WO2011148782A1 - Substrate processing apparatus and temporary storage shelf - Google Patents

Substrate processing apparatus and temporary storage shelf Download PDF

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Publication number
WO2011148782A1
WO2011148782A1 PCT/JP2011/060747 JP2011060747W WO2011148782A1 WO 2011148782 A1 WO2011148782 A1 WO 2011148782A1 JP 2011060747 W JP2011060747 W JP 2011060747W WO 2011148782 A1 WO2011148782 A1 WO 2011148782A1
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WO
WIPO (PCT)
Prior art keywords
transfer robot
arm
substrate
substrate processing
temporary storage
Prior art date
Application number
PCT/JP2011/060747
Other languages
French (fr)
Japanese (ja)
Inventor
祥一 田代
Original Assignee
シャープ株式会社
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Publication date
Priority to JP2010-121387 priority Critical
Priority to JP2010121387 priority
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Publication of WO2011148782A1 publication Critical patent/WO2011148782A1/en

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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/068Stacking or destacking devices; Means for preventing damage to stacked sheets, e.g. spaces
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769Storage means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02Controlled or contamination-free environments or clean space conditions

Abstract

Disclosed is a substrate processing apparatus wherein, even if one transfer robot is stopped, deterioration of productivity is suppressed by having the other transfer robot operate. The substrate processing apparatus (200) that processes a substrate (10) is provided with a substrate carry-in chamber (61), a first transfer robot area (63), a first substrate processing chamber (51), a storage shelf area (64), a second transfer robot area (65), and a second substrate processing chamber (52). In a temporary storage shelf (100) disposed in the temporary storage shelf area (64), an arm intrusion cover (30) that covers an opening (21B) on the second transfer robot area (65) side is disposed, and furthermore, the temporary storage shelf (100) is provided with a stop switch (40) that stops driving of the second transfer robot (70B) in a state wherein the opening (21B) is covered with the arm intrusion cover (30).

Description

Substrate processing apparatus and temporary storage shelf

The present invention relates to a substrate processing apparatus for processing a substrate. In particular, the present invention relates to a substrate processing apparatus for processing a thin substrate (for example, a glass substrate) used in a method for manufacturing a flat panel display (for example, a liquid crystal panel). The present invention also relates to a temporary storage shelf on which a substrate can be temporarily placed by a first transfer robot and a second transfer robot.
Note that this application claims priority based on Japanese Patent Application No. 2010-121387 filed on May 27, 2010, the entire contents of which are incorporated herein by reference. .

A liquid crystal panel, which is a component of a liquid crystal display device (LCD), has a structure in which a pair of glass substrates are opposed to each other with a predetermined gap secured. With the increase in size and mass production of liquid crystal panels, the glass substrates (mother glass) for liquid crystal panels have been increasing year by year, and the liquid crystal panel production line is used to transport such large glass substrates. A substrate transfer device is provided in the factory.

In recent years, a processing apparatus that processes a glass substrate for a liquid crystal panel often performs various processes by introducing the mother glass transported by the substrate transport apparatus into the processing apparatus from the viewpoint of efficiency. Mother glass for liquid crystal panels continues to increase in size from the viewpoint of mass productivity and cost. In the case of the 10th generation mother glass, the size is 2880 mm (W) × 3130 mm (L). .

Therefore, for example, when performing a CVD process on a substrate, there is a difference in a CVD apparatus that performs a CVD process on a mother glass for a liquid crystal panel as compared with a CVD apparatus that performs a CVD process on a semiconductor wafer (for example, 300 mm in diameter) ( For example, Patent Documents 1 and 2). Specifically, the configuration of a device for transporting a substrate (a transport robot) differs between a technology for transporting and processing a small semiconductor wafer compared to the mother glass and a technology for transporting and processing a mother glass. .

JP-A-6-69140 JP 2000-228431 A

FIG. 1 shows a CVD apparatus 1000 examined by the present inventors. A CVD apparatus 1000 shown in FIG. 1 is an apparatus that performs a CVD process on a mother glass for a liquid crystal panel. The CVD apparatus 1000 is provided with a first substrate processing chamber 101 and a second substrate processing chamber 102 that perform CVD processing. At the entrance of the CVD apparatus 1000 is a substrate carry-in chamber 103 into which a substrate (mother glass) is carried. The substrate in the substrate carry-in chamber 103 is moved by an arm (arm 1) of the transfer robot 105 arranged in the transfer robot area 104. Introduced into the first substrate processing chamber 101.

