WO2008146779A1 - 流体制御装置およびその組立方法 - Google Patents

流体制御装置およびその組立方法 Download PDF

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Publication number
WO2008146779A1
WO2008146779A1 PCT/JP2008/059632 JP2008059632W WO2008146779A1 WO 2008146779 A1 WO2008146779 A1 WO 2008146779A1 JP 2008059632 W JP2008059632 W JP 2008059632W WO 2008146779 A1 WO2008146779 A1 WO 2008146779A1
Authority
WO
WIPO (PCT)
Prior art keywords
screw member
male screw
rear direction
control apparatus
fluid control
Prior art date
Application number
PCT/JP2008/059632
Other languages
English (en)
French (fr)
Inventor
Tomohiro Nakata
Tsutomu Shinohara
Michio Yamaji
Original Assignee
Fujikin Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikin Incorporated filed Critical Fujikin Incorporated
Priority to US12/451,643 priority Critical patent/US8220495B2/en
Priority to KR1020097026375A priority patent/KR101230747B1/ko
Priority to TW97119847A priority patent/TWI387696B/zh
Publication of WO2008146779A1 publication Critical patent/WO2008146779A1/ja

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/598—With repair, tapping, assembly, or disassembly means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining
    • Y10T29/49947—Assembling or joining by applying separate fastener
    • Y10T29/49963—Threaded fastener

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Valve Housings (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　組立て作業効率の向上が図られた流体制御装置を提供する。 　前後方向にのびるねじ挿通孔29は、おねじ部材18の頭部18aを受ける段部29aを有し、この段部29aが上方からのおねじ部材34の前後方向位置よりも前後方向からのおねじ部材28の挿入先端側に位置させられている。前後方向からのおねじ部材18を先に、上方からのおねじ部材34を後から締め付けることにより、前後方向からのおねじ部材18と上方からのおねじ部材34との干渉が避けられている。
PCT/JP2008/059632 2007-05-31 2008-05-26 流体制御装置およびその組立方法 WO2008146779A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/451,643 US8220495B2 (en) 2007-05-31 2008-05-26 Fluid control apparatus and method for assembling the same
KR1020097026375A KR101230747B1 (ko) 2007-05-31 2008-05-26 유체 제어 장치 및 그 조립 방법
TW97119847A TWI387696B (zh) 2007-05-31 2008-05-29 流體控制裝置及其組立方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007144927A JP5125228B2 (ja) 2007-05-31 2007-05-31 流体制御装置およびその組立方法
JP2007-144927 2007-05-31

Publications (1)

Publication Number Publication Date
WO2008146779A1 true WO2008146779A1 (ja) 2008-12-04

Family

ID=40075020

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059632 WO2008146779A1 (ja) 2007-05-31 2008-05-26 流体制御装置およびその組立方法

Country Status (5)

Country Link
US (1) US8220495B2 (ja)
JP (1) JP5125228B2 (ja)
KR (1) KR101230747B1 (ja)
TW (1) TWI387696B (ja)
WO (1) WO2008146779A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015178894A (ja) * 2013-12-05 2015-10-08 Ckd株式会社 配管継手、流体供給制御装置、及び配管接続構造

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5340382B2 (ja) * 2009-04-17 2013-11-13 三菱電機株式会社 弁ブロック及び弁ブロックユニット
KR101599344B1 (ko) * 2011-09-30 2016-03-03 가부시키가이샤 후지킨 가스 공급 장치
US9631734B2 (en) * 2012-10-30 2017-04-25 Ckd Corporation Fluid control device manifold, manifold assembling method, and connection tool
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
TWI646278B (zh) * 2013-12-05 2019-01-01 Ｃｋｄ股份有限公司 Piping joint, fluid supply control device, and piping connection structure
WO2015168369A1 (en) * 2014-04-30 2015-11-05 Parker-Hannifin Corporation Hydraulic sectional control valve with multiple relief slots
JP1539278S (ja) * 2015-03-31 2015-11-30
USD854656S1 (en) * 2016-05-19 2019-07-23 Nagano Keiki Co., Ltd. Fluid controller
US10830367B2 (en) * 2016-06-21 2020-11-10 Fujikin Incorporated Fluid control system
CN109891138B (zh) * 2016-10-24 2020-07-07 株式会社富士金 流体控制装置和使用该流体控制装置的制品制造方法
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5086322U (ja) * 1973-12-11 1975-07-23
JPS5170978U (ja) * 1974-11-30 1976-06-04
JPH0395053U (ja) * 1990-01-19 1991-09-27
JPH0447646U (ja) * 1990-08-29 1992-04-22
JP2002346814A (ja) * 2001-05-21 2002-12-04 Yoshikawa Tekkosho:Kk 旋盤用チャック装置

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US3654960A (en) * 1969-12-31 1972-04-11 Hydro Stack Mfg Corp Modular hydraulic system
DE2119224B2 (de) * 1971-04-21 1977-09-29 Robert Bosch Gmbh, 7000 Stuttgart Baueinheit zum aufbau einer mit druckmittel fuehrenden kanaelen versehenen grundplatte
JPS5086322A (ja) 1973-11-30 1975-07-11
JPS5170978A (en) 1974-12-17 1976-06-19 Sharp Kk Enshindatsusuikino baransaasochi
GB1545488A (en) * 1975-04-01 1979-05-10 B & G Hydraulics Ltd Hydraulic circuit units
GB2232240A (en) 1989-05-25 1990-12-05 Svecia Antiqua Ltd Checking and combining corresponding items such as letters and their envelopes.
JPH0547646A (ja) 1991-08-21 1993-02-26 Hitachi Ltd 電子線描画方法
JP3997338B2 (ja) 1997-02-14 2007-10-24 忠弘 大見 流体制御装置
JP4110304B2 (ja) * 1998-06-30 2008-07-02 株式会社フジキン 流体制御装置および流体制御装置組立て方法
DE10039072C2 (de) * 2000-08-10 2002-07-18 Festo Ag & Co Ventilanordnung
US6951226B2 (en) * 2001-07-13 2005-10-04 Talon Innovations, Inc. Shear-resistant modular fluidic blocks
JP4058531B2 (ja) * 2002-06-11 2008-03-12 Ｓｍｃ株式会社 ユニットマニホールドバルブ
WO2006093872A1 (en) * 2005-02-28 2006-09-08 Swagelok Company Modular system with captivated pastener assemblies
JP4437553B2 (ja) * 2005-06-14 2010-03-24 シーケーディ株式会社 マニホールドブロック及びそれを用いたバルブユニット

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5086322U (ja) * 1973-12-11 1975-07-23
JPS5170978U (ja) * 1974-11-30 1976-06-04
JPH0395053U (ja) * 1990-01-19 1991-09-27
JPH0447646U (ja) * 1990-08-29 1992-04-22
JP2002346814A (ja) * 2001-05-21 2002-12-04 Yoshikawa Tekkosho:Kk 旋盤用チャック装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015178894A (ja) * 2013-12-05 2015-10-08 Ckd株式会社 配管継手、流体供給制御装置、及び配管接続構造

Also Published As

Publication number Publication date
US20100132808A1 (en) 2010-06-03
TWI387696B (zh) 2013-03-01
TW200912168A (en) 2009-03-16
KR101230747B1 (ko) 2013-02-07
JP5125228B2 (ja) 2013-01-23
US8220495B2 (en) 2012-07-17
JP2008298179A (ja) 2008-12-11
KR20100022055A (ko) 2010-02-26

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