WO2010122612A1 - Spiral contactor and method for manufacturing same - Google Patents

Spiral contactor and method for manufacturing same Download PDF

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Publication number
WO2010122612A1
WO2010122612A1 PCT/JP2009/005129 JP2009005129W WO2010122612A1 WO 2010122612 A1 WO2010122612 A1 WO 2010122612A1 JP 2009005129 W JP2009005129 W JP 2009005129W WO 2010122612 A1 WO2010122612 A1 WO 2010122612A1
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WO
WIPO (PCT)
Prior art keywords
spiral
contact
contactor
photomask
photoresist
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Application number
PCT/JP2009/005129
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French (fr)
Japanese (ja)
Inventor
平井幸廣
Original Assignee
株式会社アドバンストシステムズジャパン
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Priority claimed from JP2009106614A external-priority patent/JP2010257757A/en
Priority claimed from JP2009136741A external-priority patent/JP2010282902A/en
Application filed by 株式会社アドバンストシステムズジャパン filed Critical 株式会社アドバンストシステムズジャパン
Publication of WO2010122612A1 publication Critical patent/WO2010122612A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/22Contacts for co-operating by abutting
    • H01R13/24Contacts for co-operating by abutting resilient; resiliently-mounted
    • H01R13/2407Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
    • H01R13/2421Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means using coil springs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R43/00Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
    • H01R43/16Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for manufacturing contact members, e.g. by punching and by bending

