WO2012029402A1 - Pickup method and pickup device - Google Patents
Pickup method and pickup device Download PDFInfo
- Publication number
- WO2012029402A1 WO2012029402A1 PCT/JP2011/065058 JP2011065058W WO2012029402A1 WO 2012029402 A1 WO2012029402 A1 WO 2012029402A1 JP 2011065058 W JP2011065058 W JP 2011065058W WO 2012029402 A1 WO2012029402 A1 WO 2012029402A1
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- WO
- WIPO (PCT)
- Prior art keywords
- adhesive sheet
- chip
- pressure
- sensitive adhesive
- suction
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 108
- 239000000853 adhesive Substances 0.000 claims abstract description 156
- 230000001070 adhesive effect Effects 0.000 claims abstract description 156
- 239000012530 fluid Substances 0.000 claims abstract description 44
- 238000002347 injection Methods 0.000 claims abstract description 27
- 239000007924 injection Substances 0.000 claims abstract description 27
- 238000013459 approach Methods 0.000 claims abstract description 4
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 66
- 238000001179 sorption measurement Methods 0.000 claims description 6
- 230000007246 mechanism Effects 0.000 description 54
- 230000008569 process Effects 0.000 description 49
- 238000012986 modification Methods 0.000 description 27
- 230000004048 modification Effects 0.000 description 27
- 230000002093 peripheral effect Effects 0.000 description 22
- 230000000630 rising effect Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 230000006837 decompression Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1126—Using direct fluid current against work during delaminating
- Y10T156/1132—Using vacuum directly against work during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1933—Spraying delaminating means [e.g., atomizer, etc.
Definitions
- the present invention relates to a chip pickup method and a chip pickup apparatus.
- a three-dimensional integration technique in which a plurality of semiconductor devices are stacked and arranged three-dimensionally.
- the following method has been proposed.
- a substrate on which an integrated circuit has been formed in advance is divided into a plurality of chips.
- segmentation is selected from the some chip
- the chips thus selected are stacked on another substrate and mounted as a three-dimensional stacked body (hereinafter also referred to as “stacked chip”).
- such a stacked chip is manufactured as follows. First, an adhesive sheet such as a dicing tape or a back grind tape is attached to the substrate on which the semiconductor device is formed from the device forming surface side where the semiconductor device is formed. Then, the substrate with the adhesive sheet attached to the device forming surface in this way is thinned by grinding from the surface opposite to the device forming surface, that is, from the back surface of the substrate to a predetermined thickness. Thereafter, the substrate thinned in this way is diced while being attached to the adhesive sheet, and divided into individual chips. Next, the individual chips thus divided are taken out from the adhesive sheet, and the taken-out chips are stacked (for example, see Patent Document 1).
- an adhesive sheet such as a dicing tape or a back grind tape is attached to the substrate on which the semiconductor device is formed from the device forming surface side where the semiconductor device is formed. Then, the substrate with the adhesive sheet attached to the device forming surface in this way is thinned by grinding from the surface opposite to the device forming surface,
- a needle pickup device that picks up a chip by pushing up a needle from the back surface of an adhesive sheet is disclosed.
- a needleless pickup device in which a nozzle capable of vacuum-sucking a chip is brought close to the surface of the chip and the chip is taken out from an adhesive sheet by vacuum suction using the nozzle.
- a shear stress acts on the boundary surface between the part peeled off from the pressure-sensitive adhesive sheet and the part not peeled off from the pressure-sensitive adhesive sheet, and the shear stress is determined by the size of the chip plane and the thickness of the chip. Depends on. If the shear stress exceeds the shear fracture strength (shear strength) of the chip, the chip may be destroyed.
- the present invention has been made in view of the above points. That is, the present invention provides a chip pickup method capable of reducing stress load applied to a chip when picking up a chip attached to an adhesive sheet when picking up a thinned chip and preventing chip breakage. And a pickup device.
- the following pickup method is provided.
- the first adsorbing portion is brought close to and in contact with the chip attached to the adhesive sheet, and the second adsorbing portion in which a concave portion is formed on the contact surface contacting the adhesive sheet is used as the adhesive sheet.
- the second suction part is brought into contact with the pressure-sensitive adhesive sheet so as to approach the first suction part. Then, the pressure-sensitive adhesive sheet is sucked by the second suction part in contact with the pressure-sensitive adhesive sheet, and fluid is injected between the pressure-sensitive adhesive sheet and the chip by the injection part.
