WO2011089930A1 - Method for producing copper clad laminate, copper foil used therein, and laminating apparatus for copper clad laminate - Google Patents
Method for producing copper clad laminate, copper foil used therein, and laminating apparatus for copper clad laminate Download PDFInfo
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- WO2011089930A1 WO2011089930A1 PCT/JP2011/050085 JP2011050085W WO2011089930A1 WO 2011089930 A1 WO2011089930 A1 WO 2011089930A1 JP 2011050085 W JP2011050085 W JP 2011050085W WO 2011089930 A1 WO2011089930 A1 WO 2011089930A1
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- copper foil
- copper
- clad laminate
- laminating
- preheating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
- B29C65/56—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using mechanical means or mechanical connections, e.g. form-fits
- B29C65/64—Joining a non-plastics element to a plastics element, e.g. by force
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21C—MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
- B21C37/00—Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape
- B21C37/02—Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape of sheets
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
- B29C65/02—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/80—General aspects of machine operations or constructions and parts thereof
- B29C66/83—General aspects of machine operations or constructions and parts thereof characterised by the movement of the joining or pressing tools
- B29C66/834—General aspects of machine operations or constructions and parts thereof characterised by the movement of the joining or pressing tools moving with the parts to be joined
- B29C66/8341—Roller, cylinder or drum types; Band or belt types; Ball types
- B29C66/83411—Roller, cylinder or drum types
- B29C66/83413—Roller, cylinder or drum types cooperating rollers, cylinders or drums
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/90—Measuring or controlling the joining process
- B29C66/91—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux
- B29C66/914—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux
- B29C66/9141—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the temperature
- B29C66/91411—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the temperature of the parts to be joined, e.g. the joining process taking the temperature of the parts to be joined into account
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/90—Measuring or controlling the joining process
- B29C66/91—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux
- B29C66/914—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux
- B29C66/9161—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the heat or the thermal flux, i.e. the heat flux
- B29C66/91641—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the heat or the thermal flux, i.e. the heat flux the heat or the thermal flux being non-constant over time
- B29C66/91643—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the heat or the thermal flux, i.e. the heat flux the heat or the thermal flux being non-constant over time following a heat-time profile
- B29C66/91645—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux by controlling or regulating the temperature, the heat or the thermal flux by controlling or regulating the heat or the thermal flux, i.e. the heat flux the heat or the thermal flux being non-constant over time following a heat-time profile by steps
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/90—Measuring or controlling the joining process
- B29C66/91—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux
- B29C66/919—Measuring or controlling the joining process by measuring or controlling the temperature, the heat or the thermal flux characterised by specific temperature, heat or thermal flux values or ranges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/043—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0036—Heat treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
- B29C65/02—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
- B29C65/44—Joining a heated non plastics element to a plastics element
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/40—General aspects of joining substantially flat articles, e.g. plates, sheets or web-like materials; Making flat seams in tubular or hollow articles; Joining single elements to substantially flat surfaces
- B29C66/41—Joining substantially flat articles ; Making flat seams in tubular or hollow articles
- B29C66/45—Joining of substantially the whole surface of the articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
- B29C66/71—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
- B29C66/72—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined
- B29C66/723—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined being multi-layered
- B29C66/7232—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined being multi-layered comprising a non-plastics layer
- B29C66/72321—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined being multi-layered comprising a non-plastics layer consisting of metals or their alloys
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
- B29C66/74—Joining plastics material to non-plastics material
- B29C66/742—Joining plastics material to non-plastics material to metals or their alloys
- B29C66/7428—Transition metals or their alloys
- B29C66/74281—Copper or alloys of copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/90—Measuring or controlling the joining process
- B29C66/94—Measuring or controlling the joining process by measuring or controlling the time
- B29C66/949—Measuring or controlling the joining process by measuring or controlling the time characterised by specific time values or ranges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/243—Coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/06—Coating on the layer surface on metal layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/546—Flexural strength; Flexion stiffness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2309/00—Parameters for the laminating or treatment process; Apparatus details
- B32B2309/02—Temperature
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2309/00—Parameters for the laminating or treatment process; Apparatus details
- B32B2309/04—Time
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/12—Copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2379/00—Other polymers having nitrogen, with or without oxygen or carbon only, in the main chain
- B32B2379/08—Polyimides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/111—Preheating, e.g. before soldering
Definitions
- the present invention relates to a flexible copper-clad laminate used for a flexible printed circuit board (FPC: Flexible ⁇ ⁇ Printed Circuit) suitably used for a bent portion of an electric circuit, a copper foil used therefor, and a copper clad laminate laminating apparatus. is there.
- FPC Flexible ⁇ ⁇ Printed Circuit
- FPCs used for bent parts of mobile phones, etc. are coated with a polyimide varnish on copper foil, dried and cured by heating, and a method called the cast method, which is bonded in advance. It is manufactured by a method called a laminating method in which a polyimide film coated with a strong thermoplastic polyimide and a copper foil are stacked and pressure-bonded through a heating roll or the like.
- the flexible copper-clad laminate obtained by these methods is called a two-layer flexible copper-clad laminate.
- a three-layer flexible copper-clad laminate in which a copper foil and a polyimide film are bonded with an epoxy-based adhesive is also known.
- Patent Documents 1 and 2 As these FPC copper foils, a technique is known in which the I / I0 of the 200 plane that gives reflex annealing and gives flexibility is 40 or more (Patent Documents 1 and 2). Furthermore, the present inventors have reported a technique for reducing the laminating speed to some extent, increasing the crystal grain size of the copper foil, and improving the flexibility when producing a two-layer flexible copper-clad laminate by the laminating method. (Patent Document 3).
- JP 2001-323354 A (paragraph 0014) Japanese Patent Laid-Open No. 11-286760 JP 2009-292090 A (Claim 3)
- CCL Copper Clad Laminate: copper clad laminate
- the degree of orientation of the copper foil in the (200) direction does not increase and the flexibility is lowered.
- the technique described in Patent Document 3 slows the laminating speed to a certain extent, and slowly heats the copper foil during laminating to increase the degree of orientation in the (200) direction.
- the objective of this invention is providing the manufacturing method of the copper clad laminated board excellent in both flexibility and productivity, the copper foil used for it, and the laminating apparatus of a copper clad laminated board.
