WO2012023634A1 - Procédé de mise en contact gaz-liquide et appareil de mise en contact gaz-liquide - Google Patents

Procédé de mise en contact gaz-liquide et appareil de mise en contact gaz-liquide Download PDF

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Publication number
WO2012023634A1
WO2012023634A1 PCT/JP2011/069364 JP2011069364W WO2012023634A1 WO 2012023634 A1 WO2012023634 A1 WO 2012023634A1 JP 2011069364 W JP2011069364 W JP 2011069364W WO 2012023634 A1 WO2012023634 A1 WO 2012023634A1
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Prior art keywords
gas
liquid contact
liquid
contact method
contact section
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PCT/JP2011/069364
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English (en)
Japanese (ja)
Inventor
小嶋　久夫
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株式会社 アネモス
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Priority to JP2012529643A priority Critical patent/JP5938346B2/ja
Publication of WO2012023634A1 publication Critical patent/WO2012023634A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/14—Packed scrubbers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2321—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by moving liquid and gas in counter current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2322—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles using columns, e.g. multi-staged columns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/32—Packing elements in the form of grids or built-up elements for forming a unit or module inside the apparatus for mass or heat transfer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/302—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/404—Nitrogen oxides other than dinitrogen oxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/12—Methods and means for introducing reactants
    • B01D2259/124—Liquid reactants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/32—Details relating to packing elements in the form of grids or built-up elements for forming a unit of module inside the apparatus for mass or heat transfer
    • B01J2219/322—Basic shape of the elements
    • B01J2219/32203—Sheets
    • B01J2219/32224—Sheets characterised by the orientation of the sheet
    • B01J2219/32234—Inclined orientation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/32—Details relating to packing elements in the form of grids or built-up elements for forming a unit of module inside the apparatus for mass or heat transfer
    • B01J2219/322—Basic shape of the elements
    • B01J2219/32203—Sheets
    • B01J2219/32237—Sheets comprising apertures or perforations
    • B01J2219/32244—Essentially circular apertures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/32—Details relating to packing elements in the form of grids or built-up elements for forming a unit of module inside the apparatus for mass or heat transfer
    • B01J2219/332—Details relating to the flow of the phases
    • B01J2219/3322—Co-current flow

