WO2010040917A1 - Procédé de nettoyage de surfaces mettant en oeuvre un liquide ionique de type protique - Google Patents
Procédé de nettoyage de surfaces mettant en oeuvre un liquide ionique de type protique Download PDFInfo
- Publication number
- WO2010040917A1 WO2010040917A1 PCT/FR2009/001194 FR2009001194W WO2010040917A1 WO 2010040917 A1 WO2010040917 A1 WO 2010040917A1 FR 2009001194 W FR2009001194 W FR 2009001194W WO 2010040917 A1 WO2010040917 A1 WO 2010040917A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solution
- acid
- mixture
- ionic liquid
- base
- Prior art date
Links
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000004140 cleaning Methods 0.000 title claims abstract description 28
- 239000002253 acid Substances 0.000 claims abstract description 35
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims abstract description 9
- 239000000919 ceramic Substances 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims abstract description 8
- -1 imidazole diamine Chemical class 0.000 claims abstract description 8
- 239000004033 plastic Substances 0.000 claims abstract description 8
- 229920003023 plastic Polymers 0.000 claims abstract description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 69
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 44
- 239000000203 mixture Substances 0.000 claims description 33
- 238000011282 treatment Methods 0.000 claims description 29
- 235000019260 propionic acid Nutrition 0.000 claims description 22
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 22
- IWDFHWZHHOSSGR-UHFFFAOYSA-N 1-ethylimidazole Chemical compound CCN1C=CN=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-N 0.000 claims description 15
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 15
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 14
- OLQRGYQXBHVXDZ-UHFFFAOYSA-N 1-ethylimidazole;propanoic acid Chemical compound CCC([O-])=O.CC[NH+]1C=CN=C1 OLQRGYQXBHVXDZ-UHFFFAOYSA-N 0.000 claims description 8
- 150000007513 acids Chemical class 0.000 claims description 8
- FSQZUOBIINOWOI-UHFFFAOYSA-N 3-ethyl-1h-imidazol-3-ium;acetate Chemical compound CC([O-])=O.CCN1C=C[NH+]=C1 FSQZUOBIINOWOI-UHFFFAOYSA-N 0.000 claims description 7
- 239000004310 lactic acid Substances 0.000 claims description 7
- 235000014655 lactic acid Nutrition 0.000 claims description 7
- MCMFEZDRQOJKMN-UHFFFAOYSA-N 1-butylimidazole Chemical compound CCCCN1C=CN=C1 MCMFEZDRQOJKMN-UHFFFAOYSA-N 0.000 claims description 6
- 125000002883 imidazolyl group Chemical group 0.000 claims description 6
- 239000001384 succinic acid Substances 0.000 claims description 6
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- KRUMNJCVIFXLIH-UHFFFAOYSA-N C(CCC(=O)[O-])(=O)[O-].C(C)[N+]1=CNC=C1.C(C)[N+]1=CNC=C1 Chemical compound C(CCC(=O)[O-])(=O)[O-].C(C)[N+]1=CNC=C1.C(C)[N+]1=CNC=C1 KRUMNJCVIFXLIH-UHFFFAOYSA-N 0.000 claims description 4
- CTQGPLQAKFGVSF-UHFFFAOYSA-N CC([O-])=O.CCCCN1C=C[NH+]=C1 Chemical compound CC([O-])=O.CCCCN1C=C[NH+]=C1 CTQGPLQAKFGVSF-UHFFFAOYSA-N 0.000 claims description 4
- 238000010669 acid-base reaction Methods 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- PFZPMLROUDTELO-UHFFFAOYSA-N 1-methyl-1h-imidazol-1-ium;acetate Chemical compound CC(O)=O.CN1C=CN=C1 PFZPMLROUDTELO-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- ZXSFYJIFABEQTK-UHFFFAOYSA-N 1-methylimidazole;propanoic acid Chemical compound CCC(O)=O.CN1C=CN=C1 ZXSFYJIFABEQTK-UHFFFAOYSA-N 0.000 claims description 2
- BJZILMKZLWTRQY-UHFFFAOYSA-N C(CC)(=O)[O-].C(CCC)[N+]1=CNC=C1 Chemical compound C(CC)(=O)[O-].C(CCC)[N+]1=CNC=C1 BJZILMKZLWTRQY-UHFFFAOYSA-N 0.000 claims description 2
- 239000006184 cosolvent Substances 0.000 claims description 2
- 235000015047 pilsener Nutrition 0.000 abstract description 6
- 150000002739 metals Chemical class 0.000 abstract description 5
- 239000003921 oil Substances 0.000 abstract description 4
- 239000011253 protective coating Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 2
- 239000002689 soil Substances 0.000 abstract description 2
- 239000012530 fluid Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 67
- 235000012431 wafers Nutrition 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000005238 degreasing Methods 0.000 description 9
