WO2012032839A1 - 表面被覆切削工具 - Google Patents
表面被覆切削工具 Download PDFInfo
- Publication number
- WO2012032839A1 WO2012032839A1 PCT/JP2011/065339 JP2011065339W WO2012032839A1 WO 2012032839 A1 WO2012032839 A1 WO 2012032839A1 JP 2011065339 W JP2011065339 W JP 2011065339W WO 2012032839 A1 WO2012032839 A1 WO 2012032839A1
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- WIPO (PCT)
- Prior art keywords
- layer
- titanium carbonitride
- hardness
- coating film
- carbonitride layer
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B51/00—Tools for drilling machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Definitions
- the present invention relates to a surface-coated cutting tool including a base material and a coating film formed thereon.
- Recent cutting tool trends include the need for dry machining without cutting fluids from the viewpoint of global environmental conservation, the diversification of work materials, and higher cutting speeds to further improve machining efficiency. For example, the cutting edge temperature of a tool tends to become higher and higher. Moreover, in recent cutting operations, cutting with a deep cutting depth and cutting with a large feed amount are frequently performed, so that the characteristics required for the tool material are becoming stricter.
- the surface of cutting tools and wear resistant tools made of hard base materials such as WC-based cemented carbide, cermet and high speed steel is coated.
- Such coating is mainly performed by a chemical vapor deposition (CVD) method.
- CVD chemical vapor deposition
- the HT (high temperature) -CVD method is widely used.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2008-087150
- Patent Document 1 a source gas containing CH 3 CN and a chain hydrocarbon having 2 to 20 carbon atoms are introduced as an excess carbon source, and the TiCN layer is coated by MT-CVD.
- the TiCN layer thus formed has a columnar crystal structure and a large amount of carbon.
- the surface of the TiCN layer is covered with an aluminum oxide layer having excellent oxidation resistance.
- Patent Document 2 JP-A-63-195268
- Patent Document 2 CH 4 , N 2 , and TiCl 4 are introduced as main raw materials, and the surface of the base material is coated with a Ti carbonitride oxide layer using the HT-CVD method.
- the HT-CVD method of Patent Document 2 is not preferable from the viewpoint of manufacturing efficiency because the film formation rate is slower than that of the MT-CVD method.
- the HT-CVD method has a problem that the composition and crystal structure of the TiCN layer change greatly if the film forming conditions change even slightly.
- a portion with low hardness is dispersed in the TiCN layer, such as when cutting a hard work material such as cast iron, or when cutting a work material with microscopic irregularities Under the cutting conditions, the surface-coated cutting tool was likely to be chipped or chipped.
- the present invention has been made in view of the current situation as described above, and an object of the present invention is to provide a surface-coated cutting tool that is highly compatible with wear resistance and fracture resistance.
- the present inventors have studied a method of forming a coating film by chemical vapor deposition. As a result, a titanium carbonitride layer is formed on one layer of the coating film, and the crystal orientation of the titanium carbonitride layer is controlled. Further, by eliminating the variation in hardness of the titanium carbonitride layer, it was found that both the wear resistance and the fracture resistance were excellent, and the present invention was finally completed by further study based on this knowledge. It was.
- the surface-coated cutting tool of the present invention includes a base material and a coating film formed on the base material, and the coating film includes at least one titanium carbonitride layer,
- the titanium layer has the largest orientation index TC (220) of the texture coefficient TC (hkl), the indentation hardness of the hardness reference piece is Hs, and the indentation hardness of the titanium carbonitride layer is Ht.
- the average value of the relative hardness Ht / Hs in the measurement is 3 or more, and the maximum value Ht max / Hs and the minimum value Ht min / Hs of the relative hardness of the titanium carbonitride layer with respect to the average value of the relative hardness Ht / Hs
- the difference is 0.5 or less.
- the difference between the maximum value Ht max / Hs and the minimum value Ht min / Hs of the relative hardness of the titanium carbonitride layer with respect to the average value of the relative hardness Ht / Hs is preferably 0.3 or less.
- the above-mentioned titanium carbonitride layer preferably has an atomic ratio of carbon of 0.7 or more with respect to the total of carbon and nitrogen.
- the coating film includes at least one alumina layer, and the alumina layer is preferably made of ⁇ -type aluminum oxide and has an average layer thickness of 2 ⁇ m or more and 15 ⁇ m or less.
- the surface-coated cutting tool of the present invention has a configuration as described above, so that it is possible to achieve both high wear resistance and fracture resistance.
