KR20100023126A - Ultra-violet curable composition - Google Patents
Ultra-violet curable composition Download PDFInfo
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- KR20100023126A KR20100023126A KR1020080081733A KR20080081733A KR20100023126A KR 20100023126 A KR20100023126 A KR 20100023126A KR 1020080081733 A KR1020080081733 A KR 1020080081733A KR 20080081733 A KR20080081733 A KR 20080081733A KR 20100023126 A KR20100023126 A KR 20100023126A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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Abstract
Description
본 발명은 자외선 경화형 수지 조성물에 관한 것으로서, 보다 상세하게는 대전 방지가 가능하고, 우수한 내스크래치성을 가져서 광학 필름 제조에 적합한 자외선 경화형 수지 조성물 및 이 수지 조성물을 사용하여 제조되는 광학 필름에 관한 것이다. TECHNICAL FIELD The present invention relates to an ultraviolet curable resin composition, and more particularly, to an ultraviolet curable resin composition capable of antistatic and having excellent scratch resistance and suitable for optical film production, and an optical film produced using the resin composition. .
종래에는 LCD의 광학필름에 사용되는 기재 필름인 폴리 에틸렌 테레프탈레트 (Poly Ethylene Terephthalate), 폴리 메틸 메타 아크릴레이트(PMMA : Polymethylmetacrylate), 폴리 카보네이트(PC : Ploy carbonate) 고분자 수지들로 이루어져 있어서 정전기를 유발한다. 이러한 정전기 발생은 확산 필름이나 프리즘시트 적층 시 정전기가 생김으로서 LCD의 밝기 저하, LCD 생산 시 조립장치 고장 및 생산 수율 저하의 문제점을 일으킨다. Conventionally, it is composed of polyethylene terephthalate (Poly Ethylene Terephthalate), polymethyl methacrylate (PMMA), and polycarbonate (PC) polymer resin, which is a base film used in the optical film of LCD. do. The generation of static electricity causes static electricity when the diffusion film or prism sheet is stacked, which causes problems such as deterioration of LCD brightness, assembly failure during LCD production, and reduction of production yield.
특히, LCD의 백라이트 장치에 사용되는 확산필름 및 프리즘필름과 같은 광학필름의 경우에는 BLU 조립공정 중에 필름의 정전기적 현상으로 인해 발생되는 공기중의 먼지나 미세 이물질이 필름표면에 혼입되는 경우가 발생될 수 있으며 이러한 이물질의 혼입은 광학적 손실을 초래하여 불량발생률을 증가시킨다. In particular, in the case of optical films such as diffusion films and prism films used in LCD backlight devices, dust or fine particles in the air generated by the electrostatic phenomena of the film may be mixed on the film surface during the BLU assembly process. Incorporation of such foreign matters can result in optical loss, increasing the incidence of defects.
또한 프리즘산과 같은 특정 형상을 가진 광학필름의 경우에 산의 무너짐이나 미세 흠집으로 인해서 광학적 손실을 초래한다.In addition, in the case of an optical film having a specific shape, such as a prism acid, an optical loss is caused due to acid collapse or fine scratches.
종래에 이러한 정전기 발생을 방지하고자 아크릴 수지에 4급 암모늄을 첨가하여 사용하나 자외선 경화 시 4급 암모늄은 비반응성 타입으로 고온 고습 (60℃, 75%상대습도)하에서 염의 용출현상 및 기재와 코팅 층간의 부착성 저하를 발생 시키는 문제가 있었다.Conventionally, quaternary ammonium is added to acrylic resin to prevent the generation of static electricity, but when UV curing, quaternary ammonium is a non-reactive type, dissolution of salt under high temperature and high humidity (60 ℃, 75% relative humidity) and interlayer between substrate and coating There was a problem of causing a decrease in adhesion.
한편 LCD의 BLU용 광학필름에 사용되는 프리즘산을 형성하는 프리즘필름 (복합 필름포함 : 프리즘산과 렌즈형의 혼합형태 필름 또는 프리즘 변형형태 필름)에 적용함으로써 BLU 조립공정 중에 발생되는 프리즘 필름의 긁힘 현상으로 인한 프리즘산의 상부가 부서지거나 마모되어 휘도를 저하시키는 문제가 발생된다.On the other hand, the prism film that forms the prism acid used in the BLU optical film of LCD is applied to the prism film (including composite film: mixed prism acid and lenticular film or prism deformation film) and scratching phenomenon of the prism film generated during the BLU assembly process Due to this, the upper portion of the prism acid is broken or worn, resulting in a problem of lowering luminance.