- the adhesive sheet is peeled off from the portion of the chip facing the recess, and the first adsorption unit sucks the chip from the adhesive sheet sucked by the second adsorption unit. Keep the adsorption part away. In this way, the chip is separated from the adhesive sheet and picked up.
- the first suction part that sucks the chip the first drive part that drives the first suction part to move, and the contact surface that contacts the adhesive sheet. It has a second suction part that is formed with a recess and sucks the adhesive sheet, a second drive part that drives to move the second suction part, an injection part that injects fluid, and a control part A pickup device is provided.
- the control unit causes the first drive unit to bring the first suction unit into close contact with the chip attached to the adhesive sheet, and causes the second drive unit to stick the second suction unit.
- the second suction part is brought into contact with the adhesive sheet so as to be close to the sheet and face the first suction part.
- a control part opposes the recessed part of a chip
- the adhesive sheet is peeled from the part.
- the control part is in a state where the chip is adsorbed by the first adsorbing part, by moving the first adsorbing part away from the adhesive sheet sucked by the second adsorbing part by the first driving part, The chip is peeled off from the adhesive sheet and picked up.
- the stress load applied to the chip when picking up the chip attached to the adhesive sheet can be reduced, and the chip can be prevented from being broken.
- the pickup apparatus 10 includes a stage 20, an upper collet 30, a lower collet 40, and a control unit 60.
- the stage 20 is installed horizontally.
- An adhesive sheet 21, for example, a dicing tape, to which the wafer W is attached, is held on the stage 20 while being held on the ring frame 22.
- the wafer W attached to the adhesive sheet 21 is bonded onto the adhesive sheet 21 in a state where a plurality of chips 23 formed on the wafer W are diced and divided into individual chips.
- a stage 20 provided separately from the pickup device 10 may be used. That is, the pickup device 10 has at least an upper collet 30 and a lower collet 40.
- the upper collet 30 and the lower collet 40 are configured so as to sandwich the chip 23 attached to the adhesive sheet 21 held on the stage 20 from above and below, that is, to face each other.
- the upper collet 30 and the lower collet 40 are provided in a configuration that can move up and down and move in a two-dimensional direction within a horizontal plane, respectively.
- the upper collet driving mechanism 32 and the lower collet driving mechanism 42 described later It is moved in a two-dimensional direction in the horizontal plane. Then, the upper collet driving mechanism 32 and the lower collet driving mechanism 42 are positioned so that the central axes of the upper collet 30 and the lower collet 40 coincide with the center of the chip 23 to be picked up.
- the upper collet 30 and the lower collet 40 correspond to the first suction part and the second suction part in the present invention, respectively.
- the pickup device 10 may be configured such that the configuration shown in FIG.
- the upper collet 30 has an upper collet body 31, an upper collet drive mechanism 32, and an upper collet exhaust mechanism 33.
- the upper collet drive mechanism 32 corresponds to the first drive unit in the present invention.
- the lower surface of the upper collet lower end 34 that is, the surface on the chip 23 side, is configured to be substantially parallel to the upper surface of the chip 23, and has a shape such as a rectangle, a circle, and an ellipse in plan view.
- the upper collet lower end portion 34 has a structure in which a peripheral side member 36 and a central side member 37 are arranged in a double manner on the central side and the peripheral side, respectively.
- the peripheral side member 36 is an airtight member, and an opening 39 that communicates with a suction hole 38 for sucking the chip 23 in contact with the lower surface is formed on the center side of the lower surface of the peripheral side member 36.
- the center side member 37 is provided in the vicinity of the opening 39 communicating with the suction hole 38 so as to be locked to the peripheral side member 36.
- the center side member 37 is comprised with the porous material, and has the structure which can distribute
- the upper collet shaft 35 holds the upper collet lower end 34.
- the upper collet shaft portion 35 has a hollow suction hole 38 along the central axis.
- the lower end of the suction hole 38 is connected to an opening 39 formed on the lower surface of the peripheral side member 36 via a center side member 37 formed of a porous material.
- the upper end of the suction hole 38 is connected to the upper collet exhaust mechanism 33.
