WO2012161011A1 - Substrat à luminophores pour dispositif d'affichage, dispositif d'affichage et procédé de fabrication de substrat à luminophores pour dispositif d'affichage - Google Patents

Substrat à luminophores pour dispositif d'affichage, dispositif d'affichage et procédé de fabrication de substrat à luminophores pour dispositif d'affichage Download PDF

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Publication number
WO2012161011A1
WO2012161011A1 PCT/JP2012/062284 JP2012062284W WO2012161011A1 WO 2012161011 A1 WO2012161011 A1 WO 2012161011A1 JP 2012062284 W JP2012062284 W JP 2012062284W WO 2012161011 A1 WO2012161011 A1 WO 2012161011A1
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Prior art keywords
display device
substrate
phosphor
layer
light
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PCT/JP2012/062284
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English (en)
Japanese (ja)
Inventor
真也 門脇
壮史 石田
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シャープ株式会社
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Publication of WO2012161011A1 publication Critical patent/WO2012161011A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133614—Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light

Definitions

  • the present invention relates to a phosphor substrate for a display device, a display device, and a method for manufacturing the phosphor substrate for a display device.
  • a liquid crystal display device which is a type of display device, includes, as a backlight, a device that combines a light source such as an LED (Light Emitting Diode) or a cold cathode tube, a light guide plate, and an optical sheet.
  • the liquid crystal display device includes a liquid crystal panel as an optical shutter.
  • the liquid crystal panel includes two substrates and a liquid crystal layer sealed between the two substrates.
  • a TFT element is provided on one surface of two substrates, and a color filter (CF) is provided on the other surface.
  • the white light of the backlight is emitted as light of a desired color by passing through one of the three primary colors of red, green, and blue provided as a color filter, but is incident by passing through the color filter. Since light components other than the color of the filter are absorbed, the amount of light is reduced to about 1/3.
  • Patent Document 1 proposes a display device including a backlight that emits blue light, a liquid crystal panel, and a phosphor substrate.
  • the phosphor substrate herein includes a phosphor that absorbs blue light and emits red light, and a phosphor that absorbs blue light and emits green light. Blue light is displayed by light transmitted through the blue color filter, but since the light source light is originally blue, there is almost no loss of light in the blue color filter. As described above, in the display device described in Patent Document 1, there is no loss of light amount due to absorption by the color filter, and light utilization efficiency is improved.
  • a method for forming a phosphor layer having a desired pattern on a phosphor substrate a method in which a phosphor is supplied and arranged only in a necessary region can be considered.
  • a method may be considered in which a phosphor layer is formed so as to cover the entire surface of the substrate, and only the phosphor layer in a necessary region is left and the others are removed.
  • the first method includes an inkjet method and various printing methods.
  • the second method includes a photolithography method.
  • the phosphor is applied to the entire substrate.
  • the first ink jet method applies a phosphor only to a necessary region. Therefore, compared with the second method, the ink jet method of the first method has an advantage that the amount of phosphor to be used can be reduced.
  • the inkjet method is preferable because the inkjet method can form a pattern with higher accuracy than the printing method.
  • the phosphor constituting the color filter needs to be disposed on the surface of the phosphor substrate on the side of the optical shutter, that is, the side on which light that has passed through the optical shutter enters.
  • Crosstalk here means that light that has passed through the optical shutter of one pixel enters a phosphor region other than the phosphor region of the color that correctly corresponds to that pixel. Since display quality deteriorates when crosstalk occurs, it is desirable that the crosstalk be as little or as little as possible.
  • the “pixel” refers to a monochrome pixel. For example, when one element of color display in an image is expressed by a combination of three different colors of single color display, it means an area for displaying one of the three colors.
  • the liquid crystal display device includes a color filter having a phosphor that emits red fluorescence when excited by blue light, and a phosphor that emits green fluorescence when excited by blue light, and further scatters at least blue light.
  • a light scattering film is provided.
  • a light-shielding partition wall is used to separate different color filters from each other. Is required.