Definitions

  • the present invention relates to a spiral contactor having a good combination of excellent electrical characteristics and spring characteristics with a high yield point.
  • the spiral contactors are stacked in two upper and lower stages, the upper spiral contact and the lower spiral contact.
  • the present invention relates to a spiral contactor in which at least one part of a base from the base of a contact has an integral structure and a method for manufacturing the same.
  • FIG. 20 is a schematic view showing an outline of a conventional single spiral two-stage spiral contactor.
  • a convex spiral contactor 201 having a tip at the center of a spiral has a plurality of spiral contacts 211 and 212 joined together at the tip.
  • the roots 211b and 212b of the spiral contacts 211 and 212 are arranged at the overlapping positions, and fixed by, for example, laser spot welding, and rise from the roots 211b and 212b toward the center of the spiral, Are provided with tips 211a and 212a.
  • connection terminals of various shapes it is possible to connect to connection terminals of various shapes, and when the spiral contact makes contact with the connection terminal and the spiral contact is pushed down from the tip in order, the spiral contact makes a twisting action with the connection terminal. It has excellent electrical connectivity by making a contact while drawing and drawing a minute circle (see Patent Document 1).
  • the present invention was devised to solve the above-described problems, and is a spiral contactor having a superior spiral characteristic and a high yield point spring characteristic in which convex spiral contacts are superposed in two upper and lower stages.
  • the spiral contactor is stacked in two upper and lower stages, and the spiral contactor in which the upper spiral contact is integrated with at least one part of the base from the base of the lower spiral contact and its It is an object to provide a manufacturing method.
  • the spiral contactor of the invention according to claim 1 is formed in a spiral shape from the root toward the center of the tip, and the convex spiral contacts 11 and 12 having a tip at the spiral center are overlapped in two upper and lower stages.
  • the spiral contactor 1 has an integral structure in which at least one part from the base to the base of the upper spiral contact 11 and the lower spiral contact 12 is integrated. .
  • At least one portion of the base from the base of the upper spiral contact and the lower spiral contact is integrated with the spiral contact.
  • the invention according to claim 2 is the spiral contactor 1 according to claim 1, wherein the spiral contactors 11 and 12 of the upper and lower two stages are arranged at the same base, and the spiral contactor is arranged from the root.
  • the spiral contactor 1 rising toward the center is characterized in that at least one portion of the base portion from the base has an integral structure.
  • the spiral contact element alone is realized by forming at least one portion of the base portion from the base of the upper spiral contact element and the lower spiral contact element.
  • the invention according to claim 3 is the spiral contactor 3 according to claim 1, wherein the roots of the upper and lower two-stage spiral contacts 31, 32 are arranged at positions shifted from each other by 180 °.
  • a double spiral spiral that rises from the root toward the center of the spiral, and the two spiral contacts 31 and 32 that are arranged in a spiral shape with the center being the same are joined together at the tip.
  • the contactor 3 is characterized in that at least one part of the base portion from the base has an integral structure.
  • the invention of claim 3 it is realized by a single spiral contactor by having at least one part of the base from the base of the upper spiral contactor and the lower spiral contactor to be integrated. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
  • the invention according to claim 4 is the spiral contactor 4 according to claim 1, wherein the roots of the upper and lower two-stage spiral contacts 41, 42 are arranged at positions shifted from each other by 120 °, and A triple spiral spiral contactor that rises from the root toward the center of the spiral, and the three spiral contacts 41 and 42 that are arranged in a spiral with the centers being the same are joined together at the tip. 4 is characterized in that at least one part of the base from the base has an integral structure.
  • the invention of claim 4 it is realized by a single spiral contactor by having at least one part of the base from the base of the upper spiral contactor and the lower spiral contactor to be integrated. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
  • the invention according to claim 5 is the spiral contactor 5 according to claim 1, wherein the spiral bases of the spiral contactors 51, 52 in the upper and lower two stages are made to be the same in parallel and arranged in a spiral shape.
  • the spiral contactor itself can be realized by having at least one portion of the base part from the base of the upper spiral contactor and the lower spiral contactor to be integrated.
  • the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force.
  • a spiral contact having a small installation area can be maintained.
  • the spiral contactor of the invention according to claim 6 is formed in a spiral shape from the root toward the tip center, and the convex spiral contactor (112, 122) having the tip at the spiral center in two upper and lower stages.
  • the spiral contactor (101) is a superposed spiral contactor (101) that uses a spiral contactor (112) using a material having high electrical conductivity at the upper stage and a material having high springiness at the lower stage.
  • a spiral contact (122) provided is provided.
  • the upper and lower spiral contactors use a material having high electrical conductivity at the upper stage on the side in contact with the connection terminal and a material having high springiness at the lower stage.
  • the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
  • the invention according to claim 7 is the spiral contactor (101) according to claim 6, wherein the width of the lower spiral contactor (122) is greater than the width of the upper spiral contactor (112). It is characterized by being narrow.
  • the width of the spiral contactor on the lower side of the spiral contactor arranged in the upper and lower two stages is made narrower than the width of the upper spiral contact, thereby making the upper and lower two stage spirals. Even when the contactor is compressed, the entire upper surface of the lower spiral contactor is not detached from the lower surface of the upper spiral contactor, and a stable electrical connection characteristic can be obtained. Excellent electrical characteristics and an excellent spring It is possible to realize a spiral contact having both characteristics.
  • the invention according to claim 8 is the spiral contactor (101) according to claim 6, wherein the thickness of the lower spiral contact (122) is the thickness of the upper spiral contact (112). It is characterized by being thinner than that.
  • the thickness of the lower spiral contact disposed in the upper and lower spiral contacts is made thinner than that of the upper spiral contact. Since the spiral contact has a smaller cross-sectional stress, the upper surface of the lower spiral contact is not separated from the lower surface of the upper spiral contact even when the upper and lower spiral contacts are compressed. Following this, a stable electrical connection characteristic can be obtained, and a spiral contactor having both excellent electrical characteristics and excellent spring characteristics can be realized.
  • the invention according to claim 9 is the spiral contactor (101) according to claim 6, wherein the roots of the upper and lower two-stage spiral contactors (112, 122) are arranged at positions shifted from each other by 180 °. Then, the two spiral contacts (112, 122), which rise from the root toward the center of the spiral and are arranged in a spiral with the centers being the same, are joined together at the tip.
  • the double spiral spiral contactor (101) is characterized in that at least one portion of the base portion is vertically joined from the base and is superposed in two stages.
  • the upper and lower spiral contactors use a material having high electrical conductivity at the upper stage on the side in contact with the connection terminal, and a material having high springiness at the lower stage.
  • the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
  • the invention according to claim 10 is the spiral contactor (101) according to claim 6, wherein the roots of the upper and lower two-stage spiral contactors (131, 132) are arranged at positions shifted by 120 ° from each other. Then, the triple spiral spiral that rises from the root toward the center of the spiral, and the three spiral contacts that are arranged in a spiral in parallel with each other at the center join together at the tip.
  • the contactor (101 ') is characterized in that at least one portion of the base portion is vertically joined from the base, and is superposed in two stages.
  • the upper and lower spiral contactors use a material with high electrical conductivity at the upper stage on the side in contact with the connection terminal, and use a material with high springiness at the lower stage.
  • it is difficult to achieve with a single spiral contact but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
  • the invention according to claim 11 is the spiral contactor (101) according to claim 6, wherein in the spiral contactors (133, 134) of the upper and lower two stages, the roots of the spirals are made to be the same to each other.
  • Two spiral contacts (133, 134) arranged in a spiral shape merge at the tip to form an integral spiral contact (133, 134) up and down at least one location from the base to the base. It is characterized by being joined to the upper and lower two stages.
  • the upper and lower spiral contactors use a material with high electrical conductivity on the upper stage on the side in contact with the connection terminal, and use a material with high springiness on the lower stage.
  • it is difficult to achieve with a single spiral contact but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
  • the invention according to claim 12 is the spiral contactor (101, 101 ′, 101 ′′) according to claim 6, wherein the spiral contactor is formed in a spiral shape from the root toward the tip center, and the spiral contactor is formed at the center of the spiral shape.
  • a hole is provided in the vicinity of the center on the flat surface of the tip of the contact.
  • the mirror-like flat surface 31aa disposed in the upper stage is provided with a substantially circular hole 31aaa (a depression or a through hole) in the vicinity of the center. Due to the holes 31aaa, the surface pressure is not dispersed and a large pressure is applied, and since the radius to which the surface pressure is applied is large, the area in which the surface moves is increased and the metal-to-metal bonding is easily generated. In addition, when soldering is used, fillets that are sucked up solder are formed in both the hole and the periphery, thereby enabling a stronger solder joint.
  • a spiral contactor manufacturing method comprising: a first step (a) of preparing a metal plate 14; and applying or drying a first photoresist 15 on the surface of the metal plate 14 made of Cu foil 14. Affix the film.
  • a second step (b) of covering the first photomask 16 having the spiral contact 11 pattern from above and irradiating light from above the photomask 16 for exposure, and the first photomask 16 A third step (c) of developing the first photoresist 15 so as to form a pattern, and further, a metal plating 13 composed of Au plating 17, rhodium Rh19, and Ni plating on the exposed surface of the Cu foil 14 from above.
  • the third photoresist 22 is applied to the back surface of the metal plate 14 or a dry film is applied.
  • Method for manufacturing a spiral contactor spiral contacts 11, 12 of the state is characterized by comprising a seventeenth step in close contact with each other of the bottom and the top surface (q), the.
  • At least one part of the base from the base of the upper spiral contact and the lower spiral contact has an integral structure, thereby shortening the manufacturing process and reducing the manufacturing cost. Can do.
  • Resist 40 is applied or a dry film is applied.
  • a second photomask 38 having a pattern of the integrated structure portion 42 is applied from above, and the F-step (f) is performed by irradiating light from above the photomask 38, and the photomask 38 is irradiated with light.
  • a third photomask 46 having a pattern of spiral contacts 11 ′ is applied from above, and a J-th step (j) is performed by irradiating light from above the photomask 46.
  • step L (l) The K-th step (k) in which the third photoresist 45 is removed by irradiating light with exposure and development, and the metal plating 33 composed of the Ni plating 33 is applied to the surface of the Au plating 37, and further Au plating
  • step L (l) the fourth photo resist 47 is applied to the back surface of the metal plate 34 or a dry film is applied.
  • a fourth photomask 48 having a pattern of etching holes is covered from above, and the Mth step (m) in which exposure is performed by irradiating light from above the photomask 48, and the fourth photomask 48 is irradiated with light.
  • At least one portion of the base portion from the base of the upper spiral contact and the lower spiral contact has an integrated structure, thereby shortening the manufacturing process and reducing the manufacturing cost. Can do.
  • two spiral contacts are stacked to form a two-tier structure, and at least one of the base and the base is made into an integral structure, so that the length of the spiral contact is increased.
  • An effect was born.
  • the spring constant of the two-stage spiral contact increased, and the yield point was deepened. Therefore, it can be connected to connection terminals of various shapes, and when the spiral contact comes into contact with the connection terminal and the spiral contact is pushed down sequentially from the tip, the tip of the spiral contact is connected to the connection terminal.
  • a spiral contact that has both excellent electrical characteristics and excellent spring characteristics in a spiral contact with excellent electrical connectivity by making contact with twisting motion and drawing a micro circle. be able to.
  • the single spiral two-stage spiral contact for explaining the first embodiment of the present invention is shown, (a) is a plan view showing a single spiral two-stage spiral contact, (b) is ( It is sectional drawing of the AA line shown to a), and is sectional drawing of a convex single spiral two-stage spiral contact in a natural body, (c) is a single spiral two-stage spiral shape shown in (b) It is sectional drawing which shows the state which the upper and lower sides of the contactor adhered. It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 1st Embodiment of this invention.
  • FIG. 2B is a cross-sectional view taken along line BB shown in FIG. 1A, and is a cross-sectional view of a double contact spiral contact having a convex shape in a natural body
  • FIG. 2C is a double spiral double step shown in FIG. It is sectional drawing which shows the state which the upper and lower sides of the spiral contactor of a formula adhered.
  • the triple spiral two-stage spiral contact for explaining the fourth embodiment of the present invention is shown, (a) is a plan view showing the triple spiral two-stage spiral contact, (b) is ( It is sectional drawing of CC line shown to a), It is sectional drawing of a convex triple spiral two-stage spiral contactor in a natural body, (c) is a triple spiral two-stage spiral shape shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the contactor adhered.
  • the spiral base for explaining the fifth embodiment of the present invention is shown as a two-stage spiral contact arranged in parallel with each other with the same spiral root, and (a) shows the spiral contact.
  • FIG. 4B is a cross-sectional view taken along line DD shown in FIG.
  • FIG. 1A is a cross-sectional view of a spiral contact that is a convex shape in a natural body.
  • the double spiral two-stage spiral contact for explaining the sixth embodiment of the present invention is shown, (a) is a plan view showing the double spiral two-stage spiral contact, (b) FIG. 2A is a cross-sectional view taken along line EE shown in FIG. 1A, and is a cross-sectional view of a double contact spiral contact having a convex shape in a natural body.
  • FIG. 10 shows a two-stage spiral contactor for explaining an eighth embodiment of the present invention, wherein (a) is a plan view showing a spiral contact having a tip and a protrusion in the vicinity thereof, and (b) is (a). ) Is a cross-sectional view taken along line GG shown in FIG. It is the schematic of the interconnector to which the spiral contactor of this invention is applied, (a) is a general view, (b) is an enlarged view of the part shown by E in the figure. It is the schematic which shows the outline of the conventional single spiral two-stage spiral contactor.
  • FIG. 1 shows a single spiral two-stage spiral contact for explaining the first embodiment of the present invention
  • (a) is a plan view showing a single spiral two-stage spiral contact
  • (b) is a cross-sectional view taken along line AA shown in (a)
  • (c) is a single-stage double-stage shown in (b)
  • the spiral contactor 1 is formed in a spiral shape from the root 11b toward the center of the tip 11a, and has a convex spiral shape having the tip 11a at the center of the spiral.
  • the contacts 11 and 12 are superposed in two upper and lower stages, and at least one portion from the base 11b to the base 11d of the upper spiral contact 12 and the lower spiral contact 11 has an integral structure.
  • the base 11b to the base portion 11d of the upper spiral contact 12 and the lower spiral contact 11 has an integral structure, it is difficult to realize with a single spiral contact.
  • the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required yield point depth is maintained and installed.
  • a spiral contact with a small area can be obtained.
  • FIGS. 2, 3, and 4 are process cross-sectional views illustrating a manufacturing process of a single spiral two-stage spiral contactor for explaining the first embodiment of the present invention.
  • the first step (a) for preparing the metal plate 14 and the first photoresist 15 is applied to the surface of the metal plate 14 made of Cu foil 14 or a dry film is applied. .
  • a third step (c) of developing the first photoresist 15 so as to form a pattern, and a metal plating 13 composed of Au plating 17, rhodium Rh19, and Ni plating on the exposed surface of the Cu foil 14 from above is further performed.
  • the ninth step (i) for applying the metal plating 13 composed of 13 is turned upside down, and the third photoresist 22 is applied to the back surface of the metal plate 14 or a dry film is applied.
  • a 14th step (n) of annealing forming in a heated state The fifteenth step (0) for applying the adhesive tape 24, the sixteenth step (p) for removing the Cu foil 14 by etching, and the spiral contacts 11 and 12 in the form of being stacked one above the other are the bottom and top surfaces of each other. And a seventeenth step (q) in close contact with each other.
  • FIGS. 5 to 8 are process cross-sectional views showing a manufacturing process of a single spiral two-stage spiral contactor for explaining a second embodiment of the present invention.
  • the first step 35 (a) in which the metal plate 34 is prepared and the first photoresist 35 is applied to the surface of the metal plate 34 that is the Cu foil 34 or a dry film is applied.
  • a D step (d) To form a spiral contact 11 ′, a D step (d), an E step (e) to remove the first photoresist 35, and a second contact on the surface of the formed spiral contact 11 ′.
  • the photoresist 40 is applied or a dry film is applied.
  • a second photomask 38 having a pattern of the integrated structure portion 42 is applied from above, and the F-step (f) is performed by irradiating light from above the photomask 38, and the photomask 38 is irradiated with light.
  • the G step (g) for removing the second photoresist 40 by exposure and development, the H step (h) for applying the Cu plating 31e to the removed surface and further applying the Au plating 37, the first step The first step (i) for removing the photoresist 35, and the third photoresist 45 is applied to the surface of the Au plating 37 and the Cu plating 31e, or a dry film is applied.
  • a third photomask 46 having a pattern of spiral contacts 11 ′ is applied from above, and a J-th step (j) is performed by irradiating light from above the photomask 46.
  • step L (l) the fourth photo resist 47 is applied to the back surface of the metal plate 34 or a dry film is applied.
  • a fourth photomask 48 having a pattern of etching holes is covered from above, and the Mth step (m) in which exposure is performed by irradiating light from above the photomask 48, and the fourth photomask 48 is irradiated with light.
  • Q-th step (q) of annealing forming in a deformed state The R step (r) for attaching the adhesive tape 49, the S step (s) for removing the Cu foil 34 by etching, and the spiral contacts 11 ', 12' in the form of being stacked one above the other are the bottom surfaces of each other. And a T-th step (t) in close contact with each other on the upper surface.
  • FIG. 9 shows a double spiral two-stage spiral contact for explaining the third embodiment of the present invention
  • FIG. 9A is a plan view showing a double spiral two-stage spiral contact
  • (B) is a cross-sectional view taken along line BB shown in (a), and is a cross-sectional view of a convex double spiral two-stage spiral contact in a natural body
  • (c) is a cross-sectional view shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the double spiral type spiral contactor contact
  • the spiral contacts 32, 31 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the roots 32b, 31b. Are formed in a spiral shape toward the center of the tip, and the tips 32a and 31a are arranged in parallel with each other in a spiral shape, and the double spiral spiral contacts 32 and 31 in which the tips 32a and 31a are integrated are formed at the root. At least one of the base portions 32d and 31d from the portions 32b and 31b has an integral structure.
  • the spiral contacts 32, 31 are formed in a spiral shape from the roots 32b, 31b toward the center of the tip, and the convex spiral contacts 32, 31 having the tips 32a, 31a at the center of the spiral are arranged vertically. It is the spiral contactor 3 piled up in the step
  • the spiral contactor 3 uses the material rich in electrical conductivity, and the material rich in spring property.
  • the core material forming the spiral contacts 32 and 3 is a nickel (Ni) base material of a low electrical resistance material, and the upper and lower surfaces are plated with Au.
  • the core material forming the spiral contacts 32 and 3 is a nickel alloy (Ni alloy) blended with tungsten having excellent spring characteristics, and at least the upper surface is Au plated.
  • the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required depth of the yield point.
  • a spiral contact with a small installation area can be obtained.
  • FIG. 10 shows a triple spiral two-stage spiral contact for explaining the fourth embodiment of the present invention
  • (a) is a plan view showing a triple spiral two-stage spiral contact
  • b) is a cross-sectional view taken along the line C-C shown in (a), and is a cross-sectional view of a convex triple spiral spiral contact in a natural body
  • (c) is a triple spiral double stage shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the spiral contactor of a formula adhered. As shown in FIGS.
  • the spiral contacts 42 and 41 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the roots 42b and 41b. Are formed in a spiral shape toward the center of the tip, and the tips 42a and 41a are arranged in parallel with each other in a spiral shape, and the double spiral spiral contacts 42 and 41 in which the tips 42a and 41a are integrated are formed at the root. At least one part of the base parts 42d and 41d from the parts 42b and 41b has an integral structure.
  • FIG. 11 shows a two-stage spiral contact arranged in a spiral shape in parallel with each other with the same spiral root for explaining the fifth embodiment of the present invention.
  • FIG. FIG. 4B is a cross-sectional view taken along the line DD shown in FIG. 4A, and is a cross-sectional view of a spiral contact that is a convex shape in a natural body.
  • the spiral contacts 52 and 51 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but from the roots 52b and 51b to the center of the tip.
  • the spiral contacts 52 and 51 are integrally formed with the tips 52a and 51a from the roots 52b and 51b to the base 52d.
  • 51d has an integral structure.
  • the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required yield point depth is maintained and installed.
  • a spiral contact with a small area can be obtained.
  • FIG. 12 shows a double spiral two-stage spiral contact for explaining the sixth embodiment of the present invention
  • FIG. 12A is a plan view showing a double spiral two-stage spiral contact
  • (B) is sectional drawing of the EE line shown to (a), and is a sectional view of a spiral contact of a convex double spiral two-stage type in a natural body.
  • the spiral contacts 112 and 122 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but from the roots 112b and 122b to the center of the tip.
  • the spiral contacts 112 and 122 are formed in a spiral shape from the root toward the tip center, and spiral spiral contacts 112 and 122 having tips at the spiral center are stacked in two upper and lower stages.
  • the spiral contactor 101 is provided with a spiral contactor 112 using a material having high electrical conductivity in the upper stage and a spiral contactor 122 using a material having high springiness in the lower stage.
  • the core material forming the spiral contact 112 is a nickel (Ni) base material of a low electrical resistance material, and the upper and lower surfaces are plated with Au.
  • the core material forming the spiral contact 122 is a nickel alloy (Ni alloy) containing tungsten having excellent spring characteristics, and at least the upper surface is Au plated.
  • the spiral contact of the upper and lower stages uses a material having high electrical conductivity for the upper stage on the side in contact with the connection terminal, and a material having high springiness for the lower stage, so that the spiral contact element alone
  • the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressure.
  • a spiral contact with a small installation area can be obtained while maintaining the depth of the yield point.
  • the width of the lower spiral contact 122 is formed narrower than the width of the upper spiral contact 112. In this way, by making the width of the spiral contact 122 on the lower side of the spiral contacts 112, 122 arranged in two upper and lower stages narrower than the width of the upper spiral contact 112, two upper and lower stages Even when the spiral contacts 112 and 122 are compressed, the entire upper surface of the lower spiral contact 122 is not detached from the lower surface of the upper spiral contact 112, and stable electrical connection characteristics can be obtained. It is possible to realize a spiral contact having both electrical characteristics and excellent spring characteristics.
  • the thickness of the lower spiral contact 122 is formed to be thinner than the thickness of the upper spiral contact 112.
  • the lower spiral contact since the cross-sectional stress is small, even when the upper and lower spiral contacts are compressed, the entire upper surface of the lower spiral contact follows the upper spiral contact without moving away from the lower surface, thereby providing stable electricity. Connection characteristics can be obtained, and a spiral contactor having both excellent electrical characteristics and excellent spring characteristics can be realized.
  • a columnar protrusion (column) 112d is provided at the tip 112a located at the center of the upper spiral contact 112. This column 112d is at least one column provided upward at the position of the tip 112a of the upper spiral contact 112.
  • the lower spiral contact 122 has no protrusion.
  • the spiral widths V (V1, V2) of the two spiral upper and lower spiral contacts 112, 122 are the same, and become wider as they approach the roots 112b, 122b from the tips 112a, 122a.
  • the spiral portions 112c and 122c are provided from the roots 112b and 122b toward the tips 112a and 122a.
  • the width V may be constant as it goes from the tips 112a and 122a to the roots 112b and 122b.
  • the thickness T (T1, T2) is also constant, the thickness T (T1, T2) may be gradually increased from the tips 112a, 122a to the roots 112b, 122b.
  • the upper spiral contact 112 has its roots 112b and 112b arranged at positions that are opposed to each other by 180 degrees, and is directed from the roots 112b and 112b toward the center of the spiral.
  • the tip 112a which stands
  • the roots 122b and 122b of the lower spiral contact 122 are arranged at positions facing each other, and provided with tips 122a that rise from the roots 122b and 122b toward the center of the spiral and merge with each other at the center of the spiral. Yes.
  • the double spiral spiral contacts 112, 122 are vertically stacked to form two stages, and the tips 112a, 122a are freed, and laser spot welding is used to at least one place from the bases 112b, 122b to the bases 112d, 122d.
  • the effect similar to that of increasing the length of the spiral contactor was obtained by fixing.
  • the two-stage spiral contactor 1 has the effect of increasing the spring constant and deepening the yield point. Therefore, it can be connected to connection terminals of various shapes, and the spiral contact disposed on the upper stage when the spiral contactor 101 contacts the connection terminal (not shown) and pushes down the spiral contactor 1 sequentially from the tip.
  • the tip 112a of the child 112 comes into contact with the connection terminal with a torsional motion and draws a minute circle, a spiral contact having both excellent electrical characteristics and excellent spring characteristics can be realized. .
  • the width of the lower spiral contact 122 is narrower than the width of the upper spiral contact 112. As shown in FIG.
  • the widths V2 and W2 of the spiral contacts 122 on the lower side of the spiral contacts 112 and 122 arranged in two upper and lower stages narrower than the widths V1 and W1 of the upper spiral contacts 112, the upper and lower Even when the spiral contacts 112 and 122 of the stage are compressed, the entire upper surface of the spiral contact 122 of the lower stage is not detached from the lower surface of the spiral contact 112 of the upper stage, and stable electrical connection characteristics can be obtained.
  • the thickness T2 of the lower spiral contact 122 is thinner than the thickness T1 of the upper spiral contact 112.
  • the two upper and lower spiral contacts Even when the contactor 101 is compressed, the entire upper surface of the lower spiral contactor 122 follows the lower surface of the upper spiral contactor 112, and stable electrical connection characteristics can be obtained. It is possible to realize a spiral contact having both spring characteristics.
  • FIG. 13 is a process diagram of the manufacturing method of the spiral contactor according to the sixth embodiment of the present invention, and shows the manufacturing process of the upper spiral contactor 112.
  • a metal plate 114 is prepared, and at least one recess 114 a is formed on the surface of the metal plate 114 so as to come to the position of the tip of the spiral contact.
  • the metal plate 114 is preferably a Cu foil, the metal plate 114 is hereinafter referred to as a Cu foil 114.
  • the thickness of the Cu foil 114 is a foil shape, for example, 0.08 mm, but is not limited thereto.
  • a photoresist 115 is applied to the surface of the Cu foil 114 or a dry film is applied.
  • a photomask 116 having a spiral contact 112 pattern is applied from above, and exposure is performed by irradiating light from above the photomask 116.
  • the shape of the photomask 116 is a pattern in which the spiral contact 112 is blackened. Further, a method using a reverse black and white pattern may be used.
  • the photoresist 115 is developed so as to form a pattern of the photomask 116.
  • the exposed surface 114b of the Cu foil 14 is further subjected to metal plating 117 composed of Au plating 117b and Ni plating 117a from above to form the spiral contact 112.
  • the metal plating 117 here is preferably a nickel alloy plating excellent in electrical conductivity.
  • nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
  • the photoresist 115 is removed.
  • a photoresist 115 is pasted or applied on the back surface of the Cu foil 114, and a photomask 116 'for opening a hole is covered, and this photomask 116' is irradiated with light to be exposed and developed.
  • a hole 114c is formed in the Cu foil 114 from the back surface of the Cu foil 114 by etching.
  • the photoresist 115 on the back surface of the Cu foil 114 is removed.
  • FIG. 14 is a process chart of the manufacturing method according to the sixth embodiment of the present invention, and shows a process following the eighth process shown in FIG.
  • annealing is performed in a state where the spiral center of the spiral contact 112 turned upside down is pushed up from one side by the convex tool 130 and deformed into a convex shape.
  • the convex tool 130 is disposed below the spiral contact 112, and the forming is stabilized by annealing forming the spiral contact 112 being pushed up from below by the convex tool 130 and deformed into a convex shape. That is, the spiral contact 112 deformed into a convex shape is heated and annealed to be formed into a convex shape.
  • annealing forming for example, heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C. here, it is assumed to include around 250 ° C., and is not limited to this.
  • the annealing forming is completed and the convex tool 130 is removed.
  • FIG. 15 is a process diagram of the manufacturing method of the spiral contactor according to the sixth embodiment of the present invention, and shows the manufacturing process of the lower spiral contactor 122.
  • a metal plate 124 is prepared in the eleventh step (k).
  • the metal plate 124 is preferably a Cu foil, and is the same material as the metal plate 114 described above.
  • a photoresist 125 is applied to the surface of the Cu foil 124 or a dry film is applied.
  • a photomask 126 having a spiral contact 122 pattern is applied from above, and exposure is performed by irradiating light from above the photomask 126.
  • the shape of the photomask 126 is a pattern in which the spiral contact 122 is blackened. Further, a method using a reverse black and white pattern may be used.
  • the photoresist 125 is developed so as to form a pattern of the photomask 126.
  • the exposed surface 124b of the Cu foil 124 is further subjected to metal plating 127 composed of Au plating 127b and Ni plating 127a from above to form the spiral contact 122.
  • the metal plating 127 here is preferably a nickel alloy plating containing tungsten having a high spring property.
  • nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
  • the photoresist 125 is removed.
  • a photoresist 125 is pasted or applied on the back surface of the Cu foil 124, and a photomask 126 'for making a hole is covered, and the photomask 126' is irradiated with light to be exposed and developed.
  • a hole 124 c is formed in the Cu foil 124 by etching from the back surface of the Cu foil 124.
  • the photoresist 125 on the back surface of the Cu foil 124 is removed.
  • FIG. 16 is a process diagram of the manufacturing method according to the present invention, and shows a process following the 18th process shown in FIG.
  • annealing is performed in a state where the center of the spiral of the spiral contact 122 turned upside down is pushed up from one side by the convex tool 130 and deformed into a convex shape.
  • the convex tool 130 is arranged below the spiral contact 122, and the forming is stabilized by annealing forming the spiral contact 122 pushed up from below by the convex tool 130 and deformed into a convex shape. That is, the spiral contact 122 deformed into a convex shape is heated and annealed to be formed into a convex shape.
  • annealing forming for example, heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C. here, it is assumed to include around 250 ° C., and is not limited to this.
  • a mounting substrate 128 having a conductive land 128a is provided on the surface, a conductive paste (solder paste) 129 is applied to the upper surface of the land 128a, and a spiral contact is formed on the upper surface of the land 128a.
  • the child 122 is positioned.
  • the Cu foil 124 is removed by etching.
  • the spiral contact 112 is superposed on the spiral contact 122 in two upper and lower stages, the tip is made free, and the root is joined by laser spot welding.
  • the spiral contact 122 is fixed to 128a, and the double spiral spiral contact 112 having a protrusion on the upper stage is overlapped on the lower spiral contact 122 having no protrusion.
  • a spiral contactor 101 is formed. Further, the double spiral is described with two spirals in parallel, but a triple spiral, a quadruple spiral, or a plurality of spirals may be used.
  • the spiral can be manufactured by shifting the root position and the tip position equally.
  • FIG. 17 shows a triple spiral two-stage spiral contact for explaining the seventh embodiment of the present invention, and (a) is a plan view showing the triple spiral two-stage spiral contact; b) (c) and (d) are cross-sectional views taken along line FF shown in (a), and are cross-sectional views of a spiral contact of a triple-spiral type having a convex shape in a natural body. Two types of two-stage configurations are shown. As shown in FIGS.
  • the spiral contacts 131 and 132 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the root A, the root B, and the root
  • the triple spiral spiral contacts 131 and 132 are formed in a spiral shape from the reference numeral 131b toward the center of the tip, arranged in a spiral shape with the tip ends 131a being parallel to each other, and joined together at the tip 131a.
  • the spiral contactor 101 ′ is provided with a spiral contact 131 using a material having high electrical conductivity in the upper stage and a spiral contact 132 using a material having high spring characteristics in the lower stage.
  • the core material forming the spiral contact 131 is a nickel (Ni) base material, and the upper and lower surfaces are plated with Au.
  • the core material forming the spiral contact 132 is a nickel alloy (Ni alloy) blended with tungsten, and at least the upper surface is Au plated.
  • the root A, the root B, and the root C In the convex spiral contact 131 formed in a spiral shape from the root A, the root B, and the root C toward the tip center, and having a tip at the spiral center, the root A, the root B of the spiral contact 131, Three roots C are arranged at positions shifted by 120 ° from each other, the root A, the root B, the root C rises from the root C toward the center of the spiral, the center is the same, and the three are arranged in a spiral shape.
  • the spiral contact 131 has a mirror-like flat surface 131aa obtained by mirror-treating the upper surface of the tip 131a of the triple spiral spiral contact 131 integrated with the tip.
  • a hole 131aa (a depression or a through hole) is provided in the vicinity of a substantially circular center in the mirror-like flat surface 131aa disposed in the upper stage. Due to the hole 131aaa, the surface pressure is not dispersed and a large pressure is applied, and the radius to which the surface pressure is applied is large, so that the area in which the surface moves is increased and the metal-to-metal bonding is easily generated.
  • a column 131ab may be provided on the upper surface of the tip 131aa, and at this time, the upper surface of the column 131ab is provided with a mirror-like flat surface 131aba that is mirror-finished.
  • the column 131ab used the cylinder and the prism, the column of other shapes may be sufficient as long as the upper surface is flat.
  • a flat mirror-like flat surface 131aa may be provided.
  • FIG. 18 shows a two-stage spiral contactor for explaining an eighth embodiment of the present invention, wherein (a) is a plan view showing a spiral contact having a tip and a protrusion in the vicinity thereof; ) Is a cross-sectional view taken along line GG shown in FIG. As shown in FIGS. 18 (a) and 18 (b), the spiral contactor 101 ′′ arranged in two upper and lower stages is a convex spiral (spiral) in the natural body, but it goes from the root 133b to the center of the tip 133a.
  • a groove 133d is provided at the center in the width direction of the spiral contact 133 along the longitudinal direction of the spiral contact 133.
  • the contactors 133 and 134 are joined to at least one of the base parts 133d and 134d from the bases 133b and 134b and overlapped in two upper and lower stages to form a double spiral two-stage spiral contactor 101 ′′.
  • a projection 133aa having a quadrangular pyramid shape is provided at the tip 133a located at the center thereof. The width of the spiral increases as it approaches the root 133b from the tip 133a, and a spiral portion 133c is provided from the root 133b toward the tip 133a.
  • the width may be constant as it goes from the tip 133a to the root 133b. Although the thickness is also constant, the thickness may gradually increase from the tip to the base.
  • the spiral contactor 101 ′′ is provided with a spiral contact 133 using a material having a high electrical conductivity in the upper stage and a spiral contact 134 using a material having a high spring property in the lower stage.
  • the core material forming the spiral contact 133 is a nickel (Ni) base material, and the upper and lower surfaces are plated with Au.
  • the core material forming the spiral contactor 134 is a nickel alloy (Ni alloy) blended with tungsten, and at least the upper surface is Au plated. Note that the protrusion 133aa may not be provided.
  • the length of the groove 133d is provided in a predetermined section from the root 133b of the spiral contact 133 to the tip 133a.
  • the section can be set as appropriate.
  • the length of the groove 133d of the spiral contact 133 can be fixed as follows. That is, the roots 133b and 133b of the two spiral contacts 133 and 133 are the same, and are formed in a spiral shape from the root 133b toward the center of the tip 133a, and have a tip 133a at the center of the spiral and have two spiral contacts.
  • the child 133 may be formed in parallel with a space between each other, the space being referred to as a groove 133d, and the two spiral contacts 133 may be combined at the tip 133a.
  • FIG. 19A and 19B are schematic views of an interconnector to which the spiral contactor of the present invention is applied.
  • FIG. 19A is an overall view
  • FIG. 19B is an enlarged view of a portion indicated by D in the figure.
  • it is used as an interconnector that electrically connects between substrates, between a device and a substrate, and can be applied to a spiral contactor having a good combination of excellent electrical characteristics and spring characteristics.
  • the metal plates 14 and 34 are preferably Cu foils, the metal plates 14 and 34 are hereinafter referred to as Cu foils 14 and 34.
  • the thicknesses of the Cu foils 14 and 34 are foil-like, for example, 0.08 mm, but are not limited thereto.
  • the metal plating here is preferably a nickel alloy plating excellent in electric conductivity.
  • nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
  • heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C.
  • the shape of the photomask is a pattern in which the spiral contact portion is blackened. Further, a method using a reverse black and white pattern may be used.
  • the spiral contactor has at least a part of the base portion from the base as an integral structure, the tip portion may also have an integral structure by the same construction method. In this case, the spiral part between the base and at least a part of the base part and the tip part overlaps in a state of being in close contact or slightly separated.
  • It is used as an interconnector that electrically connects substrates, between devices and substrates, etc., and can be applied to spiral contactors that have a good combination of excellent electrical characteristics and spring characteristics.

