WO2009108002A3 - 유기 박막 트랜지스터 및 그 제조 방법 - Google Patents

유기 박막 트랜지스터 및 그 제조 방법 Download PDF

Info

Publication number
WO2009108002A3
WO2009108002A3 PCT/KR2009/000944 KR2009000944W WO2009108002A3 WO 2009108002 A3 WO2009108002 A3 WO 2009108002A3 KR 2009000944 W KR2009000944 W KR 2009000944W WO 2009108002 A3 WO2009108002 A3 WO 2009108002A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
film transistor
organic thin
manufacturing
channel
Prior art date
Application number
PCT/KR2009/000944
Other languages
English (en)
French (fr)
Other versions
WO2009108002A2 (ko
Inventor
홍문표
김동우
김건수
강상욱
손호진
Original Assignee
고려대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 고려대학교 산학협력단 filed Critical 고려대학교 산학협력단
Publication of WO2009108002A2 publication Critical patent/WO2009108002A2/ko
Publication of WO2009108002A3 publication Critical patent/WO2009108002A3/ko

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80Constructional details
    • H10K10/82Electrodes
    • H10K10/84Ohmic electrodes, e.g. source or drain electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/464Lateral top-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/466Lateral bottom-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/484Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Thin Film Transistor (AREA)

Abstract

유기 반도체 물질에 의해 표면 처리된 소스 드레인 전극과 드레인 전극을 구비하는 유기 박막 트랜지스터 및 그 제조방법이 개시된다. 표면처리에 의해 전극과 채널 사이의 컨택층이 형성되며, 컨택층은 채널과 동종 또는 이종의 유기 반도체 물질로 형성될 수 있다. 표면처리된 전극은 채널과의 에너지 벽의 감소로 전하 이동도를 향상시킨다.
PCT/KR2009/000944 2008-02-29 2009-02-27 유기 박막 트랜지스터 및 그 제조 방법 WO2009108002A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080018795A KR101124545B1 (ko) 2008-02-29 2008-02-29 유기 박막 트랜지스터 및 그 제조 방법
KR10-2008-0018795 2008-02-29

Publications (2)

Publication Number Publication Date
WO2009108002A2 WO2009108002A2 (ko) 2009-09-03
WO2009108002A3 true WO2009108002A3 (ko) 2009-10-29

Family

ID=41016598

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/000944 WO2009108002A2 (ko) 2008-02-29 2009-02-27 유기 박막 트랜지스터 및 그 제조 방법

Country Status (2)

Country Link
KR (1) KR101124545B1 (ko)
WO (1) WO2009108002A2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103650191A (zh) * 2011-06-01 2014-03-19 原子能和替代能源委员会 包括有构造和形状改进的电极的有机元件

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101286526B1 (ko) * 2012-01-20 2013-07-19 동아대학교 산학협력단 박막 트랜지스터 및 그의 제조 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050104513A (ko) * 2004-04-29 2005-11-03 엘지.필립스 엘시디 주식회사 유기 박막 트랜지스터 및 그 제조 방법
KR20060078007A (ko) * 2004-12-30 2006-07-05 엘지.필립스 엘시디 주식회사 유기 박막 트랜지스터 소자의 제조 방법
KR20070096086A (ko) * 2005-12-09 2007-10-02 삼성에스디아이 주식회사 유기 박막 트랜지스터 및 이의 제조 방법, 이를 구비한평판 디스플레이 장치
KR20070117850A (ko) * 2006-06-09 2007-12-13 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050104513A (ko) * 2004-04-29 2005-11-03 엘지.필립스 엘시디 주식회사 유기 박막 트랜지스터 및 그 제조 방법
KR20060078007A (ko) * 2004-12-30 2006-07-05 엘지.필립스 엘시디 주식회사 유기 박막 트랜지스터 소자의 제조 방법
KR20070096086A (ko) * 2005-12-09 2007-10-02 삼성에스디아이 주식회사 유기 박막 트랜지스터 및 이의 제조 방법, 이를 구비한평판 디스플레이 장치
KR20070117850A (ko) * 2006-06-09 2007-12-13 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103650191A (zh) * 2011-06-01 2014-03-19 原子能和替代能源委员会 包括有构造和形状改进的电极的有机元件

Also Published As

Publication number Publication date
WO2009108002A2 (ko) 2009-09-03
KR20090093332A (ko) 2009-09-02
KR101124545B1 (ko) 2012-03-15

Similar Documents

Publication Publication Date Title
TW200729570A (en) Transistor, organic semiconductor device, and method for manufacturing the transistor or device
WO2013049463A3 (en) Double gate ion sensitive field effect transistor
EP2750197A3 (en) Thin film transistor, thin film transistor array panel including the same and manufacturing method thereof
TW200644224A (en) Semiconductor device and method for manufacturing the same
WO2014051728A3 (en) Strained gate-all-around semiconductor devices formed on globally or locally isolated substrates
WO2010002803A3 (en) Treatment of gate dielectric for making high performance metal oxide and metal oxynitride thin film transistors
GB2509852A (en) Organic thin film transistors and method of making them
EP2363890A3 (en) High electron mobility transistors exhibiting dual depletion and methods of manufacturing the same
WO2008093741A1 (ja) 薄膜トランジスタ及びその製造方法
TW200725912A (en) Organic thin film transistor and method for manufacturing the same
WO2011071598A3 (en) Quantum-well-based semiconductor devices
WO2012135380A3 (en) High performance field-effect transistors
EP2084750A1 (en) Semiconductor device and its drive method
WO2012119125A3 (en) High performance graphene transistors and fabrication processes thereof
EP2348531A3 (en) Thin film transistor and method of manufacturing the same
WO2008099528A1 (ja) 表示装置、表示装置の製造方法
JP2011077512A5 (ja) 発光装置の作製方法
GB2500851A (en) Radiation hardened transistors based on graphene and carbon nanotubes
TW201614804A (en) Semiconductor device and method for manufacturing semiconductor device
JP2010114432A5 (ja) 半導体装置の作製方法
JP2011199272A5 (ko)
EP2273540A3 (en) Field-effect transistor and method for fabricating field-effect transistor
GB2474406A (en) Surface treated substrates for top gate organic thin film transistors
WO2009019864A1 (ja) 半導体装置とその製造方法および画像表示装置
TW200705668A (en) Thin film transistor substrate and manufacturing method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09715075

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 09715075

Country of ref document: EP

Kind code of ref document: A2