WO2009147856A1 - Appareil d'usinage par électro-érosion et procédé d'usinage par électro-érosion - Google Patents

Appareil d'usinage par électro-érosion et procédé d'usinage par électro-érosion Download PDF

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Publication number
WO2009147856A1
WO2009147856A1 PCT/JP2009/002509 JP2009002509W WO2009147856A1 WO 2009147856 A1 WO2009147856 A1 WO 2009147856A1 JP 2009002509 W JP2009002509 W JP 2009002509W WO 2009147856 A1 WO2009147856 A1 WO 2009147856A1
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Prior art keywords
gap
voltage
electric discharge
discharge machining
workpiece
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PCT/JP2009/002509
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English (en)
Japanese (ja)
Inventor
高橋康徳
金子雄二
原田武則
土肥祐三
和賀井彰
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株式会社ソディック
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Priority to CN200980119002XA priority Critical patent/CN102046318B/zh
Publication of WO2009147856A1 publication Critical patent/WO2009147856A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H1/00—Electrical discharge machining, i.e. removing metal with a series of rapidly recurring electrical discharges between an electrode and a workpiece in the presence of a fluid dielectric
    • B23H1/10—Supply or regeneration of working media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00—Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/02—Wire-cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00—Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/34—Working media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00—Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/36—Supply or regeneration of working media