- the copper foil is heated up to an ultimate temperature of 220 to 280 ° C. within 3 seconds, and Pre-heating is held for 1 to 5 seconds at the ultimate temperature.
- the area ratio occupied by recrystallized grains in the copper foil is a metal structure on the surface of the copper foil.
- Preheating is performed so that the tensile strength of the copper foil after the preheating is 10% to 80% and becomes 40 to 90% of the tensile strength before the preheating.
- the preheating is preferably performed in the same line as the heating lamination.
- the preheating is preferably performed by direct contact between the copper foil and a heat source or radiant heat from the heat source.
- the copper foil of the present invention is a copper foil used in the above-described method for producing a copper clad laminate, and when it is brought into direct contact with a heat source maintained at 250 ° C. for 1 to 5 seconds, it re-appears in the metal structure on its surface.
- the area ratio of the crystal grains is 10 to 80%, and the tensile strength of the copper foil after the contact is 40 to 90% of the tensile strength before the contact, and then the heat source maintained at 350 ° C.
- I / I0 (200) is 60 or more when in direct contact for 1 to 5 seconds. Further, the area occupied by the recrystallized grains may be 10 to 80%, more preferably 40 to 80%. This is because, in this case, the I / I0 (200) exceeds 65 when it is brought into direct contact with a heat source maintained at 350 ° C. for 1 to 5 seconds, and higher flexibility is obtained.
- the copper foil of the present invention preferably contains a total of 0.05% by mass or less of one or more selected from the group consisting of Ag and Sn.
- the copper clad laminate laminating apparatus of the present invention is a copper clad laminate laminating apparatus for continuously laminating a copper foil and a resin layer, the preheating apparatus preheating the copper foil, and the preheating. It is arranged at the rear stage of the apparatus and includes a heat press machine for heating and laminating the resin layer and the preheated copper foil.
- the most preferable metal structure for flexibility is a structure in which the cubic orientation is very developed and the crystal grain boundary is small, in other words, the crystal grain is large.
- the degree of development of the cube orientation is expressed by the magnitude of the 200 plane X-ray diffraction intensity ratio I / I0 (I: 200 plane diffraction intensity of copper foil, I0: 200 plane diffraction intensity of copper powder). The larger this value, the more the cube orientation is developed.
- the copper foil material before being laminated on the flexible copper-clad laminate can be sufficiently annealed in advance in a temperature range suitable for recrystallization in the (200) orientation to increase the degree of orientation in the (200) orientation. Flexibility is improved, but the recrystallized copper foil is very soft, so it tends to cause creases and wrinkles during handling. Therefore, in the copper foil coil before being attached to the laminating apparatus, the copper foil needs a certain degree of strength, and it is difficult to sufficiently increase the degree of orientation in the (200) direction.
- the CCL can be given flexibility.
- the copper foil coil is preheated on the line of the continuous laminator and immediately laminated with the resin layer on the same line, the copper foil is partially recrystallized before lamination without considering the strength of the copper foil.
- the degree of orientation in the (200) direction can be improved and flexibility can be imparted.
- FIG. 1 shows a configuration example of a laminating apparatus 1 for a copper clad laminate of the present invention.
- the laminating apparatus 1 in FIG. 1 is an apparatus for double-sided CCL.
- a varnish-like resin composition 2a is applied to the first copper foil 4 and cured to form the resin layer 2.
- the 2nd copper foil 6 is piled up on the resin layer 2 surface of this single-sided CCL, and it heat-stacks with the lamination rolls 20 and 21.
- a laminating apparatus 1 includes a pair of heat rolls (preliminary heating apparatuses) 30 and 31 for preheating a copper foil 6, and a pair of laminating rolls 20 and 21 arranged at the subsequent stage of the heat rolls 30 and 31. (Heating press).
- the coiled copper foil 6 is unwound and immediately introduced into the laminating rolls 20 and 21 immediately after being preheated by the heat rolls 30 and 31 (on the same line of the laminating apparatus 1).
- the heat rolls 30 and 31 and the laminating rolls 20 and 21 are on the same line of the laminating apparatus 1.
- the heat rolls 30 and 31 are located immediately before the laminate rolls 20 and 21 (there are no other rolls between the heat rolls 30 and 31 and the laminate rolls 20 and 21). For this reason, the copper foil 6 can be sufficiently preheated by the heat rolls 30 and 31 and recrystallized without considering the strength of the copper foil, and then introduced into the laminate rolls 20 and 21.
- the coil-shaped 1st copper foil 4 is continuously unwound, and the varnish-like resin composition 2a is continuously apply
- FIG. This resin composition 2a becomes the resin layer 2 after curing.
- coated resin composition 2a is introduce
- the coil is wound into a coil shape and the process proceeds to the second step.
- the coiled second copper foil 6 is continuously unwound and heated up to a temperature of 220 to 280 ° C. by the heat rolls 30 and 31 within 3 seconds, and at this temperature reached from 1 second to 5 seconds. Perform preheating for 2 seconds. Thereby, the 2nd copper foil 6 is laminated in the state recrystallized moderately.
- this preheating may be performed with a single heating device or a plurality of heating devices as long as the conditions of the temperature rise and the holding temperature are within the above condition range.
- the recrystallization texture of the copper foil 6 does not sufficiently develop when the holding time at the above-described temperature is less than 1 second. This is presumably because nucleation of recrystallized grains occurs randomly before each preferred orientation grows, and each grows.
- the holding time at the above-mentioned ultimate temperature is 1 second or more, only the preferred orientation that is easy to recrystallize can be nucleated, and the preferred orientation produced by preheating due to the heating during the heat lamination in the subsequent laminating method. Can grow nuclei.
- the holding time exceeds 5 seconds, the productivity decreases.
- the ultimate temperature is less than 220 ° C., the recrystallized texture of the copper foil 6 does not sufficiently develop, and the holding time becomes long, so the productivity is lowered.
- the ultimate temperature exceeds 280 ° C. the entire copper foil is recrystallized and becomes almost completely softened, so that the strength is lowered and heating lamination becomes difficult.
- the copper foil when the copper foil is heated to a high temperature in a short time, nucleation of recrystallized grains occurs randomly before the preferred orientation grows, and the degree of orientation in the (200) orientation does not increase.
- the ultimate temperature exceeds 280 ° C., the copper foil surface is oxidized and the etching property and the adhesion to the resin layer are lowered, or the rust preventive agent on the copper foil surface is volatilized and the storability is lowered.
