WO2008146779A1 - 流体制御装置およびその組立方法 - Google Patents
流体制御装置およびその組立方法 Download PDFInfo
- Publication number
- WO2008146779A1 WO2008146779A1 PCT/JP2008/059632 JP2008059632W WO2008146779A1 WO 2008146779 A1 WO2008146779 A1 WO 2008146779A1 JP 2008059632 W JP2008059632 W JP 2008059632W WO 2008146779 A1 WO2008146779 A1 WO 2008146779A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- screw member
- male screw
- rear direction
- control apparatus
- fluid control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/003—Housing formed from a plurality of the same valve elements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/598—With repair, tapping, assembly, or disassembly means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87885—Sectional block structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
- Y10T29/49947—Assembling or joining by applying separate fastener
- Y10T29/49963—Threaded fastener
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Valve Housings (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020097026375A KR101230747B1 (ko) | 2007-05-31 | 2008-05-26 | 유체 제어 장치 및 그 조립 방법 |
| US12/451,643 US8220495B2 (en) | 2007-05-31 | 2008-05-26 | Fluid control apparatus and method for assembling the same |
| TW97119847A TWI387696B (zh) | 2007-05-31 | 2008-05-29 | 流體控制裝置及其組立方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-144927 | 2007-05-31 | ||
| JP2007144927A JP5125228B2 (ja) | 2007-05-31 | 2007-05-31 | 流体制御装置およびその組立方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008146779A1 true WO2008146779A1 (ja) | 2008-12-04 |
Family
ID=40075020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/059632 Ceased WO2008146779A1 (ja) | 2007-05-31 | 2008-05-26 | 流体制御装置およびその組立方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8220495B2 (ja) |
| JP (1) | JP5125228B2 (ja) |
| KR (1) | KR101230747B1 (ja) |
| TW (1) | TWI387696B (ja) |
| WO (1) | WO2008146779A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015178894A (ja) * | 2013-12-05 | 2015-10-08 | Ckd株式会社 | 配管継手、流体供給制御装置、及び配管接続構造 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9062787B2 (en) | 2009-04-17 | 2015-06-23 | Mitsubishi Electric Corporation | Valve block, and valve block unit |
| JP5576991B2 (ja) * | 2011-09-30 | 2014-08-20 | 株式会社フジキン | ガス供給装置 |
| KR20150051242A (ko) * | 2012-10-30 | 2015-05-11 | 시케이디 가부시키가이샤 | 유체 제어 기기 매니폴드, 매니폴드 조립 방법, 접속용 공구 |
| US9454158B2 (en) | 2013-03-15 | 2016-09-27 | Bhushan Somani | Real time diagnostics for flow controller systems and methods |
| TWI650499B (zh) * | 2013-12-05 | 2019-02-11 | Ckd Corporation | 流路方塊及流體供給控制裝置 |
| CA2946880A1 (en) * | 2014-04-30 | 2015-11-05 | Parker-Hannifin Corporation | Hydraulic sectional control valve with multiple relief slots |
| JP1539278S (ja) * | 2015-03-31 | 2015-11-30 | ||
| USD854656S1 (en) * | 2016-05-19 | 2019-07-23 | Nagano Keiki Co., Ltd. | Fluid controller |
| CN109312874B (zh) * | 2016-06-21 | 2020-11-03 | 株式会社富士金 | 流体控制装置 |
| WO2018079288A1 (ja) * | 2016-10-24 | 2018-05-03 | 株式会社フジキン | 流体制御装置およびこの流体制御装置を用いた製品製造方法 |
| US10983537B2 (en) | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5086322U (ja) * | 1973-12-11 | 1975-07-23 | ||
| JPS5170978U (ja) * | 1974-11-30 | 1976-06-04 | ||