Also, the substrate can be temporarily placed on the temporary shelf 110 arranged in the temporary shelf area 106 by the arm 1 of the transfer robot 105. FIG. 2 shows the temporary storage rack 110 viewed from the transport robot 105 or 108 side. The temporary storage shelf 110 shown in FIG. 2 includes a shelf main body 120 in which the temporarily placed substrate 130 is stored, and an opening 117 provided on the side of the shelf main body 120 on the transfer robot 105 or 108 side. ing. The robot arm 115 (that is, arm 1 or arm 2) of the transfer robot 105 or 108 is inserted from the opening 117, and the substrate 130 can be taken in and out by the robot arm 115. In the shelf main body 120, members (pins, shelf pieces, etc.) that support the substrate 130 are not shown.

Refer to FIG. 1 again. The substrate (130) temporarily placed on the temporary shelf 110 is introduced into the second substrate processing 102 by the arm (arm 2) of the transfer robot 108 arranged in the transfer robot area 107. Note that the substrate can be moved in the reverse direction through the same procedure, and the processed substrate can be sent out to the substrate carry-in chamber 103.

As described above, the CVD apparatus 1000 includes the two substrate processing chambers (CVD processing chambers) 101 and 102, and the transfer robots 105 and 108 move the substrates in and out of the substrate processing chambers (101 and 102). It is carried out. That is, in this configuration, the loader (transfer robot area) positioned in front of the substrate processing chambers (CVD process chambers) 101 and 102 has an area (104, 106, 107). In addition, since the operation signals of the transfer robots 105 and 108 are common in the CVD apparatus 1000, when one transfer robot on one side is stopped, the other transfer robot on the other side also stops. Therefore, for example, during maintenance of the transfer robot 108, not only the transfer robot 108 but also the transfer robot 105 is stopped, resulting in a production operation loss.

On the other hand, since the transfer robot 105 and the transfer robot 108 are only in contact with each other via the temporary storage rack 110, when the transfer robot 108 on one side is stopped, the transfer robot 105 on the other side is forcibly forcibly stopped. It is possible to secure safety by adopting a structure in which the motor is stopped. That is, during the maintenance of the transfer robot 108, if the transfer robot 105 is operated to perform an operation, if the transfer robot 108 is operated and the arm 2 enters the temporary storage rack 110, the arms 1 and 2 are There is a possibility of contact with the temporary storage rack 110. That is, in order to ensure the safety of the operation of the transfer robot, it is required to use a common stop signal for stopping both transfer robots. Therefore, during the maintenance of the transfer robot 108, a production operation loss occurs due to the stop of the transfer robot 105.

The present invention has been made in view of the above points, and a main object of the present invention is to provide a substrate processing apparatus capable of operating the other transfer robot while the other transfer robot is stopped to suppress a decrease in productivity. There is to do.

A substrate processing apparatus according to the present invention is an apparatus for processing a substrate, and is connected to a substrate carry-in chamber into which a substrate is carried in, a first transfer robot area connected to the substrate carry-in chamber, and the first transfer robot area. A first substrate processing chamber into which the substrate is introduced from the first transfer robot area; the second transfer robot area connected to the first transfer robot area via a temporary storage shelf area; And a second substrate processing chamber connected to the second transfer robot area and into which the substrate is introduced from the second transfer robot area. A first transfer robot having an arm for transferring the substrate to the first substrate processing chamber is disposed in the first transfer robot area, and in the second transfer robot area, the second substrate processing chamber is provided. A second transfer robot having an arm for transferring the substrate is disposed. In the temporary storage shelf area, a temporary storage shelf capable of temporarily placing the substrate by the arm of the first transfer robot and the arm of the second transfer robot is disposed. The temporary storage shelf includes the second storage shelf. An arm intrusion cover that closes the opening on the transfer robot area side and prevents the arm of the second transfer robot from entering is disposed. Moreover, the temporary storage shelf is provided with a stop switch for stopping the driving of the second transfer robot in a state where the opening is closed by the arm entry cover.
In a preferred embodiment, a hook for supporting the arm entry cover is provided on an upper portion of the temporary storage shelf.
In a preferred embodiment, a cover storage portion for storing the arm intrusion cover is disposed at an upper portion of the temporary storage shelf, and the arm intrusion cover is pulled out from the cover storage portion to open the opening. It is characterized by blocking.
The arm intrusion cover has a structure that can be inserted and removed from the cover storage portion by electric power.
In a preferred embodiment, the substrate is a mother glass for a liquid crystal panel, and one of a CVD process and a dry etching process is performed in the first substrate processing chamber and the second substrate processing chamber.
The temporary storage shelf according to the present invention is a temporary storage shelf in which a substrate can be temporarily placed by a first transfer robot and a second transfer robot provided in a clean room, and a shelf main body for storing the substrate, and the shelf main body A first opening into which the arm of the first transfer robot is inserted, and a second opening that is provided in the shelf main body and into which the arm of the second transfer robot is inserted, An arm intrusion cover for preventing the arm of the second transport robot from entering the 2 opening is disposed, and the temporary storage shelf has the second opening in a state where the second opening is closed by the arm intrusion cover. A stop switch for stopping the driving of the second transfer robot is provided.