Abstract

Provided is a spiral contactor (1) wherein protruding spiral contacts (11, 12), which are formed in spiral shapes (11c, 12c) from start portions (11b, 12b) toward the center of the leading ends (11a, 12a) and have the leading ends (11a, 12a) at the center of the spiral shapes (11c, 12c), are placed one over another in two layers. The spiral contactor (1) has the structure wherein the upper spiral contact (12) and the lower spiral contact (11) from the start portions (11b, 12b) to base sections (11d, 12d) are integrated at least on one area. Thus, the protruding spiral contacts are placed one over another in two layers and the spiral contactor having a high breakdown point is provided without increasing the area occupied by the spiral contactor.

Description

スパイラルコンタクタおよびその製造方法Spiral contactor and manufacturing method thereof
 本発明は、優れた電気特性と降伏点の高いバネ特性の良好な組み合わせを併せ持ったスパイラルコンタクタに関し、特にスパイラル状接触子を上下二段に重ね、上段のスパイラル状接触子と、下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体的な構造になっているスパイラルコンタクタおよびその製造方法に関する。 The present invention relates to a spiral contactor having a good combination of excellent electrical characteristics and spring characteristics with a high yield point. In particular, the spiral contactors are stacked in two upper and lower stages, the upper spiral contact and the lower spiral contact. The present invention relates to a spiral contactor in which at least one part of a base from the base of a contact has an integral structure and a method for manufacturing the same.
 図20は、従来の一重渦巻き二段式スパイラルコンタクタの概略を示す概略図である。図20に示すように、渦巻きの中心に先端を有する凸形のスパイラルコンタクタ201は、中心を同一として互いに併行して渦巻状に配設された複数のスパイラル状接触子211、212が先端で合流して一体としており、このスパイラル状接触子211、212の根元211b、212bを重ねた位置に配置して、例えばレーザスポット溶接で固定し、根元211b、212bから渦巻きの中心に向けて立ち上がり、渦巻きの中心に先端211a、212aを備えている。
 これによって、さまざまな形状の接続端子にも接続可能であるとともに、スパイラル状接触子が接続端子と接触して、スパイラル状接触子を先端から順に押し下げるときにスパイラル状接触子が接続端子とねじり動作を伴いながら接触し、微小円を描くことによって、優れた電気接続性を有する(特許文献1参照)。
FIG. 20 is a schematic view showing an outline of a conventional single spiral two-stage spiral contactor. As shown in FIG. 20, a convex spiral contactor 201 having a tip at the center of a spiral has a plurality of spiral contacts 211 and 212 joined together at the tip. The roots 211b and 212b of the spiral contacts 211 and 212 are arranged at the overlapping positions, and fixed by, for example, laser spot welding, and rise from the roots 211b and 212b toward the center of the spiral, Are provided with tips 211a and 212a.
As a result, it is possible to connect to connection terminals of various shapes, and when the spiral contact makes contact with the connection terminal and the spiral contact is pushed down from the tip in order, the spiral contact makes a twisting action with the connection terminal. It has excellent electrical connectivity by making a contact while drawing and drawing a minute circle (see Patent Document 1).
特願2008-202905号Japanese Patent Application No. 2008-202905
 しかしながら、スパイラル状接触子が接続端子に対し、強く加圧されることによって、さらに電気的接続特性を向上させるために、電気的特性とバネ特性の両方を兼ね備えたスパイラル状接触子が求められていた。
 このため、スパイラル状接触子のバネ定数を大きくするとともに、降伏点を深くすることが必要である。また、そのための方法として、スパイラル状接触子のメッキ厚を厚くしたり、板厚自体を厚くするなどの方法があるが、板厚を厚くすることによってバネ定数は大きくなるが、素材としての降伏点が浅くなってしまう。このため、スパイラル状接触子の長さを長くして降伏点を深くする必要がある。
However, in order to further improve the electrical connection characteristics when the spiral contact is strongly pressed against the connection terminal, a spiral contact having both electrical characteristics and spring characteristics is required. It was.
For this reason, it is necessary to increase the spring constant of the spiral contact and to deepen the yield point. In addition, as a method for this, there are methods such as increasing the plating thickness of the spiral contactor or increasing the plate thickness itself, but increasing the plate thickness increases the spring constant, but yielding as a material The point becomes shallow. For this reason, it is necessary to increase the yield point by increasing the length of the spiral contact.
 本発明は、前記課題を解決するために創案されたものであり、凸形のスパイラル状接触子を上下二段に重ね合わせ、優れた電気特性や降伏点の高いバネ特性を持ったスパイラルコンタクタであって、特にスパイラル状接触子を上下二段に重ね、上段のスパイラル状接触子と、下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体的な構造になっているスパイラルコンタクタおよびその製造方法を提供することを課題とする。 The present invention was devised to solve the above-described problems, and is a spiral contactor having a superior spiral characteristic and a high yield point spring characteristic in which convex spiral contacts are superposed in two upper and lower stages. In particular, the spiral contactor is stacked in two upper and lower stages, and the spiral contactor in which the upper spiral contact is integrated with at least one part of the base from the base of the lower spiral contact and its It is an object to provide a manufacturing method.
 請求項1に係る発明のスパイラルコンタクタは、根元から先端中心に向かって渦巻状に形成され、前記渦巻状の中心に先端を有する凸形のスパイラル状接触子11、12を上下二段に重ね合わせたスパイラルコンタクタ1において、前記スパイラルコンタクタ1は、上段のスパイラル状接触子11と下段のスパイラル状接触子12の前記根元から基部の少なくとも1箇所が一体的な構造になっていることを特徴とする。 The spiral contactor of the invention according to claim 1 is formed in a spiral shape from the root toward the center of the tip, and the convex spiral contacts 11 and 12 having a tip at the spiral center are overlapped in two upper and lower stages. In the spiral contactor 1, the spiral contactor 1 has an integral structure in which at least one part from the base to the base of the upper spiral contact 11 and the lower spiral contact 12 is integrated. .
 請求項1に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the first aspect of the present invention, at least one portion of the base from the base of the upper spiral contact and the lower spiral contact is integrated with the spiral contact. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
 請求項2に係る発明は、請求項1に記載のスパイラルコンタクタ1であって、前記上下二段のスパイラル状接触子11、12の根元を同一にした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がったスパイラルコンタクタ1において、前記根元から基部の少なくとも1箇所が一体構造になっていることを特徴とする。 The invention according to claim 2 is the spiral contactor 1 according to claim 1, wherein the spiral contactors 11 and 12 of the upper and lower two stages are arranged at the same base, and the spiral contactor is arranged from the root. The spiral contactor 1 rising toward the center is characterized in that at least one portion of the base portion from the base has an integral structure.
 請求項2に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the second aspect of the present invention, the spiral contact element alone is realized by forming at least one portion of the base portion from the base of the upper spiral contact element and the lower spiral contact element. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
 請求項3に係る発明は、請求項1に記載のスパイラルコンタクタ3であって、前記上下二段のスパイラル状接触子31、32の根元を互いに180°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子31、32が先端で合流して一体とした二重渦巻きスパイラルコンタクタ3において、前記根元から基部の少なくとも1箇所が一体構造になっていることを特徴とする。 The invention according to claim 3 is the spiral contactor 3 according to claim 1, wherein the roots of the upper and lower two-stage spiral contacts 31, 32 are arranged at positions shifted from each other by 180 °. A double spiral spiral that rises from the root toward the center of the spiral, and the two spiral contacts 31 and 32 that are arranged in a spiral shape with the center being the same are joined together at the tip. The contactor 3 is characterized in that at least one part of the base portion from the base has an integral structure.
 請求項3に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 3, it is realized by a single spiral contactor by having at least one part of the base from the base of the upper spiral contactor and the lower spiral contactor to be integrated. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
 請求項4に係る発明は、請求項1に記載のスパイラルコンタクタ4であって、前記上下二段のスパイラル状接触子41、42の根元を互いに120°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された3個の前記スパイラル状接触子41、42が先端で合流して一体とした三重渦巻きスパイラルコンタクタ4において、前記根元から基部の少なくとも1箇所が一体構造になっていることを特徴とする。 The invention according to claim 4 is the spiral contactor 4 according to claim 1, wherein the roots of the upper and lower two- stage spiral contacts 41, 42 are arranged at positions shifted from each other by 120 °, and A triple spiral spiral contactor that rises from the root toward the center of the spiral, and the three spiral contacts 41 and 42 that are arranged in a spiral with the centers being the same are joined together at the tip. 4 is characterized in that at least one part of the base from the base has an integral structure.
 請求項4に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 4, it is realized by a single spiral contactor by having at least one part of the base from the base of the upper spiral contactor and the lower spiral contactor to be integrated. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
 請求項5に係る発明は、請求項1に記載のスパイラルコンタクタ5であって、前記上下二段の前記スパイラル状接触子51、52の前記渦巻きの根元を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子51、52が先端で合流して一体としたスパイラルコンタクタ5において、前記根元から基部の少なくとも1箇所が一体構造になっていることを特徴とする。 The invention according to claim 5 is the spiral contactor 5 according to claim 1, wherein the spiral bases of the spiral contactors 51, 52 in the upper and lower two stages are made to be the same in parallel and arranged in a spiral shape. In the spiral contactor 5 in which the two spiral contactors 51 and 52 provided are merged at the tip and integrated with each other, at least one portion of the base from the base has an integral structure.
 請求項5に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the fifth aspect of the present invention, the spiral contactor itself can be realized by having at least one portion of the base part from the base of the upper spiral contactor and the lower spiral contactor to be integrated. Although it is difficult, the yield point can be deepened by stacking two spiral contactors in two upper and lower stages, and the electrical resistance can be reduced without increasing the contact pressing force. Thus, a spiral contact having a small installation area can be maintained.
 請求項6に係る発明のスパイラルコンタクタは、根元から先端中心に向かって渦巻状に形成され、前記渦巻状の中心に先端を有する凸形のスパイラル状接触子(112、122)を上下二段に重ね合わせたスパイラルコンタクタ(101)であって、前記スパイラルコンタクタ(101)は、上段に電気電導性に富んだ材料を用いたスパイラル状接触子(112)、下段にバネ性に富んだ材料を用いたスパイラル状接触子(122)を設けたことを特徴とする。 The spiral contactor of the invention according to claim 6 is formed in a spiral shape from the root toward the tip center, and the convex spiral contactor (112, 122) having the tip at the spiral center in two upper and lower stages. The spiral contactor (101) is a superposed spiral contactor (101) that uses a spiral contactor (112) using a material having high electrical conductivity at the upper stage and a material having high springiness at the lower stage. A spiral contact (122) provided is provided.
 請求項6に係る発明によれば、上下二段のスパイラル状接触子が、接続端子に接触する側の上段に電気電導性に富んだ材料を用い、下段にバネ性に富んだ材料を用いることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 6, the upper and lower spiral contactors use a material having high electrical conductivity at the upper stage on the side in contact with the connection terminal and a material having high springiness at the lower stage. However, it is difficult to achieve with a single spiral contact, but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
 請求項7に係る発明は、請求項6に記載のスパイラルコンタクタ(101)であって、前記下段のスパイラル状接触子(122)の幅は、前記上段のスパイラル状接触子(112)の幅より狭いことを特徴とする。 The invention according to claim 7 is the spiral contactor (101) according to claim 6, wherein the width of the lower spiral contactor (122) is greater than the width of the upper spiral contactor (112). It is characterized by being narrow.
 請求項7に係る発明によれば、上下二段に配設されたスパイラルコンタクタの下側のスパイラル状接触子の幅を上段のスパイラル状接触子の幅より狭くすることによって、上下二段のスパイラルコンタクタが圧縮されるときにも下段のスパイラル状接触子の上面全体が上段のスパイラル状接触子の下面から外れることがなく安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 According to the seventh aspect of the present invention, the width of the spiral contactor on the lower side of the spiral contactor arranged in the upper and lower two stages is made narrower than the width of the upper spiral contact, thereby making the upper and lower two stage spirals. Even when the contactor is compressed, the entire upper surface of the lower spiral contactor is not detached from the lower surface of the upper spiral contactor, and a stable electrical connection characteristic can be obtained. Excellent electrical characteristics and an excellent spring It is possible to realize a spiral contact having both characteristics.
 請求項8に係る発明は、請求項6に記載のスパイラルコンタクタ(101)であって、前記下段のスパイラル状接触子(122)の厚さは、前記上段のスパイラル状接触子(112)の厚さより薄いことを特徴とする。 The invention according to claim 8 is the spiral contactor (101) according to claim 6, wherein the thickness of the lower spiral contact (122) is the thickness of the upper spiral contact (112). It is characterized by being thinner than that.
 請求項8に係る発明によれば、上下二段に配設されたスパイラル状接触子の下側のスパイラル状接触子の厚さを上段のスパイラル状接触子の厚さより薄くすることによって、下段のスパイラル状接触子の方が断面応力が小さいため、上下二段のスパイラル状接触子が圧縮されるときにも下段のスパイラル状接触子の上面全体が上段のスパイラル状接触子の下面から離れることなく追随し、安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 According to the eighth aspect of the present invention, the thickness of the lower spiral contact disposed in the upper and lower spiral contacts is made thinner than that of the upper spiral contact. Since the spiral contact has a smaller cross-sectional stress, the upper surface of the lower spiral contact is not separated from the lower surface of the upper spiral contact even when the upper and lower spiral contacts are compressed. Following this, a stable electrical connection characteristic can be obtained, and a spiral contactor having both excellent electrical characteristics and excellent spring characteristics can be realized.
 請求項9に係る発明は、請求項6に記載のスパイラルコンタクタ(101)であって、前記上下二段のスパイラル状接触子(112、122)の根元を互いに180°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(112、122)が先端で合流して一体とした二重渦巻きスパイラルコンタクタ(101)を、前記根元から基部の少なくとも1箇所を上下接合して上下二段に重ね合わせたことを特徴とする。 The invention according to claim 9 is the spiral contactor (101) according to claim 6, wherein the roots of the upper and lower two-stage spiral contactors (112, 122) are arranged at positions shifted from each other by 180 °. Then, the two spiral contacts (112, 122), which rise from the root toward the center of the spiral and are arranged in a spiral with the centers being the same, are joined together at the tip. The double spiral spiral contactor (101) is characterized in that at least one portion of the base portion is vertically joined from the base and is superposed in two stages.
 請求項9に係る発明によれば、上下二段のスパイラル状接触子が、接続端子に接触する側の上段に電気電導性に富んだ材料を用い、下段にバネ性に富んだ材料を用いることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 9, the upper and lower spiral contactors use a material having high electrical conductivity at the upper stage on the side in contact with the connection terminal, and a material having high springiness at the lower stage. However, it is difficult to achieve with a single spiral contact, but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
 請求項10に係る発明は、請求項6に記載のスパイラルコンタクタ(101)であって、前記上下二段のスパイラル状接触子(131、132)の根元を互いに120°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された3個の前記スパイラル状接触子が先端で合流して一体とした三重渦巻きスパイラルコンタクタ(101´)を、前記根元から基部の少なくとも1箇所を上下接合して上下二段に重ね合わせたことを特徴とする。 The invention according to claim 10 is the spiral contactor (101) according to claim 6, wherein the roots of the upper and lower two-stage spiral contactors (131, 132) are arranged at positions shifted by 120 ° from each other. Then, the triple spiral spiral that rises from the root toward the center of the spiral, and the three spiral contacts that are arranged in a spiral in parallel with each other at the center join together at the tip. The contactor (101 ') is characterized in that at least one portion of the base portion is vertically joined from the base, and is superposed in two stages.
 請求項10に係る発明によれば、上下二段のスパイラル状接触子が、接続端子に接触する側の上段に電気電導性に富んだ材料を用い、下段にバネ性に富んだ材料を用いることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 10, the upper and lower spiral contactors use a material with high electrical conductivity at the upper stage on the side in contact with the connection terminal, and use a material with high springiness at the lower stage. However, it is difficult to achieve with a single spiral contact, but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
 請求項11に係る発明は、請求項6に記載のスパイラルコンタクタ(101)であって、前記上下二段の前記スパイラル状接触子(133、134)において、前記渦巻きの根元を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(133、134)が先端で合流して一体としたスパイラル状接触子(133、134)を前記根元から基部の少なくとも1箇所を上下に接合して上下二段に重ね合わせたことを特徴とする。 The invention according to claim 11 is the spiral contactor (101) according to claim 6, wherein in the spiral contactors (133, 134) of the upper and lower two stages, the roots of the spirals are made to be the same to each other. Two spiral contacts (133, 134) arranged in a spiral shape merge at the tip to form an integral spiral contact (133, 134) up and down at least one location from the base to the base. It is characterized by being joined to the upper and lower two stages.
 請求項11に係る発明によれば、上下二段のスパイラル状接触子が、接続端子に接触する側の上段に電気電導性に富んだ材料を用い、下段にバネ性に富んだ材料を用いることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 According to the invention of claim 11, the upper and lower spiral contactors use a material with high electrical conductivity on the upper stage on the side in contact with the connection terminal, and use a material with high springiness on the lower stage. However, it is difficult to achieve with a single spiral contact, but by stacking two spiral contacts in two steps, the yield point can be deepened and the electrical resistance can be reduced without increasing the contact pressure. It is possible to maintain the required yield point depth and to make a spiral contact with a small installation area.