따라서 내스크래치 특성의 향상을 위하여 다양한 연구가 진행되어 왔으며 그 중 일본국 공개특허 제2001-2744호에서 자외선 경화성 우레탄(메타)아크릴레이트 올리고머 및 광개시제를 함유한 자기치유력으로 경화물 표면위에 생긴 스크렛치 방지를 제안한 바 있으나 스크래치 내성은 상당부분 개선은 되었으나 용도에 제한받지 않고 사용하기에는 내스크래치 특성이 미흡한 수준이므로 다양한 용도에 적용하기에는 미흡한 문제점이 있다.Therefore, various studies have been conducted to improve the scratch resistance, among which, scratches generated on the surface of the cured product by self-healing force containing UV-curable urethane (meth) acrylate oligomer and photoinitiator in Japanese Patent Application Laid-Open No. 2001-2744. Although it has been proposed to prevent the scratch, the scratch resistance has been significantly improved, but there is a problem that it is insufficient to be applied to various applications because the scratch resistance is insufficient to be used without being limited to the use.
본 발명이 해결하고자 하는 기술적 과제는 자외선 경화형 수지 조성물에 대전방지제를 첨가함과 동시에 자외선 경화성 아크릴 수지의 함량조정을 통한 자외선 경화물의 분자구조를 사다리(Ladder)형태로 네트워크를 형성시키고 양쪽의 선형구조에 알킬 또는 산소원자를 함유한 알킬사슬 및 방향족을 도입하여 우수한 내스크래치 성능의 발현 및 대전방지의 효과를 동시에 구현하는 자외선 경화형 수지 조성물 및 이러한 수지 조성물을 사용하여 제조되는 광학 필름을 제공하는 것이다. The technical problem to be solved by the present invention is to form a network in the form of a ladder (ladder) of the molecular structure of the ultraviolet curable material by adjusting the content of the ultraviolet curable acrylic resin while adding an antistatic agent to the ultraviolet curable resin composition and linear structure of both The present invention provides an ultraviolet curable resin composition and an optical film produced using the resin composition which simultaneously introduce an alkyl chain containing an alkyl or oxygen atom and an aromatic group, and an aromatic group to simultaneously realize excellent scratch resistance and antistatic effects.
전술한 과제를 해결하기 위한 본 발명에 따른 자외선 경화형 수지 조성물은 아크릴 수지, 광개시제 및 대전방지제를 포함하며, 액상 굴절율이 1. 47 ~ 1. 58 인 것을 특징으로 한다. The ultraviolet curable resin composition according to the present invention for solving the above problems includes an acrylic resin, a photoinitiator and an antistatic agent, characterized in that the liquid refractive index is 1. 47 ~ 1. 58.
본 발명에서 상기 아크릴 수지는, 고굴절 아크릴 수지 10 ~ 70 중량 %, 지방족 아크릴 모노머 수지 2 ~ 30 중량 %, 방향족 아크릴 모노머 수지 및 올리고머 수지 20 ~ 70 중량 %, 실리콘 변성 폴리아크릴레이트 수지 0.02 ~ 5 중량 %를 포함하는 것을 특징으로 한다. The acrylic resin in the present invention, high refractive acrylic resin 10 to 70% by weight, aliphatic acrylic monomer resin 2 to 30% by weight, aromatic acrylic monomer resin and oligomer resin 20 to 70% by weight, silicone modified polyacrylate resin 0.02 to 5% by weight It is characterized by including the%.
한편 본 발명에 따른 광학 필름은, 기재 필름에 전술한 자외선 경화형 수지 조성물을 사용하여 특정한 패턴 예를 들어 렌즈, 프리즘 또는 그 혼합 형태 등의 광학 패턴을 형성한 것이다. On the other hand, the optical film which concerns on this invention forms the optical pattern, such as a specific pattern, for example, a lens, a prism, or its mixed form, using the ultraviolet curable resin composition mentioned above to the base film.
본 발명에 따른 광학 필름은 표면 저항값이 1010 ~ 1012 Ω/cm2 인 것을 특징으로 한다. Optical film according to the invention is characterized in that the surface resistance value of 1010 ~ 1012 Ω / cm2.