According to the present invention, in the substrate processing apparatus including the first substrate processing chamber and the second substrate processing chamber, the temporary storage shelf capable of temporarily placing the substrate in the temporary storage shelf area is disposed, 2 An arm intrusion cover for preventing the arm of the transfer robot from entering is disposed. In addition, a stop switch is provided for stopping the driving of the second transfer robot in a state where the opening is closed by the arm intrusion cover. Therefore, the arm intrusion cover can prevent the arm of the second transfer robot from entering, and the driving of the second transfer robot can be stopped by turning on the stop switch with the arm intrusion cover. As a result, even when the second transfer robot is stopped (for example, during maintenance), the first transfer robot can be operated, and a reduction in productivity can be suppressed.

It is a figure which shows the structure of CVD apparatus 1000. FIG. It is a figure which shows the structure of the temporary storage shelf. It is a figure which shows the structure of the substrate processing apparatus 200 which concerns on embodiment of this invention. It is sectional drawing (side view) of the temporary storage shelf 100 which concerns on embodiment of this invention. It is a front view of temporary storage shelf 100 concerning an embodiment of the present invention. It is a figure which shows the substrate processing apparatus 210 which concerns on embodiment of this invention. It is sectional drawing (side view) which shows the modification of the temporary storage shelf. It is a front view which shows the example of a change of the temporary storage shelf.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, components having substantially the same function are denoted by the same reference numerals for the sake of brevity. In addition, this invention is not limited to the following embodiment.

FIG. 3 is a diagram (top view) schematically showing the configuration of the substrate processing apparatus 200 according to the embodiment of the present invention. 4 and 5 are a cross-sectional view (side view) and a front view, respectively, schematically showing the configuration of the temporary storage shelf 100 arranged in the substrate processing apparatus 200 of the present embodiment.

The substrate processing apparatus 200 of the present embodiment is an apparatus that processes the substrate 10, for example, a CVD apparatus that performs a CVD (Chemical Vapor Deposition) process. The substrate processing apparatus 200 of this embodiment includes a substrate carry-in chamber 61 into which the substrate 10 is carried in, a first transfer robot area 63, a first substrate processing chamber 51, a temporary storage shelf area 64, and a second transfer robot area. 65 and the second substrate processing chamber 52. In the first substrate processing chamber 51 and the second substrate processing chamber 52 of the present embodiment, a CVD process can be performed on the substrate 10.

The substrate 10 of the present embodiment is, for example, a glass substrate, and the substrate 10 of the present embodiment is a glass substrate for a liquid crystal panel. In the illustrated example, the substrate 10 is a mother glass before being cut out to the dimensions of the liquid crystal panel. The size of the mother glass as the substrate 10 is 1 meter or more on one side. Specifically, when the substrate 10 is a 10th generation mother glass, the size is 2880 mm (W) × 3130 mm (L).

The substrate 10 is not limited to the mother glass before being cut out to the dimensions of the liquid crystal panel, but may be glass having the size of the liquid crystal panel after being cut out. Further, the substrate 10 may be an array substrate on which a thin film transistor (TFT) is manufactured (or a product in the middle of manufacturing), or a CF substrate on which a color filter (CF) is formed (or a device in the middle of manufacturing thereof). It may be. When the substrate 10 is an array substrate or a CF substrate (including those in the middle of production), a thin film (such as various patterns) is formed on the surface of the substrate 10. In addition, the substrate 10 is not limited to a liquid crystal panel, but may be used for other purposes (for example, a PDP or other flat panel display).