- the layer thickness or film thickness is measured by a scanning electron microscope (SEM), and the composition of each layer constituting the coating film is an energy dispersive X-ray analyzer (EDS: Energy Dispersive x). -ray Spectroscopy).
- the surface-coated cutting tool of the present invention comprises a substrate and a coating film formed thereon.
- the surface-coated cutting tool of the present invention having such a basic configuration includes, for example, a drill, an end mill, a milling or turning edge cutting type cutting tip, a metal saw, a cutting tool, a reamer, a tap, or a crankshaft pin. It can be used very effectively as a chip for milling.
- a conventionally known material known as such a cutting tool base material can be used without particular limitation.
- cemented carbide for example, WC base cemented carbide, including WC, including Co, or further including carbonitride such as Ti, Ta, Nb, etc.
- cermet TiC, TiN, TiCN, etc.
- High-speed steel, ceramics titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, and mixtures thereof), cubic boron nitride sintered body, diamond sintered body Etc. can be mentioned as examples of such a substrate.
- a cemented carbide is used as such a base material, the effect of the present invention is exhibited even if such a cemented carbide contains an abnormal phase called free carbon or ⁇ phase in the structure.
- these base materials may have a modified surface.
- a de- ⁇ layer may be formed on the surface, and in the case of cermet, a surface hardened layer may be formed, and even if the surface is modified in this way, The effect is shown.
- the coating film of the present invention comprises a single layer or a plurality of layers including at least one titanium carbonitride layer.
- a titanium carbonitride layer has a specific crystal orientation and is therefore excellent in wear resistance and has a uniform hardness, so that the coating film is not easily damaged.
- Such a coating film of the present invention includes an aspect in which the entire surface of the substrate is coated, and also includes an aspect in which the coating film is not partially formed.
- stacking aspect of a part differs is also included.
- the coating film of this invention is 5 micrometers or more and 25 micrometers or less in the whole film thickness. If it is less than 5 ⁇ m, the abrasion resistance may be inferior, and if it exceeds 25 ⁇ m, the adhesion to the substrate and the fracture resistance may be reduced.
- a particularly preferable film thickness of such a coating film is 10 ⁇ m or more and 20 ⁇ m or less.
- the coating film of the present invention includes at least one titanium carbonitride layer.
- a titanium carbonitride layer is preferably a layer mainly composed of TiCN, and is characterized in that the orientation index TC (220) of the (220) plane, which is the primary sliding surface of TiCN, is maximum.
- the orientation index TC (hkl) is defined by the following formula (I).
- I (hkl) represents the peak intensity (diffraction intensity) of the measured (hkl) plane
- I 0 (hkl) represents a JCPDS file (Joint Committee on Powder Diffraction Standards).
- File; 32-1383 (TiC), 38-1420 (TiN)) is the average value of the powder diffraction intensities of TiC and TiN constituting the (hkl) plane, and (hkl) is (111), (200), ( 220, (311), (331), (420), (422), and (511).
- the orientation index TC (220) of the texture coefficient TC (hkl) is the maximum, the slipping property of the coating film is improved and it is difficult to wear, so that the wear resistance can be improved. This shows good wear resistance especially in turning of cast iron or carbon steel.
- the titanium carbonitride layer is characterized in that an average value in a plurality of measurements of the relative hardness Ht / Hs is 3 or more. Further, the upper limit of the average value of the relative hardness Ht / Hs is not particularly limited, and the higher the value, the better the wear resistance.
- the relative hardness Ht / Hs means the ratio of the indentation hardness Ht of the titanium carbonitride layer to the indentation hardness Hs of the hardness reference piece, and is calculated as follows.
- the indentation hardness Ht of the titanium carbonitride layer is measured using the same ultrafine indentation hardness tester as described above. Specifically, the sample is cut along a plane including the normal line to the surface of the coating film of the surface-coated cutting tool, the cut surface is mechanically polished, and the titanium carbonitride layer is perpendicular to the cross section from the vertical direction. The indentation hardness Ht of the titanium carbonitride layer is measured by indenting the indenter.
- the same indentation hardness measurement is repeated 30 times by changing the position where the indenter is pushed in, and the stress-strain curve of the indentation hardness Ht is discontinuous or unnatural among these 30 measurements.
- the average value of the relative hardness Ht / Hs of the titanium carbonitride layer is calculated by dividing the average value of the indentation hardness Ht thus obtained by the indentation hardness Hs of the hardness reference piece.