그리고 본 발명의 광학 필름은 하중 산강도가 120 ~ 250 g 인 것을 특징으로 하는 한다. And the optical film of the present invention is characterized in that the load acid strength is 120 ~ 250g.
본 발명에 따르면 자외선 경화형 수지 조성물에 대전방지제를 첨가함과 동시에 자외선 경화성 아크릴 수지의 함량조정을 통한 자외선 경화물의 분자구조를 사다리(Ladder)형태로 네트워크를 형성시키고 양쪽의 선형구조에 알킬 또는 산소원자를 함유한 알킬사슬 및 방향족을 도입하여 우수한 내스크래치 성능의 발현 및 대전방지의 효과를 동시에 구현하고, 특히 광학 필름에 탄성 복원력이 우수한 광학 패턴을 형성할 수 있는 장점이 있다. According to the present invention, by adding an antistatic agent to the UV-curable resin composition and at the same time the molecular structure of the UV-cured product by adjusting the content of the UV-curable acrylic resin to form a network in the form of a ladder (ladder) and alkyl or oxygen atoms on both linear structures By introducing an alkyl chain containing an aromatic and an aromatic to realize the effect of the expression of the excellent scratch resistance and antistatic at the same time, in particular, there is an advantage that can form an optical pattern excellent in elastic resilience in the optical film.
본 발명은 자외선 경화성 대전방지제의 첨가 및 자외선 경화성 아크릴 수지의 함량조정을 통한 자외선 경화물의 분자구조를 사다리(Ladder)형태로 네트워크를 형성시키고 양쪽의 선형구조에 알킬 또는 산소원자를 함유한 알킬사슬 및 방향족을 도입하여 우수한 내스크래치 성능의 발현 및 대전방지의 효과를 동시에 구현하는데, 이러한 본 발명의 자외선 경화형 수지 조성물은 다음과 같다.The present invention forms a network in the form of a ladder (Ladder) the molecular structure of the ultraviolet curable through the addition of an ultraviolet curable antistatic agent and the content adjustment of the ultraviolet curable acrylic resin and an alkyl chain containing alkyl or oxygen atoms in both linear structures and By introducing an aromatic to simultaneously realize the effect of the expression of excellent scratch resistance and antistatic, the ultraviolet curable resin composition of the present invention is as follows.
(A) 자외선 경화조성물의 굴절률 조절을 위한 고굴절 아크릴 수지 10∼70%(A) 10 to 70% of high refractive acrylic resin for controlling refractive index of UV curable composition
(B) 지방족 아크릴 모노머 수지 2∼30%(B) 2 to 30% of aliphatic acrylic monomer resin
(C) 방향족 아크릴 모노머 및 올리고머 수지 20 ∼70%(C) 20-70% of aromatic acrylic monomers and oligomer resins
(D) 실리콘 변성 폴리아크릴레이트 수지 0.02∼5%(D) silicone modified polyacrylate resin 0.02 to 5%
(E) 광개시제 2∼6%(E) 2-6% photoinitiator
(F) 기타 기능성 첨가제 (대전방지제) 0.1∼30%(F) other functional additives (antistatic agent) 0.1-30%
본 발명의 레진 조성물을 구성하는 (A)성분인 비스페닐페놀 모노아크릴레이트, 비스플로렌 디아크릴레이트는 굴절률을 높게 유지하고 조성물의 점도 분포를 조정하는 필요한 성분이다. 레진 조성물에 대해 10∼70중량%가 바람직하고, 특히 바람직하기로는 25∼60중량%이다. Bisphenyl phenol monoacrylate which is (A) component which comprises the resin composition of this invention, and bisflorene diacrylate are necessary components which maintain a refractive index high and adjust the viscosity distribution of a composition. 10-70 weight% is preferable with respect to resin composition, Especially preferably, it is 25-60 weight%.
본 발명의 레진 조성물 (B)와 (C)성분으로는 에틸렌옥사이드를 포함하거나 또는 포함하지 않는 지방족 및 방향족 아크릴레이트를 함유한 성분으로 지방족 아크릴 모노머로는 비닐모노머와, 라우릴(메타)아크릴레이트, 스테아릴(메타)아크릴레이트, 브톡시에틸(메타)아크릴레이트, 에톡시디에틸렌글리콜(메타)아크릴레이트, 메톡시트리에틸렌글리콜(메타)아크릴레이트, 메톡시폴리에틸렌글리콜(메타)아크릴레이트, 메톡시디플로필렌글리콜(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트를 들 수 있다.The resin composition (B) and (C) components of the present invention contain aliphatic and aromatic acrylates with or without ethylene oxide. The aliphatic acrylic monomers include vinyl monomers and lauryl (meth) acrylates. , Stearyl (meth) acrylate, butoxyethyl (meth) acrylate, ethoxy diethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxy polyethylene glycol (meth) acrylate, meth A methoxy difluoro ethylene glycol (meth) acrylate and cyclohexyl (meth) acrylate are mentioned.