The first transfer robot area 63 is connected to the substrate loading chamber 61. The first substrate processing chamber 51 is connected to the first transfer robot area 63, and the substrate 10 is introduced from the first transfer robot area 63. The second transfer robot area 65 is connected to the first transfer robot area 63 via the temporary storage shelf area 64. The second substrate processing chamber 52 is connected to the second transfer robot area 65, and the substrate 10 is introduced from the second transfer robot area 65.

In the substrate carry-in chamber 61, a substrate transfer device (for example, a roller conveyor, an air levitation conveyor) 62 is disposed. In the first transfer robot area 63, a first transfer robot 70A having an arm 72 for transferring the substrate 10 to the first substrate processing chamber 51 is disposed. In the second transfer robot area 65, a second transfer robot 70B having an arm 72 for transferring the substrate 10 to the second substrate processing chamber 52 is disposed. Here, the loader located in front of the first and second substrate processing chambers (CVD processing chambers) 51 and 52 is placed in an area (63, 64, 65) having the transfer robots 70A and 70B via the temporary storage shelf 100. Become. The first transfer robot 70A and the second transfer robot 70B basically use the same transfer robot 70, but different transfer robots may be used depending on circumstances.

Also, the temporary storage shelf 100 is arranged in the temporary storage shelf area 64. The temporary shelf 100 is a shelf in which the substrate 10 can be temporarily placed by the arm 72 of the first transfer robot 70A and the arm 72 of the second transfer robot 70B. As shown in FIG. 4, the temporary storage shelf 100 includes a shelf body 20 that stores the substrate 10, and a first opening 21 </ b> A and a second opening 21 </ b> B provided in the shelf body 20. The shelf body 20 of the present embodiment can store the substrates 10 in multiple stages. Here, support members (pins, shelf pieces, etc.) for supporting the substrate 10 are not shown.

The first opening 21A faces the first transfer robot 70A, and the arm 72 of the first transfer robot 70A can be inserted from the first opening 21A. On the other hand, the second opening 21B faces the second transfer robot 70B, and when the arm entry cover 30 is not provided, the arm 72 of the second transfer robot 70B is inserted from the second opening 21B. Can do. The substrate 10 temporarily placed on the temporary shelf 100 can be introduced into the second substrate processing 52 by the arm 72 of the second transfer robot 70B. Note that it is possible to move the substrate in the reverse direction through the same procedure, and the processed substrate 10 can be sent out to the substrate carry-in chamber 61.

In the temporary storage shelf 100 of the present embodiment, the arm intrusion cover 30 that prevents the arm 72 of the second transfer robot 70B from entering can be disposed in the second opening 21B. Further, the shelf body 20 is provided with a stop switch 40 for stopping the driving of the second transfer robot 70B in a state where the second opening 21B is closed by the arm intrusion cover 30.

A hook 22 that supports the arm intrusion cover 30 is provided on the upper part of the temporary storage shelf 100 of the present embodiment. In the example shown in FIG. 4, the hook support member 24 is formed on the upper plate of the shelf body 20, and the hook 22 is attached to the hook support member 24. The arm intrusion cover 30 is provided with an engaging portion 32 that hooks onto the hook 22. By hooking the engaging portion 32 of the arm intrusion cover 30 on the hook 22, the second opening 21 </ b> B can be closed by the arm intrusion cover 30.

Further, in the illustrated example, a stop switch 40 for stopping the driving of the second transfer robot 70B is provided on the shelf 25 that is a base of the shelf body 20. The shelf 25 is disposed on the ground (for example, the floor of the panel production line) 90, and the stop switch 40 is provided on the side where the arm entry cover 30 is disposed. In the illustrated example, a plurality (two) of stop switches 40 are provided, but one stop switch 40 may be provided. Further, a switch contact member (contact plate) 36 that is brought into contact with the stop switch 40 is attached to the arm intrusion cover 30. Further, a fastening member (screw, pin, etc.) 38 can be attached to the switch contact member 36, whereby the lower part of the arm intrusion cover 30 is covered with the second opening 21 </ b> B closed by the arm intrusion cover 30. Can be fixed. In addition, in order to fix the lower part of the arm intrusion cover 30, not only the fastening member (screw, pin, etc.) 38 but other fixing members (for example, magnetic force adsorbing member, etc.) can be used.

