第二金属层和所述绝缘层的至少之一由 遮光材料制成， 该遮光材料在彩膜层上的投影形成网状并对应遮挡各亚像素 格之间的位置。
在一个实施例中， 所述传感层中的所述第一金属层和所述第二金属层均 由该遮光材料制成。
在一个实施例中， 所述传感层中的所述绝缘层由透明绝缘材料制成。 在一个实施例中， 所述传感层中的部分所述绝缘层由该遮光材料制成。 在一个实施例中， 所述传感层中的所述第一金属层和第二金属层由透明 导电材料形成。
在一个实施例中， 所述传感层中的所述第一金属层和部分所述绝缘层由 该遮光材料制成。
在一个实施例中， 所述传感层中的所述第二金属层和部分所述绝缘层由 该遮光材料制成。
在一个实施例中， 所述第一金属层由在第一方向等间距排列的多个第一 金属条紋构成， 所述第一金属条紋由多个宽部和多个窄部形成， 多个宽部和 窄部交替布置并顺序连接； 所述第二金属层由在第二方向等间距排列的多个 第二金属条紋构成， 所述第二金属条紋由多个宽部和窄部形成， 多个宽部和 窄部交替布置并顺序连接， 第二方向垂直于第一方向。 所述第一金属条紋和 所述第二金属条紋对应遮挡各亚像素格之间的位置， 所述第一金属条紋的宽 部和第二金属条紋的宽部相对， 分别形成所述传感器的电容的上极板和下极 板， 所述第一金属条紋的窄部和第二金属条紋的窄部形成连接各所述电容的 引线。
在一个实施例中， 所述绝缘层呈片状。
在一个实施例中， 所述传感层位于所述基板及彩膜层之间。
在一个实施例中， 所述传感层和所述彩膜层分别位于所述基板的相对两 侧。
根据另一个方面， 本公开涉及一种电容式触摸屏， 其包括上述的彩膜基 板。 根据本公开， 所述彩膜基板及电容式触摸屏的传感层中的金属层或部分 绝缘层由遮光材料制成， 起到同样的遮挡作用； 所以本公开中的彩膜基板及 电容式触摸屏在生产过程中可省去黑矩阵， 有效减小彩膜基板的厚度。 而且 由于省去黑矩阵，可以直接在基板上制作色胶层，所以色胶层表面平整度好， 不需要制造对色胶进行平坦化的平坦层， 因此减少了制造层数， 优化了生产 工艺， 降低了成本， 同时较现有技术轻薄。 附图说明
图 1为常规的电容式触摸屏的彩膜基板的示意侧视截面图；
图 2为常规的电容式触摸屏的电容结构的示意侧视截面图；
图 3为本公开的第一实施例的彩膜基板的传感层的示意侧视图； 图 4为本公开的第一实施例的彩膜基板的示意侧视截面图；
图 5为本公开的第一实施例的彩膜基板的传感层的上下两层金属层的示 意俯视图；
图 6为本公开的第二实施例的彩膜基板的示意侧视截面图；
图 7为本公开的第三实施例的彩膜基板的示意侧视截面图；
图 8为本公开的第三实施例的绝缘层的示意俯视图。 具体实施方式
下面结合附图对本公开的彩膜基板及电容式触摸屏进行详细描述。
图 3显示了根据本公开的第一实施例的彩膜基板的传感层。 图 4为本公 开的第一实施例的彩膜基板的示意侧视截面图。 图 5为本公开的第一实施例 的彩膜基板的传感层的上下两层金属层的示意俯视图。 该彩膜基板包括基板 11、 彩膜层 20和传感层 19。 彩膜层 20包括有多个亚像素格， 例如图 4中所 示的 RGB亚像素格。 传感层 19包括第一金属层 21、 第二金属层 22和绝缘 层 16。 第一金属层 21和第二金属层 22均由遮光材料制成， 所述第一金属层 21和所述第二金属层 22相互交叠， 并如图 5的俯视图中形成网状结构， 即 由第一金属层 21和第二金属层 22构成的遮光材料在彩膜层 20上的投影形成 网状结构， 并对应遮挡各亚像素格之间的位置。 所述传感层 19 中的绝缘层 16的材质为透明绝缘材料， 所述绝缘层 16呈片状， 嵌设在所述第一金属层 21和所述第二金属层 22之间。如图 4所示， 第一金属层 21和第二金属层 22 对应遮挡彩膜基板的各亚像素格之间的位置， 例如， 亚像素格 R与亚像素格 G的交界以及亚像素格 G与亚像素格 B的交界。
