WO2011033872A1 - Novel episulfide compounds, curable resin compositions containing the episulfide compounds, and cured products thereof - Google Patents

Novel episulfide compounds, curable resin compositions containing the episulfide compounds, and cured products thereof Download PDF

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WO2011033872A1
WO2011033872A1 PCT/JP2010/063088 JP2010063088W WO2011033872A1 WO 2011033872 A1 WO2011033872 A1 WO 2011033872A1 JP 2010063088 W JP2010063088 W JP 2010063088W WO 2011033872 A1 WO2011033872 A1 WO 2011033872A1
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group
general formula
carbon atoms
curable resin
resin composition
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PCT/JP2010/063088
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French (fr)
Japanese (ja)
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俊輔 高日
直美 佐藤
浩之 五十嵐
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株式会社Adeka
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Priority to KR1020117027059A priority Critical patent/KR101758726B1/en
Priority to CN201080021087.0A priority patent/CN102421826B/en
Publication of WO2011033872A1 publication Critical patent/WO2011033872A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D331/00Heterocyclic compounds containing rings of less than five members, having one sulfur atom as the only ring hetero atom
    • C07D331/02Three-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02Polythioethers
    • C08G75/06Polythioethers from cyclic thioethers
    • C08G75/08Polythioethers from cyclic thioethers from thiiranes

Definitions

  • the present invention relates to a novel episulfide compound, a curable resin composition containing the episulfide compound, a curing agent and / or an energy ray-sensitive cation initiator, and a cured product thereof.
  • optical materials such as lenses.
  • active development has been made in the field of electronic materials and optical materials due to the excellent electrical properties, heat resistance, adhesiveness, optical properties and the like of the cured resin combined with a curing agent.
  • examples thereof include a semiconductor sealing material, an antireflection film such as a liquid crystal display, a protective film for a color filter, an optical waveguide, a lens, a mirror, and a prism that are used in an optical device such as a camera.
  • Patent Document 1 reports branched alkyl sulfide-type episulfide compounds
  • Patent Document 2 reports linear alkyl sulfide-type episulfide compounds
  • Patent Document 3 reports bisphenol S-type episulfide compounds.
  • Patent Document 4 reports an episulfide compound having a fluorene skeleton having high heat resistance as an optical material.
  • a resin composition for obtaining a cured product exhibiting a high refractive index cannot be produced due to poor solubility in a diluent or the like.
  • An object of the present invention is to provide a compound that is excellent in curability, transparency, etc., and is particularly useful for optical applications, and a curable resin composition using the compound.
  • an episulfide compound having a specific structure is excellent in solubility, and further that a curable resin composition containing the episulfide compound is excellent in storage stability, and that the cured product is high. It was found that it is a refractive index and excellent in transparency, and it was found that the above problem can be solved by using this.
  • the present invention has been made based on the above findings, and provides a novel episulfide compound represented by the following general formula (I) or (II).
  • a 1 and A 2 represent an oxygen atom or a sulfur atom (wherein at least one of A 1 and A 2 represents a sulfur atom)
  • Cy represents a cycloalkyl group having 3 to 10 carbon atoms.
  • X and Z are each independently an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic ring having 2 to 20 carbon atoms.
  • Aromatic ring is halogen source And n represents an integer of 0 to 10, p represents an integer of 0 to 5, and r represents an integer of 0 to 4.
  • the optical isomer present when n is not 0 may be any isomer.
  • Y 1 , Y 2 and Z are each independently, An alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic group having 2 to 20 carbon atoms, and a cyclohexane having 3 to 10 carbon atoms.
  • the optical isomer present in can be any isomer.
  • this invention provides the curable resin composition containing the novel episulfide compound represented by the said general formula (I) or (II), and a hardening
  • the present invention also provides a curable resin composition containing a novel episulfide compound represented by the above general formula (I) or (II) and an energy ray-sensitive cation initiator.
  • this invention provides the hardened
  • the episulfide compound of the present invention has excellent solubility, and the curable resin composition containing the episulfide compound has excellent curability and storage stability, and gives a cured product having high refractive index and excellent transparency.
  • the episulfide compound of the present invention is a novel compound represented by the above general formula (I) or (II). First, the episulfide compound represented by the general formula (I) will be described.
  • Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by Cy, X and Z in the general formula (I) include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, methylcyclohexyl, cycloheptyl, cyclooctyl and cyclononyl. And cyclodecyl.
  • Examples of the alkyl group having 1 to 10 carbon atoms represented by X and Z in the general formula (I) include methyl, ethyl, propyl, butyl, amyl, hexyl, heptyl, octyl, nonyl, decyl and the like.
  • Examples of the group in which the methylene group in the alkyl group is interrupted by —O— include methoxy, ethoxy, propyloxy, isopropyloxy, methoxymethyl, ethoxymethyl, 2-methoxyethyl and the like.
  • Examples of the group in which the methylene group is interrupted by —S— include methylthio, ethylthio, butylthio, pentylthio and the like, and examples of the group in which the methylene group in the alkyl group is interrupted by a double bond include allyl, 3-butenyl Etc.
  • Examples of the aryl group having 6 to 20 carbon atoms represented by X and Z in the general formula (I) include phenyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 1-phenanthryl, o-tolyl, m-tolyl, p-tolyl, 3-fluorenyl, 9-fluorenyl, 1-tetrahydronaphthyl, 2-tetrahydronaphthyl, 1-acenaphthenyl, 1-indanyl, 2-indanyl, biphenyl and the like.
  • Groups interrupted by —O— include phenoxy, 1-naphthoxy, 2-naphthoxy, 1-anthryloxy, 1-phenanthryloxy, o-tolyloxy, m-tolyloxy, p-tolyloxy, 9-fluore Nyloxy, 1-indanyloxy, 2-indanyloxy and the like, and the bond part of the aryl group is-
  • the groups interrupted by — include phenylthio, 1-naphthylthio, 2-naphthylthio, 1-anthrylthio, 1-phenanthrylthio, o-tolylthio, m-tolylthio, p-tolylthio, 9-fluorenylthio, 1-tetrahydronaphthylthio, Examples include 2-tetrahydronaphthylthio, 1-indanylthio, 2-indanylthio and the like, and examples of the group in which the bond
  • Examples of the arylalkyl group having 7 to 20 carbon atoms represented by X and Z in the general formula (I) include benzyl, phenethyl, 2-phenylpropyl, diphenylmethyl, triphenylmethyl and the like.
  • Examples of the group in which the methylene group in the arylalkyl group is interrupted by —O— include benzyloxy, phenoxymethyl, phenoxyethyl, 1-naphthylmethoxy group, 2-naphthylmethoxy group, 1-anthrylmethoxy, and the like.
  • Examples of the group in which the methylene group in the arylalkyl group is interrupted by —S— include benzylthio, phenylthiomethyl, phenylthioethyl, etc., and the methylene group in the arylalkyl group is interrupted by a double bond. Examples of the group include cinnamyl.
  • heterocyclic group having 2 to 20 carbon atoms represented by X and Z in the general formula (I) examples include pyrrolyl, pyridyl, pyrimidyl, pyridazyl, piperazyl, piperidyl, pyranyl, pyrazolyl, triazyl, pyrrolidyl, quinolyl.
  • Examples of the aromatic ring formed by adjacent Zs in the general formula (I) include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a pyrene ring.
  • halogen atom represented by X and Z in the above general formula (I) and the alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and X and Z represented by the above general formula (I) and Examples of the halogen atom that may substitute the aromatic ring formed between adjacent Zs include fluorine, chlorine, bromine, and iodine.
  • the alkyl group, the aryl group, the arylalkyl group, the heterocyclic group, the cycloalkyl group and the aromatic ring formed between Z and represented by X and Z in the general formula (I) may have a substituent.
  • the alkyl group, aryl group, arylalkyl group, heterocyclic group, cyclohexyl represented by X and Z in the general formula (I) including the substituent The number of carbon atoms of the aromatic ring formed by the group and adjacent Zs shall satisfy the specified range of the number of carbon atoms.
  • an optical isomer may exist in the episulfide compound represented by the general formula (I) and the episulfide compound represented by the general formula (II) described later.
  • an optical isomer may exist in the episulfide compound represented by the general formula (I) and the episulfide compound represented by the general formula (II) described later.
  • the compounds shown in the following text are not limited to specific optical isomers.
  • Examples of the episulfide compound represented by the general formula (I) include the following compound No. 1-No. The compound shown by 13 is mentioned. In the chemical formula below, n represents a number from 0 to 10. However, the present invention is not limited by the following compounds.
  • X and Z are alkyl groups having 1 to 10 carbon atoms or aryl groups having 6 to 20 carbon atoms
  • p And compounds in which r is 0 to 2 and n is 0 to 5 are preferred because of their good storage stability.
  • the following compounds i) to iii) are easy to obtain from raw materials and have good productivity. Further preferred.
  • the optical isomer present when n is not 0 may be any isomer.
  • X is an aryl group having 6 to 20 carbon atoms
  • p is 0 or 1
  • n is 0 to 2.
  • the method for producing the episulfide compound represented by the general formula (I) is not particularly limited. For example, as shown in the following reaction formula, by reacting the epoxy derivative (1) with thiourea, The episulfide compound represented by the general formula (I) can be easily produced.
  • the amount of thiourea used in the reaction and the reaction time it is possible to arbitrarily control the ratio of substitution of oxygen atoms to sulfur atoms in the oxirane ring (sulfur substitution rate) in the epoxy derivative as a raw material.
  • sulfur substitution rate the ratio of substitution of oxygen atoms to sulfur atoms in the oxirane ring
  • it may be used as an episulfide compound of the present invention while leaving an unsubstituted oxirane ring in the product, or an epoxy derivative as a part of the raw material.
  • the alkyl group having 1 to 10 carbon atoms represented by Y 1 , Y 2 and Z, and the methylene group in the alkyl group are —O—, —S—, or a double bond.
  • Examples of the interrupted group include the groups exemplified in the description of the general formula (I).
  • the aryl group having 6 to 20 carbon atoms represented by Y 1 , Y 2 and Z, and the bond part of the aryl group are interrupted by —O—, —S— or a double bond.
  • Examples of the group include those exemplified in the description of the general formula (I).
  • Examples of the group interrupted in the above include the groups exemplified in the description of the general formula (I).
  • heterocyclic group having 2 to 20 carbon atoms represented by Y 1 , Y 2 and Z in the general formula (II) include groups exemplified in the description of the general formula (I).
  • Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by Y 1 , Y 2 and Z in the general formula (II) include groups exemplified in the description of the general formula (I).
  • the ring structure formed by bonding adjacent Y 1 in the general formula (II) includes, in addition to those exemplified as the aromatic ring in the general formula (I), a cyclopentane ring, a cyclohexane ring, a cyclopentene ring, Examples thereof include 5- to 7-membered rings such as piperidine ring, morpholine ring, lactone ring and lactam ring, and condensed rings such as fluorene ring, acenaphthene ring, indane ring and tetralin ring.
  • Examples of the halogen atom that may substitute the ring structure formed by bonding of the heterocyclic group, the cycloalkyl group and the adjacent Y 1 include the groups exemplified in the description of the general formula (I).
  • Ring structure formed by bonding of alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and adjacent Y 1 represented by Y 1 , Y 2 and Z in the general formula (II) May have a substituent, and examples of these substituents include the groups exemplified in the description of the general formula (I), and these groups may be further substituted.
  • an alkyl group represented by Y 1 , Y 2 and Z, an aryl group, an arylalkyl group, which can be placed in the general formula (II) including the substituent when substituted with a substituent having a carbon atom, an alkyl group represented by Y 1 , Y 2 and Z, an aryl group, an arylalkyl group, which can be placed in the general formula (II) including the substituent,
  • the number of carbon atoms in a ring structure formed by a heterocyclic group, a cycloalkyl group, and adjacent Z's shall satisfy the specified range of carbon atoms.
  • n a number from 0 to 10.
  • the present invention is not limited by the following compounds.
  • the following compounds iv) to ix) are preferable because the raw materials are easily available, the productivity is high, and a cured product having a high refractive index is obtained.
  • x is 2 or 3
  • y is 0,
  • Y 1 is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or adjacent Y
  • the ring formed by 1 is an aromatic ring,
  • Y 2 and Z are an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 20 carbon atoms, and q and r are 0 to 2 A compound.
  • Y 1 is an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 20 carbon atoms.
  • the method for producing the episulfide compound represented by the general formula (II) is not particularly limited.
  • the episulfide compound represented by the general formula (II) can be easily produced.
  • the episulfide compound of the present invention includes a curable resin composition described below, and uses as a cured product obtained by heating and / or irradiating the curable resin composition with energy rays, as well as concrete and cement mortar. Paints or adhesives for various metals, leather, glass, rubber, plastic, wood, cloth, paper, etc .; adhesive tape for packaging, adhesive labels, frozen food labels, removable labels, POS labels, adhesive wallpaper, adhesive flooring, etc.
  • Adhesives Art paper, lightweight coated paper, cast coated paper, coated paperboard, carbonless copying machine, impregnated paper and other processed paper; natural fibers, synthetic fibers, glass fibers, carbon fibers, metal fibers and other sizing agents, Used for a wide range of applications such as anti-fraying agents, fiber treatment agents such as processing agents, building materials such as sealing agents, cement admixtures, waterproofing materials, and sealants for electronic and electrical equipment. Rukoto can.
  • the curable resin composition of the present invention (hereinafter also referred to as the first curable resin composition) containing the novel episulfide compound represented by the general formula (I) or (II) and a curing agent. explain.
  • the description of the episulfide compound is appropriately applied to portions that are not particularly described.
  • the curing agent examples include polyalkylpolyamines such as diethylenetriamine, triethylenetriamine, and tetraethylenepentamine; polyether polyamines such as polyoxypropylenediamine and polyoxypropylenetriamine; 1,2-diaminocyclohexane, 1, 4-diamino-3,6-diethylcyclohexane, isophoronediamine, mensendiamine, norbornenediamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, bis (aminomethyl) cyclohexane, N-aminomethylpiperazine Alicyclic polyamines such as 3,9-bis (3-aminopropyl) -2,4,8,10-tetraoxaspiro (5,5) undecane; m-xylenediamine, ⁇ - (m / p amide) Phenyl) ethylamine,
  • these polyamines and glycidyl ethers such as phenyl glycidyl ether, butyl glycidyl ether, bisphenol A-diglycidyl ether, bisphenol F-glycidyl ether, or various epoxy resins such as glycidyl esters of carboxylic acid are used in a conventional manner.
  • latent curing agents such as dicyandiamide, acid anhydrides, and imidazoles such as 2-ethyl-4methylimidazole can also be used.
  • the polyamines, modified products of the polyamines, and imidazoles are preferable, and imidazoles are more preferable in terms of storage stability and curability.
  • the content of the curing agent is preferably 0.01 to 20 parts by weight, more preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the episulfide compound. .
  • the content of the curing agent is less than 0.01 parts by weight, the curing rate is slow or the curing is insufficient, and when it exceeds 20 parts by weight, the strength of the cured product is insufficient.
  • the first curable resin composition may include a curing catalyst; reactive and / or non-reactive, such as an epoxy compound, an oxetane compound, dioctyl phthalate, dibutyl phthalate, benzyl alcohol, and coal tar.
  • a curing catalyst reactive and / or non-reactive, such as an epoxy compound, an oxetane compound, dioctyl phthalate, dibutyl phthalate, benzyl alcohol, and coal tar.
  • epoxy compound that may be used as the reactive and / or non-reactive diluent (plasticizer) include hydrogenated bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate.
  • oxetane compound that may be used as a reactive and / or non-reactive diluent (plasticizer) include soybean oil, octyl epoxy stearate, butyl epoxy stearate, epoxidized polybutadiene, and the like.
  • the first curable resin composition may contain a solvent.
  • the amount of the solvent used is such that the total content of the episulfide compound and the curing agent is preferably 5 to 90% by mass, more preferably 10 to 50% by mass in the first curable resin composition. It should be in the range.
  • the solvent include ketones such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, and cyclohexanone; ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1 Ether solvents such as 1,2-diethoxyethane and dipropylene glycol dimethyl ether; ester solvents such as methyl acetate, ethyl acetate, acetic acid-n-propyl, isopropyl acetate, and n-butyl acetate; ethylene glycol monomethyl ether, ethylene glycol Cellosolve solvents such as monoethyl ether, propylene glycol monomethyl ether acetate; methanol, ethanol, iso- or n-propanol, iso- or n-butan
  • the first curable resin composition can be cured by heat treatment.
  • the heat treatment is preferably performed in the range of 100 to 300 ° C. for 10 to 240 minutes.
  • the curable resin composition of the present invention (hereinafter referred to as the second curable resin composition) containing the novel episulfide compound represented by the general formula (I) or (II) and an energy ray-sensitive cationic polymerization initiator. (Also called things).
  • the content of the description in the said episulfide compound and the 1st curable resin composition is applied suitably about the part which is not demonstrated especially.
  • the energy beam sensitive initiator is a compound capable of releasing a substance that initiates cationic polymerization by energy beam sensitive irradiation, more specifically, energy beam irradiation as described later.
  • the energy ray-sensitive cationic polymerization initiator include a double salt that is an onium salt that releases a Lewis acid by energy ray-sensitive irradiation, or a derivative thereof.
  • a typical example of such a compound is a salt of a cation and an anion represented by the general formula [A] y + [B] y- .
  • the cation [A] y + is preferably onium, and the structure can be represented by, for example, [(R) x Q] y + .
  • R is an organic group having 1 to 60 carbon atoms and may contain any number of atoms other than carbon, and x is an integer of 1 to 5.
  • the x Rs are independent and may be the same or different. Further, at least one of x R is preferably an aromatic group.
  • the anion [B] y ⁇ is preferably a halide complex, and the structure thereof can be represented by [LX s ] y ⁇ , for example.
  • L is a metal or metalloid which is a central atom of a halide complex
  • B P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn, Co and the like.
  • X is a halogen atom.
  • anion [LX s ] y ⁇ of the above general formula examples include tetrafluoroborate (BF 4 ) ⁇ , hexafluorophosphate (PF 6 ) ⁇ , hexafluoroantimonate (SbF 6 ) ⁇ , hexafluoroarsenate.
  • PF 6 hexafluorophosphate
  • SbF 6 hexafluoroantimonate
  • hexafluoroarsenate hexafluoroarsenate.
  • AsF 6 ) ⁇ hexachloroantimonate (SbCl 6 ) ⁇ and the like can be mentioned, and hexafluoroantimonate (SbF 6 ) ⁇ is preferable.
  • a structure represented by [LX s ⁇ 1 (OH)] y ⁇ can also be used.
  • L, X, and s are the same as described above.
