WO2010021490A3 - Uv curable resin composition - Google Patents

Uv curable resin composition Download PDF

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Publication number
WO2010021490A3
WO2010021490A3 PCT/KR2009/004617 KR2009004617W WO2010021490A3 WO 2010021490 A3 WO2010021490 A3 WO 2010021490A3 KR 2009004617 W KR2009004617 W KR 2009004617W WO 2010021490 A3 WO2010021490 A3 WO 2010021490A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
curable resin
optical film
present
photoinitiator
Prior art date
Application number
PCT/KR2009/004617
Other languages
French (fr)
Korean (ko)
Other versions
WO2010021490A2 (en
Inventor
배현민
최혁
홍순지
김기용
박철진
Original Assignee
에스에스씨피 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에스에스씨피 주식회사 filed Critical 에스에스씨피 주식회사
Publication of WO2010021490A2 publication Critical patent/WO2010021490A2/en
Publication of WO2010021490A3 publication Critical patent/WO2010021490A3/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

The present invention relates to a UV curable resin composition suitable for the manufacture of an optical film due to excellent scratch resistance and anti static properties, and an optical film prepared by the resin composition. The UV curable resin composition according to the present invention comprises an acryl resin, photoinitiator, and antistatic agent, wherein the refractive index at a liquid phase is 1.47 ~ 1.58.
PCT/KR2009/004617 2008-08-21 2009-08-19 Uv curable resin composition WO2010021490A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080081733A KR20100023126A (en) 2008-08-21 2008-08-21 Ultra-violet curable composition
KR10-2008-0081733 2008-08-21

Publications (2)

Publication Number Publication Date
WO2010021490A2 WO2010021490A2 (en) 2010-02-25
WO2010021490A3 true WO2010021490A3 (en) 2010-06-24

Family

ID=41707561

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/004617 WO2010021490A2 (en) 2008-08-21 2009-08-19 Uv curable resin composition

Country Status (2)

Country Link
KR (1) KR20100023126A (en)
WO (1) WO2010021490A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101445982B1 (en) * 2013-08-06 2014-10-30 주식회사 명성디엠아이 Composite Film Having Pattern Layer Consisting of UV Curable Resin Composition
KR102097464B1 (en) * 2013-12-26 2020-04-06 동우 화인켐 주식회사 Adhesive composition containing ionic antistatic agent
KR101664353B1 (en) * 2015-01-19 2016-10-12 주식회사 소포스 Process Of Producing Nonmetalic Solid Pattern Material Using 3D Metalic Texture Film
US10377913B2 (en) * 2016-09-16 2019-08-13 Corning Incorporated High refractive index nanocomposites
CN111435220B (en) * 2019-01-15 2024-02-27 新应材股份有限公司 Photosensitive resin composition, optical film, and method for producing same
TWI704193B (en) * 2019-01-15 2020-09-11 新應材股份有限公司 Photosensitive resin composition, optical film, and method of producing the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5578657A (en) * 1994-05-17 1996-11-26 Sony Corporation CRT adhesive composition and CRT obtained by the use thereof
US20050244752A1 (en) * 2002-03-27 2005-11-03 Junji Yoshizawa Radiation-curable resin composition for adhesives
KR100544824B1 (en) * 2005-01-27 2006-01-24 주식회사 코오롱 A composition for making of prism layer and prism film made by using the same
US20060189706A1 (en) * 2003-07-22 2006-08-24 Hiroyuki Tokuda Actinic-energy-ray-curable resin composition for lens sheet and lens sheet

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5578657A (en) * 1994-05-17 1996-11-26 Sony Corporation CRT adhesive composition and CRT obtained by the use thereof
US20050244752A1 (en) * 2002-03-27 2005-11-03 Junji Yoshizawa Radiation-curable resin composition for adhesives
US20060189706A1 (en) * 2003-07-22 2006-08-24 Hiroyuki Tokuda Actinic-energy-ray-curable resin composition for lens sheet and lens sheet
KR100544824B1 (en) * 2005-01-27 2006-01-24 주식회사 코오롱 A composition for making of prism layer and prism film made by using the same

Also Published As

Publication number Publication date
KR20100023126A (en) 2010-03-04
WO2010021490A2 (en) 2010-02-25

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