WO2008139916A1 - 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ - Google Patents

銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ Download PDF

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Publication number
WO2008139916A1
WO2008139916A1 PCT/JP2008/058175 JP2008058175W WO2008139916A1 WO 2008139916 A1 WO2008139916 A1 WO 2008139916A1 JP 2008058175 W JP2008058175 W JP 2008058175W WO 2008139916 A1 WO2008139916 A1 WO 2008139916A1
Authority
WO
WIPO (PCT)
Prior art keywords
copper
silica glass
containing silica
producing
wavelength
Prior art date
Application number
PCT/JP2008/058175
Other languages
English (en)
French (fr)
Inventor
Tetsuji Ueda
Michinari Ohuchi
Hiroyuki Nishimura
Akira Fujinoki
Masahiro Nakatsuka
Hidetsugu Yoshida
Original Assignee
Shin-Etsu Quartz Products Co., Ltd.
Opto-Electronics Laboratory, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Quartz Products Co., Ltd., Opto-Electronics Laboratory, Inc. filed Critical Shin-Etsu Quartz Products Co., Ltd.
Priority to EP08740907.4A priority Critical patent/EP2145863B1/en
Priority to US12/595,605 priority patent/US20100109509A1/en
Publication of WO2008139916A1 publication Critical patent/WO2008139916A1/ja
Priority to US13/558,698 priority patent/US8635886B2/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1438—Reactant delivery systems for delivering and depositing additional reactants as liquids or solutions, e.g. solution doping of the article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0071—Compositions for glass with special properties for laserable glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
    • C03C4/085—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths for ultraviolet absorbing glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/12—Compositions for glass with special properties for luminescent glass; for fluorescent glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

　波長４００ｎｍ以下の紫外線の照射により、波長５２０ｎｍから５８０ｎｍにピークを持つ蛍光を発するガラスであり、高出力での使用においても長期安定性に優れた銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプを提供することを目的とする。 　５ｗｔｐｐｍ以上２００ｗｔｐｐｍ以下の銅を含有し、波長１６０ｎｍ以上４００ｎｍ以下の紫外光の照射により５２０ｎｍ以上５８０ｎｍ以下の領域にピークを持つ蛍光を発し、かつ、波長５３０ｎｍにおける厚さ２．５ｍｍあたりの内部透過率が９５％以上であるようにした。
PCT/JP2008/058175 2007-05-15 2008-04-28 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ WO2008139916A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08740907.4A EP2145863B1 (en) 2007-05-15 2008-04-28 Copper-containing silica glass, process for producing the same, and xenon flash lamp using the copper-containing silica glass
US12/595,605 US20100109509A1 (en) 2007-05-15 2008-04-28 Copper-contaning silica glass, method for producing the same, and xenon flash lamp using the same
US13/558,698 US8635886B2 (en) 2007-05-15 2012-07-26 Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-129707 2007-05-15
JP2007129707A JP5270862B2 (ja) 2007-05-15 2007-05-15 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/595,605 A-371-Of-International US20100109509A1 (en) 2007-05-15 2008-04-28 Copper-contaning silica glass, method for producing the same, and xenon flash lamp using the same
US13/558,698 Continuation US8635886B2 (en) 2007-05-15 2012-07-26 Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same

Publications (1)

Publication Number Publication Date
WO2008139916A1 true WO2008139916A1 (ja) 2008-11-20

Family

ID=40002130

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/058175 WO2008139916A1 (ja) 2007-05-15 2008-04-28 銅含有シリカガラス及びその製造方法、並びにそれを用いたキセノンフラッシュランプ

Country Status (4)

Country Link
US (2) US20100109509A1 (ja)
EP (1) EP2145863B1 (ja)
JP (1) JP5270862B2 (ja)
WO (1) WO2008139916A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5678509B2 (ja) * 2010-08-02 2015-03-04 日本電気硝子株式会社 波長変換部材の製造方法、波長変換部材及び光源
DE102012000418A1 (de) * 2011-12-23 2013-06-27 J-Plasma Gmbh Verfahren zum Herstellen von Stablinsen und Vorrichtung hierfür
CZ201265A3 (cs) * 2012-01-30 2013-04-24 Vysoká skola chemicko - technologická v Praze Optické luminiscencní sodnohlinitokremicité sklo, dopované ionty Cu+ a Cu2+, urcené pro fotoniku

