WO2008129569A1 - Film de matière plastique revêtu - Google Patents

Film de matière plastique revêtu Download PDF

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Publication number
WO2008129569A1
WO2008129569A1 PCT/IT2007/000289 IT2007000289W WO2008129569A1 WO 2008129569 A1 WO2008129569 A1 WO 2008129569A1 IT 2007000289 W IT2007000289 W IT 2007000289W WO 2008129569 A1 WO2008129569 A1 WO 2008129569A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
structure according
group composed
plasma
sih
Prior art date
Application number
PCT/IT2007/000289
Other languages
English (en)
Inventor
Daniel Treves
Original Assignee
Ledal S.P.A.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ledal S.P.A. filed Critical Ledal S.P.A.
Priority to PCT/IT2007/000289 priority Critical patent/WO2008129569A1/fr
Publication of WO2008129569A1 publication Critical patent/WO2008129569A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers

Definitions

  • the present invention relates to a stratified structure for use in the textile industry.
  • these stratified structures including in particular films of metallized plastics material, are cut into strips of micrometric length and then mixed with other fibres, natural or artificial, to form a finished textile having a particular aesthetic value.
  • the resulting mixture of fibres is subjected to various chemical treatments, for example dyeing processes, some of which are highly aggressive, being carried out at high temperatures (80 ⁇ 135°C) and using acid and/or basic substances with pH values lying approximately in the range from 2 to 12.
  • dyeing processes some of which are highly aggressive, being carried out at high temperatures (80 ⁇ 135°C) and using acid and/or basic substances with pH values lying approximately in the range from 2 to 12.
  • this protective layer is based on epoxy or nitrocellulose resins, but these provide insufficient protection in some chemical treatments, allowing the partial removal of the metal from the plastics material.
  • the object of the present invention is therefore to provide a stratified structure of the type comprising a first base layer of plastics material, a second intermediate metallization layer and a third protective layer, which is an improvement over the known art.
  • this object is achieved by means of a structure of the aforementioned type, characterized in that the aforesaid third layer is made from a material selected from the group composed of silicon-oxygen, silicon-nitrogen, silicon-nitrogen- oxygen and silicon-carbon alloys, as well as oxides and nitrides of Al and Ti and mixtures of these.
  • the first and second layers produce an aesthetic effect, which will be exploited in the finished textile, while the third layer provides protection against chemical agents with which the structure may come into contact during the chemical treatments required for its production.
  • the materials of the third protective layer of the structure according to the invention - which can be used in either the crystalline or the amorphous form - are more resistant than conventional materials to chemical erosion, high temperatures, light radiation and ageing, enabling them to be used in more severe conditions.
  • the structure according to the invention is thus able to withstand the mechanical stresses to which it is subjected during the use of the textile (friction, bending, compression, etc.), treatments with washing products normally used for textile products (soaps, detergents), and aggressive chemical dyeing treatments.
  • the plastics material of the first base layer is selected, for example, from the group composed of polyesters, polyamides, polyethylene and polypropylene.
  • the preferred polyester is PET.
  • the metal of the second layer is, for example, aluminium or silver.
  • the second layer can be produced by known methods of deposition on the previously formed first layer, for example by a vacuum evaporation process with electron beam enhancement if necessary, by DC or RF cathodic plasma sputtering, or by plasma-enhanced chemical vapour deposition.
  • the second layer of the structure is applied by a plasma-enhanced deposition method, it is possible to carry out, in the same reactor, a surface activation process using a plasma (an oxygen-based plasma for example) on the surface of the first layer of the structure, to improve the characteristics of the adhesion of the second layer to the first layer.
  • a plasma an oxygen-based plasma for example
  • the material of the third layer which is typically transparent, is for example an alloy selected from the group composed of SiO 2 , Si 1 -XO x , Si 3 N 4 , Si 1-X N X , SiC, Si 1-x C x and Si 1-X- y O ⁇ N y , where x and y have independent values in the range from O to 1, extremes excluded, provided that their sum is less than 1, an oxide such as Al 2 O 3 or TiO 2 or a nitride such as AlN or TiN.
