WO2009004964A1 - 超音波洗浄装置及び超音波洗浄方法 - Google Patents
超音波洗浄装置及び超音波洗浄方法 Download PDFInfo
- Publication number
- WO2009004964A1 WO2009004964A1 PCT/JP2008/061553 JP2008061553W WO2009004964A1 WO 2009004964 A1 WO2009004964 A1 WO 2009004964A1 JP 2008061553 W JP2008061553 W JP 2008061553W WO 2009004964 A1 WO2009004964 A1 WO 2009004964A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- bath
- rinsing
- ultrasonic
- bottom plate
- ultrasonic rinsing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
超音波の高周波化に伴う内槽の板厚を従来のように薄くすることなく、洗浄槽の内槽内における音圧を確保しつつ、超音波の高周波化に対応した超音波洗浄装置及び超音波洗浄方法を提供することすること。 超音波振動を伝達する伝達媒体を貯留するための外槽(5)と、前記外槽(5)の内部に配置され、内部に貯留される洗浄液内に浸漬される前記被洗浄物を、前記伝達媒体を介して伝達される超音波振動により洗浄するための内槽(3)からなると洗浄槽とを備え、前記内槽の底板(3a)は、超音波振動数の2分の1波長(半波長)の整数倍の板厚を有し、前記内槽の底板(3a)と前記外槽の底板(5a)とが平行とならないように前記内槽の底板(3a)を傾斜するように配置する。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-173030 | 2007-06-29 | ||
JP2007173030A JP4533406B2 (ja) | 2007-06-29 | 2007-06-29 | 超音波洗浄装置及び超音波洗浄方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009004964A1 true WO2009004964A1 (ja) | 2009-01-08 |
Family
ID=40226011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/061553 WO2009004964A1 (ja) | 2007-06-29 | 2008-06-25 | 超音波洗浄装置及び超音波洗浄方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4533406B2 (ja) |
TW (1) | TW200900167A (ja) |
WO (1) | WO2009004964A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110088631A (zh) * | 2016-12-20 | 2019-08-02 | 株式会社日立高新技术 | 超声波清洗器以及使用超声波清洗器的自动分析装置 |
CN110860521A (zh) * | 2019-11-18 | 2020-03-06 | 苏州圣典企业管理咨询有限公司 | 一种封闭式降噪超声波清洗机 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2315235B1 (en) * | 2009-10-21 | 2019-04-24 | IMEC vzw | Method and apparatus for cleaning a semiconductor substrate |
KR102162067B1 (ko) * | 2019-01-04 | 2020-10-06 | 에스케이실트론 주식회사 | 웨이퍼 세정장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03222419A (ja) * | 1990-01-29 | 1991-10-01 | Kokusai Denki Erutetsuku:Kk | 超音波洗浄装置 |
JP2004022578A (ja) * | 2002-06-12 | 2004-01-22 | Dainippon Screen Mfg Co Ltd | 基板処理ユニット検査装置および検査方法 |
JP2007044662A (ja) * | 2005-08-12 | 2007-02-22 | Kaijo Corp | 超音波洗浄装置 |
-
2007
- 2007-06-29 JP JP2007173030A patent/JP4533406B2/ja active Active
-
2008
- 2008-06-23 TW TW97123277A patent/TW200900167A/zh unknown
- 2008-06-25 WO PCT/JP2008/061553 patent/WO2009004964A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03222419A (ja) * | 1990-01-29 | 1991-10-01 | Kokusai Denki Erutetsuku:Kk | 超音波洗浄装置 |
JP2004022578A (ja) * | 2002-06-12 | 2004-01-22 | Dainippon Screen Mfg Co Ltd | 基板処理ユニット検査装置および検査方法 |
JP2007044662A (ja) * | 2005-08-12 | 2007-02-22 | Kaijo Corp | 超音波洗浄装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110088631A (zh) * | 2016-12-20 | 2019-08-02 | 株式会社日立高新技术 | 超声波清洗器以及使用超声波清洗器的自动分析装置 |
CN110088631B (zh) * | 2016-12-20 | 2023-02-03 | 株式会社日立高新技术 | 超声波清洗器以及使用超声波清洗器的自动分析装置 |
CN110860521A (zh) * | 2019-11-18 | 2020-03-06 | 苏州圣典企业管理咨询有限公司 | 一种封闭式降噪超声波清洗机 |
Also Published As
Publication number | Publication date |
---|---|
TW200900167A (en) | 2009-01-01 |
JP2009011879A (ja) | 2009-01-22 |
JP4533406B2 (ja) | 2010-09-01 |
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