进一步地， 如图 5所示， 所述第一金属层 21 包括等间距沿水平方向排 列的多个第一金属条紋， 所述每个第一金属条紋包括多个宽部和多个窄部， 上述宽部和窄部交替布置并顺序连接。
所述第二金属层 22 包括等间距沿垂直方向排列的多个第二金属条紋， 所述每个第二金属条紋包括形成多个宽部和多个窄部， 上述宽部和窄部交替 布置并顺序连接。
所述第一金属条紋和所述第二金属条紋交叠， 在图 5的俯视图中形成网 状结构， 并对应遮挡各亚像素格之间的位置， 第一金属条紋和第二金属条紋 的每一个交叠位置形成一个电容 24, 用于确定触摸点。 所述第一金属条紋的 宽部和第二金属条紋的宽部相对，并分别形成传感层的电容的上极板 17和下 极板 18。所述第一金属条紋的窄部和第二金属条紋的窄部形成连接各电容的 引线。
当触摸时， 触摸点的电容 24发生变化， 引起水平和垂直方向不同行列 的电流或者脉冲信号发生变化并通过各电容间的引线传递出去， 从而由水平 和垂直方向的探测器分别探测， 确定出触摸点发生的坐标， 实现了寻址。 另 夕卜， 第一金属条紋和第二金属条紋围成透光区域 23 , 每一个透光区域 23都 对应一个亚像素的区域。 第一金属层 21和第二金属层 22位于各相邻的透光 区域 23之间，并且上第二金属层由遮光材料制成，所以各亚像素格的区域是 透明的， 而各亚像素格之间的区域被金属层遮挡， 由此可防止从某个透光区 域 23 (对应某个亚像素格的区域）透过的光与周围其他透光区域（对应其他 相邻亚像素格的区域）透过的光混色。 因此形成电容极板的上和第二金属层 也可起到黑矩阵的作用。
根据本公开的第一实施例的彩膜基板的传感层也具有遮挡功能， 能够取 代现有技术中彩膜基板的黑矩阵， 所以在彩膜基板生产过程中可省去制作黑 矩阵的步骤，从而直接在基板上制作色胶层，这样制作的色胶层的表面平整， 不需要再制造平坦层，从而减少了制造层数，优化了生产工艺， 降低了成本， 较现有技术中的彩膜基板更轻薄。
如图 4所示， 所述形成于基板 11上的传感层 19与形成于所述基板 11 上的所述彩膜层 20位于基板 11的相对两侧。 如图 6所示， 根据本公开的第二实施例， 如图 3所示的所述形成于基板 11上的传感层 19位于所述基板 11及彩膜层 20之间。
本公开提供了第三实施例， 如图 7所示。 与图 4和图 6所示的实施例不 同， 第三实施例的传感层中的部分绝缘层 16 由遮光材料制成并形成网状结 构， 对应遮挡在各亚像素格之间的位置， 传感层中的第一金属层 17、 第二金 属层 18的材质均为透明导电材料， 例如 ITO。
如图 7和 8所示， 本实施例中的绝缘层 16包括具有遮光功能的遮光部 分 25及由遮光部分 25围成的透光部分， 该透光部分形成透光区域 23。 为了 防止传感层的电容短路， 透光部分由透明的绝缘材料形成。 每一个透光区域 23对应彩膜基板的一个亚像素格。 而透光区域 23四围的遮光部分 25由不透 明的绝缘材料形成， 遮挡对应亚像素格之间的位置， 可防止从该透光区域 23 透过的光（对应来自某个亚像素格的光）与相邻的其他透光区域透过的光（对 应来自于相邻的亚像素格的光） 混色， 因此本实施例中形成电容的遮光部分 25同时起到黑矩阵的功能。
在图 7中， 传感层 19和彩膜层 20位于基板 11的相对两侧。 也可以设 想传感层设置于基板 11和彩膜层 20之间， 类似于图 6所示的实施例。
根据本公开的第三实施例， 所述彩膜基板传感层中的部分绝缘层由遮光 材料制成并形成网状， 对应遮挡各亚像素格之间的位置， 起到黑矩阵的遮挡 作用。 所以在本实施例的彩膜基板的生产过程中， 可以省去制作黑矩阵， 从 而直接在基板上制作色胶层， 这样也使得色胶层表面平坦化， 不再需要制造 平坦层， 减少了制造层数， 优化了生产工艺， 降低了成本。
