WO2009000241A3 - Vorrichtung zur kontaktbelichtung einer druckschablone - Google Patents

Vorrichtung zur kontaktbelichtung einer druckschablone Download PDF

Info

Publication number
WO2009000241A3
WO2009000241A3 PCT/DE2008/001000 DE2008001000W WO2009000241A3 WO 2009000241 A3 WO2009000241 A3 WO 2009000241A3 DE 2008001000 W DE2008001000 W DE 2008001000W WO 2009000241 A3 WO2009000241 A3 WO 2009000241A3
Authority
WO
WIPO (PCT)
Prior art keywords
printing
light source
exposure device
printing screen
contact exposure
Prior art date
Application number
PCT/DE2008/001000
Other languages
English (en)
French (fr)
Other versions
WO2009000241A2 (de
Inventor
Josef Lindthaler
Hans-Herbert Frintrup
Original Assignee
Josef Lindthaler
Hans-Herbert Frintrup
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Josef Lindthaler, Hans-Herbert Frintrup filed Critical Josef Lindthaler
Publication of WO2009000241A2 publication Critical patent/WO2009000241A2/de
Publication of WO2009000241A3 publication Critical patent/WO2009000241A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

Gegenstand der Erfindung ist eine Vorrichtung zur Kontaktbelichtung einer Druckschablone (202), vorzugsweise zur Verwendung im Siebdruck, Offsetdruck, Tampondruck, Flexodruck oder dergleichen, mit Mitteln zur Aufnahme einer lichtempfindlichen Druckschablone (202), mit Mitteln zur Aufnahme eines das Motiv tragenden Films, und mit einer aus Leuchtdioden gebildeten Lichtquelle (206), wobei die Lichtquelle (206) ein im Wesentlichen linienförmiges Licht ausstrahlt und wobei die Lichtquelle (206) entlang der Druckschablone (202) bewegbar ist. Eine Vorrichtung zur Kontaktbelichtung zu schaffen, mit der auf der Druckschablone die Druckkanten sehr viel schärfer abgebildet werden wird erreicht durch eine zwischen der bewegbaren Lichtquelle (206) und der Druckschablone (202) angeordneten optischen Linse (222), die sich mit der Lichtquelle (206) mitbewegt.
PCT/DE2008/001000 2007-06-22 2008-06-21 Vorrichtung zur kontaktbelichtung einer druckschablone WO2009000241A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200710028859 DE102007028859B4 (de) 2007-06-22 2007-06-22 Vorrichtung zur Kontaktbelichtung einer Druckform
DE102007028859.1 2007-06-22

Publications (2)

Publication Number Publication Date
WO2009000241A2 WO2009000241A2 (de) 2008-12-31
WO2009000241A3 true WO2009000241A3 (de) 2009-02-19

Family

ID=40030786

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2008/001000 WO2009000241A2 (de) 2007-06-22 2008-06-21 Vorrichtung zur kontaktbelichtung einer druckschablone

Country Status (2)

Country Link
DE (1) DE102007028859B4 (de)
WO (1) WO2009000241A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5586918B2 (ja) * 2009-10-30 2014-09-10 キヤノン株式会社 移動検出装置および記録装置
US8846050B2 (en) 2010-05-11 2014-09-30 Governing Council Of The University Of Toronto N-domain of carcinoembryonic antigen and compositions, methods and uses thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1189112A2 (de) * 2000-09-19 2002-03-20 Carl Zeiss Projektionsbelichtungsanlage
DE202004017044U1 (de) * 2004-11-02 2005-01-13 Technigraf Gmbh Leuchte zur Belichtung von Siebdruckschablonen, Offsetdruckplatten, Flexodruckplatten, Inkjet-Beschichtungen o.dgl. sowie Vorrichtung zur Belichtung
US20050011382A1 (en) * 2003-05-29 2005-01-20 Donahue Joseph P. Integrated, in-line bumping and exposure system
WO2007029561A1 (ja) * 2005-09-09 2007-03-15 V Technology Co., Ltd. 露光装置
EP1770443A2 (de) * 2005-09-28 2007-04-04 Semiconductor Energy Laboratory Co., Ltd. Laserbearbeitungsvorrichtung, Laserbelichtungsgerät und Laserbelichtungsverfahren

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE9003332U1 (de) * 1990-03-19 1991-07-18 Luellau, Friedrich, Dipl.-Ing., 2123 Bardowick, De
DE9106621U1 (de) * 1991-04-26 1991-07-18 Hanus, Robert, 6078 Neu-Isenburg, De
JPH09141992A (ja) * 1995-11-20 1997-06-03 Brother Ind Ltd スタンプの印面作成方法及びその装置
US7081752B2 (en) * 2003-04-04 2006-07-25 General Electric Company System and method of electrically loading radio-frequency coils using conductive polymers

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1189112A2 (de) * 2000-09-19 2002-03-20 Carl Zeiss Projektionsbelichtungsanlage
US20050011382A1 (en) * 2003-05-29 2005-01-20 Donahue Joseph P. Integrated, in-line bumping and exposure system
DE202004017044U1 (de) * 2004-11-02 2005-01-13 Technigraf Gmbh Leuchte zur Belichtung von Siebdruckschablonen, Offsetdruckplatten, Flexodruckplatten, Inkjet-Beschichtungen o.dgl. sowie Vorrichtung zur Belichtung
WO2007029561A1 (ja) * 2005-09-09 2007-03-15 V Technology Co., Ltd. 露光装置
EP1770443A2 (de) * 2005-09-28 2007-04-04 Semiconductor Energy Laboratory Co., Ltd. Laserbearbeitungsvorrichtung, Laserbelichtungsgerät und Laserbelichtungsverfahren

Also Published As

Publication number Publication date
DE102007028859B4 (de) 2010-09-30
WO2009000241A2 (de) 2008-12-31
DE102007028859A1 (de) 2008-12-24

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