WO2009116578A1 - 太陽電池 - Google Patents
太陽電池 Download PDFInfo
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- WO2009116578A1 WO2009116578A1 PCT/JP2009/055310 JP2009055310W WO2009116578A1 WO 2009116578 A1 WO2009116578 A1 WO 2009116578A1 JP 2009055310 W JP2009055310 W JP 2009055310W WO 2009116578 A1 WO2009116578 A1 WO 2009116578A1
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- layer
- photoelectric conversion
- refractive index
- conversion unit
- solar cell
- Prior art date
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 212
- 239000000463 material Substances 0.000 claims abstract description 72
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 84
- 239000011787 zinc oxide Substances 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 31
- 229910003437 indium oxide Inorganic materials 0.000 claims description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 47
- 230000000052 comparative effect Effects 0.000 description 39
- 229910021417 amorphous silicon Inorganic materials 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 13
- 229910021419 crystalline silicon Inorganic materials 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 9
- 239000000969 carrier Substances 0.000 description 9
- 229910006404 SnO 2 Inorganic materials 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Inorganic materials [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- -1 tin oxide (SnO 2 ) Chemical class 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Definitions
- the present invention relates to a solar cell including a reflective layer that reflects a part of incident light.
- Solar cells are expected as a new energy source because they can directly convert light from the sun, which is a clean and inexhaustible energy source, into electricity.
- a solar cell absorbs light incident on a solar cell between a transparent electrode layer provided on the light incident side and a back electrode layer provided on the opposite side of the light incident side, and generates a photogenerated carrier.
- a photoelectric conversion unit to be generated is provided.
- a method in which a reflective layer that reflects a part of incident light is provided between a photoelectric conversion portion and a back electrode layer. According to this method, part of the light transmitted through the photoelectric conversion unit is reflected to the photoelectric conversion unit side by the reflective layer, so that the amount of light absorbed in the photoelectric conversion unit can be increased. As a result, the number of photogenerated carriers generated in the photoelectric conversion unit increases, so that the photoelectric conversion efficiency of the solar cell can be improved.
- zinc oxide which is a light-transmitting conductive material
- Michio Kondo et al. “Four terminal terminal cell analysis, amorphous layer / microcrystalline layer Si tandem cell”.
- the present invention has been made in view of the above situation, and an object thereof is to provide a solar cell capable of improving photoelectric conversion efficiency.
- the solar cell 10 includes a light-receiving surface electrode layer 2 having conductivity and translucency, a back electrode layer 4 having conductivity, the light-receiving surface electrode layer 2 and the back electrode layer 4.
- the laminate 3 is provided between the first photoelectric conversion unit 31 that generates a photogenerated carrier by the incidence of light, and the light transmitted through the first photoelectric conversion unit 31.
- a reflective layer 32 that partially reflects to the first photoelectric conversion unit 31 side, and the reflective layer 32 includes a low refractive index layer 32b including a refractive index adjusting material, the low refractive index layer 32b, and the first refractive index layer 32b.
- a contact layer 32a interposed between the photoelectric conversion unit 31 and the refractive index of the material constituting the refractive index adjusting material is lower than the refractive index of the material constituting the contact layer 32a,
- the refractive index of the low refractive index layer 32b is greater than the refractive index of the contact layer 32a.
- the reflective layer 32 since the reflective layer 32 includes the low refractive index layer 32b including the refractive index adjusting material, the reflective layer is more reflective than the conventional reflective layer mainly composed of ZnO or the like. The reflectance of 32 can be increased.
- the contact layer 32a is interposed between the low refractive index layer 32b and the first photoelectric conversion unit 31, the low refractive index layer 32b and the first photoelectric conversion unit 31 are in direct contact with each other. The increase in the series resistance (series resistance) value in the entire solar cell 10 can be suppressed. Therefore, the photoelectric conversion efficiency of the solar cell 10 can be improved.
- the photoelectric conversion unit 33 has a configuration in which the light receiving surface electrode layer 2 is sequentially stacked, and the reflection layer 32 is interposed between the low refractive index layer 32 b and the second photoelectric conversion unit 33.
- the refractive index of the material constituting the refractive index adjusting material is lower than the refractive index of the material constituting the other contact layer 32c, and the refractive index of the low refractive index layer 32b is further included.
- the gist is that the rate is lower than the refractive index of the other contact layer 32c.
- the contact layer 32a has a contact resistance value between the first photoelectric conversion unit 31 and the low refractive index layer 32b.
- the gist of the invention is that it is made of a material smaller than the contact resistance value with the conversion unit 31.
- the contact resistance value between the second contact layer 32c and the second photoelectric conversion unit 33 is the same as that of the low-refractive index layer 32b.
- the gist is that the two photoelectric conversion portions 33 are made of a material smaller than the contact resistance value.
- One feature of the present invention relates to the above-described feature of the present invention, and is summarized in that at least one of the contact layer 32a or the other contact layer 32c contains zinc oxide or indium oxide.
- a solar cell 10 is a solar cell 10 having a first solar cell element 10a and a second solar cell element 10a on a substrate 1 having insulating properties and translucency.
- Each of the 1 solar cell element 10a and the second solar cell element 10a includes a light receiving surface electrode layer 2 having conductivity and translucency, a back electrode layer 4 having conductivity, the light receiving surface electrode 2 layer, A laminated body 3 provided between the back electrode layer 4 and the laminated body 3.
- the laminated body 3 includes a first photoelectric conversion unit 31 that generates photogenerated carriers upon incidence of light, and the first photoelectric conversion unit 31.
- the first solar cell element 10a includes a reflective layer 32 that reflects part of the transmitted light to the first photoelectric conversion unit 31 side, and a second photoelectric conversion unit 33 that generates photogenerated carriers by the incidence of light.
- the back electrode layer 4 of the second solar cell element The extending portion 4a extends toward the light receiving surface electrode layer 2 of 10a, and the extending portion 4a is formed along the side surface of the stacked body 3 included in the first solar cell element 10a.