Definitions

  • the present invention relates to an electric discharge machining apparatus for machining a workpiece by supplying a dielectric liquid to a machining gap formed between a tool electrode and a conductive workpiece and applying a voltage pulse to the machining gap.
  • the present invention relates to an electric discharge machining apparatus for preventing electrical corrosion of a workpiece immersed in a water-based dielectric liquid (hereinafter simply referred to as “machining liquid”).
  • the electric discharge machining apparatus is used to manufacture a mold made of a hard material.
  • a mold is made of an iron-based alloy (hereinafter “steel”) or a cemented carbide.
  • a cemented carbide is an alloy obtained by sintering metal carbide powder.
  • a cemented carbide obtained by sintering tungsten carbide (WC) and cobalt (Co) as a binder is particularly well known.
  • Patent Document 1 discloses an external power supply method in which a work is connected to the negative side of an external power supply and an anticorrosion current is supplied to the work.
  • Patent Document 2 discloses that a working fluid is circulated through an anion exchange resin tower in which nitrite ions adsorbed to corrosive ions are fixed. In order to maintain the high specific resistance of the working fluid, at least one of carbonate ion, hydrogen carbonate ion and hydroxide ion is fixed to the anion exchange resin tower together with nitrite ion.
  • Patent Document 1 metal ions are eluted from the anode into the machining liquid and adhere to the workpiece surface. As a result, undesired corrosion and coloring may occur in the workpiece.
  • the anticorrosion method of Patent Document 2 is effective in preventing corrosion of a passivated metal such as steel.
  • nitrite ions can promote the corrosion of cemented carbide.
  • an electrical discharge machining apparatus that performs electrical discharge machining of a workpiece while supplying a machining fluid to a gap (9) formed between the workpiece (W) and a tool electrode (E). From a positive voltage pulse applied with a positive polarity in which the workpiece is a positive potential and the tool electrode is a negative potential, and a reverse polarity voltage pulse applied with a reverse polarity in which the workpiece is a negative potential and the tool electrode is a positive potential.
  • a power supply (20) for applying an alternating voltage pulse comprising: An average gap voltage setting device for setting an average voltage (Vmean) of the gap; And an adenine addition device (70) for adding adenine to the working fluid.
  • the average gap voltage setting device preferably sets the average gap voltage (Vmean) to the opposite polarity side. Thus, elution of the work material is prevented.
  • the average gap voltage setting device (50) may set the width of the positive polarity voltage pulse or the width of the reverse polarity voltage pulse.
  • the average gap voltage setting device (60) may set the width of the positive polarity voltage pulse or the width of the reverse polarity voltage pulse.
  • the average gap voltage (Vmean) is accurately set to the optimum value.
  • the average gap voltage setting device (60) may include a first shunt connected to the power supply (20) in parallel with the gap (9).
  • the first shunt includes a first diode (64) that passes current through the first shunt only when a positive voltage pulse is applied to the gap, and a first diode connected in series with the first diode. Switch (63).
  • the average gap voltage setting device (60) may further include a second shunt connected to the power supply device (20) in parallel with the gap (9).
  • the second shunt is a second diode (66) that passes current through the second shunt only when a reverse polarity voltage pulse is applied to the gap and a second switch connected in series with the second diode. (65).
  • the average gap voltage setting device preferably sets the average gap voltage (Vmean) according to the workpiece material such as WC-Co cemented carbide or steel.
  • an electric discharge machining method for performing electric discharge machining of a workpiece while supplying a machining fluid to a gap (9) formed between the workpiece (W) and a tool electrode (E) Setting an average voltage (Vmean) of the gap to a reverse polarity side in which the workpiece has a negative potential and the tool electrode has a positive potential; Adding adenine to the working fluid.
  • FIG. 2 is a circuit diagram showing the electric discharge machining apparatus of FIG.
  • FIG. 3 is a timing chart showing the operation of the NC apparatus of FIG.
  • FIG. 4 is a block diagram showing the machining fluid circulation system of FIG.
  • FIG. 5 is a diagram showing the corrosion inhibitor addition apparatus of FIG.
  • FIG. 6 is a diagram for explaining the anti-corrosion mechanism of adenine.
  • FIG. 7 is a block diagram showing the NC apparatus of FIG.
  • FIG. 8 is a flowchart showing the electric discharge machining method of the present invention.
  • FIG. 9 is a circuit diagram showing a second embodiment of the electric discharge machining apparatus of the present invention.
  • a wire electric discharge machining apparatus 1 of the present invention is shown in FIG.
  • a column 3 is erected from the rear part of the base 2.
  • a machining head 4 is mounted on the front surface of the column 3.
  • the processing tank 5 is placed on the front part of the base 2.
  • a work table 6 holding the work W is accommodated in the processing tank 5.
  • An upper guide assembly 7 is attached to the machining head 4, and a lower guide assembly 8 is attached to the front surface of the column 3.
  • the wire electrode E as a tool electrode travels vertically between the pair of guide assemblies 7 and 8, and a minute gap 9 is formed between the travel wire electrode E and the workpiece W.