A wiring 42 is connected to the stop switch 40 of the present embodiment, and when the stop switch 40 is turned on, a signal (robot driving stop signal) for stopping the driving of the second transfer robot 70B is issued. The stop signal is output through the wiring 42 to a control device (not shown) that controls the driving of the second transfer robot 70B. Instead of the wiring 42 of the stop switch 40, a signal may be emitted from the stop switch 40 using radio or infrared rays without using the wiring 42.

FIG. 5 shows the temporary shelf 100 in a state where the arm opening cover 30 covers the second opening 21B. In other words, it is a front view of the temporary storage shelf 100 as viewed from the second transfer robot 70B. Here, when the arm intrusion cover 30 closes the second opening 21B, the stop switch 40 issues a signal for stopping the driving of the second transfer robot 70B, and the arm intrusion cover 30 causes the second transfer robot 70B to stop driving. Intrusion of the arm 72 is prevented.

In the configuration of this embodiment, in the substrate processing apparatus 200 including the first substrate processing chamber 51 and the second substrate processing chamber 52, the first transfer robot area 63 is the second transfer robot area via the temporary storage shelf area 64. 65 is connected. In the temporary storage shelf area 64, a temporary storage shelf 100 on which the substrate 10 can be temporarily placed by the arm 72 of the first transfer robot 70A and the arm 72 of the second transfer robot 70B is disposed. The temporary storage rack 100 is provided with an arm intrusion cover 30 that prevents the arm 72 of the second transfer robot 70B from entering, and the second transfer robot 70B is in a state where the opening 21B is closed by the arm intrusion cover 30. A stop switch 40 is provided to stop the driving.

Therefore, the arm intrusion cover 30 can prevent the arm 72 of the second transfer robot 70B from entering, and the stop switch 40 is turned on by the arm intrusion cover 30 to stop the driving of the second transfer robot 70B. be able to. As a result, the operation / stop signals of the first transfer robot 70A and the second transfer robot 70B are shared, and both transfer robots (70A, 70B) need not be stopped. Specifically, even when the second transfer robot 70B is stopped (for example, during maintenance), the first transfer robot 70A can be operated, and a reduction in productivity can be suppressed. In particular, the opening 21B can be closed with the arm intrusion cover 30 and the stop switch 40 can be turned on, so that the safety of the operation of the transfer robot can be ensured.

More specifically, the operation / stop signal of the first transfer robot 70A and the second transfer robot 70B is made independent (not common), and the operation of the second transfer robot 70B is stopped only by turning on the stop switch 40. In such a case, there is a concern that the second transport robot 70B malfunctions due to an erroneous pressing of the stop switch 40. On the other hand, in the configuration of the present embodiment, the stop switch 40 can be reliably turned on when the opening 21B is closed with the arm intrusion cover 30, so that the second transfer robot 70B is stopped (for example, during maintenance). If the arm intrusion cover 30 completely blocks the opening 21B, the operation of the second transfer robot 70B can be surely stopped. As a result, the second transfer robot 70B may malfunction. Can be avoided. That is, by ensuring the safety in this way, the operation of the first transfer robot 70A can be executed, and as a result, a reduction in productivity can be suppressed.

Further, the inside of the substrate processing apparatus 200 of the present embodiment is a clean room, and the substrate 10 is transported and moved in the clean room. In the example described above, the first substrate processing chamber 51 and the second substrate processing chamber 52 are CVD processing chambers that perform CVD processing on the substrate 10, but may be processing chambers that perform other processing. For example, it may be a dry etching processing chamber for performing a dry etching process on the substrate 10.

Furthermore, the substrate processing apparatus 200 of the present embodiment can be modified as follows. FIG. 6 shows a substrate processing apparatus 210 (modified example) of this embodiment. Compared with the configuration example shown in FIG. 3, the substrate processing apparatus 210 shown in FIG. 6 further includes a third transfer robot area 67 in which the third transfer robot 70C is arranged, and a third substrate processing chamber 53. Is provided. In addition, the temporary storage rack 100A of the present embodiment is provided between the first transfer robot 70A and the second transfer robot 70B, and also between the second transfer robot 70B and the third transfer robot 70C. The temporary storage shelf 100B of the present embodiment is provided.