  • Other anions that can be used include perchlorate ion (ClO 4 ) ⁇ , trifluoromethyl sulfite ion (CF 3 S O 3 ) ⁇ , fluorosulfonic acid ion (FSO 3 ) ⁇ , toluenesulfonic acid anion, trinitrobenzenesulfonic acid anion, and the like.
  • tetrakis (pentafluorophenyl) borate can be used as the anion [B] y ⁇ .
  • aromatic onium salts among such onium salts.
  • aromatic halonium salts described in JP-A-50-151997, JP-A-50-158680, JP-A-50-151997, JP-A-52-30899, JP-A-56- No. 55420, JP-A 55-125105, etc. Group VIA aromatic onium salts, JP-A-50-158698, Group VA aromatic onium salts, JP-A 56-8428, Oxosulfoxonium salts described in JP-A-56-149402, JP-A-57-192429, etc., aromatic diazonium salts described in JP-A-49-17040, US Pat. No. 4,139,655
  • the thiopyrylium salt described in 1 is preferable.
  • aromatic onium salts the following general formula (V), (VI) or (VII) is particularly preferable.
  • R1 to R14 may be the same or different from each other, a hydrogen atom, a halogen atom, an oxygen atom or a hydrocarbon group that may contain a halogen atom, or an alkoxy group that may have a substituent, Ar is one or more.
  • a hydrogen atom is a phenyl group which may be substituted.
  • a compound having a sulfonium cation represented by: a compound having a (tricumyl) iodonium cation; a compound having a bis (t-butylphenyl) iodonium cation; Examples thereof include a compound having a phenylsulfonium cation.
  • xylene-cyclopentadienyl iron (II) hexafluoroantimonate cumene-cyclopentadienyl iron (II) hexafluorophosphate
  • xylene-cyclopentadienyl iron (II) -tris examples thereof include iron / allene complexes such as (trifluoromethylsulfonyl) methanide, aluminum complexes / photolytic silicon compound-based initiators, and the like.
  • the energy ray sensitive cationic polymerization initiator can be used alone or in combination of two or more. Moreover, the hardening
  • the amount of the energy ray sensitive cationic polymerization initiator used or the total amount of the energy ray sensitive cationic polymerization initiator and the curing agent used is 0.05 to 20 parts by mass with respect to 100 parts by mass of the episulfide compound. When the amount used is less than 0.05 parts by mass, the curable resin composition is not sufficiently cured, and distortion or unevenness occurs, or cracks occur during heating.
  • a more preferable amount of the energy ray-sensitive cationic polymerization initiator is 0.5 to 15 parts by mass with respect to 100 parts by mass of the episulfide compound.
  • any additive exemplified in the description of the first curable resin composition may be added to the second curable resin composition.
  • these optional additives are preferably 500 parts by mass or less in total with respect to 100 parts by mass of the episulfide compound.
  • the second curable resin composition may contain a solvent.
  • the amount of the solvent used is such that the total content of the episulfide compound, the energy ray-sensitive cationic polymerization initiator and / or the curing agent is preferably 5 to 90 mass in the second curable resin composition. %, More preferably 10 to 50% by mass.
  • Specific examples of the solvent include the solvents exemplified in the first curable resin composition, and among them, ketones or cellosolve solvents are preferable. Moreover, you may make it contain in the 2nd curable resin composition as it is, without removing the solvent used when synthesize
  • the second curable resin composition can be cured to a dry-to-touch state or a solvent-insoluble state usually after 0.1 seconds to several minutes by irradiation with energy rays such as ultraviolet rays.
  • energy rays such as ultraviolet rays.
  • Any suitable energy ray may be used as long as it induces decomposition of the cationic polymerization initiator, but preferably an ultra-high, high, medium, low-pressure mercury lamp, xenon lamp, carbon arc lamp, metal halide lamp, fluorescent lamp, From 2000 angstroms obtained from tungsten lamp, excimer lamp, germicidal lamp, excimer laser, nitrogen laser, argon ion laser, helium cadmium laser, helium neon laser, krypton ion laser, various semiconductor lasers, YAG laser, light emitting diode, CRT light source, etc.
  • High energy rays such as electromagnetic energy having a wavelength of 7000 angstroms, electron beams, X-rays
  • the second curable resin composition can be cured by heat treatment.
  • a heat treatment is appropriately performed before and after the energy beam irradiation, a cured product with good quality can be obtained.
  • the first and second curable resin compositions described above are used as cured products described below, as well as inks, protective films, paints, coating agents, adhesives, insulating materials, structural materials, optical disks, and sealings. It can also be used as an agent or an optical modeling agent.
  • the cured product of the present invention obtained by heating the first and / or second curable resin composition and / or irradiating energy rays will be described.
  • the content of the description in the said episulfide compound and the 1st and 2nd curable resin composition is applied suitably about the part which is not demonstrated especially.
  • the shape of the cured product of the present invention is not particularly limited, and examples thereof include a lens shape, a film, a prism shape, and a plate shape. Furthermore, the material may be coated or sealed by curing on other materials.
  • the cured product of the present invention is useful for optical parts such as an optical lens, an optical film, a light guide plate, a waveguide, an optical element, and an optical connector.
  • Examples 1-1 to 1-3 show production examples of the novel episulfide compound of the present invention
  • Examples 2-1 to 2-8 show production examples and evaluation examples of the first and second curable resin compositions.
  • Comparative Examples 2-1 to 2-7 show production examples and evaluation examples of comparative curable resin compositions.
  • Examples 3-1 to 3-3 show production examples and evaluation examples of cured products obtained by curing the first curable resin composition
  • Comparative Example 3-1 shows production examples and evaluation examples of comparative cured products.
  • Examples 4-1 and 4-2 show production examples and evaluation examples of cured products obtained by curing the second curable resin composition
  • Comparative Examples 4-1 to 4-3 are productions of comparative cured products. Examples and evaluation examples are shown.
  • Example 1-1 Production of episulfide compound A-1
  • 1,1-bis (4- (2,3-epoxypropyloxy) phenyl) -3-phenylindane was added.
  • 100.0 g of tetrahydrofuran, 250 g of tetrahydrofuran, and 60.0 g of ethanol were charged and dissolved with sufficient stirring. This was charged with 44.2 g of thiourea, heated to 45 ° C. and stirred for 18 hours.
  • the sulfur substitution rate of the oxirane ring to the thiirane ring determined from the elemental analysis value was 98%. The analysis results are shown below.
  • Example 1-2 Production of episulfide compound A-2.
  • the organic layer was washed twice with 300 mL of 10% saline and dried well over anhydrous magnesium sulfate, and then the solvent was removed to obtain 50.2 g of a colorless solid (episulfide compound (A-2)) in a yield of 95. %.
  • a colorless solid episulfide compound (A-2)
  • the sulfur substitution rate of the oxirane ring to the thiirane ring determined from the elemental analysis value was 96%. The analysis results are shown below.
  • Example 1-3 Production of episulfide compound A-3.
  • 30.0 g of bis [4- (2,3-epoxypropyloxy) phenyl] cyclohexyl (4-biphenyl) methane 150 g of 1,4-dioxane, and 30. ethanol. 0 g was charged and dissolved by stirring well. This was charged with 10.2 g of thiourea and stirred at 50 ° C. for 24 hours.
  • the comparative curable resin composition was prepared in the same manner using the following comparative compounds (B-1) to (B-3) instead of the episulfide compound of the present invention. No. 9-No. 15 was produced. The solubility of the obtained composition was evaluated. The results are shown in [Table 1] and [Table 2].
  • the composition using the comparative compound (B-2) was poor in solubility and storage stability, whereas the examples using the episulfide compound of the present invention were used.
  • the compositions of 2-1 to 2-8 are excellent in solubility in a diluent. Further, in Comparative Examples 2-1 and 2-4, the curable resin composition was not obtained because it was not dissolved, and in Comparative Example 2-7, crystals were precipitated after cooling to room temperature.
  • Examples 3-1 to 3-3 and Comparative Example 3-1 The obtained curable resin composition No. 1-No. 3 and comparative curable resin composition No. Each 10 was heated to 60 ° C. and applied to a glass substrate subjected to a release treatment. The glass was sandwiched with another glass with a 1.00 mm spacer and bonded together, and heated at 100 ° C. for 1 hour and at 150 ° C. for 1 hour. The cured product was evaluated as ⁇ , and the cured product was evaluated as ⁇ . Moreover, what was obtained as hardened
  • Examples 4-1 and 4-2 and Comparative Examples 4-1 to 4-3 The obtained curable resin composition No. 4 and no. 5 and comparative curable resin composition No. 11, No. 13, and No. 11; Each 14 was heated to 60 ° C. and applied to a glass substrate subjected to a release treatment. Laminated by sandwiching the other piece of glass with 1.00mm spacer, which after exposure at 3000 mJ / cm 2 per glass sided high pressure mercury lamp (total 6000 mJ / cm 2), for 2 hours at 0.99 ° C., cooled to room temperature And peeled from the glass substrate. The curability was evaluated as ⁇ for those obtained as cured products, and x for those that were not cured. Moreover, what was obtained as hardened
  • the episulfide compound of the present invention is excellent in solubility, and the curable resin composition of the present invention characterized by containing these compounds is a cured product having a high refractive index excellent in curability and transparency. Obviously, it is useful for optical material applications.

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Abstract

Provided are: compounds which exhibit excellent curability and transparency and are useful particularly for optical use; and curable resin compositions using the compounds. Specifically provided are episulfide compounds represented by general formula (I) or (II). In general formula (I), A1 and A2 are each an oxygen atom or a sulfur atom (with the proviso that A1 and A2 are not both oxygen atoms); Cy is C3-10 cycloalkyl; X and Z are each independently C1-10 alkyl or the like; n is 0 to 10; p is 0 to 5; and r is an integer of 0 to 4. In general formula (II), Y1 and Y2 are each C1-10 alkyl or the like; A1, A2, Z, n and r are each as defined for general formula (I); n is 0 to 10, q is 0 to 4, and q' is 0 to 8 (with the proviso that q' is equal to or below (x+y)×2); and x is a number of 0 to 4 and y is a number of 0 to 4, with the sum of x and y being 2 to 4.

Description

新規エピスルフィド化合物、該エピスルフィド化合物を含有する硬化性樹脂組成物及びその硬化物Novel episulfide compound, curable resin composition containing the episulfide compound, and cured product thereof
 本発明は、新規エピスルフィド化合物、該エピスルフィド化合物と硬化剤及び/又はエネルギー線感受性カチオン開始剤を含有する硬化性樹脂組成物、並びにその硬化物に関する。 The present invention relates to a novel episulfide compound, a curable resin composition containing the episulfide compound, a curing agent and / or an energy ray-sensitive cation initiator, and a cured product thereof.
 従来、透明で高屈折率な硬化物は、レンズ等の光学材料に使用されてきた。特に硬化剤と組み合わせた樹脂硬化物の優れた電気特性、耐熱性、接着性、光学特性等により、電子材料、光学材料の分野において活発な開発がされてきた。例えば、半導体封止材、液晶ディスプレイ等の反射防止膜、カラーフィルターの保護膜、光導波路、カメラ等の光学機器に使用されるレンズ、ミラー及びプリズム等が挙げられる。 Conventionally, transparent and high refractive index cured products have been used for optical materials such as lenses. In particular, active development has been made in the field of electronic materials and optical materials due to the excellent electrical properties, heat resistance, adhesiveness, optical properties and the like of the cured resin combined with a curing agent. Examples thereof include a semiconductor sealing material, an antireflection film such as a liquid crystal display, a protective film for a color filter, an optical waveguide, a lens, a mirror, and a prism that are used in an optical device such as a camera.
 特許文献1には、分岐アルキルスルフィド型エピスルフィド化合物、特許文献2には、直鎖アルキルスルフィド型エピスルフィド化合物、特許文献3には、ビスフェノールS型エピスルフィド化合物が報告されている。しかし、これらの化合物は耐熱性に問題があった。また特許文献4には、光学材料として高い耐熱性を有するフルオレン骨格を有するエピスルフィド化合物が報告されている。しかし、希釈剤等への溶解性が悪く、高屈折率を示す硬化物を得るための樹脂組成物が作製できないという問題があった。 Patent Document 1 reports branched alkyl sulfide-type episulfide compounds, Patent Document 2 reports linear alkyl sulfide-type episulfide compounds, and Patent Document 3 reports bisphenol S-type episulfide compounds. However, these compounds have a problem in heat resistance. Patent Document 4 reports an episulfide compound having a fluorene skeleton having high heat resistance as an optical material. However, there is a problem that a resin composition for obtaining a cured product exhibiting a high refractive index cannot be produced due to poor solubility in a diluent or the like.
特開平9-071580号公報Japanese Patent Laid-Open No. 9-071580 特開平9-110979号公報Japanese Patent Laid-Open No. 9-110979 特開平11-12273号公報Japanese Patent Laid-Open No. 11-12273 特開2001-288177号公報JP 2001-288177 A
 本発明の目的は、硬化性、透明性等が優れ、特に光学用途に有用な化合物及び該化合物を用いた硬化性樹脂組成物を提供することにある。 An object of the present invention is to provide a compound that is excellent in curability, transparency, etc., and is particularly useful for optical applications, and a curable resin composition using the compound.
 本発明者等は、鋭意検討を重ねた結果、特定の構造を有するエピスルフィド化合物が、溶解性に優れ、更に該エピスルフィド化合物を含む硬化性樹脂組成物が保存安定性に優れ、その硬化物が高屈折率であり、透明性に優れることを知見し、これを使用することにより上記課題を解決することを知見した。 As a result of intensive studies, the present inventors have found that an episulfide compound having a specific structure is excellent in solubility, and further that a curable resin composition containing the episulfide compound is excellent in storage stability, and that the cured product is high. It was found that it is a refractive index and excellent in transparency, and it was found that the above problem can be solved by using this.
 本発明は、上記知見に基づいてなされたもので、下記一般式(I)又は(II)で表される新規エピスルフィド化合物を提供するものである。 The present invention has been made based on the above findings, and provides a novel episulfide compound represented by the following general formula (I) or (II).
(式中、A1及びA2は酸素原子又は硫黄原子を表し(但し、A1及びA2の少なくとも一つは硫黄原子を表す)、Cyは炭素原子数3~10のシクロアルキル基を示し、X及びZはそれぞれ独立して、炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環基、炭素原子数3~10のシクロアルキル基又はハロゲン原子を表し、該アルキル基及びアリールアルキル基中のメチレン基並びに該アリール基の結合部は-O-、-S-又は二重結合で中断されてもよく、また、Zは隣接するZ同士で芳香環を形成してもよい。該アルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及び隣接するZ同士で形成される芳香環はハロゲン原子で置換されてもよく、nは0~10、pは0~5、rは0~4の整数を表す。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。) (Wherein, A 1 and A 2 represent an oxygen atom or a sulfur atom (wherein at least one of A 1 and A 2 represents a sulfur atom), Cy represents a cycloalkyl group having 3 to 10 carbon atoms. , X and Z are each independently an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic ring having 2 to 20 carbon atoms. Group, a cycloalkyl group having 3 to 10 carbon atoms or a halogen atom, and the methylene group in the alkyl group and arylalkyl group and the bond part of the aryl group are interrupted by —O—, —S— or a double bond Z may form an aromatic ring with adjacent Z. The alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and adjacent Z are formed with each other. Aromatic ring is halogen source And n represents an integer of 0 to 10, p represents an integer of 0 to 5, and r represents an integer of 0 to 4. The optical isomer present when n is not 0 may be any isomer. )
Figure JPOXMLDOC01-appb-C000006
(式中、A1及びA2は酸素原子又は硫黄原子を表し(但し、A1及びA2の少なくとも一つは硫黄原子を表す)、Y1、Y2及びZは、それぞれ独立して、炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環基、炭素原子数3~10のシクロアルキル基又はハロゲン原子を表し、該アルキル基及びアリールアルキル基中のメチレン基並びに該アリール基の結合部は-O-、-S-又は二重結合で中断されてもよく、隣接するY1は、互いに結合して環を形成してもよく、該アルキル基、アリール基、アリールアルキル基、複素環基及びシクロアルキル基はハロゲン原子で置換されてもよく、nは0~10、qは0~4、q’は0~8(但し、q’は(x+y)×2以下である)、rは0~4、xは0~4、yは0~4の整数を表し、xとyの合計は2~4である。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
Figure JPOXMLDOC01-appb-C000006
(Wherein A 1 and A 2 represent an oxygen atom or a sulfur atom (provided that at least one of A 1 and A 2 represents a sulfur atom), Y 1 , Y 2 and Z are each independently, An alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic group having 2 to 20 carbon atoms, and a cyclohexane having 3 to 10 carbon atoms. Represents an alkyl group or a halogen atom, the methylene group in the alkyl group and arylalkyl group, and the bond part of the aryl group may be interrupted by —O—, —S— or a double bond, and adjacent Y 1 is May be bonded to each other to form a ring, and the alkyl group, aryl group, arylalkyl group, heterocyclic group and cycloalkyl group may be substituted with a halogen atom, n is 0 to 10, and q is 0 -4, q 'is 0-8 (where q' is (x y) × 2 or less), r is 0 to 4, x is 0 to 4, y is an integer of 0 to 4, and the sum of x and y is 2 to 4. When n is not 0 The optical isomer present in can be any isomer.)
 また、本発明は、上記一般式(I)又は(II)で表される新規エピスルフィド化合物と硬化剤を含有する硬化性樹脂組成物を提供するものである。 Moreover, this invention provides the curable resin composition containing the novel episulfide compound represented by the said general formula (I) or (II), and a hardening | curing agent.
 また、本発明は、上記一般式(I)又は(II)で表される新規エピスルフィド化合物とエネルギー線感受性カチオン開始剤を含有する硬化性樹脂組成物を提供するものである。 The present invention also provides a curable resin composition containing a novel episulfide compound represented by the above general formula (I) or (II) and an energy ray-sensitive cation initiator.
 また、本発明は、前記の硬化性樹脂組成物を加熱及び/又はエネルギー線を照射して得られる硬化物を提供するものである。 Moreover, this invention provides the hardened | cured material obtained by heating the said curable resin composition and / or irradiating an energy ray.
 本発明のエピスルフィド化合物は、溶解性に優れ、更に該エピスルフィド化合物を含む硬化性樹脂組成物は硬化性、保存安定性に優れており、高屈折率で透明性に優れた硬化物を与える。 The episulfide compound of the present invention has excellent solubility, and the curable resin composition containing the episulfide compound has excellent curability and storage stability, and gives a cured product having high refractive index and excellent transparency.
 以下、本発明のエピスルフィド化合物、硬化性樹脂組成物及びその硬化物について好ましい実施形態に基づき詳細に説明する。
 本発明のエピスルフィド化合物は、上記一般式(I)又は(II)で表わされる新規化合物である。
 先ず、上記一般式(I)で表わされるエピスルフィド化合物について説明する。
Hereinafter, the episulfide compound, curable resin composition, and cured product thereof of the present invention will be described in detail based on preferred embodiments.