- the extending portion 4a is in contact with the reflective layer 32 exposed on the side surface of the stacked body 3 included in the first solar cell element 10a, and the reflective layer 32 includes a low refractive index adjusting material.
- Lower refractive index layer than the refractive index of the material The refractive index of 2b is summarized in that less than the refractive index of the refractive index and the other contact layer 32c of the contact layer 32a.
- FIG. 1 is a cross-sectional view of a solar cell 10 according to the first embodiment of the present invention.
- FIG. 2 is a cross-sectional view of the solar cell 10 according to the second embodiment of the present invention.
- FIG. 3 is a cross-sectional view of a solar cell 10 according to the third embodiment of the present invention.
- FIG. 4 is a cross-sectional view of a solar cell 10 according to the fourth embodiment of the present invention.
- FIG. 5 is a cross-sectional view of the solar cell 20 according to Comparative Example 1 and Comparative Example 2 of the present invention.
- FIG. 6 is a cross-sectional view of a solar cell 30 according to Comparative Example 3 of the present invention.
- FIG. 1 is a cross-sectional view of a solar cell 10 according to the first embodiment of the present invention.
- the solar cell 10 includes a substrate 1, a light-receiving surface electrode layer 2, a stacked body 3, and a back electrode layer 4.
- the substrate 1 has translucency and is made of a translucent material such as glass or plastic.
- the light-receiving surface electrode layer 2 is laminated on the substrate 1 and has conductivity and translucency.
- a metal oxide such as tin oxide (SnO 2 ), zinc oxide (ZnO), indium oxide (In 2 O 3 ), or titanium oxide (TiO 2 ) can be used. These metal oxides may be doped with fluorine (F), tin (Sn), aluminum (Al), iron (Fe), gallium (Ga), niobium (Nb), or the like.
- the laminate 3 is provided between the light-receiving surface electrode layer 2 and the back electrode layer 4.
- the stacked body 3 includes a first photoelectric conversion unit 31 and a reflective layer 32.
- the 1st photoelectric conversion part 31 and the reflection layer 32 are laminated
- the first photoelectric conversion unit 31 generates photogenerated carriers by light incident from the light receiving surface electrode layer 2 side. In addition, the first photoelectric conversion unit 31 generates photogenerated carriers by the light reflected from the reflective layer 32.
- the first photoelectric conversion unit 31 has a pin junction in which a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor are stacked from the substrate 1 side (not shown). .
- the reflective layer 32 reflects a part of the light transmitted through the first photoelectric conversion unit 31 to the first photoelectric conversion unit 31 side.
- the reflective layer 32 includes a first layer 32a and a second layer 32b.
- the first layer 32a and the second layer 32b are sequentially stacked from the first photoelectric conversion unit 31 side. Therefore, the first layer 32 a is in contact with the first photoelectric conversion unit 31, and the second layer 32 b is not in contact with the first photoelectric conversion unit 31.
- the second layer 32b includes a binder made of resin or the like, a translucent conductive material, and a refractive index adjusting material.
- Silica or the like can be used as the binder.
- the light-transmitting conductive material ZnO, ITO, or the like can be used.
- the refractive index adjusting material a material having a refractive index lower than that of the first layer 32a is used.
- the refractive index adjusting material it is possible to use air bubbles or fine particles composed of SiO 2 , Al 2 O 3 , MgO, CaF 2 , NaF, CaO, LiF, MgF 2 , SrO, B 2 O 3 or the like. it can.
- the second layer 32b for example, a layer containing ITO particles and bubbles in a silica-based binder can be used.
- the refractive index of the second layer 32b as a whole is lower than the refractive index of the first layer 32a.
- the first layer 32a a material having a contact resistance value between the first photoelectric conversion unit 31 and a material constituting the second layer 32b and a contact resistance value between the first photoelectric conversion unit 31 is used. It is done.
- the material constituting the first layer 32a is such that the contact resistance (contact resistance) value between the first photoelectric conversion unit 31 and the first layer 32a directly contacts the first photoelectric conversion unit 31 and the second layer 32b.
- the contact resistance value is preferably selected to be less than the contact resistance value.
- the first layer 32a for example, ZnO, ITO or the like can be used.
- the first layer 32a corresponds to the “contact layer” of the present invention.
- the second layer 32b corresponds to the “low refractive index layer” of the present invention.
- the material constituting the first layer 32a is selected so that the resistance value at both ends of the stacked body 3 including the first layer 32a is smaller than the resistance value at both ends of the stacked body 3 not including the first layer 32a. It is preferred that
- the back electrode layer 4 has conductivity.
- the back electrode layer may have a configuration in which a layer containing ZnO and a layer containing Ag are stacked from the stacked body 3 side. Further, the back electrode layer 4 may have only a layer containing Ag.
- the reflective layer 32 is based on the second layer 32b including the refractive index adjusting material, and the contact resistance value between the second layer 32b and the first photoelectric conversion unit 31.
- the first layer 32a made of a material having a small contact resistance value with respect to the first photoelectric conversion unit 31.
- the first layer 32a and the second layer 32b are sequentially stacked from the first photoelectric conversion unit 31 side.
- the photoelectric conversion efficiency of the solar cell 10 can be improved. This effect will be described in detail below.
- the second layer 32b included in the reflective layer 32 is composed of a material having a refractive index lower than that of ZnO that has been conventionally used as the main body of the reflective layer. Includes refractive index adjusting material.
- the refractive index of the second layer 32b as a whole is lower than the refractive index of the layer made of ZnO. Therefore, by including such a second layer 32b in the reflective layer 32, the reflectance of the reflective layer 32 can be increased as compared with the conventional reflective layer mainly composed of ZnO.
- the second layer containing the refractive index adjusting material. 32 b comes into direct contact with the first photoelectric conversion unit 31. Since the contact resistance value between the second layer 32b containing the refractive index adjusting material and the first photoelectric conversion unit 31 mainly composed of silicon is very high, the second layer 32b directly contacts the first photoelectric conversion unit 31. In the case of contact, the series resistance (series resistance) value in the entire solar cell 10 increases. Accordingly, the short-circuit current generated in the solar cell 10 increases as the reflectance of the reflective layer 32 is increased. On the other hand, the fill factor (FF) of the solar cell 10 decreases as the series resistance value increases. Therefore, it is not possible to sufficiently improve the photoelectric conversion efficiency of the solar cell 10.