- the upper collet exhaust mechanism 33 has an exhaust pump and a valve (not shown), and the exhaust pressure of the suction hole 38 can be adjusted by adjusting the opening of the valve at an arbitrary timing.
- the suction hole 38 When the suction hole 38 is decompressed by the upper collet exhaust mechanism 33 in a state where the lower surface of the peripheral side member 36 is in contact with the upper surface of the chip 23, the opening 39 is sealed by the upper surface of the chip 23, and the central side member 37 and the suction hole are sealed. 38 is depressurized. As a result, the upper collet body 31 can suck the chip 23. That is, the lower surface of the peripheral side member 36 has a structure that isolates the center side member 37 and the suction hole 38 formed of the porous material inside the opening 39 from the atmosphere by contact with the upper surface of the chip 23.
- the upper surface 45S of the lower collet upper end 45 that is, the surface on the pressure-sensitive adhesive sheet 21 side is configured substantially parallel to the sheet surface of the pressure-sensitive adhesive sheet 21, and has a shape such as a rectangle, a circle, or an ellipse in plan view. Yes.
- the lower collet upper end portion 45 has a peripheral side member 47.
- the peripheral side member 47 is an airtight member, and a recess 48 is formed on the center side of the upper surface 45S of the peripheral side member 47.
- the recess 48 is used for sucking the adhesive sheet 21 brought into contact with the upper surface 45 ⁇ / b> S of the peripheral side member 47.
- An opening 51 of a suction hole 50 for sucking the adhesive sheet 21 in contact with the upper surface 45 ⁇ / b> S of the peripheral side member 47 is formed on the bottom surface 49 of the recess 48.
- the wafer W on which a plurality of chips 23 are formed is previously attached to an adhesive sheet 21 that is, for example, a dicing tape, and the periphery of the adhesive sheet 21 to which the wafer W is attached is attached. For example, it is held by the ring frame 22. Then, the wafer W attached to the pressure-sensitive adhesive sheet 21 is diced by a dicing apparatus (not shown), and is separated for each chip 23 while being attached to the pressure-sensitive adhesive sheet 21. Further, the pressure-sensitive adhesive sheet 21 to which the plurality of chips 23 diced are attached is fixed to the stage 20 and held, for example, while being held on the ring frame 22. At this time, the tape surface of the pressure-sensitive adhesive sheet 21 can be fixed and held on the stage 20 so as to be horizontal, for example, and the chip 23 is attached to the upper surface of the pressure-sensitive adhesive sheet 21 held horizontally. Can be arranged.
- step S11 the position of the upper collet body 31 in the horizontal plane is adjusted in the state where the upper collet body 31 is above the adhesive sheet 21 fixedly held on the stage 20.
- the position of the upper collet body 31 in the horizontal plane is adjusted by the upper collet drive mechanism 32 shown in FIG. 1 so that the center of the upper collet body 31 and the center of the chip 23 are substantially coincident with each other in plan view.
- the upper collet body 31 whose position in the horizontal plane is adjusted in this way is lowered by the upper collet driving mechanism 32, and the upper collet body 31 is brought into contact with the upper surface of the chip 23.
- the peripheral side member 36 of the upper collet main body 31 is in contact with the upper surface of the chip 23.
- airtightness between the center side member 37 and the suction hole 38 of the upper collet body 31 and the upper surface of the chip 23 is ensured.
- the upper collet exhaust mechanism 33 shown in FIG. 1 is connected to the suction hole 38 formed in the lower surface of the upper collet body 31. Then, as shown in FIG. 3B, the upper collet exhaust mechanism 33 decompresses the inside of the center side member 37 and the suction hole 38 of the upper collet main body 31 that is airtight with the upper surface of the chip 23. As a result, the upper surface of the chip 23 is sucked into the center side member 37 and the suction hole 38 of the upper collet body 31.