The episulfide compound of the present invention is a novel compound represented by the above general formula (I) or (II).
First, the episulfide compound represented by the general formula (I) will be described.
 上記一般式(I)におけるCy、X及びZで表される炭素原子数3~10のシクロアルキル基としては、例えば、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、メチルシクロヘキシル、シクロヘプチル、シクロオクチル、シクロノニル、シクロデシル等が挙げられる。 Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by Cy, X and Z in the general formula (I) include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, methylcyclohexyl, cycloheptyl, cyclooctyl and cyclononyl. And cyclodecyl.
 上記一般式(I)におけるX及びZで表わされる炭素原子数1~10のアルキル基としては、例えば、メチル、エチル、プロピル、ブチル、アミル、ヘキシル、ヘプチル、オクチル、ノニル、デシル等が挙げられ、該アルキル基中のメチレン基が-O-で中断された基としては、メトキシ、エトキシ、プロピルオキシ、イソプロピルオキシ、メトキシメチル、エトキシメチル、2-メトキシエチル等が挙げられ、該アルキル基中のメチレン基が-S-で中断された基としては、メチルチオ、エチルチオ、ブチルチオ、ペンチルチオ等が挙げられ、該アルキル基中のメチレン基が二重結合で中断された基としては、アリル、3-ブテニル等が挙げられる。 Examples of the alkyl group having 1 to 10 carbon atoms represented by X and Z in the general formula (I) include methyl, ethyl, propyl, butyl, amyl, hexyl, heptyl, octyl, nonyl, decyl and the like. Examples of the group in which the methylene group in the alkyl group is interrupted by —O— include methoxy, ethoxy, propyloxy, isopropyloxy, methoxymethyl, ethoxymethyl, 2-methoxyethyl and the like. Examples of the group in which the methylene group is interrupted by —S— include methylthio, ethylthio, butylthio, pentylthio and the like, and examples of the group in which the methylene group in the alkyl group is interrupted by a double bond include allyl, 3-butenyl Etc.
 上記一般式(I)におけるX及びZで表される炭素原子数6~20のアリール基としては、例えば、フェニル、1-ナフチル、2-ナフチル、1-アントリル、1-フェナントリル、o-トリル、m-トリル、p-トリル、3-フルオレニル、9-フルオレニル、1-テトラヒドロナフチル、2-テトラヒドロナフチル、1-アセナフテニル、1-インダニル、2-インダニル、ビフェニル等が挙げられ、該アリール基の結合部が-O-で中断された基としてはフェノキシ、1-ナフトキシ、2-ナフトキシ、1-アントリルオキシ、1-フェナントリルオキシ、o-トリルオキシ、m-トリルオキシ、p-トリルオキシ、9-フルオレニルオキシ、1-インダニルオキシ、2-インダニルオキシ等が挙げられ、該アリール基の結合部が-S-で中断された基としてはフェニルチオ、1-ナフチルチオ、2-ナフチルチオ、1-アントリルチオ、1-フェナントリルチオ、o-トリルチオ、m-トリルチオ、p-トリルチオ、9-フルオレニルチオ、1-テトラヒドロナフチルチオ、2-テトラヒドロナフチルチオ、1-インダニルチオ、2-インダニルチオ等が挙げられ、該アリール基の結合部が二重結合で中断された基としてはスチリル等が挙げられる。 Examples of the aryl group having 6 to 20 carbon atoms represented by X and Z in the general formula (I) include phenyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 1-phenanthryl, o-tolyl, m-tolyl, p-tolyl, 3-fluorenyl, 9-fluorenyl, 1-tetrahydronaphthyl, 2-tetrahydronaphthyl, 1-acenaphthenyl, 1-indanyl, 2-indanyl, biphenyl and the like. Groups interrupted by —O— include phenoxy, 1-naphthoxy, 2-naphthoxy, 1-anthryloxy, 1-phenanthryloxy, o-tolyloxy, m-tolyloxy, p-tolyloxy, 9-fluore Nyloxy, 1-indanyloxy, 2-indanyloxy and the like, and the bond part of the aryl group is- The groups interrupted by — include phenylthio, 1-naphthylthio, 2-naphthylthio, 1-anthrylthio, 1-phenanthrylthio, o-tolylthio, m-tolylthio, p-tolylthio, 9-fluorenylthio, 1-tetrahydronaphthylthio, Examples include 2-tetrahydronaphthylthio, 1-indanylthio, 2-indanylthio and the like, and examples of the group in which the bond portion of the aryl group is interrupted by a double bond include styryl.
 上記一般式(I)におけるX及びZで表される炭素原子数7~20のアリールアルキル基としては、例えば、ベンジル、フェネチル、2-フェニルプロピル、ジフェニルメチル、トリフェニルメチル等が挙げられ、該アリールアルキル基中のメチレン基が-O-で中断された基としては、ベンジルオキシ、フェノキシメチル、フェノキシエチル、1-ナフチルメトキシ基、2-ナフチルメトキシ基、1-アントリルメトキシ等が挙げられ、該アリールアルキル基中のメチレン基が-S-で中断された基としては、ベンジルチオ、フェニルチオメチル、フェニルチオエチル等が挙げられ、該アリールアルキル基中のメチレン基が二重結合で中断された基としては、シンナミル等が挙げられる。 Examples of the arylalkyl group having 7 to 20 carbon atoms represented by X and Z in the general formula (I) include benzyl, phenethyl, 2-phenylpropyl, diphenylmethyl, triphenylmethyl and the like. Examples of the group in which the methylene group in the arylalkyl group is interrupted by —O— include benzyloxy, phenoxymethyl, phenoxyethyl, 1-naphthylmethoxy group, 2-naphthylmethoxy group, 1-anthrylmethoxy, and the like. Examples of the group in which the methylene group in the arylalkyl group is interrupted by —S— include benzylthio, phenylthiomethyl, phenylthioethyl, etc., and the methylene group in the arylalkyl group is interrupted by a double bond. Examples of the group include cinnamyl.
 上記一般式(I)におけるX及びZで表される炭素原子数2~20の複素環基としては、例えば、ピロリル、ピリジル、ピリミジル、ピリダジル、ピペラジル、ピペリジル、ピラニル、ピラゾリル、トリアジル、ピロリジル、キノリル、イソキノリル、イミダゾリル、ベンゾイミダゾリル、トリアゾリル、フリル、フラニル、ベンゾフラニル、チエニル、チオフェニル、ベンゾチオフェニル、チアジアゾリル、チアゾリル、ベンゾチアゾリル、オキサゾリル、ベンゾオキサゾリル、イソチアゾリル、イソオキサゾリル、インドリル、ユロリジル、モルフォリニル、チオモルフォリニル、2-ピロリジノン-1-イル、2-ピペリドン-1-イル、2,4-ジオキシイミダゾリジン-3-イル、2,4-ジオキシオキサゾリジン-3-イル等が挙げられる。 Examples of the heterocyclic group having 2 to 20 carbon atoms represented by X and Z in the general formula (I) include pyrrolyl, pyridyl, pyrimidyl, pyridazyl, piperazyl, piperidyl, pyranyl, pyrazolyl, triazyl, pyrrolidyl, quinolyl. , Isoquinolyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, urolidyl, morpholinyl, thiomorpholinyl 2-pyrrolidinon-1-yl, 2-piperidone-1-yl, 2,4-dioxyimidazolidin-3-yl, 2,4-dioxyoxazolidine-3-yl, etc. And the like.
 上記一般式(I)における隣接するZ同士で形成される芳香環としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ピレン環等が挙げられる。 Examples of the aromatic ring formed by adjacent Zs in the general formula (I) include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a pyrene ring.
 上記一般式(I)におけるX及びZで表されるハロゲン原子、並びに上記一般式(I)におけるX及びZで表されるアルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及び隣接するZ同士で形成される芳香環を置換してもよいハロゲン原子としては、フッ素、塩素、臭素、ヨウ素が挙げられる。 The halogen atom represented by X and Z in the above general formula (I), and the alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and X and Z represented by the above general formula (I) and Examples of the halogen atom that may substitute the aromatic ring formed between adjacent Zs include fluorine, chlorine, bromine, and iodine.
 上記一般式(I)におけるX及びZで表わされるアルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及びZ同士で形成される芳香環は置換基を有してもよく、例えば、メチル、エチル、プロピル、イソプロピル、シクロプロピル、ブチル、第二ブチル、第三ブチル、イソブチル、アミル、イソアミル、第三アミル、シクロペンチル、ヘキシル、2-ヘキシル、3-ヘキシル、シクロヘキシル、ビシクロヘキシル、1-メチルシクロヘキシル、ヘプチル、2-ヘプチル、3-ヘプチル、イソヘプチル、第三ヘプチル、n-オクチル、イソオクチル、第三オクチル、2-エチルヘキシル、ノニル、イソノニル、デシル等のアルキル基;メチルオキシ、エチルオキシ、プロピルオキシ、イソプロピルオキシ、ブチルオキシ、第二ブチルオキシ、第三ブチルオキシ、イソブチルオキシ、アミルオキシ、イソアミルオキシ、第三アミルオキシ、ヘキシルオキシ、シクロヘキシルオキシ、ヘプチルオキシ、イソヘプチルオキシ、第三ヘプチルオキシ、n-オクチルオキシ、イソオクチルオキシ、第三オクチルオキシ、2-エチルヘキシルオキシ、ノニルオキシ、デシルオキシ等のアルコキシ基;メチルチオ、エチルチオ、プロピルチオ、イソプロピルチオ、ブチルチオ、第二ブチルチオ、第三ブチルチオ、イソブチルチオ、アミルチオ、イソアミルチオ、第三アミルチオ、ヘキシルチオ、シクロヘキシルチオ、ヘプチルチオ、イソヘプチルチオ、第三ヘプチルチオ、n-オクチルチオ、イソオクチルチオ、第三オクチルチオ、2-エチルヘキシルチオ等のアルキルチオ基;ビニル、1-メチルエテニル、2-メチルエテニル、2-プロペニル、1-メチル-3-プロペニル、3-ブテニル、1-メチル-3-ブテニル、イソブテニル、3-ペンテニル、4-ヘキセニル、シクロヘキセニル、ビシクロヘキセニル、ヘプテニル、オクテニル、デセニル、ぺンタデセニル、エイコセニル、トリコセニル等のアルケニル基;ベンジル、フェネチル、ジフェニルメチル、トリフェニルメチル、スチリル、シンナミル等のアリールアルキル基;フェニル、ナフチル等のアリール基;フェノキシ、ナフチルオキシ等のアリールオキシ基;フェニルチオ、ナフチルチオ等のアリールチオ基;アセチル、2-クロロアセチル、プロピオニル、オクタノイル、アクリロイル、メタクリロイル、フェニルカルボニル(ベンゾイル)、フタロイル、4-トリフルオロメチルベンゾイル、ピバロイル、サリチロイル、オキザロイル、ステアロイル、メトキシカルボニル、エトキシカルボニル、t-ブトキシカルボニル、n-オクタデシルオキシカルボニル、カルバモイル等のアシル基;アセチルオキシ、ベンゾイルオキシ等のアシルオキシ基;アミノ、エチルアミノ、ジメチルアミノ、ジエチルアミノ、ブチルアミノ、シクロペンチルアミノ、2-エチルヘキシルアミノ、ドデシルアミノ、アニリノ、クロロフェニルアミノ、トルイジノ、アニシジノ、N-メチル-アニリノ、ジフェニルアミノ,ナフチルアミノ、2-ピリジルアミノ、メトキシカルボニルアミノ、フェノキシカルボニルアミノ、アセチルアミノ、ベンゾイルアミノ、ホルミルアミノ、ピバロイルアミノ、ラウロイルアミノ、カルバモイルアミノ、N,N-ジメチルアミノカルボニルアミノ、N,N-ジエチルアミノカルボニルアミノ、モルホリノカルボニルアミノ、メトキシカルボニルアミノ、エトキシカルボニルアミノ、t-ブトキシカルボニルアミノ、n-オクタデシルオキシカルボニルアミノ、N-メチル-メトキシカルボニルアミノ、フェノキシカルボニルアミノ、スルファモイルアミノ、N,N-ジメチルアミノスルホニルアミノ、メチルスルホニルアミノ、ブチルスルホニルアミノ、フェニルスルホニルアミノ等の置換アミノ基;スルホンアミド基、スルホニル基、カルボキシル基、シアノ基、スルホ基、水酸基、ニトロ基、メルカプト基、イミド基、カルバモイル基、スルホンアミド基等が挙げられ、これらの基は更に置換されてもよい。尚、炭素原子を有する置換基で置換される場合は、該置換基を含めた上記一般式(I)におけるX及びZで表されるアルキル基、アリール基、アリールアルキル基、複素環基、シクロヘキシル基及び隣接するZ同士で形成される芳香環の炭素原子数が規定された炭素原子数の範囲を満たすものとする。 The alkyl group, the aryl group, the arylalkyl group, the heterocyclic group, the cycloalkyl group and the aromatic ring formed between Z and represented by X and Z in the general formula (I) may have a substituent. , Methyl, ethyl, propyl, isopropyl, cyclopropyl, butyl, sec-butyl, tert-butyl, isobutyl, amyl, isoamyl, tert-amyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, bicyclohexyl, 1 -Alkyl groups such as methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, tertiary heptyl, n-octyl, isooctyl, tertiary octyl, 2-ethylhexyl, nonyl, isononyl, decyl; methyloxy, ethyloxy, propyl Oxy, isopropyloxy, butyloxy Secondary butyloxy, tertiary butyloxy, isobutyloxy, amyloxy, isoamyloxy, tertiary amyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, tertiary heptyloxy, n-octyloxy, isooctyloxy, tertiary Alkoxy groups such as octyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy; methylthio, ethylthio, propylthio, isopropylthio, butylthio, sec-butylthio, tert-butylthio, isobutylthio, amylthio, isoamylthio, tert-amylthio, hexylthio, cyclohexyl Alkylthio such as thio, heptylthio, isoheptylthio, tertiary heptylthio, n-octylthio, isooctylthio, tertiary octylthio, 2-ethylhexylthio, etc. Groups: vinyl, 1-methylethenyl, 2-methylethenyl, 2-propenyl, 1-methyl-3-propenyl, 3-butenyl, 1-methyl-3-butenyl, isobutenyl, 3-pentenyl, 4-hexenyl, cyclohexenyl, bicyclo Alkenyl groups such as hexenyl, heptenyl, octenyl, decenyl, pentadecenyl, eicosenyl and tricosenyl; arylalkyl groups such as benzyl, phenethyl, diphenylmethyl, triphenylmethyl, styryl and cinnamyl; aryl groups such as phenyl and naphthyl; phenoxy and naphthyl Aryloxy groups such as oxy; arylthio groups such as phenylthio and naphthylthio; acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, phenylcarbonyl (benzoyl) , Phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, oxaloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl, carbamoyl, and other acyl groups; acetyloxy, benzoyloxy, and other acyloxy groups Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino, toluidino, anisidino, N-methyl-anilino, diphenylamino, naphthylamino, 2-pyridylamino, Methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzoylamino, formylamino, pivaloylamino, Roylamino, carbamoylamino, N, N-dimethylaminocarbonylamino, N, N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl -Substituted amino groups such as methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, N, N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonylamino; sulfonamide group, sulfonyl group, carboxyl group, A cyano group, a sulfo group, a hydroxyl group, a nitro group, a mercapto group, an imide group, a carbamoyl group, a sulfonamide group, etc., and these groups are further substituted. Good. In addition, when substituted with a substituent having a carbon atom, the alkyl group, aryl group, arylalkyl group, heterocyclic group, cyclohexyl represented by X and Z in the general formula (I) including the substituent The number of carbon atoms of the aromatic ring formed by the group and adjacent Zs shall satisfy the specified range of the number of carbon atoms.
 上記一般式(I)で表わされるエピスルフィド化合物及び後述する上記一般式(II)で表わされるエピスルフィド化合物において、nが0でない時は光学異性体が存在する場合があるが、どの異性体であってもよく、以下の本文中に示す化合物は、特定の光学異性体に制限するものではない。 In the episulfide compound represented by the general formula (I) and the episulfide compound represented by the general formula (II) described later, when n is not 0, an optical isomer may exist. The compounds shown in the following text are not limited to specific optical isomers.
 上記一般式(I)で表わされるエピスルフィド化合物としては、例えば、下記の化合物No.1~No.13に示される化合物が挙げられる。尚、下記化学式中、nは0~10の数を表す。但し、本発明は以下の化合物により何ら制限を受けるものではない。 Examples of the episulfide compound represented by the general formula (I) include the following compound No. 1-No. The compound shown by 13 is mentioned. In the chemical formula below, n represents a number from 0 to 10. However, the present invention is not limited by the following compounds.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 上記一般式(I)で表されるエピスルフィド化合物の中でも、上記一般式(I)中、X及びZが炭素原子数1~10のアルキル基又は炭素原子数6~20のアリール基であり、p及びrが0~2であり、nが0~5である化合物が、保存安定性が良いため好ましく、特に、下記i)~iii)の化合物は、原料が入手容易であり生産性が良いため更に好ましい。
i)下記一般式(III)で表される化合物。
Figure JPOXMLDOC01-appb-C000010
(式中、A1、A2、Z、r及びnは上記一般式(I)と同じである。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
ii)上記一般式(I)中、Xが炭素原子数6~20のアリール基であり、pが0又は1であり、nが0~2である化合物。
iii)上記一般式(III)中、nが0~2である化合物。
Among the episulfide compounds represented by the general formula (I), in the general formula (I), X and Z are alkyl groups having 1 to 10 carbon atoms or aryl groups having 6 to 20 carbon atoms, p And compounds in which r is 0 to 2 and n is 0 to 5 are preferred because of their good storage stability. In particular, the following compounds i) to iii) are easy to obtain from raw materials and have good productivity. Further preferred.
i) A compound represented by the following general formula (III).
Figure JPOXMLDOC01-appb-C000010
(In the formula, A 1 , A 2 , Z, r and n are the same as those in the general formula (I). The optical isomer present when n is not 0 may be any isomer.)
ii) A compound in which, in the above general formula (I), X is an aryl group having 6 to 20 carbon atoms, p is 0 or 1, and n is 0 to 2.
iii) A compound wherein n is 0-2 in the above general formula (III).
