WO2010078022A2 - Appareils et procédés de retrait épitaxial de type bande - Google Patents

Appareils et procédés de retrait épitaxial de type bande Download PDF

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Publication number
WO2010078022A2
WO2010078022A2 PCT/US2009/068445 US2009068445W WO2010078022A2 WO 2010078022 A2 WO2010078022 A2 WO 2010078022A2 US 2009068445 W US2009068445 W US 2009068445W WO 2010078022 A2 WO2010078022 A2 WO 2010078022A2
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WIPO (PCT)
Prior art keywords
support tape
tape
support
substrates
gallium arsenide
Prior art date
Application number
PCT/US2009/068445
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English (en)
Other versions
WO2010078022A3 (fr
Inventor
Thomas J. Gmitter
Gang He
Melissa Archer
Andreas Hegedus
Original Assignee
Alta Devices, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alta Devices, Inc. filed Critical Alta Devices, Inc.
Priority to CN2009801556182A priority Critical patent/CN102301456A/zh
Priority to EP09836939.0A priority patent/EP2359393B1/fr
Publication of WO2010078022A2 publication Critical patent/WO2010078022A2/fr
Publication of WO2010078022A3 publication Critical patent/WO2010078022A3/fr

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
    • H01L21/7813—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate leaving a reusable substrate, e.g. epitaxial lift off
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30612—Etching of AIIIBV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68345—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling
    • H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/544—Solar cells from Group III-V materials

Definitions

  • Embodiments of the invention generally relate to apparatuses and methods for the fabrication of solar, semiconductor, and electronic materials and devices, and more particularly to epitaxial lift off (ELO) thin films and devices.
  • ELO epitaxial lift off
  • One phase in device fabrication involves handling and packaging of thin films used as photovoltaic or solar devices, semiconductor devices, or other electronic devices.
  • Such thin film devices may be manufactured by utilizing a variety of processes for depositing materials onto and removing material from a substrate or wafer.
  • One uncommon technique for manufacturing thin film devices is known as the epitaxial lift off (ELO) process.
  • the ELO process includes depositing an epitaxial layer or film on a sacrificial layer on a growth substrate, then etching the sacrificial layer to separate the epitaxial layer from the growth substrate.
  • the removed thin epitaxial layer is known as the ELO or epitaxial film or layer and typically includes thin films used as photovoltaic or solar devices, semiconductor devices, or other electronic devices.
  • the thin ELO films are very difficult to manage or handle, such as when bonding to a substrate or while packaging, since the ELO films are very fragile and have narrow dimensions.
  • the ELO films crack under very small forces. Also, the ELO films are very difficult to align due to their extremely narrow dimensions.
  • the sacrificial layer is typically very thin and may be etched away via a wet chemical process.
  • the speed of the overall process may be limited by the lack of delivery or exposure of reactant to the etch front, which leads to less removal of by-products from the etch front.
  • the ELO etching process is a diffusion limited process and when the ELO films are maintained in their as deposited geometries, a very narrow and long opening forms which severely limits the overall speed of the PATENT
  • the bending of the ELO film however can induce stresses the epitaxial layers within and the amount of bending is limited by the strength of the ELO film.
  • the ELO film usually contains a brittle material, which does not undergo plastic deformation before failure, and as such may be subject to crack induced failures.
  • the brittle ELO film may be maintained under a compressive stress. Cracks usually do not propagate through regions of residual compressive stress.
  • the ELO film is placed under tensile stress while bending the ELO film away from the growth substrate since the ELO film is on the outside of the curvature of the crevice.
  • the tensile stress limits the amount of crevice curvature and reduces the speed of the etch process.
  • a residual compressive stress may be instilled within the ELO film before etching the sacrificial layer. This initial compressive stress may be offset by tensile stress caused by the bending and therefore allows for a greater amount of bending during the separation process.
  • the ELO process has always been a cost prohibiting technique for commercially producing the thin ELO film devices.
  • Current ELO processes include transferring a single growth substrate through many fabrication steps while producing a single ELO film.
  • the current processes are time consuming, costly, and rarely produce commercial quality ELO films.
  • Embodiments of the invention generally relate to apparatuses and methods for producing epitaxial thin films and devices by epitaxial lift off (ELO) processes.
  • the thin film devices generally contain epitaxially grown layers which are formed on a sacrificial layer disposed on or over a growth substrate, such as a wafer.
  • a support tape may be disposed on or over the opposite side of the epitaxial film as the wafer. The support tape may be used to hold the epitaxial films during the etching and removal steps of the ELO process, and thereafter.
  • the apparatus for removing the epitaxial films from the substrates may include an etch section, substrate and support tape handling devices, and various tension control devices to protect the epitaxial films during the ELO removal process.
  • a method for forming thin film devices during an ELO process includes forming an epitaxial film or material over a sacrificial layer on a substrate, adhering an elongated tape support onto the epitaxial film, removing the sacrificial layer during an etching process, and peeling the epitaxial film from the substrate while bending the elongated tape support away from the substrate.
  • an apparatus for forming a tape-based ELO stack contains a first end, a second end, and a tape supply section proximate the first end.
  • the tape supply section provides at least one unloaded support tape, a lamination section for receiving the at least one unloaded support tape, and a plurality of substrates having an epitaxial film thereon.
  • the lamination section adheres the substrates to the at least one unloaded support tape to form at least one loaded support tape and an ELO etch section proximate the second end, the ELO etch section removing the substrates from the at least one loaded support tape, while leaving the epitaxial film on the at least one loaded support tape.
  • the tape supply section generally includes at least one roller which has at least one roller with at least one tape wound thereon.
  • Embodiments of the apparatus further provide a splice/punch section disposed between the tape supply section and the lamination section, the splice/punch section forming openings in the elongated, unloaded support tape.
  • the ELO etch section containing etch bath reservoirs or tanks may be configured to continuously remove the substrates from the loaded support tape and may be configured to remove the substrates from the loaded support tape in batches.
  • the support tape has at least one row of track openings extending the length of the support tape.
  • each side of the support tape has a row of track openings extending the length of the support tape.
  • the support tape moves around at least two reels, drums, or rollers.
  • the support tape moves around at least one roller having a plurality of pins extending from the roller to engage the track openings.
  • the roller contains a sprocket or a cog to engage the track openings.
  • the loaded support tape may contain a plurality of slots extending perpendicular or substantially perpendicular from the outside edges of the support tape.
  • the plurality of slots has pairs of aligned slots which extend from opposite outside edges of the loaded support tape. Each pair of slots is within a region of the loaded support tape, and the region is free of substrates. Each substrate may be coupled to or with the loaded support tape between two consecutive pairs of slots, such as outside the region containing the pair of slots.
  • a method for forming thin film devices during an ELO process includes coupling an elongated support tape and a plurality of substrates, wherein each substrate contains an epitaxial film disposed over a sacrificial layer disposed over a wafer, exposing the substrates to an etchant during an etching process while moving the elongated support tape, and etching the sacrificial layers and peeling the epitaxial films from the wafers while moving the elongated support tape.
  • the elongated support tape is coupled with each substrate by the epitaxial film disposed thereon.
  • the plurality of substrates coupled with the elongated support tape generally contains from about 4 substrates to about 100 substrates or PATENT
  • the elongated support tape may contain multiple layers.
  • the elongated support tape contains at least one metal, for example, at least one metallic foil.
  • the metallic foil contains a metal such as iron, nickel, cobalt, steel, stainless steel, alloys thereof, derivatives thereof, or combinations thereof.
  • the elongated support tape contains at least one material such as a plastic material, a polymeric material, a co-polymeric material, an oligomeric material, derivatives thereof, or combinations thereof.
  • the elongated support tape may contain polyacrylic materials, polyethylene materials, polypropylene materials, polytetrafluoroethylene materials, fluorinated polymeric materials, isomers thereof, derivatives thereof, and combinations thereof.