- the indentation hardness distribution of the titanium carbonitride layer (that is, the uniformity of hardness within the layer) is evaluated using the measurement results of the indentation hardness of 30 times. That is, after removing an abnormal value from the 30 indentation hardness measurements, a maximum value Ht max and a minimum value Ht min of the indentation hardness are selected, and these are respectively divided by the indentation hardness Hs of the hardness reference piece. Thus, the maximum value Ht max / Hs of the relative hardness and the minimum value Ht min / Hs of the relative hardness are calculated.
- the value obtained by dividing the difference between the maximum relative hardness value Ht max / Hs and the minimum relative hardness value Ht min / Hs by the average relative hardness Ht / Hs is the indentation of the titanium carbonitride layer. It becomes an index indicating the distribution of hardness.
- the maximum relative hardness Ht of the titanium carbonitride layer The max / Hs is 3.9, the minimum value Ht min / Hs is 3.1, and the difference is 0.8.
- the index indicating the indentation hardness distribution of the titanium carbonitride layer (that is, the maximum value Ht max / Hs and the minimum value Ht min / Hs of the relative hardness of the titanium carbonitride layer with respect to the average value of the relative hardness Ht / Hs) ) Is 0.3 or less, and preferably 0.1 or less.
- the titanium carbonitride layer having such a hardness distribution is less likely to cause chipping or chipping during cutting.
- Such a titanium carbonitride layer contains TiCN as a main component as described above, but the term “including TiCN as a main component” means that it contains 90% by mass or more of TiCN, and preferably contains inevitable impurities. Except that it is composed only of TiCN.
- Ti carbonitride The atomic ratio between the elements contained in such TiCN (Ti carbonitride) includes all conventionally known atomic ratios, and the atomic ratio is not particularly limited.
- Ti and CN The atomic ratio of Ti is preferably 0.8 to 1.4 when the total of CN is 1, and the atomic ratio of carbon to the total of carbon and nitrogen is preferably 0.7 or more. . When this is expressed by a formula, it is preferable to satisfy C / (C + N) ⁇ 0.7. Thereby, the orientation index of the (220) plane of the titanium carbonitride layer can be increased, and thus the wear resistance can be improved.
- the average thickness of the titanium carbonitride layer is preferably 5 ⁇ m or more and 20 ⁇ m or less, more preferably the upper limit is 15 ⁇ m and the lower limit is 7 ⁇ m. By satisfying this, it is possible to maintain a good balance between wear resistance and chipping resistance. If the thickness of the titanium carbonitride layer exceeds 20 ⁇ m, the chipping resistance decreases, which may not be preferable. If the thickness is less than 5 ⁇ m, the coating film tends to wear during high-speed cutting, which is not preferable.
- a coating film contains a lowermost layer, a titanium carbonitride layer, an adhesion layer, an alumina layer, and an outermost surface layer in this order from the base material side.
- a coating film contains a lowermost layer, a titanium carbonitride layer, an adhesion layer, an alumina layer, and an outermost surface layer in this order from the base material side.
- ⁇ Lower layer> In the coating film of the present invention, it is preferable to provide a lowermost layer (layer in contact with the substrate) made of Ti nitride between the substrate and the titanium carbonitride layer. Since this lowermost layer has high adhesiveness with the base material, it is possible to prevent the entire coating film from being peeled even when it corresponds to severe cutting conditions. By forming such a lowermost layer, sufficient adhesion that can withstand cutting can be obtained even when compressive residual stress is applied to at least one layer of the coating film.
- the layer thickness of the lowermost layer is preferably 0.05 ⁇ m or more and 1 ⁇ m or less.
- the coating film of the present invention has TiB x N y directly above the titanium carbonitride layer (wherein x and y each represent an atomic ratio, and 0.001 ⁇ x / (x + y) ⁇ 0.04) It is preferable that the contact
- x and y are particularly preferably 0.003 ⁇ x / (x + y) ⁇ 0.02.
- the atomic ratio between Ti and BN is preferably set so that Ti is 0.8 to 1.5 when the total of BN is 1.
- Such an adhesion layer can contain an element contained in another layer constituting the coating film of the present invention (in particular, an element contained in a layer in contact with the adhesion layer).
- Such an adhesion layer preferably has a thickness of 0.05 ⁇ m or more and 1 ⁇ m or less, and more preferably has an upper limit of 0.8 ⁇ m and a lower limit of 0.1 ⁇ m. If the thickness exceeds 1 ⁇ m, the wear resistance may decrease, which may be undesirable. If the thickness is less than 0.05 ⁇ m, sufficient adhesion to the alumina layer may not be exhibited.