 請求項12に係る発明は、請求項6に記載のスパイラルコンタクタ(101、101´、101´´)であって、前記根元から先端中心に向かって渦巻状に形成され、前記渦巻状の中心に先端を有する凸形のスパイラル状接触子を上下二段に重ね合わせたスパイラルコンタクタ(101、101´、101´´)であって、前記上下二段のスパイラルコンタクタの少なくとも上段に配設されたスパイラル状接触子の先端部平面には、センタ付近に穴が設けられていることを特徴とする。 The invention according to claim 12 is the spiral contactor (101, 101 ′, 101 ″) according to claim 6, wherein the spiral contactor is formed in a spiral shape from the root toward the tip center, and the spiral contactor is formed at the center of the spiral shape. A spiral contactor (101, 101 ′, 101 ″) in which convex spiral contacts having tips are stacked in two upper and lower stages, and a spiral disposed at least in the upper stage of the two upper and lower spiral contactors. A hole is provided in the vicinity of the center on the flat surface of the tip of the contact.
 請求項12に係る発明によれば、この上段に配設された鏡面状平面31aaには、センタ付近にほぼ円形の穴31aaa(窪み、または貫通孔)が設けられている。この穴31aaaによって、面圧が分散せず大きな圧力が掛かり、またその面圧が掛かる半径が大きいため面の動くエリアが大きくなり金属間接合が容易に発生する。また、半田付けを用いる場合、穴と周辺の両方に半田の吸い上がりであるフィレットが形成され、より強固な半田接合を可能とする。このように、スパイラル状接触子を2枚重ねにして二段とし、レーザスポット溶接で根元を固定することによって、スパイラル状接触子の長さを長くするのと同様の効果が生まれた。これによって、二段重ねのスパイラル状接触子のバネ定数が大きくなり、降伏点が深くなるという効果が得られた。したがって、さまざまな形状の接続端子にも接続可能であるとともに、スパイラル状接触子が接続端子と接触して、スパイラル状接触子を先端から順に押し下げるときにスパイラル状接触子の先端部が接続端子とねじり動作を伴いながら接触し、微小円を描くことによって、優れた電気接続性を有するスパイラル状接触子において、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 According to the twelfth aspect of the present invention, the mirror-like flat surface 31aa disposed in the upper stage is provided with a substantially circular hole 31aaa (a depression or a through hole) in the vicinity of the center. Due to the holes 31aaa, the surface pressure is not dispersed and a large pressure is applied, and since the radius to which the surface pressure is applied is large, the area in which the surface moves is increased and the metal-to-metal bonding is easily generated. In addition, when soldering is used, fillets that are sucked up solder are formed in both the hole and the periphery, thereby enabling a stronger solder joint. In this way, two spiral contactors are stacked in two steps, and the root is fixed by laser spot welding, thereby producing the same effect as increasing the length of the spiral contactor. As a result, the spring constant of the two-stage spiral contact increased, and the yield point was deepened. Therefore, it can be connected to connection terminals of various shapes, and when the spiral contact comes into contact with the connection terminal and the spiral contact is pushed down sequentially from the tip, the tip of the spiral contact is connected to the connection terminal. A spiral contact that has both excellent electrical characteristics and excellent spring characteristics in a spiral contact with excellent electrical connectivity by making contact with twisting motion and drawing a micro circle. be able to.
 請求項13に係る発明のスパイラルコンタクタの製造方法は、金属板14を用意する第1工程(a)と、Cu箔14とした金属板14の表面に第1のフォトレジスト15を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11のパターンを有する第1のフォトマスク16を被せ、このフォトマスク16の上方から光を照射して露光する第2工程(b)と、第1のフォトマスク16のパターンを形成するように第1のフォトレジスト15を現像する第3工程(c)と、さらに上方からCu箔14の露出面にAuメッキ17、ロジュームRh19、Niメッキから構成される金属メッキ13を施し、スパイラル状接触子11を成形する第4工程(d)と、形成したスパイラル状接触子11の表面に第2のフォトレジスト20を塗布、もしくはドライフィルムを貼付する。その上方から一体構造部25のパターンを有する第2のフォトマスク18を被せ、このフォトマスク18の上方から光を照射して露光する第5工程(e)と、このフォトマスク18に光を照射して露光・現像して第2のフォトレジスト20を除去し、除去した表面にAu(金)メッキ17を施す第6工程(f)と、金属メッキ17の表面にCuメッキ11eを施しさらにAuメッキ17を施す第7工程(g)と、第2のフォトレジスト20を除去する第8工程(h)と、Auメッキ17の表面にNiメッキ13から構成される金属メッキ13を施す第9工程(i)と、上下反転させ、金属板14の裏面に第3のフォトレジスト22を塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第3のフォトマスク23を被せ、このフォトマスク23の上方から光を照射して露光する第10工程(j)と、フォトマスク23に光を照射して露光・現像して第3のフォトレジスト22を除去する第11工程(k)と、Cu箔14の裏面からCu箔14にエッチングで穴14cを開ける第12工程(l)と、Cu箔14の裏面の第3のフォトレジスト22を除去する第13工程(m)と、上下反転させたスパイラル状接触子11、12の渦巻きの中心を一方から凸形工具21で押し上げて凸形に変形させた状態でアニールフォーミングする第14工程(n)と、粘着テープ24を貼り付ける第15工程(0)と、Cu箔14をエッチングで除去する第16工程(p)と、上下に重ねられた形態のスパイラル状接触子11、12が互いの底面と上面で密着している第17工程(q)と、を含むことを特徴とするスパイラルコンタクタの製造方法。 According to a thirteenth aspect of the present invention, there is provided a spiral contactor manufacturing method comprising: a first step (a) of preparing a metal plate 14; and applying or drying a first photoresist 15 on the surface of the metal plate 14 made of Cu foil 14. Affix the film. A second step (b) of covering the first photomask 16 having the spiral contact 11 pattern from above and irradiating light from above the photomask 16 for exposure, and the first photomask 16 A third step (c) of developing the first photoresist 15 so as to form a pattern, and further, a metal plating 13 composed of Au plating 17, rhodium Rh19, and Ni plating on the exposed surface of the Cu foil 14 from above. And a fourth step (d) of forming the spiral contact 11 and applying the second photoresist 20 on the surface of the formed spiral contact 11 or applying a dry film. A fifth step (e) in which the second photomask 18 having the pattern of the integrated structure portion 25 is covered from above and exposed by irradiating light from above the photomask 18, and the photomask 18 is irradiated with light. Then, the second photoresist 20 is removed by exposure and development, and a sixth step (f) in which Au (gold) plating 17 is applied to the removed surface, and Cu plating 11e is applied to the surface of the metal plating 17 and Au is further applied. A seventh step (g) for applying the plating 17; an eighth step (h) for removing the second photoresist 20; and a ninth step for applying the metal plating 13 composed of the Ni plating 13 on the surface of the Au plating 17. (I) Then, the third photoresist 22 is applied to the back surface of the metal plate 14 or a dry film is applied. A tenth step (j) in which a third photomask 23 having a pattern of holes for etching is covered from above and exposed by irradiating light from above the photomask 23, and the photomask 23 is irradiated with light. An eleventh step (k) in which the third photoresist 22 is removed by exposure and development, a twelfth step (l) in which a hole 14c is formed in the Cu foil 14 by etching from the back surface of the Cu foil 14, and the Cu foil 14 13th step (m) for removing the third photoresist 22 on the back surface of the substrate, and the spiral center of the spiral contactors 11 and 12 turned upside down is pushed up from one side by the convex tool 21 and deformed into a convex shape 14th step (n) for annealing forming in a heated state, 15th step (0) for attaching the adhesive tape 24, and 16th step (p) for removing the Cu foil 14 by etching, which were stacked one above the other. Method for manufacturing a spiral contactor spiral contacts 11, 12 of the state is characterized by comprising a seventeenth step in close contact with each other of the bottom and the top surface (q), the.
 請求項13に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、製造工程の短縮および製造コストの低減をすることができる。 According to the thirteenth aspect of the present invention, at least one part of the base from the base of the upper spiral contact and the lower spiral contact has an integral structure, thereby shortening the manufacturing process and reducing the manufacturing cost. Can do.
 請求項14に係る発明のスパイラルコンタクタの製造方法は、金属板34を用意する第A工程(a)と、Cu箔34とした金属板34の表面に第1のフォトレジスト35を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11のパターンを有する第1のフォトマスク36を被せ、このフォトマスク36の上方から光を照射して露光する第B工程(b)と、第1のフォトマスク36のパターンを形成するように第1のフォトレジスト35を現像する第C工程(c)と、さらに上方からCu34の露出面にAuメッキ37、ロジュームRh39、Niメッキ33から構成される金属メッキ33を施し、スパイラル状接触子11´を成形する第D工程(d)と、第1のフォトレジスト35を除去する第E工程(e)と、形成したスパイラル状接触子11´の表面に第2のフォトレジスト40を塗布、もしくはドライフィルムを貼付する。その上方から一体構造部42のパターンを有する第2のフォトマスク38を被せ、このフォトマスク38の上方から光を照射して露光する第F工程(f)と、このフォトマスク38に光を照射して露光・現像して第2のフォトレジスト40を除去する第G工程(g)と、除去した表面にCuメッキ31eを施しさらにAuメッキ37を施す第H工程(h)と、第1のフォトレジスト35を除去する第I工程(i)と、Auメッキ37、Cuメッキ31eの表面に第3のフォトレジスト45を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11´のパターンを有する第3のフォトマスク46を被せ、このフォトマスク46の上方から光を照射して露光する第J工程(j)と、第3のフォトマスク46に光を照射して露光・現像して第3のフォトレジスト45を除去する第K工程(k)と、Auメッキ37の表面にNiメッキ33から構成される金属メッキ33を施し、さらにAuメッキを施す第L工程(l)と、上下反転させ、金属板34の裏面に第4のフォトレジスト47を塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第4のフォトマスク48を被せ、このフォトマスク48の上方から光を照射して露光する第M工程(m)と、第4のフォトマスク48に光を照射して露光・現像して第4のフォトレジスト47を除去する第N工程(n)と、Cu箔34の裏面からCu箔34にエッチングで穴34cを開ける第O工程(o)と、Cu箔34の裏面の第4のフォトレジスト47を除去する第P工程(p)と、上下反転させたスパイラル状接触子11´、12´の渦巻きの中心を一方から凸形工具43で押し上げて凸形に変形させた状態でアニールフォーミングする第Q工程(q)と、粘着テープ49を貼り付ける第R工程(r)と、Cu箔34をエッチングで除去する第S工程(s)と、上下に重ねられた形態のスパイラル状接触子11´、12´が互いの底面と上面で密着している第T工程(t)と、を含むことを特徴とする。 In the spiral contactor manufacturing method according to the fourteenth aspect of the present invention, the first step 35 (a) in which the metal plate 34 is prepared, and the first photoresist 35 is applied to the surface of the metal plate 34 as the Cu foil 34 or dry. Affix the film. A first step B (b) in which a first photomask 36 having a pattern of the spiral contactor 11 is covered from above and exposed by irradiating light from above the photomask 36, and the first photomask 36 is exposed. A C-step (c) in which the first photoresist 35 is developed so as to form a pattern, and a metal plating 33 composed of Au plating 37, rhodium Rh39, and Ni plating 33 is applied to the exposed surface of the Cu 34 from above. The D step (d) for forming the spiral contact 11 ′, the E step (e) for removing the first photoresist 35, and the second photo on the surface of the formed spiral contact 11 ′. Resist 40 is applied or a dry film is applied. A second photomask 38 having a pattern of the integrated structure portion 42 is applied from above, and the F-step (f) is performed by irradiating light from above the photomask 38, and the photomask 38 is irradiated with light. Then, the G step (g) for removing the second photoresist 40 by exposure and development, the H step (h) for applying the Cu plating 31e to the removed surface and further applying the Au plating 37, the first step The first step (i) for removing the photoresist 35, and the third photoresist 45 is applied to the surface of the Au plating 37 and the Cu plating 31e, or a dry film is applied. A third photomask 46 having a pattern of spiral contacts 11 ′ is applied from above, and a J-th step (j) is performed by irradiating light from above the photomask 46. The K-th step (k) in which the third photoresist 45 is removed by irradiating light with exposure and development, and the metal plating 33 composed of the Ni plating 33 is applied to the surface of the Au plating 37, and further Au plating In step L (l), the fourth photo resist 47 is applied to the back surface of the metal plate 34 or a dry film is applied. A fourth photomask 48 having a pattern of etching holes is covered from above, and the Mth step (m) in which exposure is performed by irradiating light from above the photomask 48, and the fourth photomask 48 is irradiated with light. N step (n) in which the fourth photoresist 47 is removed by exposure / development by irradiation, an O step (o) in which a hole 34c is formed in the Cu foil 34 by etching from the back surface of the Cu foil 34, and The P-th step (p) for removing the fourth photoresist 47 on the back surface of the Cu foil 34, and the center of the spiral of the spiral contact 11 ', 12' turned upside down is pushed up from one side by the convex tool 43. Q process (q) for annealing forming in a deformed state, R process (r) for attaching adhesive tape 49, S process (s) for removing Cu foil 34 by etching, Of the form superimposed on And a T-th step (t) in which the spiral contacts 11 ′ and 12 ′ are in close contact with each other on the bottom surface and the top surface.
 請求項14に係る発明によれば、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、製造工程の短縮および製造コストの低減をすることができる。 According to the fourteenth aspect of the present invention, at least one portion of the base portion from the base of the upper spiral contact and the lower spiral contact has an integrated structure, thereby shortening the manufacturing process and reducing the manufacturing cost. Can do.
 また、このように、スパイラル状接触子を2枚重ねにして二段とし、根元および基部の少なくとも一か所を一体構造とすることによって、スパイラル状接触子の長さを長くするのと同様の効果が生まれた。これによって、二段重ねのスパイラル状接触子のバネ定数が大きくなり、降伏点が深くなるという効果が得られた。したがって、さまざまな形状の接続端子にも接続可能であるとともに、スパイラル状接触子が接続端子と接触して、スパイラル状接触子を先端から順に押し下げるときにスパイラル状接触子の先端部が接続端子とねじり動作を伴いながら接触し、微小円を描くことによって、優れた電気接続性を有するスパイラル状接触子において、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 In addition, in this way, two spiral contacts are stacked to form a two-tier structure, and at least one of the base and the base is made into an integral structure, so that the length of the spiral contact is increased. An effect was born. As a result, the spring constant of the two-stage spiral contact increased, and the yield point was deepened. Therefore, it can be connected to connection terminals of various shapes, and when the spiral contact comes into contact with the connection terminal and the spiral contact is pushed down sequentially from the tip, the tip of the spiral contact is connected to the connection terminal. A spiral contact that has both excellent electrical characteristics and excellent spring characteristics in a spiral contact with excellent electrical connectivity by making contact with twisting motion and drawing a micro circle. be able to.
本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラル状接触子を示し、(a)は一重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すA―A線の断面図であり、自然体では凸形状の一重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す一重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。The single spiral two-stage spiral contact for explaining the first embodiment of the present invention is shown, (a) is a plan view showing a single spiral two-stage spiral contact, (b) is ( It is sectional drawing of the AA line shown to a), and is sectional drawing of a convex single spiral two-stage spiral contact in a natural body, (c) is a single spiral two-stage spiral shape shown in (b) It is sectional drawing which shows the state which the upper and lower sides of the contactor adhered. 本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 1st Embodiment of this invention. 本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 1st Embodiment of this invention. 本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 1st Embodiment of this invention. 本発明の第2の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 2nd Embodiment of this invention. 本発明の第2の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 2nd Embodiment of this invention. 本発明の第2の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 2nd Embodiment of this invention. 本発明の第2の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。It is process sectional drawing which shows the manufacturing process of the single spiral two-stage spiral contactor for demonstrating the 2nd Embodiment of this invention. 本発明の第3の実施形態を説明するための二重渦巻き二段式のスパイラル状接触子を示し、(a)は二重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すB―B線の断面図であり、自然体では凸形状の二重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す二重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。The double spiral two-stage spiral contact for explaining the third embodiment of the present invention is shown, (a) is a plan view showing the double spiral two-stage spiral contact, (b) FIG. 2B is a cross-sectional view taken along line BB shown in FIG. 1A, and is a cross-sectional view of a double contact spiral contact having a convex shape in a natural body, and FIG. 2C is a double spiral double step shown in FIG. It is sectional drawing which shows the state which the upper and lower sides of the spiral contactor of a formula adhered. 本発明の第4の実施形態を説明するための三重渦巻き二段式のスパイラル状接触子を示し、(a)は三重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すC―C線の断面図であり、自然体では凸形状の三重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す三重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。The triple spiral two-stage spiral contact for explaining the fourth embodiment of the present invention is shown, (a) is a plan view showing the triple spiral two-stage spiral contact, (b) is ( It is sectional drawing of CC line shown to a), It is sectional drawing of a convex triple spiral two-stage spiral contactor in a natural body, (c) is a triple spiral two-stage spiral shape shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the contactor adhered. 本発明の第5の実施形態を説明するための渦巻きの根元を同一として互いに併行して渦巻状に配設された二段式のスパイラル状接触子を示し、(a)はスパイラル状接触子を示す平面図、(b)は(a)に示すD―D線の断面図であり、自然体では凸形状のスパイラル状接触子の断面図である。The spiral base for explaining the fifth embodiment of the present invention is shown as a two-stage spiral contact arranged in parallel with each other with the same spiral root, and (a) shows the spiral contact. FIG. 4B is a cross-sectional view taken along line DD shown in FIG. 1A, and is a cross-sectional view of a spiral contact that is a convex shape in a natural body. 本発明の第6の実施形態を説明するための二重渦巻き二段式のスパイラル状接触子を示し、(a)は二重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すE―E線の断面図であり、自然体では凸形状の二重渦巻き二段式のスパイラル状接触子の断面図である。The double spiral two-stage spiral contact for explaining the sixth embodiment of the present invention is shown, (a) is a plan view showing the double spiral two-stage spiral contact, (b) FIG. 2A is a cross-sectional view taken along line EE shown in FIG. 1A, and is a cross-sectional view of a double contact spiral contact having a convex shape in a natural body. 本発明に係るスパイラルコンタクタの製造方法の工程図であり、上段のスパイラル状接触子の製造工程を示している。It is process drawing of the manufacturing method of the spiral contactor which concerns on this invention, and has shown the manufacturing process of the upper spiral contactor. 本発明に係るスパイラルコンタクタの製造方法の工程図であり、図13に示す第8工程に続く工程を示している。It is process drawing of the manufacturing method of the spiral contactor which concerns on this invention, and has shown the process following the 8th process shown in FIG. 本発明に係るスパイラルコンタクタの製造方法の工程図であり、下段のスパイラル状接触子の製造工程を示している。It is process drawing of the manufacturing method of the spiral contactor which concerns on this invention, and has shown the manufacturing process of the lower spiral contactor. 本発明に係る製造方法の工程図であり、図15に示す第18工程に続く工程を示している。It is process drawing of the manufacturing method which concerns on this invention, and has shown the process following the 18th process shown in FIG. 本発明の第7の実施形態を説明するための三重渦巻き二段式のスパイラル状接触子を示し、(a)は三重渦巻き二段式のスパイラル状接触子を示す平面図、(b)(c)(d)は、(a)に示すF―F線の断面図であり、自然体では凸形状の三重渦巻き二段式のスパイラル状接触子の断面図であり、代表的な3種類の二段式形態を示している。The triple spiral two-stage spiral contact for explaining the seventh embodiment of the present invention is shown, (a) is a plan view showing the triple spiral two-stage spiral contact, (b) (c) ) (D) is a cross-sectional view taken along line FF shown in (a), and is a cross-sectional view of a spiral contact of a triple-spiral type having a convex shape in a natural body, and is representative of three types of two-stages. The formula form is shown. 本発明の第8の実施形態を説明するための二段式のスパイラルコンタクタを示し、(a)は先端及びその近傍に突起を備えたスパイラル状接触子を示す平面図、(b)は(a)に示すG―G線の断面図であり、自然体では凸形状の断面図である。FIG. 10 shows a two-stage spiral contactor for explaining an eighth embodiment of the present invention, wherein (a) is a plan view showing a spiral contact having a tip and a protrusion in the vicinity thereof, and (b) is (a). ) Is a cross-sectional view taken along line GG shown in FIG. 本発明のスパイラルコンタクタを適用したインターコネクタの概略図であり、(a)は全体図、(b)は図中のEに示す部分の拡大図である。It is the schematic of the interconnector to which the spiral contactor of this invention is applied, (a) is a general view, (b) is an enlarged view of the part shown by E in the figure. 従来の一重渦巻き二段式スパイラルコンタクタの概略を示す概略図である。It is the schematic which shows the outline of the conventional single spiral two-stage spiral contactor.