  • the wire electrical discharge machining apparatus 1 includes a machining fluid circulation system 40 that supplies machining fluid to the gap 9.
  • the wire electric discharge machining apparatus 1 includes first and second power supply apparatuses 10 and 20 that supply power pulses to the gap 9.
  • the first power supply device 10 includes a DC power supply 11 and a switching transistor 12.
  • the negative terminal of the DC power source 11 is connected to the wire electrode E by an appropriate contact accommodated in the upper and lower guide assemblies 7 and 8.
  • the plus terminal of the DC power supply 11 is connected to the work W via the switching transistor 12.
  • the wire electrical discharge machining apparatus 1 includes a machining fluid circulation system 40 and an NC device 50 that controls the first and second power supply devices 10 and 20. The operation of the switching transistor 12 is controlled by the NC device 50.
  • the second power supply device 20 includes an 80V DC power supply 21 and a bridge circuit 22 including four switching transistors 81, 82, 83, and 84.
  • the switching transistors 81, 82, 83, and 84 are connected in series while forming four connection points A, B, C, and D between adjacent transistors.
  • a connection point A between the switching transistors 81 and 82 is connected to the negative terminal of the DC power supply 21.
  • a connection point B between the switching transistors 82 and 83 is connected to the work W via the cable 35.
  • a connection point C between the switching transistors 83 and 84 is connected to the plus terminal of the DC power supply 21 through the resistor 23, the diode 24 and the switch 25.
  • a connection point D between the switching transistors 84 and 81 is connected to the wire electrode E through the cable 34.
  • the operations of the switch 25 and the switching transistors 81, 82, 83 and 84 are controlled by the NC device 50.
  • the polarity in which the workpiece W has a positive potential and the wire electrode E has a negative potential is called positive polarity.
  • the polarity in which the workpiece W has a negative potential and the wire electrode E has a positive potential is called reverse polarity.
  • FIG. 3 shows the voltage (hereinafter referred to as “gap voltage”) Vgap between the workpiece W and the wire electrode E.
  • the NC device 50 opens the switch 25, turns on the switching transistors 81 and 83, and turns off the switching transistors 82 and 84. As a result, the voltage pulse of the DC power source 21 is applied to the gap 9 with a positive polarity.
  • the NC device 50 turns on the switching transistors 82 and 84 and turns off the switching transistors 81 and 83. Thus, the voltage pulse of the DC power supply 21 is applied to the gap 9 with the reverse polarity.
  • the NC device 50 turns on the switching transistors 81 and 83 again and turns off the switching transistors 82 and 84.
  • the second power supply device 20 repeatedly applies a voltage pulse whose polarity changes every pulse (hereinafter, “AC voltage pulse”) to the gap 9. it can.
  • the NC device 50 turns off the switch 25 and the switching transistors 81, 82, 83, and 84, and turns on the switching transistor 12.
  • the first power supply device 10 ends the voltage application
  • the second power supply device 20 starts to supply current to the gap 9.
  • the NC device 50 turns off the switching transistor 12, and the second power supply device 20 ends the current supply.
  • the first power supply device 10 starts to apply a voltage pulse to the gap 9 again.
  • the NC device 50 maintains the size of the gap 9 at a constant value by matching the integrated value of one voltage pulse hatched in FIG. 3 with the servo reference voltage SV.
  • a positive voltage pulse width ND, a reverse polarity voltage pulse width RD, an ON time ON / OFF time, and a servo reference voltage SV are set in the NC device 50.
  • the pulse widths ND and RD in FIG. 3 are set equal, and the average Vmean of the gap voltage Vgap is approximately 0V.
  • Reference numeral NV in FIG. 3 indicates a no-load voltage of a positive voltage pulse.
  • Reference sign RV indicates the no-load voltage of the reverse polarity voltage pulse.
  • the no-load voltage is a voltage when a voltage is applied to the gap 9 but no discharge is generated.
  • the average of the gap voltage Vgap can be changed by changing at least one of the pulse widths ND and RD.
  • the average of the gap voltage Vgap can be deflected to the positive polarity side by making the pulse width ND larger than the pulse width RD.
  • the pulse width RD By making the pulse width RD larger than the pulse width ND, the average of the gap voltage Vgap can be deflected to the opposite polarity side.
  • the second power supply device 20 further includes a 15V DC power supply 26 that supplies a series of AC voltage pulses to the gap 9 during non-machining.
  • the DC power supply 26 is connected to the gap 9 in parallel with the DC power supply 21.
  • the negative terminal of the DC power supply 26 is connected to the connection point A in the bridge circuit 22, and the positive terminal of the DC power supply 26 is connected to the connection point C in the bridge circuit 22 via the switch 29, the diode 28 and the resistor 27.
  • the output voltage of the DC power supply 26 is set to a value such that no discharge occurs in the gap 9 during non-machining, and is set smaller than the absolute value of the output voltage of the DC power supply 21.
  • the machining liquid supply system 40 stores the machining liquid discharged from the machining tank 5 in the septic tank 47.
  • the processing liquid in the septic tank 47 is clarified by the filtration filter 48 and stored in the fresh water tank 49.
  • the machining liquid supply system 40 maintains the pH, temperature, and specific resistance of the machining liquid at set values by the ion exchange resin 42 and the machining liquid temperature setting device 43. Further, the machining fluid supply system 40 supplies the machining fluid to which a predetermined amount of corrosion inhibitor is added to the machining tank 5 by the corrosion inhibitor addition device 70.