한편 다관능모노머 성분으로는 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌 글리콜디(메타)아크릴레이트, 트리에틸렌글 리콜디(메타)아크릴레이트, 트리프로필렌글리콜디(메타)아크릴레이트, 테트라메틸렌글리콜디(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 에톡시화 리메틸올프로판트리(메타)아크릴레이트, 프로폭시화 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 그리세릴트리(메타)아크릴레이트, 프로폭시화 그리세릴트리(메타)아크릴레이트, 트리스(2-히드록시에틸)이소시아누레이트트리아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디트리메티롤프로판테트라(메타)아크릴레이트 등을 들 수 있다.Meanwhile, as the polyfunctional monomer, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate and tetramethylene glycol Di (meth) acrylate, 1,4-butanedioldi (meth) acrylate, 1,6-hexanedioldi (meth) acrylate, ethoxylated dimethylol propane tri (meth) acrylate, propoxylated trimethylol Propane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, gglyceryl tri (meth) acrylate, propoxylated gglyceryl tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate Triacrylate, pentaerythritol tetra (meth) acrylate, ditrimetholol propane tetra (meth) acrylate, etc. are mentioned.
방향족 모노머 및 올리고머의 성분으로는 페닐옥시에틸렌아크릴레이트, 벤조일아크릴레이트, 페닐옥시페닐에틸아크릴레이트가 주성분으로 지방족 단관능성 아크릴레이트에 의해서 저하되는 굴절률 조정에 필요한 요소 성분이다. 상기 방향족 모노머 및 올리고머의 예로는 에틸렌옥사이드를 포함하는 에톡시비스페놀A디(메타)아크릴레이트로 에톡시의 반복단위가 2∼30을 함유하는 성분을 들 수 있으며, 비스페놀F우레탄디아크릴레이트, 에톡시 비스페놀A에폭시디아크릴레이트 성분도 포함한다.As a component of an aromatic monomer and an oligomer, phenyloxyethylene acrylate, benzoyl acrylate, and phenyloxy phenyl ethyl acrylate are the main components which are necessary for the adjustment of the refractive index which falls with aliphatic monofunctional acrylate as a main component. Examples of the aromatic monomers and oligomers include ethoxybisphenol A di (meth) acrylate containing ethylene oxide, and a component containing 2 to 30 repeating units of ethoxy. A oxy bisphenol A epoxy diacrylate component is also included.
본 발명의 레진 조성물인 (D) 성분은 상기의 실리콘, 실리콘 변성 폴리머로서 BYK-Chemie사(社) 제품인 BYK-307, BYK-323, BYK-331, BYK-333, BYK-356, BYK-371, BYK-377 BYK-UV3510, BYK-3500, BYK-UV3530, BYK-UV3570, Dow Chem.社 제품인 DC-57, DC-190, Degussa社 제품인 Tego glide 100, Tego glide 410, Tego glide 432, Tego glide 435, Tego glide 440, Tego glide 440, Tego glide 455, Tego glide, Tego glide A 115, Tego glide B 1484, Tego glide ZG 400, Tego rad 2100, Tego rad 2200N, Tego rad 2250, Tego rad 2300, Tego rad 2500, Tego rad 2600, Tego rad 700, EEKA 社 제품인EFKA-3232, EFKA-3236, EFKA-3239, EFKA-3288, EFKA-3299를 들 수 있다. 여기에서 상기 실리콘 변성 폴리머의 명칭들은 모두 상업적으로 용이하게 획득할 수 있는 것으므로 그 구체적인 화학 조성은 언급하지 않는다. 그리고 이 (D) 성분의 적정함량은 0.02~5% 중량%이고 좀더 바람직하게는 0.02~2.0중량%이다.Component (D) of the resin composition of the present invention is BYK-307, BYK-323, BYK-331, BYK-333, BYK-356, BYK-371 manufactured by BYK-Chemie as the silicone and silicone-modified polymer. , BYK-377 BYK-UV3510, BYK-3500, BYK-UV3530, BYK-UV3570, DC-57 from Dow Chem., DC-190, Tego glide 100 from Tegussa, Tego glide 410, Tego glide 432, Tego glide 435, Tego glide 440, Tego glide 440, Tego glide 455, Tego glide, Tego glide A 115, Tego glide B 1484, Tego glide ZG 400, Tego rad 2100, Tego rad 2200N, Tego rad 2250, Tego rad 2300, Tego rad 2500, Tego rad 2600, Tego rad 700, and EEKA company EFKA-3232, EFKA-3236, EFKA-3239, EFKA-3288, and EFKA-3299. Here, the names of the silicone-modified polymers are all commercially available, and thus the specific chemical composition is not mentioned. And the appropriate content of this component (D) is 0.02 to 5% by weight, more preferably 0.02 to 2.0% by weight.