- 238000007654 immersion Methods 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 229910001220 stainless steel Inorganic materials 0.000 description 9
- 238000002604 ultrasonography Methods 0.000 description 9
- 239000000976 ink Substances 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KXCVJPJCRAEILX-UHFFFAOYSA-M 1-butyl-3-methylimidazol-3-ium;hydrogen sulfate Chemical compound OS([O-])(=O)=O.CCCCN1C=C[N+](C)=C1 KXCVJPJCRAEILX-UHFFFAOYSA-M 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ASOVOYVPVWSSMT-UHFFFAOYSA-N 1-ethylimidazole;2-hydroxypropanoic acid Chemical compound CC(O)C(O)=O.CCN1C=CN=C1 ASOVOYVPVWSSMT-UHFFFAOYSA-N 0.000 description 2
- IWDFHWZHHOSSGR-UHFFFAOYSA-O 3-ethyl-1h-imidazol-3-ium Chemical compound CCN1C=C[NH+]=C1 IWDFHWZHHOSSGR-UHFFFAOYSA-O 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 101150032095 SOL3 gene Proteins 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000010426 asphalt Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 101150090449 sol4 gene Proteins 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- BSKSXTBYXTZWFI-UHFFFAOYSA-M 1-butyl-3-methylimidazol-3-ium;acetate Chemical compound CC([O-])=O.CCCC[N+]=1C=CN(C)C=1 BSKSXTBYXTZWFI-UHFFFAOYSA-M 0.000 description 1
- ZPTRYWVRCNOTAS-UHFFFAOYSA-M 1-ethyl-3-methylimidazol-3-ium;trifluoromethanesulfonate Chemical compound CC[N+]=1C=CN(C)C=1.[O-]S(=O)(=O)C(F)(F)F ZPTRYWVRCNOTAS-UHFFFAOYSA-M 0.000 description 1
- CYXIKYKBLDZZNW-UHFFFAOYSA-N 2-Chloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)CCl CYXIKYKBLDZZNW-UHFFFAOYSA-N 0.000 description 1
- BWVHVHWMCIBWJE-UHFFFAOYSA-N 3-ethyl-1h-imidazol-3-ium;2,2,2-trifluoroacetate Chemical compound CC[N+]=1C=CNC=1.[O-]C(=O)C(F)(F)F BWVHVHWMCIBWJE-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 101100096184 Alternaria solani sol5 gene Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 101100168642 Arabidopsis thaliana CRN gene Proteins 0.000 description 1
- 101100045632 Arabidopsis thaliana TCX2 gene Proteins 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- 101100203596 Caenorhabditis elegans sol-1 gene Proteins 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-O Pyrrolidinium ion Chemical compound C1CC[NH2+]C1 RWRDLPDLKQPQOW-UHFFFAOYSA-O 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 231100000357 carcinogen Toxicity 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001212 derivatisation Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000003471 mutagenic agent Substances 0.000 description 1
- 231100000707 mutagenic chemical Toxicity 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 101150103732 sol2 gene Proteins 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/088—Iron or steel solutions containing organic acids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/12—Light metals
- C23G1/125—Light metals aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
- C23G1/26—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions using inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/16—Metals
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Definitions
- the subject of the present invention is an optimized method comprising the use of a solution based on particular ionic liquid of the PIL type (liquid protic ionic according to the English terminology or protic ionic liquid), said solution being used for cleaning, stripping, electrolytic degreasing, derestriction of surfaces such as metals, ceramics, glasses, semiconductors and plastics, said surfaces having been oxidized and / or contaminated with oils or greases and / or having have been covered with a protective coating, or else soiled by particles or any other residue.
- PIL type liquid protic ionic according to the English terminology or protic ionic liquid
- the process according to the invention uses a solution containing a protic ionic liquid obtained by acid-base reaction with at least one acid containing at least one carboxylic function and a base which is an imidazole diamine.
- the surfaces to be treated must be previously free of any contamination of organic and / or inorganic impurities that can come from the parts development steps (forming, machining using a lubricant or cutting liquid or protection, storage, ... etc).