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05254879A (ja) 1992-03-06 1993-10-05 Seiko Epson Corp 蛍光ガラス及びそれを用いたレーザー装置
JP2004115294A (ja) * 2002-09-25 2004-04-15 National Institute Of Advanced Industrial & Technology 蛍光ガラスおよびその製造方法
JP2005187262A (ja) 2003-12-25 2005-07-14 Shinetsu Quartz Prod Co Ltd 蛍光シリカガラス
JP2005255498A (ja) * 2004-03-15 2005-09-22 National Institute Of Advanced Industrial & Technology 蛍光ガラスおよびその製造方法
JP2005272243A (ja) 2004-03-25 2005-10-06 Shinetsu Quartz Prod Co Ltd 波長変換シリカガラス
JP2006044995A (ja) * 2004-08-05 2006-02-16 Toshiba Ceramics Co Ltd ドープシリカガラスおよびその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69303949T2 (de) * 1992-03-02 1997-03-13 Koninkl Philips Electronics Nv Elektrische Infrarot-Glühlampe und Verfahren zur Herstellung derselben
GB9210327D0 (en) * 1992-05-14 1992-07-01 Tsl Group Plc Heat treatment facility for synthetic vitreous silica bodies
US5585640A (en) * 1995-01-11 1996-12-17 Huston; Alan L. Glass matrix doped with activated luminescent nanocrystalline particles
JP3270423B2 (ja) * 1998-06-22 2002-04-02 オリンパス光学工業株式会社 赤外吸収ガラス及びその作製方法
JP3472234B2 (ja) * 1999-10-19 2003-12-02 信越石英株式会社 エキシマレーザ及びエキシマランプ用のシリカガラス光学材料
JP3943008B2 (ja) * 2002-08-28 2007-07-11 日本電信電話株式会社 オゾンガスの検知素子および検出装置ならびに検出方法
CA2506200C (en) * 2002-11-29 2011-05-17 Japan Science And Technology Agency Luminescent glass
JP4591862B2 (ja) * 2003-04-01 2010-12-01 日本電気硝子株式会社 発光性ガラス物品およびその製造方法
WO2005054139A1 (de) * 2003-12-08 2005-06-16 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur herstellung von laseraktivem quarzglas und verwendung desselben
JP4199267B2 (ja) * 2006-07-19 2008-12-17 株式会社東芝 蛍光体、その製造方法、および発光装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05254879A (ja) 1992-03-06 1993-10-05 Seiko Epson Corp 蛍光ガラス及びそれを用いたレーザー装置
JP2004115294A (ja) * 2002-09-25 2004-04-15 National Institute Of Advanced Industrial & Technology 蛍光ガラスおよびその製造方法
JP2005187262A (ja) 2003-12-25 2005-07-14 Shinetsu Quartz Prod Co Ltd 蛍光シリカガラス
JP2005255498A (ja) * 2004-03-15 2005-09-22 National Institute Of Advanced Industrial & Technology 蛍光ガラスおよびその製造方法
JP2005272243A (ja) 2004-03-25 2005-10-06 Shinetsu Quartz Prod Co Ltd 波長変換シリカガラス
JP2006044995A (ja) * 2004-08-05 2006-02-16 Toshiba Ceramics Co Ltd ドープシリカガラスおよびその製造方法

Also Published As

Publication number Publication date
JP2008285344A (ja) 2008-11-27
US20120291488A1 (en) 2012-11-22
US20100109509A1 (en) 2010-05-06
JP5270862B2 (ja) 2013-08-21
EP2145863A4 (en) 2013-07-03
EP2145863B1 (en) 2016-02-17
US8635886B2 (en) 2014-01-28
EP2145863A1 (en) 2010-01-20

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