  • the elongated support tape moves around at least two reels, drums, or rollers. At least one side of the elongated support tape contains a row of track openings extending the length of the elongated support tape. In some examples, each side of the elongated support tape contains a row of track openings extending the length of the elongated support tape.
  • the elongated support tape moves around at least one roller having a plurality of pins extending from the roller to engage the track openings.
  • the roller may have a sprocket or a cog as the pins for engaging the track openings.
  • the elongated support tape may have a plurality of slots extending perpendicular or substantially perpendicular from the outside edges of the elongated support tape.
  • the plurality of slots may have pairs of aligned slots which extend from opposite outside edges of the elongated support tape.
  • each pair of slots may be within a region of the elongated support tape, and the region is free of substrates.
  • Each substrate may be coupled with the elongated support tape between two consecutive pairs of slots.
  • an adhesive layer is disposed between each substrate and the elongated support tape.
  • the adhesive layer may be formed by applying an adhesive to each substrate and coupling each substrate to the elongated support tape.
  • the adhesive layer may contain a pressure sensitive adhesive, a hot-melt adhesive, a UV-cured adhesive.
  • the adhesive layer contains an acrylic adhesive.
  • the sacrificial layer contains aluminum arsenide, alloys thereof, derivatives thereof, or combinations thereof.
  • the sacrificial layer may have a thickness within a range from about 1 nm to about 20 nm.
  • the sacrificial layer may be exposed to a wet etch solution during the etching process.
  • the wet etch solution may contain hydrofluoric acid, a surfactant, and a buffer.
  • the sacrificial layer is etched at a rate of about 5 mm/hr or greater.
  • the epitaxial film or material grown or formed on the wafer may have a plurality of layers.
  • the wafer generally contains gallium arsenide, gallium arsenide alloys, dopants thereof, or derivatives thereof.
  • Each layer of the epitaxial film or material may contain gallium arsenide, aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • the epitaxial film has a layer containing gallium arsenide and another layer containing aluminum gallium arsenide.
  • the epitaxial film may have a gallium arsenide buffer layer, at least one aluminum gallium arsenide passivation layer, and a gallium arsenide active layer.
  • the gallium arsenide buffer layer may have a thickness within a range from about 100 nm to about 500 nm
  • the aluminum gallium arsenide passivation layer has a thickness within a range from about 10 nm to about 50 nm
  • the gallium arsenide active layer has a thickness within a range from about 500 nm to about 2,000 nm.
  • each epitaxial film contains a photovoltaic or solar cell structure having multiple layers.
  • the photovoltaic cell structure contains at least two materials such as gallium arsenide, n-doped gallium arsenide, p-doped gallium arsenide, aluminum gallium arsenide, n-doped aluminum gallium arsenide, p-doped aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • Figure 1 is a schematic isometric view of a substrate containing an ELO thin film stack on a wafer according to embodiments described herein.
  • Figure 2A is a side view of an assembly formed of a plurality of substrates adhered to a support tape, according to embodiments of the invention.
  • Figure 2B is a plan view of the bottom of the assembly of Figure 2A.
  • Figure 2C is a side view of an assembly formed of a plurality of epitaxial films attached to a support tape, according to embodiments of the invention.
  • Figure 2D is a side view of the assembly of Figure 2C being wound on a support roll, according to embodiments of the invention.
  • Figure 2E is a side view of an assembly including the assembly of Figure 2C wound on a support roll, according to embodiments of the invention.
  • Figure 3 is a schematic plan view of one embodiment of an apparatus for forming tape based ELO films and devices.
  • Figure 4 is a schematic isometric view of one embodiment of an apparatus for performing an ELO process to remove ELO films from support wafers.
  • Figure 5 is an enlarged overhead isometric view of the tape drive and tensioning portion of the apparatus of Figure 4.
  • Figure 6 is an enlarged horizontal isometric view of the tape drive and tensioning portion of the apparatus of Figure 4.
  • Figures 6A-6C are cross sections of the tape and wafer assembly as it proceeds through the apparatus of Figure 4.
  • Figure 7 is an isometric view of a tape and wafer tank entry assembly for use with embodiments of the ELO process apparatus of the invention.
  • Figure 8 is an isometric view of a tape extraction assembly for use with embodiments of the ELO process apparatus of the invention.
  • Figure 9 is an isometric view of a positive substrate detachment assembly for use with embodiments of the ELO process apparatus of the invention.
  • Figure 10 is a schematic isometric view of a further embodiment of an apparatus for performing an ELO process to remove ELO films from support wafers.
  • Figure 11 is an enlarged isometric view of the tape drive and tensioning portion of the apparatus of Figure 10.
  • Figures 11 A-11 C are cross sections of the tape and wafer assembly as it proceeds through the apparatus of Figure 10.
  • Figure 12 is a schematic isometric view of another embodiment of an apparatus for performing an ELO process to remove ELO films from support wafers.
  • Figure 13 is an enlarged isometric view of the tape drive and point load tensioning portion of the apparatus of Figure 12.
  • Figure 14 is an enlarged isometric view of the wafer support and pusher portion of the apparatus of Figure 12.
  • Figure 15 is a schematic isometric view of another embodiment of an apparatus for performing an ELO process to remove ELO films from support wafers.
  • Figure 16 is an enlarged isometric view of the tape drive and point load tensioning portion of the apparatus of Figure 15.
  • Figure 17 is an enlarged isometric view of the wafer support and pusher portion of the apparatus of Figure 15.
  • Figure 18 is a schematic isometric view of a batch-type embodiment of an apparatus for performing an ELO process to remove ELO films from support wafers.
  • Figure 19 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18.
  • Figure 20 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18.
  • Figure 21 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a loading position.
  • Figure 22 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a loading position.
  • Figure 23 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load and finger lowering position.
  • Figure 24 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load and finger lowering position.
  • Figure 25 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load and finger further lowered position.
  • Figure 26 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load and finger further lowered position.
  • Figure 27 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a tape locked position.
  • Figure 28 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a tape locked position.
  • Figure 29 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a lowered belt position.
  • Figure 30 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a lowered belt position.
  • Figure 31 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in an initial ELO position.
  • Figure 32 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in an initial ELO position.
  • Figure 33 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a continuing ELO position.
  • Figure 34 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a continuing ELO position.
  • Figure 35 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in an ELO completed position.
  • Figure 36 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in an ELO completed position.
  • Figure 37 is an enlarged isometric view of the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load rotated position.
  • Figure 38 is a cross section through the wafer support and belt drive and point load tensioning portion of the apparatus of Figure 18 in a point load rotated position.
  • Figure 39 is a flow chart illustrating one embodiment of a method for forming ELO thin films and devices that may be performed by the apparatus of Figure 3.
  • Figure 40 is a flow chart illustrating one embodiment of a batch ELO method that may be performed by the apparatus of Figures 18-38.
  • FIG. 1 depicts substrate 100 containing an epitaxial lift off (ELO) thin film stack 150, as described in one embodiment herein.
  • the ELO thin film stack 150 is disposed on or over the wafer 102 and contains an epitaxial film 106 disposed on or over a sacrificial layer 104.
  • the substrate 100 is a relatively difficult product to handle, requiring each ELO thin film stack 150 to be handled separately.
  • the wafers 102 used to form the epitaxial layers of the ELO thin film stacks 150 are usually expensive, particularly when made of gallium arsenide.
  • the wafer 102 may contain or be formed of a variety of materials, such as Group Ill/V materials, and may be doped with other elements.
  • the wafer 102 may be a wafer or a substrate and usually contains gallium arsenide, gallium arsenide alloys or other derivatives, and may be n-doped or p-doped.
  • the wafer 102 contains n-doped gallium arsenide material.
  • the wafer 102 contains p-doped gallium arsenide material.