본 발명 레진조성물 (E)인 광중합 개시제는 수지조성물 전체에 대한 함유량으로서 1.0 ~ 10중량%가 바람직하다. 더욱 바람직하기로는 2~5중량%이다.As for content of the photoinitiator which is the resin composition (E) of this invention with respect to the whole resin composition, 1.0-10 weight% is preferable. More preferably, it is 2-5 weight%.
1.0 중량% 미만에서는 광경화성이 이뤄지지 않아 패턴형상이 형성되지 않은 tacky 성분으로 존재하며, 10 중량%를 넘게 레진 조성물의 광경화가 빠르게 진행이 되긴 하지만 부산물로 분자량이 작은 레진성분이 발생이 되어 최종 경화물의 물성에 악영향을 미치게 된다. 성분 (E)의 예로는, 1-히드록시-시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐-1-프로판온, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸-1-프로판온, 메틸벤조일포르메이트, 옥시-페닐-아세틱엑시드2-[2옥소-2페닐-아세톡시-에톡시]-에틸에스테르/옥시-페닐-아세틱2-[2-히드록시-에톡시]-에틸에스테르 혼합물, 2-벤질-2-(디메틸아미노)-1-[4-(4-몰포리닐)페닐-1-부타논, 2,4,6-트 리메틸벤조일-디페닐-포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)-페닐포스틴옥사이드, 2-히드록시-1-{4-[4-(2-히드록시-2-메틸-프로피오닐)-벤질]-페닐}-2-메틸-프로판-1-온, 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논], 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논]/트리프로필렌글리콜디아크릴레이트 혼합물, 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논]/에틸렌옥사이드 또는 프리필렌옥사이드를 함유한 트리메틸올프로판트리아크릴레이트 혼합물, 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논]/글리세릴프로폭시드트리아크릴레이트 혼합물, 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논]/2-히드록시-2-메틸-1-페닐-1-프로판온 혼합물, Esacure ONE (Lamberti社), 2,4,6-트리메틸벤조페논/4-메틸벤조페논 혼합물, 올리고[2-히드록시-2-메틸-1-[4(1-메틸비닐)페닐]프로판논]/2,4,6-트리메틸벤조페논/4-메틸벤조페논 혼합물 등을 들 수 있다. 상기 광개시제는 단독 사용 또는 혼합형태로 사용할 수 있다. If it is less than 1.0% by weight, the photocurability is not achieved, so it exists as a tacky component that does not have a pattern shape.The photocuring of the resin composition proceeds more than 10% by weight, but a resin component having a low molecular weight is generated as a by-product. It will adversely affect the physical properties of the water. Examples of the component (E) include 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2-hydroxy-1- [4- (2-hydroxy Oxyethoxy) phenyl] -2-methyl-1-propanone, methylbenzoylformate, oxy-phenyl-acetic acid 2- [2-oxo-2phenyl-acetoxy-ethoxy] -ethylester / oxy-phenyl -Acetic2- [2-hydroxy-ethoxy] -ethylester mixture, 2-benzyl-2- (dimethylamino) -1- [4- (4-morpholinyl) phenyl-1-butanone, 2 , 4,6-trimethylbenzoyl-diphenyl-phosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylpostin oxide, 2-hydroxy-1- {4- [4- (2- Hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propane-1-one, oligo [2-hydroxy-2-methyl-1- [4 (1-methylvinyl) phenyl] Propaneone], oligo [2-hydroxy-2-methyl-1- [4 (1-methylvinyl) phenyl] propanone] / tripropylene glycol diacrylate mixture, oligo [2-hydroxy-2-methyl- 1- [4 (1-methylvinyl) phenyl] propanone] / Trimethylolpropanetriacrylate mixture containing methylene oxide or prepropylene oxide, oligo [2-hydroxy-2-methyl-1- [4 (1-methylvinyl) phenyl] propanone] / glycerylpropoxide tree Acrylate mixture, oligo [2-hydroxy-2-methyl-1- [4 (1-methylvinyl) phenyl] propanone] / 2-hydroxy-2-methyl-1-phenyl-1-propanone mixture, Esacure ONE (Lamberti), 2,4,6-trimethylbenzophenone / 4-methylbenzophenone mixture, oligo [2-hydroxy-2-methyl-1- [4 (1-methylvinyl) phenyl] propanone] / 2,4,6-trimethylbenzophenone / 4-methylbenzophenone mixture, etc. are mentioned. The photoinitiator may be used alone or in a mixed form.
