WO2010021490A3 - Composition de résine durcissable aux uv - Google Patents

Composition de résine durcissable aux uv Download PDF

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Publication number
WO2010021490A3
WO2010021490A3 PCT/KR2009/004617 KR2009004617W WO2010021490A3 WO 2010021490 A3 WO2010021490 A3 WO 2010021490A3 KR 2009004617 W KR2009004617 W KR 2009004617W WO 2010021490 A3 WO2010021490 A3 WO 2010021490A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
curable resin
optical film
present
photoinitiator
Prior art date
Application number
PCT/KR2009/004617
Other languages
English (en)
Korean (ko)
Other versions
WO2010021490A2 (fr
Inventor
배현민
최혁
홍순지
김기용
박철진
Original Assignee
에스에스씨피 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에스에스씨피 주식회사 filed Critical 에스에스씨피 주식회사
Publication of WO2010021490A2 publication Critical patent/WO2010021490A2/fr
Publication of WO2010021490A3 publication Critical patent/WO2010021490A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

L'invention concerne une composition de résine durcissable aux UV appropriée pour produire un film optique du fait de son excellente résistance aux rayures et de ses propriétés antistatiques, et un film optique préparé au moyen de la composition de résine. La composition de résine durcissable aux UV de l'invention comprend une résine acrylique, un photoinitiateur, et un agent antistatique, l'indice de réfraction en phase liquide étant compris entre 1,47 et 1,58.
PCT/KR2009/004617 2008-08-21 2009-08-19 Composition de résine durcissable aux uv WO2010021490A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0081733 2008-08-21
KR1020080081733A KR20100023126A (ko) 2008-08-21 2008-08-21 자외선 경화형 수지 조성물

Publications (2)

Publication Number Publication Date
WO2010021490A2 WO2010021490A2 (fr) 2010-02-25
WO2010021490A3 true WO2010021490A3 (fr) 2010-06-24

Family

ID=41707561

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/004617 WO2010021490A2 (fr) 2008-08-21 2009-08-19 Composition de résine durcissable aux uv

Country Status (2)

Country Link
KR (1) KR20100023126A (fr)
WO (1) WO2010021490A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101445982B1 (ko) * 2013-08-06 2014-10-30 주식회사 명성디엠아이 자외선 경화형 수지 조성물로 이루어진 패턴층을 가지는 복합필름
KR102097464B1 (ko) * 2013-12-26 2020-04-06 동우 화인켐 주식회사 이온성 대전 방지제를 포함하는 점착제 조성물
KR101664353B1 (ko) * 2015-01-19 2016-10-12 주식회사 소포스 금속질감 입체패턴의 필름을 이용한 비금속소재 제조방법
US10377913B2 (en) * 2016-09-16 2019-08-13 Corning Incorporated High refractive index nanocomposites
CN111435220B (zh) * 2019-01-15 2024-02-27 新应材股份有限公司 感光性树脂组合物、光学膜及其制造方法
TWI704193B (zh) * 2019-01-15 2020-09-11 新應材股份有限公司 感光性樹脂組成物、光學膜及其製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5578657A (en) * 1994-05-17 1996-11-26 Sony Corporation CRT adhesive composition and CRT obtained by the use thereof
US20050244752A1 (en) * 2002-03-27 2005-11-03 Junji Yoshizawa Radiation-curable resin composition for adhesives
KR100544824B1 (ko) * 2005-01-27 2006-01-24 주식회사 코오롱 프리즘층 형성용 조성물 및 이로부터 제조된 프리즘 필름
US20060189706A1 (en) * 2003-07-22 2006-08-24 Hiroyuki Tokuda Actinic-energy-ray-curable resin composition for lens sheet and lens sheet

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5578657A (en) * 1994-05-17 1996-11-26 Sony Corporation CRT adhesive composition and CRT obtained by the use thereof
US20050244752A1 (en) * 2002-03-27 2005-11-03 Junji Yoshizawa Radiation-curable resin composition for adhesives
US20060189706A1 (en) * 2003-07-22 2006-08-24 Hiroyuki Tokuda Actinic-energy-ray-curable resin composition for lens sheet and lens sheet
KR100544824B1 (ko) * 2005-01-27 2006-01-24 주식회사 코오롱 프리즘층 형성용 조성물 및 이로부터 제조된 프리즘 필름

Also Published As

Publication number Publication date
KR20100023126A (ko) 2010-03-04
WO2010021490A2 (fr) 2010-02-25

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