- organic solvents are flammable, highly volatile and toxic (including carcinogens and mutagens).
- VOC Volatile Organic Compound
- the patent application WO2006 / 088737 describes the use of ionic liquids containing either an imidazolium cation, a pyridinium cation, pyrrolidinium, ammonium or even phosphonium.
- the ionic liquids are used in the "pure" state, that is to say that in this case, the ionic liquid consists entirely of ions and must contain less than 1% of impurities. If the ionic liquid is derived from the reaction of an acid with a base such as imidazole or derivative, then the degree of proton transfer of the acid must be greater than 99%. In addition, their use is limited to the cleaning of semiconductor surfaces.
- the Applicant has discovered that a multicomponent solution based on a particular type of ionic liquid could be used in surface cleaning processes such as metals, ceramics, glasses, semiconductors and plastics, in particular. having good cleaning efficiency.
- the particular type of ionic liquids in the composition of the solution is easy to obtain and can be economically manufactured.
- it has the particularity of being easily regenerable - and therefore reusable - for example thermally
- Another advantage of the process of the invention is that it can be implemented by minimizing the risks of chemical attack by corrosion.
- PILs protic ionic liquids according to the English terminology or protic ionic liquid
- protic ionic liquids are easily produced by combining a Bronsted acid and a
- the main distinguishing feature of PILs from other ionic liquids is the proton transfer from the acid to the base, leading to the presence of proton donor or acceptor sites, resulting in specific properties for PILs. and different from other ionic liquids.
- Ionic liquids of the PIL type have a proton available for a hydrogen bond and are obtained according to the following mechanism: B + AH o HB + A " where AH is an acid and B a base
- the acid-base equilibrium implies that the acid reaction base is not total and therefore, the so-called "multi-constituent" solution used in the process of the invention comprises the acid, the base and the ionic liquid resulting therefrom.
- Cleaning process means any method of cleaning, stripping, degreasing (electrolytic or not), derisinage, applied to surfaces such as metals, ceramics, glasses, semiconductors and plastics, said surfaces having been oxidized and / or contaminated with oils or greases and / or having been covered with a temporary protective coating or not, or else soiled by any type of soiling, in the form of particles for example.
- temporary protective coating is generally meant any type of coating that has been used for the protection or treatment of the material in previous development steps.
- the invention relates to an optimized surface cleaning method of the metal, ceramic, glass or plastic composite material type such as semiconductors, in which said surface is treated with a solution comprising a mixture of an ionic liquid of the PIL type.
- the acid or acids may be either acetic acid or propionic acid used alone or in combination with a second acid having a function carboxylic acid such as maleic acid, lactic acid, succinic acid, oxalic acid.
- the acid is either acetic acid or propionic acid, used alone.
- acetic acid or propionic acid are used in combination with lactic acid or succinic acid.
- the subject of the invention is an optimized method of degreasing and / or surface etching of metal, ceramic, glass, plastic or semiconductor composite material, in which said surfaces are sprinkled and / or immersed with in a solution comprising a mixture of a PILs ionic liquid, an imidazole diamine and at least one acid containing at least one carboxylic function.
- the process according to the invention uses a solution containing a protic ionic liquid obtained by acid-base reaction with at least one acid containing a carboxylic function and a base which is a diamine, the said acid or acids containing at least one less a carboxylic function and the base being an imidazole diamine.
- the one or more acids may be either acetic acid or propionic acid used alone, or in combination with a second acid having at least one carboxylic function such as maleic acid, lactic acid, succinic acid, oxalic acid.
- the acid is either acetic acid or propionic acid, used alone.
- acetic acid or propionic acid are used in combination with lactic acid or succinic acid.
- the diamine imidazole type has the following formula:
- R1 H or alkyl group containing 1 to 4 carbon atoms, preferably 1 to 2 carbon atoms.
- the solution comprises a mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate.
- the solution comprises a mixture of 1-butylimidazole, acetic acid and 1-butylimidazolium acetate.
- the solution comprises a mixture of 1-methylimidazole, acetic acid and 1-methylimidazolium acetate.
- the solution comprises a mixture of 1-ethylimidazole, propionic acid and 1-ethyl imidazolium propionate.
- the solution comprises a mixture of 1-butylimidazole, propionic acid and 1-butylimidazolium propionate.
- the solution comprises a mixture of 1-methylimidazole, propionic acid and 1-methylimidazolium propionate.
