WO2009008517A1 - プラズマ形成領域の制御装置及びプラズマ処理装置 - Google Patents
プラズマ形成領域の制御装置及びプラズマ処理装置 Download PDFInfo
- Publication number
- WO2009008517A1 WO2009008517A1 PCT/JP2008/062635 JP2008062635W WO2009008517A1 WO 2009008517 A1 WO2009008517 A1 WO 2009008517A1 JP 2008062635 W JP2008062635 W JP 2008062635W WO 2009008517 A1 WO2009008517 A1 WO 2009008517A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plasma
- formation region
- microwave oscillator
- controller
- antenna
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02P—IGNITION, OTHER THAN COMPRESSION IGNITION, FOR INTERNAL-COMBUSTION ENGINES; TESTING OF IGNITION TIMING IN COMPRESSION-IGNITION ENGINES
- F02P23/00—Other ignition
- F02P23/04—Other physical ignition means, e.g. using laser rays
- F02P23/045—Other physical ignition means, e.g. using laser rays using electromagnetic microwaves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02P—IGNITION, OTHER THAN COMPRESSION IGNITION, FOR INTERNAL-COMBUSTION ENGINES; TESTING OF IGNITION TIMING IN COMPRESSION-IGNITION ENGINES
- F02P3/00—Other installations
- F02P3/02—Other installations having inductive energy storage, e.g. arrangements of induction coils
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02P—IGNITION, OTHER THAN COMPRESSION IGNITION, FOR INTERNAL-COMBUSTION ENGINES; TESTING OF IGNITION TIMING IN COMPRESSION-IGNITION ENGINES
- F02P9/00—Electric spark ignition control, not otherwise provided for
- F02P9/002—Control of spark intensity, intensifying, lengthening, suppression
- F02P9/007—Control of spark intensity, intensifying, lengthening, suppression by supplementary electrical discharge in the pre-ionised electrode interspace of the sparking plug, e.g. plasma jet ignition
Abstract
高圧力下において、大規模なプラズマを、容易、かつ、低コストで得ることができるプラズマの存在領域の制御装置を提供する。 マイクロ波発振器と、マイクロ波発振器に接続されたアンテナと、マイクロ波発振器及びアンテナの位置を制御する制御手段とを備え、制御手段は、各時刻におけるプラズマの形成領域の指定に基づいてプラズマの形成領域に向けてアンテナを配置し、指定されたプラズマの温度状態に基づいてマイクロ波発振器の駆動シーケンスを設定し、この駆動シーケンスにしたがいマイクロ波発振器を駆動する。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08791116.0A EP2178350B1 (en) | 2007-07-12 | 2008-07-12 | Controller of plasma formation region and plasma processor |
US12/668,787 US8552650B2 (en) | 2007-07-12 | 2008-07-12 | Plasma formation region control apparatus and plasma processing apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007183751 | 2007-07-12 | ||
JP2007-183751 | 2007-07-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009008517A1 true WO2009008517A1 (ja) | 2009-01-15 |
Family
ID=40228687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/062635 WO2009008517A1 (ja) | 2007-07-12 | 2008-07-12 | プラズマ形成領域の制御装置及びプラズマ処理装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8552650B2 (ja) |
EP (1) | EP2178350B1 (ja) |
JP (1) | JP5716181B2 (ja) |
WO (1) | WO2009008517A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2478955A1 (en) * | 2009-09-17 | 2012-07-25 | Imagineering, Inc. | Plasma-generation device |
US9709019B2 (en) | 2011-01-18 | 2017-07-18 | Imagineering, Inc. | Plasma generation device and internal combustion engine |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8890410B2 (en) | 2009-09-17 | 2014-11-18 | Imagineering, Inc. | Plasma generation device |
WO2011043399A1 (ja) | 2009-10-06 | 2011-04-14 | イマジニアリング株式会社 | 内燃機関 |
EP2578854A4 (en) | 2010-06-02 | 2017-02-22 | Imagineering, Inc. | Control device for internal combustion engine |
JP5786145B2 (ja) * | 2011-01-25 | 2015-09-30 | イマジニアリング株式会社 | 電源制御装置 |
WO2012105568A2 (ja) | 2011-01-31 | 2012-08-09 | イマジニアリング株式会社 | プラズマ装置 |
WO2012105569A2 (ja) * | 2011-01-31 | 2012-08-09 | イマジニアリング株式会社 | プラズマ生成装置 |
EP2677163A4 (en) * | 2011-02-15 | 2018-08-08 | Imagineering, Inc. | Internal combustion engine |
WO2012124671A2 (ja) * | 2011-03-14 | 2012-09-20 | イマジニアリング株式会社 | 内燃機関 |
EP2760259B1 (en) * | 2011-09-22 | 2016-12-28 | Imagineering, Inc. | Plasma generating device, and internal combustion engine |
WO2014115707A1 (ja) | 2013-01-22 | 2014-07-31 | イマジニアリング株式会社 | プラズマ生成装置、及び内燃機関 |
US20140202634A1 (en) * | 2013-01-23 | 2014-07-24 | Applied Materials, Inc. | Radial transmission line based plasma source |
JP5725574B2 (ja) * | 2013-03-05 | 2015-05-27 | 東京エレクトロン株式会社 | マイクロ波導波装置、プラズマ処理装置及びプラズマ処理方法 |