 1、1´、3、4、5 スパイラルコンタクタ
 11、12、11´、12´、21、22、31、32、41、41、51、52 スパイラル状接触子
 11e、31e Cuメッキ
 14、34 Cu箔
 15、20、22、35、40、45 フォトレジスト
 16、18、23、36、38、46、48 フォトマスク
 13、33 金属メッキ,Niメッキ
 25、42 一体構造部
 21、43 凸形工具
 101、101´、101´´ スパイラルコンタクタ
 112、122、131、132、133、134 スパイラル状接触子
 114、124 Cu箔
 115、125 フォトレジスト
 116、116´、126、126´ フォトマスク
 117 金属メッキ
 128 実装基板
 119、129 ペースト
 130 凸形工具
1, 1 ', 3, 4, 5 Spiral contactor 11, 12, 11', 12 ', 21, 22, 31, 32, 41, 41, 51, 52 Spiral contact 11e, 31e Cu plating 14, 34 Cu Foil 15, 20, 22, 35, 40, 45 Photoresist 16, 18, 23, 36, 38, 46, 48 Photomask 13, 33 Metal plating, Ni plating 25, 42 Integrated structure 21, 43 Convex tool 101 , 101 ′, 101 ″ Spiral contactor 112, 122, 131, 132, 133, 134 Spiral contactor 114, 124 Cu foil 115, 125 Photoresist 116, 116 ′, 126, 126 ′ Photomask 117 Metal plating 128 Mounting Substrate 119, 129 Paste 130 Convex tool
 以下、本発明に係るスパイラルコンタクタおよびその製造方法の実施の形態を、図面を参照しながら詳細に説明する。
 <第1の実施形態>
 図1は、本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラル状接触子を示し、(a)は一重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すA―A線の断面図であり、自然体では凸形状の一重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す一重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。
 図1(a)(b)(c)に示すように、スパイラルコンタクタ1は、根元11bから先端11a中心に向かって渦巻状に形成され、渦巻状の中心に先端11aを有する凸形のスパイラル状接触子11、12を上下二段に重ね合わせ、上段のスパイラル状接触子12と下段のスパイラル状接触子11の根元11bから基部11dの少なくとも1箇所が一体構造になっている。
Embodiments of a spiral contactor and a manufacturing method thereof according to the present invention will be described below in detail with reference to the drawings.
<First Embodiment>
FIG. 1 shows a single spiral two-stage spiral contact for explaining the first embodiment of the present invention, (a) is a plan view showing a single spiral two-stage spiral contact, (b) is a cross-sectional view taken along line AA shown in (a), and is a cross-sectional view of a spiral contact with a single-convex double-stage type having a convex shape in a natural body, and (c) is a single-stage double-stage shown in (b) It is sectional drawing which shows the state which the upper and lower sides of the spiral contactor of a formula adhered.
As shown in FIGS. 1A, 1B, and 1C, the spiral contactor 1 is formed in a spiral shape from the root 11b toward the center of the tip 11a, and has a convex spiral shape having the tip 11a at the center of the spiral. The contacts 11 and 12 are superposed in two upper and lower stages, and at least one portion from the base 11b to the base 11d of the upper spiral contact 12 and the lower spiral contact 11 has an integral structure.
 上段のスパイラル状接触子12と下段のスパイラル状接触子11の根元11bから基部11dの少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 Although at least one part from the base 11b to the base portion 11d of the upper spiral contact 12 and the lower spiral contact 11 has an integral structure, it is difficult to realize with a single spiral contact. By stacking two contactors in the upper and lower stages, the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required yield point depth is maintained and installed. A spiral contact with a small area can be obtained.
 図2、図3、図4は、本発明の第1の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。
 図2~図4に示すように、金属板14を用意する第1工程(a)と、Cu箔14とした金属板14の表面に第1のフォトレジスト15を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11のパターンを有する第1のフォトマスク16を被せ、このフォトマスク16の上方から光を照射して露光する第2工程(b)と、第1のフォトマスク16のパターンを形成するように第1のフォトレジスト15を現像する第3工程(c)と、さらに上方からCu箔14の露出面にAuメッキ17、ロジュームRh19、Niメッキから構成される金属メッキ13を施し、スパイラル状接触子11を成形する第4工程(d)と、形成したスパイラル状接触子11の表面に第2のフォトレジスト20を塗布、もしくはドライフィルムを貼付する。その上方から一体構造部25のパターンを有する第2のフォトマスク18を被せ、このフォトマスク18の上方から光を照射して露光する第5工程(e)と、このフォトマスク18に光を照射して露光・現像して第2のフォトレジスト20を除去し、除去した表面にAu(金)メッキ17を施す第6工程(f)と、
 金属メッキ17の表面にCuメッキ11eを施しさらにAuメッキ17を施す第7工程(g)と、第2のフォトレジスト20を除去する第8工程(h)と、Auメッキ17の表面にNiメッキ13から構成される金属メッキ13を施す第9工程(i)と、上下反転させ、金属板14の裏面に第3のフォトレジスト22を塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第3のフォトマスク23を被せ、このフォトマスク23の上方から光を照射して露光する第10工程(j)と、フォトマスク23に光を照射して露光・現像して第3のフォトレジスト22を除去する第11工程(k)と、Cu箔14の裏面からCu箔14にエッチングで穴14cを開ける第12工程(l)と、Cu箔14の裏面の第3のフォトレジスト22を除去する第13工程(m)と、上下反転させたスパイラル状接触子11、12の渦巻きの中心を一方から凸形工具21で押し上げて凸形に変形させた状態でアニールフォーミングする第14工程(n)と、
 粘着テープ24を貼り付ける第15工程(0)と、Cu箔14をエッチングで除去する第16工程(p)と、上下に重ねられた形態のスパイラル状接触子11、12が互いの底面と上面で密着している第17工程(q)と、を含むスパイラルコンタクタの製造工程である。
2, 3, and 4 are process cross-sectional views illustrating a manufacturing process of a single spiral two-stage spiral contactor for explaining the first embodiment of the present invention.
As shown in FIGS. 2 to 4, the first step (a) for preparing the metal plate 14 and the first photoresist 15 is applied to the surface of the metal plate 14 made of Cu foil 14 or a dry film is applied. . A second step (b) of covering the first photomask 16 having the spiral contact 11 pattern from above and irradiating light from above the photomask 16 for exposure, and the first photomask 16 A third step (c) of developing the first photoresist 15 so as to form a pattern, and a metal plating 13 composed of Au plating 17, rhodium Rh19, and Ni plating on the exposed surface of the Cu foil 14 from above is further performed. And a fourth step (d) of forming the spiral contact 11 and applying the second photoresist 20 on the surface of the formed spiral contact 11 or applying a dry film. A fifth step (e) in which the second photomask 18 having the pattern of the integrated structure portion 25 is covered from above and exposed by irradiating light from above the photomask 18, and the photomask 18 is irradiated with light. A sixth step (f) of removing the second photoresist 20 by exposure and development, and applying Au (gold) plating 17 to the removed surface;
Seventh step (g) of applying Cu plating 11e to the surface of the metal plating 17 and further applying Au plating 17, an eighth step (h) of removing the second photoresist 20, and Ni plating on the surface of the Au plating 17 The ninth step (i) for applying the metal plating 13 composed of 13 is turned upside down, and the third photoresist 22 is applied to the back surface of the metal plate 14 or a dry film is applied. A tenth step (j) in which a third photomask 23 having a pattern of etching holes is covered from above and exposed by irradiating light from above the photomask 23, and the photomask 23 is irradiated with light. An eleventh step (k) in which the third photoresist 22 is removed by exposure and development, a twelfth step (l) in which a hole 14c is formed in the Cu foil 14 by etching from the back surface of the Cu foil 14, and the Cu foil 14 13th step (m) for removing the third photoresist 22 on the back surface of the substrate, and the center of the spiral of the spiral contactors 11 and 12 turned upside down is pushed up from one side by the convex tool 21 and deformed into a convex shape. A 14th step (n) of annealing forming in a heated state;
The fifteenth step (0) for applying the adhesive tape 24, the sixteenth step (p) for removing the Cu foil 14 by etching, and the spiral contacts 11 and 12 in the form of being stacked one above the other are the bottom and top surfaces of each other. And a seventeenth step (q) in close contact with each other.
 <第2の実施形態>
 図5、図6、図7、図8は、本発明の第2の実施形態を説明するための一重渦巻き二段式のスパイラルコンタクタの製造工程を示す工程断面図である。
 図5~図8に示すように、金属板34を用意する第A工程(a)と、Cu箔34とした金属板34の表面に第1のフォトレジスト35を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11のパターンを有する第1のフォトマスク36を被せ、このフォトマスク36の上方から光を照射して露光する第B工程(b)と、第1のフォトマスク36のパターンを形成するように第1のフォトレジスト35を現像する第C工程(c)と、さらに上方からCu箔34の露出面にAuメッキ37、ロジュームRh39、Niメッキ33から構成される金属メッキ33を施し、スパイラル状接触子11´を成形する第D工程(d)と、第1のフォトレジスト35を除去する第E工程(e)と、形成したスパイラル状接触子11´の表面に第2のフォトレジスト40を塗布、もしくはドライフィルムを貼付する。その上方から一体構造部42のパターンを有する第2のフォトマスク38を被せ、このフォトマスク38の上方から光を照射して露光する第F工程(f)と、このフォトマスク38に光を照射して露光・現像して第2のフォトレジスト40を除去する第G工程(g)と、除去した表面にCuメッキ31eを施しさらにAuメッキ37を施す第H工程(h)と、第1のフォトレジスト35を除去する第I工程(i)と、Auメッキ37、Cuメッキ31eの表面に第3のフォトレジスト45を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子11´のパターンを有する第3のフォトマスク46を被せ、このフォトマスク46の上方から光を照射して露光する第J工程(j)と、第3のフォトマスク46に光を照射して露光・現像して第3のフォトレジスト45を除去する第K工程(k)と、Auメッキ37の表面にNiメッキ33から構成される金属メッキ33を施し、さらにAuメッキを施す第L工程(l)と、上下反転させ、金属板34の裏面に第4のフォトレジスト47を塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第4のフォトマスク48を被せ、このフォトマスク48の上方から光を照射して露光する第M工程(m)と、第4のフォトマスク48に光を照射して露光・現像して第4のフォトレジスト47を除去する第N工程(n)と、Cu箔34の裏面からCu箔34にエッチングで穴34cを開ける第O工程(o)と、Cu箔34の裏面の第4のフォトレジスト47を除去する第P工程(p)と、上下反転させたスパイラル状接触子11´、12´の渦巻きの中心を一方から凸形工具43で押し上げて凸形に変形させた状態でアニールフォーミングする第Q工程(q)と、
 粘着テープ49を貼り付ける第R工程(r)と、Cu箔34をエッチングで除去する第S工程(s)と、上下に重ねられた形態のスパイラル状接触子11´、12´が互いの底面と上面で密着している第T工程(t)と、を含むスパイラルコンタクタの製造工程である。
<Second Embodiment>
5, FIG. 6, FIG. 7, and FIG. 8 are process cross-sectional views showing a manufacturing process of a single spiral two-stage spiral contactor for explaining a second embodiment of the present invention.
As shown in FIGS. 5 to 8, the first step 35 (a) in which the metal plate 34 is prepared and the first photoresist 35 is applied to the surface of the metal plate 34 that is the Cu foil 34 or a dry film is applied. . A first step B (b) in which a first photomask 36 having a pattern of the spiral contactor 11 is covered from above and exposed by irradiating light from above the photomask 36, and the first photomask 36 is exposed. A C-step (c) in which the first photoresist 35 is developed so as to form a pattern, and a metal plating 33 composed of an Au plating 37, a rhodium Rh39, and an Ni plating 33 on the exposed surface of the Cu foil 34 from above. To form a spiral contact 11 ′, a D step (d), an E step (e) to remove the first photoresist 35, and a second contact on the surface of the formed spiral contact 11 ′. The photoresist 40 is applied or a dry film is applied. A second photomask 38 having a pattern of the integrated structure portion 42 is applied from above, and the F-step (f) is performed by irradiating light from above the photomask 38, and the photomask 38 is irradiated with light. Then, the G step (g) for removing the second photoresist 40 by exposure and development, the H step (h) for applying the Cu plating 31e to the removed surface and further applying the Au plating 37, the first step The first step (i) for removing the photoresist 35, and the third photoresist 45 is applied to the surface of the Au plating 37 and the Cu plating 31e, or a dry film is applied. A third photomask 46 having a pattern of spiral contacts 11 ′ is applied from above, and a J-th step (j) is performed by irradiating light from above the photomask 46. The K-th step (k) in which the third photoresist 45 is removed by irradiating light with exposure and development, and the metal plating 33 composed of the Ni plating 33 is applied to the surface of the Au plating 37, and further Au plating In step L (l), the fourth photo resist 47 is applied to the back surface of the metal plate 34 or a dry film is applied. A fourth photomask 48 having a pattern of etching holes is covered from above, and the Mth step (m) in which exposure is performed by irradiating light from above the photomask 48, and the fourth photomask 48 is irradiated with light. N step (n) in which the fourth photoresist 47 is removed by exposure / development by irradiation, an O step (o) in which a hole 34c is formed in the Cu foil 34 by etching from the back surface of the Cu foil 34, and The P-th step (p) for removing the fourth photoresist 47 on the back surface of the Cu foil 34, and the center of the spiral of the spiral contact 11 ', 12' turned upside down is pushed up from one side by the convex tool 43. Q-th step (q) of annealing forming in a deformed state,
The R step (r) for attaching the adhesive tape 49, the S step (s) for removing the Cu foil 34 by etching, and the spiral contacts 11 ', 12' in the form of being stacked one above the other are the bottom surfaces of each other. And a T-th step (t) in close contact with each other on the upper surface.
 <第3の実施形態>
 図9は、本発明の第3の実施形態を説明するための二重渦巻き二段式のスパイラル状接触子を示し、(a)は二重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すB―B線の断面図であり、自然体では凸形状の二重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す二重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。
 図9(a)(b)(c)に示すように、上下二段に配設されたスパイラル状接触子32、31は、自然体では凸形状のスパイラル(渦巻き)であるが、根元32b、31bから先端中心に向かって渦巻状に形成され、先端32a、31aを同一として互いに併行して渦巻状に配設され、先端32a、31aを一体とした二重渦巻きスパイラル状接触子32、31が根元32b、31bから基部32d、31dの少なくとも1箇所を一体構造としている。
<Third Embodiment>
FIG. 9 shows a double spiral two-stage spiral contact for explaining the third embodiment of the present invention, and FIG. 9A is a plan view showing a double spiral two-stage spiral contact. (B) is a cross-sectional view taken along line BB shown in (a), and is a cross-sectional view of a convex double spiral two-stage spiral contact in a natural body, and (c) is a cross-sectional view shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the double spiral type spiral contactor contact | adhered.
As shown in FIGS. 9A, 9B, and 9C, the spiral contacts 32, 31 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the roots 32b, 31b. Are formed in a spiral shape toward the center of the tip, and the tips 32a and 31a are arranged in parallel with each other in a spiral shape, and the double spiral spiral contacts 32 and 31 in which the tips 32a and 31a are integrated are formed at the root. At least one of the base portions 32d and 31d from the portions 32b and 31b has an integral structure.
 このスパイラル状接触子32、31は、根元32b、31bから先端中心に向かって渦巻状に形成され、渦巻状の中心に先端32a、31aを有する凸形のスパイラル状接触子32、31を上下二段に重ね合わせたスパイラルコンタクタ3であって、スパイラルコンタクタ3は、電気電導性に富んだ材料、バネ性に富んだ材料を用いている。スパイラル状接触子32、3を形成するコア材は低電気抵抗材料のニッケル(Ni)基材であり、上下表面にはAuメッキを施している。そしてスパイラル状接触子32、3を形成するコア材はバネ特性に優れたタングステンを配合したニッケル合金(Ni合金)であり、少なくとも上面表面にはAuメッキを施している。
 このようにスパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。
The spiral contacts 32, 31 are formed in a spiral shape from the roots 32b, 31b toward the center of the tip, and the convex spiral contacts 32, 31 having the tips 32a, 31a at the center of the spiral are arranged vertically. It is the spiral contactor 3 piled up in the step | level, Comprising: The spiral contactor 3 uses the material rich in electrical conductivity, and the material rich in spring property. The core material forming the spiral contacts 32 and 3 is a nickel (Ni) base material of a low electrical resistance material, and the upper and lower surfaces are plated with Au. The core material forming the spiral contacts 32 and 3 is a nickel alloy (Ni alloy) blended with tungsten having excellent spring characteristics, and at least the upper surface is Au plated.
Thus, by stacking two spiral contactors in two upper and lower stages, the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required depth of the yield point. Thus, a spiral contact with a small installation area can be obtained.
 <第4の実施形態>
 図10は、本発明の第4の実施形態を説明するための三重渦巻き二段式のスパイラル状接触子を示し、(a)は三重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すC―C線の断面図であり、自然体では凸形状の三重渦巻き二段式のスパイラル状接触子の断面図、(c)は(b)に示す三重渦巻き二段式のスパイラル状接触子の上下が密着した状態を示す断面図である。
 図10(a)(b)(c)に示すように、上下二段に配設されたスパイラル状接触子42、41は、自然体では凸形状のスパイラル(渦巻き)であるが、根元42b、41bから先端中心に向かって渦巻状に形成され、先端42a、41aを同一として互いに併行して渦巻状に配設され、先端42a、41aを一体とした二重渦巻きスパイラル状接触子42、41が根元42b、41bから基部42d、41dの少なくとも1箇所を一体構造としている。