  • the sacrificial layer 104 may contain aluminum arsenide, alloys thereof, derivatives thereof, or combinations thereof. In one example, the sacrificial layer 104 contains at least an aluminum arsenide layer. The sacrificial layer 104 may PATENT
  • a thickness of about 20 nm or less such as within a range from about 1 nm to about 20 nm, or from about 1 nm to about 10 nm, or from about 4 nm to about 6 nm.
  • the epitaxial film 106 generally contains multiple layers of epitaxial materials.
  • the epitaxial material of the epitaxial film 106 may contain gallium arsenide, aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • the epitaxial film 106 may contain one layer, but usually contains multiple layers.
  • the epitaxial film 106 contains a layer having gallium arsenide and another layer having aluminum gallium arsenide.
  • the epitaxial film 106 contains a gallium arsenide buffer layer, an aluminum gallium arsenide passivation layer, and a gallium arsenide active layer.
  • the gallium arsenide buffer layer may have a thickness within a range from about 100 nm to about 500 nm, such as about 300 nm
  • the aluminum gallium arsenide passivation layer may have a thickness within a range from about 10 nm to about 50 nm, such as about 30 nm
  • the gallium arsenide active layer may have a thickness within a range from about 500 nm to about 2,000 nm, such as about 1 ,000 nm.
  • the epitaxial film 106 further contains a second aluminum gallium arsenide passivation layer.
  • the second gallium arsenide buffer layer may have a thickness within a range from about 100 nm to about 500 nm, such as about 300 nm.
  • the epitaxial film 106 may have a photovoltaic cell structure containing multiple layers.
  • the photovoltaic cell structure may contain gallium arsenide, n-doped gallium arsenide, p-doped gallium arsenide, aluminum gallium arsenide, n-doped aluminum gallium arsenide, p-doped aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • Figures 2A-2E depict various stages of transferring the epitaxial film 106 from the wafer 102 to a tape substrate on a roll, according to embodiments of the invention.
  • Figure 2A is a side view and
  • Figure 2B is a bottom view of an assembly 200 that includes a plurality (six shown) of the substrates 100 of Figure 1 , attached to a support tape 202.
  • Each of the substrates 100 has a sacrificial layer 104 disposed on or over a wafer 102 and an epitaxial film 106 disposed on or over the PATENT Attorney Docket No.: ALTA/0018PCT
  • An adhesive layer 204 may be disposed between each of the substrates 100 and the support tape 202.
  • the adhesive layer 204 may be applied to the substrates 100 or the epitaxial films 106 before adhering or coupling with the support tape 202.
  • the adhesive layer 204 may be applied to the support tape 202 before adhering or coupling with the substrates 100 or the epitaxial films 106.
  • the adhesive layer 204 may be applied to both the support tape 202 and the substrates 100 or the epitaxial films 106 and subsequently, adhering or coupling together.
  • the adhesive layers 204 may be made of a pressure sensitive adhesive (PSA), a hot melt adhesive, an ultraviolet (UV) curing adhesive, an acrylic adhesive, a rubber adhesive, a natural adhesive (e.g., natural rubber), a synthetic adhesive (e.g., synthetic rubber), derivatives thereof, or combinations thereof.
  • PSA pressure sensitive adhesive
  • UV ultraviolet curing adhesive
  • acrylic adhesive acrylic adhesive
  • rubber adhesive e.g., polymethyl methacrylate
  • a natural adhesive e.g., natural rubber
  • synthetic adhesive e.g., synthetic rubber
  • the adhesive layers 204 may be formed from or contain an optical adhesive and/or a UV-curable adhesive that has been exposed to UV radiation during a curing process.
  • the adhesive may be exposed to the UV radiation for a time period within a range from about 1 minute to about 10 minutes, preferably, from about 3 minutes to about 7 minutes, such as about 5 minutes.
  • the adhesive may be cured at a temperature within a range from about 25°C to about 75°C, such as about 50 0 C.
  • An exemplary optical adhesive is commercially available as Norland UV-curable optical adhesive.
  • the adhesive layers 204 may contain a mercapto ester compound.
  • the adhesive layers 204 may further contain an adhesive material such as butyl octyl phthalate, tetrahydrofurfuryl methacrylate, acrylate monomer, isomers thereof, derivatives thereof, or combinations thereof.
  • the adhesive layers 204 may contain an acrylic compound or derivatives thereof.
  • the adhesive of the adhesive layers 204 may be a silicone adhesive or may contain sodium silicate.
  • the adhesive may be cured for a time period within a range from about 10 hours to about 100 hours, preferably, from about 20 hours to about 60 hours, and more preferably, from PATENT
  • the adhesive may be cured at a temperature within a range from about 25°C to about 75°C, such as about 50 0 C. Also the adhesive may be cured by applying a pressure thereto.
  • the pressure applied to the adhesive may be within a range from about 1 psi (pounds per square inch) to about 50 psi, preferably, from about 3 psi to about 25 psi, and more preferably, from about 5 psi to about 15 psi. In one example, the pressure is about 9 psi.
  • the adhesive layers 204 may contain a polymer, a copolymer, an oligomer, derivatives thereof, or combinations thereof.
  • the adhesive layer 204 contains a copolymer.
  • the copolymer may be an ethylene/vinylacetate (EVA) copolymer or derivatives thereof.
  • EVA copolymer which is useful as the adhesive layer 204 is WAFER GRIP adhesive film, commercially available from Dynatex International, located in Santa Rosa, California.
  • the support tape 202 is an elongated thin strip of material.
  • the support tape 202 is similar in structure to photographic film.
  • the elongated support tape, such as support tape 202 may be coupled with each substrate 100 through each epitaxial film 106 by an adhesive or adhesive layer 204.
  • the support tape 202 may have from about 4 substrates to about 100 substrates or more.
  • the support tape 202 may have a single layer or may contain multiple layers of the same or different materials.
  • the material of the support tape 202 includes metallic, plastic, polymeric, co-polymeric, and/or oligomeric materials.
  • the support tape 202 may be formed from or contain polyacrylic materials, polyethylene materials, polypropylene materials, polytetrafluoroethylene materials, fluorinated polymeric materials, isomers thereof, derivatives thereof, or combinations thereof.
  • the material of the support tape 202 is at least substantially resistant to the etchant used in the etching process as described below.
  • the support tape 202 contains at least one PATENT Attorney Docket No.: ALTA/0018PCT
  • the metallic foil may contain at least one metal such as iron, nickel, cobalt, steel, stainless steel, alloys thereof, derivatives thereof, or combinations thereof.
  • the support tape 202 may have a width Wi that is between about 10 mm and about 1 ,000 mm, or about 50 mm to about 300 mm, or about 70 mm to about 150 mm, in various embodiments.
  • the overall length (not shown) of the support tape 202 is only limited by the size of the storage rolls or reels that the support tape 202 is wound upon. In one embodiment the length of the support tape 202 is between about 1 m and about 1 ,000 m.
  • Each substrate 100 may have a length Li in the longitudinal direction of the support tape 202 and a width W 2 , traverse to the support tape 202.
  • L 1 is between about 8 mm and about 950 mm
  • W 2 is between about 8 mm and about 950 mm.
  • the substrates 100 in one embodiment, are substantially centered on the tape, and spaced a distance Di from each other. In one embodiment, D 1 is between about 2 mm and about 20 mm.
  • the support tape 202 may optionally include track openings 206 along the sides of the support tape 202 for engagement by drive elements as described below with respect to various embodiments of the apparatus.
  • the support tape 202 may include regularly spaced slots 208, in some embodiments, to provide a greater degree of flexibility in the transverse direction, as required.
  • the slots 208 are generally centered between two adjacent substrates 100, and in one embodiment have a width W 3 that is between about 0.5 mm and about 2 mm.