- the vertical relationship between the upper collet 30 and the lower collet 40 may be opposite to that in FIG. 1, or the upper collet 30 and the lower collet 40 face each other in the horizontal direction. It may be configured as follows. In such a case, the step S13 may be anything as long as the lower collet 40 is brought close to the upper collet 30 to the adhesive sheet 21 that is fixedly held. And what is necessary is just to make the lower collet 40 brought close in this way contact the surface of the chip
- step S ⁇ b> 17 as shown in FIG. 3G, a fluid containing a gas or a liquid between the chip 23 and the peeled adhesive sheet 21 by the needle 44 inserted between the chip 23 and the peeled adhesive sheet 21. Inject FL. As a result, the following force acts on the peeled adhesive sheet 21. That is, the pressure of the fluid FL injected between the chip 23 and the peeled adhesive sheet 21 and the suction force that sucks the peeled adhesive sheet 21 into the concave portion 48 due to the above-mentioned pressure reduction. As a result, a force for further peeling the pressure-sensitive adhesive sheet 21 from the chip 23 acts, and the pressure-sensitive adhesive sheet 21 can be completely peeled from the portion of the chip 23 facing the recess 48.
- an incompressible fluid that is a liquid or a compressive fluid that is a gas can be used.
- a fluid in a liquid phase state including any one or more of water such as pure water, alcohol such as ethanol, carbonated water and the like can be used.
- a fluid in a gas phase state including any one or more of carbon dioxide (CO 2 ), nitrogen (N 2 ), and other various gases can be used.
- the pickup device 110 includes a stage 120, an upper collet 130, and a lower collet 140.
- the upper collet 130 has an upper collet body 131, an upper collet drive mechanism 132, and an upper collet exhaust mechanism 133.
- the lower collet 140 includes a lower collet main body 141, a lower collet driving mechanism 142, a lower collet exhaust mechanism 143, and a needle 144.
- the adhesive sheet 21 to which the chip 23 is attached is held on the stage 120 via the ring frame 22 as in the embodiment described above with reference to FIG.
- the lower collet 40a in the present modification includes a lower collet body 41a, a lower collet drive mechanism 42a, a lower collet exhaust mechanism 43, and a needle 44a.
- the configurations of the lower collet body 41a and the needle 44a are shown in FIG. This is different from the above-described embodiment.
- the needle 44a has only the needle main body 52a and the fluid supply mechanism 54. That is, the needle 44a is provided integrally with the lower collet body 41a with the tip 44aT of the needle 44a protruding from the bottom surface 49a of the recess 48a of the lower collet body 41a, and is perpendicular to the lower collet body 41a. It is not provided to be movable in the direction.
- the needle body 52a is provided with a supply hole 55a and communicates with the opening 56a provided at the tip 44aT of the needle body 52a, as in the embodiment described above with reference to FIG. .
- FIG. 10 is a flowchart for explaining the procedure of each step of the pickup method according to this modification.
- 11A to 11E are schematic cross-sectional views showing the state of the pickup device 10a in each step of the pickup method according to this modification.
- the step of fixing and holding the pressure-sensitive adhesive sheet 21 with the chip 23 affixed to the stage 20 in advance is the same as in the embodiment described above with reference to FIG. It is.
- the upper collet lowering step (step S21), the upper collet exhausting step (step S22), and the lower collet rising step (step S23) according to the present modification are respectively related to the embodiment described above with reference to FIG.
- the pickup method is the same as the upper collet lowering step (step S11), the upper collet exhausting step (step S12), and the lower collet rising step (step S13).
- 11A to 11C show states of the pickup device 10a when performing the upper collet lowering step (step S21), the upper collet exhausting step (step S22), and the lower collet rising step (step S23), respectively. .
- step S24 the space SP formed by the recess 48a of the lower collet 40a and the adhesive sheet 21 is decompressed, and the adhesive sheet 21 is sucked.
- FIG. 11D shows the state of the pickup device 10a when performing step S24.
- the space SP formed by the recess 48a and the adhesive sheet 21 is formed by the lower collet exhaust mechanism 43 shown in FIG. 9 connected to the suction hole 50a formed in the recess 48a. Reduce pressure. Thereby, the adhesive sheet 21 affixed to the part of the chip 23 facing the recess 48a is sucked into the recess 48a.
- the degree of decompression of the space SP may be such that the adhesive sheet 21 attached to the portion of the chip 23 facing the recess 48a is peeled off from the chip 23 by the suction by the decompression.
- step S14 the lower collet exhaust process (step S14), the needle insertion process (step S16), and the fluid injection process (step S17) in the pickup method according to the embodiment described above with reference to FIG. S24).
- step S25 before the chip 23 is peeled from the adhesive sheet 21 in the upper collet raising step (step S25), the adhesive sheet 21 is sucked into the recess 48a by the lower collet 40a and the needle in step S24 as described above.