본 발명의 레진 조성물기 (F)는 4급 암모늄 염, ELECON-700DA, 500DA, 100ED, Pri-HR-SS, PRIZOL-600DA (나노캠텍 社)제품 및 SY-ICA-P212B, SY-ICA-P211, SY-ICA-P226A (수양켐텍 社) AS-66 (나이스켐 社) AS1021 (미원상사) 및 KOEI社의 IL-A2, ILA2-7, IL-AP1, IL-M8, ILA21-9, IL-A5, IL-AP3, IL-P14등의 제품을 들 수 있다. 여기에서 대전방지제의 예로 들은 명칭들은 모두 상업적으로 용이하게 획들할 수 있는 것으로서 그 구체적인 화학 조성은 언급하지 않는다. Resin composition group (F) of the present invention is quaternary ammonium salt, ELECON-700DA, 500DA, 100ED, Pri-HR-SS, PRIZOL-600DA (NanoCamtech Co., Ltd.) and SY-ICA-P212B, SY-ICA-P211 , SY-ICA-P226A (Sooyang Chemtech) AS-66 (Nischem) AS1021 (Miwon Corporation) and KOEI's IL-A2, ILA2-7, IL-AP1, IL-M8, ILA21-9, IL- A5, IL-AP3, IL-P14, etc. are mentioned. The names given herein as examples of antistatic agents are all commercially available and do not mention their specific chemical composition.
자외선 경화성 레진 조성물의 전체에 대한 함유량으로서 0.1 ~ 30중량%가 바 람직하다. 더욱 바람직하게는 0.1~20중량%이다. 과량의 30%이상일 때에는 대전방지제의 용출현상이 발생과 더불어 광학필름 기재와의 부착성 불량의 원인을 일으킨다.As content with respect to the whole ultraviolet curable resin composition, 0.1-30 weight% is preferable. More preferably, it is 0.1-20 weight%. If the excess is more than 30%, the dissolution of the antistatic agent occurs and causes the poor adhesion to the optical film substrate.
상기의 대전방지제를 적용하여 자외선 경화성 레진조성물의 패턴형상 필름의 표면 저항치가 1010~1012Ω/cm2의 범위를 갖는 것을 특징으로 한다.The surface resistance of the patterned film of the ultraviolet curable resin composition by applying the antistatic agent is characterized in that it has a range of 10 10 ~ 10 12 Ω / cm 2 .
경화 조건Curing conditions
자외선 경화성 수지 조성물을 250㎛ PET Film에 프리즘 산 모양[25㎛(프리즘 산 높이)×15㎛(피치)]의 니켈 몰드를 이용하여 자외선 조사 공정(H-bulb, 500~600mJ/㎠)을 통해서 프림즘산 패턴형상 필름을 제조하였다.The UV curable resin composition was subjected to UV irradiation process (H-bulb, 500-600 mJ / cm 2) using a nickel mold of a prism acid shape [25 μm (prism acid height) × 15 μm (pitch)] on a 250 μm PET film. A prismatic acid patterned film was prepared.
(평가 방법)(Assessment Methods)
UV 경화 코팅한 프리즘 시트의 특성을 평가하기 위해 굴절율, 점도, 부착성, 대전방지제 용출현상, 표면저항 값, 하중 산강도를 측정하였다. 각 항목별 분석방법은 아래와 같이 수행하였다.In order to evaluate the properties of the UV cured coated prism sheet, refractive index, viscosity, adhesion, antistatic agent dissolution phenomenon, surface resistance value, and load acid strength were measured. The analysis method for each item was performed as follows.