Therefore, in the case of the substrate processing apparatus 210 shown in FIG. 6, when the first, second, and third transfer robots 70A, 70B, and 70C are first operated, the first, second, and third substrate processing chambers are operated. The processing can be executed at 51, 52, 53. Here, when the third transfer robot 70C is stopped by, for example, maintenance, the arm intrusion cover 30 can be set on the temporary storage shelf 100B to stop the operation of the third transfer robot 70C. At that time, since the first transfer robot 70A and the second transfer robot 70B can be operated, a decrease in productivity can be suppressed.

In addition, when the second transfer robot 70B is stopped by maintenance, for example, as described above, the arm intrusion cover 30 can be set on the temporary storage shelf 100A to stop the operation of the second transfer robot 70B. At that time, the first transfer robot 70A can be operated, so that a reduction in productivity can be suppressed.

Furthermore, the temporary storage shelf 100 of the present embodiment can be modified as follows. FIG. 7 is a cross-sectional view (side view) showing a modified example of the temporary storage shelf 100 of the present embodiment. In the temporary shelf 100 shown in FIG. 4, the engaging portion 32 of the arm intrusion cover 30 is attached to the hook 22 and the opening portion 21 </ b> B is closed with the arm intrusion cover 30. You can also. In the modified example shown in FIG. 7, a cover storage unit 26 for storing the arm entry cover 31 is disposed on the temporary storage shelf 100.

In this example, the arm intrusion cover 31 is wound and stored in a roll shape in the cover storage unit 26. The arm intrusion cover 31 can be pulled out from the cover storage portion 26 to close the opening 21 </ b> B as indicated by an arrow 81. The arm entry cover 31 has a so-called shutter structure. Further, when the arm intrusion cover 31 closes the opening 21B, the distal end portion 33 of the arm intrusion cover 31 can come into contact with the stop switch 44 to turn on the stop switch 44. When the stop switch 44 is turned on, a stop signal for stopping the operation of the second transfer robot 70B is issued.

Further, in the case of the temporary storage shelf 100 shown in FIG. 4, it is convenient for an operator to manually execute the engagement portion 32 of the arm entry cover 30 on the hook 22. Further, in the case of the temporary storage shelf 100 shown in FIG. 7, it is possible to adopt a structure in which the tip 33 of the arm entry cover 31 is moved downward by electric drive. If the arm intrusion cover 31 is configured to be electrically movable downward, it is convenient that the operation of setting the arm intrusion cover 31 can be executed without an operator entering the temporary storage shelf area 64. Even in the case of the temporary storage shelf 100 shown in FIG. 7, the operator may manually lower the tip 33 of the arm entry cover 31.

Further, the temporary storage shelf 100 of the present embodiment can be modified as shown in FIG. FIG. 8 is a cross-sectional view (front view) showing a modified example of the temporary storage shelf 100 of the present embodiment. In the temporary storage rack 100 shown in FIG. 8, the opening 21 </ b> B can be closed by moving the arm entry cover 35 in the parallel direction 82. The arm entry cover 35 has a so-called curtain structure. When the arm entry cover 35 does not block the opening 21B, the arm entry cover 35 is folded and brought together at one end. When the arm intrusion cover 35 closes the opening 21B, a part 37 of the arm intrusion cover 35 can come into contact with the stop switch 46 to turn on the stop switch 46. When the stop switch 46 is turned on, a stop signal for stopping the operation of the second transfer robot 70B is issued.

The temporary storage rack 100 shown in FIG. 8 can also be configured to move the arm intrusion cover 35 in the horizontal direction (left-right direction) 82 electrically. Even in the case of the temporary storage shelf 100 shown in FIG. 8, the operator may manually move the arm entry cover 35 in the horizontal direction 82.

As mentioned above, although this invention has been demonstrated by suitable embodiment, such description is not a limitation matter and, of course, various modifications are possible.

According to the present invention, it is possible to provide a substrate processing apparatus capable of suppressing a decrease in productivity by operating the other transfer robot even when one transfer robot is stopped.