- the recrystallization rate of copper foil 6 (area ratio occupied by recrystallized grains in the metal structure on the surface of copper foil 6) is adjusted to 10 to 80%, and the tensile strength is adjusted to 40 to 90% before preheating. Is done.
- the “tensile strength ratio” is defined by ((tensile strength after preheating) / (tensile strength before preheating)) ⁇ 100.
- FIG. 2 schematically shows the relationship between the recrystallization rate of copper foil and the tensile strength ratio by preheating.
- the recrystallization rate is less than 10%, the recrystallization texture of the copper foil 6 does not develop sufficiently, and when the recrystallization rate exceeds 80%, the entire copper foil is recrystallized and becomes almost completely softened. Lowering makes heating lamination difficult. If the tensile strength exceeds 90% before preheating, the recrystallization rate is also less than 10%, and the recrystallization texture of the copper foil 6 is not sufficiently developed. When the tensile strength is less than 40% before the preheating, the recrystallization rate also exceeds 80%, and the entire copper foil is recrystallized, which is close to complete softening.
- Preheating may be performed on a separate line from the heat lamination (laminating press) using the laminating rolls 20, 21 or the like, or may be performed on the same line.
- the preheating method is not particularly limited, but it is preferably performed by direct contact between the copper foil and the heat source or radiant heat from the heat source.
- a convection heating device such as an annealing furnace
- a laminate heating press to increase the equipment size It is difficult to install on the same line as the machine.
- Specific examples of the direct contact method between the copper foil and the heat source include the heat rolls 30 and 31 described above.
- Specific examples of the radiant heat method from a heat source include infrared heating (IR heating).
- the resin layer 2 (having the first copper foil 4 laminated on the back surface) and the second copper foil 6 are continuously passed between the laminating rolls 20 and 21 heated to 350 to 400 ° C. Foil.
- the 2nd copper foil 6 is match
- the double-sided copper clad laminate 8 is appropriately wound around a coil.
- the copper foil (corresponding to the second copper foil 6) used in the method for producing a copper clad laminate of the present invention has its surface metal when directly contacted with a heat source maintained at 250 ° C. for 1 to 5 seconds.
- the area ratio of the recrystallized grains in the structure is 10 to 80%, and the tensile strength of the copper foil after the contact is 40 to 90% of the tensile strength before the contact, and then maintained at 350 ° C. It has a characteristic that I / I0 (200) is 60 or more when directly in contact with a heat source for 1 to 5 seconds.
- the characteristics of the copper foil after contact with the heat source maintained at 250 ° C. represent the characteristics obtained by the preheating.
- the characteristics when directly in contact with a heat source maintained at 350 ° C for 1 to 5 seconds represent the characteristics obtained by heating at the time of laminating, and I / I0 (200) is 60 or more. If it exists, it is excellent in the flexibility of obtained CCL.
- the composition of the copper foil used for the copper clad laminated board manufacturing method of this invention Tough pitch copper (JIS-1100), oxygen-free copper (JIS-1020), and these from the group of Ag and Sn Those containing a total of 0.05% by mass or less of one or more kinds selected are preferable. If the total amount of one or more selected from the group of Ag and Sn exceeds 0.05% by mass, recrystallization of the copper foil is hindered, so that a predetermined structure may not be obtained by preheating.
- the semi-softening temperature of the copper foil is preferably 100 ° C. to 200 ° C.
- the semi-softening temperature is about 100 ° C. to 140 ° C.
- the semi-softening temperature means an annealing temperature at which the strength after annealing for 30 minutes is an intermediate value between the strength before annealing and the strength in the complete recrystallization state.
- the resin layer 2 polyimide; PET (polyethylene terephthalate); thermosetting resin such as epoxy resin and phenol resin; and thermoplastic resin such as saturated polyester resin can be used, but not limited thereto.
- a varnish for example, a polyamic acid solution of a polyimide precursor
- a solvent is removed by heating to react (for example, The imidization reaction) may proceed to be cured.
- the thickness of the resin layer 2 can be set to about 1 to 15 ⁇ m, for example.
- a film-like material may be used as the resin layer 2, and this may be heated and laminated on the first copper foil 4 and / or the second copper foil 6.
- the copper foil 6 is combined on the surface of the resin layer 2 and heated and laminated. It is good also as an apparatus which heat-stacks copper foil on both surfaces of a resin film other than an apparatus. In the latter case, two copper foils may be simultaneously heated and laminated on both sides of the resin film, or after the first copper foil is heated and laminated on one side of the resin film, the second copper foil may be laminated by heating. Good. In this case, it is preferable to provide a preheating device for preheating both the first copper foil and the second copper foil.
- Examples of the laminating apparatus for the copper clad laminate for single-sided CCL include an apparatus for heating and laminating the first copper foil on one side of the resin film, and a preheating device for preheating the copper foil is provided. Furthermore, when the copper foil is heated and laminated on the resin film, it is preferable to use a resin film having an adhesive layer formed in advance on the resin film side, but the resin film and the copper foil may be heated and laminated without using the adhesive layer. . In addition, the resin film and the adhesive layer having different compositions are the three-layer CCL. However, when the resin film and the adhesive layer have the same composition, the two-layer CCL in which the copper foil and the resin film are laminated is obtained after the heat lamination. .
- ⁇ Copper foil> An ingot having the composition shown in Table 1 was manufactured, processed to about 10 mm by hot rolling, repeatedly manufactured by cold rolling and annealing, and pre-heated under the conditions shown in Table 1 after cold rolling. Was used. Preheating was performed by sandwiching a copper foil (CCL in the evaluation of flexibility described later) between two copper plates heated to a predetermined temperature. The composition of the copper foil is as shown in the table. The copper foil was rolled to a final working degree of 99% to a thickness of 18 ⁇ m. One side of the foil after the preheating was subjected to chemical treatment (copper-based rough plating) and provided for CCL lamination.
- CCL copper foil
- the recrystallization rate and tensile strength ratio of the copper foil before and after preheating were measured, and the semi-softening temperature of the copper foil after preheating was further measured.
- the recrystallization rate was measured by observing the surface of the copper foil with an electron microscope, analyzing the binarized image, and calculating the area ratio of the recrystallized portion.
- the tensile strength conformed to JIS.
- the preheated copper foil was sandwiched between two copper plates heated to 350 ° C. and held for 1 second, and then the X-ray diffraction intensity ratio I / I0 on the 200 plane was measured.