JP6082881B2 (ja) | 2013-08-21 | 2017-02-22 | イマジニアリング株式会社 | 内燃機関の点火装置及び内燃機関 |
CN103758678B (zh) * | 2013-12-18 | 2015-12-30 | 安徽理工大学 | 一种脉冲谐振电火花触发微波放电体模点火助燃装置 |
WO2016006714A1 (ja) * | 2014-07-11 | 2016-01-14 | イマジニアリング株式会社 | 点火装置 |
US10036361B2 (en) | 2014-08-12 | 2018-07-31 | Imagineering, Inc. | Ignition device |
JP2022039820A (ja) * | 2020-08-28 | 2022-03-10 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000133494A (ja) * | 1998-10-23 | 2000-05-12 | Mitsubishi Heavy Ind Ltd | マイクロ波プラズマ発生装置及び方法 |
JP2001527300A (ja) * | 1997-12-31 | 2001-12-25 | アクセリス テクノロジーズ インコーポレーティッド | プラズマ放電装置 |
JP2004363089A (ja) * | 2003-05-09 | 2004-12-24 | Japan Science & Technology Agency | タップ付きアンテナを有する高周波プラズマ装置 |
JP2006274322A (ja) * | 2005-03-28 | 2006-10-12 | Univ Nagoya | 撥水処理方法 |
JP2006278643A (ja) * | 2005-03-29 | 2006-10-12 | Advanced Lcd Technologies Development Center Co Ltd | プラズマ処理装置及びプラズマ処理方法 |
JP2006302652A (ja) * | 2005-04-20 | 2006-11-02 | Univ Nagoya | プラズマ処理装置 |
JP2007026981A (ja) * | 2005-07-20 | 2007-02-01 | Iwasaki Electric Co Ltd | プラズマ処理装置 |
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US4138980A (en) * | 1974-08-12 | 1979-02-13 | Ward Michael A V | System for improving combustion in an internal combustion engine |
US3934566A (en) * | 1974-08-12 | 1976-01-27 | Ward Michael A V | Combustion in an internal combustion engine |
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US5696428A (en) * | 1995-06-07 | 1997-12-09 | Lsi Logic Corporation | Apparatus and method using optical energy for specifying and quantitatively controlling chemically-reactive components of semiconductor processing plasma etching gas |
JP2000012468A (ja) * | 1998-06-24 | 2000-01-14 | Sharp Corp | 薄膜の製造方法 |
JP3889918B2 (ja) * | 2000-08-25 | 2007-03-07 | 富士通株式会社 | プラズマエッチング方法、プラズマエッチング装置及びプラズマ処理装置 |
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JP2004221019A (ja) * | 2003-01-17 | 2004-08-05 | Ebara Corp | 大気圧下でマイクロ波プラズマを点火する方法および装置 |
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JP4321308B2 (ja) * | 2004-03-02 | 2009-08-26 | パナソニック株式会社 | プラズマ発生方法及び装置 |
JP4531451B2 (ja) * | 2004-06-10 | 2010-08-25 | 多津男 庄司 | 大気圧中でのプラズマ生成装置及び大気圧中でのプラズマ生成支援装置 |
JP2006004684A (ja) | 2004-06-16 | 2006-01-05 | Mitsubishi Electric Corp | 超電導線材の製造方法 |
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JP4876217B2 (ja) | 2005-09-20 | 2012-02-15 | イマジニアリング株式会社 | 点火装置、内燃機関 |
-
2008
- 2008-07-12 US US12/668,787 patent/US8552650B2/en not_active Expired - Fee Related
- 2008-07-12 JP JP2008182104A patent/JP5716181B2/ja active Active
- 2008-07-12 EP EP08791116.0A patent/EP2178350B1/en not_active Not-in-force
- 2008-07-12 WO PCT/JP2008/062635 patent/WO2009008517A1/ja active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001527300A (ja) * | 1997-12-31 | 2001-12-25 | アクセリス テクノロジーズ インコーポレーティッド | プラズマ放電装置 |
JP2000133494A (ja) * | 1998-10-23 | 2000-05-12 | Mitsubishi Heavy Ind Ltd | マイクロ波プラズマ発生装置及び方法 |
JP2004363089A (ja) * | 2003-05-09 | 2004-12-24 | Japan Science & Technology Agency | タップ付きアンテナを有する高周波プラズマ装置 |
JP2006274322A (ja) * | 2005-03-28 | 2006-10-12 | Univ Nagoya | 撥水処理方法 |
JP2006278643A (ja) * | 2005-03-29 | 2006-10-12 | Advanced Lcd Technologies Development Center Co Ltd | プラズマ処理装置及びプラズマ処理方法 |
JP2006302652A (ja) * | 2005-04-20 | 2006-11-02 | Univ Nagoya | プラズマ処理装置 |
JP2007026981A (ja) * | 2005-07-20 | 2007-02-01 | Iwasaki Electric Co Ltd | プラズマ処理装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2478955A1 (en) * | 2009-09-17 | 2012-07-25 | Imagineering, Inc. | Plasma-generation device |
EP2478955A4 (en) * | 2009-09-17 | 2014-10-01 | Imagineering Inc | PLASMA GENERATION DEVICE |
US9709019B2 (en) | 2011-01-18 | 2017-07-18 | Imagineering, Inc. | Plasma generation device and internal combustion engine |
Also Published As
Publication number | Publication date |
---|---|
JP2009038025A (ja) | 2009-02-19 |
EP2178350B1 (en) | 2016-04-13 |
EP2178350A4 (en) | 2014-08-06 |
US8552650B2 (en) | 2013-10-08 |
JP5716181B2 (ja) | 2015-05-13 |
EP2178350A1 (en) | 2010-04-21 |
US20100186670A1 (en) | 2010-07-29 |
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