WO2012150777A2 - The printed circuit board and the method for manufacturing the same - Google Patents
The printed circuit board and the method for manufacturing the same Download PDFInfo
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- WO2012150777A2 WO2012150777A2 PCT/KR2012/003236 KR2012003236W WO2012150777A2 WO 2012150777 A2 WO2012150777 A2 WO 2012150777A2 KR 2012003236 W KR2012003236 W KR 2012003236W WO 2012150777 A2 WO2012150777 A2 WO 2012150777A2
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
- H05K1/0204—Cooling of mounted components using means for thermal conduction connection in the thickness direction of the substrate
- H05K1/0206—Cooling of mounted components using means for thermal conduction connection in the thickness direction of the substrate by printed thermal vias
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/096—Vertically aligned vias, holes or stacked vias
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09854—Hole or via having special cross-section, e.g. elliptical
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0369—Etching selective parts of a metal substrate through part of its thickness, e.g. using etch resist
Definitions
- Circuit boards refer to electrical insulating substrates printed with circuit patterns, and are used to mount electronic components thereon.
- the present invention provides a printed circuit board which does not employ a laser drilling scheme when forming a via hole.
- the first to fourth insulating layers 120, 150, 176, and 186 may include epoxy insulating resin representing low thermal conductivity (about 0.2W/mK to about 0.4W/mk). Alternatively, the first to fourth insulating layers 120, 150, 176, and 186 may include poly imide resin representing high thermal conductivity. In addition, the first to fourth insulating layers 120, 150, 176, and 186 may include the same material. Alternatively, the first to fourth insulating layers 120, 150, 176, and 186 may include materials different from each other.
- the first metallic layer 130 may be etched through a wet etching process after the resist pattern has been formed.
- the first adhesive layer 131 has a surface extending to the upper portion of the first insulating layer 120 so that the first adhesive layer 131 has a surface wider than the top surface of the first via layer 110.
- FIG. 14 a multi-layer structure of FIG. 14 is formed by repeating the processes of FIGS. 3 to 13.
Abstract
Disclosed are a printed circuit board and a method for manufacturing the same. The printed circuit board includes a first insulating layer, a second insulating layer on the first insulating layer, and at least one via formed through the first and second insulating layers and having a layer structure. The via includes a first via layer formed through the first insulating layer, a second via layer formed on the first via layer while passing through the second insulating layer, and an adhesive layer between the first and second via layers. The first via layer has a section different from a section of the second via layer.
Description
The present invention relates to a printed circuit board and a method for manufacturing the same.
Circuit boards refer to electrical insulating substrates printed with circuit patterns, and are used to mount electronic components thereon.
Recently, among the circuit boards, a thin multi-layer circuit board has been suggested. To manufacture the thin multi-layer circuit board, various attempts of forming a thin support substrate to support the bending of an intermediate central layer during a process for the intermediate central layer have been suggested.
FIG. 1 is a sectional view showing a printed circuit board 10 according to the related art.
The printed circuit board 10 according to the related art includes multi-layer circuit patterns 4 and 5 formed between a plurality of multi-layer insulating layers 1, and is formed therein with vias 2 and 3 used to connect the circuit patterns 4 and 5 to each other.
In this case, the vias 2 and 3 are filled with conductive paste after a mechanical hole process has been performed, or formed through a plating process after a hole process has been performed through a laser drill scheme.
In this case, the scheme of forming the via 2 by using the conductive paste is employed when the plating scheme may not be employed due to the great size of the via 2. However, the via 2 formed by the conductive paste represents great electrical resistance, so that the transmission signal may have noise. Accordingly, the reliability may be degraded.
Meanwhile, in the case of the via 3 formed through a laser drilling scheme, a hole process is required with respect to each insulating layer 1, so that the economical problem is caused.
The embodiment provides a printed circuit board having a novel structure and a method for manufacturing the same.
The embodiment provides a printed circuit board and a method for manufacturing the same, in which vias are formed through a simple process.
According to the embodiment, there is provided a printed circuit board including a first insulating layer, a second insulating layer on the first insulating layer, and at least one via formed through the first and second insulating layers and having a layer structure. The via includes a first via layer formed through the first insulating layer, a second via layer formed on the first via layer while passing through the second insulating layer, and an adhesive layer between the first and second via layers. The first via layer has a section different from a section of the second via layer.