  • partition walls 902 are arranged on the surface of the transparent substrate 901 opposite to the viewing side 5, and phosphors 903 r and 903 g are disposed between these partition walls 902. The light 4 from the backlight enters the phosphors 903r and 903g from below.
  • the light converted into a desired color by the phosphors 903r and 903g as color filters is in a state having a Lambertian distribution, that is, omnidirectionality, as schematically displayed in the phosphor 903r in FIG. Emits light. Therefore, not only light travels to the viewing side 5, but also much light travels in a direction that is not the viewing side 5. At this time, the light traveling toward the partition 902 adjacent to the side of the phosphor is absorbed by the partition 902.
  • an object of the present invention is to provide a phosphor substrate for a display device, a display device, and a method for manufacturing the phosphor substrate for a display device that can increase the light utilization efficiency.
  • a phosphor substrate for a display device includes a substrate having a main surface, a plurality of monochromatic layers formed on the main surface, each having a side surface, and the plurality of monochromatic layers.
  • a translucent partition wall disposed on the main surface so as to separate the two monochrome layers from each other while contacting the side surfaces of the two monochrome layers adjacent to each other.
  • the said partition has the groove part dug down to the depth which divides the said partition in the center. The groove portion becomes narrower as it approaches the main surface, and the inner surface of the groove portion is covered with a reflective film.
  • the light traveling sideways is reflected toward the viewing side by the reflective film and emitted from the substrate toward the viewing side.
  • the light utilization efficiency can be increased.
  • the barrier ribs 902 As shown in FIG. It is necessary to prepare a partition wall 902 having a tapered shape so that the viewing side 5 is wide, and to provide a reflective film on the tapered slope 907.
  • the “viewing side” is the transparent substrate 901 side that is the base material of the phosphor substrate. Accordingly, it is required to form a reflective film on the overhanging slope 907 so that the opening distance becomes narrower as the distance from the transparent substrate 901 increases.
  • the sputtering method usually used for forming the reflective film cannot form the reflective film on the so-called reverse tapered slope 907.
  • the inventors have made the present invention as an invention that can be realized by a sputtering method and that can improve the utilization efficiency of light.
  • the phosphor substrate 41 for a display device is adjacent to each other among the transparent substrate 1 as the substrate having the main surface 1a, the plurality of single-color layers 3 formed on the main surface 1a and each having a side surface, and the plurality of single-color layers 3.
  • the partition wall 2 has a groove 8 in the center that is dug down to a depth at which the partition wall 2 is divided. Groove portion 8 becomes narrower as it approaches main surface 1a.
  • the inner surface of the groove 8 is covered with the reflective film 6.
  • the transparent substrate 1 is, for example, a glass substrate.
  • the plurality of monochromatic layers 3 are preferably arranged by combining a combination of the three primary colors, such as red, green, and blue.
  • the plurality of monochromatic layers 3 may be phosphor layers that emit light of each color.
  • the partition walls 2 are translucent. Therefore, the light 11 traveling to the side can pass through the partition wall 2 and reach the reflection film 6. Since the reflection film 6 covers the inner surface of the groove portion 8 whose width becomes narrower as it approaches the main surface 1 a, the light 11 is reflected by the reflection film 6 toward the viewing side 5. Thus, the light 11 that originally traveled to the side is emitted from the transparent substrate 1 toward the viewing side 5. In this embodiment, the light utilization efficiency can be improved in this way.
  • a low refractive index layer 9 is preferably provided between the main surface 1 a of the transparent substrate 1 and the partition walls 2 and the monochromatic layer 3.
  • a low refractive index layer 10 is preferably provided on the surface of the monochromatic layer 3 opposite to the viewing side 5. If the low refractive index layers 9 and 10 are provided, a lot of light that is going to be emitted from the phosphor 3 in an inappropriate direction can be reflected by the low refractive index layers 9 and 10 and guided to the reflective film 6. By reflecting these lights with the reflective film 6, the light can be emitted from the transparent substrate 1 to the viewing side 5 with higher probability, which contributes to the improvement of the light utilization efficiency.