 上記一般式(I)で表わされるエピスルフィド化合物の製造方法は、特に限定されるものではないが、例えば、下記反応式に示すように、エポキシ誘導体(1)とチオ尿素とを反応させることにより、上記一般式(I)で表わされるエピスルフィド化合物を容易に製造することができる。 The method for producing the episulfide compound represented by the general formula (I) is not particularly limited. For example, as shown in the following reaction formula, by reacting the epoxy derivative (1) with thiourea, The episulfide compound represented by the general formula (I) can be easily produced.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 また、反応に用いるチオ尿素の量や、反応時間を増減することにより原料であるエポキシ誘導体におけるオキシラン環中の酸素原子の硫黄原子へ置換の割合(硫黄置換率)を任意に制御することが可能であり、目的に応じて一部原料であるエポキシ誘導体や、生成物中に未置換のオキシラン環を残したまま本発明のエピスルフィド化合物として用いてもよい。硫黄置換率は高いほど硬化物の屈折率が高くなるため、好ましくは50%~100%であり、更に好ましくは80%~100%である。 In addition, by changing the amount of thiourea used in the reaction and the reaction time, it is possible to arbitrarily control the ratio of substitution of oxygen atoms to sulfur atoms in the oxirane ring (sulfur substitution rate) in the epoxy derivative as a raw material. Depending on the purpose, it may be used as an episulfide compound of the present invention while leaving an unsubstituted oxirane ring in the product, or an epoxy derivative as a part of the raw material. The higher the sulfur substitution rate, the higher the refractive index of the cured product. Therefore, it is preferably 50% to 100%, and more preferably 80% to 100%.
 次に、上記一般式(II)で表わされるエピスルフィド化合物について説明する。尚、以下の説明において、特に説明しない部分については、上記一般式(I)で表わされるエピスルフィド化合物における説明の内容が適宜適用される。 Next, the episulfide compound represented by the general formula (II) will be described. In the following description, the contents of the description in the episulfide compound represented by the above general formula (I) are appropriately applied to portions not specifically described.
 上記一般式(II)におけるY1、Y2及びZで表される炭素原子数1~10のアルキル基、及び該アルキル基中のメチレン基が-O-、-S-、又は二重結合で中断された基としては、上記一般式(I)の説明で例示した基が挙げられる。 In the general formula (II), the alkyl group having 1 to 10 carbon atoms represented by Y 1 , Y 2 and Z, and the methylene group in the alkyl group are —O—, —S—, or a double bond. Examples of the interrupted group include the groups exemplified in the description of the general formula (I).
 上記一般式(II)におけるY1、Y2及びZで表される炭素原子数6~20のアリール基、及び該アリール基の結合部が-O-、-S-又は二重結合で中断された基としては、上記一般式(I)の説明で例示した基が挙げられる。 In the general formula (II), the aryl group having 6 to 20 carbon atoms represented by Y 1 , Y 2 and Z, and the bond part of the aryl group are interrupted by —O—, —S— or a double bond. Examples of the group include those exemplified in the description of the general formula (I).
 上記一般式(II)におけるY1、Y2及びZで表される炭素原子数7~20のアリールアルキル基、及び該アリールアルキル基中のメチレン基が-O-、-S-又は二重結合で中断された基としては、上記一般式(I)の説明で例示した基が挙げられる。 The arylalkyl group having 7 to 20 carbon atoms represented by Y 1 , Y 2 and Z in the general formula (II), and the methylene group in the arylalkyl group are —O—, —S— or a double bond Examples of the group interrupted in the above include the groups exemplified in the description of the general formula (I).
 上記一般式(II)におけるY1、Y2及びZで表される炭素原子数2~20の複素環基としては、上記一般式(I)の説明で例示した基が挙げられる。 Examples of the heterocyclic group having 2 to 20 carbon atoms represented by Y 1 , Y 2 and Z in the general formula (II) include groups exemplified in the description of the general formula (I).
 上記一般式(II)におけるY1、Y2及びZで表される炭素原子数3~10のシクロアルキル基としては、上記一般式(I)の説明で例示した基が挙げられる。 Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by Y 1 , Y 2 and Z in the general formula (II) include groups exemplified in the description of the general formula (I).
 上記一般式(II)における隣接するY1が結合して形成される環構造としては、上記一般式(I)における芳香環として例示したものに加えて、シクロペンタン環、シクロヘキサン環、シクロペンテン環、ピペリジン環、モルホリン環、ラクトン環、ラクタム環等の5~7員環、フルオレン環、アセナフテン環、インダン環、テトラリン環等の縮合環が挙げられる。 The ring structure formed by bonding adjacent Y 1 in the general formula (II) includes, in addition to those exemplified as the aromatic ring in the general formula (I), a cyclopentane ring, a cyclohexane ring, a cyclopentene ring, Examples thereof include 5- to 7-membered rings such as piperidine ring, morpholine ring, lactone ring and lactam ring, and condensed rings such as fluorene ring, acenaphthene ring, indane ring and tetralin ring.
 上記一般式(II)におけるY1、Y2及びZで表されるハロゲン原子、並びに上記一般式(II)におけるY1、Y2及びZで表されるアルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及び隣接するY1が結合して形成される環構造を置換してもよいハロゲン原子としては、上記一般式(I)の説明で例示した基が挙げられる。 The halogen atom represented by Y 1 , Y 2 and Z in the general formula (II), and the alkyl group, aryl group, arylalkyl group represented by Y 1 , Y 2 and Z in the general formula (II); Examples of the halogen atom that may substitute the ring structure formed by bonding of the heterocyclic group, the cycloalkyl group and the adjacent Y 1 include the groups exemplified in the description of the general formula (I).
 上記一般式(II)に置けるY1、Y2及びZで表されるアルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及び隣接するY1が結合して形成される環構
造は置換基を有してもよく、これらの置換基としては、上記一般式(I)の説明で例示した基が挙げられ、これらの基は更に置換されてもよい。尚、炭素原子を有する置換基で置換される場合は、該置換基を含めた上記一般式(II)に置けるY1、Y2及びZで表されるアルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基、及び隣接するZ同士で形成される環構造の炭素原子数が規定された炭素原子数の範囲を満たすものとする。
Ring structure formed by bonding of alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and adjacent Y 1 represented by Y 1 , Y 2 and Z in the general formula (II) May have a substituent, and examples of these substituents include the groups exemplified in the description of the general formula (I), and these groups may be further substituted. In addition, when substituted with a substituent having a carbon atom, an alkyl group represented by Y 1 , Y 2 and Z, an aryl group, an arylalkyl group, which can be placed in the general formula (II) including the substituent, The number of carbon atoms in a ring structure formed by a heterocyclic group, a cycloalkyl group, and adjacent Z's shall satisfy the specified range of carbon atoms.
 上記一般式(II)で表わされるエピスルフィド化合物としては、例えば、下記の化合物No.14~No.62に示される化合物が挙げられる。尚、下記化学式中、nは0~10の数を表す。但し、本発明は以下の化合物により何ら制限を受けるものではない。 As the episulfide compound represented by the general formula (II), for example, the following compound No. 14-No. The compound shown by 62 is mentioned. In the chemical formula below, n represents a number from 0 to 10. However, the present invention is not limited by the following compounds.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 上記一般式(II)で表されるエピスルフィド化合物の中でも、以下のiv)~ix)の化合物は、原料が入手容易であり生産性がよく、高屈折率の硬化物が得られるため好ましい。
 iv)上記一般式(II)中、xが2又は3であり、yが0であり、Y1が炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基又は隣接するY1同士で形成した環が芳香環となる基であり、Y2及びZは炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基であり、q及びrが0~2である化合物。
 v)下記一般式(IV)で表される化合物。
Figure JPOXMLDOC01-appb-C000023
(式中、Y2’は上記一般式(II)のY2と同じ又は水素原子を表し、x’は1又は2であり、A1及びA2は上記一般式(II)と同じであり、Y1、Z、n、q及びrは上記一般式(II)と同じである。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
 vi)上記一般式(II)又は(IV)中、nが0~5である化合物。
 vii)上記一般式(II)又は(IV)中、Y2がフェニル基である化合物。
 viii)上記一般式(II)又は(IV)中、qが0又は1であり、qが1の時、Y1が炭素原子数1~10のアルキル基又は炭素原子数6~20のアリール基である化合物。
 ix)上記一般式(II)中、xは2であり、yは0であり、Y2はフェニル基であり、qは0であり、q’は0であり、qは1であり、rは0であり、nは0~2である化合物。   
Among the episulfide compounds represented by the above general formula (II), the following compounds iv) to ix) are preferable because the raw materials are easily available, the productivity is high, and a cured product having a high refractive index is obtained.
iv) In the above general formula (II), x is 2 or 3, y is 0, Y 1 is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or adjacent Y The ring formed by 1 is an aromatic ring, Y 2 and Z are an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 20 carbon atoms, and q and r are 0 to 2 A compound.
v) A compound represented by the following general formula (IV).
Figure JPOXMLDOC01-appb-C000023
(In the formula, Y 2 ′ is the same as Y 2 in the general formula (II) or represents a hydrogen atom, x ′ is 1 or 2, and A 1 and A 2 are the same as those in the general formula (II). , Y 1 , Z, n, q and r are the same as those in the general formula (II), and the optical isomers present when n is not 0 may be any isomers.)
vi) A compound wherein n is 0 to 5 in the above general formula (II) or (IV).
vii) A compound wherein Y 2 is a phenyl group in the above general formula (II) or (IV).
viii) In the above general formula (II) or (IV), when q is 0 or 1, and q is 1, Y 1 is an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 20 carbon atoms. A compound that is
ix) In the general formula (II), x is 2, y is 0, Y 2 is a phenyl group, q is 0, q ′ is 0, q is 1, r Is a compound in which n is 0 and n is 0-2.
 上記一般式(II)で表わされるエピスルフィド化合物の製造方法は、特に限定されるものではないが、例えば、下記反応式に示すように、エポキシ誘導体(2)とチオ尿素とを反応させることにより、上記一般式(II)で表わされるエピスルフィド化合物を容易に製造することができる。 The method for producing the episulfide compound represented by the general formula (II) is not particularly limited. For example, as shown in the following reaction formula, by reacting the epoxy derivative (2) with thiourea, The episulfide compound represented by the general formula (II) can be easily produced.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 本発明のエピスルフィド化合物は、以下に説明する硬化性樹脂組成物、並びに該硬化性樹脂組成物を加熱及び/又はエネルギー線を照射して得られる、硬化物としての用途のほか、コンクリート、セメントモルタル、各種金属、皮革、ガラス、ゴム、プラスチック、木、布、紙等に対する塗料或いは接着剤;包装用粘着テープ、粘着ラベル、冷凍食品ラベル、リムーバルラベル、POSラベル、粘着壁紙、粘着床材等の粘着剤;アート紙、軽量コート紙、キャストコート紙、塗工板紙、カーボンレス複写機、含侵紙等の加工紙;天然繊維、合成繊維、ガラス繊維、炭素繊維、金属繊維等の収束剤、ほつれ防止剤、加工剤等の繊維処理剤;シーリング剤、セメント混和剤、防水材等の建築材料;電子・電気機器用封止剤等の広範な用途に使用することができる。 The episulfide compound of the present invention includes a curable resin composition described below, and uses as a cured product obtained by heating and / or irradiating the curable resin composition with energy rays, as well as concrete and cement mortar. Paints or adhesives for various metals, leather, glass, rubber, plastic, wood, cloth, paper, etc .; adhesive tape for packaging, adhesive labels, frozen food labels, removable labels, POS labels, adhesive wallpaper, adhesive flooring, etc. Adhesives: Art paper, lightweight coated paper, cast coated paper, coated paperboard, carbonless copying machine, impregnated paper and other processed paper; natural fibers, synthetic fibers, glass fibers, carbon fibers, metal fibers and other sizing agents, Used for a wide range of applications such as anti-fraying agents, fiber treatment agents such as processing agents, building materials such as sealing agents, cement admixtures, waterproofing materials, and sealants for electronic and electrical equipment. Rukoto can.
 次に、上記一般式(I)又は(II)で表される新規エピスルフィド化合物と硬化剤を含有する、本発明の硬化性樹脂組成物(以下、第1の硬化性樹脂組成物とも言う)について説明する。尚、以下の説明において、特に説明しない部分については、上記エピスルフィド化合物における説明の内容が適宜適用される。 Next, the curable resin composition of the present invention (hereinafter also referred to as the first curable resin composition) containing the novel episulfide compound represented by the general formula (I) or (II) and a curing agent. explain. In the following description, the description of the episulfide compound is appropriately applied to portions that are not particularly described.
 上記硬化剤としては、例えば、ジエチレントリアミン、トリエチレントリアミン、テトラエチレンペンタミン等のポリアルキルポリアミン類;ポリオキシプロピレンジアミン、ポリオキシプロピレントリアミン等のポリエーテルポリアミン類;1,2-ジアミノシクロヘキサン、1,4-ジアミノ-3,6-ジエチルシクロヘキサン、イソホロンジアミン、メンセンジアミン、ノルボルネンジアミン、ビス(4-アミノ-3-メチルジシクロヘキシル)メタン、ジアミノジシクロヘキシルメタン、ビス(アミノメチル)シクロヘキサン、N-アミノメチルピペラジン、3,9-ビス(3-アミノプロピル)-2,4,8,10-テトラオキサスピロ(5,5)ウンデカン等の脂環式ポリアミン類;m-キシレンジアミン、α-(m/pアミノフェニル)エチルアミン、m-フェニレンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、ジアミノジエチルジメチルジフェニルメタン、ジアミノジエチルジフェニルメタン、ジメチルチオトルエンジアミン、ジエチルトルエンジアミン、α,α’-ビス(4-アミノフェニル)-p-ジイソプロピルベンゼン、ジチオジアニリン等の芳香族ポリアミン類等が挙げられる(以下、ポリアミン類とする)。また、これらのポリアミン類と、フェニルグリシジルエーテル、ブチルグリシジルエーテル、ビスフェノールA-ジグリシジルエーテル、ビスフェノールF-グリシジルエーテル等のグリシジルエーテル類又はカルボン酸のグリシジルエステル類等の各種エポキシ樹脂とを常法によって反応させることによって製造されるポリエポキシ付加変性物;これらのポリアミン類と、フタル酸、イソフタル酸、ダイマー酸等のカルボン酸類とを常法によって反応させることによって製造されるアミド化変性物;これらのポリアミン類とホルムアルデヒド等のアルデヒド類及びフェノール、クレゾール、キシレノール、t-ブチルフェノール、レゾルシン等の核に少なくとも一個のアルデヒド化反応性部位を有するフェノール類とを常法によって反応させることによって製造されるマンニッヒ化変性物等が挙げられる(以下、ポリアミン類の変性物とする)。更に、ジシアンジアミド、酸無水物、2-エチル-4メチルイミダゾール等のイミダゾール類等の潜在性硬化剤も使用できる。特に、前記のポリアミン類、前記ポリアミン類の変性物及びイミダゾール類が好ましく、イミダゾール類が保存安定性及び硬化性の点で更に好ましい。 Examples of the curing agent include polyalkylpolyamines such as diethylenetriamine, triethylenetriamine, and tetraethylenepentamine; polyether polyamines such as polyoxypropylenediamine and polyoxypropylenetriamine; 1,2-diaminocyclohexane, 1, 4-diamino-3,6-diethylcyclohexane, isophoronediamine, mensendiamine, norbornenediamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, bis (aminomethyl) cyclohexane, N-aminomethylpiperazine Alicyclic polyamines such as 3,9-bis (3-aminopropyl) -2,4,8,10-tetraoxaspiro (5,5) undecane; m-xylenediamine, α- (m / p amide) Phenyl) ethylamine, m-phenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, diaminodiethyldimethyldiphenylmethane, diaminodiethyldiphenylmethane, dimethylthiotoluenediamine, diethyltoluenediamine, α, α'-bis (4-aminophenyl) -p-diisopropyl Examples include aromatic polyamines such as benzene and dithiodianiline (hereinafter referred to as polyamines). In addition, these polyamines and glycidyl ethers such as phenyl glycidyl ether, butyl glycidyl ether, bisphenol A-diglycidyl ether, bisphenol F-glycidyl ether, or various epoxy resins such as glycidyl esters of carboxylic acid are used in a conventional manner. Polyepoxy addition-modified products produced by reacting; amidation-modified products produced by reacting these polyamines with carboxylic acids such as phthalic acid, isophthalic acid, and dimer acid; Polyamines and aldehydes such as formaldehyde and phenols having at least one aldehyde-reactive site in the nucleus such as phenol, cresol, xylenol, t-butylphenol and resorcinol are reacted in a conventional manner. Mannich-modified products such as produced by Rukoto the like (hereinafter referred to as modified products of polyamines). Furthermore, latent curing agents such as dicyandiamide, acid anhydrides, and imidazoles such as 2-ethyl-4methylimidazole can also be used. In particular, the polyamines, modified products of the polyamines, and imidazoles are preferable, and imidazoles are more preferable in terms of storage stability and curability.
 第1の硬化性樹脂組成物において、上記硬化剤の含有量は、上記エピスルフィド化合物100重量部に対して、好ましくは0.01~20重量部、より好ましくは0.1~5重量部である。硬化剤の含有量が0.01重量部未満では、硬化速度が遅かったり、硬化が不十分であり、20重量部超では、硬化物の強度が不十分である。 In the first curable resin composition, the content of the curing agent is preferably 0.01 to 20 parts by weight, more preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the episulfide compound. . When the content of the curing agent is less than 0.01 parts by weight, the curing rate is slow or the curing is insufficient, and when it exceeds 20 parts by weight, the strength of the cured product is insufficient.
 また、第1の硬化性樹脂組成物には、必要に応じて、硬化触媒;エポキシ化合物、オキセタン化合物、ジオクチルフタレート、ジブチルフタレート、ベンジルアルコール、コールタール等の、反応性及び/又は非反応性の希釈剤(可塑剤);ガラス繊維、炭素繊維、セルロース、ケイ砂、セメント、カオリン、クレー、水酸化アルミニウム、ベントナイト、タルク、シリカ、微粉末シリカ、二酸化チタン、カーボンブラック、グラファイト、酸化鉄、瀝青物質等の充填剤若しくは顔料;γ-アミノプロピルトリエトキシシラン、N-β-(アミノエチル)-γ-アミノプロピルトリエトキシシラン、N-β-(アミノエチル)-N’-β-(アミノエチル)-γ-アミノプロピルトリエトキシシラン、γ-アニリノプロピルトリエトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリエトキシシラン、ビニルトリエトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルトリエトキシシラン、γ-メタクリロキシプロピルトリメトキシシラン、γ-クロロプロピルトリメトキシシラン、γ-メルカプトプロピルトリメトキシシラン等のシランカップリング剤;界面活性剤;キャンデリラワックス、カルナウバワックス、木ろう、イボタロウ、みつろう、ラノリン、鯨ろう、モンタンワックス、石油ワックス、脂肪酸ワックス、脂肪酸エステル、脂肪酸エーテル、芳香族エステル、芳香族エーテル等の潤滑剤;増粘剤;チキソトロピック剤;酸化防止剤;光増感剤;光安定剤;紫外線吸収剤;難燃剤;消泡剤;防錆剤;保存安定剤;コロイダルシリカ、コロイダルアルミナ等の常用の添加物を含有してもよく、更に、キシレン樹脂、石油樹脂等の粘着性の樹脂類を併用することもできる。第1の硬化性樹脂組成物において、これらの任意の添加物は、上記エピスルフィド化合物100質量部に対し、好ましくは合計で500質量部以下である。 In addition, the first curable resin composition may include a curing catalyst; reactive and / or non-reactive, such as an epoxy compound, an oxetane compound, dioctyl phthalate, dibutyl phthalate, benzyl alcohol, and coal tar. Diluent (plasticizer): glass fiber, carbon fiber, cellulose, silica sand, cement, kaolin, clay, aluminum hydroxide, bentonite, talc, silica, fine powder silica, titanium dioxide, carbon black, graphite, iron oxide, bitumen Fillers or pigments such as substances; γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -N′-β- (aminoethyl ) -Γ-Aminopropyltriethoxysilane, γ-anilinopropyltriethoxysilane γ-glycidoxypropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, vinyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltriethoxysilane Silane coupling agents such as γ-methacryloxypropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, and γ-mercaptopropyltrimethoxysilane; surfactants; candelilla wax, carnauba wax, wood wax, ibotarou, beeswax , Lanolin, whale wax, montan wax, petroleum wax, fatty acid wax, fatty acid ester, fatty acid ether, aromatic ester, aromatic ether and other lubricants; thickeners; thixotropic agents; antioxidants; photosensitizers; Light stabilizer; UV absorber; Flame retardant Antifoaming agent; rust preventive agent; storage stabilizer; may contain conventional additives such as colloidal silica and colloidal alumina, and may also be used in combination with adhesive resins such as xylene resin and petroleum resin . In the first curable resin composition, these optional additives are preferably 500 parts by mass or less in total with respect to 100 parts by mass of the episulfide compound.