According to the embodiment, there is provided a method for manufacturing a printed circuit board. The method includes forming a via groove in a via region of each of a plurality of bulk metallic layers to form a via layer, filling a first insulating layer in the via groove of one bulk metallic layer, forming an adhesive layer on a plurality of via grooves of the one bulk metallic layer, arranging the via layer of another bulk metallic layer on the adhesive layer and bonding the bulk metallic layers to each other while filling a second insulating layer into the via groove, and etching the bulk metallic layers to expose the first and second insulating layers.
As described above, according to the present invention, the adhesive property between the copper layer and the insulating layer is improved, and bulk copper is used, so that the heat radiation property can be improved.
In addition, the vias used to connect interlayer circuits to each other are formed between a plurality of insulating layers through an etching process instead of a laser process or a polishing process, so that the process ability can be improved, and the manufacturing cost can be reduced.
FIG. 1 is a sectional view showing a printed circuit board according to the related art;
FIG. 2 is a sectional view showing a device chip package employing a printed circuit board according to the embodiment of the present invention;
FIGS. 3 to 16 are sectional views showing a method for manufacturing the printed circuit board of FIG. 2; and
FIG. 17 is a sectional view showing a device chip package employing the printed circuit board of FIG. 2.
Hereinafter, embodiments will be described in detail with reference to accompanying drawings so that those skilled in the art can easily work with the embodiments. However, the embodiments may have various modifications.
However, the present invention can be realized as various modifications, and is not limited to the embodiments.
In the following description, when a predetermined part "includes" a predetermined component, the predetermined part does not exclude other components, but may further include other components if there is a specific opposite description.
The thickness and size of each layer shown in the drawings may be exaggerated, omitted or schematically drawn for the purpose of convenience or clarity. In addition, the size of elements does not utterly reflect an actual size. The same reference numbers will be assigned the same elements throughout the drawings.
In the description of the embodiments, it will be understood that, when a layer (or film), a region, or a plate is referred to as being "on" or "under" another layer (or film), another region, or another plate, it can be "directly" or "indirectly" on the other layer (or film), region, plate, or one or more intervening layers may also be present. Such a position of the layer has been described with reference to the drawings.
The present invention provides a printed circuit board which does not employ a laser drilling scheme when forming a via hole.
Hereinafter, a heat radiating circuit substrate according to the embodiment of the present invention will be described with reference to FIGS. 2 to 16.
FIG. 2 is a sectional view showing a printed circuit board according to the embodiment of the present invention and a device chip package 100 employing the printed circuit board.
Referring to FIG. 2, the device chip package 100 according to the present invention includes the printed circuit board and a device chip 200 mounted on the printed circuit board.
The printed circuit board includes a plurality of insulating layers 120, 150, 176, and 186, a plurality of vias formed through the insulating layers 120, 150, 176, and 186, and a coverlay 195 to cover the vias.
The insulating layers 120, 150, 176, and 186 include the first insulating layer 120, the second insulating layer 150 formed on the first insulating layer 120, and third and fourth insulating layers 176 and 186 formed on the first insulating layer 176 and under the fourth insulating layer 186, respectively.
The first to fourth insulating layers 120, 150, 176, and 186 may include epoxy insulating resin representing low thermal conductivity (about 0.2W/mK to about 0.4W/mk). Alternatively, the first to fourth insulating layers 120, 150, 176, and 186 may include poly imide resin representing high thermal conductivity. In addition, the first to fourth insulating layers 120, 150, 176, and 186 may include the same material. Alternatively, the first to fourth insulating layers 120, 150, 176, and 186 may include materials different from each other.
In addition, the first to fourth insulating layers 120, 150, 176, and 186 are formed by filling adjacent vias with a predetermined material, and have sectional shapes varied according to the shapes of the vias.
The vias may be spaced apart from each other, and may include through vias formed by perforating from the top surface of the printed circuit board to the bottom surface of the printed circuit board.
Each via has a layer structure including a plurality of layers.
Each via includes a first via layer formed by perforating the first insulating layer 120, a second via layer 140 formed through the second insulating layer 150 and aligned with the first via layer 110, and third and fourth via layers 170 and 180 formed on the first via layer 110 and under the second via layer 140, respectively, by perforating the third and fourth insulating layers 176 and 186, respectively.
In this case, although the present invention has been described in that the printed circuit board is limited to a multi-layer structure having four insulating layers 120, 150, 176, and 186, so that the vias are formed in a four layer-structure, the vias may be designed as many as the number of the insulating layers 120, 150, 176, and 186. In addition, the vias has the layer structure having layers, the number of which is fewer than the number of the insulating layers 120, 150, 176, and 186, so that the shape of the filled via can be represented instead of the shape of the through via.
Hereinafter, the via having a four-layer structure will be described.