- thermoplastic polyimide adhesive on the surface is not a resin different from the polyimide film of the core part, but after being laminated with a copper foil, it becomes a base resin as a whole and becomes a two-layer flexible copper-clad laminate.
- the two copper foils after the preheating described above are stacked so that the chemically treated surfaces face the films, and the films are sandwiched between the copper foils and laminated,
- the film was heated and laminated (laminated) with a heating roll of about 300 ° C. at a foil passing rate of 3 m / min.
- the transportability was evaluated as x when the CCL after lamination had five or more holes or cuts in the copper foil per 1 m of the plate length due to folding or wrinkling.
- the productivity was evaluated as x when the preheating holding time exceeded 5 seconds.
- TPC tough pitch copper (JIS-1100)
- OFC oxygen-free copper
- Ag 190 ppm-TPC represents a composition in which 190 mass ppm of Ag is added to TPC.
- FIG. 3 shows a micrograph of the structure of the copper foil of Example 1 after preheating
- FIG. 4 shows a micrograph of the structure of the copper foil of Example 1 after further heating at 350 ° C. for 1 second after preheating. Show. It can be seen that a recrystallized structure is partially generated by the preheating, and further the recrystallized structure is increased by heating at the time of lamination (350 ° C. ⁇ 1 second).
- the comparative example 2 is the example which simulated the convection type heating apparatus (annealing furnace etc.) with a slow temperature increase rate.
- the recrystallization rate was 100%, which was almost completely softened, the strength was lowered, and the transportability was inferior.
- the degree of orientation of the 200 plane of the copper foil after heating at 350 ° C. for 1 second was also less than 60, and the flexibility of the obtained CCL was inferior.
- Comparative Example 7 In the case of Comparative Example 7 in which the holding time during the preheating exceeds 5 seconds, the preheating time becomes long and the productivity is inferior, and the recrystallization rate becomes 100%, which is close to complete softening and the strength is lowered. Inferior transportability.
- Comparative Example 8 In the case of Comparative Example 8 in which the amount of Sn added in the copper foil exceeded 0.05 mass% (500 ppm), recrystallization did not occur even when preheated, and the copper foil after heating at 350 ° C. for 1 second was 200 The degree of orientation of the surface was less than 60, and the flexibility of the obtained CCL was inferior.
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Abstract
Description
又、エポキシ系などの接着剤で銅箔とポリイミドフィルムを接着した三層フレキシブル銅貼積層板も知られている。
これらのFPC用銅箔として、再結晶焼鈍させ、屈曲性を与える200面のI/I0を40以上とした技術が知られている(特許文献1,2)。
さらに、本発明者らは、ラミネート法で二層フレキシブル銅貼積層板を製造する際、ラミネート速度をある程度遅くして、銅箔の結晶粒径を大きくし、屈曲性を向上させる技術を報告している(特許文献3)。 Currently, FPCs used for bent parts of mobile phones, etc. are coated with a polyimide varnish on copper foil, dried and cured by heating, and a method called the cast method, which is bonded in advance. It is manufactured by a method called a laminating method in which a polyimide film coated with a strong thermoplastic polyimide and a copper foil are stacked and pressure-bonded through a heating roll or the like. The flexible copper-clad laminate obtained by these methods is called a two-layer flexible copper-clad laminate.
A three-layer flexible copper-clad laminate in which a copper foil and a polyimide film are bonded with an epoxy-based adhesive is also known.
As these FPC copper foils, a technique is known in which the I / I0 of the 200 plane that gives reflex annealing and gives flexibility is 40 or more (Patent Documents 1 and 2).
Furthermore, the present inventors have reported a technique for reducing the laminating speed to some extent, increasing the crystal grain size of the copper foil, and improving the flexibility when producing a two-layer flexible copper-clad laminate by the laminating method. (Patent Document 3).
又、特許文献3記載の技術は、ラミネート速度をある程度遅くすることで、ラミネート時に銅箔をゆっくりと加熱し、(200)方位への配向度を高めているが、ラミネート速度を遅くすると生産性が低下するという問題がある。
従って、本発明の目的は、屈曲性と生産性に共に優れた銅張積層板の製造方法、それに用いる銅箔、及び銅張積層板のラミネート装置を提供することにある。 However, in CCL (Copper Clad Laminate: copper clad laminate) produced by a laminating method, there is a problem that the degree of orientation of the copper foil in the (200) direction does not increase and the flexibility is lowered. This is presumably because, in the case of the laminating method, the film and the copper foil are pressure-bonded by a heat roll, so that the copper foil is rapidly heated by the heat roll and the degree of orientation in the (200) direction does not increase.
The technique described in Patent Document 3 slows the laminating speed to a certain extent, and slowly heats the copper foil during laminating to increase the degree of orientation in the (200) direction. There is a problem that decreases.
Therefore, the objective of this invention is providing the manufacturing method of the copper clad laminated board excellent in both flexibility and productivity, the copper foil used for it, and the laminating apparatus of a copper clad laminated board.
前記予備加熱を、前記銅箔と熱源との直接接触、又は熱源からの輻射熱により行うことが好ましい。 The preheating is preferably performed in the same line as the heating lamination.
The preheating is preferably performed by direct contact between the copper foil and a heat source or radiant heat from the heat source.
一方、フレキシブル銅貼積層板に積層する前の銅箔材料を、予め(200)方位の再結晶に適した温度範囲で充分に焼鈍しておき、(200)方位への配向度を高めておけば屈曲性はよくなるが、再結晶した銅箔は非常に柔らかいため、取り扱い時にオレやシワが発生しやすい。そのため、ラミネート装置に取り付ける前の銅箔コイルでは、銅箔にある程度の強度が必要であり、(200)方位への配向度を十分に高めることは難しい。 An important point for obtaining a flexible copper-clad laminate exhibiting high flexibility is to recrystallize the metal structure of the copper foil into a state favorable for flexibility when it becomes a laminate. The most preferable metal structure for flexibility is a structure in which the cubic orientation is very developed and the crystal grain boundary is small, in other words, the crystal grain is large. Here, the degree of development of the cube orientation is expressed by the magnitude of the 200 plane X-ray diffraction intensity ratio I / I0 (I: 200 plane diffraction intensity of copper foil, I0: 200 plane diffraction intensity of copper powder). The larger this value, the more the cube orientation is developed.
