WO2011116496A1 - Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé - Google Patents

Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé Download PDF

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Publication number
WO2011116496A1
WO2011116496A1 PCT/CN2010/000365 CN2010000365W WO2011116496A1 WO 2011116496 A1 WO2011116496 A1 WO 2011116496A1 CN 2010000365 W CN2010000365 W CN 2010000365W WO 2011116496 A1 WO2011116496 A1 WO 2011116496A1
Authority
WO
WIPO (PCT)
Prior art keywords
soft magnetic
inductively coupled
annular gap
magnetic shell
shell
Prior art date
Application number
PCT/CN2010/000365
Other languages
English (en)
Chinese (zh)
Inventor
付志强
王成彪
岳�文
张伟
彭志坚
于翔
Original Assignee
中国地质大学（北京）
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 中国地质大学（北京） filed Critical 中国地质大学（北京）
Priority to PCT/CN2010/000365 priority Critical patent/WO2011116496A1/fr
Publication of WO2011116496A1 publication Critical patent/WO2011116496A1/fr

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Definitions

  • the invention relates to a soft magnetic shell strong electromagnetic field enhanced inductively coupled plasma generating device, in particular to a novel inductively coupled plasma generating device for generating high density plasma by using a radio frequency glow discharge under a strong electromagnetic field, which can be used for material surface modification. , functional thin film deposition and plasma etching.
  • Physical vapor deposition is a widely used method for preparing thin film materials having special mechanical properties and physicochemical properties.
  • introduction of a high-density or the like, and an increase in the ionization rate of the working gas and the reaction gas are effective methods for obtaining a film material excellent in performance, which requires a high-density plasma generating apparatus.
  • the device in which the high density plasma generating device is its core component.
  • high-density plasma generating devices include an electron cyclotron resonance source, a spiral wave source, and an inductively coupled plasma (ICP) source, wherein the ICP source is easily amplified to industrial production, and the plasma density is substantially constant during the amplification process, which is very suitable.
  • ICP inductively coupled plasma
  • the plasma density of the non-magnetically constrained ICP source needs to be further improved, and the working pressure is higher.
  • a variety of magnetically constrained ICP sources have been developed.
  • a Helmholtz-type axial electromagnet is placed outside the induction coil. When the direct current passes through the electromagnet coil, the generated magnetic field confines the plasma and enhances the plasma ionization gas and the ability to sputter atoms, which can control the incident during film deposition. The ratio of ions to neutral atoms on the surface of the film growth.
  • Patent ZL02115200. 4 proposes a magnetic confinement technique for placing a short-excited helical coil on the outside of the RF induction coil. The magnetic field generated by the excitation short spiral coil can confine the plasma and increase the plasma density. And increase the uniform hook area of the plasma.
  • the magnetic confinement system of the ICP source always has a part of the magnetic flux outside the excitation coil, and the magnetic induction intensity in the plasma region is low, and the restraining effect on the charged particles is weak.
  • the electromagnetic induction coil is housed in a soft magnetic shell made of a soft magnetic material with an inner annular gap
  • the soft magnetic shell with the inner annular gap can concentrate the magnetic lines of force generated by the excitation of the excitation coil generating the constrained magnetic field on the soft magnetic Near the annular gap in the shell, the magnetic induction near the inner annular gap will be significantly improved, which will greatly extend the trajectory of the charged particles, significantly increase the number of collisions between charged particles and gas molecules, and thus achieve high density at lower air pressure.
  • the plasma increasing the plasma density and improving the plasma distribution; however, there is currently no excitation system design using an inner ring soft magnetic shell to enhance the ICP source confined magnetic field.
  • the present invention proposes a soft magnetic shell strong electromagnetic field enhanced inductively coupled plasma generating device, which is characterized in that: the device is mainly composed of a radio frequency induction coil 4, with The soft magnetic shell 5 of the inner annular gap, the exciting copper coil 6 for generating the constraining magnetic field, the intake duct 1, the outer casing 2, the workpiece table 3, the vacuum obtaining system 7, the vacuum measuring system and the control system are composed.
  • the RF induction coil 4 is wound around the plasma generator casing 2, and is connected to the RF power source through a matching device.
  • the soft magnetic shell 5 with the inner annular gap is mounted on the outer side of the radio frequency induction coil 4, and the soft magnetic shell 5 has an annular gap inside, and the gap width W is 0. .
  • the soft magnetic shell 5 is made of one of iron-silicon alloy, pure iron, permalloy, iron-cobalt alloy.
  • the soft magnetic shell 5 with the inner annular gap is surrounded by an exciting copper coil 6 which generates a constraining magnetic field, and the number of exciting copper coil turns is 1-50, and the exciting copper is The coil is connected to a DC excitation power supply.
  • the soft magnetic shell 5 with the inner annular gap can concentrate the magnetic lines of force generated by the excitation of the excitation copper coil 6 in the vicinity of the annular gap in the soft magnetic shell 5, and the magnetic induction intensity near the annular gap will be significantly improved, which will greatly extend the electrification.
  • the trajectory significantly increases the number of collisions between charged particles and gas molecules, thereby obtaining a high-density plasma, increasing plasma density, and improving plasma distribution at a lower gas pressure.
  • the outer casing 2 of the plasma generator is made of a non-magnetic material.
  • the drawing is a schematic structural view of a composite vacuum deposition apparatus proposed by the present invention.
  • a soft magnetic shell strong electromagnetic field enhanced inductively coupled plasma generating device mainly comprises a radio frequency induction coil 4, a soft magnetic shell 5 with an inner annular gap, an exciting copper coil 6 for generating a confined magnetic field, an intake duct 1, and an outer casing 2.
  • the workpiece table 3, the vacuum obtaining system 7, the vacuum measuring system and the control system are composed.
  • the RF induction coil 4 is wound around the plasma generator housing 2 and connected to the RF power source through a matching device.
  • the soft magnetic shell 5 is made of a ferrosilicon alloy, with a soft magnetic shell 5 having an annular gap, and a gap width W of 0.5 mm.
  • the soft magnetic shell 5 of the inner annular gap is surrounded by a magnetic copper coil 6 which generates a constraining magnetic field, the number of the exciting copper coil is 10, the exciting copper coil is connected to the DC excitation power source; the soft magnetic shell 5 with the inner annular gap can cause the constraint
  • the magnetic field lines generated by the excitation of the excitation copper coil 6 of the magnetic field are concentrated near the annular gap in the soft magnetic shell 5, and the magnetic induction intensity near the annular gap is significantly increased, which will greatly prolong the movement trajectory of the charged particles and significantly increase the collision of the charged particles with the gas molecules.
  • the number of times makes it possible to obtain a high-density plasma at a lower gas pressure, increase the plasma density, and improve the distribution of the plasma.
  • the outer casing 2 of the plasma generator is made of a non-magnetic material.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

