WO2008149702A1 - 流体制御装置 - Google Patents

流体制御装置 Download PDF

Info

Publication number
WO2008149702A1
WO2008149702A1 PCT/JP2008/059628 JP2008059628W WO2008149702A1 WO 2008149702 A1 WO2008149702 A1 WO 2008149702A1 JP 2008059628 W JP2008059628 W JP 2008059628W WO 2008149702 A1 WO2008149702 A1 WO 2008149702A1
Authority
WO
WIPO (PCT)
Prior art keywords
control apparatus
fluid control
main body
lower section
open
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/059628
Other languages
English (en)
French (fr)
Inventor
Wataru Okase
Shuji Moriya
Tomohiro Nakata
Tsutomu Shinohara
Michio Yamaji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Fujikin Inc
Original Assignee
Tokyo Electron Ltd
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Fujikin Inc filed Critical Tokyo Electron Ltd
Priority to US12/451,649 priority Critical patent/US8434522B2/en
Priority to JP2009517796A priority patent/JP5150628B2/ja
Priority to CN2008800177112A priority patent/CN101680561B/zh
Priority to TW97119846A priority patent/TWI432663B/zh
Publication of WO2008149702A1 publication Critical patent/WO2008149702A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00—Pipe-line systems
    • F17D1/02—Pipe-line systems for gases or vapours
    • F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/598—With repair, tapping, assembly, or disassembly means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87917—Flow path with serial valves and/or closures

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Valve Housings (AREA)
  • Fluid-Pressure Circuits (AREA)
  • Control Of Fluid Pressure (AREA)

Abstract

　部品点数削減および組立て作業効率の向上が図られた流体制御装置を提供する。 　相対的に取外しの頻度が高い圧力表示器4は、上方からのおねじ部材17によって下方にあるベースブロック5に結合されている。相対的に取外しの頻度が低い開閉弁6は、一体に設けられたブロック状本体6aを下方に有している。開閉弁6の本体6aが前後方向からのおねじ部材18によってベースブロック5に結合されている。
PCT/JP2008/059628 2007-05-31 2008-05-26 流体制御装置 Ceased WO2008149702A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/451,649 US8434522B2 (en) 2007-05-31 2008-05-26 Fluid control apparatus
JP2009517796A JP5150628B2 (ja) 2007-05-31 2008-05-26 流体制御装置
CN2008800177112A CN101680561B (zh) 2007-05-31 2008-05-26 流体控制装置
TW97119846A TWI432663B (zh) 2007-05-31 2008-05-29 流體控制裝置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-144918 2007-05-31
JP2007144918 2007-05-31

Publications (1)

Publication Number Publication Date
WO2008149702A1 true WO2008149702A1 (ja) 2008-12-11

Family

ID=40093524

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059628 Ceased WO2008149702A1 (ja) 2007-05-31 2008-05-26 流体制御装置

Country Status (6)

Country Link
US (1) US8434522B2 (ja)
JP (1) JP5150628B2 (ja)
KR (1) KR20100024925A (ja)
CN (1) CN101680561B (ja)
TW (1) TWI432663B (ja)
WO (1) WO2008149702A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011101934A1 (ja) * 2010-02-22 2011-08-25 株式会社フジキン 混合ガス供給装置
WO2019044541A1 (ja) * 2017-08-31 2019-03-07 株式会社フジキン 継手ブロックおよびその製造方法
US10895329B2 (en) 2016-09-12 2021-01-19 Fujikin Incorporated Fluid control system, base block used for same, and method for manufacturing fluid control system

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2940624A1 (fr) * 2008-12-30 2010-07-02 Akhea Dispositif melangeur d'au moins deux constituants gazeux
JP5576991B2 (ja) * 2011-09-30 2014-08-20 株式会社フジキン ガス供給装置
JP5868219B2 (ja) * 2012-02-29 2016-02-24 株式会社フジキン 流体制御装置
WO2014136557A1 (ja) * 2013-03-08 2014-09-12 株式会社フジキン 流体制御装置および流体制御装置へのサーマルセンサ設置構造
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US9490149B2 (en) * 2013-07-03 2016-11-08 Lam Research Corporation Chemical deposition apparatus having conductance control
CN103924218B (zh) * 2014-04-25 2016-10-19 安徽亚格盛电子新材料有限公司 可持续供应mo源的装置
JP1539278S (ja) * 2015-03-31 2015-11-30
JP6539482B2 (ja) * 2015-04-15 2019-07-03 株式会社フジキン 遮断開放器
KR102056140B1 (ko) * 2016-02-29 2019-12-16 가부시키가이샤 후지킨 유량 제어 장치
CN109563942B (zh) * 2016-06-21 2020-04-10 株式会社富士金 流体控制装置
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
KR102259108B1 (ko) * 2017-09-25 2021-06-01 가부시키가이샤 후지킨 밸브장치, 조정 정보 생성방법, 유량 조정방법, 유체 제어장치, 유량 제어방법, 반도체 제조장치 및 반도체 제조방법
KR102822934B1 (ko) 2018-05-07 2025-06-18 램 리써치 코포레이션 설정가능한 (configurable) 분산 인터록킹 시스템
CN112912652A (zh) * 2018-10-31 2021-06-04 株式会社富士金 流体供给系统
CN109323019B (zh) * 2018-11-30 2020-04-21 四川天采科技有限责任公司 一种3d打印成型的一体化程控阀组
CN113994460B (zh) * 2019-04-15 2025-05-20 朗姆研究公司 用于气体输送的模块部件系统
FR3116000B1 (fr) * 2020-11-10 2023-06-02 Novasep Process Assemblage de modules fluidiques
US20250207679A1 (en) * 2023-12-22 2025-06-26 Applied Materials, Inc. Gas delivery system
US20260096371A1 (en) * 2024-09-27 2026-04-02 Applied Materials, Inc. Modular multi-directional gas mixing block

