WO2010039339A4 - Alignement de faisceaux de particules chargées - Google Patents

Alignement de faisceaux de particules chargées Download PDF

Info

Publication number
WO2010039339A4
WO2010039339A4 PCT/US2009/053523 US2009053523W WO2010039339A4 WO 2010039339 A4 WO2010039339 A4 WO 2010039339A4 US 2009053523 W US2009053523 W US 2009053523W WO 2010039339 A4 WO2010039339 A4 WO 2010039339A4
Authority
WO
WIPO (PCT)
Prior art keywords
charged particle
segments
electrode
source
ion
Prior art date
Application number
PCT/US2009/053523
Other languages
English (en)
Other versions
WO2010039339A2 (fr
WO2010039339A3 (fr
Inventor
Raymond Hill
Original Assignee
Carl Zeiss Smt Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Inc. filed Critical Carl Zeiss Smt Inc.
Priority to JP2011529047A priority Critical patent/JP2012504309A/ja
Priority to EP09791414A priority patent/EP2342734A2/fr
Priority to US13/062,797 priority patent/US20110180722A1/en
Publication of WO2010039339A2 publication Critical patent/WO2010039339A2/fr
Publication of WO2010039339A3 publication Critical patent/WO2010039339A3/fr
Publication of WO2010039339A4 publication Critical patent/WO2010039339A4/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

La présente invention concerne des systèmes comprenant une source de particules chargées et une colonne optique de particules chargées comprenant une pluralité d'électrodes. Une première électrode de la colonne est cylindrique, est placée à proximité immédiate de la source de particules chargées et comprend une pluralité de segments, des potentiels électriques différents étant appliqués sur au moins certains des segments.
PCT/US2009/053523 2008-09-30 2009-08-12 Alignement de faisceaux de particules chargées WO2010039339A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011529047A JP2012504309A (ja) 2008-09-30 2009-08-12 荷電粒子ビームの位置合わせ
EP09791414A EP2342734A2 (fr) 2008-09-30 2009-08-12 Alignement de faisceaux de particules chargées
US13/062,797 US20110180722A1 (en) 2008-09-30 2009-08-12 Aligning charged particle beams

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10119708P 2008-09-30 2008-09-30
US61/101,197 2008-09-30

Publications (3)

Publication Number Publication Date
WO2010039339A2 WO2010039339A2 (fr) 2010-04-08
WO2010039339A3 WO2010039339A3 (fr) 2010-06-10
WO2010039339A4 true WO2010039339A4 (fr) 2010-07-29

Family

ID=41334573

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/053523 WO2010039339A2 (fr) 2008-09-30 2009-08-12 Alignement de faisceaux de particules chargées

Country Status (4)

Country Link
US (1) US20110180722A1 (fr)
EP (1) EP2342734A2 (fr)
JP (1) JP2012504309A (fr)
WO (1) WO2010039339A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CZ304824B6 (cs) * 2013-07-11 2014-11-19 Tescan Orsay Holding, A.S. Způsob opracovávání vzorku v zařízení se dvěma nebo více částicovými svazky a zařízení k jeho provádění
NL2011401C2 (en) * 2013-09-06 2015-03-09 Mapper Lithography Ip Bv Charged particle optical device.

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7012671A (fr) * 1970-08-27 1972-02-29
JPH01289057A (ja) * 1988-05-16 1989-11-21 Res Dev Corp Of Japan 荷電粒子ビーム発生装置
JPH03276547A (ja) * 1990-03-27 1991-12-06 Jeol Ltd レンズ非対称性補正装置と一体化した電子レンズ
US6288401B1 (en) * 1999-07-30 2001-09-11 Etec Systems, Inc. Electrostatic alignment of a charged particle beam
EP1120810B1 (fr) * 2000-01-24 2010-12-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Colonne pour dispositif à faisceau de particules chargées
US7279686B2 (en) * 2003-07-08 2007-10-09 Biomed Solutions, Llc Integrated sub-nanometer-scale electron beam systems
JP4628076B2 (ja) * 2004-10-14 2011-02-09 日本電子株式会社 収差補正方法及び収差補正装置
EP1760762B1 (fr) * 2005-09-06 2012-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dispositif et procédé pour la sélection d' une surface d' émission d'un motif d' émission
US8003952B2 (en) * 2006-09-12 2011-08-23 Agilent Technologies, Inc. Integrated deflectors for beam alignment and blanking in charged particle columns

Also Published As

Publication number Publication date
EP2342734A2 (fr) 2011-07-13
WO2010039339A2 (fr) 2010-04-08
WO2010039339A3 (fr) 2010-06-10
US20110180722A1 (en) 2011-07-28
JP2012504309A (ja) 2012-02-16

Similar Documents

Publication Publication Date Title
WO2007032779A3 (fr) Appareil et procede permettant d'inspecter et de soumettre des substrats d'affichage a ecran plat a un essai
US9236235B2 (en) Curved ion guide and related methods
CN106663588A (zh) 质量分析器
JP5698245B2 (ja) エンハンストインテグリティー投影レンズアセンブリ
Vidal-de-Miguel et al. Transversal modulation ion mobility spectrometry (TM-IMS), a new mobility filter overcoming turbulence related limitations
CN102270557B (zh) 离子注入装置
CN101421815B (zh) 采用用于离子注入系统的变角度狭槽阵列的离子束角度测量系统及方法
WO2010039339A4 (fr) Alignement de faisceaux de particules chargées
US9171694B2 (en) Asymmetric electrostatic quadrupole deflector for improved field uniformity
JPH01223384A (ja) 透過電離箱組立体、電離放射線ビームのずれ検出、補正装置とずれ検出方法、及び線形電子加速器
Leimbach et al. Upgrades of the GANDALPH photodetachment detector towards the determination of the electron affinity of astatine
Johnson et al. Characterization of the ion beam focusing in a mass spectrometer using an IonCCD™ detector
US20030030008A1 (en) Charged particle beam control system and charge partical beam optical apparatus using the system
JP2003028999A (ja) 荷電粒子ビーム制御装置、及びそれを用いた荷電粒子ビーム光学装置、荷電粒子ビーム欠陥検査装置、並びに荷電粒子ビーム制御方法
JP5521255B2 (ja) ２重集束を有する磁気色消し質量分析計
CN102922127A (zh) 操作激光扫描器的方法和具有激光扫描器的加工系统
JP4563928B2 (ja) ビーム位置モニタ
JP2009192252A (ja) 円筒型圧電アクチュエータおよび圧電素子ならびにそれを用いた走査型プローブ顕微鏡
US5134287A (en) Double-focussing mass spectrometer
US9147561B2 (en) Method for determining the maximum mass peak in mass spectrometry
Krielaart et al. Miniature electron beam separator based on three stacked dipoles
KR20210137207A (ko) 하전 입자 디바이스를 위한 빔 분할기
Rothermel et al. Rearranging a nanoprobe: Line foci, grid shadow patterns and performance tests
JPH0765766A (ja) 静電偏向器
US20110001056A1 (en) Component for manipulating a stream of charged particles

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09791414

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2011529047

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 13062797

Country of ref document: US

REEP Request for entry into the european phase

Ref document number: 2009791414

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2009791414

Country of ref document: EP