WO2009148779A3 - Oxydes métalliques fortement dopés et leurs procédés de fabrication - Google Patents
Oxydes métalliques fortement dopés et leurs procédés de fabrication Download PDFInfo
- Publication number
- WO2009148779A3 WO2009148779A3 PCT/US2009/043689 US2009043689W WO2009148779A3 WO 2009148779 A3 WO2009148779 A3 WO 2009148779A3 US 2009043689 W US2009043689 W US 2009043689W WO 2009148779 A3 WO2009148779 A3 WO 2009148779A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- doped metal
- doped
- making
- metal oxide
- methods
- Prior art date
Links
- 229910044991 metal oxide Inorganic materials 0.000 title abstract 6
- 150000004706 metal oxides Chemical class 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 4
- 239000013078 crystal Substances 0.000 abstract 2
- 239000002019 doping agent Substances 0.000 abstract 2
- 229910052755 nonmetal Inorganic materials 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- 229910001887 tin oxide Inorganic materials 0.000 abstract 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000004151 rapid thermal annealing Methods 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
Classifications
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- B01J35/39—
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/24—Nitrogen compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0225—Coating of metal substrates
- B01J37/0226—Oxidation of the substrate, e.g. anodisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/08—Heat treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/344—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy
- B01J37/346—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy of microwave energy
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
- C01P2002/52—Solid solutions containing elements as dopants
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
Abstract
L'invention porte sur un procédé de fabrication d'un oxyde métallique dopé, qui comprend le chauffage d'un premier oxyde métallique dopé par un recuit thermique rapide, pour former un deuxième oxyde métallique dopé. La structure cristalline du deuxième oxyde métallique dopé est différente de la structure cristalline du premier oxyde métallique dopé. Le procédé peut produire un oxyde de titane dopé, dans lequel le rapport atomique du non métal dopant au titane est de 2 % à 20 %, et une quantité d'au moins 10 % de l'oxyde de titane dopé se présente dans la phase rutile. Le procédé peut aussi produire un oxyde d'étain dopé, dans lequel le rapport atomique de non métal dopant à l'étain est de 2 % à 20 %, et une quantité d'au moins 50 % de l'oxyde d'étain dopé se présente dans la phase rutile.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/994,437 US9120088B2 (en) | 2008-05-29 | 2009-05-13 | Heavily doped metal oxides and methods for making the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5705008P | 2008-05-29 | 2008-05-29 | |
US61/057,050 | 2008-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009148779A2 WO2009148779A2 (fr) | 2009-12-10 |
WO2009148779A3 true WO2009148779A3 (fr) | 2010-05-27 |
Family
ID=41112502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/043689 WO2009148779A2 (fr) | 2008-05-29 | 2009-05-13 | Oxydes métalliques fortement dopés et leurs procédés de fabrication |
Country Status (2)
Country | Link |
---|---|
US (1) | US9120088B2 (fr) |
WO (1) | WO2009148779A2 (fr) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009148779A2 (fr) | 2008-05-29 | 2009-12-10 | The Board Of Trustees Of The University Of Illinois | Oxydes métalliques fortement dopés et leurs procédés de fabrication |
US9278337B2 (en) * | 2011-05-19 | 2016-03-08 | Nanoptek Corporation | Visible light titania photocatalyst, method for making same, and processes for use thereof |
CN102515566B (zh) * | 2011-11-07 | 2013-10-30 | 中山市格兰特实业有限公司火炬分公司 | 一种具有可见光响应的磁控溅射自清洁玻璃的制备方法 |
CN102644055A (zh) * | 2012-04-05 | 2012-08-22 | 东南大学 | 一种氮掺杂二氧化锡薄膜的制备方法 |
CN105568229B (zh) * | 2016-03-09 | 2018-10-30 | 无锡南理工科技发展有限公司 | 一种掺氮二氧化钛薄膜的制备方法 |
CN105944745B (zh) * | 2016-05-13 | 2018-09-14 | 河海大学 | 一种二氧化钛纳米微球及其制备方法和应用 |
KR101968403B1 (ko) * | 2016-05-31 | 2019-04-11 | 한양대학교 에리카산학협력단 | 열처리 방법, 및 질소 도핑된 금속 산화물 구조체 |
US10910679B2 (en) * | 2016-07-19 | 2021-02-02 | Uchicago Argonne, Llc | Photo-assisted fast charging of lithium manganese oxide spinel (LiMn2O4) in lithium-ion batteries |
CN108435125A (zh) * | 2018-05-17 | 2018-08-24 | 沈阳理工大学 | 一种自清洁陶瓷纤维绳的制备方法 |
Citations (2)
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EP1205245A1 (fr) * | 1999-08-05 | 2002-05-15 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Matiere catalytique et article photocatalytique |
JP2004000988A (ja) * | 1999-08-05 | 2004-01-08 | Toyota Central Res & Dev Lab Inc | 光触媒物質、光触媒体およびこれらの製造方法 |
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JP3221473B2 (ja) | 1994-02-03 | 2001-10-22 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
FR2738813B1 (fr) | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
DK0850203T3 (da) * | 1995-09-15 | 2001-01-29 | Rhodia Chimie Sa | Substrat med fotokatalytisk belægning på basis af titandioxid og organiske dispersioner på basis af titandioxid |
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EP0959154B1 (fr) | 1998-05-22 | 2010-04-21 | Shin-Etsu Handotai Co., Ltd | Plaquette épitaxiale de silicium monocristallin et procédé pour sa production |
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- 2009-05-13 WO PCT/US2009/043689 patent/WO2009148779A2/fr active Application Filing
- 2009-05-13 US US12/994,437 patent/US9120088B2/en not_active Expired - Fee Related
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EP1205245A1 (fr) * | 1999-08-05 | 2002-05-15 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Matiere catalytique et article photocatalytique |
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Also Published As
Publication number | Publication date |
---|---|
US20110301018A1 (en) | 2011-12-08 |
WO2009148779A2 (fr) | 2009-12-10 |
US9120088B2 (en) | 2015-09-01 |
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