- FF fill factor
- the first layer 32a and the second layer 32b are sequentially stacked from the first photoelectric conversion unit 31 side, whereby the second layer 32b including the refractive index adjusting material.
- direct contact with the first photoelectric conversion unit 31 is avoided.
- the photoelectric conversion efficiency of the solar cell 10 can be improved.
- the stacked body 3 includes a first photoelectric conversion unit 31 and a reflective layer 32.
- the laminated body 3 has the structure containing the 2nd photoelectric conversion part 33 in addition to the 1st photoelectric conversion part 31 and the reflection layer 32, and what is called a tandem structure.
- FIG. 2 is a cross-sectional view of the solar cell 10 according to the second embodiment of the present invention.
- the solar cell 10 includes a substrate 1, a light-receiving surface electrode layer 2, a stacked body 3, and a back electrode layer 4.
- the laminate 3 is provided between the light-receiving surface electrode layer 2 and the back electrode layer 4.
- the stacked body 3 includes a first photoelectric conversion unit 31, a reflective layer 32, and a second photoelectric conversion unit 33.
- the first photoelectric conversion unit 31, the second photoelectric conversion unit 33, and the reflection layer 32 are sequentially stacked from the light receiving surface electrode layer 2 side.
- the first photoelectric conversion unit 31 generates photogenerated carriers by light incident from the light receiving surface electrode layer 2 side.
- the first photoelectric conversion unit 31 has a pin junction in which a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor are stacked from the substrate 1 side (not shown). .
- the reflection layer 32 reflects a part of the light incident from the first photoelectric conversion unit 31 side to the first photoelectric conversion unit 31 side.
- the reflective layer 32 includes a first layer 32a and a second layer 32b. The first layer 32a and the second layer 32b are sequentially stacked from the first photoelectric conversion unit 31 side. Accordingly, the first layer 32 a is in contact with the second photoelectric conversion unit 33, and the second layer 32 b is not in contact with the second photoelectric conversion unit 33.
- the second photoelectric conversion unit 33 generates a photogenerated carrier by incident light.
- the second photoelectric conversion unit 33 has a pin junction in which a p-type crystalline silicon semiconductor, an i-type crystalline silicon semiconductor, and an n-type crystalline silicon semiconductor are stacked from the substrate 1 side (not shown).
- the first layer 32a and the second layer 32b included in the reflective layer 32 are sequentially stacked from the first photoelectric conversion unit 31 side.
- the reflectance of the reflective layer 32 can be increased while suppressing an increase in the series resistance value in the entire solar cell 10. Therefore, the photoelectric conversion efficiency of the solar cell 10 can be improved.
- the stacked body 3 includes a first photoelectric conversion unit 31 and a reflective layer 32.
- the laminated body 3 has the structure containing the 2nd photoelectric conversion part 33 in addition to the 1st photoelectric conversion part 31 and the reflection layer 32, and what is called a tandem structure.
- the reflective layer 32 includes a third layer 32c in addition to the first layer 32a and the second layer 32b.
- FIG. 3 is a cross-sectional view of the solar cell 10 according to the third embodiment of the present invention.
- the solar cell 10 includes a substrate 1, a light-receiving surface electrode layer 2, a stacked body 3, and a back electrode layer 4.
- the laminate 3 is provided between the light-receiving surface electrode layer 2 and the back electrode layer 4.
- the stacked body 3 includes a first photoelectric conversion unit 31, a reflective layer 32, and a second photoelectric conversion unit 33.
- the first photoelectric conversion unit 31, the reflection layer 32, and the second photoelectric conversion unit 33 are sequentially stacked from the light receiving surface electrode layer 2 side.
- the first photoelectric conversion unit 31 generates photogenerated carriers by light incident from the light receiving surface electrode layer 2 side. In addition, the first photoelectric conversion unit 31 generates photogenerated carriers by the light reflected from the reflective layer 32.
- the first photoelectric conversion unit 31 has a pin junction in which a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor are stacked from the substrate 1 side (not shown). .
- the reflective layer 32 reflects a part of the light transmitted through the first photoelectric conversion unit 31 to the first photoelectric conversion unit 31 side.
- the reflective layer 32 includes a first layer 32a, a second layer 32b, and a third layer 32c.
- the first layer 32a, the second layer 32b, and the third layer 32c are sequentially stacked from the first photoelectric conversion unit 31 side. Therefore, the first layer 32 a is in contact with the first photoelectric conversion unit 31, and the third layer 32 c is in contact with the second photoelectric conversion unit 33. The second layer 32 b is not in contact with either the first photoelectric conversion unit 31 or the second photoelectric conversion unit 33.
- the second layer 32b includes a binder made of resin or the like, a translucent conductive material, and a refractive index adjusting material.
- Silica or the like can be used as the binder.
- the light-transmitting conductive material ZnO, ITO, or the like can be used.
- the refractive index adjusting material a material having a refractive index lower than the refractive index of the first layer 32a and the refractive index of the third layer 32c is used.
- the refractive index adjusting material it is possible to use air bubbles or fine particles composed of SiO 2 , Al 2 O 3 , MgO, CaF 2 , NaF, CaO, LiF, MgF 2 , SrO, B 2 O 3 or the like. it can. Therefore, as the second layer 32b, for example, a layer containing ITO particles and bubbles in a silica-based binder can be used.
- the refractive index of the second layer 32b as a whole is lower than the refractive index of the first layer 32a and the refractive index of the third layer 32c.
- the first layer 32a is mainly composed of a material having a contact resistance value between the first photoelectric conversion unit 31 and a contact resistance value between the material constituting the second layer 32b and the first photoelectric conversion unit 31.
- a material having a contact resistance value between the second photoelectric conversion unit 33 and a contact resistance value between the material constituting the second layer 32b and the first photoelectric conversion unit 31 is smaller. Is used as the subject.