  • the corrosion inhibitor adding device 70 includes a pump 71 and a dissolution tank 72.
  • the corrosion inhibitor 77 is dissolved in the processing liquid.
  • a net-like partition 73 partitions the dissolution tank 72 into an upper part and a lower part.
  • the processing liquid in the fresh water tank 49 is supplied to the lower part of the dissolution tank 72 by the pump 71.
  • a powdery corrosion inhibitor 77 wrapped in a packaging material 76 is accommodated in the upper part of the dissolution tank 72.
  • the packaging material 76 is a water-permeable nonwoven fabric, for example.
  • the concentration of the corrosion inhibitor in the working fluid can be controlled by adjusting the discharge amount of the pump 71.
  • the corrosion inhibitor addition apparatus 70 adds powdered adenine (6-aminopurine) [CAS registration number 73-24-5] shown in Chemical formula 1 to the working fluid as a corrosion inhibitor.
  • metal ions such as copper ions are generated in the processing liquid from processing scraps and wire electrodes E.
  • Adenine reacts with a metal ion to form a metal complex as shown in Chemical Formula 2.
  • metal ions adhering to the surface of the workpiece W are reduced.
  • adenine forms a protective film 78 on the surface of the workpiece W, and has a certain effect on the oxidation and elution of the workpiece W.
  • the effect of adenine on the workpiece W is also exerted on equipment immersed in the machining liquid, for example, the machining liquid supply system 40 and the machining tank 5.
  • the elution of the workpiece W is reliably reduced by setting the average gap voltage Vmean according to the workpiece material, and the adhesion of metal ions to the workpiece W is reliably reduced by adding adenine to the machining fluid. Is done.
  • the NC device 50 functions as an average gap voltage setting device that sets the average gap voltage Vmean of the workpiece W to a desired value. As shown in FIG. 7, the NC device 50 includes an input device 51, a storage device 52, and a processing device 53.
  • the input device 51 includes, for example, a keyboard and a mouse, and an operator inputs information using the input device 51.
  • the storage device 52 is configured by a hard disk, a CD-ROM, or the like, and stores an NC program for executing electric discharge machining. Machining conditions such as workpiece material, ON time ON, OFF time OFF and servo reference voltage SV are described in the NC program.
  • the storage device 52 stores a data table including many combinations of parameters that determine the average gap voltage Vmean.
  • the data table includes at least the width ND of the positive voltage pulse and the width RD of the reverse polarity voltage pulse.
  • the data table further includes processing conditions such as workpiece material, power supply output voltage, ON time ON, OFF time OFF, and servo reference voltage SV.
  • the average gap voltage Vmean for preventing the elution of the workpiece W varies depending on the material of the workpiece W, and varies depending on the machining mode / non-machining mode.
  • the machining mode indicates a period during which the workpiece W is being machined
  • the non-machining mode indicates a period during which the machining of the workpiece W has been completed but is not being machined.
  • the processing device 53 includes a CPU and a memory, and controls electric discharge machining of the workpiece W based on an NC program and a data table.
  • the processing device 53 includes an adenine control module 54, a processing condition setting module 55, a pulse control module 56, and a discharge detection module 57.
  • the adenine control module 54 generates a control signal for setting the discharge amount of the pump 71 in order to control the adenine concentration in the working fluid.
  • the machining condition setting module 55 decodes the NC program and extracts the machining conditions described in the NC program. Further, the processing condition setting module 55 sets the width ND of the positive polarity voltage pulse and the width RD of the reverse polarity voltage pulse based on the extracted processing conditions and the data table.
  • the pulse control module 57 controls the power pulse supplied to the gap 9 according to the processing conditions.
  • the control signal of the pulse control module 57 is supplied to the switching transistor 12, the switch 25, and the switching transistors 81, 82, 83, and 84 during processing.
  • the control signal of the pulse control module 57 is supplied to the switch 29 during non-machining.
  • the gap voltage detection module 57 detects the gap voltage Vgap and detects the occurrence of discharge by comparing the gap voltage Vgap with an appropriate threshold value.
  • step S10 the operator fixes the workpiece W to the workpiece table 6 and fills the machining tank 5 with the machining fluid.
  • the operator inputs an optimum adenine concentration to the NC device 50 in order to prevent the workpiece W from being corroded.
  • the adenine control module 54 sets the discharge amount of the pump 71 according to the operator's input, and the corrosion inhibitor adding device 70 adds adenine to the working fluid.
  • step S20 the machining mode is set in the NC device 50.
  • step S21 the machining condition setting module 55 reads the NC program and sets machining conditions. Further, the machining condition setting module 55 sets an optimum average gap voltage Vmean based on the extracted machining conditions and the data table. Specifically, the optimum average gap voltage Vmean is determined by setting the width ND of the positive polarity voltage pulse and the width RD of the reverse polarity voltage pulse. When the workpiece material is WC—Co cemented carbide or steel, the average gap voltage Vmean is set to the opposite polarity side ( ⁇ side in FIG. 3).