Un dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé essentiellement, mais non limitativement, constitué d'une bobine de radiofréquence à induction (4), d'une substance faiblement ferromagnétique de type enveloppe (5) à espace interne annulaire, de bobines d'excitation en cuivre (6) produisant un champ magnétique restreint, d'un tuyau d'admission d'air (1), d'une enveloppe externe (2), d'un support pour pièce à usiner (3), d'un système d'obtention de vide (7), d'un système de mesure de vide et d'un système de commande. La substance faiblement ferromagnétique de type enveloppe à espace annulaire interne permet aux lignes magnétiques excitées par la bobine d'excitation en cuivre (6) destinée à la génération d'un champ magnétique restreint d'être proches de manière concentrée de l'espace annulaire interne de l'enveloppe (5). L'intensité de l'induction magnétique de la zone centrale du générateur est considérablement augmentée de sorte que la trajectoire des particules chargées est sensiblement étendue. Le nombre de collisions entre les particules chargées et les molécules de gaz augmentent fortement, ce qui entraîne la production d'un plasma à haute densité dans une pression plus faible et l'amélioration de la distribution du plasma.
PCT/CN2010/000365 2010-03-24 2010-03-24 Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé WO2011116496A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/CN2010/000365 WO2011116496A1 (fr) 2010-03-24 2010-03-24 Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2010/000365 WO2011116496A1 (fr) 2010-03-24 2010-03-24 Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé

Publications (1)

Publication Number Publication Date
WO2011116496A1 true WO2011116496A1 (fr) 2011-09-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2010/000365 WO2011116496A1 (fr) 2010-03-24 2010-03-24 Dispositif de génération de champ électromagnétique à substance faiblement ferromagnétique de type enveloppe à plasma à couplage inductif renforcé

Country Status (1)

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WO (1) WO2011116496A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110364060A (zh) * 2019-06-26 2019-10-22 北京航空航天大学 一种用于研究磁线圈束流的实验装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1378248A (zh) * 2002-05-13 2002-11-06 华南师范大学 等离子体对iii－v族化合物的干法刻蚀系统及刻蚀方法
CN2633899Y (zh) * 2003-07-02 2004-08-18 中国科学院上海硅酸盐研究所 电磁场约束电感耦合等离子体增强气相沉积薄膜系统
CN1929091A (zh) * 2006-09-26 2007-03-14 中国科学院上海硅酸盐研究所 利用电磁场约束电感耦合等离子体溅射沉积法制备ZnO基稀磁半导体薄膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1378248A (zh) * 2002-05-13 2002-11-06 华南师范大学 等离子体对iii－v族化合物的干法刻蚀系统及刻蚀方法
CN2633899Y (zh) * 2003-07-02 2004-08-18 中国科学院上海硅酸盐研究所 电磁场约束电感耦合等离子体增强气相沉积薄膜系统
CN1929091A (zh) * 2006-09-26 2007-03-14 中国科学院上海硅酸盐研究所 利用电磁场约束电感耦合等离子体溅射沉积法制备ZnO基稀磁半导体薄膜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110364060A (zh) * 2019-06-26 2019-10-22 北京航空航天大学 一种用于研究磁线圈束流的实验装置

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