굴절율Refractive index
굴절율은 ABBE Refractometer @ 589.3㎚ , 25℃ 에서 측정 하였다. Refractive index was measured at 25 ℃, ABBE Refractometer @ 589.3nm.
점 도Viscosity
BrookFild LV DVⅢ+, Spindle # 18, 7rpm, 25℃온도 에서 측정하였다.It was measured at BrookFild LV DVIII +, Spindle # 18, 7rpm, 25 ℃.
부착성Adhesion
광학필름 기재에 대한 상온 부착성 및 고온고습후의 부착성은 ASTM D3359에 의거 엄격한 격자 부착성 실험을 하였다. 코팅된 필름에 100개의 사각형 모눈이 되도록 Cross hatch cutter (Elcometer 107)를 이용해 금을 긋고, 격자로 금이 그어진 위에 일본 Nitto Denko Tape 31B를 붙인 후 빠르게 벗겨내는 것이다. 필름에 남아있는 사각형 모눈의 남은 개수가 상대적 부착율을 나타낸다. 초기 부착성은 패턴 Molder로부터 필름을 형성한 후, 바로 측정을 하였으며, 고습 후 부착성은 항온 항습기에 65℃/75%RH/24hrs.조건하에서 방치한 후, 부착성을 확인하였다.The room temperature adhesion to the optical film substrate and the adhesion after high temperature and high humidity were subjected to strict lattice adhesion test according to ASTM D3359. The coated film was cut in gold using a cross hatch cutter (Elcometer 107) to form 100 square grids, and the Japanese Nitto Denko Tape 31B was attached on a gold plated grid and quickly peeled off. The remaining number of square grids remaining on the film indicates the relative adhesion rate. Initial adhesion was measured immediately after forming the film from the pattern molder, and after high humidity, the adhesion was left in a constant temperature and humidity chamber at 65 ° C./75%RH/24hrs.
코팅 면 용출 현상 Coating surface dissolution phenomenon
100℃ 끊는 물에 20분 동안 방치 후 패턴형상 표면의 용출현상 관찰하였다.After leaving for 20 minutes in 100 ° C water, the dissolution of the pattern surface was observed.
표면저항 값Surface resistance
MITSUBISHI CHEMICAL 社 MCP-HT450으로 URS PROBE을 사용하여 Voltage 1000V 하에서 30초간 표면저항 값을 측정하였다.The surface resistance was measured for 30 seconds under a voltage of 1000V by using URS PROBE with MITSUBISHI CHEMICAL's MCP-HT450.
하중 weight 산강도Mountain river ( ( 내스크래치성Scratch resistance ))
대성정밀 社에서 제작한 steel wool # 0000 tester기에서 steel wool를 고정시키는 부분에 원추형을 고정할 수 있게 변형한 장치를 이용하여 측정하였다. 원추의 뾰족한 부분이 편광필름위에 위치하게 하고 편광필름 밑에는 측정하고자 하는 패턴이 형성된 필름을 위치해 놓는다. 일정한 무게 (g)를 순차적으로 증가시키면서 원추를 일정한 속도로 5회 왕복 실시한다. 편광필름 밑에 적층된 패턴형상 필름 (프리즘)의 표면 스크레치 정도를 추의 무게에 따라 g으로 평가하였다. 스크레치된 표면의 복원정도는 외관으로 30초 후에 평가하였다.The steel wool # 0000 tester manufactured by Daesung Precision Co., Ltd. was used to measure the conical shape of the steel wool. Place the pointed part of the cone on the polarizing film and place the film with the pattern to be measured under the polarizing film. Perform 5 round trips of the cone at a constant speed while sequentially increasing the constant weight (g). The surface scratch degree of the patterned film (prism) laminated under the polarizing film was evaluated in g according to the weight of the weight. The extent of repair of the scratched surface was evaluated after 30 seconds in appearance.
실시예1Example 1
경화물의 대전방지성과 복원력을 구현하기 위해서 배합조성물에 대한 실시예1은 (A)성분은 미첨가 (B)성분, 17중량 %, (C)성분, 62중량 %, (D)성분, 1중량 %, (E)성분, 5중량%, (F)성분, 15중량%를 배합하여 제조하였다.In order to realize the antistatic property and the restoring force of the cured product, Example 1 of the composition (A) is not added (B) component, 17 weight%, (C) component, 62 weight%, (D) component, 1 weight It prepared by mix | blending%, (E) component, 5 weight%, (F) component, and 15 weight%.