- the coating film preferably includes an alumina layer between the outermost surface layer and the titanium carbonitride layer. Since such an alumina layer is a layer mainly composed of Al 2 O 3 , it exhibits good performance against oxidative wear during high-speed cutting and contributes to improvement of wear resistance.
- alumina layer is a layer mainly composed of Al 2 O 3 , it exhibits good performance against oxidative wear during high-speed cutting and contributes to improvement of wear resistance.
- mainly composed of Al 2 O 3 is an Al 2 O 3 is meant to include more than 90 wt%, preferably means that it is composed of only Al 2 O 3 except for unavoidable impurities.
- Such an alumina layer is mainly composed of Al 2 O 3 having an ⁇ -type crystal structure (hereinafter sometimes referred to as ⁇ -Al 2 O 3 ), or Al 2 O 3 having a ⁇ -type crystal structure. (Hereinafter sometimes referred to as ⁇ -Al 2 O 3 ).
- ⁇ -Al 2 O 3 is advantageous in that it is generally excellent in wear resistance in high-speed cutting.
- Such a crystal structure can be confirmed by X-ray diffraction.
- Such an alumina layer preferably has a layer thickness of 2 ⁇ m or more and 15 ⁇ m or less, more preferably the upper limit is 10 ⁇ m and the lower limit is 4 ⁇ m.
- the thickness exceeds 15 ⁇ m, peeling at the tip of the cutting edge or the boundary portion of the cutting edge tends to occur, and the chipping resistance may be lowered. If it is less than 2 ⁇ m, the crater wear resistance on the rake face is reduced. In addition, the corrosion resistance in repeated cutting such as thread cutting and grooving may be reduced.
- the coating film of this invention contains an outermost surface layer with the said titanium carbonitride layer.
- the outermost surface layer is a layer constituting the surface of the coating film mainly composed of any one of Ti carbide, nitride and carbonitride.
- the phrase “consisting of any one of Ti carbide, nitride and carbonitride” means containing 90% by mass or more of Ti carbide, nitride and carbonitride, preferably inevitable It means that it is composed of only Ti carbide, nitride and carbonitride except for impurities.
- the mass ratio of Ti and elements other than Ti that is, C, N, and CN is 50 mass% or more for Ti.
- Ti nitride ie, a compound represented by TiN
- TiN has the clearest color (exhibits gold color) among these compounds, there is an advantage that the corner of the cutting tip after cutting use can be easily identified.
- the atomic ratio is not limited to a stoichiometric range unless it is particularly limited and includes any conventionally known atomic ratio.
- the atomic ratio of “Ti”, “C”, and “N” is not limited to 50:25:25, and also when “TiN” is described, “Ti” and “N”
- the atomic ratio is not limited to 50:50.
- the outermost surface layer preferably has a thickness of 0.05 ⁇ m or more and 1 ⁇ m or less. Furthermore, the upper limit of the thickness is 0.8 ⁇ m, more preferably 0.6 ⁇ m, and the lower limit is 0.1 ⁇ m, more preferably 0.2 ⁇ m. If the thickness is less than 0.05 ⁇ m, the effect is not sufficient when compressive residual stress is applied, and there is not much effect in improving the fracture resistance, and if it exceeds 1 ⁇ m, the layer located inside the outermost surface layer Adhesion may be reduced.
- the coating film of the present invention is preferably formed by a chemical vapor deposition method (CVD method).
- CVD method chemical vapor deposition method
- the film formation temperature when forming the titanium carbonitride layer is preferably higher than that of the conventional MT-CVD method and lower than that of the conventional HT-CVD method. Is preferably 900 ° C. or higher and 1000 ° C. or lower.
- the film formation temperature when forming the titanium carbonitride layer is preferably higher than that of the conventional MT-CVD method and lower than that of the conventional HT-CVD method. Is preferably 900 ° C. or higher and 1000 ° C. or lower.
- the MT-CVD method forms a film at a relatively low temperature of about 830 ° C. to 900 ° C.
- the HT-CVD method forms a film at a relatively high temperature of about 1000 ° C. or more. is there.
- a titanium carbonitride layer having a crystal orientation with the (220) plane having the maximum peak intensity can be formed, and the surface is smooth in terms of crystal structure. And excellent in wear resistance.