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227836A (ja) * 1995-02-21 1996-09-03 Ckd Corp ガス供給集積ユニット及びそのシステム
JPH08326943A (ja) * 1995-05-31 1996-12-10 Tadahiro Omi 流体制御装置
JPH10148272A (ja) * 1996-11-20 1998-06-02 Tadahiro Omi 遮断開放器
JPH10220698A (ja) * 1996-12-03 1998-08-21 Nippon Aera Kk 流体制御装置
JPH11351500A (ja) * 1998-06-05 1999-12-24 Hitachi Metals Ltd 集積形流体制御装置
WO2006115084A1 (ja) * 2005-04-21 2006-11-02 Fujikin Incorporated 流体制御装置
WO2008062679A1 (en) * 2006-11-22 2008-05-29 Fujikin Incorporated Fluid coupling

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100232112B1 (ko) * 1996-01-05 1999-12-01 아마노 시게루 가스공급유닛
JP3726168B2 (ja) * 1996-05-10 2005-12-14 忠弘 大見 流体制御装置
JP3650859B2 (ja) * 1996-06-25 2005-05-25 忠弘 大見 遮断開放器およびこれを備えた流体制御装置
JP3997338B2 (ja) 1997-02-14 2007-10-24 忠弘 大見 流体制御装置
US6152175A (en) * 1997-06-06 2000-11-28 Ckd Corporation Process gas supply unit
JP3921565B2 (ja) * 1998-07-10 2007-05-30 株式会社フジキン 流体制御装置
JP3360133B2 (ja) * 1998-11-11 2002-12-24 株式会社フジキン 流体制御装置用継手部材およびその製造方法
US6363958B1 (en) * 1999-05-10 2002-04-02 Parker-Hannifin Corporation Flow control of process gas in semiconductor manufacturing
RU2346996C2 (ru) 2004-06-29 2009-02-20 ЮРОПИЭН НИКЕЛЬ ПиЭлСи Усовершенствованное выщелачивание основных металлов
TW200801513A (en) 2006-06-29 2008-01-01 Fermiscan Australia Pty Ltd Improved process

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227836A (ja) * 1995-02-21 1996-09-03 Ckd Corp ガス供給集積ユニット及びそのシステム
JPH08326943A (ja) * 1995-05-31 1996-12-10 Tadahiro Omi 流体制御装置
JPH10148272A (ja) * 1996-11-20 1998-06-02 Tadahiro Omi 遮断開放器
JPH10220698A (ja) * 1996-12-03 1998-08-21 Nippon Aera Kk 流体制御装置
JPH11351500A (ja) * 1998-06-05 1999-12-24 Hitachi Metals Ltd 集積形流体制御装置
WO2006115084A1 (ja) * 2005-04-21 2006-11-02 Fujikin Incorporated 流体制御装置
WO2008062679A1 (en) * 2006-11-22 2008-05-29 Fujikin Incorporated Fluid coupling

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011101934A1 (ja) * 2010-02-22 2011-08-25 株式会社フジキン 混合ガス供給装置
CN102934202A (zh) * 2010-02-22 2013-02-13 株式会社富士金 混合气体供给装置
JP5456879B2 (ja) * 2010-02-22 2014-04-02 株式会社フジキン 混合ガス供給装置
CN102934202B (zh) * 2010-02-22 2015-05-13 株式会社富士金 混合气体供给装置
US9233347B2 (en) 2010-02-22 2016-01-12 Fujikin Incorporated Mixed gas supply device
US10895329B2 (en) 2016-09-12 2021-01-19 Fujikin Incorporated Fluid control system, base block used for same, and method for manufacturing fluid control system
WO2019044541A1 (ja) * 2017-08-31 2019-03-07 株式会社フジキン 継手ブロックおよびその製造方法
JPWO2019044541A1 (ja) * 2017-08-31 2020-08-20 株式会社フジキン 継手ブロックおよびその製造方法
JP7045089B2 (ja) 2017-08-31 2022-03-31 株式会社フジキン 継手ブロックおよびその製造方法

Also Published As

Publication number Publication date
JP5150628B2 (ja) 2013-02-20
KR20100024925A (ko) 2010-03-08
CN101680561B (zh) 2011-12-21
US20100096031A1 (en) 2010-04-22
CN101680561A (zh) 2010-03-24
JPWO2008149702A1 (ja) 2010-08-26
TWI432663B (zh) 2014-04-01
TW200916678A (en) 2009-04-16
US8434522B2 (en) 2013-05-07

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