The first via layer 110 is formed at the central region of the printed circuit board, and has a sectional shape gradually enlarged toward the lower portion thereof.
The second via layer 140 extends from the top surface of the first via layer 110, and has a sectional shape gradually enlarged toward the upper portion thereof.
The third via layer 170 may be formed on the second via layer 140, and may have the same shape as that of the second via layer 140. The fourth via layer 180 may be formed under the first via layer 110, and may have the same shape as that of the first via layer 110.
In other words, the plural layer structure may have a symmetric structure about the central region.
The first to fourth via layers 110, 140, 170, and 180 may include the same material. Preferably, the first to fourth via layers 110, 140, 170, and 180 may include copper which is a conductive material representing superior heat radiation property.
Meanwhile, a plurality of adhesive layers 131, 161, and 191 may be formed between the via layers.
The adhesive layers 131, 161, and 191 include the first adhesive layer 131 formed between the first and second via layers 110 and 140, the second adhesive layers 161 formed between the second and third via layers 140 and 170 and between the first and fourth via layers 110 and 180, respectively, and the third adhesive layers 191 formed on the surface of the third via layer 170, which is exposed through the top surface of the printed circuit board, and formed on the surface of the fourth via layer 180, which is exposed through the bottom surface of the printed circuit board.
The adhesive layers 131, 161, and 191 may include the same material, and used to bond a plurality of via layers formed through different processes to each other. The adhesive layers 131, 161, and 191 may include the same material as that of the via layers.
In other words, the adhesive layers 131, 161, and 191 may include the alloy containing copper.
The printed circuit board is provided on the top and bottom surfaces thereof with coverlays 195, and portions of vias are exposed from the coverlay 195 to form pads 198 and 199.
The pads 198 and 199 may include the alloy containing metal such as silver, gold, nickel or palladium, and include the inner lead 198 formed on a surface having a chip to be formed thereon and the outer lead 199 formed on a rear surface provided in opposition to the surface having the chip to be formed thereon.
A solder paste 220 is coated on the exposed top surface of the via, and the device chip 200 is mounted on the solder paste 220.
The device chip 200 may include a semiconductor chip, a light emitting diode chip, and other driving chips. In addition, the device chip 200 is electrically connected to the inner lead 198 through a wire 210.
The device chip 200 is molded by a resin 230 so that the device chip 200 can be protected from the outside.
Hereinafter, a method for manufacturing the printed circuit board of FIG. 2 will be described with reference to FIGS. 3 to 16.
First, as shown in FIG. 3, the first bulk metallic plate 111 is prepared.
The first bulk metallic plate 111 may include a copper plate having a thickness greater than that of each via layer.
Next, a first insulating groove 115 is formed by etching a space between the vias except for the region for the formation of the via as shown in FIG. 4.
The first insulating groove 115 may be formed by performing a wet etching scheme after a resist pattern is formed on the copper plate 111, and may have a curved section.
Therefore, a protrusion constituting the first via layer 110 is formed between the first insulating grooves 115.
Next, as shown in FIG. 6, after forming a hole corresponding to the first via layer 110 in the first insulating layer 120, the first insulating layer 120 is pressed against the first metallic plate 111, so that the first insulating layer 120 is filled in the first insulating groove 115 of the first metallic plate 111.
Next, as shown in FIG. 7, the first metallic layer 130 is formed on the first via layer 110 and the first insulating layer 120.
The first metallic layer 130 may be formed by depositing copper through an aerosol deposition scheme. In other words, mixture of the copper and gas is aerosolized and sprayed on the first via layer 110 and the first insulating layer 120 through a nozzle, thereby forming the first metallic layer 130.
When the aerosol deposition is performed in order to form he metallic layer 130, deposition is achieved at a room temperature instead of a high temperature.
Next, as shown in FIG. 8, the first metallic layer 130 is etched except for the upper portion of the first via layer 110, thereby forming the first adhesive layer 131 of FIG. 2.
In this case, the first metallic layer 130 may be etched through a wet etching process after the resist pattern has been formed. In this case, the first adhesive layer 131 has a surface extending to the upper portion of the first insulating layer 120 so that the first adhesive layer 131 has a surface wider than the top surface of the first via layer 110.
Next, as shown in FIG. 9, after forming a second insulating groove 145 in a second metallic plate 141 by repeating the processes of FIGS. 2 to 4, the second metallic plate 141 is arranged in such a manner that the second insulating groove 145 faces the first insulating layer 115. Then, the second insulating layer 150 is provided corresponding to the second insulating groove 145, and heat and pressure are applied to the first and second metallic plates 111 and 141, thereby completing the shape of FIG. 10.