  • step S22 the pulse control module 57 opens the switch 25 and controls the on / off switching operation of the switching transistors 81, 82, 83, and 84.
  • an AC voltage pulse is applied from the DC power source 21 to the gap 9.
  • the gap voltage detection module 57 compares the gap voltage Vgap with an appropriate threshold value in order to detect the occurrence of discharge.
  • step S24 the pulse control module 57 closes the switch 25, turns off the switching transistors 81, 82, 83, and 84, and turns on the switching transistor 12.
  • the application of the AC voltage pulse is completed, and the DC pulse is supplied from the DC power source 11 to the gap 9.
  • step S25 When the ON time ON reaches the set value in step S25, the process proceeds to step S26 and the OFF time starts.
  • step S26 the pulse control module 57 turns off the switching transistor 12, and the supply of the DC pulse is completed.
  • step S27 When the off time OFF reaches the set value in step S27, the process proceeds to step S28. If the processing is not completed in step S28, the process returns to step S22. In this way, the material of the workpiece W is removed by supplying a DC pulse from the DC power supply 11.
  • step S28 When machining is completed in step S28, the non-machining mode is set in the NC device 50 in step S30.
  • the machining condition setting module 55 sets the width ND of the positive polarity voltage pulse and the width RD of the reverse polarity voltage pulse so that the average gap voltage Vmean becomes an optimum value for preventing the elution of the workpiece W.
  • step S32 the pulse control module 57 opens the switch 29 and controls the on / off switching operation of the switching transistors 81, 82, 83, and 84.
  • the average gap voltage Vmean may be determined by setting no-load voltages NV and RV instead of the pulse widths ND and RD.
  • the average gap voltage Vmean is set to a value on the reverse polarity side when the material of the workpiece W is a WC—Co cemented carbide.
  • a no-load voltage setting circuit 60 that functions as an average gap voltage setting device is added to the wire electric discharge machining device.
  • the no-load voltage setting circuit 60 is disposed between the bridge circuit 22 and the gap 9 and is connected to the power supply device 20 in parallel with the gap 9.
  • the no-load voltage setting circuit 60 is a shunt for passing a current from the power supply device 20.
  • the no-load voltage setting circuit 60 can individually set the no-load voltage of the positive voltage pulse and the no-load voltage of the reverse polarity voltage pulse.
  • the no-load voltage setting circuit 60 includes a first shunt in which a switch 63, a variable resistor 67 and a diode 64 are connected in series, and a second shunt in which a switch 65, a variable resistor 68 and a diode 66 are connected in series. It consists of a shunt and a switch 61.
  • the first and second shunts are connected to the power supply device 20 in parallel with each other.
  • the diode 64 passes current through the first shunt only when a positive voltage pulse is applied to the gap 9.
  • the diode 66 passes current through the second shunt only when a reverse polarity voltage pulse is applied to the gap 9.
  • the switches 61 and 63 When the switches 61 and 63 are open, the no-load voltage NV decreases according to the resistance of the variable resistor 67. When the switches 61 and 65 are open, the no-load voltage RV decreases according to the resistance of the variable resistor 68.
  • the switches 61, 63 and 65 are controlled by the NC device 50.
  • Adenine used for the experiment is manufactured by KOHJIN Co., Ltd.
  • the working fluid was maintained at a pH of 6.5 to 7.5, a temperature of about 25 ° C., and a specific resistance of 5 ⁇ 10 4 ⁇ ⁇ cm to 1 ⁇ 10 5 ⁇ ⁇ cm.
  • the concentration of adenine was maintained between 10 mg / L and 1000 mg / L.
  • Brass wire electrodes were used.
  • the absolute value of the servo reference voltage SV was 10V to 50V.
  • the average gap voltage Vmean was set to ⁇ 2.0 V or less by lowering the no-load voltage NV of the positive voltage pulse to less than +80 V instead of lowering the pulse width ND. As a result, the elution of the work material was within an allowable range, and there was almost no adhesion of metal ions.
  • the average gap voltage Vmean was set to 0V by setting both the widths ND and RD of the voltage pulses to 10 ⁇ s. As a result, the elution of the work material was within an allowable range, and there was almost no adhesion of metal ions.
  • the average gap voltage Vmean was set to be larger than 0V and not more than + 2.0V. As a result, the elution of the work material was within an allowable range, and there was almost no adhesion of metal ions.
  • the steel workpiece was left in the machining fluid, and an AC voltage pulse was applied to the gap 9 from a 15 V DC power supply 26.
  • the average gap voltage Vmean was set to ⁇ 3.5V to ⁇ 4.5V by setting the width RD of the reverse polarity voltage pulse to 32 ⁇ s and reducing the width ND of the positive polarity voltage pulse to less than 32 ⁇ s. As a result, there was almost no elution of the work material or adhesion of metal ions.
  • the average gap voltage Vmean was set to 0V by setting both the voltage pulse widths ND and RD to 32 ⁇ s. As a result, the elution of the work material was within an allowable range, and there was almost no adhesion of metal ions.
  • the average gap voltage Vmean was set to + 2.5V to + 3.5V by setting the positive voltage pulse width RD to 32 ⁇ s and decreasing the reverse polarity voltage pulse width ND to less than 32 ⁇ s. As a result, the elution of the work material was within an allowable range, and there was almost no adhesion of metal ions.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