  • the slots 208 are located between substrates 100 such that between about 2 substrates and about 5 substrates are between adjacent slots 208. Further, in some embodiments, the slots 208 extend between about 25% and about 90% to the center of the support tape 202.
  • each slot 208 would extend about 70% to the center of the support tape 202, leaving a connecting edge of about 6 mm between the slots 208.
  • FIG. 2C a side view of an assembly 210 is shown that includes a plurality (six shown) of the epitaxial films 106 of Figure 2A, attached to the support tape 202 by the adhesive layers 204.
  • the support tape 202 may have from about 4 epitaxial films to about 100 epitaxial films or more within the plurality of epitaxial films 106.
  • the assembly 210 is formed by exposing the sacrificial layer 104 in the assembly 200 of Figures 2A and 2B to a wet etch solution during an ELO etching process.
  • the wet etch solution contains hydrofluoric acid and may contain a surfactant and/or a buffer.
  • the sacrificial layer 104 may be etched at a rate of about 0.3 mm/hr or greater, preferably, about 1 mm/hr or greater, and more preferably, about 5 mm/hr or greater.
  • the sacrificial layer 104 may be exposed to an electrochemical etch during the ELO etching process.
  • the electrochemical etch may be a biased process or a galvanic process.
  • the sacrificial layer 104 may be exposed to a vapor phase etch during the ELO etching process in another embodiment described herein.
  • the vapor phase etch includes exposing the sacrificial layer 104 to hydrogen fluoride vapor.
  • the ELO etching process may be a photochemical etch, a thermally enhanced etch, a plasma enhanced etch, a stress enhanced etch, derivatives thereof, or combinations thereof.
  • FIG. 2D a side view is shown of the assembly 210 of Figure 2C being wound on a support reel or a support roll 212.
  • the assembly 210 includes the support tape 202 with a plurality of epitaxial films 106 attached or adhered thereto as described above.
  • the assembly 210 is shown being wound around roll 212 with the epitaxial films 106 attached to the bottom of the support tape 202 such that the epitaxial films 106 are faced toward the surface of the roll 212.
  • the epitaxial films 106 may be above the support tape 202 such that the epitaxial films 106 are faced away from the surface of the roll 212.
  • a protective film or sheet 214 may be provided to protect the epitaxial films 106 from adjacent surfaces.
  • the roll 212 has a minimum (unloaded) radius of R-i.
  • the radius Ri of the roll 212 is between about 10 cm to about 100 cm.
  • the radius Ri of the roll 212 is an important design consideration, as the epitaxial films 106 may be cracked or otherwise damaged if they are subjected to a radius of curvature that is too small.
  • the radius Ri of the roll 212 is chosen based on the structural PATENT Attorney Docket No.: ALTA/0018PCT
  • Figure 3 is a schematic plan view of one embodiment of an apparatus 300 that is useful for performing a method of forming tape based ELO products such as assembly 220 in Figure 2E.
  • Figure 39 is a flow chart of a method 3900 that in one embodiment is performed by apparatus 300.
  • a first section 302 includes one or more reels or rolls 354 containing one or more blank or unloaded support tapes 352.
  • the unloaded support tapes 352 are unwound from the roll(s), and the unloaded support tapes 352 are fed from the roll(s) 354 into a splice/punch section 304.
  • the unloaded support tapes 352 are cut, punched, or a combination of cut and punched to form openings in the tape, as required for handling and other purposes.
  • the openings formed in the support tapes 352 in the splice/punch section 304 include the track openings 206 and the slots 208, as shown in Figure 2B. In other embodiments, openings may not be required, and the splice/punch section 304 may be omitted from apparatus 300.
  • the unloaded support tapes 352 enter a lamination section 306.
  • the lamination section 306 receives substrates 356 from a substrate input section 308.
  • a robot 310 may be used to load the substrates 356 into the lamination section 306.
  • the substrates 356 may, in one embodiment, be similar in structure to the substrate 100 of Figure 1. In the lamination section 306, the substrates are attached, adhered or otherwise bonded to PATENT
  • the loaded support tapes 368 are similar in structure to assembly 200 as shown in Figures 2A and 2B.
  • the loaded support tapes 368 enter an accumulation section 312 after leaving the lamination section 306.
  • the loaded support tapes 368 are accumulated prior to entering etch bath reservoirs or tanks within the ELO etch section 314, as illustrated by block 3908 of method 3900.
  • the loaded support tapes 368 enter etch bath reservoirs or tanks within an ELO etch section 314.
  • the sacrificial layer for example sacrificial layer 104 in Figures 1 and 2A
  • the wafer for example, wafer 102 in Figures 1 and 2A
  • the resulting ELO film loaded support tapes 364 proceed to tape post etch processing sections, while the unloaded substrates 360 proceed to wafer post etch processing sections, in block 3912 of method 3900.
  • the unloaded substrates 360 enter a conveyor loading section 316, where the unloaded substrates 360 are placed on a conveyor, for example, by a robot (not shown).
  • the wafer post etch processing sections include a first wafer rinsing section 318, a wafer cleaning section 320, a second wafer rinsing section 322 and a wafer drying section 324.
  • the wafer post etch processing sections are designed to prepare the wafers to be reused in the process, by removing contaminates from the wafers.
  • a robot 326 unloads the substrates from the wafer drying section 324 to a wafer output section 328.
  • the wafers 362 in the wafer output section 328 are ready to have sacrificial and epitaxial material layers redeposited thereon.
  • a conveyor (not shown) may redirect the wafers 362 to a deposition chamber or process. Once the sacrificial layers and epitaxial films are deposited on the substrates, the substrates may be further conveyed to substrate input section 308 as substrates 356, to be reused in the process. In this manner, the relatively expensive wafers may be used multiple times to grow the desired epitaxial thin films and devices.
  • the resulting ELO film loaded support tapes 364 proceed to tape post etch processing sections.
  • the tape post etch processing sections include a first tape rinsing section 330, a tape cleaning section 332, a second tape rinsing section 334 and a tape drying section 336.
  • the ELO film loaded support tapes are similar to the assembly 210 as shown in Figure 2C.
  • the tape post etch processing sections are designed to clean and dry the ELO film loaded support tapes 364 to remove contaminates from the tape and epitaxial material loaded thereon.
  • the ELO film loaded support tapes 364 proceed to a tape winding section 338 located at a second end 370 of the apparatus 300.
  • the ELO film loaded support tapes 364 are wound onto one or more reels or rolls 366, such as shown in Figure 2D, and in block 3914 of method 3900.
  • the loaded roll is removed from the tape winding section 338 and is replaced by an empty roll.
  • the loaded roll is similar to assembly 220 as shown in Figure 2E.
  • FIG. 4-6 a longitudinal geared wedge embodiment of an apparatus 400 for performing an ELO etch process to remove ELO film stacks from support wafers.
  • the apparatus 400 includes a tape and wafer loading section 402, an etch bath 404, a wafer unload section 406, and a tape unload section 408.
  • Figure 5 shows an overhead view of a portion of the etch bath 404 and the tape drive and tensioning portion of the apparatus 400.
  • the support tape 202 includes a plurality of openings or track openings 206 along its sides, similar to those shown in Figure 2B.
  • the apparatus 400 includes a plurality of drive and tensioning gears 502 that engage the tape in the track openings 206.
  • the drive and tensioning gears 502 drive the tape through the etch bath 404, while also maintaining the lateral position of the sides of the support tape 202 by engaging the outside portion 504 of the track openings 206.
  • the drive and tensioning gears 502 are connected to driven sprockets 506 by drive shafts 508.
  • the driven sprockets 506 may in turn be attached to a driving sprocket and motor (not shown) by a drive chain or belt (not PATENT
  • the driven sprockets 506 and the elements that drive them are, in one embodiment, located above the etch bath 404.
  • Tape guides 510 may also be provided to guide the support tape 202 through the etch bath 404.