Subsequently, as shown in FIG. 11, both surfaces of the first and second metallic plates 111 and 141 are etched until the first and second insulating layers 120 and 150 are exposed, thereby forming the first and second via layers 110 and 140 of FIG. 2.
Next, as shown in FIG. 12, the second metallic layers 160 are formed on the first and second via layers 110 and 140 and the exposed first and second insulating layers 120 and 150.
Each second metallic layer 160 is formed by using a copper layer through an aerosol deposition scheme as shown in FIG. 7, and portions of the second metallic layers 160 are etched to form the second adhesive layers 161 on the first and second via layers 110 and 140 as shown in FIG. 13.
The second adhesive layer 161 has an area wider than that of the first adhesive layer 131 due to the shapes of the first and second via layers 110 and 140.
Subsequently, a multi-layer structure of FIG. 14 is formed by repeating the processes of FIGS. 3 to 13.
In the multi-layer structure of FIG. 14, the third via layer 170 is formed on the second via layer 140, the fourth via layer 180 is formed under the first via layer 110, and the third adhesive layers 191 are formed on the exposed surface of the first and fourth via layers 110 and 180.
The third adhesive layers 191 may have the same shape as that of the second adhesive layers 161, and have areas extending to the upper portions of the third and fourth insulating layers 176 and 186.
Subsequently, areas in which the inner lead 198, the outer lead 199, and the device chip 200 are formed are exposed and the coverlay 195 is formed.
The coverlay 195 may include solder resist or a dry film.
Next, the inner lead 198 and the outer lead 199 are formed by plating the exposed surfaces of the coverlay 195. The inner lead 198 and the outer lead 199 may include the alloy containing metal such as silver, gold, nickel, or palladium, and may be subject to plating, so that the inner lead 198 and the outer lead 199 may have a multi-layer structure.
As shown in FIG. 16, if the pads of the inner lead 198 and the outer lead 199 are formed, the printed circuit board is completed.
As shown in FIG. 17, after coating the solder paste 220 on the mounting region of the device chip 200 of the printed circuit board of FIG. 16, the device chip 200 is mounted, and the device chip 200 is electrically conducted with the inner lead 198 through the wire 210, thereby completing the package 100 of the device chip 200.
As described above, when forming a multi-layer via in the printed circuit board having a multi-layer insulating layer, the via is formed through the etching process, so that the cost can be reduced. In addition, the adhesive layer is formed between via layers, so that an adhesive strength and a signal characteristic can be ensured.
Although exemplary embodiments of the present invention have been described for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims.
Claims (15)
- A printed circuit board comprising:a first insulating layer;a second insulating layer on the first insulating layer; andat least one via formed through the first and second insulating layers and having a layer structure,wherein the via comprises:a first via layer formed through the first insulating layer;a second via layer formed on the first via layer while passing through the second insulating layer; andan adhesive layer between the first and second via layers, andwherein the first via layer has a section different from a section of the second via layer.
- The printed circuit board of claim 1, wherein the section of the first via layer is symmetrical to the section of the second via layer about the adhesive layer.
- The printed circuit board of claim 2, wherein the sections of the first and second via layers are enlarged as the first and second via layers are away from the adhesive layer.
- The printed circuit board of claim 3, wherein lateral sides of the first and second via layers are recessed in a concave shape.
- The printed circuit board of claim 1, wherein the first via layer includes a material equal to a material of the second via layer.
- The printed circuit board of claim 1, wherein the adhesive layer includes a material equal to a material of the first via layer.
- The printed circuit board of claim 1, wherein the adhesive layer and the first and second via layers include an alloy including copper.
- The printed circuit board of claim 1, wherein the adhesive layer is formed through an aerosol deposition scheme.
- The printed circuit board of claim 1, further comprising third and fourth via layers extending to an upper portion of the first via layer and a lower portion of the second via layer, respectively.
- The printed circuit board of claim 9, further comprising an additional adhesive layer among the first to fourth via layers.
- The printed circuit board of claim 1, wherein the adhesive layer includes a region extending to the first and second insulating layers.
- A method for manufacturing a printed circuit board, the method comprising:forming a via groove in a via region of each of a plurality of bulk metallic layers to form a via layer;filling a first insulating layer in the via groove of one bulk metallic layer;forming an adhesive layer on a plurality of via grooves of the one bulk metallic layer;arranging the via layer of another bulk metallic layer on the adhesive layer and bonding the bulk metallic layers to each other while filling a second insulating layer into the via groove; andetching the bulk metallic layers to expose the first and second insulating layers.
