JPS644023A - Dry etching device - Google Patents
Dry etching deviceInfo
- Publication number
- JPS644023A JPS644023A JP15901387A JP15901387A JPS644023A JP S644023 A JPS644023 A JP S644023A JP 15901387 A JP15901387 A JP 15901387A JP 15901387 A JP15901387 A JP 15901387A JP S644023 A JPS644023 A JP S644023A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- ecr
- dry etching
- excitation currents
- plasma generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To improve an etching shape and the etching uniformity and to enhance the universality of an ECR dry etching device by a method wherein a magnetic coil surrounding a plasma generation chamber is divided and excitation currents which are mutually independent are made to flow. CONSTITUTION:Excitation currents are designated as i8-i10 in divided magnetic coils 8-10; if the electric currents specified as i8<i9<i10 flow, a strength distribution 11 of a magnetic field approaches a line parallel to an axis; a region 12 which satisfied a condition for electron cyclotron resonance (ECR) by microwaves is extended to a wider range of a plasma generation chamber; an electric discharge at a low gas pressure becomes possible. If the excitation currents i8-i10 are controlled at appropriate values, it is possible to form a ring-shaped high ion density region of an optimum size corresponding to a change in a size of a wafer and a change in an etching condition. By this setup, an ECR dry etching device can be applied to an etching operation requiring the low shock energy in order to suppress the damage on the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15901387A JPS644023A (en) | 1987-06-26 | 1987-06-26 | Dry etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15901387A JPS644023A (en) | 1987-06-26 | 1987-06-26 | Dry etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS644023A true JPS644023A (en) | 1989-01-09 |
Family
ID=15684338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15901387A Pending JPS644023A (en) | 1987-06-26 | 1987-06-26 | Dry etching device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS644023A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0481198A2 (en) * | 1990-10-16 | 1992-04-22 | International Business Machines Corporation | Scanned electron cyclotron resonance plasma source |
| US5133825A (en) * | 1987-04-08 | 1992-07-28 | Hi Tachi, Ltd. | Plasma generating apparatus |
| US5181986A (en) * | 1990-04-02 | 1993-01-26 | Fuji Electric Co., Ltd. | Plasma processing apparatus |
| US8691874B2 (en) | 2000-03-02 | 2014-04-08 | Kato Pharmaceuticals, Inc. | Treatment of ophthalmic disorders using urea |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61177728A (en) * | 1985-02-04 | 1986-08-09 | Nippon Telegr & Teleph Corp <Ntt> | Apparatus for irradiation with low-energy ionized particle |
-
1987
- 1987-06-26 JP JP15901387A patent/JPS644023A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61177728A (en) * | 1985-02-04 | 1986-08-09 | Nippon Telegr & Teleph Corp <Ntt> | Apparatus for irradiation with low-energy ionized particle |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5133825A (en) * | 1987-04-08 | 1992-07-28 | Hi Tachi, Ltd. | Plasma generating apparatus |
| US5181986A (en) * | 1990-04-02 | 1993-01-26 | Fuji Electric Co., Ltd. | Plasma processing apparatus |
| EP0481198A2 (en) * | 1990-10-16 | 1992-04-22 | International Business Machines Corporation | Scanned electron cyclotron resonance plasma source |
| EP0481198A3 (en) * | 1990-10-16 | 1992-06-03 | International Business Machines Corporation | Scanned electron cyclotron resonance plasma source |
| US8691874B2 (en) | 2000-03-02 | 2014-04-08 | Kato Pharmaceuticals, Inc. | Treatment of ophthalmic disorders using urea |
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