L'invention porte sur un appareil d'usinage par électro-érosion qui amène un fluide d'usinage aqueux à un espace d'usinage (9) formé entre une pièce usinée (W) constituée d'un alliage extra-dur WC-Co ou d'acier et une électrode d'outil (E) tout en effectuant un usinage par électro-érosion sur la pièce usinée. L'appareil d'usinage par électro-érosion comprend un dispositif d'alimentation électrique (20) pour appliquer une impulsion de tension alternative à l'espace d'usinage, un dispositif de réglage de tension d'espace moyenne (50) pour régler la tension moyenne d'espace d'usinage (Vmean) à la valeur optimale pour éviter une corrosion de la pièce usinée, et un dispositif d'ajout d'adénine (70) pour ajouter de l'adénine au fluide d'usinage de façon à adsorber des ions métalliques corrosifs.
PCT/JP2009/002509 2008-06-03 2009-06-03 Appareil d'usinage par électro-érosion et procédé d'usinage par électro-érosion WO2009147856A1 (fr)

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CN200980119002XA CN102046318B (zh) 2008-06-03 2009-06-03 放电加工装置以及放电加工方法

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JP2008145865 2008-06-03
JP2008-145865 2008-06-03

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WO2009147856A1 true WO2009147856A1 (fr) 2009-12-10

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US20140224859A1 (en) * 2012-02-29 2014-08-14 Sumitomo Electric Industries, Ltd. Coated rotary tool and method for manufacturing the same
US9193007B2 (en) 2012-02-29 2015-11-24 Sumitomo Electric Industries, Ltd. Coated rotary tool and method for manufacturing the same
TWI671151B (zh) * 2017-12-01 2019-09-11 財團法人金屬工業研究發展中心 電化學研削裝置及其導電研磨輪

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CN105081485A (zh) * 2015-09-28 2015-11-25 河南省大地合金股份有限公司 电火花加工用碳化钨合金细棒

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JPS6267184A (ja) * 1985-09-16 1987-03-26 ダブリュー・アール・グレイス・アンド・カンパニー−コネチカツト 防食組成物
WO2006126248A1 (fr) * 2005-05-23 2006-11-30 Mitsubishi Denki Kabushiki Kaisha Appareil de contrôle de qualité de liquide d’usinage, procédé idoine, et appareil d’usinage à décharge électrique

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JPS61192415A (ja) * 1985-02-22 1986-08-27 Inoue Japax Res Inc ワイヤカツト放電加工用電源装置
JPS61274812A (ja) * 1985-05-30 1986-12-05 Fanuc Ltd 水中での放電加工における加工面のさび防止加工方法
JPS6267184A (ja) * 1985-09-16 1987-03-26 ダブリュー・アール・グレイス・アンド・カンパニー−コネチカツト 防食組成物
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US20140224859A1 (en) * 2012-02-29 2014-08-14 Sumitomo Electric Industries, Ltd. Coated rotary tool and method for manufacturing the same
US9193007B2 (en) 2012-02-29 2015-11-24 Sumitomo Electric Industries, Ltd. Coated rotary tool and method for manufacturing the same
TWI671151B (zh) * 2017-12-01 2019-09-11 財團法人金屬工業研究發展中心 電化學研削裝置及其導電研磨輪

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