- The method of claim 12, wherein, in the forming of the via groove, a region except for the via region is wet etched.
- The method of claim 12, wherein the forming of the adhesive layer comprises:depositing metal on an entire surface of the bulk metallic layer through an aerosol deposition scheme; andforming the adhesive layer by wet-etching the deposited metal.
- The method of claim 14, wherein a portion of the adhesive layer extends to the first and second insulating layers.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12780038.1A EP2705736B1 (en) | 2011-05-03 | 2012-04-26 | The printed circuit board and the method for manufacturing the same |
CN201280033324.4A CN103650652A (en) | 2011-05-03 | 2012-04-26 | The printed circuit board and the method for manufacturing the same |
US14/115,138 US20140060908A1 (en) | 2011-05-03 | 2012-04-26 | Printed circuit board and the method for manufacturing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0042157 | 2011-05-03 | ||
KR1020110042157A KR20120124319A (en) | 2011-05-03 | 2011-05-03 | The printed circuit board and the method for manufacturing the same |
Publications (2)
Publication Number | Publication Date |
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WO2012150777A2 true WO2012150777A2 (en) | 2012-11-08 |
WO2012150777A3 WO2012150777A3 (en) | 2013-03-21 |
Family
ID=47108111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/003236 WO2012150777A2 (en) | 2011-05-03 | 2012-04-26 | The printed circuit board and the method for manufacturing the same |
Country Status (6)
Country | Link |
---|---|
US (1) | US20140060908A1 (en) |
EP (1) | EP2705736B1 (en) |
KR (1) | KR20120124319A (en) |
CN (1) | CN103650652A (en) |
TW (1) | TWI479959B (en) |
WO (1) | WO2012150777A2 (en) |
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TWI553787B (en) * | 2013-08-16 | 2016-10-11 | 臻鼎科技股份有限公司 | Ic substrate,semiconductor device with ic substrate and manufucturing method thereof |
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US9153550B2 (en) * | 2013-11-14 | 2015-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate design with balanced metal and solder resist density |
KR102320158B1 (en) * | 2020-04-29 | 2021-11-01 | 엘지이노텍 주식회사 | Circuit board |
KR20220098997A (en) * | 2021-01-05 | 2022-07-12 | 삼성전기주식회사 | Printed circuit board |
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JP3290041B2 (en) * | 1995-02-17 | 2002-06-10 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Multilayer printed circuit board, method for manufacturing multilayer printed circuit board |
JP3123638B2 (en) * | 1995-09-25 | 2001-01-15 | 株式会社三井ハイテック | Semiconductor device |
JP3488888B2 (en) * | 2000-06-19 | 2004-01-19 | アムコー テクノロジー コリア インコーポレーティド | Method of manufacturing circuit board for semiconductor package and circuit board for semiconductor package using the same |
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JP2008135645A (en) * | 2006-11-29 | 2008-06-12 | Toshiba Corp | Multilayer printed wiring board and interlayer joining method for the same |
JP4973226B2 (en) * | 2007-02-16 | 2012-07-11 | 富士通株式会社 | Wiring board manufacturing method |
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US8541693B2 (en) * | 2010-03-31 | 2013-09-24 | Ibiden Co., Ltd. | Wiring board and method for manufacturing the same |
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- 2011-05-03 KR KR1020110042157A patent/KR20120124319A/en active Application Filing
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2012
- 2012-04-26 EP EP12780038.1A patent/EP2705736B1/en active Active
- 2012-04-26 US US14/115,138 patent/US20140060908A1/en not_active Abandoned
- 2012-04-26 CN CN201280033324.4A patent/CN103650652A/en active Pending
- 2012-04-26 WO PCT/KR2012/003236 patent/WO2012150777A2/en active Application Filing
- 2012-04-30 TW TW101115328A patent/TWI479959B/en active
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TWI553787B (en) * | 2013-08-16 | 2016-10-11 | 臻鼎科技股份有限公司 | Ic substrate,semiconductor device with ic substrate and manufucturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
EP2705736B1 (en) | 2019-03-27 |
US20140060908A1 (en) | 2014-03-06 |
KR20120124319A (en) | 2012-11-13 |
TWI479959B (en) | 2015-04-01 |
EP2705736A4 (en) | 2014-11-26 |
EP2705736A2 (en) | 2014-03-12 |
TW201309117A (en) | 2013-02-16 |
CN103650652A (en) | 2014-03-19 |
WO2012150777A3 (en) | 2013-03-21 |
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