WO2011066696A1

WO2011066696A1 - Gas feeding device and gas feeding method

Info

Publication number: WO2011066696A1
Application number: PCT/CN2009/076024
Authority: WO
Inventors: 范振华
Original assignee: 东莞宏威数码机械有限公司
Priority date: 2009-12-01
Filing date: 2009-12-25
Publication date: 2011-06-09
Also published as: CN101813236A; CN101813236B

Abstract

A gas feeding device (10) includes a housing (100) with a hollow gas storage chamber (101), a cover (102) and a pipe group. The cover (102) provided uniformly with air holes (103) is positioned on the gas storage chamber (101) in which the pipe group is positioned. The pipe group comprises a first pipe unit (200) and a second pipe unit (300). The first and the second pipe units (200, 300) comprise respectively several first and several second pipes (201，301) arranged in parallel whose free ends are sealed. Several first and second gas apertures (202, 302) are formed on two sides of these pipes (201，301) which are arranged alternately and equidistantly in the same plane and in which the gas flows in opposite directions. Axial directions of the first and the second gas apertures (202, 302) are perpendicular to axial directions of the gas holes (103) and the first and the second gas apertures (202, 302) are arranged in the same plane. A gas feeding method is also disclosed. The gas feeding device and the gas feeding method can provide gas uniformly.

Description

Gas delivery device and delivery method

The present invention relates to a gas delivery device and a delivery method, and more particularly to a gas delivery device and a gas delivery method suitable for use in a semiconductor process. Background technique

With the development of semiconductor technology, the semiconductor process is becoming more and more complex, and higher requirements are placed on the production equipment and production process for producing semiconductor products, such as organic light-emitting display devices, liquid crystal display devices, and amorphous silicon solar panels. Etc., gas is used in many steps in the process, such as dry etching, oxidation, ion implantation, thin film deposition, etc. in the semiconductor process, using a considerable amount of gas, gas purity, gas delivery device, gas The delivery method has a decisive influence on the performance and yield of semiconductor products.

Taking the production of amorphous silicon solar cell silicon film as an example, the general amorphous silicon solar cell silicon film production includes the following steps: First, the glass substrate is placed in a vacuum chamber, and then enters the amorphous silicon P layer deposition chamber through the transition chamber. Depositing amorphous silicon P layer, depositing amorphous silicon I layer through the transition chamber into the amorphous silicon I layer deposition chamber, and finally depositing amorphous silicon N layer through the transition chamber into the amorphous silicon N layer deposition chamber. Out, the production of amorphous silicon solar cell silicon film has to go through at least three thin film deposition processes. At present, a method for fabricating an amorphous silicon thin film solar cell silicon film is mainly a chemical meteorological deposition method, and a chemical vapor deposition method (CVD) is a film forming method for forming a film from a raw material gas by using a chemical reaction. It is widely used for the formation of thin films of micro devices including semiconductor devices. Therefore, the supply of process gas is required during the deposition of the film, but the method and apparatus for supplying the process gas is the key to the process, since uniformity of the process gas will involve overall coating uniformity issues.

For semiconductor products, process gas is required in both the chemical vapor deposition method and the atmospheric pressure vapor deposition technology in the process, and the process gas requires special equipment and methods for supply. The existing gas delivery device generally comprises a gas supply line, an exhaust pipe and a gas injection device, the gas supply line is directly connected with the exhaust pipe, the exhaust pipe is arranged in the process chamber of the gas injection device, and the process gas is supplied through the gas supply The pipe is input to the exhaust pipe, and is output from the exhaust pipe to the gas injection device The process chamber is outputted to the glass substrate by a gas injection device, thereby reflecting the formation of the film. In the prior art, when designing the pipeline, it is generally not considered that the gas will decrease with the extension of the length of the exhaust pipe, and the gas transmission also needs to overcome the resistance of the pipeline, so that the exhaust pipe is provided to the process chamber of the gas injection device. The gas in the chamber is not evenly hooked, so that the gas supplied from the gas injection device to the surface of the glass substrate is difficult to achieve uniform uniformity, resulting in uneven film composition and film thickness on the glass substrate, which affects the quality stability of the semiconductor product. And the yield rate; in addition to the existing gas delivery device, the gas supply pipeline and the overall equipment have complicated structure and high production cost due to the problem of gas supply pressure and gas supply mode.