 上記反応性及び/又は非反応性の希釈剤(可塑剤)として用いてもよいエポキシ化合物としては、水素添加ビスフェノールAジグリシジルエーテル、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-1-メチルシクロヘキシル-3,4-エポキシ-1-メチルシクロヘキサンカルボキシレート、6-メチル-3,4-エポキシシクロヘキシルメチル-6-メチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-3-メチルシクロヘキシルメチル-3,4-エポキシ-3-メチルシクロヘキサンカルボキシレート、3,4-エポキシ-5-メチルシクロヘキシルメチル-3,4-エポキシ-5-メチルシクロヘキサンカルボキシレート、2-(3,4-エポキシシクロヘキシル-5,5-スピロ-3,4-エポキシ)シクロヘキサン-メタジオキサン、ビス(3,4-エポキシシクロヘキシルメチル)アジペート、3,4-エポキシ-6-メチルシクロヘキシルカルボキシレート、メチレンビス(3,4-エポキシシクロヘキサン)、ジシクロペンタジエンジエポキサイド、エチレンビス(3,4-エポキシシクロヘキサンカルボキシレート)、エポキシヘキサヒドロフタル酸ジオクチル、エポキシヘキサヒドロフタル酸ジ-2-エチルヘキシル、1,4-ブタンジオールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、グリセリンのトリグリシジルエーテル、トリメチロールプロパンのトリグリシジルエーテル、ソルビトールのテトラグリシジルエーテル、ジペンタエリスリトールのヘキサグリシジルエーテル、ポリエチレングリコールのジグリシジルエーテル、ポリプロピレングリコールのジグリシジルエーテル等の多価アルコールのグリシジルエーテル、またプロピレングリコール、トリメチロールプロパン、グリセリン等の脂肪族多価アルコールに1種又は2種以上のアルキレンオキサイドを付加することによって得られるポリエーテルポリオールのポリグリシジルエーテル、脂肪族長鎖二塩基酸のジグリシジルエステル、脂肪族高級アルコールのモノグリシジルエーテルやフェノール、クレゾール、ブチルフェノール、また、これらにアルキレンオキサイドを付加することによって得られるポリエーテルアルコールのモノグリシジルエーテル、高級脂肪酸のグリシジルエステル、エポキシ化大豆油、エポキシステアリン酸オクチル、エポキシステアリン酸ブチル、エポキシ化ポリブタジエン等が挙げられ、反応性及び/又は非反応性の希釈剤(可塑剤)として用いてもよいオキセタン化合物としては、3-エチル-3-ヒドロキシメチルオキセタン、3-(メタ)アリルオキシメチル-3-エチルオキセタン、(3-エチル-3-オキセタニルメトキシ)メチルベンゼン、4-フルオロ-[1-(3-エチル-3-オキセタニルメトキシ)メチル]ベンゼン、4-メトキシ-[1-(3-エチル-3-オキセタニルメトキシ)メチル]ベンゼン、[1-(3-エチル-3-オキセタニルメトキシ)エチル]フェニルエーテル、イソブトキシメチル(3-エチル-3-オキセタニルメチル)エーテル、イソボルニルオキシエチル(3-エチル-3-オキセタニルメチル)エーテル、イソボルニル(3-エチル-3-オキセタニルメチル)エーテル、2-エチルヘキシル(3-エチル-3-オキセタニルメチル)エーテル、エチルジエチレングリコール(3-エチル-3-オキセタニルメチル)エーテル、ジシクロペンタジエン(3-エチル-3-オキセタニルメチル)エーテル、ジシクロペンテニルオキシエチル(3-エチル-3-オキセタニルメチル)エーテル、ジシクロペンテニル(3-エチル-3-オキセタニルメチル)エーテル、テトラヒドロフルフリル(3-エチル-3-オキセタニルメチル)エーテル、テトラブロモフェニル(3-エチル-3-オキセタニルメチル)エーテル、2-テトラブロモフェノキシエチル(3-エチル-3-オキセタニルメチル)エーテル、トリブロモフェニル(3-エチル-3-オキセタニルメチル)エーテル、2-トリブロモフェノキシエチル(3-エチル-3-オキセタニルメチル)エーテル、2-ヒドロキシエチル(3-エチル-3-オキセタニルメチル)エーテル、2-ヒドロキシプロピル(3-エチル-3-オキセタニルメチル)エーテル、ブトキシエチル(3-エチル-3-オキセタニルメチル)エーテル、ペンタクロロフェニル(3-エチル-3-オキセタニルメチル)エーテル、ペンタブロモフェニル(3-エチル-3-オキセタニルメチル)エーテル、ボルニル(3-エチル-3-オキセタニルメチル)エーテル、3,7-ビス(3-オキセタニル)-5-オキサ-ノナン、3,3'-(1,3-(2-メチレニル)プロパンジイルビス(オキシメチレン))ビス-(3-エチルオキセタン)、1,4-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]ベンゼン、1,2-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]エタン、1,3-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]プロパン、エチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、ジシクロペンテニルビス(3-エチル-3-オキセタニルメチル)エーテル、トリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、テトラエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、トリシクロデカンジイルジメチレン(3-エチル-3-オキセタニルメチル)エーテル、トリメチロールプロパントリス(3-エチル-3-オキセタニルメチル)エーテル、1,4-ビス(3-エチル-3-オキセタニルメトキシ)ブタン、1,6-ビス(3-エチル-3-オキセタニルメトキシ)ヘキサン、ペンタエリスリトールトリス(3-エチル-3-オキセタニルメチル)エーテル、ペンタエリスリトールテトラキス(3-エチル-3-オキセタニルメチル)エーテル、ポリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールヘキサキス(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールペンタキス(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールテトラキス(3-エチル-3-オキセタニルメチル)エーテル、カプロラクトン変性ジペンタエリスリトールヘキサキス(3-エチル-3-オキセタニルメチル)エーテル、カプロラクトン変性ジペンタエリスリトールペンタキス(3-エチル-3-オキセタニルメチル)エーテル、ジトリメチロールプロパンテトラキス(3-エチル-3-オキセタニルメチル)エーテル、EO変性ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、PO変性ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、EO変性水添ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、PO変性水添ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、EO変性ビスフェノールF(3-エチル-3-オキセタニルメチル)エーテル等が挙げられる。 Examples of the epoxy compound that may be used as the reactive and / or non-reactive diluent (plasticizer) include hydrogenated bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate. 3,4-epoxy-1-methylcyclohexyl-3,4-epoxy-1-methylcyclohexanecarboxylate, 6-methyl-3,4-epoxycyclohexylmethyl-6-methyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-3-methylcyclohexylmethyl-3,4-epoxy-3-methylcyclohexanecarboxylate, 3,4-epoxy-5-methylcyclohexylmethyl-3,4-epoxy-5-methylcyclohexanecarboxylate, 2- (3 -Epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-metadioxane, bis (3,4-epoxycyclohexylmethyl) adipate, 3,4-epoxy-6-methylcyclohexylcarboxylate, methylenebis (3 4-epoxycyclohexane), dicyclopentadiene diepoxide, ethylene bis (3,4-epoxycyclohexanecarboxylate), dioctyl epoxy hexahydrophthalate, di-2-ethylhexyl epoxy hexahydrophthalate, 1,4-butanediol di Glycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin triglycidyl ether, trimethylolpropane triglycidyl ether, sorbitol tetraglycidyl ether, di One or two of glycidyl ethers of polyhydric alcohols such as hexaglycidyl ether of intertaerythritol, diglycidyl ether of polyethylene glycol, diglycidyl ether of polypropylene glycol, and aliphatic polyhydric alcohols such as propylene glycol, trimethylolpropane and glycerin Polyglycidyl ether of polyether polyol obtained by adding more than one kind of alkylene oxide, diglycidyl ester of aliphatic long chain dibasic acid, monoglycidyl ether of aliphatic higher alcohol, phenol, cresol, butylphenol, etc. Monoglycidyl ether of polyether alcohol obtained by adding alkylene oxide, glycidyl ester of higher fatty acid, large epoxidation Examples of the oxetane compound that may be used as a reactive and / or non-reactive diluent (plasticizer) include soybean oil, octyl epoxy stearate, butyl epoxy stearate, epoxidized polybutadiene, and the like. -Hydroxymethyloxetane, 3- (meth) allyloxymethyl-3-ethyloxetane, (3-ethyl-3-oxetanylmethoxy) methylbenzene, 4-fluoro- [1- (3-ethyl-3-oxetanylmethoxy) methyl Benzene, 4-methoxy- [1- (3-ethyl-3-oxetanylmethoxy) methyl] benzene, [1- (3-ethyl-3-oxetanylmethoxy) ethyl] phenyl ether, isobutoxymethyl (3-ethyl- 3-Oxetanylmethyl) ether, isobornyloxyethyl (3- Til-3-oxetanylmethyl) ether, isobornyl (3-ethyl-3-oxetanylmethyl) ether, 2-ethylhexyl (3-ethyl-3-oxetanylmethyl) ether, ethyl diethylene glycol (3-ethyl-3-oxetanylmethyl) ether Dicyclopentadiene (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyl (3-ethyl-3-oxetanylmethyl) ether, tetrahydrofur Furyl (3-ethyl-3-oxetanylmethyl) ether, tetrabromophenyl (3-ethyl-3-oxetanylmethyl) ether, 2-tetrabromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether , Tribromophenyl (3-ethyl-3-oxetanylmethyl) ether, 2-tribromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether, 2-hydroxyethyl (3-ethyl-3-oxetanylmethyl) ether 2-hydroxypropyl (3-ethyl-3-oxetanylmethyl) ether, butoxyethyl (3-ethyl-3-oxetanylmethyl) ether, pentachlorophenyl (3-ethyl-3-oxetanylmethyl) ether, pentabromophenyl (3 -Ethyl-3-oxetanylmethyl) ether, bornyl (3-ethyl-3-oxetanylmethyl) ether, 3,7-bis (3-oxetanyl) -5-oxa-nonane, 3,3 '-(1,3- (2-Methylenyl) propanediylbis (oxymethylene) ) Bis- (3-ethyloxetane), 1,4-bis [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, 1,2-bis [(3-ethyl-3-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenylbis (3-ethyl-3-oxetanylmethyl) ether , Triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tricyclodecanediyldimethylene (3-ethyl-3-oxetanylmethyl) ether , Trimethylolpropane tris (3-ethyl-3-o Xetanylmethyl) ether, 1,4-bis (3-ethyl-3-oxetanylmethoxy) butane, 1,6-bis (3-ethyl-3-oxetanylmethoxy) hexane, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ) Ether, pentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, polyethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol hexakis (3-ethyl-3-oxetanylmethyl) ether, Dipentaerythritol pentakis (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol hexakis 3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol pentakis (3-ethyl-3-oxetanylmethyl) ether, ditrimethylolpropanetetrakis (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol A Bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO Modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol F (3-ethyl-3-oxetanylmethyl) ether, and the like.
 第1の硬化性樹脂組成物には、溶媒を含有させてもよい。この場合、溶媒の使用量は、上記エピスルフィド化合物及び上記硬化剤の合計の含有量が、第1の硬化性樹脂組成物中、好ましくは5~90質量%、更に好ましくは10~50質量%の範囲になるようにするとよい。該溶媒の具体例としては、例えば、メチルエチルケトン、メチルアミルケトン、ジエチルケトン、アセトン、メチルイソプロピルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;エチルエーテル、ジオキサン、テトラヒドロフラン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、ジプロピレングリコールジメチルエーテル等のエーテル系溶媒;酢酸メチル、酢酸エチル、酢酸-n-プロピル、酢酸イソプロピル、酢酸-n-ブチル等のエステル系溶媒;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテルアセテート等のセルソルブ系溶媒;メタノール、エタノール、イソ-又はn-プロパノール、イソ-又はn-ブタノール、アミルアルコール等のアルコール系溶媒;ベンゼン、トルエン、キシレン等のBTX系溶媒;ヘキサン、ヘプタン、オクタン、シクロヘキサン等の脂肪族炭化水素系溶媒;テレピン油、D-リモネン、ピネン等のテルペン系炭化水素油;ミネラルスピリット、スワゾール#310(コスモ松山石油(株))、ソルベッソ#100(エクソン化学(株))等のパラフィン系溶媒;四塩化炭素、クロロホルム、トリクロロエチレン、塩化メチレン等のハロゲン化脂肪族炭化水素系溶媒;クロロベンゼン等のハロゲン化芳香族炭化水素系溶媒;カルビトール系溶媒、アニリン、トリエチルアミン、ピリジン、酢酸、アセトニトリル、二硫化炭素、N,N-ジメチルホルムアミド、N-メチルピロリドン等が挙げられ、中でも、ケトン類或いはセロソルブ系溶媒が好ましい。また、上記エピスルフィド化合物を合成する際に用いた溶媒を除去せず、そのまま第1の硬化性樹脂組成物に含有させてもよい。 The first curable resin composition may contain a solvent. In this case, the amount of the solvent used is such that the total content of the episulfide compound and the curing agent is preferably 5 to 90% by mass, more preferably 10 to 50% by mass in the first curable resin composition. It should be in the range. Specific examples of the solvent include ketones such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, and cyclohexanone; ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1 Ether solvents such as 1,2-diethoxyethane and dipropylene glycol dimethyl ether; ester solvents such as methyl acetate, ethyl acetate, acetic acid-n-propyl, isopropyl acetate, and n-butyl acetate; ethylene glycol monomethyl ether, ethylene glycol Cellosolve solvents such as monoethyl ether, propylene glycol monomethyl ether acetate; methanol, ethanol, iso- or n-propanol, iso- or n-butanol, amyla Alcohol solvents such as coal; BTX solvents such as benzene, toluene and xylene; aliphatic hydrocarbon solvents such as hexane, heptane, octane and cyclohexane; terpene hydrocarbon oils such as terpine oil, D-limonene and pinene; Paraffinic solvents such as Mineral Spirit, Swazol # 310 (Cosmo Matsuyama Oil Co., Ltd.), Solvesso # 100 (Exxon Chemical Co., Ltd.); Halogenated aliphatic hydrocarbons such as carbon tetrachloride, chloroform, trichloroethylene, and methylene chloride Solvents: halogenated aromatic hydrocarbon solvents such as chlorobenzene; carbitol solvents, aniline, triethylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, N, N-dimethylformamide, N-methylpyrrolidone, etc. , Ketones or cellosolve solvents It is preferred. Moreover, you may make it contain in the 1st curable resin composition as it is, without removing the solvent used when synthesize | combining the said episulfide compound.
 第1の硬化性樹脂組成物は加熱処理することにより硬化することができる。加熱処理は、好ましくは100~300℃の範囲で、10~240分加熱するとよい。 The first curable resin composition can be cured by heat treatment. The heat treatment is preferably performed in the range of 100 to 300 ° C. for 10 to 240 minutes.
 次に、上記一般式(I)又は(II)で表される新規エピスルフィド化合物とエネルギー線感受性カチオン重合開始剤を含有する、本発明の硬化性樹脂組成物(以下、第2の硬化性樹脂組成物とも言う)について説明する。尚、以下の説明において、特に説明しない部分については、上記エピスルフィド化合物及び第1の硬化性樹脂組成物における説明の内容が適宜適用される。 Next, the curable resin composition of the present invention (hereinafter referred to as the second curable resin composition) containing the novel episulfide compound represented by the general formula (I) or (II) and an energy ray-sensitive cationic polymerization initiator. (Also called things). In addition, in the following description, the content of the description in the said episulfide compound and the 1st curable resin composition is applied suitably about the part which is not demonstrated especially.
 上記エネルギー線感受性開始剤は、エネルギー線感受性照射、より具体的には後述するようなエネルギー線の照射によりカチオン重合を開始させる物質を放出することが可能な化合物である。 The energy beam sensitive initiator is a compound capable of releasing a substance that initiates cationic polymerization by energy beam sensitive irradiation, more specifically, energy beam irradiation as described later.
 上記エネルギー線感受性カチオン重合開始剤として特に好ましいものとしては、エネルギー線感受性照射によってルイス酸を放出するオニウム塩である複塩、又はその誘導体が挙げられる。かかる化合物の代表的なものとしては、一般式、[A]y+[B]y-で表される陽イオンと陰イオンとの塩を挙げることができる。 Particularly preferable examples of the energy ray-sensitive cationic polymerization initiator include a double salt that is an onium salt that releases a Lewis acid by energy ray-sensitive irradiation, or a derivative thereof. A typical example of such a compound is a salt of a cation and an anion represented by the general formula [A] y + [B] y- .
 ここで、陽イオン[A]y+はオニウムであることが好ましく、その構造は例えば、[(R)xQ]y+で表すことができる。 Here, the cation [A] y + is preferably onium, and the structure can be represented by, for example, [(R) x Q] y + .
