WO2012041314A3 - Verfahren und vorrichtung zur herstellung einer dünnschichtsolarzelle - Google Patents
Verfahren und vorrichtung zur herstellung einer dünnschichtsolarzelle Download PDFInfo
- Publication number
- WO2012041314A3 WO2012041314A3 PCT/DE2011/075207 DE2011075207W WO2012041314A3 WO 2012041314 A3 WO2012041314 A3 WO 2012041314A3 DE 2011075207 W DE2011075207 W DE 2011075207W WO 2012041314 A3 WO2012041314 A3 WO 2012041314A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- ply
- producing
- applying
- thin
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 title abstract 2
- 239000006096 absorbing agent Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000010276 construction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
- H01L21/02686—Pulsed laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0732—Shaping the laser spot into a rectangular shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/005—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/52—Alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H01L21/02691—Scanning of a beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1872—Recrystallisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- High Energy & Nuclear Physics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Recrystallisation Techniques (AREA)
- Photovoltaic Devices (AREA)
Abstract
Die Erfindung betrifft ein Verfahren zur Herstellung einer Dünnschichtsolarzelle mit einem mehrschichtigen Aufbau beinhaltend ein Substrat (1), eine Keimschicht (2) sowie eine Absorberschicht (3), mit den Schritten: Erzeugung der Keimschicht (2) durch Aufbringen einer amorphen ersten Schicht eines ersten Halbleitermaterials (2.1) auf dem Substrat (1) und Beaufschlagung der ersten Schicht mit einem ersten Laserstrahl (4.1), um diese Schicht zu kristallisieren, Erzeugung der Absorberschicht (3) auf der Keimschicht (2) durch lagenweises Aufbringen einer zweiten Schicht eines zweiten Halbleitermaterials (3.1) und lagenweises Beaufschlagen der zweiten Schicht mit einem gepulsten, zweiten Laserstrahl (4.2), wobei ein lagenweises, epitaktisches Aufwachsen der zweiten Schicht bewirkt wird, dadurch gekennzeichnet, dass das lagenweise Aufbringen maximal zweilagig erfolgt und der zweite Laserstrahl (4.2) eine Wellenlänge in einem Bereich von 500 bis 1100 nm und eine Pulsdauer im Bereich von 300 bis 1200 ns aufweist. Die Erfindung betrifft weiterhin eine Vorrichtung zur Durchführung des erfindungsgemäßen Verfahrens.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010044480.4 | 2010-09-03 | ||
DE102010044480A DE102010044480A1 (de) | 2010-09-03 | 2010-09-03 | Verfahren und Vorrichtung zur Herstellung einer Dünnschichtsolarzelle |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012041314A2 WO2012041314A2 (de) | 2012-04-05 |
WO2012041314A3 true WO2012041314A3 (de) | 2013-01-17 |
Family
ID=45497601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2011/075207 WO2012041314A2 (de) | 2010-09-03 | 2011-08-31 | Verfahren und vorrichtung zur herstellung einer dünnschichtsolarzelle |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102010044480A1 (de) |
WO (1) | WO2012041314A2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011055604A1 (de) * | 2011-11-22 | 2013-05-23 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Funktionalisierte Festkörperoberflächen von Metallen, Halbleitern und Isolatoren mit Nanostrukturen |
DE102012203264A1 (de) | 2012-03-01 | 2013-09-05 | Institut für Photonische Technologien Jena e. V. (IPHT) | Dünnschichtsolarzelle und Verfahren zur Herstellung einer Dünnschichtsolarzelle |
DE102012221409A1 (de) | 2012-11-22 | 2014-05-22 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Funktionalisierte Festkörperoberflächen aus Zwei- und Mehrstoffsystemen mit Komposit-Nanostrukturen aus Metallen, Halbleitern und Isolatoren |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10058541A1 (de) * | 1999-06-29 | 2002-05-29 | Xoptix Pty Ltd | Eine durchsichtige Solarzelle und ihr Herstellungsverfahren |
US20040040938A1 (en) * | 2002-06-14 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and apparatus |
US20060019474A1 (en) * | 2004-07-26 | 2006-01-26 | Tetsuya Inui | Semiconductor thin film crystallization device and semiconductor thin film crystallization method |
DE102007009924A1 (de) * | 2007-02-27 | 2008-08-28 | Carl Zeiss Laser Optics Gmbh | Durchlaufbeschichtungsanlage, Verfahren zur Herstellung kristalliner Dünnschichten und Solarzellen sowie Solarzelle |
US20090130795A1 (en) * | 2007-11-21 | 2009-05-21 | Trustees Of Columbia University | Systems and methods for preparation of epitaxially textured thick films |
DE102008045533A1 (de) * | 2008-09-03 | 2010-03-04 | Innovavent Gmbh | Verfahren und Vorrichtung zum Ändern der Struktur einer Halbleiterschicht |
WO2011011764A2 (en) * | 2009-07-23 | 2011-01-27 | Gigasi Solar, Inc. | Systems, methods and materials involving crystallization of substrates using a seed layer, as well as products produced by such processes |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10042733A1 (de) | 2000-08-31 | 2002-03-28 | Inst Physikalische Hochtech Ev | Multikristalline laserkristallisierte Silicium-Dünnschicht-Solarzelle auf transparentem Substrat |