- the solution comprises a mixture of 1-ethylimidazole, 1-ethylimidazolium propionate, propionic acid, succinic acid and 1-ethylimidazolium succinate.
- the solution used according to the invention is obtained by bringing the acid or acids into contact with the base in proportions such as the ratio x / y, where x is the number of imidazole functions or the number of nitrogen atoms. and therefore of basic equivalent, and y the number of carboxylic functions, between 0.5 and 2.0, and more preferably between 0.9 and 1.1.
- the contacting is generally carried out with stirring.
- the solution is used without dilution, but it is not excluded that it contains a co-solvent, such as water for example. With water, dilution rates of up to 30% can be used.
- the ionic liquid solution of PIL type implemented according to the process of the invention advantageously has a pH generally between 6.0 and 8.0, preferably between 6 and 7.5.
- Said solution is brought into contact with the surface to be treated preferably by spraying or by immersion of said surface in a treatment bath containing the solution described above.
- the modes of contact “spraying” and “immersion” can also be combined, and possibly supplemented by mechanical brushing.
- the temperature of the solution or of the treatment bath is generally between 15 and 80 ° C., preferably between 30 and 70 ° C.
- the treatment bath containing the solution based on ionic liquid is subjected to ultrasound.
- the ultrasonic generators used according to the method of the invention may be at single or variable ultrasound frequency and in particular be submersible to be installed in existing tanks.
- the ultrasound frequency is generally between 20 and 160 kHz, preferably between 30 and 80 kHz.
- the duration of the treatment is generally between 1 and 60 minutes, preferably less than 30 minutes.
- the treated part (s) is (are) rinsed (s) with water, for example by immersion in a tank of dimensions adapted to those of the room or even with the help of jets of water.
- the conditions of use of the degreasing / pickling bath common to the following examples are as follows.
- the ultrasound heated bath is a TRANSSONIC device type T570 / H of the brand ELMA ®. Its characteristics are as follows: internal dimensions of the tank: 240 x 137 x 100 mm, ultrasonic frequency: 35 kHz, - power: 360 W
- the following operations are successively carried out: soaking of the parts to be treated in a bath containing the PILs-type ionic liquid solution, - heating of the bath and implementation of the ultrasound for the time required for the part to be treated, rinsing with water. water then drying with a blower parts.
- Example 1 Draising of silicon wafers with a solution containing a mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate (according to the invention)
- the wafer is a very pure silicon wafer used for the manufacture of integrated circuits. Silicon wafer cleaning tests are carried out with a solution containing a mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate. The solution is prepared using an x / y ratio (number of imidazole functions / number of carboxylic functions) equal to 1.
- wafer T3 1, 8 ⁇ m
- wafer T5 13 ⁇ m
- the wafers are immersed in a bath containing the solution at a temperature of between 50 ° C. and 55 ° C., at a pH of 6.1 (at 1M in water), using ultrasound. After treatment, the wafers are rinsed with ultra pure water.
- Table 1 summarizes the tests carried out and the results obtained in terms of removal rate of the resin. This is quantified visually by optical microscope observation (magnification 50). It is found that the removal rate of the resin is 100% when the entire surface of the sample is completely gray and matte knowing that before treatment, the wafers have a brown surface with iridescence. Observation under the microscope clearly reveals a totally resin-free surface.
- Example 2 Draising of silicon wafers with various solutions of "pure” ionic liquids (not in accordance with the invention).
- Silicon wafers having a thickness of 1, 8 and 13 ⁇ m on which a resin of the SU-8 2005 type has been deposited have been treated according to the protocol of Example 1 with various solutions of "pure" ionic liquids whose composition is specified below and corresponds to the ionic liquids described in the patent application WO2006 / 088737.
- the tests below are summarized in Table 2 below:
- Example 3 Derivatization of silicon wafers with a solution containing a mixture of propionic acid, 1-ethylimidazolium propionate, succinic acid and 1-ethylimidazolium succinate (according to the invention)
- Silicon wafer derisinage tests were carried out according to the same protocol as Example 1 but using a mixture of propionic acid, 1-ethylimidazolium propionate, succinic acid and 1-ethylimidazolium succinate.
- the solution was prepared using a ratio x / y (number of imidazole functions / number of carboxylic functions) equal to 1 and the pH of the solution is 6.4.