Therefore, there is an urgent need for a gas delivery device that provides uniform gas and has a simple structure. Summary of the invention

It is an object of the present invention to provide a gas delivery device that provides a uniform gas and a simple structure. Another object of the present invention is to provide a gas delivery method capable of providing a uniform gas.

In order to achieve the above object, the technical solution of the present invention is: providing a gas delivery device, which is adapted to communicate with an output tube of a gas supply device, the gas delivery device comprising a box body, a box cover and a pipe group, wherein the box body is a hollow structure, the hollow structure forms an air storage chamber, the cover is sealed on the air storage chamber, and the box cover is hooked with a plurality of vent holes communicating with the air storage chamber, and the pipe group is installed In the gas storage chamber, wherein the pipe group includes a first pipe assembly and a second pipe assembly, and the first pipe assembly and the second pipe assembly are respectively connected to an output pipe of the gas supply device; The first pipe assembly includes a plurality of first pipes arranged in parallel with each other, the free ends of the first pipes are sealed, and a plurality of first air holes are formed on both sides; the second pipe assembly includes the first pipe a second pipe having the same number and arranged in parallel with each other, the free end of the second pipe is sealed, and a plurality of second air holes are formed on both sides; the first pipe and the second pipe Arranging in the same plane at equal intervals and at equal intervals, and the air flow direction of the first duct and the second duct is opposite, the axial direction of the first air hole and the second air hole are the axis of the vent hole Vertically, and the first air hole is in the same plane as the second air hole.

Preferably, the adjacent first air holes are opposite to the second air holes; more specifically, the aperture of the first air hole on the first pipe gradually increases along the free end of the first pipe; The aperture of the second air hole on the second duct gradually increases along the free end of the second duct; the first air hole and the second air hole The aperture gradually increases along the free end, which compensates for the disadvantage that the gas output from the first air hole and the second air hole gradually decreases along the free ends of the first pipe and the second pipe, and at the same time, excludes the first air hole and the second air hole. The gases compensate each other in the gas storage chamber, which in turn makes the gas in the gas storage chamber more uniform.

Preferably, the first air hole and the second air hole have the same aperture, the first air hole and the second air hole are equally spaced; the gas removed from the first air hole and the second air hole is in the air storage cavity To the mutual compensation, the gas in the gas storage chamber is made uniform.

A gas delivery method for conveying gas in an output pipe of a gas supply device, comprising the steps of: providing a plurality of first pipes arranged in parallel with each other, the first pipe being in communication with the output pipe and having a free end sealed a plurality of first air holes are formed on two sides of the first pipe; a second pipe is provided in the same number as the first pipe and arranged in parallel with each other, and the second pipe is connected to the output pipe and has a free end a plurality of second air holes are formed on two sides of the second pipe; the first air hole and the second air hole are adjusted to be in the same plane; and the first pipe and the second pipe are mutually The intersections are equally and equally spaced in the same plane, and the air flow direction of the first duct and the second duct is opposite.