Definitions

  • the present invention relates to a gas-liquid contact method and a gas-liquid contact apparatus.
  • a first gas-liquid contact portion having a spiral blade body disposed on the upstream side of a cylindrical container is disposed, and a spiral blade is disposed downstream of the first gas-liquid contact portion.
  • a second gas-liquid contact portion having a body provided therein, a watering nozzle disposed above (upstream side) the first gas-liquid contact portion and the second gas-liquid contact portion, and an upstream portion of the container A gas containing a different kind of substance pressurized or depressurized is introduced, a pressurized liquid is supplied from a watering nozzle, and the first gas-liquid contact part and the second gas-liquid contact part are connected to gas and liquid.
  • the first gas-liquid contact part is made to flow at a high speed in the first gas-liquid contact part and the second gas-liquid contact part is made to contact and mix at a low speed in parallel flow from the upstream side to the downstream side.
  • the gas-liquid contact device based on this gas-liquid contact method has a wide range of applications such as a device for transferring a different substance in a gas into a liquid, such as a gas absorption device, a gas-liquid reaction device, and a dust collecting device.
  • gas-liquid contact devices such as gas absorption devices include devices such as packed towers and plate towers, but the flooding phenomenon occurs, so the gas velocity in the tower is limited. For this reason, the tower diameter becomes large and the equipment cost becomes expensive. Further, if dust is contained in the gas, the operation is stopped due to clogging or blockage. Furthermore, the actual situation is that the dust collection efficiency of fine particles of 1 ⁇ m or less, for example, submicron particles such as ZnO and SiO 2 powder is low. Furthermore, although a venturi scrubber is known as a dust collector, the pressure loss (for example, 3 to 20 kPa) becomes higher and the power cost becomes higher as the granular material becomes submicron particles.
  • the gas velocity is as high as 40 to 150 m / s, and the gas-liquid contact time is short, it is inappropriate to use it for high concentration gas absorption operation. Furthermore, in the case of an electrostatic precipitator, there are drawbacks such as a large installation cost, operating cost, and installation area.
  • the gas-liquid treatment apparatus using the static fluid mixer described in Patent Document 1 and Patent Document 2 has a problem that the dust collection efficiency of submicron particles is low.
  • the present invention has been made in view of the above problems, and an object of the present invention is to provide a gas-liquid contact method and a gas-liquid contact apparatus that achieve high performance of dust collection efficiency and gas absorption efficiency of submicron particles. .
  • the gas-liquid contact method of the present invention includes a first gas-liquid contact portion in which a spiral blade body is provided on the upstream side of a cylindrical container. And a second gas-liquid contact portion having a spiral blade body disposed on the downstream side of the first gas-liquid contact portion, the first gas-liquid contact portion and the second gas-liquid contact portion A watering nozzle is disposed on the upstream side of the container, a gas is introduced from the upstream part of the container, a liquid is supplied from the watering nozzle, and the gas and the liquid are upstream of the first gas-liquid contact part and the second gas-liquid contact part.
  • the gas and the liquid flow in the first gas-liquid contact portion at a high speed (for example, 15 to 150 m / s) in parallel flow, and the generated fine water droplets and exhaust gas Submicron particles are brought into contact with and mixed with each other, and the submicron particles are humidified and granulated to be collected in the liquid. Furthermore, the dust collection efficiency and gas absorption are obtained by contacting and mixing the submicron particles that have been humidified and increased in size by passing through the second gas-liquid contact part at a low speed (eg 0.5 to 15 m / s) and the cleaning liquid. Increase efficiency.
  • a low speed eg 0.5 to 15 m / s
  • the first gas-liquid contact part is disposed in the upper part of the gas-liquid contact tower, and the second gas-liquid contact part is disposed in the lower part.
  • the speed is 15 to 150 m / s
  • the gas pressure is used at a gauge pressure of 1 to 30 kPa
  • the second gas-liquid contact part is at a gas speed of 0.5 to 15 m / s
  • the gas pressure is at a gauge pressure of 0.1 to 10 kPaG. used.
  • the gas-liquid contact method of the present invention provides a dust collector and gas absorption efficiency that can collect submicron particles in a gas with high efficiency.
  • FIG. 1 is a schematic configuration diagram of a gas-liquid contact device 1 according to a first embodiment of the present invention.
  • a gas-liquid contact device 1 according to the present embodiment includes a container 2, a first gas-liquid contact unit 3, a second gas-liquid contact unit 4, and a first liquid sprinkling means. 5, the second liquid sprinkling means 6, the liquid supply means 7, the gas introduction means 8, the gas discharge means 9, the liquid discharge means 10, the new liquid supply means 11, and the liquid reservoir 12. I have.
  • the first gas-liquid contact part 3 and the second gas-liquid contact part 4 are provided with stationary fluid mixers 13 and 14 having spiral blades in a sealed processing container 2.
  • the longitudinal direction is arranged vertically.
  • the gas introduction means 8 and the first liquid sprinkling means 5 are provided on the upstream side of the first gas-liquid contact part 3 in the container 2, and on the downstream side of the first gas-liquid contact part 3.