<Fourth Embodiment>
FIG. 10 shows a triple spiral two-stage spiral contact for explaining the fourth embodiment of the present invention, (a) is a plan view showing a triple spiral two-stage spiral contact; b) is a cross-sectional view taken along the line C-C shown in (a), and is a cross-sectional view of a convex triple spiral spiral contact in a natural body, and (c) is a triple spiral double stage shown in (b). It is sectional drawing which shows the state which the upper and lower sides of the spiral contactor of a formula adhered.
As shown in FIGS. 10A, 10B, and 10C, the spiral contacts 42 and 41 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the roots 42b and 41b. Are formed in a spiral shape toward the center of the tip, and the tips 42a and 41a are arranged in parallel with each other in a spiral shape, and the double spiral spiral contacts 42 and 41 in which the tips 42a and 41a are integrated are formed at the root. At least one part of the base parts 42d and 41d from the parts 42b and 41b has an integral structure.
 <第5の実施形態>
 図11は、本発明の第5の実施形態を説明するための渦巻きの根元を同一として互いに併行して渦巻状に配設された二段式のスパイラル状接触子を示し、(a)はスパイラル状接触子を示す平面図、(b)は(a)に示すD―D線の断面図であり、自然体では凸形状のスパイラル状接触子の断面図である。
 図11(a)(b)に示すように、上下二段に配設されたスパイラル状接触子52、51は、自然体では凸形状のスパイラル(渦巻き)であるが、根元52b、51bから先端中心に向かって渦巻状に形成され、先端52a、51aを同一として互いに併行して渦巻状に配設され、先端52a、51aを一体としたスパイラル状接触子52、51が根元52b、51bから基部52d、51dの少なくとも1箇所を一体構造としている。
<Fifth Embodiment>
FIG. 11 shows a two-stage spiral contact arranged in a spiral shape in parallel with each other with the same spiral root for explaining the fifth embodiment of the present invention. FIG. FIG. 4B is a cross-sectional view taken along the line DD shown in FIG. 4A, and is a cross-sectional view of a spiral contact that is a convex shape in a natural body.
As shown in FIGS. 11 (a) and 11 (b), the spiral contacts 52 and 51 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but from the roots 52b and 51b to the center of the tip. The spiral contacts 52 and 51 are integrally formed with the tips 52a and 51a from the roots 52b and 51b to the base 52d. , 51d has an integral structure.
 このように、上段のスパイラル状接触子と下段のスパイラル状接触子の根元から基部の少なくとも1箇所が一体構造になっていることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 As described above, since at least one portion of the base portion from the base of the upper spiral contact and the lower spiral contact has an integrated structure, it is difficult to realize the spiral contact alone. By stacking two contactors in the upper and lower stages, the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressing force, and the required yield point depth is maintained and installed. A spiral contact with a small area can be obtained.
 <第6の実施形態>
 図12は、本発明の第6の実施形態を説明するための二重渦巻き二段式のスパイラル状接触子を示し、(a)は二重渦巻き二段式のスパイラル状接触子を示す平面図、(b)は(a)に示すE―E線の断面図であり、自然体では凸形状の二重渦巻き二段式のスパイラル状接触子の断面図である。
 図12(a)(b)に示すように、上下二段に配設されたスパイラル状接触子112、122は、自然体では凸形状のスパイラル(渦巻き)であるが、根元112b、122bから先端中心に向かって渦巻状に形成され、先端112a、122aを同一として互いに併行して渦巻状に配設され、先端112a、122aを一体とした二重渦巻きスパイラル状接触子112、122が根元112b、122bから基部112d、122dの少なくとも1箇所をレーザスポット溶接によって接合して上下二段に重ね合わせている。
<Sixth Embodiment>
FIG. 12 shows a double spiral two-stage spiral contact for explaining the sixth embodiment of the present invention, and FIG. 12A is a plan view showing a double spiral two-stage spiral contact. (B) is sectional drawing of the EE line shown to (a), and is a sectional view of a spiral contact of a convex double spiral two-stage type in a natural body.
As shown in FIGS. 12 (a) and 12 (b), the spiral contacts 112 and 122 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but from the roots 112b and 122b to the center of the tip. Are formed in a spiral shape with the tips 112a and 122a being the same in parallel and arranged in a spiral shape, and double spiral spiral contacts 112 and 122 having the tips 112a and 122a integrally formed have roots 112b and 122b. To at least one of the bases 112d and 122d is joined by laser spot welding and overlapped in two stages.
 このスパイラル状接触子112、122は、根元から先端中心に向かって渦巻状に形成され、渦巻状の中心に先端を有する凸形のスパイラル状接触子112、122を上下二段に重ね合わせたスパイラルコンタクタ101であって、スパイラルコンタクタ101は、上段に電気電導性に富んだ材料を用いたスパイラル状接触子112、下段にバネ性に富んだ材料を用いたスパイラル状接触子122を設けている。スパイラル状接触子112を形成するコア材は低電気抵抗材料のニッケル(Ni)基材であり、上下表面にはAuメッキを施している。そしてスパイラル状接触子122を形成するコア材はバネ特性に優れたタングステンを配合したニッケル合金(Ni合金)であり、少なくとも上面表面にはAuメッキを施している。 The spiral contacts 112 and 122 are formed in a spiral shape from the root toward the tip center, and spiral spiral contacts 112 and 122 having tips at the spiral center are stacked in two upper and lower stages. In the contactor 101, the spiral contactor 101 is provided with a spiral contactor 112 using a material having high electrical conductivity in the upper stage and a spiral contactor 122 using a material having high springiness in the lower stage. The core material forming the spiral contact 112 is a nickel (Ni) base material of a low electrical resistance material, and the upper and lower surfaces are plated with Au. The core material forming the spiral contact 122 is a nickel alloy (Ni alloy) containing tungsten having excellent spring characteristics, and at least the upper surface is Au plated.
 このように上下二段のスパイラル状接触子が、接続端子に接触する側の上段に電気電導性に富んだ材料を用い、下段にバネ性に富んだ材料を用いることによって、スパイラル状接触子単体では実現することが難しいが、スパイラル状接触子を上下二段に二枚重ねたことで、降伏点を深くすることができ、さらに接触押圧力を上げることなく電気抵抗を小さくすることができ、必要な降伏点の深さを維持して設置面積の小さいスパイラル状接触子とすることができる。 In this way, the spiral contact of the upper and lower stages uses a material having high electrical conductivity for the upper stage on the side in contact with the connection terminal, and a material having high springiness for the lower stage, so that the spiral contact element alone However, it is difficult to achieve this, but by stacking two spiral contacts in two steps, the yield point can be deepened, and the electrical resistance can be reduced without increasing the contact pressure. A spiral contact with a small installation area can be obtained while maintaining the depth of the yield point.
 また、下段のスパイラル状接触子122の幅は、上段のスパイラル状接触子112の幅より狭く形成されている。
 このように、上下二段に配設されたスパイラル状接触子112、122の下側のスパイラル状接触子122の幅を上段のスパイラル状接触子112の幅より狭くすることによって、上下二段のスパイラル状接触子112、122が圧縮されるときにも下段のスパイラル状接触子122の上面全体が上段のスパイラル状接触子112の下面から外れることがなく安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。
Further, the width of the lower spiral contact 122 is formed narrower than the width of the upper spiral contact 112.
In this way, by making the width of the spiral contact 122 on the lower side of the spiral contacts 112, 122 arranged in two upper and lower stages narrower than the width of the upper spiral contact 112, two upper and lower stages Even when the spiral contacts 112 and 122 are compressed, the entire upper surface of the lower spiral contact 122 is not detached from the lower surface of the upper spiral contact 112, and stable electrical connection characteristics can be obtained. It is possible to realize a spiral contact having both electrical characteristics and excellent spring characteristics.
 また、下段のスパイラル状接触子122の厚さは、上段のスパイラル状接触子112の厚さより薄く形成されている。
 このように、上下二段に配設されたスパイラル状接触子の下側のスパイラル状接触子の厚さを上段のスパイラル状接触子の厚さより薄くすることによって、下段のスパイラル状接触子の方が断面応力が小さいため、上下二段のスパイラル状接触子が圧縮されるときにも下段のスパイラル状接触子の上面全体が上段のスパイラル状接触子の下面から離れることなく追随し、安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。
Further, the thickness of the lower spiral contact 122 is formed to be thinner than the thickness of the upper spiral contact 112.
Thus, by making the thickness of the spiral contact on the lower side of the spiral contact arranged in the upper and lower stages thinner than that of the upper spiral contact, the lower spiral contact However, since the cross-sectional stress is small, even when the upper and lower spiral contacts are compressed, the entire upper surface of the lower spiral contact follows the upper spiral contact without moving away from the lower surface, thereby providing stable electricity. Connection characteristics can be obtained, and a spiral contactor having both excellent electrical characteristics and excellent spring characteristics can be realized.
 また、上段のスパイラル状接触子112の中心に位置する先端112aには、柱状の突起(柱)112dが設けられている。この柱112dは、上段のスパイラル状接触子112の先端112aの位置に上方へ向けて設けられた少なくとも1本の柱である。下段のスパイラル状接触子122には突起は設けられていない。また、上下二段のスパイラル状接触子112、122とも、その渦巻きの幅V(V1、V2)は、同一幅で、先端112a、122aから根元112b、122bに近づけば近づく程に広くなっており、根元112b、122bから先端112a、122aに向かって渦巻き部112c、122cを備えている。なお、幅Vは、先端112a、122aから根元112b、122bに行くにしたがって、一定でも構わない。厚さT(T1、T2)も一定としているが、先端112a、122aから根元112b、122bに行くにしたがって、次第に厚く変化していても構わない。 Also, a columnar protrusion (column) 112d is provided at the tip 112a located at the center of the upper spiral contact 112. This column 112d is at least one column provided upward at the position of the tip 112a of the upper spiral contact 112. The lower spiral contact 122 has no protrusion. Further, the spiral widths V (V1, V2) of the two spiral upper and lower spiral contacts 112, 122 are the same, and become wider as they approach the roots 112b, 122b from the tips 112a, 122a. The spiral portions 112c and 122c are provided from the roots 112b and 122b toward the tips 112a and 122a. The width V may be constant as it goes from the tips 112a and 122a to the roots 112b and 122b. Although the thickness T (T1, T2) is also constant, the thickness T (T1, T2) may be gradually increased from the tips 112a, 122a to the roots 112b, 122b.
 この二重渦巻き二段式のスパイラルコンタクタ101において、上段のスパイラル状接触子112は、その根元112b、112bを互いに180度対向した位置に配置して、根元112b、112bから渦巻きの中心に向けて立ち上がり、渦巻きの中心で互いに合流する先端112aを備えている。すなわち、先端112aは、左右から支持された二重の渦巻きによって中心に維持されながら、さらに先端112aがねじり回動する。同様に、下段のスパイラル状接触子122の根元122b、122bを互いに対向した位置に配置して、根元122b、122bから渦巻きの中心に向けて立ち上がり、渦巻きの中心で互いに合流する先端122aを備えている。このように、二重渦巻きスパイラル状接触子112、122を上下に重ねて二段とし、これを先端112a、122aをフリーにしてレーザスポット溶接で根元112b、122bから基部112d、122dの少なくとも1箇所を固定することによって、スパイラル状接触子の長さを長くするのと同様の効果が得られた。これによって、二段重ねのスパイラルコンタクタ1はそのバネ定数が大きくなり、降伏点が深くなるという効果が得られた。したがって、さまざまな形状の接続端子にも接続可能であるとともに、スパイラルコンタクタ101が接続端子(図略)と接触して、スパイラルコンタクタ1を先端から順に押し下げるときに上段に配設されたスパイラル状接触子112の先端部112aが接続端子とねじり動作を伴いながら接触し、微小円を描くことによって、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 In this double spiral two-stage spiral contactor 101, the upper spiral contact 112 has its roots 112b and 112b arranged at positions that are opposed to each other by 180 degrees, and is directed from the roots 112b and 112b toward the center of the spiral. The tip 112a which stands | starts up and merges mutually in the center of a spiral is provided. That is, the tip 112a is further twisted and rotated while being maintained at the center by the double spiral supported from the left and right. Similarly, the roots 122b and 122b of the lower spiral contact 122 are arranged at positions facing each other, and provided with tips 122a that rise from the roots 122b and 122b toward the center of the spiral and merge with each other at the center of the spiral. Yes. In this way, the double spiral spiral contacts 112, 122 are vertically stacked to form two stages, and the tips 112a, 122a are freed, and laser spot welding is used to at least one place from the bases 112b, 122b to the bases 112d, 122d. The effect similar to that of increasing the length of the spiral contactor was obtained by fixing. As a result, the two-stage spiral contactor 1 has the effect of increasing the spring constant and deepening the yield point. Therefore, it can be connected to connection terminals of various shapes, and the spiral contact disposed on the upper stage when the spiral contactor 101 contacts the connection terminal (not shown) and pushes down the spiral contactor 1 sequentially from the tip. When the tip 112a of the child 112 comes into contact with the connection terminal with a torsional motion and draws a minute circle, a spiral contact having both excellent electrical characteristics and excellent spring characteristics can be realized. .
 図12の(b)に示すように、下段のスパイラル状接触子122の幅は、上段のスパイラル状接触子112の幅より狭くしている。上下二段に配設されたスパイラル状接触子112、122の下側のスパイラル状接触子122の幅V2、W2を上段のスパイラル状接触子112の幅V1、W1より狭くすることによって、上下二段のスパイラル状接触子112、122が圧縮されるときにも下段のスパイラル状接触子122の上面全体が、上段のスパイラル状接触子112の下面から外れることがなく安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 12B, the width of the lower spiral contact 122 is narrower than the width of the upper spiral contact 112. As shown in FIG. By making the widths V2 and W2 of the spiral contacts 122 on the lower side of the spiral contacts 112 and 122 arranged in two upper and lower stages narrower than the widths V1 and W1 of the upper spiral contacts 112, the upper and lower Even when the spiral contacts 112 and 122 of the stage are compressed, the entire upper surface of the spiral contact 122 of the lower stage is not detached from the lower surface of the spiral contact 112 of the upper stage, and stable electrical connection characteristics can be obtained. Thus, it is possible to realize a spiral contactor having both excellent electrical characteristics and excellent spring characteristics.
 また、下段のスパイラル状接触子122の厚さT2は、上段のスパイラル状接触子112の厚さT1より薄い。このように、上下二段に配設されたスパイラルコンタクタ101の下側のスパイラル状接触子122の厚さT2を上段のスパイラル状接触子の厚さT1より薄くすることによって、上下二段のスパイラルコンタクタ101が圧縮されるときにも下段のスパイラル状接触子122の上面全体が上段のスパイラル状接触子112の下面に追随し、安定した電気的接続特性が得られ、優れた電気的特性と優れたバネ特性の両方を併せ持ったスパイラル状接触子を実現することができる。 Also, the thickness T2 of the lower spiral contact 122 is thinner than the thickness T1 of the upper spiral contact 112. Thus, by making the thickness T2 of the spiral contactor 122 on the lower side of the spiral contactor 101 arranged in two upper and lower stages thinner than the thickness T1 of the upper spiral contactor, the two upper and lower spiral contacts Even when the contactor 101 is compressed, the entire upper surface of the lower spiral contactor 122 follows the lower surface of the upper spiral contactor 112, and stable electrical connection characteristics can be obtained. It is possible to realize a spiral contact having both spring characteristics.
 次に、スパイラルコンタクタの製造方法を説明する。
 図13は、本発明の第6の実施形態に係るスパイラルコンタクタの製造方法の工程図であり、上段のスパイラル状接触子112の製造工程を示している。図13に示すように、第1工程は、金属板114を用意し、この金属板114の表面に少なくとも1つの凹部114aをスパイラル状接触子の先端の位置に来るように形成する。なお、金属板114はCu箔が好適であるので、以下、金属板114はCu箔114と記載する。Cu箔114の厚みは、箔状であり、例えば、0.08mmとしたが、これに限定されるものではない。
Next, a manufacturing method of the spiral contactor will be described.
FIG. 13 is a process diagram of the manufacturing method of the spiral contactor according to the sixth embodiment of the present invention, and shows the manufacturing process of the upper spiral contactor 112. As shown in FIG. 13, in the first step, a metal plate 114 is prepared, and at least one recess 114 a is formed on the surface of the metal plate 114 so as to come to the position of the tip of the spiral contact. Since the metal plate 114 is preferably a Cu foil, the metal plate 114 is hereinafter referred to as a Cu foil 114. The thickness of the Cu foil 114 is a foil shape, for example, 0.08 mm, but is not limited thereto.
 第2工程(b)は、Cu箔114の表面にフォトレジスト115を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子112のパターンを有するフォトマスク116を被せ、このフォトマスク116の上方から光を照射して露光する。
 このフォトマスク116の形状は、スパイラル形状接触子112の部分を黒塗りにした模様になっている。また、白黒逆のパターンを用いた方法でも構わない。
 第3工程(c)は、フォトマスク116のパターンを形成するようにフォトレジスト115を現像する。
 第4工程(d)は、さらに上方からCu箔14の露出面114bにAuメッキ117b、Niメッキ117aから構成される金属メッキ117を施し、スパイラル状接触子112を成形する。ここでの金属メッキ117は、電気電導性に優れたニッケル合金メッキが好適である。なお、金属メッキは、例えば、ニッケルNi合金メッキを用いたが、これに限定されるものではない。
In the second step (b), a photoresist 115 is applied to the surface of the Cu foil 114 or a dry film is applied. A photomask 116 having a spiral contact 112 pattern is applied from above, and exposure is performed by irradiating light from above the photomask 116.
The shape of the photomask 116 is a pattern in which the spiral contact 112 is blackened. Further, a method using a reverse black and white pattern may be used.
In the third step (c), the photoresist 115 is developed so as to form a pattern of the photomask 116.
In the fourth step (d), the exposed surface 114b of the Cu foil 14 is further subjected to metal plating 117 composed of Au plating 117b and Ni plating 117a from above to form the spiral contact 112. The metal plating 117 here is preferably a nickel alloy plating excellent in electrical conductivity. In addition, although nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
 第5工程(e)は、フォトレジスト115を除去する。
 第6工程(f)は、Cu箔114の裏面にフォトレジスト115を貼付もしくは塗布し、穴を開けるためのフォトマスク116´を被せ、このフォトマスク116´に光を照射して露光・現像する。
 第7工程(g)は、Cu箔114の裏面からCu箔114にエッチングで穴114cを開ける。
 第8工程(h)は、Cu箔114の裏面のフォトレジスト115を除去する。
In the fifth step (e), the photoresist 115 is removed.
In the sixth step (f), a photoresist 115 is pasted or applied on the back surface of the Cu foil 114, and a photomask 116 'for opening a hole is covered, and this photomask 116' is irradiated with light to be exposed and developed. .
In the seventh step (g), a hole 114c is formed in the Cu foil 114 from the back surface of the Cu foil 114 by etching.
In the eighth step (h), the photoresist 115 on the back surface of the Cu foil 114 is removed.
 図14は、本発明の第6の実施形態に係る製造方法の工程図であり、図13に示す第8工程に続く工程を示している。図14に示すように、第9工程(i)は、上下反転させたスパイラル状接触子112の渦巻きの中心を一方から凸形工具130で押し上げて凸形に変形させた状態でアニールフォーミングする。
 詳細には、スパイラル状接触子112の下方に凸形工具130を配置し、スパイラル状接触子112を下方から凸形工具130で押し上げて凸形に変形させた状態でアニールフォーミングして成形を安定させ、すなわち、凸状に変形したスパイラル状接触子112が加熱及び焼鈍されて凸形状に成形される。このアニールフォーミングは、例えば、250℃で加熱し、焼きなまし処理を行い、内部応力を除去する。ここで加熱温度は250℃としたが、250℃前後を含むものとし、さらにこれに限定されるものではない。
 第10工程(j)は、アニールフォーミングが完了するとともに、凸形工具130を取り外した状態である。