 更にここで、Rは炭素数が1~60であり、炭素以外の原子をいくつ含んでもよい有機基であり、xは1~5の整数である。x個のRは各々独立で、同一でも異なっていてもよい。また、x個のRのうち少なくとも一つは、芳香族基であることが好ましい。Qは、S、N、Se、Te、P、As、Sb、Bi、O、I、Br、Cl、F及びN=Nからなる群から選ばれる原子或いは原子団である。また、陽イオン[A]y+中のQの原子価をzとしたとき、y=x-zの関係が成り立つことが必要である。 Further, here, R is an organic group having 1 to 60 carbon atoms and may contain any number of atoms other than carbon, and x is an integer of 1 to 5. The x Rs are independent and may be the same or different. Further, at least one of x R is preferably an aromatic group. Q is an atom or atomic group selected from the group consisting of S, N, Se, Te, P, As, Sb, Bi, O, I, Br, Cl, F, and N = N. Further, when the valence of Q in the cation [A] y + is z, it is necessary that the relationship y = xz is established.
 また、陰イオン[B]y-は、ハロゲン化物錯体であることが好ましく、その構造は例えば、[LXs]y-で表すことができる。 The anion [B] y− is preferably a halide complex, and the structure thereof can be represented by [LX s ] y− , for example.
 更にここで、Lはハロゲン化物錯体の中心原子である金属又は半金属(Metalloid)であり、B、P、As、Sb、Fe、Sn、Bi、Al、Ca、In、Ti、Zn、Sc、V、Cr、Mn、Co等である。Xはハロゲン原子である。sは3~7の整数である。また、陰イオン[B]y-中のLの原子価をtとしたとき、y=s-tの関係が成り立つことが重要である。 Further, here, L is a metal or metalloid which is a central atom of a halide complex, and B, P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn, Co and the like. X is a halogen atom. s is an integer of 3 to 7. It is important that the relationship of y = s−t holds when the valence of L in the anion [B] y− is t.
 上記一般式の陰イオン[LXs]y-の具体例としては、テトラフルオロボレート(BF4-、ヘキサフルオロホスフェート(PF6-、ヘキサフルオロアンチモネート(SbF6-、ヘキサフルオロアルセネート(AsF6-、ヘキサクロロアンチモネート(SbCl6-等が挙げられ、好ましくはヘキサフルオロアンチモネート(SbF6-である。 Specific examples of the anion [LX s ] y− of the above general formula include tetrafluoroborate (BF 4 ) , hexafluorophosphate (PF 6 ) , hexafluoroantimonate (SbF 6 ) , hexafluoroarsenate. (AsF 6 ) , hexachloroantimonate (SbCl 6 ) − and the like can be mentioned, and hexafluoroantimonate (SbF 6 ) is preferable.
 また、陰イオン [B]y-としては、[LXs -1(OH)]y-で表される構造のものも用いることができる。L、X、sは上記と同様である。また、その他用いることができる陰イオンとしては、過塩素酸イオン(ClO4-、トリフルオロメチル亜硫酸イオン(CF3
3-、フルオロスルホン酸イオン(FSO3-、トルエンスルホン酸陰イオン、トリニトロベンゼンスルホン酸陰イオン等が挙げられる。
As the anion [B] y− , a structure represented by [LX s −1 (OH)] y− can also be used. L, X, and s are the same as described above. Other anions that can be used include perchlorate ion (ClO 4 ) , trifluoromethyl sulfite ion (CF 3 S
O 3 ) , fluorosulfonic acid ion (FSO 3 ) , toluenesulfonic acid anion, trinitrobenzenesulfonic acid anion, and the like.
 また、陰イオン[B]y-として、テトラキス(ペンタフルオロフェニル)ボレートも使用できる。 Also, tetrakis (pentafluorophenyl) borate can be used as the anion [B] y−.
 本発明では、このようなオニウム塩の中でも、芳香族オニウム塩を使用するのが特に有効である。中でも、特開昭50-151997号公報、特開昭50-158680号公報に記載の芳香族ハロニウム塩、特開昭50-151997号公報、特開昭52-30899号公報、特開昭56-55420号公報、特開昭55-125105号公報等に記載のVIA族芳香族オニウム塩、特開昭50-158698号公報に記載のVA族芳香族オニウム塩、特開昭56-8428号公報、特開昭56-149402号公報、特開昭57-192429号公報等に記載のオキソスルホキソニウム塩、特開昭49-17040号公報に記載の芳香族ジアゾニウム塩、米国特許第4139655号明細書に記載のチオピリリウム塩等が好ましい。 In the present invention, it is particularly effective to use an aromatic onium salt among such onium salts. Of these, aromatic halonium salts described in JP-A-50-151997, JP-A-50-158680, JP-A-50-151997, JP-A-52-30899, JP-A-56- No. 55420, JP-A 55-125105, etc., Group VIA aromatic onium salts, JP-A-50-158698, Group VA aromatic onium salts, JP-A 56-8428, Oxosulfoxonium salts described in JP-A-56-149402, JP-A-57-192429, etc., aromatic diazonium salts described in JP-A-49-17040, US Pat. No. 4,139,655 The thiopyrylium salt described in 1 is preferable.
 これらの芳香族オニウム塩の中でも特に好ましいのは、下記一般式(V)、(VI)又は(VII)
Figure JPOXMLDOC01-appb-C000025
(式中、R1~R14は各々同一でも異なっていてもよい水素原子、ハロゲン原子或いは酸素原子又はハロゲン原子を含んでもよい炭化水素基、若しくは置換基がついてもよいアルコキシ基、Arは1以上の水素原子が置換されてもよいフェニル基である。)で表されるスルホニウム陽イオンを有する化合物;(トリクミル)ヨードニウム陽イオンを有する化合物;ビス(t-ブチルフェニル)ヨードニウム陽イオンを有する化合物;トリフェニルスルホニウム陽イオンを有する化合物等が挙げられる。
Of these aromatic onium salts, the following general formula (V), (VI) or (VII) is particularly preferable.
Figure JPOXMLDOC01-appb-C000025
(Wherein R1 to R14 may be the same or different from each other, a hydrogen atom, a halogen atom, an oxygen atom or a hydrocarbon group that may contain a halogen atom, or an alkoxy group that may have a substituent, Ar is one or more. A hydrogen atom is a phenyl group which may be substituted.) A compound having a sulfonium cation represented by: a compound having a (tricumyl) iodonium cation; a compound having a bis (t-butylphenyl) iodonium cation; Examples thereof include a compound having a phenylsulfonium cation.
 例えば、4-(4-ベンゾイル-フェニルチオ)フェニル-ジ-(4-フルオロフェニル)スルホニウムヘキサフルオロホスフェート;4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロホスフェート、4,4’-ビス[ビス((β-ヒドロキシエトキシ)フェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート;4,4’-ビス[ビス(フルオロフェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロホスフェート、4,4’-ビス[ビス(フルオロフェニル)スルホニオ]フェニルスルフィド-ビス-ヘキサフルオロアンチモネート;4,4’-ビス(ジフェニルスルホニオ)フェニルスルフィド-ビス-ヘキサフルオロホスフェート、4,4’-ビス(ジフェニルスルホニオ)フェニルスルフィド-ビス-ヘキサフルオロアンチモネート;4-(4-ベンゾイルフェニルチオ)フェニル-ジ-(4-(β-ヒドロキシエトキシ)フェニル)スルホニウムヘキサフルオロホスフェート、4-(4-ベンゾイルフェニルチオ)フェニル-ジ-(4-(β-ヒドロキシエトキシ)フェニル)スルホニウムヘキサフルオロアンチモネート;4-(4-ベンゾイルフェニルチオ)フェニル-ジ-(4-フルオロフェニル)スルホニウムヘキサフルオロホスフェート、4-(4-ベンゾイルフェニルチオ)フェニル-ジ-(4-フルオロフェニル)スルホニウムヘキサフルオロアンチモネート;4-(4-ベンゾイルフェニルチオ)フェニル-ジフェニルスルホニウムヘキサフルオロホスフェート、4-(4-ベンゾイルフェニルチオ)フェニル-ジフェニルスルホニウムヘキサフルオロアンチモネート;4-(フェニルチオ)フェニル-ジ-(4-(β-ヒドロキシエトキシ)フェニル)スルホニウムヘキサフルオロホスフェート、4-(フェニルチオ)フェニル-ジ-(4-(β-ヒドロキシエトキシ)フェニル)スルホニウムヘキサフルオロアンチモネート;4-(フェニルチオ)フェニル-ジ-(4-フルオロフェニル)スルホニウムヘキサフルオロホスフェート、4-(フェニルチオ)フェニル-ジ-(4-フルオロフェニル)スルホニウムヘキサフルオロアンチモネート;4-(フェニルチオ)フェニル-ジフェニルスルホニウムヘキサフルオロホスフェート、4-(フェニルチオ)フェニル-ジフェニルスルホニウムヘキサフルオロアンチモネート;4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウムヘキサフルオロホスフェート、4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウムヘキサフルオロアンチモネート;4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルジフェニルスルホニウムヘキサフルオロホスフェート、4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルジフェニルスルホニウムヘキサフルオロアンチモネート;4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルビス(4-ヒドロキシフェニル)スルホニウムヘキサフルオロホスフェート、4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルビス(4-ヒドロキシフェニル)スルホニウムヘキサフルオロアンチモネート;トリフェニルスルホニウムヘキサフルオロホスフェート、トリフェニルスルホニウムヘキサフルオロアンチモネート;(トリルクミル)ヨードニウムヘキサフルオロホスフェート、(トリルクミル)ヨードニウムヘキサフルオロアンチモネート;(トリルクミル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレート;ビス(ターシャリブチルフェニル)ヨードニウムヘキサフルオロホスフェート、ビス(ターシャリブチルフェニル)ヨードニウムヘキサフルオロアンチモネート;ビス(ターシャリブチルフェニル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレート;ベンジル-4-ヒドロキシフェニルメチルスルホニウムヘキサフルオロホスフェート、ベンジル-4-ヒドロキシフェニルメチルスルホニウムヘキサフルオロアンチモネート;ベンジルジメチルスルホニウムヘキサフルオロホスフェート、ベンジルジメチルスルホニウムヘキサフルオロアンチモネート;p-クロロベンジル-4-ヒドロキシフェニルメチルスルホニウムヘキサフルオロホスフェート、p-クロロベンジル-4-ヒドロキシフェニルメチルスルホニウムヘキサフルオロアンチモネート;4-アセトキシフェニルジメチルスルホニウムヘキサフルオロホスフェート、4-アセトキシフェニルジメチルスルホニウムヘキサフルオロアンチモネート;4-メトキシカルボニルオキシフェニルジメチルスルホニウムヘキサフルオロホスフェート、4-メトキシカルボニルオキシフェニルジメチルスルホニウムヘキサフルオロアンチモネート;4-エトキシカルボニルオキシフェニルジメチルスルホニウムヘキサフルオロホスフェート、4-エトキシカルボニルオキシフェニルジメチルスルホニウムヘキサフルオロアンチモネート;α-ナフチルメチルジメチルスルホニウムヘキサフルオロホスフェート、α-ナフチルメチルジメチルスルホニウムヘキサフルオロアンチモネート;α-ナフチルメチルテトラヒドロチオフェニウムヘキサフルオロホスフェート、α-ナフチルメチルテトラヒドロチオフェニウムヘキサフルオロアンチモネート;シンナミルジメチルスルホニウムヘキサフルオロホスフェート、シンナミルジメチルスルホニウムヘキサフルオロアンチモネート;シンナミルテトラヒドロチオフェニウムヘキサフルオロホスフェート、シンナミルテトラヒドロチオフェニウムヘキサフルオロアンチモネート;N-(α-フェニルベンジル)シアノピリジニウムヘキサフルオロホスフェート、N-(α-フェニルべンジル)-2-シアノピリジニウムヘキサフルオロアンチモネート;N-シンナミル-2-シアノピリジニウムヘキサフルオロホスフェート、N-シンナミル-2-シアノピリジニウムヘキサフルオロアンチモネート;N-(α-ナフチルメチル)-2-シアノピリジニウムヘキサフルオロホスフェート、N-(α-ナフチルメチル)-2-シアノピリジニウムヘキサフルオロアンチモネート;N-べンジル-2-シアノピリジニウムヘキサフルオロホスフェート、N-べンジル-2-シアノピリジニウムヘキサフルオロアンチモネート;(4-ベンゾイルフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウムテトラキス(3,5-ジフルオロ-4-メトキシフェニル)ボレート等を挙げることができる。 For example, 4- (4-benzoyl-phenylthio) phenyl-di- (4-fluorophenyl) sulfonium hexafluorophosphate; 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis- Hexafluorophosphate, 4,4′-bis [bis ((β-hydroxyethoxy) phenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate; 4,4′-bis [bis (fluorophenyl) sulfonio] phenyl sulfide Bis-hexafluorophosphate, 4,4′-bis [bis (fluorophenyl) sulfonio] phenyl sulfide-bis-hexafluoroantimonate; 4,4′-bis (diphenylsulfonio) phenyl sulfide-bis-hexafluorophosphate Sulfate, 4,4′-bis (diphenylsulfonio) phenyl sulfide-bis-hexafluoroantimonate; 4- (4-benzoylphenylthio) phenyl-di- (4- (β-hydroxyethoxy) phenyl) sulfonium hexafluoro Phosphate, 4- (4-benzoylphenylthio) phenyl-di- (4- (β-hydroxyethoxy) phenyl) sulfonium hexafluoroantimonate; 4- (4-benzoylphenylthio) phenyl-di- (4-fluorophenyl) ) Sulfonium hexafluorophosphate, 4- (4-benzoylphenylthio) phenyl-di- (4-fluorophenyl) sulfonium hexafluoroantimonate; 4- (4-benzoylphenylthio) phenyl-diphenylsulfonium hexaf Fluorophosphate, 4- (4-benzoylphenylthio) phenyl-diphenylsulfonium hexafluoroantimonate; 4- (phenylthio) phenyl-di- (4- (β-hydroxyethoxy) phenyl) sulfonium hexafluorophosphate, 4- ( Phenylthio) phenyl-di- (4- (β-hydroxyethoxy) phenyl) sulfonium hexafluoroantimonate; 4- (phenylthio) phenyl-di- (4-fluorophenyl) sulfonium hexafluorophosphate, 4- (phenylthio) phenyl- Di- (4-fluorophenyl) sulfonium hexafluoroantimonate; 4- (phenylthio) phenyl-diphenylsulfonium hexafluorophosphate, 4- (phenylthio) phenyl-diphenyl Sulfonium hexafluoroantimonate; 4- (2-chloro-4-benzoylphenylthio) phenylbis (4-fluorophenyl) sulfonium hexafluorophosphate, 4- (2-chloro-4-benzoylphenylthio) phenylbis (4- Fluorophenyl) sulfonium hexafluoroantimonate; 4- (2-chloro-4-benzoylphenylthio) phenyldiphenylsulfonium hexafluorophosphate, 4- (2-chloro-4-benzoylphenylthio) phenyldiphenylsulfonium hexafluoroantimonate; 4- (2-chloro-4-benzoylphenylthio) phenylbis (4-hydroxyphenyl) sulfonium hexafluorophosphate, 4- (2-chloro-4-benzoylphenylthio) Phenylbis (4-hydroxyphenyl) sulfonium hexafluoroantimonate; triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate; (tolylcumyl) iodonium hexafluorophosphate, (tolylcumyl) iodonium hexafluoroantimonate; (tolylcumyl) iodonium Tetrakis (pentafluorophenyl) borate; bis (tertiarybutylphenyl) iodonium hexafluorophosphate, bis (tertiarybutylphenyl) iodonium hexafluoroantimonate; bis (tertiarybutylphenyl) iodonium tetrakis (pentafluorophenyl) borate; benzyl -4-hydroxyphenylmethylsulfonium hex Fluorophosphate, benzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate; benzyldimethylsulfonium hexafluorophosphate, benzyldimethylsulfonium hexafluoroantimonate; p-chlorobenzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, p-chlorobenzyl -4-hydroxyphenylmethylsulfonium hexafluoroantimonate; 4-acetoxyphenyldimethylsulfonium hexafluorophosphate, 4-acetoxyphenyldimethylsulfonium hexafluoroantimonate; 4-methoxycarbonyloxyphenyldimethylsulfonium hexafluorophosphate, 4-methoxycarbonyloxy Phenyldimethyls Rufonium hexafluoroantimonate; 4-ethoxycarbonyloxyphenyldimethylsulfonium hexafluorophosphate, 4-ethoxycarbonyloxyphenyldimethylsulfonium hexafluoroantimonate; α-naphthylmethyldimethylsulfonium hexafluorophosphate, α-naphthylmethyldimethylsulfonium hexafluoro Α-naphthylmethyltetrahydrothiophenium hexafluorophosphate, α-naphthylmethyltetrahydrothiophenium hexafluoroantimonate; cinnamyldimethylsulfonium hexafluorophosphate, cinnamyldimethylsulfonium hexafluoroantimonate; Ni-hexafluorophosphate , Cinnamyltetrahydrothiophenium hexafluoroantimonate; N- (α-phenylbenzyl) cyanopyridinium hexafluorophosphate, N- (α-phenylbenzyl) -2-cyanopyridinium hexafluoroantimonate; N-cinnamyl-2 -Cyanopyridinium hexafluorophosphate, N-cinnamyl-2-cyanopyridinium hexafluoroantimonate; N- (α-naphthylmethyl) -2-cyanopyridinium hexafluorophosphate, N- (α-naphthylmethyl) -2-cyanopyridinium Hexafluoroantimonate; N-benzyl-2-cyanopyridinium hexafluorophosphate, N-benzyl-2-cyanopyridinium hexafluoroantimonate; (4-benzoylpheny Thio) phenyl bis (4-fluorophenyl) sulfonium tetrakis (3,5-difluoro-4-methoxyphenyl) borate, and the like.
 また、その他好ましいものとしては、キシレン-シクロペンタジエニル鉄(II)ヘキサフルオロアンチモネート、クメン-シクロペンタジエニル鉄(II)ヘキサフルオロホスフェート、キシレン-シクロペンタジエニル鉄(II)-トリス(トリフルオロメチルスルホニル)メタナイド等の鉄/アレン錯体、アルミニウム錯体/光分解ケイ素化合物系開始剤等も挙げられる。 Other preferable examples include xylene-cyclopentadienyl iron (II) hexafluoroantimonate, cumene-cyclopentadienyl iron (II) hexafluorophosphate, xylene-cyclopentadienyl iron (II) -tris ( Examples thereof include iron / allene complexes such as (trifluoromethylsulfonyl) methanide, aluminum complexes / photolytic silicon compound-based initiators, and the like.