On the other hand, the copper foil material before being laminated on the flexible copper-clad laminate can be sufficiently annealed in advance in a temperature range suitable for recrystallization in the (200) orientation to increase the degree of orientation in the (200) orientation. Flexibility is improved, but the recrystallized copper foil is very soft, so it tends to cause creases and wrinkles during handling. Therefore, in the copper foil coil before being attached to the laminating apparatus, the copper foil needs a certain degree of strength, and it is difficult to sufficiently increase the degree of orientation in the (200) direction.
従って、図1のラミネート装置1においては、第2の銅箔6の予備加熱が、本発明の対象となる。 Hereinafter, the manufacturing method of the copper clad laminated board which concerns on embodiment of this invention is demonstrated. In the present invention,% means mass% (mass%) unless otherwise specified. FIG. 1 shows a configuration example of a laminating apparatus 1 for a copper clad laminate of the present invention. The laminating apparatus 1 in FIG. 1 is an apparatus for double-sided CCL. First, a varnish-
Therefore, in the laminating apparatus 1 of FIG. 1, the preliminary heating of the
ここで、上記した到達温度での保持時間が1秒未満であると、銅箔6の再結晶集合組織が充分に発達しない。これは優先方位が成長する以前に、ランダムに再結晶粒の核生成が起こり、それぞれが成長してしまうためと考えられる。上記した到達温度での保持時間を1秒以上とすると、再結晶しやすい優先方位だけを核生成させることができ、その後のラミネート法での加熱積層時の加熱により、予備加熱で生成した優先方位の核を成長させることができる。一方、保持時間が5秒を超えると、生産性が低下する。
又、到達温度が220℃未満であると、銅箔6の再結晶集合組織が充分に発達せず、又、保持時間が長くなるために生産性が低下する。到達温度が280℃を超えると、銅箔全体が再結晶し、完全軟化に近くなって強度が低下して加熱積層が困難になる。さらに銅箔が高温まで短時間に加熱されることにより、優先方位が成長する前にランダムに再結晶粒の核生成が起こり、(200)方位への配向度が高くならない。又、到達温度が280℃を超えると、銅箔表面が酸化してエッチング性や樹脂層との密着性が低下したり、銅箔表面の防錆剤が揮発して保存性が低下する。 Next, the coiled
Here, the recrystallization texture of the
On the other hand, if the ultimate temperature is less than 220 ° C., the recrystallized texture of the
図2は、予備加熱による銅箔の再結晶率と引張り強さ比との関係を模式的に表す。再結晶率が10%未満であると銅箔6の再結晶集合組織が充分に発達せず、再結晶率が80%を超えると銅箔全体が再結晶し、完全軟化に近くなって強度が低下して加熱積層が困難になる。
又、引張り強さが予備加熱前の90%を越えると、再結晶率も10%未満となって銅箔6の再結晶集合組織が充分に発達しない。引張り強さが予備加熱前の40%未満である場合は、再結晶率も80%を超えて銅箔全体が再結晶し、完全軟化に近くなる。 By this preheating, the recrystallization rate of copper foil 6 (area ratio occupied by recrystallized grains in the metal structure on the surface of copper foil 6) is adjusted to 10 to 80%, and the tensile strength is adjusted to 40 to 90% before preheating. Is done. Here, the “tensile strength ratio” is defined by ((tensile strength after preheating) / (tensile strength before preheating)) × 100.
FIG. 2 schematically shows the relationship between the recrystallization rate of copper foil and the tensile strength ratio by preheating. When the recrystallization rate is less than 10%, the recrystallization texture of the
If the tensile strength exceeds 90% before preheating, the recrystallization rate is also less than 10%, and the recrystallization texture of the
銅箔と熱源との直接接触法の具体例としては、上記したヒートロール30、31を挙げることができる。熱源からの輻射熱法の具体例としては、赤外線加熱(IR加熱)を挙げることができる。 The preheating method is not particularly limited, but it is preferably performed by direct contact between the copper foil and the heat source or radiant heat from the heat source. This is because a convection heating device (such as an annealing furnace) generally used for heat treatment of copper foil has a slow heating rate of the material, making it difficult to obtain the prescribed heat treatment conditions, and a laminate heating press to increase the equipment size It is difficult to install on the same line as the machine.
Specific examples of the direct contact method between the copper foil and the heat source include the heat rolls 30 and 31 described above. Specific examples of the radiant heat method from a heat source include infrared heating (IR heating).
250℃に保持された熱源に接触後の銅箔の特性は、上記予備加熱で得られる特性を表している。又、350℃に保持された熱源に1秒間~5秒間直接接触させたときの特性は、ラミネートによる加熱積層時の加熱で得られる特性を表しており、I/I0(200)が60以上であれば、得られたCCLの屈曲性に優れる。 The copper foil (corresponding to the second copper foil 6) used in the method for producing a copper clad laminate of the present invention has its surface metal when directly contacted with a heat source maintained at 250 ° C. for 1 to 5 seconds. The area ratio of the recrystallized grains in the structure is 10 to 80%, and the tensile strength of the copper foil after the contact is 40 to 90% of the tensile strength before the contact, and then maintained at 350 ° C. It has a characteristic that I / I0 (200) is 60 or more when directly in contact with a heat source for 1 to 5 seconds.
The characteristics of the copper foil after contact with the heat source maintained at 250 ° C. represent the characteristics obtained by the preheating. The characteristics when directly in contact with a heat source maintained at 350 ° C for 1 to 5 seconds represent the characteristics obtained by heating at the time of laminating, and I / I0 (200) is 60 or more. If it exists, it is excellent in the flexibility of obtained CCL.
銅箔の再結晶を促進させるため、銅箔の半軟化温度が100℃~200℃であることが好ましい。半軟化温度が100℃~140℃程度であることがさらに好ましい。ここで半軟化温度とは、30分焼鈍後の強度が、焼鈍前の強度と完全再結晶状態での強度との中間値となる焼鈍温度を意味する。 Moreover, although there is no restriction | limiting in the composition of the copper foil used for the copper clad laminated board manufacturing method of this invention, Tough pitch copper (JIS-1100), oxygen-free copper (JIS-1020), and these from the group of Ag and Sn Those containing a total of 0.05% by mass or less of one or more kinds selected are preferable. If the total amount of one or more selected from the group of Ag and Sn exceeds 0.05% by mass, recrystallization of the copper foil is hindered, so that a predetermined structure may not be obtained by preheating.