- the material constituting the first layer 32a is a contact when the contact resistance value between the first photoelectric conversion unit 31 and the first layer 32a directly contacts the first photoelectric conversion unit 31 and the second layer 32b. It is preferable to select such that it is less than the resistance value.
- the material constituting the third layer 32c is a contact resistance value between the third layer 32c and the second photoelectric conversion unit 33 when the second layer 32b and the second photoelectric conversion unit 33 are in direct contact with each other. It is preferable to select such that it is less than the resistance value.
- the material constituting the first layer 32a and the material constituting the third layer 32c are such that the resistance values at both ends of the stacked body 3 including the first layer 32a and the third layer 32c are the first layer 32a and the third layer. It is preferably selected so as to be smaller than the resistance values at both ends of the laminate 3 not including 32c.
- the first layer 32a or the third layer 32c for example, ZnO, ITO or the like can be used.
- the material which comprises the 1st layer 32a, and the material which comprises the 3rd layer 32c may be the same, and may differ.
- the third layer 32c corresponds to “another contact layer” of the present invention.
- the second photoelectric conversion unit 33 generates a photogenerated carrier by incident light.
- the second photoelectric conversion unit 33 has a pin junction in which a p-type crystalline silicon semiconductor, an i-type crystalline silicon semiconductor, and an n-type crystalline silicon semiconductor are stacked from the substrate 1 side (not shown).
- the reflective layer 32 includes a second layer 32b including a refractive index adjusting material, and a contact resistance value between the second layer 32b and the first photoelectric conversion unit 31.
- the first photoelectric conversion unit 31 has a lower contact resistance value between the first photoelectric conversion unit 31 and the second photoelectric conversion unit than the contact resistance value between the second layer 32b and the second photoelectric conversion unit 33.
- a third layer 32a made of a material having a small contact resistance value between the first and second layers. The first layer 32a, the second layer 32b, and the third layer 32c are sequentially stacked from the first photoelectric conversion unit 31 side. Therefore, the second layer 32 b including the refractive index adjusting material is not in contact with either the first photoelectric conversion unit 31 or the second photoelectric conversion unit 33.
- the reflective layer 32 including the second layer 32b including the refractive index adjusting material is less likely to absorb light in a long wavelength region (around 1000 nm) than a conventional reflective layer mainly composed of ZnO. Therefore, the amount of light absorbed by the second photoelectric conversion unit 33 can be increased. Therefore, the photoelectric conversion efficiency of the solar cell 10 can be improved.
- the solar cell 10 includes the substrate 1, the light receiving surface electrode layer 2, the stacked body 3, and the back electrode layer 4.
- the solar cell 10 is equipped with the several solar cell element 10a provided with the light-receiving surface electrode layer 2, the laminated body 3, and the back surface electrode layer 4 on the board
- FIG. 4 is a cross-sectional view of a solar cell 10 according to the fourth embodiment of the present invention.
- the solar cell 10 includes a substrate 1 and a plurality of solar cell elements 10a.
- Each of the plurality of solar cell elements 10a is formed on the substrate 1.
- the plurality of solar cell elements 10a each include a light-receiving surface electrode layer 2, a stacked body 3, and a back electrode layer 4.
- the laminate 3 is provided between the light-receiving surface electrode layer 2 and the back electrode layer 4.
- the stacked body 3 includes a first photoelectric conversion unit 31, a reflective layer 32, and a second photoelectric conversion unit 33.
- the reflective layer 32 includes a first layer 32a, a second layer 32b, and a third layer 32c.
- the first layer 32a, the second layer 32b, and the third layer 32c are sequentially stacked from the first photoelectric conversion unit 31 side. Therefore, the first layer 32 a is in contact with the first photoelectric conversion unit 31, and the third layer 32 c is in contact with the second photoelectric conversion unit 33.
- the second layer 32 b is not in contact with either the first photoelectric conversion unit 31 or the second photoelectric conversion unit 33.
- the thickness of the first layer 32a and the third layer 32c is preferably as small as possible.
- the back electrode layer 4 has an extending portion 4a extending toward the light receiving surface electrode layer 2 of another solar cell element 10a adjacent to one solar cell element 10a included in the plurality of solar cell elements 10a.
- the extended portion 4a is formed along the side surface of the stacked body 3 included in one solar cell element 10a.
- the extending portion 4a is in contact with the reflective layer 32 exposed on the side surface of the stacked body 3 included in one solar cell element 10a.
- ZnO which has been conventionally used as the main component of the reflective layer, has a sheet resistance value of about 1.0 ⁇ 10 2 to 5.0 ⁇ 10 2 ⁇ / ⁇ . Therefore, when a conventional reflective layer mainly composed of ZnO is used, a part of the current generated in the solar cell element 10a flows along the reflective layer to the extending portion 4a and a leak current is generated. When such a leakage current increases in each of the plurality of solar cell elements 10a, the fill factor (FF) of the solar cell 10 decreases.
- the sheet resistance value of the second layer 32b including the refractive index adjusting material is 1.0 ⁇ 10 6 ⁇ / ⁇ or more. Therefore, in the solar cell 10 according to the fourth embodiment of the present invention, the second layer 32b including the refractive index adjusting material is included in the reflective layer 32, so that the sheet resistance value in the reflective layer 32 is mainly composed of ZnO.
- the sheet resistance value of the reflective layer can be significantly higher. Therefore, in the solar cell 10 according to the fourth embodiment of the present invention, it is possible to suppress the current generated in the solar cell element 10a from reaching the extending portion 4a along the reflective layer 32.
- the reflective layer 32 including the second layer 32b a decrease in the fill factor (FF) of the solar cell 10 can be suppressed as compared with the case where a conventional reflective layer mainly composed of ZnO is used. From the above, the photoelectric conversion efficiency of the solar cell 10 can be improved.
- the first layer 32a reduces the contact resistance value between the second layer 32b (low refractive index layer) and the first photoelectric conversion unit 31, and the third layer 32c (other contact layer). Is to reduce the contact resistance value between the second layer 32b (low refractive index layer) and the second photoelectric conversion unit 33, so that the thickness of the first layer 32a and the third layer 32c is reduced. Can do.