- the difference in film formation temperature between the adhesion layer and the alumina layer formed after forming the titanium carbonitride layer is small, and there is an advantage that temperature change and thermal shock during film formation are suppressed to a minimum.
- the film formation temperature is less than 900 ° C.
- the crystal structure of the titanium carbonitride layer is oriented in the columnar crystal (422) plane, so that sufficient slipperiness cannot be obtained.
- Decarburization in the hard alloy substrate or cermet substrate becomes severe, and a hard and brittle layer is formed at the interface between the substrate and the coating film. This brittle layer reduces the adhesion between the substrate and the coating film.
- the titanium carbonitride layer of the present invention is formed at a temperature about 100 ° C. lower than that of the conventional HT-CVD method.
- the carbon source constituting the titanium carbonitride layer the number of carbons having higher activity than CH 4 gas. It is preferable to use a saturated hydrocarbon of 2 (C 2 H 2 gas, C 2 H 4 gas, and C 2 H 6 gas). Thereby, there is no inferiority to the conventional HT-CVD method, the film can be formed at a sufficient speed, and the production efficiency is not lowered.
- the titanium carbonitride layer constituting the coating film of the present invention is formed under a film formation condition lower than the conventional film formation pressure, that is, a film formation pressure of 40 kPa or more and 80 kPa or less.
- a film formation pressure of 40 kPa or more and 80 kPa or less.
- the mean free process between the reaction gases is shortened, so that the film formation speed is increased and the aspect ratio of the crystal structure constituting the titanium carbonitride layer can be increased.
- the titanium carbonitride layer can be made into a good quality columnar crystal having the maximum peak intensity on the (220) plane, and the hardness of the titanium carbonitride layer can be made uniform.
- the film When the film is formed under a high vacuum condition of less than 40 kPa, the evaporation of the bonding layer in the substrate is promoted, and the bonding force between the WC particles or the TiCN particles in the substrate is reduced. Thereby, the interface between the coating film and the base material is easily peeled off, and the tool is easily damaged.
- the film when the film is formed under a low vacuum condition exceeding 80 kPa, the crystal structure of the titanium carbonitride layer cannot be uniformly formed into a columnar crystal, and depending on the condition, a granular mixed structure is formed, resulting in a difference in structure. The hardness of the titanium carbonitride layer is difficult to be uniform.
- the titanium carbonitride layer is made uniform by forming the titanium carbonitride layer at a film forming temperature of 900 ° C. or higher and 1000 ° C. or lower and a film forming pressure of 40 kPa or higher and 80 kPa or lower. Therefore, chipping and chipping are less likely to occur during cutting.
- the raw material gas introduced when forming the titanium carbonitride layer preferably includes at least a Ti source, a C source, and an N source, and also includes H 2 or argon.
- TiCl 4 gas or the like is preferably used as the Ti source
- N 2 gas, NH 3 gas, CH 3 CN gas or the like is preferably used as the N source.
- the C source it is preferable to use a saturated hydrocarbon gas or an unsaturated hydrocarbon gas having 1 to 3 carbon atoms.
- the saturated hydrocarbon gas having 1 to 3 carbon atoms include CH 4 gas, C 2 H 6 gas, and C 3 H 8 gas.
- the unsaturated hydrocarbon gas having 1 to 3 carbon atoms include C 2 H 2 gas, C 2 H 4 gas, C 3 H 4 gas, and C 3 H 6 gas.
- CH 3 CN gas used as the N source may be used as the C source.
- the molar ratio of the C source to the Ti source (that is, the molar ratio of the C source / the molar ratio of the Ti source) is preferably 4 or more and 10 or less.
- the composition ratio of carbon contained in the titanium carbonitride layer can be increased as compared with the case where the film is formed by the conventional MT-CVD method, and thus the hardness at high temperature is excellent. It becomes a titanium carbonitride layer. And since the friction coefficient of a titanium carbonitride layer becomes low, slipperiness improves and abrasion resistance can be improved.
- the film formation rate of the titanium carbonitride layer is slow, which is not suitable for mass productivity.
- the crystal structure constituting the titanium carbonitride layer is coarsened, and the hardness of the coating film becomes difficult to be uniform, and a large amount of chloride is generated as an unreacted substance in the manufacturing process. Therefore, it is not preferable from an environmental viewpoint.
- the blast treatment can be performed by colliding a metal powder such as a steel ball or a ceramic powder such as alumina mixed directly or with a solvent such as water with the surface of the coating film.