Compared with the prior art, since the first pipe assembly of the gas conveying device of the present invention comprises a plurality of first pipes arranged in parallel with each other, the free ends of the first pipes are sealed, and a plurality of first air holes are formed on both sides; The second pipe assembly includes the same number of second pipes arranged in parallel with the first pipe, and the free ends of the second pipe are sealed, and a plurality of second air holes are formed on both sides; the first pipe and the second pipe cross each other and Arranged in the same plane at equal intervals, and the airflow direction of the first duct and the second duct are opposite, the axial directions of the first air hole and the second air hole are both perpendicular to the axial direction of the vent hole, and the first air hole and the air vent The second air holes are located in the same plane; therefore, when the gas with the opposite air flow direction is output from the first air hole and the second air hole to the air storage chamber, the output gas acts as a mutual compensation, so that the output gas is uniform, thereby improving the quality of the product. At the same time, the gas delivery device has a simple layout and overall structure, and the production cost is low. DRAWINGS

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the structure of a gas delivery device of the present invention.

Fig. 2 is a schematic structural view showing the state of use of the gas delivery device of the present invention. Figure 3 is a schematic view showing the structure of a first embodiment of the gas delivery device of the present invention.

Figure 4 is an enlarged schematic view of a portion A of Figure 3.

Figure 5 is a schematic view showing the structure of a second embodiment of the gas delivery device of the present invention.

Figure 6 is an enlarged schematic view of a portion B of Figure 5.

Figure 7 is a flow chart of the gas delivery method of the present invention. detailed description

Embodiments of the present invention will now be described with reference to the drawings, in which like reference numerals represent like elements.

As shown in FIG. 1 and FIG. 2, the gas delivery device 10 of the present invention comprises a tank 100, a tank cover 102 and a pipeline group. The tank body 100 has a hollow structure, and the hollow structure forms an air storage chamber 101, and the tank cover 102 is sealed and sealed. On the cavity 101, the cover 102 is hooked with a plurality of vent holes 103 communicating with the air storage chamber 101. The pipe group is installed in the air storage chamber 101, and the output pipe 400 of the air supply device is installed outside the air storage chamber 101, wherein The pipe group includes a first pipe assembly 200 and a second pipe assembly 300. The first pipe assembly 200 and the second pipe assembly 300 are mounted on opposite sidewalls of the gas storage chamber 101 and pass through the side wall of the gas storage chamber 101. The first pipe assembly 200 and the second pipe assembly 300 are respectively connected to the output pipe 400 of the air supply device; the first pipe assembly 200 includes a plurality of first pipes 201 arranged in parallel with each other, and the free end of the first pipe 201 is sealed. A plurality of first air holes 202 are defined on both sides of the first pipe 201. The second pipe assembly 300 includes the same number of second pipes 301 arranged in parallel with the first pipe 201, and the free ends of the second pipes 301 are a plurality of second air holes 302 are formed on both sides of the second pipe 301; the first pipe 201 and the second pipe 301 are mutually intersected and arranged at equal intervals in the same plane, and the first pipe 201 and the second pipe 301 are The airflow direction is opposite, and the axial directions of the first air hole 202 and the second air hole 302 are both perpendicular to the axial direction of the vent hole 103, and the first air hole 202 and the second air hole 302 are located in the same plane.

As shown in FIG. 2, when the gas delivery device 10 of the present invention is in use, the gas flow direction is indicated by the direction of the arrow in the figure, and the gas is delivered to the first pipe assembly 200 by the output pipe 400 of the air supply device outside the casing 100. After the second pipe assembly 300, the gas flows along the free end of each of the first pipes 201 of the first pipe assembly 200. Since the first pipe assembly 200 is provided with a plurality of first air holes 202, the gas will flow from the first process. The first air hole 202 on a pipe 201 is output into the air storage chamber 101; When the gas sent to the second pipe assembly 300 flows along the free end of each of the second pipes 301, it is outputted from the second air holes 302 on the second pipes 301 into the gas storage chamber 101, and the gas passes through the first pipe 201 and When the second duct 301 is transported, the air pressure in the first duct 201 and the second duct 301 gradually decreases along the flow direction of the gas, so that the gas that the first air hole 202 and the second air hole 302 output into the air storage chamber 101 will follow. The direction of the free end of the first pipe 201 and the second pipe 301 is gradually decreased, but the air flow direction of the first pipe 201 and the second pipe 301 is opposite, so that the gas output from the adjacent first air hole 202 and the second air hole 302 is stored in the gas. The cavity 101 is mutually compensated to make the gas outputted into the gas storage chamber 101 as a whole uniform; the gas which is stored in the gas storage chamber 101 is output to the glass substrate through the vent hole 103 which is hooked on the cover 102, so that The film composition and film thickness formed on the glass substrate are uniform.