- the sheet resistance value of the first layer 32a can be increased.
- the thickness of the third layer 32c is reduced, the sheet resistance value of the third layer 32c can be increased.
- the contact resistance value between the second layer 32b (low refractive index layer) and the first photoelectric conversion unit 31 can be sufficiently reduced.
- the contact resistance value between the second layer 32b (low refractive index layer) and the first photoelectric conversion unit 31 can be sufficiently reduced. Therefore, by reducing the thickness of the first layer 32a and the third layer 32c as much as possible, it is possible to reduce the leakage current flowing to the extending portion 4a along the first layer 32a and the third layer 32c.
- the photoelectric conversion part contained in the laminated body 3 is one (1st photoelectric conversion part 31), and it is contained in the laminated body 3 in 2nd Embodiment and 3rd Embodiment.
- the laminate 3 may include three or more photoelectric conversion units.
- the reflective layer 32 can be provided between any two adjacent photoelectric conversion units.
- the first photoelectric conversion unit 31 includes a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor stacked from the substrate 1 side.
- the present invention is not limited to this.
- the first photoelectric conversion unit 31 has a pin junction in which a p-type crystalline silicon semiconductor, an i-type crystalline silicon semiconductor, and an n-type crystalline silicon semiconductor are stacked from the substrate 1 side. May be.
- crystalline silicon includes microcrystalline silicon and polycrystalline silicon.
- the first photoelectric conversion unit 31 and the second photoelectric conversion unit 33 have pin junctions, but are not limited to this. Specifically, even if at least one of the first photoelectric conversion unit 31 and the second photoelectric conversion unit 33 has a pn junction in which a p-type silicon semiconductor and an n-type silicon semiconductor are stacked from the substrate 1 side. Good.
- the solar cell 10 has a configuration in which the light-receiving surface electrode layer 2, the stacked body 3, and the back electrode layer 4 are sequentially stacked on the substrate 1.
- the present invention is not limited to this.
- the solar cell 10 may have a configuration in which the back electrode layer 4, the stacked body 3, and the light receiving surface electrode layer 2 are sequentially stacked on the substrate 1.
- the solar cell according to the present invention will be specifically described with reference to examples.
- the present invention is not limited to those shown in the following examples, and can be implemented with appropriate modifications within a range not changing the gist thereof.
- the refractive index of a layer (hereinafter referred to as bubble-containing ITO layer) containing ITO particles (translucent conductive material) and bubbles (refractive index adjusting material) in a silica-based binder, and conventionally used as the main component of the reflective layer. Comparison was made with the refractive indexes of the ZnO layer and the ITO layer.
- a bubble-containing ITO layer was first prepared by a spin coating method using a dispersion obtained by mixing ITO fine particles and a silica-based binder in an alcohol solvent. At this time, bubbles were included in the dispersion by mechanically stirring the dispersion just before being used in the spin coating method.
- ITO fine particles ITO fine particles (SUFP) manufactured by Sumitomo Metal Mining with an average particle diameter of 20 to 40 nm were used.
- the mixing ratio of the silica binder was 10 to 15% by volume with respect to the ITO fine particles.
- Table 1 shows the measurement results of the refractive index of the bubble-containing ITO layer.
- the refractive index of the ZnO layer and the ITO layer is about 2.0. Therefore, as shown in Table 1, it was confirmed that the refractive index of the bubble-containing ITO layer was lower than the refractive indexes of the ZnO layer and the ITO layer. Therefore, the reflectance of the reflective layer can be increased by including the bubble-containing ITO layer in the reflective layer.
- Example 1 The solar cell 10 according to Example 1 was produced as follows. First, an SnO 2 layer (light-receiving surface electrode layer 2) was formed on a glass substrate (substrate 1) having a thickness of 4 mm.
- a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor are formed on the SnO 2 layer (light-receiving surface electrode layer 2) using a plasma CVD method.
- the first cell (first photoelectric conversion unit 31) was formed by stacking.
- the thicknesses of the p-type amorphous silicon semiconductor, the i-type amorphous silicon semiconductor, and the n-type amorphous silicon semiconductor were 15 nm, 200 nm, and 30 nm, respectively.
- an intermediate reflection layer was formed on the first cell (first photoelectric conversion unit 31) by using a sputtering method and a spin coating method. Specifically, a ZnO layer (first layer 32a) formed by sputtering, a bubble-containing ITO layer (second layer 32b) formed by spin coating, and a ZnO layer (third layer) formed by sputtering. 32c) were sequentially stacked on the first cell (first photoelectric conversion unit 31). As a result, an intermediate reflective layer (reflective layer 32) having a three-layer structure was formed. The thicknesses of the ZnO layer (first layer 32a), the bubble-containing ITO layer (second layer 32b), and the ZnO layer (third layer 32c) were 5 nm, 20 nm, and 5 nm, respectively.
- a p-type microcrystalline silicon semiconductor, an i-type microcrystalline silicon semiconductor, and an n-type microcrystalline silicon semiconductor are stacked on the intermediate reflective layer (reflective layer 32) using a plasma CVD method.
- a cell (second photoelectric conversion unit 33) was formed.
- the thicknesses of the p-type microcrystalline silicon semiconductor, the i-type microcrystalline silicon semiconductor, and the n-type microcrystalline silicon semiconductor were 30 nm, 2000 nm, and 20 nm, respectively.
- a ZnO layer and an Ag layer were formed on the second cell (second photoelectric conversion unit 33) by sputtering.
- the thicknesses of the ZnO layer and the Ag layer (back electrode layer 4) were 90 nm and 200 nm, respectively.
- Example 1 As described above, in Example 1, as shown in FIG. 3, the bubble-containing ITO layer (first photoelectric conversion unit 31) is interposed between the first cell (first photoelectric conversion unit 31) and the second cell (second photoelectric conversion unit 33).
- a ZnO layer (first layer 32a) is interposed between the bubble-containing ITO layer (second layer 32b) and the first cell (first photoelectric conversion unit 31), and the bubble-containing ITO layer (second layer 32b).