  • a static wedge is shown formed by two ramps 512. The static wedge progressively applies pressure to remove the wafers 102 from the support tape 202, while leaving the ELO stack on the support tape 202.
  • a number of adjustable supports 514 adjustably connect the ramps 512 to an overhead assembly (not shown).
  • the adjustable supports 514 may be threaded, or otherwise adjustable, to provide adjustment of the level of the ramps 512 at the various stages of the etch bath 404.
  • the ramps 512 are spaced apart at their first end adjacent to the tape and wafer loading section 402, and converge toward one another at their second end adjacent to the tape unload section 408.
  • the ramps 512 also extend further down into the etch bath 404 from their first end to their second end and thereby increasingly engage the top of the support tape 202 as it travels through the etch bath 404.
  • the wafers 102 are supported from below by a substrate support (not shown) that supports the wafers 102 near the tape unload section 408 of apparatus 400 using a spring or buoyancy applied force.
  • Figures 6A-6C are schematic diagrams illustrating the relationship between the ramps 512, the support tape 202, and wafers 102, as the support tape 202 and wafers 102 proceed through the etch bath 404 (see Figure 4).
  • the support tape 202 and wafer 102 are in an initial position of the etch bath 404.
  • the ramps 512 are substantially at the initial level of the support tape 202 and the wafers 102, and the assembly is therefore relatively planar, with little or no pressure being applied to the support tape 202 and wafers 102.
  • the drive and tensioning gears 502 maintain the position of the ends of the support tape 202.
  • FIG 7 is an isometric view of one embodiment of a tape and wafer tank entry assembly 700 for use in the tape and wafer loading section 402, (see Figure 4), of various embodiments of the ELO process apparatus of the invention.
  • the tape and wafer tank entry assembly 700 includes a tape and wafer guiding block 702. While in this embodiment, the tape and wafer guiding block 702 has four tapes engaging sides 704, other numbers of sides may be used.
  • Each tape engaging side 704 includes a plurality of pins 706 for engaging the track openings 206 in the support tape 202.
  • the tape and wafer guiding block 702 rotates about a shaft (not shown) that extends through a centrally located hole 708.
  • a shaft support plate 710 is provided on opposite sides of the tape and wafer guiding block 702, for supporting and guiding the shaft.
  • a slot 712 is provided in each shaft support plate 710, and allows the shaft to oscillate as the tape and wafer guiding block 702 rotates.
  • the tape and wafer guiding block 702 includes guiding pins 714 on each corner of the sides through which the hole 708 extends. The guiding pins 714 engage sides 716 of the shaft support plates 710, so that each corner of the wafer guiding block 702 travels substantially vertically down into the etch bath, before traveling horizontally.
  • FIG 8 an embodiment of a tape extraction assembly 800 is shown for use in the tape unload section 408 of the various ELO process apparatuses of the invention.
  • the support tape 202 includes the ELO films that have been removed from the wafers 102 in the etch bath 404 as previously described.
  • the tape extraction assembly 800 includes a tape engaging drum or roller 802 that rotates about a support shaft 804.
  • the roller 802 includes a plurality of pins 806 that engage the track openings 206 in the support tape 202.
  • the pins 806 may be formed by attaching a cog or a sprocket to the roller 802.
  • the roller 802 containing may be formed or manufactured as a single device.
  • the radius R 2 of the roller 802 is of a sufficient size to avoid damaging the ELO films or stacks on the support tape 202, as described above with respect to Ri of Figure 2D.
  • the support tape 202 with the ELO films or stacks thereon proceeds to the tape post etch processing sections of apparatus 300 as described above.
  • FIG. 9 depicts a positive substrate detachment assembly 900, which may be used with the various embodiments of the ELO process apparatuses of the invention.
  • the positive substrate detachment assembly 900 includes a wafer engaging bar 902 that contacts the leading edge 904 of any wafers 102 remaining on the support tape 202 once the support tape 202 reaches the roller 802.
  • the wafer engaging bar 902 peels the wafer 102 from the support tape 202. While this action may damage the ELO stack, such as epitaxial film 106 associated with the wafer 102, the positive substrate detachment assembly 900 avoids manual intervention by technicians, thereby decreasing downtime and increasing product throughput.
  • FIG. 10-11 a longitudinal chain wedge embodiment of an apparatus 1000 for performing an ELO process to remove ELO films or stacks from support wafers, is shown.
  • Those components of apparatus 1000 that are similar in construction to the components in apparatus 400 are labeled with the same PATENT
  • apparatus 1000 Similar to the apparatus 400, apparatus 1000 includes the tape and wafer loading section 402, an etch bath 404, a wafer unload section 406 and a tape unload section 408.
  • Figure 11 shows an enlarged view of a portion of the apparatus 1000 that illustrates a tape drive and tensioning portion 1100 of the apparatus 1000.
  • the support tape 202 includes a plurality of openings or track openings 206 along its sides, similar to those shown in Figure 2B.
  • the tape drive and tensioning portion 1100 includes a plurality of drive blocks 1002 that are mounted on a drive belt or drive chain 1006.
  • the drive chain 1006 is driven and guided by a plurality of driving sprockets 1008 on each side of the etch bath 404.
  • At least one of the driving sprockets 1008 on each side of the etch bath 404 is attached to a motor (not shown) by a drive shaft (not shown), to rotate the driving sprocket and the drive train 1006.
  • two or more of the driving sprockets 1008 may be driven in this manner by an associated motor, drive shaft and/or other driving structure.
  • the drive blocks 1002 also include a pin 1102 that engages the support tape 202 in the track openings 206.
  • Each drive block 1002 further includes a tensioning roller 1104 that is rotatably mounted on a shaft 1106.
  • the tensioning rollers 1104 engage a rail 1004 ( Figure 10) to maintain a spaced apart relationship of the drive blocks 1002 on opposite sides of the etch bath 404, as they are driven therethrough.
  • a rail 1004 Figure 10
  • the tensioning rollers 1104 engage a rail 1004 ( Figure 10) to maintain a spaced apart relationship of the drive blocks 1002 on opposite sides of the etch bath 404, as they are driven therethrough.
  • the drive blocks 1002 drive the support tape 202 through the etch bath 404, the lateral position of the sides of the support tape 202 are maintained by the pins 1102 engaging the outside portion 504 of the track openings 206.
  • apparatus 1000 includes a static wedge that is formed by two ramps 512.
  • the static wedge progressively applies pressure to remove the wafers 102 from the support tape 202, while leaving the ELO stack on the support tape 202.
  • a number of adjustable supports adjustably connect the ramps 512 to an overhead assembly (not shown).
  • the adjustable supports may include an adjustment mechanism to provide adjustment of the level of the ramps 512 at the various stages of the etch bath 404.
  • the ramps 512 are spaced apart at their first end adjacent to the tape and wafer loading section 402, and converge toward one another at their second end adjacent to the tape unload section 408.
  • the ramps 512 also extend further down into the etch bath 404 from their first end to their second end and thereby increasingly engage the top of the support tape 202 as it travels through the etch bath 404.
  • the wafers 102 are supported from below by a substrate support (not shown) that supports the wafers 102 near the tape unload section 408 of apparatus 1000 using a spring or buoyancy applied force.
  • Figures 11A-11C are schematic diagrams illustrating the relationship between the ramps 512, the support tape 202 and wafers 102, as the support tape 202 and wafers 102 proceed through the etch bath 404.
  • the support tape 202 and wafer 102 are in an initial position of the etch bath 404.
  • the ramps 512 are substantially at the initial level of the support tape 202 and the wafers 102, and the assembly is therefore relatively planar, with little or no pressure being applied to the support tape 202 and wafers 102.
  • the pins 1102 maintain the position of the ends of the support tape 202 as the support tape 202 progresses through the etch bath 404.