Different embodiments of the gas delivery device 10 of the present invention are described in detail below with reference to the accompanying drawings.

As shown in FIG. 3 and FIG. 4, in the first embodiment of the gas delivery device 10 of the present invention, a plurality of first air holes 202 are opened on both sides of the first pipe 201, and the aperture of the first air hole 202 is along the first The free end of the pipe 201 is gradually increased; the second pipe 301 is provided with a plurality of second air holes 302, and the aperture of the second air hole 302 is gradually increased along the free end of the second pipe 301, adjacent to the first The first air hole 202 on the pipe 201 and the second pipe 301 is opposite to the second air hole 302; after the gas is sent from the output pipe 400 of the air supply device to the first pipe 201 and the second pipe 301, the gas along the first pipe 201 and The free end of the second pipe 301 flows, and flows through the first air hole 202 and the second air hole 302 on the first pipe 201 and the second pipe 301 to the air storage chamber 101, so that the first pipe 201 and the second pipe are The pressure in the 301 gradually decreases along the direction of the airflow, but the apertures of the first air hole 202 and the second air hole 302 on the first pipe 201 and the second pipe gradually increase along the free end, thereby making the first air hole 202 and the second hole 202 Gas output from the air hole 302 The body does not gradually become smaller along the free ends of the first pipe 201 and the second pipe 301, so that the output gas is uniform; meanwhile, the airflow directions of the adjacent first pipe 201 and the second pipe 301 are opposite, thus, adjacent The gas outputted by one of the tubes 201 and the second tube compensates each other in the gas storage chamber 101 to further make the gas in the gas storage chamber 101 more uniform.

As shown in FIG. 5 and FIG. 6 , in the second embodiment of the gas delivery device 10 of the present invention, the first air hole 202 and the second air hole 302 having the same aperture are respectively disposed on the first pipe 201 and the second pipe 301. The first air holes 202 on the adjacent first pipe 201 and the second pipe 301 are arranged at equal intervals with the second air holes 302, so that the gas output from the first air holes 202 and the second air holes 302 is in the air storage chamber 101. To The mutual compensation acts to keep the gas in the gas storage chamber 101 uniform.

As shown in FIG. 7, the gas conveying method of the present invention comprises the following steps: (S01) providing a plurality of first pipes arranged in parallel with each other, the first pipe is in communication with the output pipe and the free end is sealed, and the two sides of the first pipe are a plurality of first air holes are provided in the upper opening; (S02) a second pipe is provided in the same quantity as the first pipe and arranged in parallel with each other, the second pipe is connected to the output pipe and the free end is sealed, the first a plurality of second air holes are formed on two sides of the two pipes; (S03) adjusting the first air holes and the second air holes in the same plane; (S04) crossing the first pipe and the second pipe And arranged at equal intervals in the same plane, and the air flow direction of the first pipe and the second pipe is opposite.