 上記エネルギー線感受性カチオン重合開始剤は、1種で又は2種以上混合して使用することができる。また、第1の硬化性樹脂組成物で用いた硬化剤も混合して使用することができる。上記エネルギー線感受性カチオン重合開始剤の使用量又は上記エネルギー線感受性カチオン重合開始剤と硬化剤の合計使用量は、上記エピスルフィド化合物100質量部に対して0.05~20質量部である。該使用量が0.05質量部未満であると、硬化性樹脂組成物の硬化が不十分になり、歪みやムラを生じたり、加熱時に亀裂が入るため望ましくない。また該使用量が50質量部を越えると、硬化性樹脂組成物を硬化させて形成した接着層におけるイオン性物質の含有量が増加するために硬化物の吸湿性が高くなり、耐久性能を十分得ることができない。上記エネルギー線感受性カチオン重合開始剤のより好ましい使用量は、上記エピスルフィド化合物100質量部に対して0.5質量部~15質量部である。 The energy ray sensitive cationic polymerization initiator can be used alone or in combination of two or more. Moreover, the hardening | curing agent used with the 1st curable resin composition can also be mixed and used. The amount of the energy ray sensitive cationic polymerization initiator used or the total amount of the energy ray sensitive cationic polymerization initiator and the curing agent used is 0.05 to 20 parts by mass with respect to 100 parts by mass of the episulfide compound. When the amount used is less than 0.05 parts by mass, the curable resin composition is not sufficiently cured, and distortion or unevenness occurs, or cracks occur during heating. When the amount used exceeds 50 parts by mass, the content of the ionic substance in the adhesive layer formed by curing the curable resin composition increases, so the hygroscopicity of the cured product increases and the durability performance is sufficient. Can't get. A more preferable amount of the energy ray-sensitive cationic polymerization initiator is 0.5 to 15 parts by mass with respect to 100 parts by mass of the episulfide compound.
 また、第2の硬化性樹脂組成物には、第1の硬化性樹脂組成物の説明で例示した任意の添加物を添加してもよい。第2の硬化性樹脂組成物において、これらの任意の添加物は、上記エピスルフィド化合物100質量部に対し、好ましくは合計で500質量部以下である。 Further, any additive exemplified in the description of the first curable resin composition may be added to the second curable resin composition. In the second curable resin composition, these optional additives are preferably 500 parts by mass or less in total with respect to 100 parts by mass of the episulfide compound.
 第2の硬化性樹脂組成物には、溶媒を含有させてもよい。この場合、溶媒の使用量は、上記エピスルフィド化合物、上記エネルギー線感受性カチオン重合開始剤及び/又は上記硬化剤の合計の含有量が、第2の硬化性樹脂組成物中、好ましくは5~90質量%、更に好ましくは10~50質量%の範囲になるようにするとよい。該溶媒の具体例としては、第1の硬化性樹脂組成物において例示した溶媒が挙げられ、中でも、ケトン類或いはセロソルブ系溶媒が好ましい。また、上記エピスルフィド化合物を合成する際に用いた溶媒を除去せず、そのまま第2の硬化性樹脂組成物に含有させてもよい。 The second curable resin composition may contain a solvent. In this case, the amount of the solvent used is such that the total content of the episulfide compound, the energy ray-sensitive cationic polymerization initiator and / or the curing agent is preferably 5 to 90 mass in the second curable resin composition. %, More preferably 10 to 50% by mass. Specific examples of the solvent include the solvents exemplified in the first curable resin composition, and among them, ketones or cellosolve solvents are preferable. Moreover, you may make it contain in the 2nd curable resin composition as it is, without removing the solvent used when synthesize | combining the said episulfide compound.
 第2の硬化性樹脂組成物は紫外線等のエネルギー線を照射することにより通常は0.1秒~数分後に指触乾燥状態或いは溶媒不溶性の状態に硬化することができる。適当なエネルギー線としては、カチオン重合開始剤の分解を誘発する限りいかなるものでもよいが、好ましくは、超高、高、中、低圧水銀ランプ、キセノンランプ、カーボンアーク灯、メタルハライドランプ、蛍光灯、タングステンランプ、エキシマーランプ、殺菌灯、エキシマーレーザー、窒素レーザー、アルゴンイオンレーザー、ヘリウムカドミウムレーザー、ヘリウムネオンレーザー、クリプトンイオンレーザー、各種半導体レーザー、YAGレーザー、発光ダイオード、CRT光源等から得られる2000オングストロームから7000オングストロームの波長を有する電磁波エネルギーや電子線、X線、放射線等の高エネルギー線を利用する。 The second curable resin composition can be cured to a dry-to-touch state or a solvent-insoluble state usually after 0.1 seconds to several minutes by irradiation with energy rays such as ultraviolet rays. Any suitable energy ray may be used as long as it induces decomposition of the cationic polymerization initiator, but preferably an ultra-high, high, medium, low-pressure mercury lamp, xenon lamp, carbon arc lamp, metal halide lamp, fluorescent lamp, From 2000 angstroms obtained from tungsten lamp, excimer lamp, germicidal lamp, excimer laser, nitrogen laser, argon ion laser, helium cadmium laser, helium neon laser, krypton ion laser, various semiconductor lasers, YAG laser, light emitting diode, CRT light source, etc. High energy rays such as electromagnetic energy having a wavelength of 7000 angstroms, electron beams, X-rays and radiation are used.
 また、第2の硬化性樹脂組成物は加熱処理によっても硬化できる。好ましくは、エネルギー線照射前後に適宜加熱処理をすると品質の良い硬化物が得られる。 Also, the second curable resin composition can be cured by heat treatment. Preferably, when a heat treatment is appropriately performed before and after the energy beam irradiation, a cured product with good quality can be obtained.
 以上説明した第1及び第2の硬化性樹脂組成物は、以下に説明する硬化物としての用途のほか、インキ、保護膜、塗料、コーティング剤、接着剤、絶縁材、構造材、光ディスク、シーリング剤、光造形剤としても使用することができる。 The first and second curable resin compositions described above are used as cured products described below, as well as inks, protective films, paints, coating agents, adhesives, insulating materials, structural materials, optical disks, and sealings. It can also be used as an agent or an optical modeling agent.
 次に、第1及び/又は第2の硬化性樹脂組成物を加熱及び/又はエネルギー線を照射して得られる、本発明の硬化物について説明する。尚、以下の説明において、特に説明しない部分については、上記エピスルフィド化合物並びに第1及び第2の硬化性樹脂組成物における説明の内容が適宜適用される。 Next, the cured product of the present invention obtained by heating the first and / or second curable resin composition and / or irradiating energy rays will be described. In addition, in the following description, the content of the description in the said episulfide compound and the 1st and 2nd curable resin composition is applied suitably about the part which is not demonstrated especially.
 加熱及びエネルギー線照射等の条件については先に説明した通りである。 The conditions such as heating and energy beam irradiation are as described above.
 本発明の硬化物の形状は特に限定されるものでなく、例えば、レンズ状、フィルム上、プリズム状、板状等が挙げられる。更に、他の材料上で硬化させることにより、その材料を被覆又は封止してもよい。 The shape of the cured product of the present invention is not particularly limited, and examples thereof include a lens shape, a film, a prism shape, and a plate shape. Furthermore, the material may be coated or sealed by curing on other materials.
 本発明の硬化物は、光学レンズ、光学フィルム、導光板、導波路、光学素子、光コネクター等の光学部品に有用である。 The cured product of the present invention is useful for optical parts such as an optical lens, an optical film, a light guide plate, a waveguide, an optical element, and an optical connector.
 以下、実施例及び比較例を示して本発明を更に詳細に説明するが、本発明はこれらの実施例等に限定されるものではない。実施例1-1~1-3は本発明の新規エピスルフィド化合物の製造例を示し、実施例2-1~2-8は、第1及び第2の硬化性樹脂組成物の製造例及び評価例を示し、比較例2-1~2-7は、比較硬化性樹脂組成物の製造例及び評価例を示す。実施例3-1~3-3は、第1の硬化性樹脂組成物を硬化させた硬化物の製造例及び評価例を示し、比較例3-1は、比較硬化物の製造例及び評価例を示す。実施例4-1及び4-2は、第2の硬化性樹脂組成物を硬化させた硬化物の製造例及び評価例を示し、比較例4-1~4-3は、比較硬化物の製造例及び評価例を示す。 Hereinafter, although an example and a comparative example are shown and the present invention is explained still in detail, the present invention is not limited to these examples. Examples 1-1 to 1-3 show production examples of the novel episulfide compound of the present invention, and Examples 2-1 to 2-8 show production examples and evaluation examples of the first and second curable resin compositions. Comparative Examples 2-1 to 2-7 show production examples and evaluation examples of comparative curable resin compositions. Examples 3-1 to 3-3 show production examples and evaluation examples of cured products obtained by curing the first curable resin composition, and Comparative Example 3-1 shows production examples and evaluation examples of comparative cured products. Indicates. Examples 4-1 and 4-2 show production examples and evaluation examples of cured products obtained by curing the second curable resin composition, and Comparative Examples 4-1 to 4-3 are productions of comparative cured products. Examples and evaluation examples are shown.
[実施例1-1]エピスルフィド化合物A-1の製造
 攪拌装置及び温度計を付した三口フラスコに、1,1-ビス(4-(2,3-エポキシプロピルオキシ)フェニル)-3-フェニルインダンの100.0g、テトラヒドロフラン250g、及びエタノール60.0gを仕込みよく攪拌して溶解させた。これにチオ尿素の44.2gを仕込み、45℃に加熱し18時間攪拌した。この後トルエン300mL、酢酸エチル200mL及び水300mLを加え、分液ろうとで洗浄し、水層を廃棄した。更に有機層を10%食塩水の300mLで2度洗浄した後無水硫酸マグネシウムでよく乾燥させ、脱溶媒を行い粗生成物を得た。この粗生成物をシリカゲルカラムクロマトグラフィー(展開溶媒:トルエン)で分離精製を行い、73.0gの無色粘稠性固体(エピスルフィド化合物(A-1))を収率69%で得た。各種分析の結果、該無色粘稠性固体は本発明のエピスルフィド化合物(化合物No.53におけるn=0の化合物)であることを確認した。元素分析値から求められるオキシラン環のチイラン環への硫黄置換率は98%であった。分析結果を下記に示す。
[Example 1-1] Production of episulfide compound A-1 In a three-necked flask equipped with a stirrer and a thermometer, 1,1-bis (4- (2,3-epoxypropyloxy) phenyl) -3-phenylindane was added. 100.0 g of tetrahydrofuran, 250 g of tetrahydrofuran, and 60.0 g of ethanol were charged and dissolved with sufficient stirring. This was charged with 44.2 g of thiourea, heated to 45 ° C. and stirred for 18 hours. Thereafter, 300 mL of toluene, 200 mL of ethyl acetate and 300 mL of water were added, washed with a separatory funnel, and the aqueous layer was discarded. Further, the organic layer was washed twice with 300 mL of 10% saline, and then thoroughly dried over anhydrous magnesium sulfate, and the solvent was removed to obtain a crude product. This crude product was separated and purified by silica gel column chromatography (developing solvent: toluene) to obtain 73.0 g of a colorless viscous solid (episulfide compound (A-1)) in a yield of 69%. As a result of various analyses, it was confirmed that the colorless viscous solid was an episulfide compound of the present invention (a compound of n = 0 in Compound No. 53). The sulfur substitution rate of the oxirane ring to the thiirane ring determined from the elemental analysis value was 98%. The analysis results are shown below.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
(分析結果)
(1)1H-NMRのケミカルシフト(DMSO-d6、35℃):(ppm)
2.42-2.45(m:2H)、2.49-2.73(m:3H)、3.15-3.20(m:1H)、3.26-3.37(m:2H)、3.95-4.02(m:2H)、4.07-4.16(m:3H)、6.78(d:1H)、6.86-6.96(m:4H)、7.01-7.07(m:3H)、7.08-7.13(m:2H)、7.15-7.26(m:5H)、7.30-7.35(m:2H)。
(2)元素分析による硫黄含量(ダイアインスルメンツ社製TOX-100による測定含量)
実測値:12.1%、理論値:12.3%。
(3)IR(cm-1
3027、2868、1605、1579、1507、1468、1454、1397、1292、1245、1181、1118、1032、1011、828、779、756、736、701
(result of analysis)
(1) 1 H-NMR chemical shift (DMSO-d6, 35 ° C.): (ppm)
2.42-2.45 (m: 2H), 2.49-2.73 (m: 3H), 3.15-3.20 (m: 1H), 3.26-3.37 (m: 2H) ), 3.95-4.02 (m: 2H), 4.07-4.16 (m: 3H), 6.78 (d: 1H), 6.86-6.96 (m: 4H), 7.01-7.07 (m: 3H), 7.08-7.13 (m: 2H), 7.15-7.26 (m: 5H), 7.30-7.35 (m: 2H) ).
(2) Sulfur content by elemental analysis (measured content by TOIN-100 manufactured by Diainstruments)
Found: 12.1%, Theoretical value: 12.3%.
(3) IR (cm -1 )
3027, 2868, 1605, 1579, 1507, 1468, 1454, 1397, 1292, 1245, 1181, 1118, 1032, 1011, 828, 779, 756, 736, 701
[実施例1-2]エピスルフィド化合物A-2の製造。
 攪拌装置及び温度計を付した三口フラスコに、1,1-ビス(4-(2,3-エポキシプロピルオキシ)フェニル)-3,5-ジフェニルインダンの50.0g、テトラヒドロフラン270g、及びエタノール30.0gを仕込みよく攪拌して溶解させた。これにチオ尿素の14.8gを仕込み、室温で48時間攪拌した。この後トルエン1000mL、と水300mLを加え、分液ろうとで洗浄し、水層を廃棄した。更に有機層を10%食塩水の300mLで2度洗浄し、無水硫酸マグネシウムでよく乾燥させた後、脱溶媒を行い、50.2gの無色固体(エピスルフィド化合物(A-2))を収率95%で得た。各種分析の結果、該無色固体は本発明のエピスルフィド化合物(化合物No.44におけるn=0の化合物)であることを確認した。元素分析値から求められるオキシラン環のチイラン環への硫黄置換率は96%であった。分析結果を下記に示す。
[Example 1-2] Production of episulfide compound A-2.
In a three-necked flask equipped with a stirrer and a thermometer, 50.0 g of 1,1-bis (4- (2,3-epoxypropyloxy) phenyl) -3,5-diphenylindane, 270 g of tetrahydrofuran, and 30. 0 g was charged and dissolved by stirring well. This was charged with 14.8 g of thiourea and stirred at room temperature for 48 hours. Thereafter, 1000 mL of toluene and 300 mL of water were added, washed with a separatory funnel, and the aqueous layer was discarded. Further, the organic layer was washed twice with 300 mL of 10% saline and dried well over anhydrous magnesium sulfate, and then the solvent was removed to obtain 50.2 g of a colorless solid (episulfide compound (A-2)) in a yield of 95. %. As a result of various analyses, it was confirmed that the colorless solid was an episulfide compound of the present invention (a compound of n = 0 in Compound No. 44). The sulfur substitution rate of the oxirane ring to the thiirane ring determined from the elemental analysis value was 96%. The analysis results are shown below.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
(分析結果)
(1)1H-NMRのケミカルシフト(DMSO-d6、35℃):(ppm)
2.50(d:1H)、2.65(d:1H)、2.68-2.71(m:2H)、2.76-2.82(m:1H)、3.21-3.36(m:3H)、3.80-3.86(m:1H)、4.00-4.03(m:1H)、4.10-4.15(m:1H)、4.18-4.24(m:1H)、4.26-4.31(m:1H)、6.88-6.92(m:4H)、6.98(s:1H)、7.05-7.09(m:2H)、7.14-7.20(m:3H)、7.25-7.41(m:8H)、7.48-7.55(m:3H)(2)元素分析による硫黄含量(ダイアインスルメンツ社製TOX-100による測定含量)
実測値:10.3%、理論値:10.7%。
(3)IR(cm-1
3027、2925、1604、1579、1508、1475、1298、1245、1181、1035、914、830、763、701
(result of analysis)
(1) 1 H-NMR chemical shift (DMSO-d6, 35 ° C.): (ppm)
2.50 (d: 1H), 2.65 (d: 1H), 2.68-2.71 (m: 2H), 2.76-2.82 (m: 1H), 3.21-3. 36 (m: 3H), 3.80-3.86 (m: 1H), 4.00-4.03 (m: 1H), 4.10-4.15 (m: 1H), 4.18- 4.24 (m: 1H), 4.26-4.31 (m: 1H), 6.88-6.92 (m: 4H), 6.98 (s: 1H), 7.05-7. 09 (m: 2H), 7.14-7.20 (m: 3H), 7.25-7.41 (m: 8H), 7.48-7.55 (m: 3H) (2) Elemental analysis Sulfur content (measured by Diax Instruments TOX-100)
Actual value: 10.3%, theoretical value: 10.7%.
(3) IR (cm -1 )
3027, 2925, 1604, 1579, 1508, 1475, 1298, 1245, 1181, 1035, 914, 830, 763, 701
[実施例1-3]エピスルフィド化合物A-3の製造。
 攪拌装置及び温度計を付した三口フラスコに、ビス[4-(2,3-エポキシプロピルオキシ)フェニル]シクロヘキシル(4-ビフェニル)メタンの30.0g、1,4-ジオキサン150g、及びエタノール30.0gを仕込みよく攪拌して溶解させた。これにチオ尿素の10.2gを仕込み、50℃で24時間攪拌し、この後トルエン300mL、酢酸エチル200mL及び水300mLを加え、分液ろうとで洗浄し、水層を廃棄した。更に有機層を10%食塩水の300mLで2度洗浄し、無水硫酸マグネシウムでよく乾燥させた後脱溶媒を行い、白色粉末状の結晶を析出させた。この結晶をトルエンとヘキサンで洗浄し、よく乾燥させて22.5gの無色結晶(エピスルフィド化合物(A-3))を収率71%で得た。各種分析の結果、該無色結晶は本発明のエピスルフィド化合物(化合物No.1におけるn=0の化合物)であることを確認した。元素分析値から求められるオキシラン環のチイラン環への硫黄置換率は92%であった。分析結果を下記に示す。
[Example 1-3] Production of episulfide compound A-3.