DESCRIPTION OF SYMBOLS 10 Board | substrate 20 Shelf body part 21A, 21B Opening part 22 Hook 24 Hook support member 25 Shelf 26 Cover storage part 30 Arm intrusion cover 31 Arm intrusion cover 32 Engagement part 33 Tip part 35 Arm intrusion cover 36 Switch contact member 40 Stop switch 42 Wiring 44 Stop switch 46 Stop switch 51 First substrate processing chamber 52 Second substrate processing chamber 53 Third substrate processing chamber 61 Substrate loading chamber 63 First transfer robot area 64 Temporary storage shelf area 65 Second transfer robot area 67 Third Transfer robot area 70A First transfer robot 70B Second transfer robot 70C Third transfer robot 72 Arm (robot arm)
100 Temporary storage shelf 200 Substrate processing apparatus (CVD apparatus)
210 Substrate processing equipment (CVD equipment)
1000 Substrate processing equipment (CVD equipment)

Claims (6)

  1. A substrate processing apparatus for processing a substrate,
    A substrate loading chamber in which substrates are loaded;
    A first transfer robot area connected to the substrate loading chamber;
    A first substrate processing chamber connected to the first transfer robot area and into which the substrate is introduced from the first transfer robot area;
    The second transfer robot area connected to the first transfer robot area via a temporary storage shelf area;
    A second substrate processing chamber connected to the second transfer robot area and into which the substrate is introduced from the second transfer robot area;
    A first transfer robot having an arm for transferring the substrate to the first substrate processing chamber is disposed in the first transfer robot area.
    A second transfer robot having an arm for transferring the substrate to the second substrate processing chamber is disposed in the second transfer robot area,
    In the temporary storage shelf area, a temporary storage shelf capable of temporarily placing the substrate by the arm of the first transfer robot and the arm of the second transfer robot is disposed,
    The temporary storage shelf is provided with an arm entry cover that closes the opening on the second transfer robot area side and prevents the arm of the second transfer robot from entering, and the temporary storage shelf includes the arm A substrate processing apparatus, comprising: a stop switch that stops driving of the second transfer robot in a state where the opening is closed by an intrusion cover.
  2. The substrate processing apparatus according to claim 1, wherein a hook for supporting the arm entry cover is provided on an upper portion of the temporary storage shelf.
  3. On the upper part of the temporary storage shelf, a cover storage portion for storing the arm entry cover is disposed,
    The substrate processing apparatus according to claim 1, wherein the arm intrusion cover is pulled out from the cover storage portion and closes the opening.
  4. 4. The substrate processing apparatus according to claim 3, wherein the arm intrusion cover has a structure that can be inserted and removed from the cover storage portion by electric power.
  5. The substrate is a mother glass for a liquid crystal panel,
    5. The substrate processing apparatus according to claim 1, wherein one of a CVD process and a dry etching process is performed in the first substrate processing chamber and the second substrate processing chamber.
  6. A temporary storage shelf in which a substrate can be temporarily placed by a first transfer robot and a second transfer robot provided in a clean room,
    A shelf body for storing the substrate;
    A first opening provided in the shelf body and into which an arm of the first transfer robot is inserted;
    A second opening provided in the shelf main body and into which an arm of the second transfer robot is inserted;
    An arm intrusion cover for preventing the arm of the second transfer robot from entering is disposed in the second opening, and
    The temporary storage shelf is provided with a stop switch for stopping the driving of the second transfer robot in a state where the second opening is closed by the arm intrusion cover.
PCT/JP2011/060747 2010-05-27 2011-05-10 Substrate processing apparatus and temporary storage shelf WO2011148782A1 (en)

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JP2010121387 2010-05-27

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997034742A1 (en) * 1996-03-18 1997-09-25 Komatsu Ltd. Control device for a work carrying system
JP2007511104A (en) * 2003-11-10 2007-04-26 ブルーシフト テクノロジーズ インコーポレイテッド Method and system for processing a product being processed in a semiconductor processing system under vacuum

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997034742A1 (en) * 1996-03-18 1997-09-25 Komatsu Ltd. Control device for a work carrying system
JP2007511104A (en) * 2003-11-10 2007-04-26 ブルーシフト テクノロジーズ インコーポレイテッド Method and system for processing a product being processed in a semiconductor processing system under vacuum

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