Since the first pipe assembly 200 of the gas conveying device 10 of the present invention includes a plurality of first pipes 201 arranged in parallel with each other, the free ends of the first pipes 201 are sealed, and a plurality of first air holes 202 are opened on both sides; the second pipe The assembly 300 includes the second pipe 301 of the same number and parallel to the first pipe 201. The free ends of the second pipe 301 are sealed, and a plurality of second air holes 302 are defined on both sides. The first pipe 201 and the second pipe 201 The ducts 301 are mutually intersected and arranged at equal intervals in the same plane, and the airflow direction of the first duct 201 and the second duct 301 are opposite, and the axial directions of the first air hole 202 and the second air hole 302 are both in the axial direction of the vent hole 103. Vertically, the first air hole 202 and the second air hole 302 are in the same plane; therefore, the gas with the opposite air flow direction is output from the first air hole 202 and the second air hole 302 to the air storage chamber 101, and the output gas is in the air storage chamber. The internal compensation function in 101 is such that the gas outputted to the gas storage chamber 101 is hooked to ensure uniform gas output from the vent hole 103 on the tank cover 102 to the glass substrate. Thereby improving the quality of the product; the same time, the gas delivery conduit means 10 and the overall layout of simple structure, low production cost.

The above description is only for the embodiment in which the pipe group is cylindrical, but is not limited to the above embodiment. The gas conveying device 10 of the present invention can also set different types of pipe groups according to actual needs, and can also set the first according to actual needs. The shape of the air hole 202 and the second air hole 302.

The gas delivery device 10 of the present invention is also not limited to the semiconductor process, and can be used in similar processes and environments according to actual needs.

The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, and the equivalent changes made by the scope of the present invention remain within the scope of the present invention.

Claims

Rights request

A gas delivery device, adapted to be in communication with an output tube of a gas supply device, the gas delivery device comprising a tank body, a tank cover and a pipe group, the tank body having a hollow structure, the hollow structure forming a gas storage chamber The cover is sealed on the air storage chamber, and the cover is hooked with a plurality of vent holes communicating with the air storage chamber, and the pipe group is installed in the air storage chamber, wherein :

The pipe group includes a first pipe assembly and a second pipe assembly, and the first pipe assembly and the second pipe assembly are respectively connected to an output pipe of the air supply device;

The first pipe assembly includes a plurality of first pipes arranged in parallel with each other, and the free ends of the first pipes are sealed, and a plurality of first air holes are formed on both sides;

The second pipe assembly includes a second pipe having the same number and parallel to each other as the first pipe, and the free end of the second pipe is sealed, and a plurality of second air holes are formed on both sides;

The first duct and the second duct cross each other and are arranged at equal intervals in the same plane, and the air flow direction of the first duct and the second duct are opposite, the first air hole and the second air hole The axial direction is perpendicular to the axial direction of the vent hole, and the first air hole and the second air hole are located in the same plane.

The gas delivery device according to claim 1, wherein the adjacent first air holes are opposite to the second air holes.

3. The gas delivery device according to claim 2, wherein: an aperture of the first air hole on the first duct gradually increases along a free end of the first duct; The aperture of the two air holes gradually increases along the free end of the second duct.

The gas delivery device according to claim 1, wherein the first air hole has the same aperture as the second air hole, and the first air hole and the second air hole intersect at equal intervals.

5. A gas transport method for transporting gas in an output pipe of a gas supply device, comprising the steps of: Providing a plurality of first pipes arranged in parallel with each other, the first pipe is in communication with the output pipe and the free end is sealed, and a plurality of first air holes are formed on both sides of the first pipe;

Providing a second pipe of the same quantity and parallel to each other as the first pipe, the second pipe is in communication with the output pipe and the free end is sealed, and the second pipe is provided with a plurality of second sides Stomata

Adjusting the first air hole and the second air hole in the same plane;

The first pipe and the second pipe are mutually intersected and arranged at equal intervals in the same plane, and the airflow direction of the first pipe and the second pipe are opposite.

6. The gas delivery method according to claim 5, wherein: the adjacent first pores and the second pores are adjusted to face each other.

7. The gas delivery method according to claim 6, wherein: a diameter of the first air hole on the first pipe gradually increases along a free end of the first pipe; The aperture of the two air holes gradually increases along the free end of the second duct.

The gas delivery method according to claim 5, wherein the first air hole has the same aperture as the second air hole, and the first air hole and the second air hole intersect at equal intervals.