In a three-necked flask equipped with a stirrer and a thermometer, 30.0 g of bis [4- (2,3-epoxypropyloxy) phenyl] cyclohexyl (4-biphenyl) methane, 150 g of 1,4-dioxane, and 30. ethanol. 0 g was charged and dissolved by stirring well. This was charged with 10.2 g of thiourea and stirred at 50 ° C. for 24 hours. After that, 300 mL of toluene, 200 mL of ethyl acetate and 300 mL of water were added, washed with a separatory funnel, and the aqueous layer was discarded. Further, the organic layer was washed twice with 300 mL of 10% saline, dried thoroughly with anhydrous magnesium sulfate, and then the solvent was removed to precipitate white powdery crystals. The crystals were washed with toluene and hexane and dried well to obtain 22.5 g of colorless crystals (episulfide compound (A-3)) with a yield of 71%. As a result of various analyses, it was confirmed that the colorless crystals were the episulfide compound of the present invention (the compound of n = 0 in Compound No. 1). The sulfur substitution rate of the oxirane ring to the thiirane ring determined from elemental analysis values was 92%. The analysis results are shown below.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
(分析結果)
(1)1H-NMRのケミカルシフト(DMSO-d6、25℃):(ppm)
0.99-1.10(m:3H)、1.30-1.52(m:5H)、2.07(d:2H)、2.30(d:2H)、2.51(d:2H)、3.14-3.22(m:2H)、3.80(dd:2H)、3.86(s:1H)、3.96(dd:2H)、6.61-6.66(m:4H)、6.86-6.92(m:6H)、7.20-7.25(m:1H)、7.31-7.37(m:2H)、7.44(d:2H)、7.57(d:2H)
(2)元素分析による硫黄含量(ダイアインスルメンツ社製TOX-100による測定含量)
実測値:10.1%、理論値:11.0%
(3)IR(cm-1
2929、2845、1606、1508、1236、1181、1032、824、764、763
(result of analysis)
(1) 1 H-NMR chemical shift (DMSO-d6, 25 ° C.): (ppm)
0.99-1.10 (m: 3H), 1.30-1.52 (m: 5H), 2.07 (d: 2H), 2.30 (d: 2H), 2.51 (d: 2H), 3.14-3.22 (m: 2H), 3.80 (dd: 2H), 3.86 (s: 1H), 3.96 (dd: 2H), 6.61-6.66 (M: 4H), 6.86-6.92 (m: 6H), 7.20-7.25 (m: 1H), 7.31-7.37 (m: 2H), 7.44 (d : 2H), 7.57 (d: 2H)
(2) Sulfur content by elemental analysis (measured content by TOIN-100 manufactured by Diainstruments)
Measured value: 10.1%, theoretical value: 11.0%
(3) IR (cm -1 )
2929, 2845, 1606, 1508, 1236, 1181, 1032, 824, 764, 763
[実施例2-1~2-8及び比較例2-1~2-7]硬化性樹脂組成物No.1~No.8及び比較硬化性樹脂組成物No.9~No.15の製造
 上記製造例1~3で製造したエピスルフィド化合物(A-1)~(A-3)及び希釈剤(C-1)又は(C-2)を[表1]の配合比率に従い混合し、100℃に加熱して攪拌溶解させた後、60℃まで降温し、熱硬化剤(D-1)又はカチオン重合開始剤(D-2)を加えて10分撹拌し、それぞれ硬化性樹脂組成物No.1~No.8を作製した。また、[表2]の配合比率に従い、本発明のエピスルフィド化合物に替えて、下記に示す比較化合物(B-1)~(B-3)を用いて同様の操作で、比較硬化性樹脂組成物No.9~No.15を作製した。得られた組成物の溶解性を評価した。結果を[表1]及び[表2]に示す。
(B-1)2,2-ビス(4-(2,3-エピチオプロピルオキシ)フェニル)プロパン(B-2)9,9-ビス(4-(2,3-エピチオプロピルオキシ)フェニル)フルオレン
(B-3)1,1-ビス(4-(2,3-エポキシプロピルオキシ)フェニル)-3-フェニルインダン
(C-1)アデカレジンEP-4100E((株)ADEKA製):ビスフェノールA型エポキシ樹脂):希釈剤
(C-2)グリシジルフェニルエーテル:希釈剤
(D-1)2-エチル-4-メチルイミダゾール:熱硬化剤
(D-2)4-(2-クロロ-4-ベンゾイルフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウムヘキサフルオロアンチモネート(アデカオプトマーSP-172、(株)ADEKA製):エネルギー線感受性カチオン重合開始剤
Figure JPOXMLDOC01-appb-C000029
[Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-7] Curable resin composition Nos. 1-No. 8 and comparative curable resin composition No. 9-No. Production of 15 The episulfide compounds (A-1) to (A-3) produced in Production Examples 1 to 3 and the diluent (C-1) or (C-2) were mixed according to the blending ratio of [Table 1]. After heating to 100 ° C. and stirring and dissolving, the temperature was lowered to 60 ° C., and the thermosetting agent (D-1) or cationic polymerization initiator (D-2) was added and stirred for 10 minutes. Item No. 1-No. 8 was produced. Further, according to the blending ratio in [Table 2], the comparative curable resin composition was prepared in the same manner using the following comparative compounds (B-1) to (B-3) instead of the episulfide compound of the present invention. No. 9-No. 15 was produced. The solubility of the obtained composition was evaluated. The results are shown in [Table 1] and [Table 2].
(B-1) 2,2-bis (4- (2,3-epithiopropyloxy) phenyl) propane (B-2) 9,9-bis (4- (2,3-epithiopropyloxy) phenyl Fluorene (B-3) 1,1-bis (4- (2,3-epoxypropyloxy) phenyl) -3-phenylindane (C-1) Adeka Resin EP-4100E (manufactured by ADEKA Corporation): Bisphenol A Type epoxy resin): diluent (C-2) glycidyl phenyl ether: diluent (D-1) 2-ethyl-4-methylimidazole: thermosetting agent (D-2) 4- (2-chloro-4-benzoyl) Phenylthio) phenylbis (4-fluorophenyl) sulfonium hexafluoroantimonate (Adekaoptomer SP-172, manufactured by ADEKA Corporation): Energy ray sensitive cation Polymerization initiator
Figure JPOXMLDOC01-appb-C000029
<溶解性>
 得られた硬化性樹脂組成物を60℃で10分撹拌後、室温まで冷却し、溶解性について評価した。尚、評価基準は、室温まで冷却しても析出物が確認されない場合は○、加熱時に溶解するが室温まで冷却後1日で析出物が確認される場合を△、加熱しても溶解しない場合は×とした。
<Solubility>
The obtained curable resin composition was stirred at 60 ° C. for 10 minutes, cooled to room temperature, and evaluated for solubility. The evaluation criteria are ○ when the precipitate is not confirmed even after cooling to room temperature, △ when the precipitate is confirmed after cooling to room temperature but one day after cooling to room temperature, when it does not dissolve even when heated Is x.
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
 [表1]及び[表2]から明らかなように、比較化合物(B-2)を用いた組成物では溶解性及び保存安定性が悪いのに対し、本発明のエピスルフィド化合物を用いた実施例2-1~2-8の組成物では、希釈剤に対する溶解性に優れる。また、比較例2-1及び2-4では溶解しなかった為、また比較例2-7では室温まで冷却後、結晶が析出してきた為に硬化性樹脂組成物が得られなかった。 As is clear from [Table 1] and [Table 2], the composition using the comparative compound (B-2) was poor in solubility and storage stability, whereas the examples using the episulfide compound of the present invention were used. The compositions of 2-1 to 2-8 are excellent in solubility in a diluent. Further, in Comparative Examples 2-1 and 2-4, the curable resin composition was not obtained because it was not dissolved, and in Comparative Example 2-7, crystals were precipitated after cooling to room temperature.
[実施例3-1~3-3及び比較例3-1]
 得られた硬化性樹脂組成物No.1~No.3及び比較硬化性樹脂組成物No.10をそれぞれ60℃に加熱し、離形処理を施したガラス基板に塗布した。1.00mmのスペーサーと共にもう一枚のガラスで挟み込んで張り合わせ、100℃で1時間、150℃で1時間加熱し、硬化したものを○、硬化しなかったものを×として硬化性を評価した。また、硬化物として得られたものは、屈折率及び透明性を評価した。結果を[表3]に示す。
[Examples 3-1 to 3-3 and Comparative Example 3-1]
The obtained curable resin composition No. 1-No. 3 and comparative curable resin composition No. Each 10 was heated to 60 ° C. and applied to a glass substrate subjected to a release treatment. The glass was sandwiched with another glass with a 1.00 mm spacer and bonded together, and heated at 100 ° C. for 1 hour and at 150 ° C. for 1 hour. The cured product was evaluated as ◯, and the cured product was evaluated as ×. Moreover, what was obtained as hardened | cured material evaluated the refractive index and transparency. The results are shown in [Table 3].
<屈折率>
 得られた硬化物についてアタゴ(株)製アッベ屈折計DR-M2にて、25℃におけるD線及びe線の屈折率nd及びneの測定を行った。
<Refractive index>
At resulting cured product for Atago Co. Abbe refractometer DR-M2, it was measured D line and e-line refractive index n d and n e at 25 ° C..
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
 [表3]より、希釈剤と熱硬化剤からなる比較硬化性樹脂組成物No.10(比較例3-1)の硬化物と比較して、本発明のエピスルフィド化合物A-1~A-3を用いた硬化性樹脂組成物No.1~No.3(実施例3-1~3-3)の硬化物は屈折率が高いことが明らかである。 From [Table 3], a comparative curable resin composition No. consisting of a diluent and a thermosetting agent was used. Compared with the cured product of No. 10 (Comparative Example 3-1), the curable resin composition No. 1-No. It is apparent that the cured product of 3 (Examples 3-1 to 3-3) has a high refractive index.
[実施例4-1及び4-2並びに比較例4-1~4-3]
 得られた硬化性樹脂組成物No.4及びNo.5並びに比較硬化性樹脂組成物No.11、No、13及びNo.14をそれぞれ60℃に加熱し、離形処理を施したガラス基板に塗布した。1.00mmのスペーサーと共にもう一枚のガラスで挟み込んで張り合わせ、これを高圧水銀灯でガラス片面につき3000mJ/cm2(計6000mJ/cm2)で露光後に、150℃で2時間処理し、室温まで冷却してガラス基板から剥離させた。硬化物として得られたものについて○、硬化していないものは×として、硬化性を評価した。また、硬化物として得られたものは、屈折率及び透明性を評価した。結果を[表4]に示す。
[Examples 4-1 and 4-2 and Comparative Examples 4-1 to 4-3]
The obtained curable resin composition No. 4 and no. 5 and comparative curable resin composition No. 11, No. 13, and No. 11; Each 14 was heated to 60 ° C. and applied to a glass substrate subjected to a release treatment. Laminated by sandwiching the other piece of glass with 1.00mm spacer, which after exposure at 3000 mJ / cm 2 per glass sided high pressure mercury lamp (total 6000 mJ / cm 2), for 2 hours at 0.99 ° C., cooled to room temperature And peeled from the glass substrate. The curability was evaluated as ◯ for those obtained as cured products, and x for those that were not cured. Moreover, what was obtained as hardened | cured material evaluated the refractive index and transparency. The results are shown in [Table 4].
<屈折率>
 得られた硬化物について、アタゴ(株)製アッベ屈折計DR-M2にて、25℃におけるD線及びe線の屈折率nd及びneの測定を行った。
<Refractive index>
The obtained cured product at Atago Co. Abbe refractometer DR-M2, were measured D line and e-line refractive index n d and n e at 25 ° C..
<透明性>
 日本電色工業(株)製ヘーズメーターNDH5000にて、得られた硬化物の全光線透過率を測定した。
<Transparency>
The total light transmittance of the resulting cured product was measured with a haze meter NDH5000 manufactured by Nippon Denshoku Industries Co., Ltd.
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000033
 [表4]より、比較化合物(B-1)を用いた比較硬化性樹脂組成物No.11(比較例4-1)は、溶解性は良好であるが、硬化性が悪く、比較化合物(B-3)を用いた硬化性樹脂組成物No.13(比較例4-2)、及び希釈剤とエネルギー線感受性カチオン重合開始剤からなる比較硬化性樹脂組成物No.14(比較例4-3)は、硬化性は良好であるが、屈折率及び透明性が劣る。
 これに対して、本発明のエピスルフィド化合物A-1を用いた硬化性樹脂組成物No.4及び5(実施例4-4及び4-5)は、硬化性、屈折率及び透明性に優れることは明らかである。
From [Table 4], comparative curable resin composition No. using comparative compound (B-1) was obtained. 11 (Comparative Example 4-1) has good solubility but poor curability, and the curable resin composition No. 11 using the comparative compound (B-3) was not good. 13 (Comparative Example 4-2), and comparative curable resin composition No. 1 comprising a diluent and an energy ray-sensitive cationic polymerization initiator. 14 (Comparative Example 4-3) has good curability but poor refractive index and transparency.
In contrast, the curable resin composition No. 1 using the episulfide compound A-1 of the present invention was used. It is clear that 4 and 5 (Examples 4-4 and 4-5) are excellent in curability, refractive index and transparency.
 以上より、本発明のエピスルフィド化合物は溶解性に優れ、且つこれらの化合物を含有させることを特徴とする本発明の硬化性樹脂組成物は、硬化性及び透明性に優れた高屈折率を有する硬化物を与え、光学材料用途に有用なことが明らかである。 From the above, the episulfide compound of the present invention is excellent in solubility, and the curable resin composition of the present invention characterized by containing these compounds is a cured product having a high refractive index excellent in curability and transparency. Obviously, it is useful for optical material applications.

Claims (9)

  1.  下記一般式(I)で表されるエピスルフィド化合物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、A1及びA2は酸素原子又は硫黄原子を表し(但し、A1及びA2の少なくとも一つは硫黄原子を表す)、Cyは炭素原子数3~10のシクロアルキル基を示し、X及びZはそれぞれ独立して、炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環基、炭素原子数3~10のシクロアルキル基又はハロゲン原子を表し、該アルキル基及びアリールアルキル基中のメチレン基並びに該アリール基の結合部は-O-、-S-又は二重結合で中断されてもよく、また、Zは隣接するZ同士で芳香環を形成してもよい。該アルキル基、アリール基、アリールアルキル基、複素環基、シクロアルキル基及び隣接するZ同士で形成される芳香環はハロゲン原子で置換されてもよく、nは0~10、pは0~5、rは0~4の整数を表す。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
    Episulfide compounds represented by the following general formula (I).
    Figure JPOXMLDOC01-appb-C000001
    (Wherein, A 1 and A 2 represent an oxygen atom or a sulfur atom (wherein at least one of A 1 and A 2 represents a sulfur atom), Cy represents a cycloalkyl group having 3 to 10 carbon atoms. , X and Z are each independently an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic ring having 2 to 20 carbon atoms. Group, a cycloalkyl group having 3 to 10 carbon atoms or a halogen atom, and the methylene group in the alkyl group and arylalkyl group and the bond part of the aryl group are interrupted by —O—, —S— or a double bond Z may form an aromatic ring with adjacent Z. The alkyl group, aryl group, arylalkyl group, heterocyclic group, cycloalkyl group and adjacent Z are formed with each other. Aromatic ring is halogen source And n represents an integer of 0 to 10, p represents an integer of 0 to 5, and r represents an integer of 0 to 4. The optical isomer present when n is not 0 may be any isomer. )
  2.  下記一般式(II)で表されるエピスルフィド化合物。
    Figure JPOXMLDOC01-appb-C000002
    (式中、A1及びA2は酸素原子又は硫黄原子を表し(但し、A1及びA2の少なくとも一つは硫黄原子を表す)、Y1、Y2及びZは、それぞれ独立して、炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環基、炭素原子数3~10のシクロアルキル基又はハロゲン原子を表し、該アルキル基及びアリールアルキル基中のメチレン基並びに該アリール基の結合部は-O-、-S-又は二重結合で中断されてもよく、隣接するY1は、互いに結合して環を形成してもよく、該アルキル基、アリール基、アリールアルキル基、複素環基及びシクロアルキル基はハロゲン原子で置換されてもよく、nは0~10、qは0~4、q’は0~8(但し、q’は(x+y)×2以下である)、rは0~4、xは0~4、yは0~4の整数を表し、xとyの合計は2~4である。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
    An episulfide compound represented by the following general formula (II).
    Figure JPOXMLDOC01-appb-C000002
    (Wherein A 1 and A 2 represent an oxygen atom or a sulfur atom (provided that at least one of A 1 and A 2 represents a sulfur atom), Y 1 , Y 2 and Z are each independently, An alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic group having 2 to 20 carbon atoms, and a cyclohexane having 3 to 10 carbon atoms. Represents an alkyl group or a halogen atom, the methylene group in the alkyl group and arylalkyl group, and the bond part of the aryl group may be interrupted by —O—, —S— or a double bond, and adjacent Y 1 is May be bonded to each other to form a ring, and the alkyl group, aryl group, arylalkyl group, heterocyclic group and cycloalkyl group may be substituted with a halogen atom, n is 0 to 10, and q is 0 -4, q 'is 0-8 (where q' is (x y) × 2 or less), r is 0 to 4, x is 0 to 4, y is an integer of 0 to 4, and the sum of x and y is 2 to 4. When n is not 0 The optical isomer present in can be any isomer.)
  3.  下記一般式(III)で表される、請求項1に記載のエピスルフィド化合物。
    Figure JPOXMLDOC01-appb-C000003
    (式中、A1、A2、Z、n及びrは上記一般式(I)と同じである。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
    The episulfide compound of Claim 1 represented by the following general formula (III).
    Figure JPOXMLDOC01-appb-C000003
    (In the formula, A 1 , A 2 , Z, n and r are the same as those in the general formula (I). Note that the optical isomer present when n is not 0 may be any isomer.)
  4.  下記一般式(IV)で表される、請求項2に記載のエピスルフィド化合物。
    Figure JPOXMLDOC01-appb-C000004
    (式中、Y2’は上記一般式(II)のY2と同じ又は水素原子を表し、x’は1又は2であり、A1及びA2は上記一般式(II)と同じであり、Y1、Z、n、q及びrは上記一般式(II)と同じである。尚、nが0でないときに存在する光学異性体は、どの異性体でもよい。)
    The episulfide compound of Claim 2 represented by the following general formula (IV).
    Figure JPOXMLDOC01-appb-C000004
    (In the formula, Y 2 ′ is the same as Y 2 in the general formula (II) or represents a hydrogen atom, x ′ is 1 or 2, and A 1 and A 2 are the same as those in the general formula (II). , Y 1 , Z, n, q and r are the same as those in the general formula (II), and the optical isomers present when n is not 0 may be any isomers.)
  5.  上記一般式(IV)のx’が1である請求項4に記載のエピスルフィド化合物。 The episulfide compound according to claim 4, wherein x 'in the general formula (IV) is 1.
  6.  請求項1~5の何れか1項に記載のエピスルフィド化合物と硬化剤を含有する硬化性樹脂組成物。 A curable resin composition comprising the episulfide compound according to any one of claims 1 to 5 and a curing agent.
  7.  請求項1~5の何れか1項に記載のエピスルフィド化合物とエネルギー線感受性カチオン重合開始剤を含有する硬化性樹脂組成物。 A curable resin composition comprising the episulfide compound according to any one of claims 1 to 5 and an energy ray-sensitive cationic polymerization initiator.
  8.  請求項6又は7に記載の硬化性樹脂組成物を加熱して得られる硬化物。 A cured product obtained by heating the curable resin composition according to claim 6 or 7.
  9.  請求項7に記載の硬化性樹脂組成物にエネルギー線を照射して得られる硬化物。 A cured product obtained by irradiating the curable resin composition according to claim 7 with energy rays.
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JP2011063776A (en) 2011-03-31
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