- the fluid FL is injected between the adhesive sheet 21 and the chip 23 by 44a.
- the adhesive sheet 21 is peeled off from the part of the chip 23 facing the recess 48a.
Abstract
Description
(実施の形態)
最初に、図1から図8を参照し、本発明の実施の形態に係るピックアップ装置及びピックアップ方法について説明する。 Next, a mode for carrying out the present invention will be described with reference to the drawings.
(Embodiment)
First, a pickup apparatus and a pickup method according to an embodiment of the present invention will be described with reference to FIGS.
F=S×σmax (1)
で表される。ここで、Sは、上コレット上昇工程(ステップS18)が開始される時点における、チップの粘着シートとの間の接着面積を示すものとする。 Therefore, in the upper collet raising step (step S18) of the pickup method according to the present embodiment, the peeling force F necessary for peeling the chip from the adhesive sheet is
F = S × σ max (1)
It is represented by Here, S represents the adhesion area between the chip and the adhesive sheet at the time when the upper collet raising step (step S18) is started.
T=FD-FU (2)
となる。そして、せん断面SFの面積の合計をAとすると、このせん断力Tがせん断面SFに作用するせん断応力τは、
τ=T/A=(FD-FU)/A (3)
で表される。そして、チップ23のせん断破壊強度をτmaxとすると、チップ23がせん断破壊しない条件は、せん断応力τとせん断破壊強度τmaxとが
τ<τmax (4)
の関係を満たすことである。 As shown in FIG. 6, in the upper collet raising step (step S <b> 18), an upward suction force FU by the
T = FD-FU (2)
It becomes. When the total area of the shear surface SF is A, the shear stress τ that the shear force T acts on the shear surface SF is
τ = T / A = (FD−FU) / A (3)
It is represented by When the shear fracture strength of the
τ <τ max (4)
To satisfy the relationship.
A=L2×d×4 (5)
となり、また、式(1)より
FD-FU≒FD=(L12-L22)×σmax (6)
となる。そして、式(3)、式(5)及び式(6)より、
τ=(L12-L22)×σmax/(L2×d×4) (7)
となる。 Then, from FIG. 7 and FIG.
A = L2 × d × 4 (5)
From the formula (1)
FD−FU≈FD = (L1 2 −L2 2 ) × σ max (6)
It becomes. And from Formula (3), Formula (5) and Formula (6),
τ = (L1 2 −L2 2 ) × σ max / (L2 × d × 4) (7)
It becomes.
σmax=0.05N/mm2 (8)
とする。また、せん断破壊強度をτmaxについては、"Investigating the Influence of Fabrication Process and Crystal
Orientation on Shear Strength of Silicon Microcomponents", Q. Chen, D.-J. Yao, C.-J. Kim, and G. P. Carman, Journal
of Materials Science, Vol. 35, No. 21, Nov. 2000, pp. 5465-5474.の記載に基づいて、
τmax=5MPa
とする。また、チップ23の平面の寸法L1及び厚さdについては、
L1=10mm (9)
d=0.02mm (10)
とする。 About the maximum stress σ max , based on the physical properties of the dicing tape described above,
σ max = 0.05 N / mm 2 (8)
And Also, regarding the shear fracture strength τ max , “Investigating the Influence of Fabrication Process and Crystal
Orientation on Shear Strength of Silicon Microcomponents ", Q. Chen, D.-J. Yao, C.-J. Kim, and G. P. Carman, Journal
of Materials Science, Vol. 35, No. 21, Nov. 2000, pp. 5465-5474.