  • the pins 1102 and the drive blocks 1002 are maintained in a spaced apart relationship by the tensioning roller 1104 engaging the rails 1004.
  • a channel 1108 surrounds the bottom portion of the pins 1102, in one embodiment, to ensure that the pins 1102 do not disengage from the track openings 206.
  • the ramps 512 are extended further into the etch bath 404, and the center of the tape and the wafer 102 are pushed downward relative to the ends of the support tape 202.
  • a crevice 600 is therefore formed between tape 202, and the wafer 102.
  • wafer 102 is removed from the support tape 202, and exits through the wafer unload section 406.
  • FIG. 12-14 illustrate another embodiment of an apparatus 1200 for performing an ELO process to remove ELO films or stacks from support wafers. It should be noted that portions of some elements have been omitted from Figures 12- 14 for clarity.
  • Apparatus 1200 includes an etch bath 404 and an upper chain drive 1202 with a plurality of longitudinal point loads 1206 mounted in each "cage" formed by the upper chain drive 1202 and a series of transverse support members 1208.
  • the longitudinal point loads 1206 are rotatably connected at each end 1302 to the transverse support members 1208, to allow the longitudinal point loads 1206 to rotate downward and apply pressure to the wafers.
  • the longitudinal point loads 1206 rotate about an axis that extends in the longitudinal direction of the apparatus 1200.
  • the longitudinal point loads 1206 can apply the pressure constantly by their weight, or in another embodiment, the pressure can be positionally controlled using cams (not shown) that engage the longitudinal point loads 1206.
  • Each "cage” is sized to surround a single wafer such that each longitudinal point load 1206 applies pressure to the wafer located below.
  • Apparatus 1200 further includes a lower chain drive 1204 with a plurality of substrate supports and/or pushers 1402.
  • the lower chain drive 1204 also includes a series of transverse support members 1404 that form "cages" in the lower chain drive 1204.
  • Each "cage” includes a pusher 1402 that supports a wafer 102 from beneath the wafer 102.
  • the pushers 1402 may apply the pressure by a spring force, or by buoyancy within the etch bath 404.
  • the upper chain drive 1202 further includes a plurality of pins 1304 that extend through the track openings 206 in the support tape 202 and into recesses (not shown) in the lower chain drive 1204 to thereby lock the support tape 202 between the chain drives.
  • the upper chain drive 1202 includes a plurality of pins 1306 that snap into receptacles 1308 in the lower chain drive 1204 to lock the chain drives together and hold the support tape 202 securely therebetween.
  • FIGs 15-17 illustrate another embodiment of an apparatus 1500 for performing an ELO process to remove ELO films or stacks from support wafers.
  • Apparatus 1500 is similar in operation to apparatus 1200, and similar elements have been labeled with the same reference designator.
  • a significant difference in apparatus 1500 is the use of transverse point loads 1502.
  • the ends 1604 of the transverse point loads 1502 are rotatably mounted to the upper chain drive 1202 such that the transverse point loads 1502 rotate about an axis transverse to the longitudinal direction of apparatus 1500.
  • the transverse support members 1602 of the upper chain drive 1202 include a plurality of pins 1606 that engage the support tape 202 and extend into recesses 1608 in the transverse support members 1610 of the lower chain drive 1204.
  • the pins 1606 maintain the longitudinal position of each section of the support tape 202 within each "cage" formed by the upper chain drive 1202 and the lower chain drive 1204 and the transverse support members 1602 and 1610.
  • Figure 17 depicts each section of the support tape 202 progressively bowed downward by the force of the transverse point loads 1502 acting on the center of each section of the support tape 202.
  • the support tape 202 has started to bow, forming a crevice 1710 at each end of the section.
  • the crevice 1710 has increased to remove a greater portion of the support tape 202 in section 1704 from the wafer 102.
  • the crevice has increased further, and in section 1708, the wafer 102 has released from the support tape 202.
  • the transverse point loads 1502 are not shown in these sections for clarity.
  • Figure 17 also illustrates further details of the pushers 1402 that in some embodiments are common to both apparatus 1500 as well as apparatus 1200.
  • the pushers 1402 are rotatable mounted to the transverse support members 1610 using a shaft (not shown) that extends through hole 1712 in the transverse support PATENT Attorney Docket No.: ALTA/0018PCT
  • a central raised portion 1714 of the pusher 1402 supports the center portion of the wafer 102 located there above.
  • the force applied by the pushers 1402 may be provided by a spring (not shown) or by buoyancy of the pushers 1402 in the etch bath 404, such that the pushers 1402 move with the wafers 102 as they are progressively released from the support tape 202.
  • FIGs 18-20 illustrate a batch-type embodiment of an apparatus 1800 for performing an ELO process to remove ELO films or stacks from support wafers.
  • the apparatus 1800 includes a tape and wafer loading section 1802, an etch bath 1804, a wafer unload section 1806 and a tape unload section 1808.
  • the wafers 102 are removed from the support tape 202 in batches. For example, in the embodiment illustrated in Figure 18, three wafers are removed from the tape in each batch. Other embodiments may remove more than three or less than three wafers per batch depending on the particular configuration.
  • Apparatus 1800 includes three point loads 1810 that provide downward force to form a crevice between the support tape 202 and the wafers 102, and to further remove the wafers 102 from the support tape 202.
  • the point loads 1810 are supported by a finger carrier 1812, that is lowered and raised to engage or disengage the point loads 1810 from the support tape 202, respectfully.
  • the finger carrier 1812 also supports a plurality of fingers 1902 that engage the track openings 206 in the support tape 202 to maintain the sides of the support tape 202 in a spaced apart relationship.
  • Two rails 1814 (one shown in the cutaway view of Figure 18) include recesses 1816 for the fingers 1902 to engage to positively lock the sides of the support tape 202 into place.
  • the wafer support and handling assembly 1904 includes two substrate drive belts 1906 and a bottom pusher 2002.
  • the substrate drive belts 1906 support the wafers 102 as the tape and wafer assembly is fed into the etch bath 404 and transports the wafers 102 to the wafer unload section 1806 once they are removed from the support tape 202.
  • the bottom pusher 2002 includes two rails 2004 that support the wafers 102 during the ELO process after loading the tape and wafer assembly and prior to release of the wafers 102 from the support tape 202.
  • Figures 21 through 38 illustrate the relationship between the moving parts of apparatus 1800 during various stages of an ELO batch process, as described by some embodiments herein.
  • Figure 40 is a flow chart illustrating one embodiment of a method 4000 for a batch ELO process that may be performed by apparatus 1800.
  • the apparatus 1800 is shown in a loading position where the tape and wafer assembly is loaded into the etch bath 1804 in block 4002 of method 4000.
  • the pins 806 in roller 802 engage the track openings 206 in tape 202 and load the tape and wafer assembly into the etch bath 1804 as the roller 802 rotates.
  • the substrate drive belts 1906 are in a raised position so that they can support the wafers 102 from below, so that they do not prematurely release from the support tape 202, which could cause damage to the ELO stack.
  • the substrate drive belts 1906 are mounted on pulleys 2102 of belt carrier 2104.
  • the pulleys may be driven by a drive motor and associated mechanisms (not shown) that are synchronized with the drive system of roller 802.
  • a lever 2106 engages the top of slot 2108 in sidewall 2110 of etch bath 1804.
  • the lever 2106 operates a mechanism (not shown) within belt carrier 2104 to lower the rails 2004 of bottom pusher 2002, ( Figure 20) so that they do not engage the wafers as they are loaded into the etch bath 1804.
  • the finger carrier 1812 is in a raised position such that the point loads 1810 and fingers 1902 are disengaged from the support tape 202.