  • the space 15 is formed, the second liquid sprinkling means 6 and the second gas-liquid contact part 4 are provided, and the liquid and the gas are separated below the second gas-liquid contact part 4
  • Gas separation means 16 for exhausting gas to the outside of the container 2 through the separation / falling section 16, the exhaust pipe 17 and the blower 18, which are spaces for dropping, is provided.
  • a portion 12 is provided.
  • a liquid supply pipe 20 is provided for supplying the liquid in the reservoir to the first and second liquid sprinkling means 5 and 6 via the circulation pump 19.
  • a new liquid supply means 11 for replenishing the storage part 12 with a new liquid as appropriate is provided.
  • an extraction pump 21 for appropriately discharging the liquid in the storage unit 12 out of the container 2 is provided.
  • a gas containing submicron particles and a liquid are supplied and sprayed from the upstream side of the first gas-liquid contact part 3 through the watering nozzle 22, and the gas in the first gas-liquid contact part 3 is gasified. It flows at a speed of 15 to 150 m / s. The sprayed liquid is further refined. The micronized water droplets and the submicron particles come into contact with each other, and the submicron particles are humidified and increased in size.
  • the gas containing the humidified and increased particles and the liquid supplied to the watering nozzle 23 via the second liquid water spraying means 6 have a gas velocity of 0.5 to 15 m in the second gas-liquid contact part 4. Flow through at / s, and contact and mix. Submicron particles in the gas are collected in the liquid. Further, Hcl, NH3, SOx, etc. in the gas can be physically absorbed and chemically reacted at a vapor-liquid equilibrium value to calm the gas.
  • the above-mentioned gas-liquid contact device is a metal, non-metal that uses exhaust gas treatment such as SOx, NOx, Hcl, Hg, and dust discharged from coal-fired power plants, garbage incinerators, blast furnaces, melting furnaces, etc.
  • Exhaust gas treatment of dust, SOx, NOx, etc. in the refining industry such as, SiO 2 , Sic 4 , Hcl, Tic 4 , SiF 4 etc. in the synthetic quartz / optical fiber manufacturing industry and (C 2 H 3 ) 3 Al in the semiconductor manufacturing industry (C 2 H 5 ) 3 Ga, H 2 Se, SiH 4 , Si 2 H 6 , B 2 H 6 and other exhaust gas treatment can be applied.
  • the gas-liquid contact device according to the present invention is not limited to the above-described embodiment, and various modifications and changes can be made without departing from the configuration of the present invention in terms of materials and configurations.
  • the spraying direction of the watering nozzles 22 and 23 can be selected and used as appropriate, either downward or upward.
  • the arrangement position of the watering nozzle may be arranged below the gas-liquid contact portions 3 and 4.
  • a wear-resistant material can be appropriately selected and used.
  • the gas introduction means 8 may be improved and selectively used by making the gas introduction pipe double or triple with seal gas.
  • FIG. 2 is a schematic configuration diagram of the gas-liquid contact device 24 according to the second embodiment of the present invention.
  • the gas-liquid contact device 24 according to the second embodiment includes a container 25, a first gas-liquid contact part 26, a second gas-liquid contact part 27, and a first liquid sprinkling means 28.
  • the first gas-liquid contact part 26 and the second gas-liquid contact part 29 are used to seal the static fluid mixers 37 and 38 having spiral blades.
  • the first gas-liquid contact part 26 is arranged horizontally and the second gas-liquid contact part 27 is arranged vertically in the longitudinal direction.
  • a gas introduction pipe 40 for supplying gas to the upstream side (exhaust gas source inlet side) of the first gas-liquid contact portion 26 disposed on the side surface of the container 25 via the blower 39 of the gas supply means 31.
  • the liquid in the liquid reservoir 35 provided at the lower part of the container 2 is supplied to the liquid supply pipe 42 via the circulation pump 41 of the liquid supply means 33, and the stationary fluid mixer 37 is horizontally supplied from the watering nozzle 43. Spray upstream.
  • the gas and the liquid are mixed and contacted by passing through the static fluid mixer 37 at a high speed (for example, 15 to 150 m / s) in a parallel flow, and the submicron particles are humidified and granulated.
  • a separation / falling section 44 for separating the increased liquid and gas is provided above the liquid storage section 35.
  • the liquid and gas that do not separate and fall flow at a low speed (for example, 0.5 to 15 m / s) from the lower end portion to the upper end portion of the static fluid mixer 38 disposed at the intermediate portion in the container 25.
  • the exhaust gas is discharged as clean gas outside the container 25 through the space 48 and the exhaust pipe 32.
  • the liquid in the liquid reservoir 35 is supplied to the liquid supply pipe 45 via the circulation pump 41 and sprayed from the water spray nozzles 46 and 47.
  • both the watering nozzle 46 and the watering nozzle 47 spray in the upward direction.
  • the gas and liquid are easily trapped in the liquid by the mixing and contact action of the cocurrent flow and the countercurrent, and the submicron particles that have increased in humidity and the particle size are easily trapped in the liquid, and Hcl, NOx, SOx, Hg in the gas. Such different substances are reacted and absorbed with high efficiency and exhausted into the atmosphere as clean gas.
  • the flow of the fluid in the static fluid mixer 38 uses both parallel flow and counter-current action, and the liquid falls from the lower part to the upper part and from the upper part to the lower part. Dust collection and gas absorption can be performed with high efficiency.