| JPH0395053U (ja) * | 1990-01-19 | 1991-09-27 | ||
| JPH0447646U (ja) * | 1990-08-29 | 1992-04-22 | ||
| JP2002346814A (ja) * | 2001-05-21 | 2002-12-04 | Yoshikawa Tekkosho:Kk | 旋盤用チャック装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3654960A (en) * | 1969-12-31 | 1972-04-11 | Hydro Stack Mfg Corp | Modular hydraulic system |
| DE2119224B2 (de) * | 1971-04-21 | 1977-09-29 | Robert Bosch Gmbh, 7000 Stuttgart | Baueinheit zum aufbau einer mit druckmittel fuehrenden kanaelen versehenen grundplatte |
| JPS5086322A (ja) | 1973-11-30 | 1975-07-11 | ||
| JPS5170978A (en) | 1974-12-17 | 1976-06-19 | Sharp Kk | Enshindatsusuikino baransaasochi |
| GB1545488A (en) * | 1975-04-01 | 1979-05-10 | B & G Hydraulics Ltd | Hydraulic circuit units |
| GB2232240A (en) | 1989-05-25 | 1990-12-05 | Svecia Antiqua Ltd | Checking and combining corresponding items such as letters and their envelopes. |
| JPH0547646A (ja) | 1991-08-21 | 1993-02-26 | Hitachi Ltd | 電子線描画方法 |
| JP3997338B2 (ja) | 1997-02-14 | 2007-10-24 | 忠弘 大見 | 流体制御装置 |
| JP4110304B2 (ja) * | 1998-06-30 | 2008-07-02 | 株式会社フジキン | 流体制御装置および流体制御装置組立て方法 |
| DE10039072C2 (de) * | 2000-08-10 | 2002-07-18 | Festo Ag & Co | Ventilanordnung |
| US6951226B2 (en) * | 2001-07-13 | 2005-10-04 | Talon Innovations, Inc. | Shear-resistant modular fluidic blocks |
| JP4058531B2 (ja) * | 2002-06-11 | 2008-03-12 | Smc株式会社 | ユニットマニホールドバルブ |
| US7464726B2 (en) * | 2005-02-28 | 2008-12-16 | Swagelok Company | Modular system with captivated fastener assemblies |
| JP4437553B2 (ja) * | 2005-06-14 | 2010-03-24 | シーケーディ株式会社 | マニホールドブロック及びそれを用いたバルブユニット |
-
2007
- 2007-05-31 JP JP2007144927A patent/JP5125228B2/ja active Active
-
2008
- 2008-05-26 KR KR1020097026375A patent/KR101230747B1/ko active Active
- 2008-05-26 US US12/451,643 patent/US8220495B2/en active Active
- 2008-05-26 WO PCT/JP2008/059632 patent/WO2008146779A1/ja not_active Ceased
- 2008-05-29 TW TW97119847A patent/TWI387696B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5086322U (ja) * | 1973-12-11 | 1975-07-23 | ||
| JPS5170978U (ja) * | 1974-11-30 | 1976-06-04 | ||
| JPH0395053U (ja) * | 1990-01-19 | 1991-09-27 | ||
| JPH0447646U (ja) * | 1990-08-29 | 1992-04-22 | ||
| JP2002346814A (ja) * | 2001-05-21 | 2002-12-04 | Yoshikawa Tekkosho:Kk | 旋盤用チャック装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015178894A (ja) * | 2013-12-05 | 2015-10-08 | Ckd株式会社 | 配管継手、流体供給制御装置、及び配管接続構造 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20100022055A (ko) | 2010-02-26 |
| KR101230747B1 (ko) | 2013-02-07 |
| TWI387696B (zh) | 2013-03-01 |
| US8220495B2 (en) | 2012-07-17 |
| JP5125228B2 (ja) | 2013-01-23 |
| US20100132808A1 (en) | 2010-06-03 |
| TW200912168A (en) | 2009-03-16 |
| JP2008298179A (ja) | 2008-12-11 |
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|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
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| DPE2 | Request for preliminary examination filed before expiration of 19th month from priority date (pct application filed from 20040101) | ||
| WWE | Wipo information: entry into national phase |
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