- a ZnO layer (third layer 32c) between the first cell and the second cell (second photoelectric conversion unit 33).
- the solar cell 20 according to Comparative Example 1 was produced as follows. First, as in Example 1 above, a SnO 2 layer (light-receiving surface electrode layer 22) and a first cell (first photoelectric conversion unit 231) were sequentially formed on a glass substrate (substrate 21) having a thickness of 4 mm.
- an intermediate reflective layer (reflective layer 232) was formed on the first cell (first photoelectric conversion unit 231) by sputtering.
- first cell first photoelectric conversion unit 231
- ZnO layer was used as the intermediate reflection layer (reflection layer 232).
- the thickness of the ZnO layer (reflection layer 232) was 30 nm.
- Example 2 the second cell (second photoelectric conversion unit 233), the ZnO layer, and the Ag layer (back electrode layer 24) were sequentially formed on the intermediate reflective layer (reflective layer 232).
- the thicknesses of the first cell (first photoelectric conversion unit 231), the second cell (second photoelectric conversion unit 233), the ZnO layer, and the Ag layer (back electrode layer 24) are the same as in Example 1 above. did.
- the ZnO layer is formed between the first cell (first photoelectric conversion unit 231) and the second cell (second photoelectric conversion unit 233).
- a solar cell 20 having an intermediate reflective layer (reflective layer 232) was formed.
- a solar cell 20 according to Comparative Example 2 was produced as follows. First, as in Example 1 above, a SnO 2 layer (light-receiving surface electrode layer 22) and a first cell (first photoelectric conversion unit 231) were sequentially formed on a glass substrate (substrate 21) having a thickness of 4 mm.
- an intermediate reflective layer (reflective layer 232) was formed on the first cell (first photoelectric conversion unit 231) by sputtering.
- first cell first photoelectric conversion unit 231
- second photoelectric conversion unit 231 only the bubble-containing ITO layer was formed on the first cell (first photoelectric conversion unit 231), and the bubble-containing ITO layer was used as an intermediate reflection layer (reflection layer 232).
- the thickness of the bubble-containing ITO layer (reflective layer 232) was 30 nm.
- Example 2 the second cell (second photoelectric conversion unit 233), the ZnO layer, and the Ag layer (back electrode layer 24) were sequentially formed on the intermediate reflective layer (reflective layer 232).
- the thicknesses of the first cell (first photoelectric conversion unit 231), the second cell (second photoelectric conversion unit 233), the ZnO layer, and the Ag layer (back electrode layer 24) are the same as in Example 1 above. did.
- the bubble-containing ITO layer is formed between the first cell (first photoelectric conversion unit 231) and the second cell (second photoelectric conversion unit 233).
- the solar cell 20 having the intermediate reflective layer (reflective layer 232) to be formed was formed.
- Comparative Example 2 As shown in Table 2, it was confirmed that in Comparative Example 2, the short circuit current was slightly increased compared to Comparative Example 1, but the curve factor was lower than that of Comparative Example 1. In Comparative Example 2, it was confirmed that the photoelectric conversion efficiency was lower than that in Comparative Example 1 as a result.
- the increase in the short-circuit current is considered to be because in the solar cell 20 according to Comparative Example 2, the intermediate reflective layer (reflective layer 232) is composed of the bubble-containing ITO layer having a refractive index lower than that of the ZnO layer. .
- the bubble-containing ITO layer constituting the intermediate reflective layer (reflective layer 232) is the first cell (first photoelectric conversion unit 231) and the first. It is considered that the series resistance value in the solar cell 20 according to Comparative Example 2 increased because the two cells (second photoelectric conversion unit 233) were in direct contact. In Comparative Example 2, it is considered that the photoelectric conversion efficiency is lower than that of Comparative Example 1 because the degree of reduction of the fill factor is large.
- Example 1 it was confirmed that the short-circuit current increased compared to Comparative Example 1 although the curve factor slightly decreased compared to Comparative Example 1. As a result, in Example 1, it was confirmed that the photoelectric conversion efficiency can be improved as compared with Comparative Example 1.
- Example 2 The solar cell 10 according to Example 2 was produced as follows. First, an SnO 2 layer (light-receiving surface electrode layer 2) was formed on a glass substrate (substrate 1) having a thickness of 4 mm.
- a p-type amorphous silicon semiconductor, an i-type amorphous silicon semiconductor, and an n-type amorphous silicon semiconductor are formed on the SnO 2 layer (light-receiving surface electrode layer 2) using a plasma CVD method.
- the first cell (first photoelectric conversion unit 31) was formed by stacking.
- the thicknesses of the p-type amorphous silicon semiconductor, i-type amorphous silicon semiconductor, and n-type amorphous silicon semiconductor were 15 nm, 360 nm, and 30 nm, respectively.
- a p-type microcrystalline silicon semiconductor, an i-type microcrystalline silicon semiconductor, and an n-type microcrystalline silicon semiconductor are stacked on the first cell (first photoelectric conversion unit 31) using a plasma CVD method.
- the 2nd cell (2nd photoelectric conversion part 33) was formed.
- the thicknesses of the p-type microcrystalline silicon semiconductor, the i-type microcrystalline silicon semiconductor, and the n-type microcrystalline silicon semiconductor were 30 nm, 2000 nm, and 20 nm, respectively.
- an intermediate reflective layer (reflective layer 32) was formed on the second cell (second photoelectric conversion unit 33) by using a sputtering method and a spin coat method.
- an ITO layer (first layer 32a) formed by a sputtering method and a bubble-containing ITO layer (second layer 32b) formed by a spin coating method are formed in a second cell (second photoelectric conversion unit 33). Laminated sequentially on top. This formed the back surface reflection layer (reflection layer 32) which has a two-layer structure.
- the thickness of the ITO layer (first layer 32a) and the bubble-containing ITO layer (second layer 32b) was 45 nm.
- an Ag layer (back electrode layer 4) was formed on the back reflective layer (reflective layer 32) by sputtering.
- the thickness of the Ag layer (back electrode layer 4) was 200 nm.