  • the point load and finger carrier 1812 is lowered in block 4004 during method 4000, after the tape and wafer assembly is loaded into PATENT Attorney Docket No.: ALT A/0018PCT
  • Figures 23 and 24 show the finger carrier 1812 lowered to a first intermediate position wherein the point loads 1810 initially contact the support tape 202. Fingers 1902 remain above the support tape 202. In Figures 25 and 26, the finger carrier 1812 has further lowered to a further intermediate position wherein the point loads 1810 have not lowered further as they are supported by the tape and wafer assembly. The fingers 1902 still remain above the support tape 202.
  • Figures 27 and 28 show the finger carrier 1812 fully lowered such that the fingers 1902' that are aligned with the track openings 206 in tape 202 engage with the recesses 1816 to lock the sides of the support tape 202 into the spaced apart relationship. In the positions shown in Figures 23 through 28, the wafer support and handling assembly 1904 remains in its raised position to support the tape and wafer assembly such that the wafers 102 do not prematurely release from the support tape 202 as previously described.
  • the method 4000 proceeds to block 4006 wherein the wafer support and handling assembly 1904 is lowered as shown in Figures 29 and 30.
  • the lever 2106 does not engages the top of the slot 2108 in the sidewall 2110 of the etch bath 1804.
  • the rails 2004 of bottom pusher 2002 are raised above the top of the wafer support and handling assembly 1904, but are still located below the wafers 102 such that the wafers 102 are free to move downward, once they are released from the support tape 202.
  • the ELO process may initiate, in some embodiments, by the weight of the point loads 1810 acting on the tape and substrate assembly to bow the support tape 202 and drive the wafers 102 downward such that crevices 3202 are formed at the edges of the wafers 102.
  • a cam or other element may apply a force to the top surface 3204 of the point loads 1810 to move the point loads 1810 downward.
  • Figures 33 and 34 illustrate that the ELO process continues, with the point loads 1810 further lowered such that the wafers 102 are pushed further down, and PATENT Attorney Docket No.: ALTA/0018PCT
  • the crevices 3202 have increased in size as more of the wafers 102 are removed from the support tape 202.
  • the point loads 1810 are shown in their fully lowered position, such that the wafers 102 are supported by the rails 2004 of bottom pusher 2002.
  • the crevices 3202 between the support tape 202 and the wafers 102 have further increased in size such that more of each wafer 102 has been removed from the support tape 202.
  • the method 4000 proceeds to block 4010 where the point loads 1810 are rotated.
  • Figures 37 and 38 show the point loads 1810 in a rotated position.
  • the point loads 1810 may be rotated by a cam assembly or other mechanism (not shown).
  • the ELO process is complete and the wafers 102 are removed from the support tape 202, as indicated in block 4012 of method 4000.
  • the method 4000 then proceeds to block 4014 and the point load and finger carrier 1812 is raised as shown by its position illustrated in Figure 22. After raising the point load and finger carrier 1812, the method 4000 proceeds to block 4016, wherein the wafer support and handling assembly 1904 is partially raised as is also shown in Figure 22.
  • the center portion 2202 of the tape and ELO stack is released from the wafers 102, and the tape and ELO stack form a straight line above and not contacting the wafers 102.
  • the substrate drive belts 1906 are in contact with the wafers 102 and the rails 2004 of bottom pusher 2002 are retracted as described above.
  • the method 4000 then proceeds to block 4018 and the wafers 102 are transported out of the etch bath 1804 and to the wafer unload section 1806 ( Figure 18) by pulleys 2102 driving the substrate drive belts 1906.
  • a series of belts 1818 and pulleys 1820 transport the removed wafers (such as shown by 1822) out of the apparatus 1800 and to subsequent processes such as those shown in apparatus 300 of Figure 3.
  • the method 4000 proceeds to block 4020, the wafer support and handling assembly 1904 is raised to its uppermost position as shown in Figure 24. The method 4000 is then restarted at block 4002 and the next batch (length) of tape and wafer assembly is loaded into the etch bath 1804.
  • a plurality of substrates 100 may be disposed on a single support substrate.
  • a plurality of ELO thin film stacks 150 may be disposed on a support substrate that contains multiple gallium arsenide wafers or surfaces. Each of the ELO thin film stacks 150 is disposed on or over each gallium arsenide wafer or surface on the support substrate. Therefore, the support substrate may contain at least 2 substrates 100 or ELO thin film stacks 150, but usually contains 3, 4, 5, 6, 9, 12, 16, 20, 24, 50, 100, or more substrates 100 or ELO thin film stacks 150.
  • Each ELO thin film stack 150 contains an epitaxial film 106 disposed on or over a sacrificial layer 104.
  • the support tape 202 may be disposed on or over each of the substrates 100, such as by the epitaxial film 106.
  • each of the ELO thin film stacks 150 may be grown on an individual wafer 100 and then coupled with the support substrate.
  • each of the ELO thin film stacks 150 may be grown on an individual gallium arsenide wafer or surface already coupled with the support substrate.
  • the support substrate may contain at least 2 epitaxial substrates or surfaces, such as gallium arsenide wafers or gallium arsenide surfaces, but usually contains 3, 4, 5, 6, 9, 12, 16, 20, 24, 50, 100, or more epitaxial substrates or surfaces.
  • the support substrate may contain or be made from columbium, columbium alloys, titanium carbide, magnesium silicate, steatite, tungsten carbide, tungsten carbide cermet, iridium, alumina, alumina ceramics, zirconium, zirconium alloys, zirconia, zirconium carbide, osmium, tantalum, hafnium, molybdenum, molybdenum alloys, oxides thereof, silicates thereof, alloys thereof, derivatives thereof, or combinations thereof.
  • the support substrate has no porosity or substantially no porosity.
  • the support substrate may be resistant to hydrogen fluoride and hydrofluoric acid.
  • An adhesive may be used to form an adhesive layer between the support substrate and either the wafer 100, or the gallium arsenide wafers or surfaces.
  • each wafer 100, containing an individual ELO thin film stack 150 disposed thereon may be coupled with the support substrate by an adhesive to form an adhesive layer therebetween.
  • each individual gallium arsenide wafer or gallium arsenide surface may be coupled with the support substrate by an adhesive to form an adhesive layer therebetween.
  • the adhesive may be the same adhesive as used to form the adhesive layer 204, as described above. Alternatively, the adhesive may be different than the adhesive used to form the adhesive layer 204.
  • the adhesion layer contains an optical adhesive or an ultraviolet-curable adhesive.
  • the adhesion layer may contain a mercapto ester compound and may further contain butyl octyl phthalate, tetrahydrofurfuryl methacrylate, acrylate monomer, derivatives thereof, or combinations thereof.
  • the adhesion layer contains silicone or sodium silicate.
  • a substrate 100 contains a sacrificial layer 104 disposed on a wafer 102, an epitaxial film 106 disposed over the sacrificial layer 104, and a support handle is the support tape 202 disposed over the epitaxial film 106.
  • the support tape 202 contains multiple layers including a stiff support layer disposed over the epitaxial film 106, a soft support layer disposed over the stiff support layer, and a handle plate layer disposed over the soft support layer.
  • the support tape 202 is the handle plate layer and is disposed over the soft support layer, which is disposed over the stiff support layer, which is disposed over the epitaxial film 106. The support tape 202 is disposed on and maintains compression of the epitaxial film 106.
  • the stiff support layer may contain a polymer, a copolymer, an oligomer, derivatives thereof, or combinations thereof. In one embodiment, the stiff support layer contains a copolymer. In one example, the PATENT Attorney Docket No.: ALTA/0018PCT
  • copolymer may be an ethylene/vinylacetate (EVA) copolymer or derivatives thereof.
  • EVA copolymer which is useful as the stiff support layer is WAFER GRIP adhesion film, commercially available from Dynatex International, located in Santa Rosa, California.
  • the stiff support layer may contain a hot-melt adhesive, an organic coating, an inorganic material, or combinations thereof.