DE10345177B3 (de) | 2003-09-29 | 2004-10-21 | Innovavent Gmbh | Linsensystem zum Homogenisieren von Laserpulsen |
DE102004036220B4 (de) | 2004-07-26 | 2009-04-02 | Jürgen H. Werner | Verfahren zur Laserdotierung von Festkörpern mit einem linienfokussierten Laserstrahl |
DE102005045096A1 (de) | 2005-09-21 | 2007-03-29 | Institut für Physikalische Hochtechnologie e.V. | Dünnschichtsolarzelle und Verfahren zur Herstellung eines Halbleiterbauelements |
-
2010
- 2010-09-03 DE DE102010044480A patent/DE102010044480A1/de not_active Withdrawn
-
2011
- 2011-08-31 WO PCT/DE2011/075207 patent/WO2012041314A2/de active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10058541A1 (de) * | 1999-06-29 | 2002-05-29 | Xoptix Pty Ltd | Eine durchsichtige Solarzelle und ihr Herstellungsverfahren |
US20040040938A1 (en) * | 2002-06-14 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and apparatus |
US20060019474A1 (en) * | 2004-07-26 | 2006-01-26 | Tetsuya Inui | Semiconductor thin film crystallization device and semiconductor thin film crystallization method |
DE102007009924A1 (de) * | 2007-02-27 | 2008-08-28 | Carl Zeiss Laser Optics Gmbh | Durchlaufbeschichtungsanlage, Verfahren zur Herstellung kristalliner Dünnschichten und Solarzellen sowie Solarzelle |
US20090130795A1 (en) * | 2007-11-21 | 2009-05-21 | Trustees Of Columbia University | Systems and methods for preparation of epitaxially textured thick films |
DE102008045533A1 (de) * | 2008-09-03 | 2010-03-04 | Innovavent Gmbh | Verfahren und Vorrichtung zum Ändern der Struktur einer Halbleiterschicht |
WO2011011764A2 (en) * | 2009-07-23 | 2011-01-27 | Gigasi Solar, Inc. | Systems, methods and materials involving crystallization of substrates using a seed layer, as well as products produced by such processes |
Non-Patent Citations (1)
Title |
---|
DASSOW R ET AL: "Laser-crystallized polycrystalline silicon on glass for photovoltaic applications", DIFFUSION AND DEFECT DATA. SOLID STATE DATA. PART B, SOLID STATEPHENOMENA, VADUZ, LI, vol. 67-68, April 1999 (1999-04-01), pages 193 - 197, XP009086082, ISSN: 1012-0394 * |
Also Published As
Publication number | Publication date |
---|---|
DE102010044480A1 (de) | 2012-03-08 |
WO2012041314A2 (de) | 2012-04-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2873104B1 (de) | Verfahren und system zur aufteilung einer grenzfolie | |
WO2012044978A3 (en) | High efficiency solar cell device with gallium arsenide absorber layer | |
WO2010094919A3 (en) | Photovoltaic cell | |
WO2011090728A3 (en) | Low cost solar cells formed using a chalcogenization rate modifier | |
WO2010104340A3 (en) | Solar cell and method for manufacturing the same, and method for forming impurity region | |
WO2011092402A3 (fr) | Cellule photovoltaïque comprenant un film mince de passivation en oxyde cristallin de silicium et procédé de réalisation | |
WO2013107653A3 (en) | Prosthetic element | |
WO2012032064A3 (en) | Chalcopyrite-type semiconductor photovoltaic device | |
EP2365535A3 (de) | Substrat zur Herstellung einer lichtemittierenden Vorrichtung und Verfahren zur Herstellung der lichtemittierenden Vorrichtung | |
WO2010096646A3 (en) | Graphene processing for device and sensor applications | |
WO2014016489A3 (fr) | Film de chalcogenure(s) metallique(s) cristallise(s) a gros grains, solution colloïdale de particules amorphes et procedes de preparation | |
WO2010089364A3 (de) | Verfahren zur herstellung eines dünnschicht-photovoltaik-systems und dünnschicht-photovoltaik-system | |
WO2012085155A3 (en) | Method for heterojunction interface passivation | |
WO2014144698A3 (en) | Large-area, laterally-grown epitaxial semiconductor layers | |
WO2012041314A3 (de) | Verfahren und vorrichtung zur herstellung einer dünnschichtsolarzelle | |
WO2011129548A3 (en) | Substrate assembly for crystal growth and fabricating method for light emitting device using the same | |
WO2011092327A3 (de) | Iii-v-halbleiter-solarzelle | |
WO2010122028A3 (de) | Verfahren zur herstellung eines halbleiterbauelementes, insbesondere einer solarzelle, mit einer lokal geöffneten dielektrikumschicht sowie entsprechendes halbleiterbauelement | |
WO2011011764A3 (en) | Systems, methods and materials involving crystallization of substrates using a seed layer, as well as products produced by such processes | |
WO2012165873A3 (en) | Solar cell apparatus and method of fabricating the same | |
WO2013022234A3 (en) | Method of manufacturing czt(s,se)-based thin film for solar cell and czt(s,se)-based thin film manufactured thereby | |
WO2014072833A3 (en) | Molybdenum substrates for cigs photovoltaic devices | |
JP2012084863A5 (de) | ||
WO2011003498A3 (en) | Method and system for the manipulation of cells | |
WO2012157853A3 (ko) | 실리콘 태양전지 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11810566 Country of ref document: EP Kind code of ref document: A2 |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11810566 Country of ref document: EP Kind code of ref document: A2 |