  • the third layer can also be produced by known methods of deposition on the previously formed second layer.
  • the third layer can be produced by a DC or RF sputtering process.
  • the material of the third layer is an SiO 2 or Si 1-x O x alloy, it can also be produced by a plasma enhanced chemical vapour deposition (PECVD) process.
  • PECVD plasma enhanced chemical vapour deposition
  • this process uses at least one precursor gas selected from the group composed of silane (SiH 4 ), disilane (Si 2 H 6 ), trimethylsilane (SiH(CH 3 ) 3 ), and tetramethylsilane (Si(CH 3 ) 4 ), and at least one precursor gas selected from the group composed of oxygen (O 2 ) and nitrous oxide (N 2 O).
  • the material of the third layer is an Si 3 N 4 , Si 1-X N X or alloy, it can also be produced by a plasma enhanced chemical vapour deposition (PECVD) process.
  • PECVD plasma enhanced chemical vapour deposition
  • this process uses at least one precursor gas selected from the group composed of silane (SiH 4 ), disilane (Si 2 H 6 ), trimethylsilane (SiH(CH 3 ) 3 ), and tetramethylsilane (Si(CHs) 4 ), and at least one precursor gas selected from the group composed of nitrogen (N 2 ), anhydrous ammonia (NH 3 ) and nitrous oxide (N 2 O).
  • the material of the third layer is an SiC or Sii -x C x alloy, it can also be produced by a plasma enhanced chemical vapour deposition (PECVD) process.
  • PECVD plasma enhanced chemical vapour deposition
  • this process uses at least one precursor gas selected from the group composed of silane (SiH 4 ), disilane (Si 2 H 6 ), trimethylsilane (SiH(CH 3 ) 3 ), and tetramethylsilane (Si(CH 3 ) 4 ), and if necessary at least one precursor gas selected from the group composed of methane (CH 4 ), propane (C 3 H 8 ) and acetylene (C 2 H 2 ).
  • the third layer of the structure is applied by a plasma-enhanced deposition method, such as plasma-enhanced chemical vapour deposition or sputtering, it is possible to carry out, in the same reactor, a surface activation process using a plasma (an oxygen-based plasma for example) on the surface of the second layer of the structure, to improve the third layer's properties of adhesion to the second layer.
  • a plasma an oxygen-based plasma for example
  • the third layer of the structure is of a metal oxide and is applied by a deposition process of the sputtering type, it is possible to deposit the second and third layers subsequently in two successive stages carried out in the same reactor, thus reducing the overall time and cost of the process.
  • the stratified structure according to the invention has a thickness in the range from 3 ⁇ m to 105 ⁇ m
  • the third layer considered separately has a thickness in the range from 0.05 ⁇ m to 5 ⁇ m, and even more preferably from 0.1 ⁇ m to 1 ⁇ m
  • the first layer considered separately has a thickness in the range from 3 ⁇ m to 100 ⁇ m.
  • the stratified structure is formed from the following layers: a first layer of PET with a thickness of 50 ⁇ m, a second layer of Al with a thickness of 1 ⁇ m, deposited on the first layer by RF sputtering, and a third layer of Al 2 O 3 with a thickness of 0.2 ⁇ m, deposited on the second layer by reactive RF sputtering using oxygen as the reactive gas.
  • the second and third layers were deposited consecutively in the same reactor.
  • the stratified structure is formed from the following layers: a first layer of PET with a thickness of 50 ⁇ m, a second layer of Al with a thickness of 1 ⁇ m, deposited on the first layer by RF sputtering, and a third layer of AlN with a thickness of 0.2 ⁇ m, deposited on the second layer by reactive RF sputtering using nitrogen as the reactive gas.
  • the second and third layers were deposited consecutively in the same reactor.
  • the stratified structure is formed from the following layers: a first layer of PET with a thickness of 50 ⁇ m, a second layer of Al with a thickness of 1 ⁇ m, deposited on the first layer by thermal evaporation, and a third layer of Si 3 N 4 with a thickness of 0.2 ⁇ m, deposited on the second layer by plasma-enhanced chemical vapour deposition, using silane (SiH 4 ) and ammonia (NH 3 ) as the precursor gases.
  • the stratified structure is formed from the following layers: a first layer of PET with a thickness of 50 ⁇ m, a second layer of Al with a thickness of 1 ⁇ m, deposited on the first layer by thermal evaporation, and a third layer of SiO 2 with a thickness of 0.2 ⁇ m, deposited on the second layer by plasma-enhanced chemical vapour deposition, using silane (SiH 4 ) and nitrous oxide (N 2 O) as the precursor gases.
  • silane SiH 4
  • N 2 O nitrous oxide
  • the third protective layer can also be formed by a mixture of two or more of the aforementioned alloys, oxides and/or nitrides.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