  • the inorganic material contains a single inorganic layer or multiple inorganic layers, such as metal layers or metallic foils.
  • the stiff support layer may contain wax or derivatives thereof, such as black wax.
  • the soft support layer may contain an elastomer, such as rubber, foam, or derivatives thereof.
  • the soft support layer may contain a material such as neoprene, latex, or derivatives thereof.
  • the soft support layer may contain a monomer.
  • the soft support layer may contain an ethylene propylene diene monomer or derivatives thereof.
  • the soft support layer may contain a liquid or a fluid contained within a membrane.
  • the soft support layer may contain a gas contained within a membrane.
  • the membrane may contain a material such as rubber, foam, neoprene, latex, or derivatives thereof.
  • the membrane contains natural rubber, synthetic rubber, or latex.
  • the handle plate may contain a material such as plastic, polymer, oligomer, derivatives thereof, or combinations thereof.
  • the handle plate may contain polyester or derivatives thereof.
  • the handle plate may have a thickness within a range from about 50.8 ⁇ m to about 127.0 ⁇ m, such as about 23.4 ⁇ m.
  • the method further includes removing the epitaxial film 106 from the wafer 102 and attaching a support substrate, such as the support tape 202, to an exposed surface of the epitaxial film 106 by an adhesive layer 204.
  • the support tape 202 may be bonded to the exposed surface of the epitaxial film
  • the adhesive layer 204 contains an optical PATENT
  • the adhesive may be UV-curable, such as commercially available as Norland UV- curable optical adhesive.
  • the adhesive may contain a mercapto ester compound.
  • the adhesive may further contain a material such as butyl octyl phthalate, tetrahydrofurfuryl methacrylate, acrylate monomer, derivatives thereof, or combinations thereof.
  • a substrate 100 contains a support substrate, such as support tape 202 disposed over a first surface of the epitaxial film 106, and the support tape 202 disposed over the other surface of the epitaxial film 106.
  • An adhesive layer 204 may be disposed between the epitaxial film 106 and the support tape 202.
  • the support tape 202 contains the stiff support layer disposed over the epitaxial film 106, the soft support layer disposed over the stiff support layer, and the handle plate disposed over the soft support layer.
  • the adhesive may be cured by exposing the adhesive to UV radiation.
  • the adhesive may be exposed to the UV radiation for a time period within a range from about 1 minute to about 10 minutes, preferably, from about 3 minutes to about 7 minutes, such as about 5 minutes.
  • the adhesive may be cured at a temperature within a range from about 25°C to about 75°C, such as about 50 0 C.
  • the adhesive may be a silicone adhesive or may contain sodium silicate.
  • the adhesive may be cured for a time period within a range from about 10 hours to about 100 hours, preferably, from about 20 hours to about 60 hours, and more preferably, from about 30 hours to about 50 hours, for example, about 42 hours.
  • the adhesive may be cured at a temperature within a range from about 25°C to about 75°C, such as about 50 0 C.
  • the adhesive may be cured at a pressure within a range from about 1 psi (pounds per square inch) to about 50 psi, preferably, from about 3 psi to about 25 psi, and more preferably, from about 5 psi to about 15 psi. In one example, the pressure may be about 9 psi.
  • the sacrificial layer 104 may be exposed to an etching process to remove the epitaxial film 106 from the wafer 102. In some embodiments, the sacrificial layer 104 may be exposed to a wet etch solution during the etching process.
  • the sacrificial layer 104 may be exposed to a wet etch solution during the etching process.
  • the wet etch solution contains hydrofluoric acid and may contain a surfactant and/or a buffer.
  • the sacrificial layer 104 may be etched at a rate of about 0.3 mm/hr or greater, preferably, about 1 mm/hr or greater, and more preferably, about 5 mm/hr or greater.
  • the sacrificial layer 104 may be exposed to an electrochemical etch during the etching process.
  • the electrochemical etch may be a biased process or a galvanic process.
  • the sacrificial layer 104 may be exposed to a vapor phase etch during the etching process in another embodiment described herein.
  • the vapor phase etch includes exposing the sacrificial layer 104 to hydrogen fluoride vapor.
  • the etching process may be a photochemical etch, a thermally enhanced etch, a plasma enhanced etch, a stress enhanced etch, derivatives thereof, or combinations thereof.
  • the epitaxial materials contained within epitaxial film 106 may include gallium arsenide, aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • the epitaxial film 106 may have a rectangular geometry, a square geometry, or other geometries.
  • the epitaxial film 106 may contain one layer, but usually contains multiple layers.
  • the epitaxial film 106 contains a layer having gallium arsenide and another layer having aluminum gallium arsenide.
  • the epitaxial film 106 contains a gallium arsenide buffer layer, an aluminum gallium arsenide passivation layer, and a gallium arsenide active layer.
  • the gallium arsenide buffer layer may have a thickness within a range from about 100 nm to about 500 nm, such as about 300 nm
  • the aluminum gallium arsenide passivation layer has a thickness within a range from about 10 nm to about 50 nm, such as about 30 nm
  • the gallium arsenide active layer has a thickness within a range from about 500 nm to PATENT Attorney Docket No.: ALTA/0018PCT
  • the epitaxial film 106 further contains a second aluminum gallium arsenide passivation layer.
  • the epitaxial film 106 may contain a photovoltaic cell structure containing multiple layers.
  • the cell structure may contain gallium arsenide, n-doped gallium arsenide, p-doped gallium arsenide, aluminum gallium arsenide, n-doped aluminum gallium arsenide, p-doped aluminum gallium arsenide, indium gallium phosphide, alloys thereof, derivatives thereof, or combinations thereof.
  • the gallium arsenide is n-doped or p- doped.
  • the sacrificial layer 104 may contain aluminum arsenide, alloys thereof, derivatives thereof, or combinations thereof.
  • the sacrificial layer 104 contains an aluminum arsenide layer and has a thickness of about 20 nm or less, preferably, within a range from about 1 nm to about 10 nm, and more preferably, from about 4 nm to about 6 nm.

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Abstract

La présente invention se rapporte en règle générale, dans des modes de réalisation, à des appareils et à des procédés permettant de produire de minces films et dispositifs épitaxiaux par des procédés de retrait épitaxial (ELO). Dans un mode de réalisation, un procédé permettant de former des dispositifs à film mince pendant un procédé ELO est proposé, lequel procédé consiste à coupler une pluralité de substrats à une bande support allongée, chaque substrat contenant un film épitaxial disposé sur une couche sacrificielle disposée sur une tranche, exposer les substrats à un agent de gravure pendant un procédé de gravure tout en déplaçant la bande support allongée, et graver les couches sacrificielles et détacher les films épitaxiaux des tranches tout en déplaçant la bande support allongée. Des modes de réalisation comprennent également plusieurs appareils de type continu ainsi que des appareils de type discontinu, pour former les minces films et dispositifs épitaxiaux, comprenant un appareil permettant d'enlever la bande support et les films épitaxiaux des tranches sur lesquelles les films épitaxiaux étaient développés.
PCT/US2009/068445 2008-12-17 2009-12-17 Appareils et procédés de retrait épitaxial de type bande WO2010078022A2 (fr)

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EP09836939.0A EP2359393B1 (fr) 2008-12-17 2009-12-17 Appareils et procédés de retrait épitaxial de type bande

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CN102301456A (zh) 2011-12-28
US10204831B2 (en) 2019-02-12
US20160049334A1 (en) 2016-02-18
TW201030802A (en) 2010-08-16
EP2359393B1 (fr) 2019-05-29
US20100151689A1 (en) 2010-06-17
WO2010078022A3 (fr) 2010-08-26
US9165805B2 (en) 2015-10-20
EP2359393A2 (fr) 2011-08-24
KR20110114577A (ko) 2011-10-19
EP2359393A4 (fr) 2014-01-08

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