- Specific conditions such as the collision can be appropriately adjusted depending on the configuration of the coating film and the magnitude of the compressive residual stress to be applied. However, if the collision is too weak, the compressive residual stress will not be applied. It is preferable to make it collide with strength.
- a cemented carbide cutting tip (shape: CNMA120408 manufactured by Sumitomo Electric Hardmetal Co., Ltd.) having a composition (including inevitable impurities) composed of WC-5% Co was used as a base material.
- the cutting edge of the base material was chamfered with a nylon brush containing SiC abrasive grains and subjected to round honing. Thereafter, the substrate surface was washed. The nose radius of this substrate was 0.8 mm.
- Example 1 After forming a 0.6 ⁇ m bottom layer (TiN layer) and a 7.5 ⁇ m titanium carbonitride layer (TiCN layer) in order from the base material, a 0.8 ⁇ m adhesion layer (TiBN layer), A 2.8 ⁇ m alumina layer ( ⁇ -Al 2 O 3 layer) and a 0.5 ⁇ m outermost layer (TiN layer) were formed. In this way, the surface-coated cutting tool of Example 1 was produced. By the same method as this, the surface-coated cutting tool of each Example and each comparative example was produced.
- Layer thickness of each layer in Table 1 indicates the layer thickness of each layer constituting the coating film
- total film thickness indicates the film thickness of the coating film.
- C / (C + N) in Table 1 represents the atomic ratio of carbon to the sum of the atomic ratios of carbon and nitrogen constituting the titanium carbonitride layer.
- atomic ratio a value obtained by analyzing the titanium carbonitride layer by EPMA (Electron Probe Micro Analysis) was adopted.
- Crystal plane of peak intensity indicates the crystal plane of the highest peak intensity when the titanium carbonitride layer is X-ray diffracted by an X-ray diffractometer (product name: RINT 2400 (manufactured by Rigaku Corporation)). .
- “Relative hardness” in Table 1 describes the average value of the relative hardness Ht / Hs of the indentation hardness Ht of the titanium carbonitride layer with respect to the indentation hardness Hs of the hardness reference piece.
- a method for calculating the average value of the relative hardness Ht / Hs first, a nano-indentation method using an ultra-fine indentation hardness tester (device name: ENT-1100a (manufactured by Elionix Co., Ltd.)) The indentation hardness Hs of the hardness reference piece (product name: UMV905 (manufactured by Yamamoto Scientific Tool Research Co., Ltd.)) was measured.
- the sample was cut along a plane including the normal to the surface of the coating film of the surface-coated cutting tool, and the cut surface was mechanically polished.
- the indentation of the titanium carbonitride layer was performed by pushing the indenter into the titanium carbonitride layer from the direction perpendicular to the cross section.
- Hardness Ht was measured.
- the indentation hardness of the titanium carbonitride layer was measured 30 times by changing the position where the indenter was pushed. Of these 30 measurements, if the stress-strain curve of indentation hardness Ht is discontinuous or unnatural, it is judged as an abnormal value, and the other indentation hardness measurements are averaged.
- the average value of the indentation hardness Ht was calculated.
- the average value of the relative hardness Ht / Hs of the titanium carbonitride layer was calculated by dividing the average value of the indentation hardness Ht by the indentation hardness Hs of the hardness reference piece.
- the maximum value Ht max and the minimum value Ht min of the indentation hardness after removing the abnormal value from the 30 indentation hardness measurements are divided by the indentation hardness Hs of the hardness reference piece to obtain the relative hardness.
- the maximum value Ht max / Hs and the minimum value Ht min / Hs were calculated.
- each layer constituting the coating film other than the titanium carbonitride layer was formed under the conditions shown in Table 2 below, and the titanium carbonitride layer was formed under the conditions in Table 3 below. That is, for example, in the film formation of the titanium carbonitride layer in Example 1, reaction gas comprising TiCl 4 : 1.9% by volume, CH 4 : 8.8% by volume, N 2 : 3% by volume, and H 2 : the balance. was introduced so that the total flow rate was 56.8 L / min, the pressure in the chamber was 80 kPa, and the temperature was 990 ° C.
- crater wear resistance was evaluated and shown in the column of “crater wear” in Table 4. Further, the damage form of the surface-coated cutting tool after the end of the cutting test is shown in the “damage form” column of Table 4.
- the surface-coated cutting tool of each example has a smaller flank wear amount and a narrower longitudinal width of crater wear than that of each comparative example. From this result, it can be said that the surface-coated cutting tool of each example is excellent in wear resistance and crater wear resistance as compared with that in each comparative example.