- Example 1 As described above, in Example 1, as shown in FIG. 2, the bubble-containing ITO layer (second layer 32b) is interposed between the second cell (second photoelectric conversion unit 33) and the Ag layer (back electrode layer 4). ) Including the back surface reflection layer (reflection layer 32). Further, the ITO layer (first layer 32a) was interposed between the bubble-containing ITO layer (second layer 32b) and the second cell (second photoelectric conversion unit 33).
- a solar cell 30 according to Comparative Example 3 was produced as follows. First, as in Example 2 above, a SnO 2 layer (light-receiving surface electrode layer 32), a first cell (first photoelectric conversion unit 331), a second cell (on a 4 mm thick glass substrate (substrate 31)) Second photoelectric conversion portions 333) were sequentially formed.
- a back reflective layer (reflective layer 332) was formed on the second cell (second photoelectric conversion unit 333) by sputtering.
- the ZnO layer was formed on the second cell (second photoelectric conversion unit 333), and the ZnO layer was used as the back surface reflection layer (reflection layer 332).
- the thickness of the ZnO layer (reflective layer 332) was 90 nm.
- an Ag layer (back electrode layer 34) was formed on the back reflection layer (reflection layer 332).
- the thicknesses of the first cell (first photoelectric conversion unit 331), the second cell (second photoelectric conversion unit 333), and the Ag layer (back electrode layer 34) were the same as in Example 2 above.
- the back surface reflection layer (ZnO layer) is formed between the second cell (second photoelectric conversion unit 333) and the Ag layer (back electrode layer 34).
- a solar cell 10 having a reflective layer 332) was formed.
- Example 2 As shown in Table 3, it was confirmed that in Example 2, the curve factor slightly decreased as compared with Comparative Example 1, but the short-circuit current increased compared with Comparative Example 3. As a result, in Example 2, it was confirmed that the photoelectric conversion efficiency can be improved as compared with Comparative Example 3.
- a solar cell with improved photoelectric conversion efficiency can be provided, which is useful in the photovoltaic power generation field.
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Abstract
Description
〈太陽電池の構成〉
以下において、本発明の第1実施形態に係る太陽電池の構成について、図1を参照しながら説明する。図1は、本発明の第1実施形態に係る太陽電池10の断面図である。
本発明の第1実施形態に係る太陽電池10において、反射層32は、屈折率調整材を含む第2層32bと、第2層32bと第1光電変換部31との間のコンタクト抵抗値よりも第1光電変換部31との間のコンタクト抵抗値が小さい材料からなる第1層32aとを含む。第1層32a及び第2層32bは、第1光電変換部31側から順に積層される。
以下において、本発明の第2実施形態について説明する。尚、以下においては、上述した第1実施形態と第2実施形態との差異について主として説明する。
以下において、本発明の第2実施形態に係る太陽電池の構成について、図2を参照しながら説明する。
本発明の第2実施形態に係る太陽電池10によれば、反射層32に含まれる第1層32a及び第2層32bが、第1光電変換部31側から順に積層される。
以下において、本発明の第3実施形態について説明する。尚、以下においては、上述した第1実施形態と第3実施形態との差異について主として説明する。
以下において、本発明の第3実施形態に係る太陽電池の構成について、図3を参照しながら説明する。
本発明の第3実施形態に係る太陽電池10において、反射層32は、屈折率調整材を含む第2層32bと、第2層32bと第1光電変換部31との間のコンタクト抵抗値よりも第1光電変換部31との間のコンタクト抵抗値が小さい材料からなる第1層32aと、第2層32bと第2光電変換部33との間のコンタクト抵抗値よりも第2光電変換部との間のコンタクト抵抗値が小さい材料からなる第3層32aとを含む。第1層32a、第2層32b及び第3層32cは、第1光電変換部31側から順に積層される。従って、屈折率調整材を含む第2層32bは、第1光電変換部31及び第2光電変換部33のいずれにも接触していない。
以下において、本発明の第4実施形態について説明する。尚、以下においては、上述した第3実施形態と第4実施形態との差異について主として説明する。
以下において、本発明の第4実施形態に係る太陽電池の構成について、図4を参照しながら説明する。図4は、本発明の第4実施形態に係る太陽電池10の断面図である。
本発明の第4実施形態に係る太陽電池10によれば、反射層32の反射率を高めることに加え、太陽電池10の曲線因子(FF)の低下を抑制することができるので、太陽電池10の光電変換効率を向上させることができる。この効果について、以下に詳説する。
本発明は上記の実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
まず、シリカ系バインダー中にITO粒子(透光性導電材料)と気泡(屈折率調整材)とを含む層(以下、気泡含有ITO層)の屈折率と、従来から反射層の主体として用いられているZnO層,ITO層の屈折率との比較を行った。