- the solution has, among others, good characteristics of non-flammability since its flash point (according to NF EN ISO 2719) is 120 0 C and its point of fire (NF
- EN ISO 2592 is also 120 ° C.
- the removal efficiency of the resin is complete even for low immersion times.
- Example 4 Cleaning of aluminum vials coated with bituminous ink with five solutions (according to five embodiments of the invention):
- the flasks are immersed in a bath containing a solution of ionic liquid PILs type 1, the solution being diluted or not with 30% vol. of water, the bath being heated to different temperatures (30 and 60 ° C) over different durations (5 and 20 minutes). Ultrasound is carried out in the bath.
- vials were treated according to the process described above by setting the treatment time to 5 minutes and using 4 different solutions (SOL 2 to SOL 5), the respective compositions of which are as follows:
- SOL 2 mixture of 1-butylimidazole, acetic acid and 1-butylimidazolium acetate (solution prepared according to a ratio x / y equal to 0.95)
- SOL 3 mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate
- SOL 5 mixture of 1-ethylimidazole, propionic acid and propionate of
- Table 5 shows that for this application and the fixed treatment operating conditions, SOL 2 and SOL 5 solutions are the most suitable.
- Aluminum flasks are cleaned in an ultrasonic tank according to the protocol described in Example 4 but using pure ionic liquid solutions which are:
- Example 6 Cleaning copper, stainless steel and molybdenum parts by treatment with a solution containing a mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate (SOL 3), according to the invention
- Tests for cleaning metal parts of various types and having greasy and dirty surfaces are carried out using a solution containing a mixture of 1-ethylimidazole, acetic acid and 1-ethylimidazolium acetate.
- the solution is prepared at an x / y ratio of 1.0 in a pH of 6.1 bath and a temperature of 55 ° C in which ultrasound is applied.
- the duration of treatment is 5 minutes.
- the parts treated according to the process of the invention are either copper, stainless steel or molybdenum.
- the surface finish after treatment is clear and bright.
- a blue-colored ionic liquid is obtained, attesting to the presence of Cu 2+ cations in solution and to a stripping of the surface by dissolving the surface oxide layer. copper.
- molybdenum parts which have complex shapes (recesses, threads, which are dirt retention zones), they also have after treatment, a glossy appearance and good wettability when rinsing with water.
- Example 7 Cleaning of stainless steel test pieces with different solutions according to the invention
- Sheet metal test pieces (dimensions: 70 ⁇ 10 mm) made of stainless steel having been greased beforehand by immersing them in cutting oil for 48 hours and storage for 1 week before carrying out the cleaning method according to the invention.
- test pieces are immersed for 5 minutes in a treatment bath at 55 ° C. (with use of ultrasound) containing a solution which is chosen from the SOL2 to SOL5 solutions described in Example 2.
- the effectiveness of the degreasing is evaluated by a qualitative wettability test which consists of observing the homogeneity of the water film present on the surface of the test piece treated and rinsed with water. If the film remains homogeneous over a period of 30 seconds, the test is positive as to the good degreasing efficiency.
- Example 8 Cleaning stainless steel test pieces by treatment with a solution containing a mixture of propionic acid, 1-ethylimidazole, 1-ethylimidazolium propionate, lactic acid and 1-ethylimidazolium lactate (according to US Pat. invention)
- a cleaning test was conducted according to the same protocol as that of Example 7 (except immersion time equal to 10 min) with a solution containing a mixture of propionic acid, 1-ethylimidazolium propionate, acid lactic and lactate 1- ethylimidazolium. This was prepared by contacting propionic acid and lactic acid with 1-ethylimidazole in a ratio x / y equal to 1. The pH of the solution is equal to 6.5 (1M in 1). 'water).
- the cleaning test leads to good wettability and satisfactory degreasing efficiency.
- Example 9 Cleaning of stainless steel test pieces by treatment with a solution containing a pure ionic liquid (1-butyl-3-methylimidazolium hydrogensulfate, not in accordance with the invention).
- Example 8 The same type of treatment as that of Example 8 was carried out with a pure ionic liquid: 1-butyl-3-methylimidazolium hydrogensulfate. Its pH is acidic (1.0 to 100 g / i). The wettability of the surface is good but on the other hand, at the end of the treatment, the part has a surface with strongly oxidized zones because of the strong acidity of the surface. solution.