- the reason why the wear resistance and crater wear resistance were improved in this way is considered to be due to the fact that the crystal plane of the peak strength of the titanium carbonitride layer is (220).
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Abstract
Description
本発明の表面被覆切削工具は、基材とその上に形成された被覆膜とを備えたものである。このような基本的構成を有する本発明の表面被覆切削工具は、たとえばドリル、エンドミル、フライス加工用または旋削加工用刃先交換型切削チップ、メタルソー、歯切工具、リーマ、タップ、またはクランクシャフトのピンミーリング加工用チップ等として極めて有用に用いることができる。
本発明の表面被覆切削工具の基材としては、このような切削工具の基材として知られる従来公知のものを特に限定なく使用することができる。たとえば、超硬合金(たとえばWC基超硬合金、WCの他、Coを含み、あるいはさらにTi、Ta、Nb等の炭窒化物等を添加したものも含む)、サーメット(TiC、TiN、TiCN等を主成分とするもの)、高速度鋼、セラミックス(炭化チタン、炭化硅素、窒化硅素、窒化アルミニウム、酸化アルミニウム、およびこれらの混合体など)、立方晶型窒化硼素焼結体、ダイヤモンド焼結体等をこのような基材の例として挙げることができる。このような基材として超硬合金を使用する場合、そのような超硬合金は、組織中に遊離炭素やη相と呼ばれる異常相を含んでいても本発明の効果は示される。
本発明の被覆膜は、少なくとも1層の炭窒化チタン層を含む単一または複数の層からなることを特徴とする。かかる炭窒化チタン層は、特定の結晶配向性を有するため、耐摩耗性に優れており、しかも均一な硬度を有するため、被覆膜に欠損が生じにくいものである。
本発明の被覆膜は、炭窒化チタン層を少なくとも1層含むものである。かかる炭窒化チタン層は、TiCNを主体とする層とすることが好ましく、TiCNの1次すべり面である(220)面の配向性指数TC(220)が最大であることを特徴とする。ここで、配向性指数TC(hkl)とは、以下の式(I)で定義されるものである。
本発明において、被覆膜は、基材側から順に、最下層、炭窒化チタン層、密着層、アルミナ層、および最表面層をこの順に含むことが好ましい。以下においては、基材側から順に被覆膜を構成する各層を説明する。
本発明の被覆膜は、基材と炭窒化チタン層との間にTiの窒化物からなる最下層(基材と接する層)を設けることが好ましい。かかる最下層は、基材との密着性が高いため、苛酷な切削条件に対応する場合でも被覆膜全体が剥離することを防止することができる。このような最下層を形成することにより、被覆膜の少なくとも1層に圧縮残留応力が付与された場合であっても切削に耐え得る十分な密着性を得ることができる。このような最下層の層厚は、0.05μm以上1μm以下であることが好ましい。
本発明の被覆膜は、上記炭窒化チタン層の直上にTiBxNy(式中、xおよびyはそれぞれ原子比を示し、0.001≦x/(x+y)≦0.04である)で構成される密着層を含むことが好ましい。このような密着層は、その表面が非常に細かな針状組織となるため、その直上に形成されるアルミナ層と優れた密着性を示す。
本発明において、被覆膜は、上記最表面層と上記炭窒化チタン層との間にアルミナ層を含むことが好ましい。このようなアルミナ層は、Al2O3を主体とする層であるため、高速切削時の酸化摩耗に対して良好な性能が示され、耐摩耗性の向上に資するものとなる。ここで、Al2O3を主体とするとは、Al2O3を90質量%以上含むことを意味し、好ましくは不可避不純物を除きAl2O3のみにより構成されることを意味する。
本発明の被覆膜は、上記炭窒化チタン層とともに最表面層を含むことが好ましい。ここで、最表面層は、Tiの炭化物、窒化物および炭窒化物のいずれかを主成分とする被覆膜の表面を構成する層である。「Tiの炭化物、窒化物および炭窒化物のいずれかを主成分とする」とは、Tiの炭化物、窒化物および炭窒化物のいずれかを90質量%以上含むことを意味し、好ましくは不可避不純物を除きTiの炭化物、窒化物および炭窒化物のいずれかのみにより構成されることを意味する。また、Tiの炭化物、窒化物および炭窒化物のそれぞれにおいて、TiとTi以外の元素(すなわちC、N、およびCN)との質量比は、Tiが50質量%以上とすることが好ましい。
本発明の被覆膜は、化学蒸着法(CVD法)により形成されたものであることが好ましい。これにより、後述のブラスト処理を施すまでは被覆膜の各層は引張り残留応力を有したものとなり、基材との密着性が非常に高いものとなる。
実施例1~12および比較例1~6の表面被覆切削工具を用いて、以下の条件で切削加工試験を5分間行なった。
切削速度:200m/min
送り速度:0.3mm/rev
切り込み:2.0mm
切削油:水溶性
切削試験前後の表面被覆切削工具をノギスで測定することにより、逃げ面の摩耗減少幅を算出し、表4の「逃げ面摩耗量」の欄に示した。なお、逃げ面摩耗量が少ないものほど、表面被覆切削工具の耐摩耗性が優れることを示している。