τ max = 5 MPa
And Further, regarding the planar dimension L1 and thickness d of the
L1 = 10mm (9)
d = 0.02mm (10)
And
表1に示すように、凹部48の開口48Kの寸法L2が6.7mm以下のときは、せん断面SFに作用するせん断応力τは、せん断破壊強度τmax以上となる。その結果、上コレット上昇工程(ステップS18)において、チップ23がせん断破壊するおそれがある。一方、凹部48の開口48Kの寸法L2が6.7mmよりも大きいときは、せん断面SFに作用するせん断応力τは、せん断破壊強度τmaxよりも小さくなる。その結果、上コレット上昇工程(ステップS18)において、チップ23がせん断破壊するおそれがない。すなわち、凹部48の開口48Kの寸法L2がチップ23の平面の寸法L1よりも小さく、かつ、所定値よりも大きいときは、せん断面SFに作用するせん断応力τをせん断破壊強度τmaxよりも小さくすることができる。その結果、上コレット上昇工程(ステップS18)において、チップ23がせん断破壊することを防止できる。
As shown in Table 1, when the dimension L2 of the
(実施の形態の変形例)
次に、図9から図11Eを参照し、本発明の実施の形態の変形例に係るピックアップ装置及びピックアップ方法について説明する。 In particular, as apparent from the equation (7), the shear stress τ increases as the thickness d of the
(Modification of the embodiment)
Next, with reference to FIGS. 9 to 11E, a pickup apparatus and a pickup method according to a modification of the embodiment of the present invention will be described.
30 上コレット
32 上コレット駆動機構
40,40a 下コレット
42,42a 下コレット駆動機構
44,44a ニードル
44T,44aT ニードルの先端
45S,45aS 下コレット上端部の上面
48,48a 凹部
48K,48aK 凹部の開口
49,49a 凹部の底面
51 凹部の底面に形成された開口
57 振動部 10, 10a Pick-up
Claims (10)
- 粘着シートに貼り付けられているチップに第1の吸着部を近づけて接触させるとともに、前記粘着シートに接触する接触面に凹部が形成されている第2の吸着部を前記粘着シートに近づけ、前記第1の吸着部と対向するように前記粘着シートに前記第2の吸着部を接触させ、
前記粘着シートに接触している前記第2の吸着部により前記粘着シートを吸引するとともに、前記粘着シートと前記チップとの間に、注入部により流体を注入することによって、前記チップの、前記凹部に対向する部分から、前記粘着シートを剥離させ、
前記第1の吸着部により前記チップを吸着している状態で、前記第2の吸着部が吸引している前記粘着シートから前記第1の吸着部を遠ざけることによって、前記チップを前記粘着シートから剥離させてピックアップする、ピックアップ方法。 The first adsorbing part is brought close to and in contact with the chip attached to the adhesive sheet, and the second adsorbing part in which a concave portion is formed on the contact surface in contact with the adhesive sheet is brought close to the adhesive sheet, Bringing the second adsorbing portion into contact with the adhesive sheet so as to face the first adsorbing portion;
The suction part is sucked by the second suction part in contact with the pressure-sensitive adhesive sheet, and a fluid is injected between the pressure-sensitive adhesive sheet and the chip by the injection part, whereby the concave part of the chip The adhesive sheet is peeled off from the part facing the
The chip is removed from the pressure-sensitive adhesive sheet by moving the first suction part away from the pressure-sensitive adhesive sheet sucked by the second suction part in a state where the chip is sucked by the first suction part. Pick-up method to pick up after peeling. - 前記第2の吸着部は、前記凹部の開口の寸法が、前記粘着シートから前記第1の吸着部を遠ざける際に前記チップに作用するせん断応力が前記チップのせん断強度と等しくなるような所定値よりも大きく、かつ、前記チップの平面の寸法よりも小さいものである、請求項1に記載のピックアップ方法。 The second adsorbing portion has a predetermined opening size of the concave portion such that a shear stress acting on the chip when the first adsorbing portion is moved away from the adhesive sheet is equal to a shear strength of the chip. The pick-up method according to claim 1, wherein the pick-up method is larger than and smaller than a plane dimension of the chip.
- 前記粘着シートに接触している前記第2の吸着部により前記粘着シートを吸引するとともに、前記粘着シートと前記チップとの間に、前記注入部により流体を注入することによって、前記チップの、前記凹部に対向する部分から、前記粘着シートを剥離させる際、前記第2の吸着部により前記粘着シートを吸引するとともに、振動部により前記粘着シートを振動させることによって、前記チップの、前記凹部に対向する部分からの前記粘着シートの剥離を開始させ、剥離が開始した前記粘着シートと前記チップとの間に前記注入部を挿入し、挿入した前記注入部により流体を注入することによって、前記チップの、前記凹部に対向する部分から、前記粘着シートを剥離させる、請求項1に記載のピックアップ方法。 While sucking the pressure-sensitive adhesive sheet by the second suction part in contact with the pressure-sensitive adhesive sheet and injecting a fluid by the injection part between the pressure-sensitive adhesive sheet and the chip, the chip, When the pressure-sensitive adhesive sheet is peeled from a portion facing the recess, the pressure-sensitive adhesive sheet is sucked by the second suction part, and the pressure-sensitive adhesive sheet is vibrated by the vibration part to face the recess of the chip. Peeling of the pressure-sensitive adhesive sheet from the part to be inserted, inserting the injection part between the pressure-sensitive adhesive sheet and the chip where peeling has started, and injecting fluid through the inserted injection part, The pickup method according to claim 1, wherein the pressure-sensitive adhesive sheet is peeled off from a portion facing the concave portion.