  • the cross-sectional shape of the groove 8 is preferably V-shaped. This is because if the groove 8 is V-shaped, the light directed toward the side can be efficiently reflected toward the viewing side 5. Even if the cross-sectional shape of the groove portion is not V-shaped, if the width becomes narrower as it approaches the main surface of the transparent substrate, light can be reflected toward the viewing side, so that a temporary effect can be achieved. it can.
  • the cross-sectional shape may be round like a groove 8i shown in FIG.
  • the main surface 1a of the transparent substrate 1 may be exposed at the bottom of the groove as in the groove portion 8j shown in FIG.
  • the correct V shape as shown in FIG. 3 is most preferred.
  • the barrier rib 2 is covered with the reflective film 6 except for the surface that contacts the side surface of the phosphor 3 and the surface that contacts the main surface 1a. This is because if the reflection film 6 is formed in this way, the light traveling from the phosphor 3 to the inside of the partition wall 2 can be reliably reflected by the reflection film 6.
  • One of the plurality of monochrome layers 3 includes a red phosphor layer 3r that emits red light, and another one of the plurality of monochrome layers 3 includes a green phosphor layer 3g that emits green light. It is preferable. If these are included, at least red and green light can be emitted toward the viewing side, and color display is facilitated.
  • the display apparatus in Embodiment 2 based on this invention is demonstrated.
  • the display device 51 in the present embodiment is overlapped with any of the display device phosphor substrates 41 described in the first embodiment and the main surface 1a side of the display device phosphor substrate 41, that is, the lower side in FIG. And an optical shutter 42 to be arranged.
  • the display device phosphor substrate 41 includes the transparent substrate 1.
  • the optical shutter 42 is a panel-like device, has a display area, and the inside of the display area is divided into a plurality of pixel areas.
  • the optical shutter 42 serves to emit light from the other surface by controlling the transmittance for each individual pixel region with respect to the light incident from one surface.
  • the optical shutter 42 it is sufficient to determine how much light is transmitted among the incident light in each pixel region, and it is not necessary to change the color of the light.
  • the optical shutter 42 is, for example, a liquid crystal display panel.
  • the optical shutter 42 may be a transmissive MEMS panel.
  • the phosphor substrate for display device and the optical shutter according to the present invention are combined, a display device with high light use efficiency can be obtained.
  • Embodiment 3 With reference to FIG. 7, the display apparatus in Embodiment 3 based on this invention is demonstrated.
  • the display device in the present embodiment is based on the display device described in the second embodiment. Further, as shown in FIG. 7, the light is emitted on the side opposite to the display device phosphor substrate 41 side of the optical shutter 42.
  • a backlight device 43 disposed to overlap the shutter 42 is provided.
  • the backlight device 43 includes an LED 431 and a light guide plate 432.
  • the LED 431 is disposed along the side surface of the light guide plate 432. Light emitted from the LED 431 enters the light guide plate 432 from the side surface of the light guide plate 432, travels through the light guide plate 432, and then exits from the main surface of the light guide plate 432 toward the optical shutter 42.
  • the phosphor substrate for display device, the optical shutter, and the backlight device according to the present invention are combined in an appropriate order, a display device with high light utilization efficiency can be obtained.
  • the configuration of the backlight device is not limited to that illustrated in FIG. 7 and may be other configurations.
  • the LEDs 433 may be planarly arranged without providing the light guide plate.
  • an organic EL panel 434 may be provided like a backlight 43j shown in FIG.
  • the phosphor substrate 41e for display device is basically the same as that described in the first embodiment, but not all of the plurality of monochromatic layers are phosphor layers.
  • the breakdown of the plurality of monochromatic layers is as follows.
  • a red phosphor layer 3r that absorbs blue light and emits red light is included as one of the plurality of monochrome layers, and blue light is emitted as the other one of the plurality of monochrome layers.
  • a green phosphor layer 3g that absorbs and emits green light is included, and a diffusion layer 3b that scatters blue light as blue light is included as yet another one of the plurality of monochromatic layers.