另外， 在本公开的实施例中， 传感层中的第一金属层和部分所述绝缘层 也可以由该遮光材料制成， 从而第一金属层和部分绝缘层在彩膜层上的投影 形成网状结构，，或者传感层中的第二金属层和部分所述绝缘层也可以由该遮 光材料制成，从而第二金属层和部分绝缘层在彩膜层上的投影形成网状结构。 因此根据公开的实施例的彩膜基板并不限于上述的精确形式， 只要所述第一 金属层、 第二金属层和所述绝缘层的至少之一由遮光材料制成， 且该遮光材 料在彩膜层上的投影形成网状并对应遮挡各亚像素格之间的位置即可。
本公开的实施例还提供一种电容式触摸屏， 包括上述的彩膜基板。
根据本公开实施例的电容式触摸屏， 使用了上述实施例中所述的任一彩 膜基板。 所述彩膜基板的传感层能起到与黑矩阵同样的遮挡作用， 所以本实 施例中的电容式触摸屏在生产过程中可省去制作黑矩阵， 有效减小彩膜基板 的厚度， 而且省去黑矩阵， 可直接在基板上制作色胶， 色胶层表面平整度好， 不需要制造平坦层对色胶进行平坦化， 减少了制造层数， 优化了生产工艺， 降低了成本， 同时较现有技术轻薄。
以上所述， 仅为本公开的具体实施方式， 但本公开的保护范围并不局限 于此， 任何熟悉本技术领域的技术人员在本公开揭露的技术范围内， 可轻易 想到变化或替换， 都应涵盖在本公开的保护范围之内。 因此， 本公开的保护 范围应所述以权利要求的保护范围为准。

Claims

权利要求
1、 一种彩膜基板， 包括： 基板； 形成于基板上的彩膜层， 所述彩 膜层包括有多个亚像素格； 以及形成于基板上的传感层， 所述传感层 包括第一金属层、 第二金属层和位于所述第一金属层、 第二金属层之 间的绝缘层， 所述第一金属层、 第二金属层和所述绝缘层的至少之一 由遮光材料制成， 该遮光材料在彩膜层上的投影形成网状并对应遮挡 各亚像素格之间的位置。
2、 根据权利要求 1所述的彩膜基板， 其特征在于， 所述传感层中 的所述第一金属层和所述第二金属层均由该遮光材料制成。
3、 根据权利要求 2所述的彩膜基板， 其特征在于， 所述传感层中 的所述绝缘层由透明绝缘材料制成。
4、 根据权利要求 1所述的彩膜基板， 其特征在于， 所述传感层中 的部分所述绝缘层由该遮光材料制成， 且该遮光材料形成网状。
5、 根据权利要求 4所述的彩膜基板， 其特征在于， 所述传感层中 的所述第一金属层和第二金属层由透明导电材料形成。
6、 根据权利要求 1所述的彩膜基板， 其特征在于， 所述传感层中 的所述第一金属层和部分所述绝缘层由该遮光材料制成。
7、 根据权利要求 1所述的彩膜基板， 其特征在于， 所述传感层中 的所述第二金属层和部分所述绝缘层由该遮光材料制成。
8、 根据权利要求 1-7之一所述的彩膜基板， 其特征在于， 所述第一金属层由在第一方向等间距排列的多个第一金属条紋构 成， 所述第一金属条故由多个宽部和多个窄部形成， 多个宽部和窄部 交替布置并顺序连接；
所述第二金属层由在第二方向等间距排列的多个第二金属条紋构 成， 所述第二金属条紋由多个宽部和窄部形成， 多个宽部和窄部交替 布置并顺序连接， 第二方向垂直于第一方向；
所述第一金属条紋和所述第二金属条紋对应遮挡各亚像素格之间 的位置， 所述第一金属条紋的宽部和第二金属条紋的宽部相对， 分别 形成所述传感器的电容的上极板和下极板， 所述第一金属条紋的窄部 和第二金属条紋的窄部形成连接各所述电容的引线。
9、 根据权利要求 1-8之一所述的彩膜基板， 其特征在于， 所述绝 缘层呈片状。
10、 根据权利要求 1-9之一所述的彩膜基板， 其特征在于， 所述 传感层位于所述基板及彩膜层之间。
11、 根据权利要求 1-10之一所述的彩膜基板， 其特征在于， 所述 传感层和所述彩膜层分别位于所述基板的相对两侧。
12、一种电容式触摸屏， 包括根据权利要求 1-11任一项所述的彩膜 基板。
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