WO2008152768A1 - テープ状酸化物超電導体 - Google Patents

テープ状酸化物超電導体 Download PDF

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Publication number
WO2008152768A1
WO2008152768A1 PCT/JP2008/001149 JP2008001149W WO2008152768A1 WO 2008152768 A1 WO2008152768 A1 WO 2008152768A1 JP 2008001149 W JP2008001149 W JP 2008001149W WO 2008152768 A1 WO2008152768 A1 WO 2008152768A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
intermediate layer
degrees
thick
tape
Prior art date
Application number
PCT/JP2008/001149
Other languages
English (en)
French (fr)
Inventor
Yasuo Takahashi
Tsutomu Koizumi
Yuji Aoki
Atsushi Kaneko
Takayo Hasegawa
Original Assignee
International Superconductivity Technology Center, The Juridical Foundation
Swcc Showa Cable Systems Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Superconductivity Technology Center, The Juridical Foundation, Swcc Showa Cable Systems Co., Ltd. filed Critical International Superconductivity Technology Center, The Juridical Foundation
Priority to US12/601,992 priority Critical patent/US8431515B2/en
Publication of WO2008152768A1 publication Critical patent/WO2008152768A1/ja

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0632—Intermediate layers, e.g. for growth control

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

　金属基板を構成する元素の超電導層への拡散や中間層のクラックの発生を防止し、かつ超電導層の配向性を向上させる。 　半値幅（ＦＷＨＭ：Δφ）６．５度のＮｉ基合金基板１上に、第１中間層として膜厚１５～１００ｎｍのＣｅ－Ｇｄ－Ｏ系酸化物層２（Ｃｅ：Ｇｄ＝４０：６０～７０：３０のモル比）及び第２中間層として膜厚１００ｎｍのＣｅ－Ｚｒ－Ｏ系酸化物層３（Ｃｅ：Ｚｒ＝５０：５０のモル比）をＭＯＤ法により形成し、さらにその上にＲＦスパッタ法により第３中間層としてＣｅＯ２酸化物層４を膜厚１５０nmに成膜した。この３層構造の中間層の上に、ＹＢＣＯ超電導層５をＴＦＡ－ＭＯＤ法により膜厚は１μｍに成膜した。 　以上のテープ状酸化物超電導体の第１乃至第３中間層のΔφは、それぞれ（６．０～６．５）度、（６．０～６．６）度及び（６．０～６．６）度、ＹＢＣＯ超電導層５の液体窒素中におけるＪｃは１．８～２．２ＭＡ／ｃｍ２の値を示した。
PCT/JP2008/001149 2007-06-12 2008-05-07 テープ状酸化物超電導体 WO2008152768A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/601,992 US8431515B2 (en) 2007-06-12 2008-05-07 Tape-shaped oxide superconductor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-155484 2007-06-12
JP2007155484A JP5244337B2 (ja) 2007-06-12 2007-06-12 テープ状酸化物超電導体

Publications (1)

Publication Number Publication Date
WO2008152768A1 true WO2008152768A1 (ja) 2008-12-18

Family

ID=40129383

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001149 WO2008152768A1 (ja) 2007-06-12 2008-05-07 テープ状酸化物超電導体

Country Status (3)

Country Link
US (1) US8431515B2 (ja)
JP (1) JP5244337B2 (ja)
WO (1) WO2008152768A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2495734A1 (en) * 2009-10-27 2012-09-05 Furukawa Electric Co., Ltd. Tape base material for a superconducting wire rod, and superconducting wire rod
WO2015129272A1 (ja) * 2014-02-27 2015-09-03 昭和電線ケーブルシステム株式会社 超電導ケーブルの端末構造体及びその製造方法
CN105098055A (zh) * 2015-08-19 2015-11-25 西北有色金属研究院 一种掺杂二氧化铈阻隔层及其制备方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5548423B2 (ja) * 2009-10-26 2014-07-16 株式会社フジクラ 超電導コイル
JP5503252B2 (ja) * 2009-10-29 2014-05-28 公益財団法人国際超電導産業技術研究センター 希土類系酸化物超電導線材
JP5380250B2 (ja) * 2009-10-29 2014-01-08 公益財団法人国際超電導産業技術研究センター 希土類系酸化物超電導線材及びその製造方法
WO2014069481A1 (ja) * 2012-11-02 2014-05-08 古河電気工業株式会社 酸化物超電導薄膜
DE102013214447B3 (de) 2013-07-24 2014-11-20 Bruker Hts Gmbh Bandförmiges, supraleitendes Element mit verbessertem Eigenschutz im Quenchfall
WO2015033808A1 (ja) * 2013-09-04 2015-03-12 東洋鋼鈑株式会社 酸化物層の成膜方法、並びにエピタキシャル成長用積層基材及びその製造方法

Citations (3)

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JP2005113220A (ja) * 2003-10-08 2005-04-28 Fujikura Ltd 多結晶薄膜及びその製造方法、酸化物超電導導体
JP2006027958A (ja) * 2004-07-16 2006-02-02 Sumitomo Electric Ind Ltd 薄膜材料およびその製造方法
JP2007115561A (ja) * 2005-10-21 2007-05-10 Internatl Superconductivity Technology Center 希土類系テープ状酸化物超電導体及びその製造方法

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JP2721595B2 (ja) 1991-04-30 1998-03-04 株式会社フジクラ 多結晶薄膜の製造方法
JP2670391B2 (ja) 1991-04-30 1997-10-29 株式会社フジクラ 多結晶薄膜の製造装置
US6537689B2 (en) * 1999-11-18 2003-03-25 American Superconductor Corporation Multi-layer superconductor having buffer layer with oriented termination plane
JP4713012B2 (ja) 2000-10-31 2011-06-29 財団法人国際超電導産業技術研究センター テープ状酸化物超電導体
US7261776B2 (en) * 2004-03-30 2007-08-28 American Superconductor Corporation Deposition of buffer layers on textured metal surfaces
US7718574B2 (en) * 2004-04-08 2010-05-18 Superpower, Inc. Biaxially-textured film deposition for superconductor coated tapes

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005113220A (ja) * 2003-10-08 2005-04-28 Fujikura Ltd 多結晶薄膜及びその製造方法、酸化物超電導導体
JP2006027958A (ja) * 2004-07-16 2006-02-02 Sumitomo Electric Ind Ltd 薄膜材料およびその製造方法
JP2007115561A (ja) * 2005-10-21 2007-05-10 Internatl Superconductivity Technology Center 希土類系テープ状酸化物超電導体及びその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2495734A1 (en) * 2009-10-27 2012-09-05 Furukawa Electric Co., Ltd. Tape base material for a superconducting wire rod, and superconducting wire rod
EP2495734A4 (en) * 2009-10-27 2013-11-20 Furukawa Electric Co Ltd BAND BASE MATERIAL FOR A SUPER-CONDUCTIVE CABLE ROD, AND SUPER-LEADABLE CABLE ROD
WO2015129272A1 (ja) * 2014-02-27 2015-09-03 昭和電線ケーブルシステム株式会社 超電導ケーブルの端末構造体及びその製造方法
CN105098055A (zh) * 2015-08-19 2015-11-25 西北有色金属研究院 一种掺杂二氧化铈阻隔层及其制备方法

Also Published As

Publication number Publication date
US8431515B2 (en) 2013-04-30
JP5244337B2 (ja) 2013-07-24
JP2008310986A (ja) 2008-12-25
US20100197506A1 (en) 2010-08-05

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