굴절률은 1.50, 점도는 320cP.,하중 산강도는 180g, 표면저항은 5.0 × 1012Ω/cm2의 결과치를 얻었다. 또한 표면의 스크렛치는 30초 후에 완전히 복원되는 것을 육안으로 확인하였다.The refractive index was 1.50, the viscosity was 320 cP., The load acid strength was 180 g, and the surface resistance was 5.0 × 10 12 Pa / cm 2 . In addition, the scratch of the surface was visually confirmed to be completely restored after 30 seconds.
실시예 2, 3, 4, 5는 표1에서 보는 바와 같이 상기의 실시예1과 동일한 조건에서 성분의 함량조절을 통해서 배합을 실시하였다. 실시예의 물성 결과는 표2와 같다.Examples 2, 3, 4, and 5 were blended by adjusting the content of ingredients under the same conditions as in Example 1, as shown in Table 1. The physical property results of the examples are shown in Table 2.
표1. 실시예 조성비 Table 1. Example Composition Ratio
표2. 실시예 테스트 결과 물성표 Table 2. Example Test Results
1) 광학기재 부착성 평가 방법 : 100/100(우수), 99/100∼95/100(양호), 95/100 이하(불량) 1) Evaluation method of optical substrate adhesion: 100/100 (excellent), 99/100 to 95/100 (good), 95/100 or less (bad)
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Cited By (6)
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KR101445982B1 (en) * | 2013-08-06 | 2014-10-30 | 주식회사 명성디엠아이 | Composite Film Having Pattern Layer Consisting of UV Curable Resin Composition |
WO2015099289A1 (en) * | 2013-12-26 | 2015-07-02 | 동우화인켐 주식회사 | Adhesive composition containing ionic anti-static agent |
KR20160089587A (en) * | 2015-01-19 | 2016-07-28 | 주식회사 소포스 | Process Of Producing Nonmetalic Solid Pattern Material Using 3D Metalic Texture Film |
US20200225581A1 (en) * | 2019-01-15 | 2020-07-16 | Echem Solutions Corp. | Photosensitive resin composition, optical film, and method of producing optical film |
CN111435220A (en) * | 2019-01-15 | 2020-07-21 | 新应材股份有限公司 | Photosensitive resin composition, optical film and method for producing same |
US10723907B2 (en) * | 2016-09-16 | 2020-07-28 | Corning Incorporated | High refractive index nanocomposites |
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TW312700B (en) * | 1994-05-17 | 1997-08-11 | Sony Co Ltd | |
JP2003277696A (en) * | 2002-03-27 | 2003-10-02 | Jsr Corp | Radiation curable resin composition for adhesive |
US7666920B2 (en) * | 2003-07-22 | 2010-02-23 | Dai Nippon Ink And Chemicals, Inc. | Radiation curable resin composition for lens sheet and lens sheet |
KR100544824B1 (en) * | 2005-01-27 | 2006-01-24 | 주식회사 코오롱 | A composition for making of prism layer and prism film made by using the same |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101445982B1 (en) * | 2013-08-06 | 2014-10-30 | 주식회사 명성디엠아이 | Composite Film Having Pattern Layer Consisting of UV Curable Resin Composition |
WO2015099289A1 (en) * | 2013-12-26 | 2015-07-02 | 동우화인켐 주식회사 | Adhesive composition containing ionic anti-static agent |
KR20160089587A (en) * | 2015-01-19 | 2016-07-28 | 주식회사 소포스 | Process Of Producing Nonmetalic Solid Pattern Material Using 3D Metalic Texture Film |
US10723907B2 (en) * | 2016-09-16 | 2020-07-28 | Corning Incorporated | High refractive index nanocomposites |
US20200225581A1 (en) * | 2019-01-15 | 2020-07-16 | Echem Solutions Corp. | Photosensitive resin composition, optical film, and method of producing optical film |
CN111435220A (en) * | 2019-01-15 | 2020-07-21 | 新应材股份有限公司 | Photosensitive resin composition, optical film and method for producing same |
CN111435220B (en) * | 2019-01-15 | 2024-02-27 | 新应材股份有限公司 | Photosensitive resin composition, optical film, and method for producing same |
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