WO2010041879A3 - 굴절율이 낮은 티오펜계 전도성 고분자 - Google Patents

굴절율이 낮은 티오펜계 전도성 고분자 Download PDF

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Publication number
WO2010041879A3
WO2010041879A3 PCT/KR2009/005754 KR2009005754W WO2010041879A3 WO 2010041879 A3 WO2010041879 A3 WO 2010041879A3 KR 2009005754 W KR2009005754 W KR 2009005754W WO 2010041879 A3 WO2010041879 A3 WO 2010041879A3
Authority
WO
WIPO (PCT)
Prior art keywords
conductive polymer
refractive index
low refractive
thiopene
polymer
Prior art date
Application number
PCT/KR2009/005754
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English (en)
French (fr)
Other versions
WO2010041879A2 (ko
Inventor
서광석
김종은
김태영
이태희
Original Assignee
Suh Kwang Suck
Kim Jong Eun
Kim Tae Young
Lee Tae Hee
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suh Kwang Suck, Kim Jong Eun, Kim Tae Young, Lee Tae Hee filed Critical Suh Kwang Suck
Publication of WO2010041879A2 publication Critical patent/WO2010041879A2/ko
Publication of WO2010041879A3 publication Critical patent/WO2010041879A3/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
    • C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L85/00—Compositions of macromolecular compounds obtained by reactions forming a linkage in the main chain of the macromolecule containing atoms other than silicon, sulfur, nitrogen, oxygen and carbon; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L39/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Compositions of derivatives of such polymers
    • C08L39/04—Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member

Abstract

본 발명은 굴절율이 1.55 이하인 티오펜계 전도성 고분자의 합성에 관한 것으로서, 더욱 자세하게는 티오펜계 전도성 고분자 합성 시 도판트 겸 분산제로 사용될 수 있는 고분자 중에서 굴절율이 낮은 화합물인 플로린을 함유하는 고분자를 전도성 고분자 합성용 도판트로 사용함으로서 합성된 전도성 고분자의 굴절율을 1.55 이하로 조절하는 기술 및 이를 통해 합성된 낮은 굴절율을 갖는 폴리티오펜계 전도성 고분자를 제공한다. 본 발명의 기술을 이용하면 저굴절 전도성 고분자 또는 이를 포함하는 전도성 고분자를 만들기 위해 별도의 저굴절 물질을 혼합하지 않고도 자체적으로 1.55 이하의 굴절율을 갖는 전도성 고분자를 합성할 수 있다. 이 전도성 고분자가 포함되어 있는 용액에 불소계 첨가제를 혼합하면 전도성 고분자 조성물의 굴절율을 더욱 낮출 수 있어 저굴절 물질 또는 조성물의 제조에 훨씬 유리하다. 또한 본 발명의 전도성 고분자는 전도성 고분자 성분에 플로린을 포함하고 있어 그 자체적으로 접촉각이 높아 오염방지 기능을 가지면서 높은 전기 전도도를 갖는 등 여러 가지 장점이 있다.
PCT/KR2009/005754 2008-10-09 2009-10-08 굴절율이 낮은 티오펜계 전도성 고분자 WO2010041879A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0099108 2008-10-09
KR1020080099108A KR101022206B1 (ko) 2008-10-09 2008-10-09 굴절율이 낮은 티오펜계 전도성 고분자

Publications (2)

Publication Number Publication Date
WO2010041879A2 WO2010041879A2 (ko) 2010-04-15
WO2010041879A3 true WO2010041879A3 (ko) 2010-07-29

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PCT/KR2009/005754 WO2010041879A2 (ko) 2008-10-09 2009-10-08 굴절율이 낮은 티오펜계 전도성 고분자

Country Status (3)

Country Link
KR (1) KR101022206B1 (ko)
TW (1) TW201022305A (ko)
WO (1) WO2010041879A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102562627B1 (ko) 2016-03-21 2023-08-03 삼성디스플레이 주식회사 디스플레이 장치
KR102373566B1 (ko) 2016-09-23 2022-03-14 삼성디스플레이 주식회사 표시 장치
CN106674396B (zh) * 2016-11-30 2018-09-21 辽宁大学 一种功能型铼聚合离子液体及其制备方法
CN113345620B (zh) * 2021-05-21 2022-11-04 四川大学 一种均相导电高分子溶液及其制备方法
CN114887112B (zh) * 2022-05-07 2023-09-22 大连工业大学 一种咪唑盐离子液体/聚乙烯醇压力传感抗菌水凝胶敷料的制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63225633A (ja) * 1987-03-16 1988-09-20 Tosoh Corp 導電性高分子複合膜及びその製造法
JP2000119336A (ja) * 1998-10-16 2000-04-25 Tosoh Corp 単一イオン伝導性高分子固体電解質
US20060076557A1 (en) * 2004-10-13 2006-04-13 Waller Francis J Aqueous dispersions of polythienothiophenes with fluorinated ion exchange polymers as dopants
JP2006257288A (ja) * 2005-03-17 2006-09-28 Kaneka Corp 金属表面コーティング用組成物、導電性高分子の製造方法、金属表面のコーティング方法、ならびに電解コンデンサおよびその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63225633A (ja) * 1987-03-16 1988-09-20 Tosoh Corp 導電性高分子複合膜及びその製造法
JP2000119336A (ja) * 1998-10-16 2000-04-25 Tosoh Corp 単一イオン伝導性高分子固体電解質
US20060076557A1 (en) * 2004-10-13 2006-04-13 Waller Francis J Aqueous dispersions of polythienothiophenes with fluorinated ion exchange polymers as dopants
JP2006257288A (ja) * 2005-03-17 2006-09-28 Kaneka Corp 金属表面コーティング用組成物、導電性高分子の製造方法、金属表面のコーティング方法、ならびに電解コンデンサおよびその製造方法

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Publication number Publication date
KR101022206B1 (ko) 2011-03-16
WO2010041879A2 (ko) 2010-04-15
TW201022305A (en) 2010-06-16
KR20100040060A (ko) 2010-04-19

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