La structure stratifiée vise à être utilisée dans l'industrie textile. Elle comprend une première couche de base de matière plastique, une seconde couche intermédiaire de métallisation et une troisième couche protectrice. La troisième couche est faite d'une matière choisie dans le groupe constitué par des alliages silicium-oxygène, silicium-azote, silicium-azote-oxygène et silicium-carbone, ainsi que des oxydes et des nitrures d'Al et Ti et des mélanges de ceux-ci. De préférence, cette structure a une épaisseur se situant dans la plage de 3 μm à 105 μm.
PCT/IT2007/000289 2007-04-19 2007-04-19 Film de matière plastique revêtu WO2008129569A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/IT2007/000289 WO2008129569A1 (fr) 2007-04-19 2007-04-19 Film de matière plastique revêtu

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IT2007/000289 WO2008129569A1 (fr) 2007-04-19 2007-04-19 Film de matière plastique revêtu

Publications (1)

Publication Number Publication Date
WO2008129569A1 true WO2008129569A1 (fr) 2008-10-30

Family

ID=38799404

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IT2007/000289 WO2008129569A1 (fr) 2007-04-19 2007-04-19 Film de matière plastique revêtu

Country Status (1)

Country Link
WO (1) WO2008129569A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62186202A (ja) * 1986-02-12 1987-08-14 Seiko Epson Corp プラスチツク光学部品の反射防止膜
DE3707214A1 (de) * 1987-03-06 1988-09-15 Hoechst Ag Beschichtete kunststoffolie und daraus hergestelltes kunststofflaminat
EP0597391A1 (fr) * 1992-11-09 1994-05-18 Central Glass Company, Limited Plaque de verre avec un revêtement multicouche absorbant les rayonnements ultraviolets
US20070030568A1 (en) * 2005-07-26 2007-02-08 Tohoku University Future Vision Inc. High-reflectance visible-light reflector member, liquid-crystal display backlight unit employing the same, and manufacture of the high-reflectance visible-light reflector member

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62186202A (ja) * 1986-02-12 1987-08-14 Seiko Epson Corp プラスチツク光学部品の反射防止膜
DE3707214A1 (de) * 1987-03-06 1988-09-15 Hoechst Ag Beschichtete kunststoffolie und daraus hergestelltes kunststofflaminat
EP0597391A1 (fr) * 1992-11-09 1994-05-18 Central Glass Company, Limited Plaque de verre avec un revêtement multicouche absorbant les rayonnements ultraviolets
US20070030568A1 (en) * 2005-07-26 2007-02-08 Tohoku University Future Vision Inc. High-reflectance visible-light reflector member, liquid-crystal display backlight unit employing the same, and manufacture of the high-reflectance visible-light reflector member

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