WO2010037515A1 - Medien für volumenholographische aufzeichnung basierend auf sich selbstentwickelndem polymer - Google Patents
Medien für volumenholographische aufzeichnung basierend auf sich selbstentwickelndem polymer Download PDFInfo
- Publication number
- WO2010037515A1 WO2010037515A1 PCT/EP2009/006984 EP2009006984W WO2010037515A1 WO 2010037515 A1 WO2010037515 A1 WO 2010037515A1 EP 2009006984 W EP2009006984 W EP 2009006984W WO 2010037515 A1 WO2010037515 A1 WO 2010037515A1
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- WO
- WIPO (PCT)
- Prior art keywords
- media according
- photopolymer
- optionally
- layer
- compounds
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/4266—Polycondensates having carboxylic or carbonic ester groups in the main chain prepared from hydroxycarboxylic acids and/or lactones
- C08G18/4269—Lactones
- C08G18/4277—Caprolactone and/or substituted caprolactone
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/4825—Polyethers containing two hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/776—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/7806—Nitrogen containing -N-C=0 groups
- C08G18/7818—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups
- C08G18/7837—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups containing allophanate groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
Definitions
- the support I) can have an anti-reflection layer, in particular in order to suppress undesired interface reflections in the holographic exposure.
- the carrier I) comprises a reflective layer.
- the support I) on the back comprises a residue-free and non-destructively removable absorbent layer.
- this layer can be present either in the form of a coating or as a stable laminating film.
- the laminating film it is preferred to use film materials analogous to the materials used in the carrier layer.
- the photopolymer layers II) preferably have a total layer thickness based on all photopolymer layers applied in layer II) of at most 200 ⁇ m, particularly preferably 3 to 200 ⁇ m, very particularly preferably 5 to 120 ⁇ m and in particular 10 to 30 ⁇ m.
- the polyisocyanates of component A) are particularly preferably di- or oligomerized aliphatic and / or cycloaliphatic di- or triisocyanates.
- Suitable polyether polyols are optionally block-formed polyaddition of cyclic ethers to OH or NH-functional starter molecules.
- Such polyether polyols preferably have number-average molar masses of from 250 to 10,000 g / mol, more preferably from 500 to 8,500 g / mol and very particularly preferably from 600 to 4500 g / mol.
- the OH functionality is preferably 1.5 to 4.0, more preferably 1.8 to 3.0.
- C) compounds of the aforementioned type having a refractive index of greater than 1.55, more preferably 1.58 are preferably used.
- Preferred polyoxyalkylene groups have up to 10, preferably up to 8, repeat units of the respective oxyalkylene group.
- Suitable dyes are, for example, Neu-Methylene Blue, Thionin, Basic Yellow, Pinacynol Chloride, Rhodamine 6G, GaI locyanine, Ethyl Violet, Victoria Blue R, Celestine Blue, Chinaldin Red, Crystal Violet, Brilliant Green, Astrazon Orange G, Darrow Red, Pyronin Y, Basic Red 29, Pyrillium I, Cyanine and Methylene Blue, Azure A (Cunningham et al., RadTech'98 North America UV / EB Conference Proceedings, Chicago, Apr. 19-22, 1998).
- the photoinitiators used for the cationic polymerization essentially consist of three classes: aryldiazonium salts, onium salts (in particular: iodonium, sulfonium and selenonium salts) and organometallic compounds.
- Phenyldiazonium salts under irradiation both in the presence and absence of a hydrogen donor, can produce a cation that initiates polymerization.
- the efficiency of the overall system is determined by the nature of the counterion used for the diazonium compound. Preference is given here to the less reactive but rather expensive SbF 6 " , AsF 6 " or PF 6 ' .
- Preferred free-radical stabilizers are 2,6-di-tert-butyl-4-methylphenol, phenothiazine and benzhydrol.
- one or more catalysts F) can be used. These preferentially catalyze urethane formation. These are preferably amines and metal compounds of the metals tin, zinc, iron, bismuth, molybdenum, cobalt, calcium, magnesium and zirconium suitable.
- the written holograms have now been read out in the following way.
- the shutter of the signal beam remained closed.
- the shutter of the reference beam was open.
- the iris diaphragm of the reference beam was closed to a diameter ⁇ 1 mm. This was achieved for all angles of rotation ( ⁇ ) of the medium of the beam is always completely in the previously written hologram lay.
- the powers of the zero-order transmitted beam were measured by means of the corresponding detector D and the powers of the first-order deflected beam were detected by the detector D.
- the diffraction efficiency ⁇ was found at each approached angle ⁇ as the quotient of:
- component B For the preparation of holographic media, component B), component C) (which can already be dissolved in component B) in the dark, and, if appropriate, the additives in the isocyanate-reactive component B) optionally dissolved at 60 0 C. Then the isocyanate component A) is added and mixed again in the speed mixer for 1 minute. In the following, a solution of component C) is added and mixed again in the speed mixer for 1 minute. The resulting mixture is applied in a coating tool (doctor blade) on the Makrofol Substate.
- the doctor blade method is characterized by: blade spacing 60 ⁇ m, web speed 0.7 m / min.
- the curing of the PU formulation is carried out in the dryer at 80-100 0 C for 10-15 min.