In order to promote recrystallization of the copper foil, the semi-softening temperature of the copper foil is preferably 100 ° C. to 200 ° C. More preferably, the semi-softening temperature is about 100 ° C. to 140 ° C. Here, the semi-softening temperature means an annealing temperature at which the strength after annealing for 30 minutes is an intermediate value between the strength before annealing and the strength in the complete recrystallization state.
又、樹脂層2としてフィルム状のものを用い、これを第1の銅箔4及び/又は第2の銅箔6に加熱積層してもよい。 As the
Alternatively, a film-like material may be used as the
片面CCL用の銅張積層板のラミネート装置としては、樹脂フィルムの片面に第1の銅箔を加熱積層する装置が挙げられ、銅箔に予備加熱を行う予備加熱装置を設ける。
さらに、樹脂フィルムに銅箔を加熱積層する際、樹脂フィルム側に予め接着層が形成されたものを用いるとよいが、接着層を用いずに樹脂フィルムと銅箔とを加熱積層してもよい。又、樹脂フィルムと接着層の組成が異なるものは3層CCLとなるが、樹脂フィルムと接着層の組成が同一の場合、加熱積層後は銅箔と樹脂フィルムが積層された2層CCLとなる。 As described above, as a laminating apparatus for a copper clad laminate for double-sided CCL, after the
Examples of the laminating apparatus for the copper clad laminate for single-sided CCL include an apparatus for heating and laminating the first copper foil on one side of the resin film, and a preheating device for preheating the copper foil is provided.
Furthermore, when the copper foil is heated and laminated on the resin film, it is preferable to use a resin film having an adhesive layer formed in advance on the resin film side, but the resin film and the copper foil may be heated and laminated without using the adhesive layer. . In addition, the resin film and the adhesive layer having different compositions are the three-layer CCL. However, when the resin film and the adhesive layer have the same composition, the two-layer CCL in which the copper foil and the resin film are laminated is obtained after the heat lamination. .
表1に示す組成のインゴットを製造し、熱間圧延で10mm前後まで加工し、冷間圧延と焼鈍とを繰り返して製造し、冷間圧延後に、表1に示す条件で予備加熱を行ったものを用いた。予備加熱は銅箔(後述する屈曲性の評価ではCCL)を、所定温度に加熱した2枚の銅板で挟んで行った。銅箔の組成は表に示すとおりである。銅箔は99%の最終加工度で圧延し、厚み18μmとした。予備加熱後の箔の片面に化学処理(銅系粗化めっき)を施し、CCLの積層に供した。
予備加熱前後の銅箔の再結晶率、引張強度比を測定し、さらに予備加熱後の銅箔の半軟化温度を測定した。再結晶率の測定は、銅箔表面を電子顕微鏡で観察し、得られた画像を二値化したものを画像解析し、再結晶部の面積率を算出した。引張強度はJISに従った。
又、予備加熱後の銅箔を、350℃に加熱した2枚の銅板で挟んで1秒間保持した後、200面のX線回折強度比I/I0を測定した。 <Copper foil>
An ingot having the composition shown in Table 1 was manufactured, processed to about 10 mm by hot rolling, repeatedly manufactured by cold rolling and annealing, and pre-heated under the conditions shown in Table 1 after cold rolling. Was used. Preheating was performed by sandwiching a copper foil (CCL in the evaluation of flexibility described later) between two copper plates heated to a predetermined temperature. The composition of the copper foil is as shown in the table. The copper foil was rolled to a final working degree of 99% to a thickness of 18 μm. One side of the foil after the preheating was subjected to chemical treatment (copper-based rough plating) and provided for CCL lamination.
The recrystallization rate and tensile strength ratio of the copper foil before and after preheating were measured, and the semi-softening temperature of the copper foil after preheating was further measured. The recrystallization rate was measured by observing the surface of the copper foil with an electron microscope, analyzing the binarized image, and calculating the area ratio of the recrystallized portion. The tensile strength conformed to JIS.
The preheated copper foil was sandwiched between two copper plates heated to 350 ° C. and held for 1 second, and then the X-ray diffraction intensity ratio I / I0 on the 200 plane was measured.
ラミネート法で二層フレキシブル銅貼積層板を製造するためのポリイミドフィルムとして、両面に熱可塑性ポリイミドを接着剤として塗布した厚み25μmのフィルム(宇部興産社製のユーピレックスVT)を用いた。表面の熱可塑性ポリイミド接着剤は、コア部のポリイミドフィルムと異種の樹脂ではなく、銅箔と積層した後は、全体として基体樹脂となって二層フレキシブル銅貼積層板になる。
接着剤を両面に有する上記ポリイミドフィルムの両面に、上記した予備加熱後の2枚の銅箔を化学処理面がそれぞれフィルムに対向するようにして重ね、フィルムを各銅箔で挟み込んで積層し、約300℃の加熱ロールで通箔速度3m/分として加熱積層(ラミネート)した。 <Manufacture of CCL>
As a polyimide film for producing a two-layer flexible copper-clad laminate by a laminating method, a 25 μm-thick film (Upilex VT manufactured by Ube Industries Co., Ltd.) coated with thermoplastic polyimide on both sides was used. The thermoplastic polyimide adhesive on the surface is not a resin different from the polyimide film of the core part, but after being laminated with a copper foil, it becomes a base resin as a whole and becomes a two-layer flexible copper-clad laminate.
On both sides of the polyimide film having the adhesive on both sides, the two copper foils after the preheating described above are stacked so that the chemically treated surfaces face the films, and the films are sandwiched between the copper foils and laminated, The film was heated and laminated (laminated) with a heating roll of about 300 ° C. at a foil passing rate of 3 m / min.
ラミネート法で得た二層フレキシブル銅貼積層板(CCL)のうち、片方の銅箔を塩化第ニ鉄水溶液でエッチングして除去した。この後、既知のフォトリソグラフイ技術を用い、残った銅箔に回路幅200μmの配線を形成し、エポキシ系の接着剤が塗布されたポリイミドフィルムをカバーレイとして熱圧着して屈曲試験用のFPCを作製した。
IPC摺動屈曲試験機を使用し、曲げ半径1mmで毎分100回の繰り返し摺動を上記FPC片に負荷し、配線の電気抵抗が初期から10%上昇した屈曲回数を終点とした。屈曲回数が10万回を超える場合を良い(○)、10万回未満を悪い(×)と判定した。 <Evaluation of flexibility>
Of the two-layer flexible copper-clad laminate (CCL) obtained by the laminating method, one copper foil was removed by etching with a ferric chloride aqueous solution. After this, using a known photolithographic technique, a wiring with a circuit width of 200 μm is formed on the remaining copper foil, and a polyimide film coated with an epoxy adhesive is thermocompression-bonded as a coverlay for FPC for bending tests Was made.