  • the phosphor substrate for display device in the present embodiment can use blue light 4b as incident light.
  • the incident blue light 4b the light incident on the red phosphor layer 3r is absorbed by the red phosphor layer 3r, but simultaneously causes red light emission from the red phosphor layer 3r.
  • the incident blue light 4b the light incident on the green phosphor layer 3g is absorbed by the green phosphor layer 3g, but simultaneously causes green light emission from the green phosphor layer 3g.
  • red light and green light can be obtained.
  • the red light and the green light from the red phosphor layer 3r and the green phosphor layer 3g are considered to emit light with omnidirectionality. However, as described above, the light traveling sideways is reflected to the viewing side 5. Since it can radiate
  • the display device 52 in the present embodiment is disposed so as to overlap the display device phosphor substrate 41e described in the fourth embodiment and the main surface 1a side of the display device phosphor substrate 41e, that is, the lower side in FIG.
  • An optical shutter 42 and a backlight device 43b that emits blue light are disposed so as to overlap the optical shutter 42 on the opposite side of the optical shutter 42 from the display device phosphor substrate 41e side.
  • the backlight device 43 b includes a blue LED 431 b and a light guide plate 432.
  • the backlight device 43b may be configured by a combination of an LED that emits light other than blue and a light guide plate that has a function of emitting incident light as blue light.
  • the blue light emitted from the backlight device 43b is emitted toward the optical shutter 42.
  • the phosphor substrate for display device, the optical shutter, and the backlight device emitting blue light are combined in an appropriate order according to the present invention, a display device with high light utilization efficiency is obtained. Can do.
  • the optical shutter 42 is a liquid crystal display panel.
  • a transparent substrate 421a which is a “light source side substrate” and a transparent substrate 421b which is a “viewing side substrate” are bonded to face each other so as to sandwich the liquid crystal layer 423 and the sealant 422.
  • the outer edge of the liquid crystal layer 423 is sealed with a sealant 422.
  • Polarizing plates 424a and 424b are attached to the surfaces facing the outside of the transparent substrates 421a and 421b.
  • the optical shutter 42 is preferably a liquid crystal display panel.
  • the optical shutter 42 preferably includes the liquid crystal layer 423. This is because if the liquid crystal layer is used to control the light transmittance, the optical shutter can be made thin, and the light transmittance for each pixel region can be easily controlled by an electric signal. is there.
  • a combination of a phosphor substrate 41 or 41e for a display device and an optical shutter 42 may be referred to as a display device. This is because even a structure that does not include a backlight device may be distributed as a display device.
  • the transparent substrates 421a and 421b included in the optical shutter 42 are also referred to as “light source side substrate” and “viewing side substrate”, respectively.
  • the phosphor substrate for display device in the sixth embodiment based on the present invention will be described.
  • the main surface 1a of the transparent substrate 1 is covered with a low refractive index layer 9, and a partition wall 2 having a groove 8 is further formed thereon.
  • a red phosphor layer 3r, a green phosphor layer 3g, and a diffusion layer 3b are disposed as monochromatic layers so as to be formed and separated by the partition walls 2.
  • the surface of the partition wall 2 that does not contact the monochromatic layer or the main surface 1 a is covered with the reflective film 6.
  • a planarization layer 19 is formed so as to cover these partition walls 2 and the monochromatic layer.
  • the planarizing layer 19 is made of an acrylic resin or the like.
  • the lower surface of the planarizing layer 19 is substantially flat.
  • a polarizing layer 12 made of a wire grid or the like is formed so as to cover the lower surface of the planarizing layer 19.
  • the optical shutter 42f includes a phosphor substrate 41f for display device and a transparent substrate 421a which is a “light source side substrate”.
  • a liquid crystal layer 423 that is sealed so as to be surrounded by the sealant 422 is disposed between the transparent substrate 421a and the phosphor substrate for display device 41f.
  • a polarizing plate 424a is attached to the surface of the transparent substrate 421a opposite to the display device phosphor substrate 41f.
  • a total of three transparent substrates are used to realize the display device.