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- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
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EP09752202A EP2331672A1 (de) | 2008-10-09 | 2009-10-08 | Verfahren zur abreinigung von oberflächen mittels einer protischen ionischen flüssigkeit |
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FR0805579A FR2937048B1 (fr) | 2008-10-09 | 2008-10-09 | Procede de nettoyage de surfaces mettant en oeuvre un liquide ionique de type pils |
FR08/05579 | 2008-10-09 |
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PCT/FR2009/001194 WO2010040917A1 (fr) | 2008-10-09 | 2009-10-08 | Procédé de nettoyage de surfaces mettant en oeuvre un liquide ionique de type protique |
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Cited By (8)
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US8481474B1 (en) | 2012-05-15 | 2013-07-09 | Ecolab Usa Inc. | Quaternized alkyl imidazoline ionic liquids used for enhanced food soil removal |
CN103555313A (zh) * | 2013-11-06 | 2014-02-05 | 山东大学 | 一种咪唑盐离子液体酸化缓蚀剂及其制备方法与应用 |
US8716207B2 (en) | 2012-06-05 | 2014-05-06 | Ecolab Usa Inc. | Solidification mechanism incorporating ionic liquids |
CN104593173A (zh) * | 2015-01-07 | 2015-05-06 | 烟台顺隆化工科技有限公司 | 一种葡萄用洗涤剂 |
WO2017031183A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Solutions of organic salts as pretreatments for plastics prior to etching |
CN111705292A (zh) * | 2020-07-13 | 2020-09-25 | 广东正信硬质材料技术研发有限公司 | 一种硬质合金表面的氮化处理方法 |
CN113026024A (zh) * | 2021-03-08 | 2021-06-25 | 吉林化工学院 | 混合型离子液体缓蚀剂及其制备方法和应用 |
CN117210814A (zh) * | 2023-09-18 | 2023-12-12 | 珠海市裕洲环保科技有限公司 | 一种线路板铜面用微蚀清洁剂及其制备方法 |
Families Citing this family (1)
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CN113549925A (zh) * | 2021-07-22 | 2021-10-26 | 西安诚惠金属材料保护有限公司 | 一种钎焊铝件清洗工艺 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006088737A2 (en) * | 2005-02-14 | 2006-08-24 | Small Robert J | Semiconductor cleaning |
-
2008
- 2008-10-09 FR FR0805579A patent/FR2937048B1/fr active Active
-
2009
- 2009-10-08 EP EP09752202A patent/EP2331672A1/de not_active Withdrawn
- 2009-10-08 WO PCT/FR2009/001194 patent/WO2010040917A1/fr active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006088737A2 (en) * | 2005-02-14 | 2006-08-24 | Small Robert J | Semiconductor cleaning |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8481474B1 (en) | 2012-05-15 | 2013-07-09 | Ecolab Usa Inc. | Quaternized alkyl imidazoline ionic liquids used for enhanced food soil removal |
US8716207B2 (en) | 2012-06-05 | 2014-05-06 | Ecolab Usa Inc. | Solidification mechanism incorporating ionic liquids |
CN103555313A (zh) * | 2013-11-06 | 2014-02-05 | 山东大学 | 一种咪唑盐离子液体酸化缓蚀剂及其制备方法与应用 |
CN103555313B (zh) * | 2013-11-06 | 2016-01-13 | 山东大学 | 一种咪唑盐离子液体酸化缓蚀剂及其制备方法与应用 |
CN104593173A (zh) * | 2015-01-07 | 2015-05-06 | 烟台顺隆化工科技有限公司 | 一种葡萄用洗涤剂 |
WO2017031183A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Solutions of organic salts as pretreatments for plastics prior to etching |
CN111705292A (zh) * | 2020-07-13 | 2020-09-25 | 广东正信硬质材料技术研发有限公司 | 一种硬质合金表面的氮化处理方法 |
CN113026024A (zh) * | 2021-03-08 | 2021-06-25 | 吉林化工学院 | 混合型离子液体缓蚀剂及其制备方法和应用 |
CN117210814A (zh) * | 2023-09-18 | 2023-12-12 | 珠海市裕洲环保科技有限公司 | 一种线路板铜面用微蚀清洁剂及其制备方法 |
CN117210814B (zh) * | 2023-09-18 | 2024-05-03 | 珠海市裕洲环保科技有限公司 | 一种线路板铜面用微蚀清洁剂及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
FR2937048A1 (fr) | 2010-04-16 |
EP2331672A1 (de) | 2011-06-15 |
FR2937048B1 (fr) | 2012-11-30 |
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