Using an IPC sliding bending tester, 100 times per minute repeated sliding with a bending radius of 1 mm was applied to the FPC piece, and the end point was the number of bendings where the electrical resistance of the wiring increased by 10% from the initial stage. The case where the number of bendings exceeded 100,000 was judged as good (◯), and the case where the number of bendings was less than 100,000 was judged as bad (×).
又、生産性は、予備加熱の保持時間が5秒を超えたものを評価×とした。 The transportability was evaluated as x when the CCL after lamination had five or more holes or cuts in the copper foil per 1 m of the plate length due to folding or wrinkling.
The productivity was evaluated as x when the preheating holding time exceeded 5 seconds.
図3は予備加熱後の実施例1の銅箔の組織の顕微鏡写真を示し、図4は、予備加熱後にさらに350℃×1秒の加熱後の実施例1の銅箔の組織の顕微鏡写真を示す。予備加熱により、部分的に再結晶組織が発生し、さらにラミネート時の加熱(350℃×1秒)により、再結晶組織が増えることがわかる。 As is clear from Table 1, in each example, before heating and laminating by the laminating method, the copper foil was heated up to an ultimate temperature of 220 to 280 ° C. within 3 seconds, and at this ultimate temperature, 1 second to Preheating was performed for 5 seconds. For this reason, after heating at 350 ° C. for 1 second simulating heating at the time of lamination, the degree of orientation on the 200th surface of the copper foil was 60 or more, and productivity, transportability, and flexibility were all excellent.
FIG. 3 shows a micrograph of the structure of the copper foil of Example 1 after preheating, and FIG. 4 shows a micrograph of the structure of the copper foil of Example 1 after further heating at 350 ° C. for 1 second after preheating. Show. It can be seen that a recrystallized structure is partially generated by the preheating, and further the recrystallized structure is increased by heating at the time of lamination (350 ° C. × 1 second).
予備加熱時の到達温度までの昇温時間が3秒を超えた比較例2の場合、到達温度と保持時間が適正であっても、充分な再結晶率が得られず、得られたCCLの屈曲性が劣った。これは、低温に銅箔が長時間曝されたために再結晶の駆動力となる転位が解放されてしまったためと考えられる。なお、比較例2は、昇温速度が遅い対流式加熱装置(焼鈍炉等)を模した例である。
又、予備加熱時の到達温度が280℃を超えた比較例4,5の場合、再結晶率が100%となって完全軟化に近くなり、強度が低下して搬送性が劣った。又、350℃×1秒の加熱後の銅箔の200面の配向度も60未満となり、得られたCCLの屈曲性が劣った。
予備加熱時の保持時間が5秒を超えた比較例7の場合、予備加熱時間が長くなって生産性が劣るとともに、再結晶率が100%となって完全軟化に近くなり、強度が低下して搬送性が劣った。
銅箔中のSnの添加量が0.05質量%(500ppm)を超えた比較例8の場合、予備加熱しても再結晶が生じず、350℃×1秒の加熱後の銅箔の200面の配向度が60未満となり、得られたCCLの屈曲性が劣った。 On the other hand, in Comparative Example 6 in which preheating was not performed and in Comparative Examples 1 and 3 in which the reached temperature during preheating was less than 220 ° C., both of the 200 surfaces of the copper foil after heating at 350 ° C. × 1 second were used. The degree of orientation was less than 60, and the flexibility of the obtained CCL was inferior.
In the case of Comparative Example 2 in which the temperature rise time to the ultimate temperature during the preheating exceeded 3 seconds, even if the ultimate temperature and the holding time were appropriate, a sufficient recrystallization rate was not obtained, and the obtained CCL The flexibility was inferior. This is thought to be because dislocations that serve as the driving force for recrystallization were released because the copper foil was exposed to a low temperature for a long time. In addition, the comparative example 2 is the example which simulated the convection type heating apparatus (annealing furnace etc.) with a slow temperature increase rate.
In the case of Comparative Examples 4 and 5 in which the temperature reached during preheating exceeded 280 ° C., the recrystallization rate was 100%, which was almost completely softened, the strength was lowered, and the transportability was inferior. Further, the degree of orientation of the 200 plane of the copper foil after heating at 350 ° C. for 1 second was also less than 60, and the flexibility of the obtained CCL was inferior.
In the case of Comparative Example 7 in which the holding time during the preheating exceeds 5 seconds, the preheating time becomes long and the productivity is inferior, and the recrystallization rate becomes 100%, which is close to complete softening and the strength is lowered. Inferior transportability.
In the case of Comparative Example 8 in which the amount of Sn added in the copper foil exceeded 0.05 mass% (500 ppm), recrystallization did not occur even when preheated, and the copper foil after heating at 350 ° C. for 1 second was 200 The degree of orientation of the surface was less than 60, and the flexibility of the obtained CCL was inferior.
2 樹脂層
6 銅箔
20,21 ラミネートロール(加熱プレス機)
30、31 ヒートロール(予備加熱装置) DESCRIPTION OF SYMBOLS 1 Laminating apparatus of copper clad laminated
30, 31 Heat roll (preheating device)
Claims (7)
- 銅箔と樹脂層とをラミネート法によって加熱積層する前に、前記銅箔を220~280℃の到達温度まで3秒以内で昇温し、かつ前記到達温度で1秒~5秒保持する予備加熱を行うことを特徴とする銅張積層板の製造方法。 Before heating and laminating a copper foil and a resin layer by a laminating method, the copper foil is heated up to a temperature of 220 to 280 ° C. within 3 seconds and preheated to hold the temperature at the temperature of 1 second to 5 seconds. The manufacturing method of the copper clad laminated board characterized by performing.