  • only a total of two transparent substrates are used as in the example shown in FIG.
  • the display device 41f can be configured. Therefore, the display device can be further reduced in thickness. Further, since the number of transparent substrates to be used is reduced, the material cost of the display device can be reduced.
  • the transparent substrate 1 included in the phosphor substrate 41f for display device serves as a viewing side substrate.
  • FIG. 16 shows a flowchart of the method for manufacturing the phosphor substrate for display device in the present embodiment.
  • a step S1 of preparing a substrate having a main surface, and the main surface are dug down to a depth that has side surfaces on both sides to contact a monochromatic layer and separates the partition walls.
  • a transparent substrate 1 is prepared as shown in FIG.
  • Transparent substrate 1 has a main surface 1a.
  • a low refractive index layer 9 is formed on the main surface 1 a of the transparent substrate 1.
  • the low refractive index layer is a layer having a low refractive index as compared with both the monochromatic layer 3 and the partition 2.
  • the thickness of the low refractive index layer 9 is not less than 0.5 ⁇ m and not more than 3 ⁇ m.
  • the thickness of the low refractive index layer 9 is preferably about 1 ⁇ m.
  • the translucent partition 2 is formed so that the low-refractive-index layer 9 may be covered in the main surface 1a of the transparent substrate 1.
  • FIG. The partition wall 2 is formed at a plurality of locations. In FIG. 19, the partition walls 2 are formed so that two peaks are arranged, but a set of two adjacent mountains shown in FIG. 19 is one partition wall 2.
  • the partition wall 2 has side surfaces for contacting the monochromatic layer on both sides, and has a groove 8 in the center that is dug down to a depth at which the partition wall 2 is divided.
  • the thickness of the partition wall 2 is 3 ⁇ m or more and 30 ⁇ m or less.
  • the thickness of the partition wall 2 is preferably 5 ⁇ m or more and 20 ⁇ m or less. A detailed method of forming the partition wall 2 will be described later.
  • step S3 at least two monochromatic layers 3 are formed as shown in FIG.
  • the monochromatic layer 3 is formed so as to be in contact with the side surface for contacting the monochromatic layer of the partition wall 2.
  • a state in which three monochromatic layers 3 are formed is shown.
  • a red phosphor layer 3r is formed.
  • a green phosphor layer 3g is formed.
  • a diffusion layer 3b is formed.
  • the width W of one single color layer 3 is 20 ⁇ m or more and 200 ⁇ m or less.
  • the monochromatic layer 3 can be formed in a desired amount at a desired location between the partition walls 2 by applying a liquid material by an ink jet method.
  • an inorganic transparent film 13 is formed so as to cover the surfaces of the partition walls 2 and the monochromatic layer 3.
  • the inorganic transparent film 13 may be formed of, for example, SiO 2 or SiN.
  • the inorganic transparent film 13 has a thickness of 100 to 500 nm.
  • the reflective film 6 is formed so as to cover a portion of the surface of the partition wall 2 other than the side surface for contacting the monochromatic layer.
  • the reflective film 6 may be made of, for example, Al or Ag.
  • the thickness of the reflective film 6 is not less than 100 nm and not more than 500 nm.
  • the thickness of the reflective film 6 is preferably about 200 nm.
  • the low refractive index layer 10 is formed so as to cover the entire surface.
  • the method for forming the partition wall 2 in step S2 will be described in detail. As a method of forming the partition wall 2, here, two preferable methods are listed.
  • FIG. 24 shows a flowchart of the breakdown of step S2 in this case.
  • Step S2 for forming the partition walls 2 at a plurality of locations includes a step S201 for forming a resist layer by applying a positive resist to the main surface, and a step S202 for irradiating the resist layer with ultraviolet light through a photomask. And step S203 of developing the resist layer irradiated with the ultraviolet light.
  • a resist layer 20 is formed on the main surface 1a of the transparent substrate 1 with a positive resist.
  • the resist layer 20 is irradiated with ultraviolet light 15 through the photomask 14.