  • the liquid-gas ratio (l / m 3 ) between the liquid and gas is reduced, the amount of liquid supplied is reduced, the power consumption of the circulation pump is saved, and the operating cost is reduced.
  • the gas-liquid contact device is made of submicron dust such as SiO 2 in the exhaust gas.
  • Table 1 shows the measurement results when used for dust collection (dust removal) and physical absorption of Hcl gas.
  • the amount of processing exhaust gas supplied into the processing container 2 (m 3 / min), the gas inflow rate (m / s) of the first and second gas-liquid contact portions, and the amount of cleaning liquid provided to the apparatus ( m 3 / hr) was kept constant, and dust concentration (mg / Nm 3 ) and Hcl gas concentration (ppm) at the gas-liquid treatment device 1 inlet and the exhaust pipe 17 outlet of the gas-liquid contact device were measured.
  • the gas-liquid contact device used for the measurement was configured by arranging two mixing elements (not shown) in series in the vertical direction as the static fluid mixer 13 arranged in the first gas-liquid contact unit 3.
  • Each mixing element (not shown) has a cylindrical body with an inner diameter of 100 mm and a cylindrical body with a height of 100 mm, and the blades are each twisted about 90 ° clockwise or counterclockwise. Those composed of 6 blades were used.
  • the blade body is formed of a perforated plate, and a hole (not shown) having a diameter of 20 mm and having a total opening area of the hole portion of about 40% with respect to the surface area of the blade body is used.
  • the amount of the cleaning liquid supplied from the liquid supply means 7 into the watering nozzle 22 was set to about 0.005% by volume with respect to the amount of treated exhaust gas introduced from the gas introduction pipe of the container 2.
  • mixing elements are arranged in series as the static fluid mixer 14 arranged in the second gas-liquid contact portion 4.
  • Each mixing element (not shown) has a cylindrical inner diameter of 200 mm, a cylindrical body height of 150 mm, and the blades are each spirally twisted about 90 ° clockwise or counterclockwise. What was comprised of the blade body of was used.
  • the blade body was formed of a perforated plate, and the diameter of the hole was 10 mm, and the total opening area of the hole portion was about 20% with respect to the surface area of the blade body.
  • the amount of the cleaning liquid supplied from the liquid supply means 7 into the watering nozzle 23 was set to about 0.01% by volume with respect to the amount of treatment exhaust gas introduced from the gas introduction pipe.
  • a mixing element disclosed in Japanese Patent Application No. 6-115817 and Japanese Patent Application No. 2005-51786 filed by the present inventor is appropriately selected and used.
  • the ratio of the amount of the cleaning liquid supplied from the upper watering nozzle 22 and the lower watering nozzle 23 and the spraying direction are appropriately selected and used depending on the gas composition, concentration, kind of dust, concentration, particle diameter, etc. in the treated exhaust gas.
  • the gas-liquid contact device 24 used for the measurement was configured by arranging two mixing elements (not shown) in series in the horizontal direction as a static fluid mixer 37 disposed in the first gas-liquid contact portion 26.
  • Each mixing element (not shown) has a cylindrical body with an inner diameter of 100 mm and a cylindrical body with a height of 100 mm, and the blades are each twisted about 90 ° clockwise or counterclockwise. The one composed of 6 blades was used. Further, the blade body is formed of a perforated plate, and a hole (not shown) having a diameter of 20 mm and having a total opening area of the hole portion of about 40% with respect to the surface area of the blade body is used. . Further, the amount of the cleaning liquid supplied from the liquid supply means 33 into the watering nozzle 43 was set to about 0.005% by volume with respect to the amount of treatment exhaust gas introduced from the gas 40 in the container 25.
  • each mixing element (not shown) has a cylindrical inner diameter of 200 mm, a cylindrical body height of 150 mm, and the blades are each spirally twisted about 90 ° clockwise or counterclockwise. What was comprised of the blade body of was used.
  • the blade body was formed of a perforated plate, and the diameter of the hole was 10 mm, and the total opening area of the hole portion was about 20% with respect to the surface area of the blade body.
  • the amount of the cleaning liquid supplied from the liquid supply means 33 into the watering nozzles 46 and 47 was set to about 0.01% by volume with respect to the amount of treated exhaust gas introduced from the gas introduction pipe 40.
  • the ratio of the amount of cleaning liquid supplied from the watering nozzle 43, the upper watering nozzle 47, and the lower watering nozzle 47 and the spraying direction are appropriately selected and used depending on the gas composition, concentration, type of dust, concentration, particle diameter, etc. in the treated exhaust gas. Is done.
  • Table 2 shows a comparison of operating conditions between the gas-liquid contact device of the prior art and the device of the present invention.
  • the gas-liquid contact device of the present invention is superior in both dust collection efficiency and gas absorption efficiency in any operating conditions as compared with the conventional packed tower and venturi scrubber. There was found.
  • the gas-liquid contact device according to the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the configuration of the present invention in other materials and configurations. Needless to say.
  • the static fluid mixer is not limited to the mixing element, and various types of static fluid mixers can be appropriately selected and used.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