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011529473A JP2012504777A (ja) | 2008-10-01 | 2009-09-29 | 自己現像性ポリマーをベースとする体積ホログラフィックのための媒体 |
CN200980138893.3A CN102171267B (zh) | 2008-10-01 | 2009-09-29 | 基于自显影聚合物的体全息记录用介质 |
US13/121,967 US20110207029A1 (en) | 2008-10-01 | 2009-09-29 | Media for volume-holographic recording based on self-developing polymer |
EP09778754.3A EP2342254B1 (de) | 2008-10-01 | 2009-09-29 | Medien für volumenholographische aufzeichnung basierend auf sich selbstentwickelndem polymer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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EP08017279.4 | 2008-10-01 | ||
EP08017279 | 2008-10-01 |
Publications (1)
Publication Number | Publication Date |
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WO2010037515A1 true WO2010037515A1 (de) | 2010-04-08 |
Family
ID=40430009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/006984 WO2010037515A1 (de) | 2008-10-01 | 2009-09-29 | Medien für volumenholographische aufzeichnung basierend auf sich selbstentwickelndem polymer |
Country Status (7)
Country | Link |
---|---|
US (1) | US20110207029A1 (de) |
EP (1) | EP2342254B1 (de) |
JP (1) | JP2012504777A (de) |
KR (1) | KR101620652B1 (de) |
CN (1) | CN102171267B (de) |
TW (1) | TWI480301B (de) |
WO (1) | WO2010037515A1 (de) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012108500A (ja) * | 2010-10-28 | 2012-06-07 | Mitsubishi Chemicals Corp | ホログラム記録媒体用組成物 |
US8715889B2 (en) | 2009-02-12 | 2014-05-06 | Bayer Materialscience Ag | Photopolymer compositions as printable formulations |
US8715888B2 (en) | 2009-02-12 | 2014-05-06 | Bayer Materialscience Ag | Method for producing holographic photopolymers on polymer films |
EP2801867A1 (de) | 2013-05-08 | 2014-11-12 | Bayer MaterialScience AG | Holografisches Aufzeichnungsmedium mit Anti-Halo-Schicht und Verfahren zu seiner Herstellung |
WO2015063064A1 (de) * | 2013-10-30 | 2015-05-07 | Bayer Materialscience Ag | Verbund umfassend ein substrat und einen photopolymerfilm |
EP3772671A1 (de) | 2019-08-06 | 2021-02-10 | Covestro Deutschland AG | Schichtaufbau für die belichtung von hologrammen |
Families Citing this family (15)
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IL200722A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer compositions for optical elements and visual displays |
CA2738835A1 (en) * | 2008-10-01 | 2010-04-08 | Bayer Materialscience Ag | Prepolymer-based polyurethane formulations for producing holographic media |
EP2218743A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme |
US8889321B2 (en) * | 2009-11-03 | 2014-11-18 | Bayer Materialscience Ag | Method for producing a holographic film |
KR101747467B1 (ko) * | 2009-11-03 | 2017-06-14 | 코베스트로 도이칠란드 아게 | 굴절률이 높고 이중 결합 밀도가 감소된 우레탄 아크릴레이트 |
US8889322B2 (en) * | 2009-11-03 | 2014-11-18 | Bayer Materialscience Ag | Photopolymer formulation having different writing comonomers |
ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
TW201906882A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構 |
KR20200005738A (ko) * | 2017-05-09 | 2020-01-16 | 코베스트로 도이칠란트 아게 | 홀로그래픽 노출용 광중합체 층 및 고내성의 코팅 층을 함유하는 홀로그래픽 매체 |
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CN107599661B (zh) * | 2017-08-30 | 2019-04-12 | 华中科技大学 | 一种可直接印刷的图像记录材料、制备方法 |
CN108047456B (zh) * | 2017-09-01 | 2021-01-15 | 深圳市深大极光科技有限公司 | Bn纳米片的制备方法、光致聚合物涂料及薄膜材料和制备方法 |
US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
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US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
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- 2009-09-29 KR KR1020117007456A patent/KR101620652B1/ko active IP Right Grant
- 2009-09-29 EP EP09778754.3A patent/EP2342254B1/de active Active
- 2009-09-29 US US13/121,967 patent/US20110207029A1/en not_active Abandoned
- 2009-09-29 WO PCT/EP2009/006984 patent/WO2010037515A1/de active Application Filing
- 2009-09-30 TW TW098133067A patent/TWI480301B/zh not_active IP Right Cessation
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US8715889B2 (en) | 2009-02-12 | 2014-05-06 | Bayer Materialscience Ag | Photopolymer compositions as printable formulations |
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WO2015063064A1 (de) * | 2013-10-30 | 2015-05-07 | Bayer Materialscience Ag | Verbund umfassend ein substrat und einen photopolymerfilm |
US9703194B2 (en) | 2013-10-30 | 2017-07-11 | Covestro Deutschland Ag | Composite comprising a substrate and a photopolymer film |
EP3772671A1 (de) | 2019-08-06 | 2021-02-10 | Covestro Deutschland AG | Schichtaufbau für die belichtung von hologrammen |
Also Published As
Publication number | Publication date |
---|---|
US20110207029A1 (en) | 2011-08-25 |
CN102171267A (zh) | 2011-08-31 |
EP2342254B1 (de) | 2017-09-27 |
KR101620652B1 (ko) | 2016-05-12 |
CN102171267B (zh) | 2014-09-03 |
EP2342254A1 (de) | 2011-07-13 |
TW201030041A (en) | 2010-08-16 |
TWI480301B (zh) | 2015-04-11 |
KR20110066926A (ko) | 2011-06-17 |
JP2012504777A (ja) | 2012-02-23 |
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