  • the photomask 14 has a desired pattern of light shielding film pattern disposed on the lower surface of a transparent plate.
  • the ultraviolet light 15 can be irradiated by a high pressure mercury lamp.
  • step S203 the resist layer 20 irradiated with the ultraviolet light 15 is developed. That is, as shown in FIG. 27, the exposed portion of the resist layer 20 is dissolved by an inorganic or organic alkali. In this way, the partition wall 2 is obtained.
  • the partition wall 2 may be further irradiated with ultraviolet light 15 as shown in FIG. It is good also as baking the structure containing the partition 2 obtained after image development. By these treatments, the partition wall 2 can be decolored or the hardness of the partition wall 2 can be increased. The partition 2 can be obtained as described above.
  • FIG. 29 shows a flowchart of the breakdown of step S2 in this case.
  • the main surface comes into contact with the step S211 of pouring the ultraviolet light curable transparent resin into the mold and the ultraviolet light curable transparent resin stored in the mold.
  • a step S212 of stacking a transparent substrate on the mold a step S213 of irradiating the ultraviolet light curable transparent resin sandwiched between the transparent substrate and the mold, and the transparent substrate And step S214 for removing the mold.
  • step S211 first, a liquid ultraviolet light curable transparent resin 17 is poured into the mold 16 as shown in FIG. A concave pattern corresponding to a convex pattern to be formed as the partition wall 2 is formed in the mold 16 in advance.
  • the transparent substrate 1 is stacked on the mold 16 so that the main surface 1a contacts the ultraviolet light curable transparent resin 17 stored in the mold 16.
  • the main surface 1a abuts is not limited to the case where the main surface 1a is in direct contact, but also includes contact through some film formed on the main surface 1a.
  • the main surface 1a since the main surface 1a is covered with the low refractive index layer 9, it is the low refractive index layer 9 that is directly in contact with the ultraviolet light curable transparent resin 17. Specifically, it can be considered that the main surface 1 a contacts the ultraviolet light curable transparent resin 17.
  • step S213 the ultraviolet light 15 is irradiated to the ultraviolet light curable transparent resin 17 sandwiched between the transparent substrate 1 and the mold 16. Thereby, the ultraviolet light curable transparent resin 17 is cured.
  • step S214 the mold 16 is removed from the transparent resin 1 as shown in FIG. By being irradiated with the ultraviolet light 15, the ultraviolet light curable transparent resin 17 is cured to form the partition 2.
  • the partition 2 can be obtained as described above.
  • a phosphor substrate for a display device having a structure capable of reflecting light traveling laterally from the monochromatic layer toward the viewing side is obtained. Therefore, a phosphor substrate for display device with improved light utilization efficiency can be obtained.
  • the partition wall 2 may have such a structure.
  • the cross-sectional shape tends to be formed in a mountain shape having a trapezoidal shape.
  • the partition wall 2 may have such a structure.
  • the bottom of the groove 8 may have a structure in which the width of the groove 8 is zero.
  • the bottom of the groove 8 may have a certain width.
  • the cross-sectional shape of the groove is a V-shape.
  • the side surfaces of the plurality of monochromatic layers 3 in contact with the partition walls 2 are within an angle range of 90 ° ⁇ 10 ° with respect to the main surface 1a. Make. This angle is more preferably within a range of 90 ° ⁇ 5 °. That is, in the present embodiment, the side surfaces of the plurality of monochromatic layers 3 that are in contact with the partition walls 2 are substantially perpendicular to the main surface 1a. Other configurations may be the same as those described in the above embodiments.
  • the side surface opposite to the side surface in contact with the monochromatic layer 3 should be inclined in order to reflect the light traveling from the inside of the monochromatic layer 3 to the viewing side.
  • a plurality of single color layers 3 are arranged.
  • the plurality of single color layers 3 may be phosphor layers that emit light of each color.
  • a structure as shown in FIGS. 37 and 38 can be considered.
  • a plurality of monochromatic layers other than the phosphor layer are also included.
  • a red phosphor layer 3r, a green phosphor layer 3g, and a diffusion layer 3b are arranged as a plurality of monochromatic layers.