Claims (3)
- 基材と、該基材上に形成された被覆膜とを備え、
前記被覆膜は、少なくとも1層の炭窒化チタン層を含み、
前記炭窒化チタン層は、組織係数TC(hkl)のうちの配向性指数TC(220)が最大であり、
硬度基準片の押し込み硬度をHsとし、前記炭窒化チタン層の押し込み硬度をHtとすると、複数回の測定における相対硬度Ht/Hsの平均値は、3以上であり、
前記相対硬度Ht/Hsに対する、前記炭窒化チタン層の相対硬度の最大値Htmax/Hsと最小値Htmin/Hsとの差は、0.5以下である、表面被覆切削工具。 - 前記炭窒化チタン層は、炭素と窒素との合計に対する炭素の原子比が0.7以上である、請求項1に記載の表面被覆切削工具。
- 前記被覆膜は、少なくとも1層のアルミナ層を含み、
前記アルミナ層は、α型酸化アルミニウムからなり、かつその平均層厚が2μm以上15μm以下である、請求項1または2に記載の表面被覆切削工具。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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US13/820,392 US9044811B2 (en) | 2010-09-07 | 2011-07-05 | Surface coated cutting tool |
CN201180042912.XA CN103108716B (zh) | 2010-09-07 | 2011-07-05 | 表面被覆切削工具 |
JP2012532889A JP5729777B2 (ja) | 2010-09-07 | 2011-07-05 | 表面被覆切削工具 |
KR1020137006123A KR20130041325A (ko) | 2010-09-07 | 2011-07-05 | 표면 피복 절삭 공구 |
EP11823318.8A EP2614905A4 (en) | 2010-09-07 | 2011-07-05 | CUTTING TOOL WITH SURFACE COATING |
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JP2010199857 | 2010-09-07 |
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US (1) | US9044811B2 (ja) |
EP (1) | EP2614905A4 (ja) |
JP (1) | JP5729777B2 (ja) |
KR (1) | KR20130041325A (ja) |
CN (1) | CN103108716B (ja) |
WO (1) | WO2012032839A1 (ja) |
Cited By (1)
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EP2839907A4 (en) * | 2012-04-19 | 2016-01-27 | Sumitomo Elec Hardmetal Corp | CUTTING TOOL WITH SURFACE COATING |
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KR101417542B1 (ko) * | 2011-03-31 | 2014-07-08 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 표면 피복 절삭 공구 및 그 제조 방법 |
CN102858483B (zh) * | 2011-04-21 | 2014-11-26 | 住友电工硬质合金株式会社 | 表面被覆切削工具及其制造方法 |
CN107427931B (zh) * | 2015-03-27 | 2019-03-15 | 株式会社泰珂洛 | 被覆切削工具 |
JP6210348B1 (ja) * | 2016-11-08 | 2017-10-11 | 株式会社タンガロイ | 被覆切削工具 |
CN109279917A (zh) * | 2017-07-20 | 2019-01-29 | 深圳市诺真空科技有限公司 | 一种陶瓷表面的镀膜方法 |
WO2021245878A1 (ja) * | 2020-06-04 | 2021-12-09 | 住友電工ハードメタル株式会社 | 切削工具 |
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JPWO2012032839A1 (ja) | 2014-01-20 |
EP2614905A1 (en) | 2013-07-17 |
KR20130041325A (ko) | 2013-04-24 |
EP2614905A4 (en) | 2016-06-01 |
US9044811B2 (en) | 2015-06-02 |
JP5729777B2 (ja) | 2015-06-03 |
CN103108716B (zh) | 2015-07-01 |
CN103108716A (zh) | 2013-05-15 |
US20130152481A1 (en) | 2013-06-20 |
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