FIG. 14 is a process chart of the manufacturing method according to the sixth embodiment of the present invention, and shows a process following the eighth process shown in FIG. As shown in FIG. 14, in the ninth step (i), annealing is performed in a state where the spiral center of the spiral contact 112 turned upside down is pushed up from one side by the convex tool 130 and deformed into a convex shape.
Specifically, the convex tool 130 is disposed below the spiral contact 112, and the forming is stabilized by annealing forming the spiral contact 112 being pushed up from below by the convex tool 130 and deformed into a convex shape. That is, the spiral contact 112 deformed into a convex shape is heated and annealed to be formed into a convex shape. In this annealing forming, for example, heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C. here, it is assumed to include around 250 ° C., and is not limited to this.
In the tenth step (j), the annealing forming is completed and the convex tool 130 is removed.
 図15は、本発明の第6の実施形態に係るスパイラルコンタクタの製造方法の工程図であり、下段のスパイラル状接触子122の製造工程を示している。図15に示すように、第11工程(k)は、金属板124を用意する。なお、金属板124はCu箔が好適であり、前記した金属板114と同一材料である。 FIG. 15 is a process diagram of the manufacturing method of the spiral contactor according to the sixth embodiment of the present invention, and shows the manufacturing process of the lower spiral contactor 122. As shown in FIG. 15, in the eleventh step (k), a metal plate 124 is prepared. The metal plate 124 is preferably a Cu foil, and is the same material as the metal plate 114 described above.
 第12工程(l)は、Cu箔124の表面にフォトレジスト125を塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子122のパターンを有するフォトマスク126を被せ、このフォトマスク126の上方から光を照射して露光する。
 このフォトマスク126の形状は、スパイラル形状接触子122の部分を黒塗りにした模様になっている。また、白黒逆のパターンを用いた方法でも構わない。
 第13工程(m)は、フォトマスク126のパターンを形成するようにフォトレジスト125を現像する。
 第14工程(n)は、さらに上方からCu箔124の露出面124bにAuメッキ127b、Niメッキ127aから構成される金属メッキ127を施し、スパイラル状接触子122を成形する。ここでの金属メッキ127は、バネ性に富んだタングステンを配合したニッケル合金メッキが好適である。なお、金属メッキは、例えば、ニッケルNi合金メッキを用いたが、これに限定されるものではない。
In the twelfth step (l), a photoresist 125 is applied to the surface of the Cu foil 124 or a dry film is applied. A photomask 126 having a spiral contact 122 pattern is applied from above, and exposure is performed by irradiating light from above the photomask 126.
The shape of the photomask 126 is a pattern in which the spiral contact 122 is blackened. Further, a method using a reverse black and white pattern may be used.
In the thirteenth step (m), the photoresist 125 is developed so as to form a pattern of the photomask 126.
In the fourteenth step (n), the exposed surface 124b of the Cu foil 124 is further subjected to metal plating 127 composed of Au plating 127b and Ni plating 127a from above to form the spiral contact 122. The metal plating 127 here is preferably a nickel alloy plating containing tungsten having a high spring property. In addition, although nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
 第15工程(o)は、フォトレジスト125を除去する。
 第16工程(p)は、Cu箔124の裏面にフォトレジスト125を貼付もしくは塗布し、穴を開けるためのフォトマスク126´を被せ、このフォトマスク126´に光を照射して露光・現像する。
 第17工程(q)は、Cu箔124の裏面からCu箔124にエッチングで穴124cを開ける。
 第18工程(r)は、Cu箔124の裏面のフォトレジスト125を除去する。
In the fifteenth step (o), the photoresist 125 is removed.
In the sixteenth step (p), a photoresist 125 is pasted or applied on the back surface of the Cu foil 124, and a photomask 126 'for making a hole is covered, and the photomask 126' is irradiated with light to be exposed and developed. .
In the seventeenth step (q), a hole 124 c is formed in the Cu foil 124 by etching from the back surface of the Cu foil 124.
In the eighteenth step (r), the photoresist 125 on the back surface of the Cu foil 124 is removed.
 図16は、本発明に係る製造方法の工程図であり、図15に示す第18工程に続く工程を示している。図16に示すように、第19工程(s)は、上下反転させたスパイラル状接触子122の渦巻きの中心を一方から凸形工具130で押し上げて凸形に変形させた状態でアニールフォーミングする。
 詳細には、スパイラル状接触子122の下方に凸形工具130を配置し、スパイラル状接触子122を下方から凸形工具130で押し上げて凸形に変形させた状態でアニールフォーミングして成形を安定させ、すなわち、凸状に変形したスパイラル状接触子122が加熱及び焼鈍されて凸形状に成形される。このアニールフォーミングは、例えば、250℃で加熱し、焼きなまし処理を行い、内部応力を除去する。ここで加熱温度は250℃としたが、250℃前後を含むものとし、さらにこれに限定されるものではない。
 第20工程(t)は、表面に導電性のランド128aを有する実装基板128を設け、ランド128aの上面に導電性のペースト(半田ペースト)129を塗布し、ランド128aの上面に、スパイラル状接触子122を位置決めする。
FIG. 16 is a process diagram of the manufacturing method according to the present invention, and shows a process following the 18th process shown in FIG. As shown in FIG. 16, in the nineteenth step (s), annealing is performed in a state where the center of the spiral of the spiral contact 122 turned upside down is pushed up from one side by the convex tool 130 and deformed into a convex shape.
Specifically, the convex tool 130 is arranged below the spiral contact 122, and the forming is stabilized by annealing forming the spiral contact 122 pushed up from below by the convex tool 130 and deformed into a convex shape. That is, the spiral contact 122 deformed into a convex shape is heated and annealed to be formed into a convex shape. In this annealing forming, for example, heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C. here, it is assumed to include around 250 ° C., and is not limited to this.
In the twentieth step (t), a mounting substrate 128 having a conductive land 128a is provided on the surface, a conductive paste (solder paste) 129 is applied to the upper surface of the land 128a, and a spiral contact is formed on the upper surface of the land 128a. The child 122 is positioned.
 第21工程(u)は、Cu箔124をエッチングで除去する。
 第22工程(v)は、スパイラル状接触子122の上に、スパイラル状接触子112を上下二段に重ね合わせ、先端をフリーにしてレーザスポット溶接で根元を接合し、実装基板上128のランド128aにスパイラル状接触子122を固着し、上段に突起を備えた二重渦巻きスパイラル状接触子112を、突起のない下段のスパイラル状接触子122に2枚重ねにした二重渦巻き二段式のスパイラルコンタクタ101を形成する。
 また、渦巻きを2本併行にして二重渦巻きとして説明したが、3重渦巻きでも、4重渦巻きでも、さらに複数の渦巻きとしても良い。その渦巻きの根元位置と先端位置をそれぞれ均等にずらすことによって製作可能である。
In the 21st step (u), the Cu foil 124 is removed by etching.
In the 22nd step (v), the spiral contact 112 is superposed on the spiral contact 122 in two upper and lower stages, the tip is made free, and the root is joined by laser spot welding. The spiral contact 122 is fixed to 128a, and the double spiral spiral contact 112 having a protrusion on the upper stage is overlapped on the lower spiral contact 122 having no protrusion. A spiral contactor 101 is formed.
Further, the double spiral is described with two spirals in parallel, but a triple spiral, a quadruple spiral, or a plurality of spirals may be used. The spiral can be manufactured by shifting the root position and the tip position equally.
 <第7の実施形態>
 図17は、本発明の第7の実施形態を説明するための三重渦巻き二段式のスパイラル状接触子を示し、(a)は三重渦巻き二段式のスパイラル状接触子を示す平面図、(b)(c)(d)は、(a)に示すF―F線の断面図であり、自然体では凸形状の三重渦巻き二段式のスパイラル状接触子の断面図であり、代表的な3種類の二段式形態を示している。
 図17(a)(b)に示すように、上下二段に配設されたスパイラル状接触子131、132は、自然体では凸形状のスパイラル(渦巻き)であるが、根元A、根元B、根元Cの符号131bから先端中心に向かって渦巻状に形成され、先端131aを同一として互いに併行して渦巻状に配設され、先端131aで合流して一体とした三重渦巻きスパイラル状接触子131、132を、根元131b、131bから基部131d、132dの少なくとも1箇所を接合して上下二段に重ね合わせ、二重渦巻き二段式のスパイラルコンタクタ101´としている。スパイラルコンタクタ101´は、上段に電気電導性に富んだ材料を用いたスパイラル状接触子131、下段にバネ性に富んだ材料を用いたスパイラル状接触子132を設けている。スパイラル状接触子131を形成するコア材はニッケル(Ni)基材であり、上下表面にはAuメッキを施している。スパイラル状接触子132を形成するコア材はタングステンを配合したニッケル合金(Ni合金)であり、少なくとも上面表面にはAuメッキを施している。
<Seventh Embodiment>
FIG. 17 shows a triple spiral two-stage spiral contact for explaining the seventh embodiment of the present invention, and (a) is a plan view showing the triple spiral two-stage spiral contact; b) (c) and (d) are cross-sectional views taken along line FF shown in (a), and are cross-sectional views of a spiral contact of a triple-spiral type having a convex shape in a natural body. Two types of two-stage configurations are shown.
As shown in FIGS. 17 (a) and 17 (b), the spiral contacts 131 and 132 arranged in two upper and lower stages are convex spirals (spirals) in the natural body, but the root A, the root B, and the root The triple spiral spiral contacts 131 and 132 are formed in a spiral shape from the reference numeral 131b toward the center of the tip, arranged in a spiral shape with the tip ends 131a being parallel to each other, and joined together at the tip 131a. Are joined to at least one of base portions 131d and 132d from the bases 131b and 131b and stacked in two upper and lower stages to form a double spiral two-stage spiral contactor 101 ′. The spiral contactor 101 ′ is provided with a spiral contact 131 using a material having high electrical conductivity in the upper stage and a spiral contact 132 using a material having high spring characteristics in the lower stage. The core material forming the spiral contact 131 is a nickel (Ni) base material, and the upper and lower surfaces are plated with Au. The core material forming the spiral contact 132 is a nickel alloy (Ni alloy) blended with tungsten, and at least the upper surface is Au plated.
 根元A、根元B、根元Cから先端中心に向かって渦巻状に形成され、渦巻状の中心に先端を有する凸形のスパイラル状接触子131において、スパイラル状接触子131の根元A、根元B、根元Cを互いに120°角度をずらした位置に配置して、根元A、根元B、根元Cから渦巻きの中心に向けて立ち上がり、中心を同一として互いに併行して渦巻状に配設された3個のスパイラル状接触子131が先端で合流して一体とした3重渦巻きスパイラル状接触子131の先端部131aの上面を鏡面処理した鏡面状平面131aaを備えている。この上段に配設された鏡面状平面131aaにはほぼ円形のセンタ付近に穴131aaa(窪み、または貫通孔)が設けられている。この穴131aaaによって、面圧が分散せず大きな圧力が掛かり、またその面圧が掛かる半径が大きいため面の動くエリアが大きくなり金属間接合が容易に発生する。 In the convex spiral contact 131 formed in a spiral shape from the root A, the root B, and the root C toward the tip center, and having a tip at the spiral center, the root A, the root B of the spiral contact 131, Three roots C are arranged at positions shifted by 120 ° from each other, the root A, the root B, the root C rises from the root C toward the center of the spiral, the center is the same, and the three are arranged in a spiral shape. The spiral contact 131 has a mirror-like flat surface 131aa obtained by mirror-treating the upper surface of the tip 131a of the triple spiral spiral contact 131 integrated with the tip. A hole 131aa (a depression or a through hole) is provided in the vicinity of a substantially circular center in the mirror-like flat surface 131aa disposed in the upper stage. Due to the hole 131aaa, the surface pressure is not dispersed and a large pressure is applied, and the radius to which the surface pressure is applied is large, so that the area in which the surface moves is increased and the metal-to-metal bonding is easily generated.
 また、図17の(c)に示すように、先端部131aaの上面には柱131abを設けても良く、このとき、柱131abの上面が鏡面処理された鏡面状平面131abaを備える。なお、柱131abの形状は、円柱や角柱を用いたが、上面がフラットであれば他の形状の柱でも構わない。
 このように、柱の形状を円柱としたことによって、接合相手の接合面と効率的に接合することができるとともに、その接合面が狭くても容易に接合することができる。
 また、図17の(d)に示すように、フラットな鏡面状平面131aaを設けても構わない。
Further, as shown in FIG. 17C, a column 131ab may be provided on the upper surface of the tip 131aa, and at this time, the upper surface of the column 131ab is provided with a mirror-like flat surface 131aba that is mirror-finished. In addition, although the column 131ab used the cylinder and the prism, the column of other shapes may be sufficient as long as the upper surface is flat.
Thus, by making the shape of the column a cylinder, it is possible to efficiently join the joining surface of the joining partner, and it is possible to easily join even if the joining surface is narrow.
Further, as shown in FIG. 17D, a flat mirror-like flat surface 131aa may be provided.
 <第8の実施形態>
 図18は、本発明の第8の実施形態を説明するための二段式のスパイラルコンタクタを示し、(a)は先端及びその近傍に突起を備えたスパイラル状接触子を示す平面図、(b)は(a)に示すG―G線の断面図であり、自然体では凸形状の断面図である。
 図18の(a)(b)に示すように、上下二段に配設されたスパイラルコンタクタ101´´は、自然体では凸形状のスパイラル(渦巻き)であるが、根元133bから先端133a中心に向かって渦巻状に形成され、渦巻の中心に先端133aを有するスパイラル状接触子133において、スパイラル状接触子133の幅方向のセンタにスパイラル状接触子133の長手方向に沿って溝133dを備え、スパイラル状接触子133、134を、根元133b、134bから基部133d、134dの少なくとも1箇所を接合して上下二段に重ね合わせ、二重渦巻き二段式のスパイラルコンタクタ101´´としている。
 その中心に位置する先端133aには、四角錐形状の突起133aaが設けられている。渦巻きの幅は、先端133aから根元133bに近づけば近づく程に広くなっており、根元133bから先端133aに向かって渦巻き部133cを備えている。なお、幅は、先端133aから根元133bに行くにしたがって、一定でも構わない。厚さも一定としているが、先端から根元に行くにしたがって、次第に厚く変化していても構わない。スパイラルコンタクタ101´´は、上段に電気電導性に富んだ材料を用いたスパイラル状接触子133、下段にバネ性に富んだ材料を用いたスパイラル状接触子134を設けている。スパイラル状接触子133を形成するコア材はニッケル(Ni)基材であり、上下表面にはAuメッキを施している。スパイラル状接触子134を形成するコア材はタングステンを配合したニッケル合金(Ni合金)であり、少なくとも上面表面にはAuメッキを施している。なお、突起133aaはなくても構わない。
<Eighth Embodiment>
FIG. 18 shows a two-stage spiral contactor for explaining an eighth embodiment of the present invention, wherein (a) is a plan view showing a spiral contact having a tip and a protrusion in the vicinity thereof; ) Is a cross-sectional view taken along line GG shown in FIG.
As shown in FIGS. 18 (a) and 18 (b), the spiral contactor 101 ″ arranged in two upper and lower stages is a convex spiral (spiral) in the natural body, but it goes from the root 133b to the center of the tip 133a. In the spiral contact 133 formed in a spiral shape and having a tip 133a at the center of the spiral, a groove 133d is provided at the center in the width direction of the spiral contact 133 along the longitudinal direction of the spiral contact 133. The contactors 133 and 134 are joined to at least one of the base parts 133d and 134d from the bases 133b and 134b and overlapped in two upper and lower stages to form a double spiral two-stage spiral contactor 101 ″.
A projection 133aa having a quadrangular pyramid shape is provided at the tip 133a located at the center thereof. The width of the spiral increases as it approaches the root 133b from the tip 133a, and a spiral portion 133c is provided from the root 133b toward the tip 133a. The width may be constant as it goes from the tip 133a to the root 133b. Although the thickness is also constant, the thickness may gradually increase from the tip to the base. The spiral contactor 101 ″ is provided with a spiral contact 133 using a material having a high electrical conductivity in the upper stage and a spiral contact 134 using a material having a high spring property in the lower stage. The core material forming the spiral contact 133 is a nickel (Ni) base material, and the upper and lower surfaces are plated with Au. The core material forming the spiral contactor 134 is a nickel alloy (Ni alloy) blended with tungsten, and at least the upper surface is Au plated. Note that the protrusion 133aa may not be provided.
 また、この溝133dの長さはスパイラル状接触子133の根元133bから先端133aまでの間の所定の区間に設けられている。区間は適宜、設定可能で有る。 Further, the length of the groove 133d is provided in a predetermined section from the root 133b of the spiral contact 133 to the tip 133a. The section can be set as appropriate.
 また、スパイラル状接触子133の溝133dの長さを固定したものとして、次のように定義できる。すなわち、2つのスパイラル状接触子133、133の根元133b、133bを同一としてその根元133bから先端133a中心に向かって渦巻状に形成され、渦巻の中心に先端133aを有し、2つのスパイラル状接触子133が互いに間隔を有して並行に形成され、その間隔を溝133dと称し、2つのスパイラル状接触子133が先端133aで合体している構成としても構わない。 Also, the length of the groove 133d of the spiral contact 133 can be fixed as follows. That is, the roots 133b and 133b of the two spiral contacts 133 and 133 are the same, and are formed in a spiral shape from the root 133b toward the center of the tip 133a, and have a tip 133a at the center of the spiral and have two spiral contacts. The child 133 may be formed in parallel with a space between each other, the space being referred to as a groove 133d, and the two spiral contacts 133 may be combined at the tip 133a.
 <その他の実施形態>
 図19は、本発明のスパイラルコンタクタを適用したインターコネクタの概略図であり、(a)は全体図、(b)は図中のDに示す部分の拡大図である。
 図19に示すように、基板間、デバイスと基板間などを電気的に接続するインターコネクタとして用いられ、優れた電気特性とバネ特性の良好な組み合わせを併せ持ったスパイラルコンタクタに適用可能である。
<Other embodiments>
19A and 19B are schematic views of an interconnector to which the spiral contactor of the present invention is applied. FIG. 19A is an overall view, and FIG. 19B is an enlarged view of a portion indicated by D in the figure.
As shown in FIG. 19, it is used as an interconnector that electrically connects between substrates, between a device and a substrate, and can be applied to a spiral contactor having a good combination of excellent electrical characteristics and spring characteristics.
 なお、前記スパイラルコンタクタの製造方法に関して以下に共通の特徴を説明する。金属板14、34はCu箔が好適であるので、以下、金属板14、34はCu箔14、34と記載する。Cu箔14、34の厚みは、箔状であり、例えば、0.08mmとしたが、これに限定されるものではない。ここでの金属メッキは、電気電導性に優れたニッケル合金メッキが好適である。なお、金属メッキは、例えば、ニッケルNi合金メッキを用いたが、これに限定されるものではない。
 このアニールフォーミングは、例えば、250℃で加熱し、焼きなまし処理を行い、内部応力を除去する。ここで加熱温度は250℃としたが、250℃前後を含むものとし、さらにこれに限定されるものではない。
 フォトマスクの形状は、スパイラル形状接触子の部分を黒塗りにした模様になっている。また、白黒逆のパターンを用いた方法でも構わない。
 また、スパイラル状接触子は、根元から基部の少なくとも一部を一体構造としているが、先端部も同一工法によって一体構造としても構わない。この場合、根元から基部の少なくとも一部と先端部との間の渦巻状部は密着、乃至やや離れた状態で重なっていることになる。
The common features of the spiral contactor manufacturing method will be described below. Since the metal plates 14 and 34 are preferably Cu foils, the metal plates 14 and 34 are hereinafter referred to as Cu foils 14 and 34. The thicknesses of the Cu foils 14 and 34 are foil-like, for example, 0.08 mm, but are not limited thereto. The metal plating here is preferably a nickel alloy plating excellent in electric conductivity. In addition, although nickel nickel alloy plating was used for metal plating, for example, it is not limited to this.
In this annealing forming, for example, heating is performed at 250 ° C., annealing is performed, and internal stress is removed. Although the heating temperature is 250 ° C. here, it is assumed to include around 250 ° C., and is not limited to this.
The shape of the photomask is a pattern in which the spiral contact portion is blackened. Further, a method using a reverse black and white pattern may be used.
Moreover, although the spiral contactor has at least a part of the base portion from the base as an integral structure, the tip portion may also have an integral structure by the same construction method. In this case, the spiral part between the base and at least a part of the base part and the tip part overlaps in a state of being in close contact or slightly separated.
 基板間、デバイスと基板間などを電気的に接続するインターコネクタとして用いられ、優れた電気特性とバネ特性に富む良好な組み合わせを併せ持ったスパイラルコンタクタに適用可能である。
 
