WO2012173343A3 - 원자간력 현미경（ａｆｍ）을 이용한 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 나노포지셔닝 기판 제조장치 및 제조방법 - Google Patents

원자간력 현미경（ａｆｍ）을 이용한 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 나노포지셔닝 기판 제조장치 및 제조방법 Download PDF

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WO2012173343A3
WO2012173343A3 PCT/KR2012/003994 KR2012003994W WO2012173343A3 WO 2012173343 A3 WO2012173343 A3 WO 2012173343A3 KR 2012003994 W KR2012003994 W KR 2012003994W WO 2012173343 A3 WO2012173343 A3 WO 2012173343A3
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tip
preparation
atomic force
force microscope
ink
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PCT/KR2012/003994
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English (en)
French (fr)
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WO2012173343A2 (ko
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하태환
박지은
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한국생명공학연구원
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Priority to US14/125,808 priority Critical patent/US9403180B2/en
Priority to EP12801029.5A priority patent/EP2720040B1/en
Publication of WO2012173343A2 publication Critical patent/WO2012173343A2/ko
Publication of WO2012173343A3 publication Critical patent/WO2012173343A3/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0005—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems, or methods for manufacturing the same
    • B81C99/0025—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems not provided for in B81C99/001 - B81C99/002
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/00029—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor provided with flat sample substrates, e.g. slides
    • G01N2035/00039—Transport arrangements specific to flat sample substrates, e.g. pusher blade
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nanotechnology (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Food Science & Technology (AREA)
  • Computer Hardware Design (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Hematology (AREA)
  • Molecular Biology (AREA)
  • Urology & Nephrology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Medicinal Chemistry (AREA)
  • Power Engineering (AREA)
  • Biomedical Technology (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micromachines (AREA)

Abstract

본 발명은 원자간력 현미경 이미징 수행방법인 딥-펜 나노리소그래피 기술에 관한 것으로, 더 상세하게는, 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 잉크 시스템의 나노포지셔닝 기판 제조장치 및 그 방법에 관한 것으로서, 본 발명에 따르면, 원자간력 현미경 이미징 수행 방법에 있어서, 팁을 잉크로 코팅하는 제 1 잉크저장부 및 제 2 잉크저장부와, 잉크가 코팅된 팁을 세척하는 제 1 세척부 및 제 2 세척부와, 팁을 기판에 새기는 패턴 색인부와, 전압을 걸어주는 전극 연결부와, 코팅된 팁이 ㎛ 스케일의 면적에서 위치를 확인하거나 위치를 결정하는 위치 확인부를 포함하고, 상기 위치 확인부는, 전압-전류의 변화, 전압에 따른 AFM 팁의 휨정도, AFM 이미지를 통해 위치를 확인하도록 구성되어, 원자간력 현미경 팁의 위치 재현성을 이용하여 다중 바이오 물질을 기판에 집적함으로써, ㎛ 스케일의 면적에서 바이오 물질의 밀도를 높일 수 있는 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 잉크 시스템의 나노포지셔닝 기판 제조장치 및 그 방법이 제공된다.
PCT/KR2012/003994 2011-06-13 2012-05-21 원자간력 현미경（ａｆｍ）을 이용한 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 나노포지셔닝 기판 제조장치 및 제조방법 WO2012173343A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US14/125,808 US9403180B2 (en) 2011-06-13 2012-05-21 Nanopositioning substrate preparation apparatus and preparation method using dip pen nanolithography with a single tip or multiple tips using atomic force microscope (AFM)
EP12801029.5A EP2720040B1 (en) 2011-06-13 2012-05-21 Nanopositioning substrate preparation apparatus and preparation method using dip pen nanolithography with single or multiple tips using atomic force microscope (afm)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110057070A KR101345337B1 (ko) 2011-06-13 2011-06-13 원자간력 현미경（ａｆｍ）을 이용한 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 나노포지셔닝 기판 제조장치 및 제조방법
KR10-2011-0057070 2011-06-13

Publications (2)

Publication Number Publication Date
WO2012173343A2 WO2012173343A2 (ko) 2012-12-20
WO2012173343A3 true WO2012173343A3 (ko) 2013-04-04

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PCT/KR2012/003994 WO2012173343A2 (ko) 2011-06-13 2012-05-21 원자간력 현미경（ａｆｍ）을 이용한 딥-펜 나노리소그래피에서의 단일 또는 다중팁을 이용한 나노포지셔닝 기판 제조장치 및 제조방법

Country Status (4)

Country Link
US (1) US9403180B2 (ko)
EP (1) EP2720040B1 (ko)
KR (1) KR101345337B1 (ko)
WO (1) WO2012173343A2 (ko)

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TWI614343B (zh) * 2014-04-21 2018-02-11 國立清華大學 膜電化學訊號之檢測系統
AU2017363146B2 (en) 2016-11-16 2023-11-02 Catalog Technologies, Inc. Systems for nucleic acid-based data storage
US10650312B2 (en) 2016-11-16 2020-05-12 Catalog Technologies, Inc. Nucleic acid-based data storage
US10459004B2 (en) * 2017-02-02 2019-10-29 TERA-print, LLC Electrical contact auto-alignment strategy for highly parallel pen arrays in cantilever free scanning probe lithography
RU2659103C1 (ru) * 2017-04-07 2018-06-28 Федеральное государственное бюджетное образовательное учреждение высшего образования "Владимирский Государственный Университет имени Александра Григорьевича и Николая Григорьевича Столетовых" (ВлГУ) Способ формирования планарных структур методом атомно-силовой литографии
JP7364604B2 (ja) 2018-03-16 2023-10-18 カタログ テクノロジーズ， インコーポレイテッド 核酸ベースのデータ記憶のための化学的方法
US20200193301A1 (en) 2018-05-16 2020-06-18 Catalog Technologies, Inc. Compositions and methods for nucleic acid-based data storage
EP3966823A1 (en) 2019-05-09 2022-03-16 Catalog Technologies, Inc. Data structures and operations for searching, computing, and indexing in dna-based data storage
CA3157804A1 (en) 2019-10-11 2021-04-15 Catalog Technologies, Inc. Nucleic acid security and authentication
AU2021271639A1 (en) 2020-05-11 2022-12-08 Catalog Technologies, Inc. Programs and functions in DNA-based data storage
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KR20070029151A (ko) * 2004-02-25 2007-03-13 나노잉크, 인크. 도전성 재료의 패터닝을 위한 마이크로미터 직접 기입 방법및 평판 표시 장치 수리에의 응용
KR20060052557A (ko) * 2004-11-12 2006-05-19 재단법인서울대학교산학협력재단 미끄러운 분자막을 이용하여 고체표면에 나노구조를선택적으로 위치 또는 정렬시키는 방법 및 그 응용
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Also Published As

Publication number Publication date
US20140134336A1 (en) 2014-05-15
WO2012173343A2 (ko) 2012-12-20
US9403180B2 (en) 2016-08-02
EP2720040A4 (en) 2015-05-06
KR101345337B1 (ko) 2013-12-30
KR20120137909A (ko) 2012-12-24
EP2720040A2 (en) 2014-04-16
EP2720040B1 (en) 2017-09-13

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