L'invention a pour objet d'augmenter l'efficacité avec laquelle un gaz et un liquide sont mis en contact et produisent de cette manière de fines gouttelettes de liquide, de réduire la quantité d'énergie, d'espace et de maintenance requis et de permettre la collecte de particules de taille submicronique à partir du gaz tout en absorbant le gaz. L'invention a également pour objet un procédé de mise en contact gaz-liquide hautement efficace et un dispositif de mise en contact gaz-liquide dont l'échelle peut être facilement augmentée. L'invention porte sur un procédé de mise en contact gaz-liquide et sur un dispositif de mise en contact gaz-liquide par lesquels un gaz et un liquide sont mis en contact et mélangés. Dans le dispositif (1) de mise en contact gaz-liquide, une première section (3) de mise en contact gaz-liquide renfermant des pales hélicoïdales est disposée sur le côté amont d'un récipient cylindrique (2), une seconde section (4) de mise en contact gaz-liquide renfermant des pales hélicoïdales est disposée sur le côté aval de la première section (3) de mise en contact gaz-liquide et des buses de pulvérisation (22, 23) sont disposées au-dessus des première et seconde sections (3, 4) de mise en contact gaz-liquide. Dans le procédé de mise en contact gaz-liquide, un gaz qui contient une matière dissemblable et qui a une pression élevée ou réduite est introduit à partir de la partie amont du récipient (2), un liquide est introduit et pulvérisé à partir des buses de pulvérisation (22, 23) et le gaz et le liquide sont amenés à traverser la première section (3) de mise en contact gaz-liquide et la seconde section (4) de mise en contact gaz-liquide du dessus (du côté amont) vers le fond (le côté aval) de manière que le gaz ait une vitesse de 20-150 m/s dans la première section (3) de mise en contact gaz-liquide et une vitesse de 0,5-20 m/s dans la seconde section (4) de mise en contact gaz-liquide.
PCT/JP2011/069364 2010-08-20 2011-08-22 Procédé de mise en contact gaz-liquide et appareil de mise en contact gaz-liquide WO2012023634A1 (fr)

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JP2012529643A JP5938346B2 (ja) 2010-08-20 2011-08-22 気液接触方法および気液接触装置

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JP2010-200319 2010-08-20

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016087539A (ja) * 2014-11-04 2016-05-23 関西電力株式会社 排ガス脱硫および煤塵除去方法
CN109745847A (zh) * 2017-11-08 2019-05-14 株式会社日本环境解决 气液接触装置
CN110354628A (zh) * 2019-06-14 2019-10-22 盐城荣平建设工程有限公司 一种建筑装配的保温板生产加工用气味处理辅助设备
CN110947343A (zh) * 2019-12-25 2020-04-03 中冶焦耐(大连)工程技术有限公司 一种集反应与分离功能于一体的卧式反应分离器

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