  • the planarization layer 19 is formed so as to cover the partition wall 2 and the monochromatic layer, and the polarizing layer 12 made of a wire grid or the like is formed so as to cover the lower surface of the planarization layer 19.
  • the details of the planarizing layer 19 are as described in the sixth embodiment.
  • FIG. 39 shows a comparative example.
  • A is a portion where the thickness of the monochromatic layer 3 is insufficient.
  • the reflective film 6 covers the region A so that light from the light source does not directly enter the region A.
  • the width W of the opening can be increased.
  • the width occupied by one pixel on the main surface 1a is P, but the ratio of W to P can be made larger. Increasing the ratio of W to P leads to an improvement in light utilization efficiency.
  • the side surface of the plurality of monochromatic layers 3 that contacts the partition wall 2 is perpendicular to the main surface 1a, and the side surface of the partition wall 2 is opposite to the side surface that contacts the monochromatic layer 3
  • the following method may be employed.
  • a method of forming the light-transmitting partition 2 as the step S2 as a method of forming the light-transmitting partition 2 as the step S2, a lithography method as the first method and a mold as the second method are used. A method is considered.
  • the lithography using the negative resist and the lithography using the positive resist are combined. This is because lithography using a negative resist has a strong tendency to make the side wall of a pattern to be vertical, and lithography using a positive resist has a strong tendency to have a side wall of a pattern to be inclined.
  • the step S2 of forming the partition walls at a plurality of locations includes a step of forming a first resist layer by applying a negative resist to the main surface, Irradiating the first resist layer with ultraviolet light through one photomask, and developing the first resist layer after finishing irradiating with ultraviolet light through the first photomask; A step of forming a second resist layer by applying a positive resist on the main surface after developing the first resist layer, and irradiating the second resist layer with ultraviolet light through a second photomask; And a step of developing the second resist layer after finishing the step of irradiating with ultraviolet light through the second photomask. More specifically, it is as follows.
  • a resist layer 20n as a first resist layer is formed with a negative resist.
  • the resist layer 20n is irradiated with ultraviolet light 15 through a photomask 14n as a first photomask, as shown in FIG.
  • the photomask 14n is a light shielding film pattern having a desired pattern disposed on the lower surface of a transparent plate material, and an area corresponding to a portion other than the inclined portion of the partition wall 2 is opened.
  • the ultraviolet light 15 can be irradiated by a high pressure mercury lamp.
  • the resist layer 20n irradiated with the ultraviolet light 15 is developed. That is, as shown in FIG. 43, the unexposed portion of the resist layer 20n is dissolved by an inorganic or organic alkali. In this way, the partition first portion 2a that becomes a part of the partition later is obtained.
  • the structure including the partition first portion 2a is baked on the partition first portion 2a using a hot plate or an oven. By these treatments, the chemical resistance of the partition first portion 2a can be improved or the hardness can be increased.
  • a resist layer 20 as a second resist layer is formed on the main surface 1a on which the partition first portion 2a is formed with a positive resist.
  • the partition first portion 2 a is covered with the resist layer 20.
  • the resist layer 20 is irradiated with ultraviolet light 15 through a photomask 14e as a second photomask.
  • the light-shielding film of the photomask 14e covers regions corresponding to the flat portion and the inclined portion of the partition wall 2, and other regions are opened.
  • the resist layer 20 irradiated with the ultraviolet light 15 is developed. That is, as shown in FIG. 47, the exposed portion of the resist layer 20 is dissolved. In this way, the partition wall second portion 2b is obtained in addition to the partition wall first portion 2a already obtained. As shown in FIG. 48, the partition wall second portion 2b is decolored by further irradiating ultraviolet light 15, and the structure including the partition wall second portion 2b is baked.
  • the partition wall 2 including the partition first portion 2a and the partition second portion 2b can be obtained.
  • the partition wall 2 has a shape in which one side surface is perpendicular to the main surface 1a and the other side surface is inclined.