次に、以下のようにして実施例1、実施例2、比較例1、比較例2及び比較例3に係る太陽電池を作製し、光電変換効率の比較を行った。
以下のようにして、実施例1に係る太陽電池10を作製した。まず、厚さ4mmのガラス基板(基板1)上に、SnO2層(受光面電極層2)を形成した。
以下のようにして、比較例1に係る太陽電池20を作製した。まず、上記実施例1と同様に、厚さ4mmのガラス基板(基板21)上に、SnO2層(受光面電極層22)、第1セル(第1光電変換部231)を順次形成した。
以下のようにして、比較例2に係る太陽電池20を作製した。まず、上記実施例1と同様に、厚さ4mmのガラス基板(基板21)上に、SnO2層(受光面電極層22)、第1セル(第1光電変換部231)を順次形成した。
実施例1、比較例1及び比較例2に係る太陽電池について、開放電圧、短絡電流、曲線因子及び光電変換効率の各特性値の比較を行った。比較結果を表2に示す。尚、表2においては、比較例1における各特性値を1.00として規格化して表している。
以下のようにして、実施例2に係る太陽電池10を作製した。まず、厚さ4mmのガラス基板(基板1)上に、SnO2層(受光面電極層2)を形成した。
以下のようにして、比較例3に係る太陽電池30を作製した。まず、上記実施例2と同様に、厚さ4mmのガラス基板(基板31)上に、SnO2層(受光面電極層32)、第1セル(第1光電変換部331)、第2セル(第2光電変換部333)を順次形成した。
実施例2及び比較例3に係る太陽電池について、開放電圧、短絡電流、曲線因子及び光電変換効率の各特性値の比較を行った。比較結果を表3に示す。尚、表3においては、比較例3における各特性値を1.00として規格化して表している。
Claims (6)
- 導電性及び透光性を有する受光面電極層と、
導電性を有する裏面電極層と、
前記受光面電極層と前記裏面電極層との間に設けられた積層体とを備え、
前記積層体は、光の入射により光生成キャリアを生成する第1光電変換部と、前記第1光電変換部を透過した光の一部を前記第1光電変換部側に反射する反射層とを含んでおり、
前記反射層は、屈折率調整材を含む低屈折率層と、前記低屈折率層と前記第1光電変換部との間に介挿されたコンタクト層とを有し、
前記屈折率調整材を構成する材料の屈折率は、前記コンタクト層を構成する材料の屈折率よりも低く、
前記低屈折率層の屈折率は、前記コンタクト層の屈折率よりも低い
ことを特徴とする太陽電池。 - 前記積層体は、前記第1光電変換部と、前記反射層と、光の入射により光生成キャリアを生成する第2光電変換部とが前記受光面電極層側から順に積層された構成を有し、
前記反射層は、前記低屈折率層と前記第2光電変換部との間に介挿された他のコンタクト層をさらに有し、
前記屈折率調整材を構成する材料の屈折率は、前記他のコンタクト層を構成する材料の屈折率よりも低く、
前記低屈折率層の屈折率は、前記他のコンタクト層の屈折率よりも低い
ことを特徴とする請求項1に記載の太陽電池。 - 前記コンタクト層は、前記第1光電変換部との間のコンタクト抵抗値が、前記低屈折率層と前記第1光電変換部との間のコンタクト抵抗値よりも小さい材料により構成されることを特徴とする請求項1又は2に記載の太陽電池。
- 前記他のコンタクト層は、前記第2光電変換部との間のコンタクト抵抗値が、前記低屈折率層と前記第2光電変換部との間のコンタクト抵抗値よりも小さい材料により構成されることを特徴とする請求項2に記載の太陽電池。
- 前記コンタクト層又は前記他のコンタクト層の少なくとも一方は、酸化亜鉛又は酸化インジウムを含むことを特徴とする請求項3又は4に記載の太陽電池。
- 絶縁性及び透光性を有する基板上に、第1太陽電池素子及び第2太陽電池素子を有する太陽電池であって、
前記第1太陽電池素子及び前記第2太陽電池素子のそれぞれは、
導電性及び透光性を有する受光面電極層と、
導電性を有する裏面電極層と、
前記受光面電極層と前記裏面電極層との間に設けられた積層体とを備え、
前記積層体は、光の入射により光生成キャリアを生成する第1光電変換部と、前記第1光電変換部を透過した光の一部を前記第1光電変換部側に反射する反射層と、光の入射により光生成キャリアを生成する第2光電変換部とを含み、
前記第1太陽電池素子の前記裏面電極層は、前記第2太陽電池素子の前記受光面電極層に向かって延在する延在部を有し、
前記延在部は、前記第1太陽電池素子に含まれる前記積層体の側面に露出した前記反射層に接しており、
前記反射層は、屈折率調整材を含む低屈折率層と、前記低屈折率層と前記第1光電変換部との間に介挿されたコンタクト層と、前記低屈折率層と前記第2光電変換部との間に介挿された他のコンタクト層とを有し、
前記屈折率調整材を構成する材料の屈折率は、前記コンタクト層を構成する材料の屈折率及び前記他のコンタクト層を構成する材料の屈折率よりも低く、
前記低屈折率層の屈折率は、前記コンタクト層の屈折率及び前記他のコンタクト層の屈折率よりも低い
ことを特徴とする太陽電池。
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JP (1) | JP2009231505A (ja) |
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WO2014185356A1 (ja) * | 2013-05-14 | 2014-11-20 | 三菱電機株式会社 | 光起電力素子及びその製造方法 |
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WO2011046388A2 (ko) | 2009-10-15 | 2011-04-21 | 엘지이노텍주식회사 | 태양광 발전장치 및 이의 제조방법 |
JP5554409B2 (ja) | 2010-06-21 | 2014-07-23 | 三菱電機株式会社 | 光電変換装置 |
TWI419343B (zh) * | 2010-07-20 | 2013-12-11 | Nexpower Technology Corp | 串疊型太陽能電池 |
KR20120082542A (ko) * | 2011-01-14 | 2012-07-24 | 엘지전자 주식회사 | 박막 태양전지 및 그 제조 방법 |
JP2012190856A (ja) * | 2011-03-08 | 2012-10-04 | Mitsubishi Materials Corp | 太陽電池向け透明導電膜用組成物および透明導電膜 |
KR101186561B1 (ko) | 2011-09-05 | 2012-10-08 | 포항공과대학교 산학협력단 | 태양전지 소자 및 이의 제조방법 |
NL2014040B1 (en) * | 2014-12-23 | 2016-10-12 | Stichting Energieonderzoek Centrum Nederland | Method of making a curent collecting grid for solar cells. |
WO2016157979A1 (ja) * | 2015-03-31 | 2016-10-06 | 株式会社カネカ | 光電変換装置および光電変換モジュール |
CN107681020A (zh) * | 2017-09-26 | 2018-02-09 | 南开大学 | 一种提高平面硅异质结太阳电池长波长光响应的方法 |
WO2019230469A1 (ja) * | 2018-05-29 | 2019-12-05 | 京セラ株式会社 | 太陽電池素子 |
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US20120138126A1 (en) | 2012-06-07 |
CN101978512B (zh) | 2012-09-05 |
CN101978512A (zh) | 2011-02-16 |
JP2009231505A (ja) | 2009-10-08 |
TW200941748A (en) | 2009-10-01 |
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