- 前記第2の吸着部は、前記凹部の底面に、前記粘着シートを吸引する吸引孔と連通する開口が形成されたものであり、
前記注入部は、前記吸引孔を通って、前記注入部の先端が前記開口から突出自在に設けられたものである、請求項1から請求項3のいずれかに記載のピックアップ方法。 The second suction part is formed with an opening communicating with a suction hole for sucking the pressure-sensitive adhesive sheet on the bottom surface of the concave part,
The pick-up method according to claim 1, wherein the injection part is provided so that a tip of the injection part protrudes from the opening through the suction hole. - 前記注入部は、前記注入部の先端が前記凹部の底面から突出した状態で、前記第2の吸着部と一体に設けられたものである、請求項1から請求項3のいずれかに記載のピックアップ方法。 The said injection | pouring part is provided in one with the said 2nd adsorption | suction part in the state which the front-end | tip of the said injection | pouring part protruded from the bottom face of the said recessed part. Pickup method.
- チップを吸着する第1の吸着部と、
前記第1の吸着部を移動するように駆動する第1の駆動部と、
粘着シートに接触する接触面に凹部が形成されており、前記粘着シートを吸引する第2の吸着部と、
前記第2の吸着部を移動するように駆動する第2の駆動部と、
流体を注入する注入部と、
前記第1の駆動部により、粘着シートに貼り付けられているチップに前記第1の吸着部を近づけて接触させるとともに、前記第2の駆動部により、前記第2の吸着部を前記粘着シートに近づけ、前記第1の吸着部と対向するように前記粘着シートに前記第2の吸着部を接触させ、
前記粘着シートに接触している前記第2の吸着部により前記粘着シートを吸引するとともに、前記粘着シートと前記チップとの間に前記注入部により流体を注入することによって、前記チップの、前記凹部に対向する部分から、前記粘着シートを剥離させ、
前記第1の吸着部により前記チップを吸着している状態で、前記第2の吸着部が吸引している前記粘着シートから前記第1の吸着部を前記第1の駆動部により遠ざけることによって、前記チップを前記粘着シートから剥離させてピックアップする、制御部と
を有する、ピックアップ装置。 A first suction part for sucking chips;
A first drive unit that drives the first suction unit to move;
A concave portion is formed on the contact surface that contacts the pressure-sensitive adhesive sheet, and a second suction part that sucks the pressure-sensitive adhesive sheet;
A second drive unit that drives the second suction unit to move;
An injection part for injecting a fluid;
The first drive unit brings the first suction unit into contact with the chip attached to the adhesive sheet, and the second drive unit causes the second suction unit to be brought into contact with the adhesive sheet. Approach the second suction part to the adhesive sheet so as to face the first suction part,
The suction part is sucked by the second suction part in contact with the pressure-sensitive adhesive sheet, and fluid is injected between the pressure-sensitive adhesive sheet and the chip by the injection part. The adhesive sheet is peeled off from the part facing the
By moving the first suction part away from the adhesive sheet sucked by the second suction part while the chip is sucked by the first suction part, by the first drive part, A pick-up device having a control part which peels and picks up the chip from the adhesive sheet. - 前記第2の吸着部は、前記凹部の開口の寸法が、前記粘着シートから前記第1の吸着部を前記第1の駆動部により遠ざける際に前記チップに作用するせん断応力が前記チップのせん断強度と等しくなるような所定値よりも大きく、かつ、前記チップの平面の寸法よりも小さいものである、請求項6に記載のピックアップ装置。 In the second suction part, the size of the opening of the concave part is determined by shear stress acting on the chip when the first suction part is moved away from the adhesive sheet by the first driving part. The pickup device according to claim 6, which is larger than a predetermined value equal to and smaller than a plane dimension of the chip.