- 銅箔と樹脂層とをラミネート法によって加熱積層する前に、前記銅箔に対し、再結晶粒の占める面積率が前記銅箔表面の金属組織において10%以上80%以下で、かつ前記予備加熱後の前記銅箔の引張強さが前記予備加熱前の引張強さの40~90%となる予備加熱を行うことを特徴とする銅張積層板の製造方法。 Before heating and laminating a copper foil and a resin layer by a laminating method, the area ratio occupied by recrystallized grains is 10% or more and 80% or less in the metal structure on the surface of the copper foil, and the preliminary heating. A method for producing a copper clad laminate, characterized by performing preheating in which the subsequent copper foil has a tensile strength of 40 to 90% of the tensile strength before the preheating.
- 前記予備加熱を、前記加熱積層と同一のラインで行う請求項1又は2に記載の銅張積層板の製造方法。 The method for producing a copper-clad laminate according to claim 1 or 2, wherein the preliminary heating is performed in the same line as the heating lamination.
- 前記予備加熱を、前記銅箔と熱源との直接接触、又は熱源からの輻射熱により行う請求項1~3のいずれかに記載の銅張積層板の製造方法。 The method for producing a copper-clad laminate according to any one of claims 1 to 3, wherein the preliminary heating is performed by direct contact between the copper foil and a heat source or radiant heat from the heat source.
- 請求項1~4のいずれかに記載の銅張積層板の製造方法に用いる銅箔であって、
250℃に保持された熱源に1秒間~5秒間直接接触させたとき、自身の表面の金属組織において再結晶粒の占める面積率が10~80%となり、かつ前記接触後の前記銅箔の引張強さが前記接触前の引張強さの40~90%となり、
その後に350℃に保持された熱源に1秒間~5秒間直接接触させたとき、I/I0(200)が60以上となる銅箔。 A copper foil used in the method for producing a copper-clad laminate according to any one of claims 1 to 4,
When it is brought into direct contact with a heat source maintained at 250 ° C. for 1 to 5 seconds, the area ratio of the recrystallized grains in the metal structure on its surface becomes 10 to 80%, and the tensile force of the copper foil after the contact The strength is 40-90% of the tensile strength before the contact,
A copper foil with an I / I0 (200) of 60 or more when brought into direct contact with a heat source maintained at 350 ° C for 1 to 5 seconds. - Ag及びSnの群から選ばれる1種以上を合計0.05質量%以下含む請求項5に記載の銅箔。 The copper foil according to claim 5, comprising a total of 0.05% by mass or less of one or more selected from the group consisting of Ag and Sn.
- 銅箔と樹脂層とを連続して積層する銅張積層板のラミネート装置であって、
前記銅箔を予備加熱する予備加熱装置と、
前記予備加熱装置の後段に配置され、樹脂層と前記予備加熱された銅箔とを加熱積層する加熱プレス機とを備えた銅張積層板のラミネート装置。 A laminating device for a copper clad laminate that continuously laminates a copper foil and a resin layer,
A preheating device for preheating the copper foil;
A laminating apparatus for a copper clad laminate, which is disposed at a subsequent stage of the preheating apparatus and includes a heat press machine for heating and laminating a resin layer and the preheated copper foil.
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KR1020127018565A KR101396218B1 (en) | 2010-01-21 | 2011-01-06 | Method for producing copper clad laminate, copper foil used therein, and laminating apparatus for copper clad laminate |
CN2011800067449A CN102712138A (en) | 2010-01-21 | 2011-01-06 | Method for producing copper clad laminate, copper foil used therein, and laminating apparatus for copper clad laminate |
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JP2010011361A JP2011148192A (en) | 2010-01-21 | 2010-01-21 | Method of manufacturing copper-clad laminated sheet, copper foil used therefor, and laminator of the copper-clad laminated sheet |
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WO2017179416A1 (en) * | 2016-04-14 | 2017-10-19 | 三井金属鉱業株式会社 | Treated surface copper foil, copper foil with carrier as well as methods for manufacturing copper-clad laminate and printed circuit board using same |
CN110475655B (en) * | 2017-03-28 | 2022-08-16 | 电化株式会社 | Method for producing laminate and apparatus for producing laminate |
JP6647253B2 (en) * | 2017-08-03 | 2020-02-14 | Jx金属株式会社 | Copper foil for flexible printed circuit board, copper-clad laminate using the same, flexible printed circuit board, and electronic device |
CN108405648B (en) * | 2018-02-27 | 2019-10-29 | 首钢京唐钢铁联合有限责任公司 | A kind of production method of anti-flash defect tin plate |
CN110356093A (en) * | 2019-08-19 | 2019-10-22 | 江门建滔电子发展有限公司 | A kind of devices and methods therefor preparing copper-clad laminate |
CN113211906B (en) * | 2021-05-10 | 2022-06-28 | 深圳市华鼎星科技有限公司 | Circuit material attaching method and formed material |
TWI777760B (en) * | 2021-08-09 | 2022-09-11 | 頎邦科技股份有限公司 | Flexible printed circuit board with heat-dissipation plate and heat-dissipation plate thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000212661A (en) * | 1998-11-17 | 2000-08-02 | Nippon Mining & Metals Co Ltd | Rolled copper foil for flexible printed circuit board and its production |
JP2009292090A (en) * | 2008-06-06 | 2009-12-17 | Nippon Mining & Metals Co Ltd | Two-layer flexible copper-clad laminated sheet excellent in flexibility and method for manufacturing it |
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---|---|---|---|---|
CN2368255Y (en) * | 1999-01-06 | 2000-03-08 | 华通电脑股份有限公司 | Device for preheating circuitboard before press-filming |
JP2006319269A (en) * | 2005-05-16 | 2006-11-24 | Fujikura Ltd | Flexible printed wiring board terminal or flexible flat cable terminal |
TW200846250A (en) * | 2007-05-18 | 2008-12-01 | Pyroswift Folding Co Ltd | Manufacture method of tag-typed integrated soft circuit board and a structure thereof |
CN101254678A (en) * | 2008-01-17 | 2008-09-03 | 上海华源复合新材料有限公司 | Copper-plastic composite board process technique and copper-plastic composite board |
TWI388260B (en) * | 2009-02-19 | 2013-03-01 | Azotek Co Ltd | Single - sided soft copper foil laminated board and its manufacturing method |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000212661A (en) * | 1998-11-17 | 2000-08-02 | Nippon Mining & Metals Co Ltd | Rolled copper foil for flexible printed circuit board and its production |
JP2009292090A (en) * | 2008-06-06 | 2009-12-17 | Nippon Mining & Metals Co Ltd | Two-layer flexible copper-clad laminated sheet excellent in flexibility and method for manufacturing it |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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