  • a liquid ultraviolet light curable transparent resin 17 is poured into the mold 16v.
  • a concave pattern corresponding to the convex pattern of the partition wall 2 is formed in advance on the mold 16v.
  • This concave shape has a shape in which one side surface is vertical and the other side surface is inclined.
  • the subsequent steps are the same as those described as the second method in the seventh embodiment. That is, the structure of FIG. 51 can be obtained by irradiating the ultraviolet light 15 with the transparent substrate 1 overlapped as shown in FIG.
  • the inclined surface tends to be an inclined surface having a curved sectional shape rather than an inclined surface having a straight sectional shape. Therefore, when the partition 2 is formed by lithography using a positive resist, for example, the structure shown in FIGS. 52 and 53 may be obtained.
  • the low refractive index layers 9 and 10 and the inorganic transparent film 13 are not shown.
  • the low refractive index layers 9 and 10 and the inorganic transparent film 13 are preferably provided, but are not essential.
  • the low refractive index layers 9 and 10 may be transparent to visible light and have a refractive index lower than that of the phosphor layer. If a fluorine-based material is selected as the material for the low refractive index layers 9 and 10, the refractive index can be lowered to about 1.3. In particular, the refractive index can be adjusted between 1.2 and 1.4 by using hollow silica or the like.
  • the material for forming the low refractive index layer is described in, for example, Japanese Patent Application Laid-Open No. 2001-233611 and Japanese Patent No. 3272111.
  • the low refractive index layer 10 is not required.
  • the present invention can be used for a phosphor substrate for a display device, a display device, and a method for manufacturing a phosphor substrate for a display device.
  • 1,901 transparent substrate 1a main surface, 2,902 partition, 2a partition first part, 2b partition second part, 3 monochromatic layer, 3r red phosphor layer, 3g green phosphor layer, 3b diffusion layer, 903, 903r 903g phosphor, 4 (from backlight) light, 4b blue light, 5 viewing side, 6,906 reflective film, 8 grooves, 9, 10 low refractive index layer, 11 light, 12 (formed by wire grid etc.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

L'invention concerne un substrat à luminophores (41) pour dispositif d'affichage comportant : un substrat transparent (11) comme substrat ayant une surface primaire (1a) ; de multiples couches monochromes (3) formées sur ladite surface primaire (1a), chacune ayant une surface latérale ; et des parois de séparation transparentes (2) disposées sur la surface primaire (1a) de façon à séparer des paires de couches monochromes (3) voisines les unes des autres tout en gardant en contact les surfaces latérales des deux couches monochromes. Le centre des parois de séparation (2) présente une partie sillon (8) creusée à une profondeur telle qu'elle divise les parois de séparation (2). Plus le sillon (8) est proche de la surface primaire (1a), plus il est étroit, et ledit sillon est couvert sur la surface interne par un film réfléchissant (6).
PCT/JP2012/062284 2011-05-20 2012-05-14 Substrat à luminophores pour dispositif d'affichage, dispositif d'affichage et procédé de fabrication de substrat à luminophores pour dispositif d'affichage WO2012161011A1 (fr)

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JP2011113850 2011-05-20
JP2011-113850 2011-05-20

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998034437A1 (fr) * 1997-02-04 1998-08-06 Idemitsu Kosan Co., Ltd. Afficheur a electroluminescence organique
JP2008066103A (ja) * 2006-09-07 2008-03-21 Fuji Electric Holdings Co Ltd 有機ｅｌ素子
WO2010143461A1 (fr) * 2009-06-12 2010-12-16 シャープ株式会社 Panneau d'affichage et dispositif d'affichage

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998034437A1 (fr) * 1997-02-04 1998-08-06 Idemitsu Kosan Co., Ltd. Afficheur a electroluminescence organique
JP2008066103A (ja) * 2006-09-07 2008-03-21 Fuji Electric Holdings Co Ltd 有機ｅｌ素子
WO2010143461A1 (fr) * 2009-06-12 2010-12-16 シャープ株式会社 Panneau d'affichage et dispositif d'affichage

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