- 前記粘着シートを振動させる振動部を有し、
前記制御部は、前記第2の吸着部により前記粘着シートを吸引するとともに、前記振動部により前記粘着シートを振動させることによって、前記チップの、前記凹部に対向する部分からの前記粘着シートの剥離を開始させ、剥離を開始した前記粘着シートと前記チップとの間に前記注入部を挿入し、挿入した前記注入部により流体を注入することによって、前記チップの、前記凹部に対向する部分から、前記粘着シートを剥離させるものである、請求項6に記載のピックアップ装置。 Having a vibrating part for vibrating the adhesive sheet;
The control unit sucks the pressure-sensitive adhesive sheet by the second suction unit and vibrates the pressure-sensitive adhesive sheet by the vibration unit, thereby peeling the pressure-sensitive adhesive sheet from a portion of the chip facing the recess. From the portion of the chip facing the recess, by inserting the injection part between the pressure-sensitive adhesive sheet that started peeling and the chip, and injecting fluid by the inserted injection part, The pickup device according to claim 6, wherein the pressure-sensitive adhesive sheet is peeled off. - 前記第2の吸着部は、前記凹部の底面に、前記粘着シートを吸引する吸引孔と連通する開口が形成されたものであり、
前記注入部は、前記吸引孔を通って、前記注入部の先端が前記開口から突出自在に設けられたものである、請求項6から請求項8のいずれかに記載のピックアップ装置。 The second suction part is formed with an opening communicating with a suction hole for sucking the pressure-sensitive adhesive sheet on the bottom surface of the concave part,
The pickup device according to any one of claims 6 to 8, wherein the injection portion is provided so that a tip of the injection portion protrudes from the opening through the suction hole. - 前記注入部は、前記注入部の先端が前記凹部の底面から突出した状態で、前記第2の吸着部と一体に設けられたものである、請求項6から請求項8のいずれかに記載のピックアップ装置。 The said injection | pouring part is a state in which the front-end | tip of the said injection | pouring part protruded from the bottom face of the said recessed part, and is provided in one with the said 2nd adsorption | suction part. Pickup device.
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JP5343525B2 (en) * | 2008-11-19 | 2013-11-13 | 富士電機株式会社 | Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
CN102472790B (en) * | 2009-08-02 | 2015-01-28 | Qmc株式会社 | Pickup apparatus and LED chip classification apparatus including same |
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2010
- 2010-08-31 JP JP2010194619A patent/JP5107408B2/en not_active Expired - Fee Related
-
2011
- 2011-06-30 US US13/819,033 patent/US20150214088A1/en not_active Abandoned
- 2011-06-30 WO PCT/JP2011/065058 patent/WO2012029402A1/en active Application Filing
- 2011-06-30 CN CN201180041531.XA patent/CN103081083B/en not_active Expired - Fee Related
- 2011-06-30 KR KR1020137006721A patent/KR20130113436A/en not_active Application Discontinuation
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JPH06204319A (en) * | 1993-01-07 | 1994-07-22 | Fujitsu Ltd | Method and device for picking-up semiconductor chip |
JPH11274181A (en) * | 1998-03-26 | 1999-10-08 | Matsushita Electric Ind Co Ltd | Chip push-up device |
JP2009277912A (en) * | 2008-05-15 | 2009-11-26 | Fujitsu Microelectronics Ltd | Peeling method and peeling device |
JP2011054648A (en) * | 2009-08-31 | 2011-03-17 | Elpida Memory Inc | Method of manufacturing semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150314544A1 (en) * | 2012-12-13 | 2015-11-05 | Michelin Recherche Et Technique, S.A. | Method for retreading a vehicle tire casing and vehicle casing obtained by this method |
US10046533B2 (en) * | 2012-12-13 | 2018-08-14 | Compagnie Generale Des Etablissements Michelin | Method for retreading a vehicle tire casing and vehicle casing obtained by this method |
Also Published As
Publication number | Publication date |
---|---|
JP5107408B2 (en) | 2012-12-26 |
CN103081083B (en) | 2015-09-23 |
KR20130113436A (en) | 2013-10-15 |
US20150214088A1 (en) | 2015-07-30 |
JP2012054344A (en) | 2012-03-15 |
CN103081083A (en) | 2013-05-01 |
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