It is used as an interconnector that electrically connects substrates, between devices and substrates, etc., and can be applied to spiral contactors that have a good combination of excellent electrical characteristics and spring characteristics.

Claims (14)

  1.  根元(11b、12b)から先端(11a、12a)中心に向かって渦巻状(11c、2c)に形成され、前記渦巻状(11c、12c)の中心に先端(11a、12a)を有する凸形のスパイラル状接触子(11、12)を上下二段に重ね合わせたスパイラルコンタクタ(1)において、
     前記スパイラルコンタクタ(1)は、上段のスパイラル状接触子(11)と下段のスパイラル状接触子(12)の前記根元から基部(11d、12d)の少なくとも1箇所が一体的な構造になっていることを特徴とするスパイラルコンタクタ(1)。
    Convex shape formed in a spiral shape (11c, 2c) from the root (11b, 12b) toward the center of the tip (11a, 12a) and having the tip (11a, 12a) at the center of the spiral shape (11c, 12c) In the spiral contactor (1) in which the spiral contacts (11, 12) are superposed in two upper and lower stages,
    The spiral contactor (1) has a structure in which at least one portion from the base to the base (11d, 12d) of the upper spiral contact (11) and the lower spiral contact (12) is integrated. Spiral contactor (1) characterized by the above.
  2.  前記上下二段のスパイラル状接触子(11、12)の根元を同一にした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がったスパイラルコンタクタ(1)において、前記根元から前記基部(11d、12d)の少なくとも1箇所が一体構造になっていることを特徴とする請求項1に記載のスパイラルコンタクタ(1)。 In the spiral contactor (1) which is arranged at the same position of the roots of the upper and lower spiral contactors (11, 12) and rises from the root toward the center of the spiral, the base ( The spiral contactor (1) according to claim 1, wherein at least one of 11d and 12d) has an integral structure.
  3.  前記上下二段のスパイラル状接触子(31、32)の根元を互いに180°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(31、32)が先端で合流して一体とした二重渦巻きスパイラルコンタクタ(3)において、前記根元から前記基部(31d、32d)の少なくとも1箇所が一体構造になっていることを特徴とする請求項1に記載のスパイラルコンタクタ(3)。 The roots of the upper and lower two-stage spiral contacts (31, 32) are arranged at positions shifted from each other by 180 °, rise from the root toward the center of the spiral, and the centers are the same and run parallel to each other. In the double spiral spiral contactor (3) in which the two spiral contacts (31, 32) arranged in a spiral shape merge at the tip, the base (31d, 32d) of the base (31d, 32d) is integrated. The spiral contactor (3) according to claim 1, characterized in that at least one part has an integral structure.
  4.  前記上下二段のスパイラル状接触子(41、42)の根元を互いに120°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された3個の前記スパイラル状接触子(41、42)が先端で合流して一体とした三重渦巻きスパイラルコンタクタ(4)において、前記根元から前記基部(41d、42d)の少なくとも1箇所が一体構造になっていることを特徴とする請求項1に記載のスパイラルコンタクタ(4)。 The roots of the upper and lower two-stage spiral contacts (41, 42) are arranged at positions shifted from each other by 120 °, rise from the roots toward the center of the spiral, In the triple spiral spiral contactor (4) in which the three spiral contacts (41, 42) arranged in a spiral shape are joined together at the tip, and at least the base (41d, 42d) from the root. The spiral contactor (4) according to claim 1, characterized in that one place has an integral structure.
  5.  前記上下二段の前記スパイラル状接触子(51、52)の前記渦巻きの根元を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(51、52)が先端で合流して一体としたスパイラルコンタクタ(5)において、前記根元から前記基部(51d、52d)の少なくとも1箇所が一体構造になっていることを特徴とする請求項1に記載のスパイラルコンタクタ(5)。 Two spiral contacts (51, 52) arranged in a spiral shape with the spiral roots of the upper and lower two-stage spiral contacts (51, 52) being arranged in parallel with each other at the tip. The spiral contactor (5) according to claim 1, wherein at least one part of the base part (51d, 52d) from the root has an integral structure in the joined and integrated spiral contactor (5). .
  6.  根元から先端中心に向かって渦巻状に形成され、前記渦巻状の中心に先端を有する凸形のスパイラル状接触子(112、122)を上下二段に重ね合わせたスパイラルコンタクタ(101)であって、前記スパイラルコンタクタ(101)は、上段に電気電導性に富んだ材料を用いたスパイラル状接触子(112)、下段にバネ性に富んだ材料を用いたスパイラル状接触子(122)を設けたことを特徴とするスパイラルコンタクタ(101)。 A spiral contactor (101) in which convex spiral contacts (112, 122) formed in a spiral shape from the base toward the center of the tip and having a tip at the center of the spiral are stacked in two upper and lower stages. The spiral contactor (101) is provided with a spiral contact (112) using a material having high electrical conductivity in the upper stage and a spiral contact (122) using a material having a high spring property in the lower stage. A spiral contactor (101) characterized by that.
  7.  前記下段のスパイラル状接触子(122)の幅は、前記上段のスパイラル状接触子(112)の幅より狭いことを特徴とする請求項6に記載のスパイラルコンタクタ(101)。 The spiral contactor (101) according to claim 6, wherein a width of the lower spiral contact (122) is narrower than a width of the upper spiral contact (112).
  8.  前記下段のスパイラル状接触子(122)の厚さは、前記上段のスパイラル状接触子(112)の厚さより薄いことを特徴とする請求項6に記載のスパイラルコンタクタ(101)。 The spiral contactor (101) according to claim 6, wherein the thickness of the lower spiral contact (122) is smaller than the thickness of the upper spiral contact (112).
  9.  前記上下二段のスパイラル状接触子(112、122)の根元を互いに180°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(112、122)が先端で合流して一体とした二重渦巻きスパイラルコンタクタ(101)を、前記根元から基部の少なくとも1箇所を上下接合して上下二段に重ね合わせたことを特徴とする請求項6に記載のスパイラルコンタクタ(101)。 The roots of the upper and lower two-stage spiral contacts (112, 122) are arranged at positions shifted from each other by 180 °, rise from the root toward the center of the spiral, and the centers are the same as each other. A double spiral spiral contactor (101) in which two spiral contacts (112, 122) arranged in a spiral shape join together at the tip end and at least one part of the base is vertically joined from the base. The spiral contactor (101) according to claim 6, wherein the spiral contactor (101) is superposed in two upper and lower stages.
  10.  前記上下二段のスパイラル状接触子(131、132)の根元を互いに120°位相をずらした位置に配置して、前記根元から渦巻きの中心に向けて立ち上がり、前記中心を同一として互いに併行して渦巻状に配設された3個の前記スパイラル状接触子が先端で合流して先端で合流して一体とした三重渦巻きスパイラルコンタクタ(101´)を、前記根元から基部の少なくとも1箇所を上下接合して上下二段に重ね合わせたことを特徴とする請求項6に記載のスパイラルコンタクタ(101´)。 The roots of the upper and lower two-stage spiral contacts (131, 132) are arranged at positions shifted from each other by 120 ° phase, rise from the root toward the center of the spiral, Three spiral contactors (101 '), in which the three spiral contacts arranged in a spiral shape merge at the tip and merge at the tip, are joined at the top and bottom at least at one location from the base. The spiral contactor (101 ') according to claim 6, wherein the spiral contactor (101') is superposed in two upper and lower stages.
  11.  前記上下二段の前記スパイラル状接触子(133、134)において、前記渦巻きの根元を同一として互いに併行して渦巻状に配設された2個の前記スパイラル状接触子(133、134)が先端で合流して一体としたスパイラル状接触子(133、134)を前記根元から基部の少なくとも1箇所を上下に接合して上下二段に重ね合わせたことを特徴とする請求項6に記載のスパイラルコンタクタ(101´´)。 In the spiral contactors (133, 134) in the two upper and lower stages, the two spiral contactors (133, 134) arranged in a spiral shape in parallel with each other with the roots of the spirals being the same. The spiral contact according to claim 6, wherein the spiral contactors (133, 134) joined and integrated together at the base are joined at the upper and lower portions at least one portion of the base portion and are superposed in two stages. Contactor (101 ″).
  12.  前記根元から先端中心に向かって渦巻状に形成され、前記渦巻状の中心に先端を有する凸形のスパイラル状接触子を上下二段に重ね合わせたスパイラルコンタクタ(101、101´、101´´)であって、前記上下二段のスパイラルコンタクタの少なくとも上段に配設されたスパイラル状接触子の先端部平面には、センタ付近に穴が設けられていることを特徴とする請求項6に記載のスパイラルコンタクタ(101、101´、101´´)。 Spiral contactors (101, 101 ′, 101 ″) in which convex spiral contacts formed in a spiral shape from the root toward the center of the tip and having a tip at the center of the spiral are stacked in two upper and lower stages. The hole in the vicinity of the center is provided in the tip plane of the spiral contact disposed at least in the upper stage of the two upper and lower spiral contactors. Spiral contactors (101, 101 ′, 101 ″).
  13.  金属板を用意する第1工程(a)と、
     Cu箔とした金属板の表面に第1のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子のパターンを有する第1のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第2工程(b)と、
     第1のフォトマスクのパターンを形成するように第1のフォトレジストを現像する第3工程(c)と、
     さらに上方からCu箔の露出面にロジュームRh、Niメッキから構成される金属メッキを施し、スパイラル状接触子を成形する第4工程(d)と、
     形成したスパイラル状接触子の表面に第2のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方から一体構造部のパターンを有する第2のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第5工程(e)と、
     このフォトマスクに光を照射して露光・現像して第2のフォトレジストを除去する第6工程(f)と、
     金属メッキの表面にCuメッキを施す第7工程(g)と、
     第2のフォトレジストを除去する第8工程(h)と、
     Cuメッキの表面にNiメッキから構成される金属メッキを施す第9工程(i)と、
     上下反転させ、金属板の裏面に第3のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第3のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第10工程(j)と、
     フォトマスクに光を照射して露光・現像して第3のフォトレジストを除去する第11工程(k)と、
     Cu箔の裏面からCu箔にエッチングで穴を開ける第12工程(l)と、
     Cu箔の裏面の第3のフォトレジストを除去する第13工程(m)と、
     上下反転させたスパイラル状接触子の渦巻きの中心を一方から凸形工具で押し上げて凸形に変形させた状態でアニールフォーミングする第14工程(n)と、
     粘着テープを貼り付ける第15工程(0)と、
     Cu箔をエッチングで除去する第16工程(p)と、
     上下に重ねられた形態のスパイラル状接触子が互いの底面と上面で密着している第17工程(q)と、を含むことを特徴とするスパイラルコンタクタの製造方法。
    A first step (a) of preparing a metal plate;
    A first photoresist is applied or a dry film is applied to the surface of the metal plate made of Cu foil. A second step (b) of covering the first photomask having a spiral contact pattern from above and exposing the photomask by irradiating light from above;
    A third step (c) of developing the first photoresist so as to form a pattern of the first photomask;
    A fourth step (d) of forming a spiral contact by applying metal plating composed of rhodium Rh and Ni plating on the exposed surface of the Cu foil from above;
    A second photoresist is applied or a dry film is applied to the surface of the formed spiral contact. A fifth step (e) in which a second photomask having a pattern of an integral structure portion is covered from above and exposed by irradiating light from above the photomask;
    A sixth step (f) of irradiating the photomask with light, exposing and developing to remove the second photoresist,
    A seventh step (g) for applying Cu plating to the surface of the metal plating;
    An eighth step (h) of removing the second photoresist;
    A ninth step (i) of applying metal plating composed of Ni plating on the surface of Cu plating;
    It is turned upside down and a third photoresist is applied to the back surface of the metal plate or a dry film is applied. A tenth step (j) in which a third photomask having a pattern of holes for etching is applied from above, and exposure is performed by irradiating light from above the photomask; and
    An eleventh step (k) of irradiating the photomask with light, exposing and developing to remove the third photoresist;
    A twelfth step (l) of making a hole in the Cu foil by etching from the back side of the Cu foil;
    A thirteenth step (m) of removing the third photoresist on the back surface of the Cu foil;
    A 14th step (n) in which annealing forming is performed in a state in which the center of the spiral of the spiral contactor turned upside down is pushed up from one side with a convex tool and deformed into a convex shape;
    A fifteenth step (0) for applying an adhesive tape;
    A sixteenth step (p) of removing the Cu foil by etching;
    And a seventeenth step (q) in which spiral contacts in the form of being stacked one above the other are in close contact with each other at the bottom and top surfaces.
  14.  金属板を用意する第A工程(a)と、
     Cu箔とした金属板の表面に第1のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子のパターンを有する第1のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第B工程(b)と、
     第1のフォトマスクのパターンを形成するように第1のフォトレジストを現像する第C工程(c)と、
     さらに上方からCu箔の露出面にロジュームRh、Niメッキから構成される金属メッキを施し、スパイラル状接触子を成形する第D工程(d)と、
     第1のフォトレジストを除去する第E工程(e)と、
     形成したスパイラル状接触子の表面に第2のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方から一体構造部のパターンを有する第2のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第F工程(f)と、
     このフォトマスクに光を照射して露光・現像して第2のフォトレジストを除去する第G工程(g)と、
     除去した表面にCuメッキを施す第H工程(h)と、
     第1のフォトレジストを除去する第I工程(i)と、
     Cuメッキの表面に第3のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方からスパイラル状接触子のパターンを有する第3のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第J工程(j)と、
     第3のフォトマスクに光を照射して露光・現像して第3のフォトレジストを除去する第K工程(k)と、
     Cuメッキの表面にNiメッキから構成される金属メッキを施す第L工程(l)と、
     上下反転させ、金属板の裏面に第4のフォトレジストを塗布、もしくはドライフィルムを貼付する。その上方からエッチング用の穴のパターンを有する第4のフォトマスクを被せ、このフォトマスクの上方から光を照射して露光する第M工程(m)と、
     第4のフォトマスクに光を照射して露光・現像して第4のフォトレジストを除去する第N工程(n)と、
     Cu箔の裏面からCu箔にエッチングで穴を開ける第O工程(o)と、
     Cu箔の裏面の第4のフォトレジストを除去する第P工程(p)と、
     上下反転させたスパイラル状接触子の渦巻きの中心を一方から凸形工具で押し上げて凸形に変形させた状態でアニールフォーミングする第Q工程(q)と、
     粘着テープを貼り付ける第R工程(r)と、
     Cu箔をエッチングで除去する第S工程(s)と、
     上下に重ねられた形態のスパイラル状接触子が互いの底面と上面で密着している第T工程(t)と、を含むことを特徴とするスパイラルコンタクタの製造方法。
    Step A (a) for preparing a metal plate;
    A first photoresist is applied or a dry film is applied to the surface of the metal plate made of Cu foil. A first step (b) in which a first photomask having a spiral contactor pattern is covered from above and exposed by irradiating light from above the photomask;
    A step C of developing the first photoresist so as to form a pattern of the first photomask; and
    Further, from the upper side, the exposed surface of the Cu foil is subjected to metal plating composed of rhodium Rh and Ni plating, and a D step (d) for forming a spiral contact,
    An E step (e) of removing the first photoresist;
    A second photoresist is applied or a dry film is applied to the surface of the formed spiral contact. An F-step (f) in which a second photomask having a pattern of a monolithic structure portion is covered from above and exposed by irradiating light from above the photomask;
    G step (g) of irradiating the photomask with light, exposing and developing to remove the second photoresist,
    Step H (h) for applying Cu plating to the removed surface;
    A first step (i) of removing the first photoresist;
    A third photoresist is applied or a dry film is applied to the surface of the Cu plating. Covering a third photomask having a spiral contact pattern from above, J-th step (j) for exposing by irradiating light from above the photomask;
    A K-th step (k) in which the third photomask is irradiated with light, exposed and developed to remove the third photoresist;
    Step L (l) for applying metal plating composed of Ni plating on the surface of Cu plating;
    It is turned upside down and a fourth photoresist is applied to the back surface of the metal plate or a dry film is applied. An Mth step (m) in which a fourth photomask having a pattern of holes for etching is covered from above, and exposure is performed by irradiating light from above the photomask; and
    An Nth step (n) of irradiating the fourth photomask with light, exposing and developing to remove the fourth photoresist;
    O-th step (o) for making a hole in the Cu foil by etching from the back side of the Cu foil;
    A P-th step (p) for removing the fourth photoresist on the back surface of the Cu foil;
    A Q-step (q) of annealing forming in a state where the spiral center of the spiral contact that is turned upside down is pushed up from one side with a convex tool and deformed into a convex shape;
    R-step (r) for applying an adhesive tape;
    Step S (s) for removing the Cu foil by etching;
    And a T-th step (t) in which spiral contacts in the form of being stacked one above the other are in close contact with each other at the bottom and top surfaces.
PCT/JP2009/005129 2009-04-24 2009-10-02 Spiral contactor and method for manufacturing same WO2010122612A1 (en)

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Cited By (2)

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CN105047382A (en) * 2015-08-25 2015-11-11 重庆民生变压器有限责任公司 Spiral-type connection terminal for transformer
EP2947721A3 (en) * 2014-05-23 2016-03-02 Alps Electric Co., Ltd. Pressure contact type connector and manufacturing method of the same

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JP2007087679A (en) * 2005-09-21 2007-04-05 Alps Electric Co Ltd Connecting element
JP2008251331A (en) * 2007-03-30 2008-10-16 Advanced Systems Japan Inc Projecting kelvin spiral contactor

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Publication number Priority date Publication date Assignee Title
JP2007087679A (en) * 2005-09-21 2007-04-05 Alps Electric Co Ltd Connecting element
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Publication number Priority date Publication date Assignee Title
EP2947721A3 (en) * 2014-05-23 2016-03-02 Alps Electric Co., Ltd. Pressure contact type connector and manufacturing method of the same
EP3416245A1 (en) * 2014-05-23 2018-12-19 Alps Electric Co., Ltd. Pressure contact type connector and manufacturing method of the same
CN105047382A (en) * 2015-08-25 2015-11-11 重庆民生变压器有限责任公司 Spiral-type connection terminal for transformer
CN105047382B (en) * 2015-08-25 2017-04-12 重庆民生变压器有限责任公司 Spiral-type connection terminal for transformer

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